Silicon wafer conveying cleanliness control device and arrangement method for photovoltaic cell production line

Abstract

The application discloses a kind of silicon wafer transmission cleanliness control device and arrangement method of photovoltaic cell production line, it is related to photovoltaic cell production technical field, device includes niche type stand and negative pressure suction cabin, the inside cavity of niche type stand is connected with particle adsorption part;Multiple negative pressure suction cabin is divided into two groups, and is connected in the two side walls of niche type stand respectively;Negative pressure suction cabin has the inner suction port towards the inside cavity of niche type stand, and the outer suction port towards the outside of niche type stand and with the opening direction of niche type stand same, the suction pressure of inner suction port is greater than the suction pressure of outer suction port.Niche type stand is staggered in two sides along the transmission direction of photovoltaic cell production line in sequence, and make the plane of niche type stand direction of placement is inclined relative to the transmission direction of photovoltaic cell production line.The application utilizes the partial negative pressure of inside of niche type stand and the flow disturbance effect of outside, so that the overall adsorption dust removal effect is better, and the range is larger.

Description

Technical Field

[0001] This invention relates to the field of photovoltaic cell manufacturing technology, and more specifically to a silicon wafer transport cleanliness control device for a photovoltaic cell production line and a method for arranging the device in the photovoltaic cell production line. Background Technology

[0002] A solar cell is a thin-film structure of photoelectric semiconductors that converts sunlight into electrical energy. In recent years, with the increasing awareness of renewable and clean energy, and with the upgrading and innovation of related technologies and industries, mass production and processing lines for solar cells have emerged.

[0003] The main production steps of solar cells are:

[0004] Step 1: Texturing: The silicon wafer is placed in a texturing machine and texturized using a chemical etching method to form a pyramidal texture on the surface of the silicon wafer, which enhances light absorption.

[0005] Step 2: Diffusion: The silicon wafer exits the texturing machine and enters the diffusion process, where phosphorus oxychloride is added to form a PN junction on the silicon wafer surface.

[0006] Step 3: Laser SE: The laser light diffuses out and enters the laser machine, where it is used to create a light doping effect in the silicon-iron metal region.

[0007] Step 4: Etching: The laser machine produces an etching machine, sometimes called a polishing machine, which uses chemical methods to polish the surface.

[0008] Step 5: Annealing. The material comes out of the etching machine and enters a high-temperature furnace for annealing to form a silicon dioxide layer.

[0009] Step 6: Back passivation. After annealing, trimethyl chloride is added to perform back passivation to form an alumina film.

[0010] Step 7: Back coating and passivation complete. Perform back coating PECVD, add ammonia gas and silane to form a silicon nitride thin film.

[0011] Step 8: After the back laser coating is completed, laser grooving and drilling are performed.

[0012] Step 9: The grooved silicon wafer is screen-printed with electrodes, placed in a sintering furnace, and sintered at high temperature to form ohmic contacts. Finally, it is sorted and inspected to obtain the solar cell.

[0013] However, the quality of solar cells produced after the above steps is still inconsistent. Among them, the quality defects caused by the cleanliness of the production line are more obvious. Therefore, the production workshop has high requirements for cleanliness and a large number of dust removal stickers are applied to many important locations. However, these stationary dust removal stickers are only a passive dust removal method. When the airflow inside the production line reaches a certain balance, it is difficult to achieve the dust removal effect.

[0014] Therefore, how to provide a cleanliness control device that is suitable for solar cell production lines and has good dust removal effect is a problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0015] In view of this, the present invention provides a silicon wafer transport cleanliness control device and arrangement method for a photovoltaic cell production line, aiming to solve the above-mentioned technical problems.

[0016] To achieve the above objectives, the present invention adopts the following technical solution:

[0017] A silicon wafer transport cleanliness control device for a photovoltaic cell production line includes:

[0018] A niche-shaped support frame, wherein the inner cavity of the niche-shaped support frame is connected to a particle adsorption section;

[0019] The negative pressure suction chamber comprises multiple chambers, which are divided into two groups and connected to the two side walls of the niche-shaped frame. Each chamber has a tracheal connector. The chamber has an inner suction port facing the inner cavity of the niche-shaped frame and an outer suction port facing the outer side of the frame and in the same direction as the opening of the frame. The suction pressure of the inner suction port is greater than that of the outer suction port. The negative pressure suction surface formed by the two corresponding inner suction ports is located at the opening of the inner cavity of the niche-shaped frame, and this surface is located in front of the particle adsorption section.

[0020] Through the above technical solution, the cleanliness control device provided by this invention does not require modification of the production line. It can be directly installed inside the production line as an external structure. Utilizing the negative pressure suction chamber, a local negative pressure state is created within the inner cavity of the niche-shaped frame. Through the combined suction action of the inner and outer suction ports, the airflow within the production line is kept in a continuous state of motion. When particles enter, they can quickly enter the inner cavity of the niche-shaped frame and be adsorbed and adhered to the particle adsorption part. This invention abandons the traditional passive static adsorption method, forming an active adsorption dust removal mode. Due to the limited space within the photovoltaic production line, controlling the particle orientation within the production line by utilizing local air pressure changes can effectively control the particle orientation, resulting in a high level of cleanliness control.

[0021] Preferably, in the silicon wafer transport cleanliness control device of the above-mentioned photovoltaic cell production line, the particle adsorption unit includes a vertically arranged conveyor belt mechanism connected to both sides of the niche-shaped frame, and a dust removal sticker is attached to the belt of the conveyor belt mechanism. In this invention, the particle adsorption unit uses the conveyor belt structure as a support carrier, and the dust removal sticker is attached to the belt of the conveyor belt mechanism. The dust removal sticker can be replaced by driving the belt, and the dust removal sticker that has moved to the rear can be easily peeled off and replaced.

[0022] Preferably, in the silicon wafer conveying cleanliness control device of the above-mentioned photovoltaic cell production line, one end of any support roller shaft of the conveyor belt mechanism has a hand crank that extends through the side wall of the niche-shaped stand. The hand crank facilitates the driving action of the conveyor belt mechanism.

[0023] Preferably, in the silicon wafer conveying cleanliness control device of the photovoltaic cell production line described above, the particle adsorption section further includes a belt tensioning mechanism connected to the two side walls of the niche-shaped stand, and the tensioning roller of the belt tensioning mechanism abuts against the inner side of the belt. In this invention, the function of the belt tensioning mechanism differs from that in the prior art: due to the formation of the negative pressure suction surface, the airflow in the inner cavity of the niche-shaped stand is unstable, which easily causes belt vibration. The belt tensioning mechanism can better ensure the stability of the belt.

[0024] Preferably, in the silicon wafer transport cleanliness control device of the above-mentioned photovoltaic cell production line, the rear side wall of the niche-shaped stand is an openable pivot door. By setting the pivot door, it is convenient to open from the rear of the niche-shaped stand and replace the dust removal stickers.

[0025] Preferably, in the silicon wafer transport cleanliness control device of the above-mentioned photovoltaic cell production line, both the inner and outer suction ports of the negative pressure suction chamber are composed of an outer support mesh and an inner filter plate stacked together, and the filter plate can be inserted, removed, and installed. By setting the filter plate, the airflow during suction can be kept uniform.

[0026] Preferably, in the silicon wafer transport cleanliness control device of the above-mentioned photovoltaic cell production line, the filter plate located in the inner suction port has a lower grade than the filter plate located in the outer suction port. By setting different grades of filter plates, the gas flow rate is controlled, thereby controlling the suction pressure.

[0027] Preferably, in the silicon wafer transport cleanliness control device of the above-mentioned photovoltaic cell production line, an airflow regulating valve is installed on the air pipe connector. The airflow regulating valve can conveniently and quickly adjust the suction force.

[0028] Preferably, in the silicon wafer transport cleanliness control device of the above-mentioned photovoltaic cell production line, a mounting plate is fixed to the bottom surface of the niche-shaped support. The mounting plate facilitates the quick installation and fixation of the niche-shaped support.

[0029] The present invention also provides a method for arranging a silicon wafer transport cleanliness control device in a photovoltaic cell production line, including a photovoltaic cell production line; the niche-shaped support is arranged alternately on both sides along the transport direction of the photovoltaic cell production line, and the planar placement direction of the niche-shaped support is inclined relative to the transport direction of the photovoltaic cell production line.

[0030] Through the above technical solution, the arrangement method of the cleanliness control device provided by the present invention abandons the traditional symmetrical arrangement on both sides of the online body. For the novel device provided by the present invention, the symmetrical arrangement limits the air flow and the range of action. By adopting an alternating inclined arrangement on both sides, the range of action can be increased with the minimum number of devices. By utilizing the local negative pressure on the inner side of the niche-shaped frame and the airflow disturbance on the outer side, the overall adsorption and dust removal effect is better and the range of action is larger.

[0031] As can be seen from the above technical solution, compared with the prior art, the present invention discloses a silicon wafer transport cleanliness control device and arrangement method for a photovoltaic cell production line, which has the following beneficial effects:

[0032] 1. The cleanliness control device provided by the present invention abandons the traditional passive static adsorption method. It utilizes the local negative pressure inside the niche-shaped frame and the airflow disturbance on the outside to achieve better overall adsorption and dust removal effect and a larger range of action.

[0033] 2. The cleanliness control device arrangement method provided by the present invention abandons the traditional symmetrical arrangement on both sides of the online body and adopts an alternating inclined arrangement on both sides, which can increase the applicable range with the minimum number of devices.

[0034] 3. The cleanliness control device provided by this invention does not require any modification to the original production line and can be directly installed in the production line as an external structure, making it more widely applicable.

[0035] 4. The cleanliness control device and corresponding arrangement method provided by this invention are applicable to the photovoltaic wafer production field. Based on its cleanliness requirements and production line limitations, it is adaptively designed and can be installed in locations where cleanliness is difficult to control, thereby improving cleanliness. Attached Figure Description

[0036] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0037] Figure 1 The attached figure is a front structural schematic diagram of the silicon wafer transport cleanliness control device provided by the present invention;

[0038] Figure 2 The attached figure is a schematic diagram of the back structure of the silicon wafer transport cleanliness control device provided by the present invention;

[0039] Figure 3 The attached figure is a schematic diagram of the particle adsorption section provided by the present invention;

[0040] Figure 4 The attached figure is a partial structural schematic diagram of the belt tensioning mechanism provided by the present invention;

[0041] Figure 5 The attached figure is a side sectional view of the silicon wafer transport cleanliness control device provided by the present invention;

[0042] Figure 6 The attached figure is a partial structural schematic diagram of the negative pressure suction chamber provided by the present invention;

[0043] Figure 7 The attached figure is a top view of the arrangement of the silicon wafer transport cleanliness control device provided by the present invention in a photovoltaic cell production line.

[0044] in:

[0045] 1-Nest-type support frame;

[0046] 11-Side panel; 111-Strip groove; 112-Support plate; 12-Top plate; 13-Pivot door panel; 14-Mounting plate;

[0047] 2-Negative pressure suction chamber;

[0048] 21-Tracheal tube connector; 22-Inner suction port; 23-Outer suction port; 24-Support mesh; 25-Filter plate; 26-Airflow regulating valve;

[0049] 3-Particle adsorption section;

[0050] 31-Conveyor belt mechanism; 311-Belt; 312-Support roller; 313-Hand crank; 32-Dust removal sticker; 33-Belt tensioning mechanism; 331-Tensioning roller; 332-Adjusting screw; 333-Adjusting nut; 334-Supporting spring; 4-Photovoltaic cell production line. Detailed Implementation

[0051] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0052] Example 1:

[0053] See appendix Figure 1 This invention discloses a silicon wafer transport cleanliness control device for a photovoltaic cell production line, comprising:

[0054] Niche-shaped support 1, with a particle adsorption part 3 connected to the inner cavity of the niche-shaped support 1;

[0055] There are multiple negative pressure suction chambers 2, which are divided into two groups and connected to the two side walls of the niche-shaped frame 1 respectively. Each negative pressure suction chamber 2 has a tracheal connector 21. Each negative pressure suction chamber 2 has an inner suction port 22 facing the inner cavity of the niche-shaped frame 1 and an outer suction port 23 facing the outer side of the niche-shaped frame 1 and having the same opening direction as the niche-shaped frame 1. The suction pressure of the inner suction port 22 is greater than that of the outer suction port 23. The negative pressure suction surface formed by the two corresponding inner suction ports 22 is located at the opening of the inner cavity of the niche-shaped frame 1 and is located in front of the particle adsorption section 3.

[0056] See appendix Figure 3 The particle adsorption unit 3 includes a vertically arranged conveyor belt mechanism 31 connected to both sides of the niche-shaped frame 1, and a dust removal sticker 32 is attached to the belt 311 of the conveyor belt mechanism 31.

[0057] To further optimize the above technical solution, one end of any support roller 312 of the conveyor belt mechanism 31 has a hand crank 313 that protrudes through the side wall of the niche-shaped frame 1.

[0058] See appendix Figure 4 and attached Figure 5 The particle adsorption unit 3 also includes a belt tensioning mechanism 33 connected to the two side walls of the niche-shaped frame 1, and the tensioning roller 331 of the belt tensioning mechanism 33 abuts against the inner side of the belt 311.

[0059] In this implementation, such as Figure 1 and Figure 2 As shown, the niche-type support frame 1 consists of a mounting plate 14, side plates 11, a top plate 12, and a pivot door plate 13 connecting the two side plates 11.

[0060] A slotted groove 111 is provided on the side plate, through which the two ends of the tension roller 331 can pass. The two ends of the tension roller 331 are slidably connected back and forth within the slotted groove 111. A support plate 112 is also fixed on the side plate 11. An adjusting screw 332 is radially fixed to the end of the tension roller 331. The adjusting screw 332 passes through the support plate 112 and is threadedly connected to an adjusting nut 333. A support spring 334 is sleeved on the adjusting screw 332, and the support spring 334 is pressed between the support plate 112 and the end of the tension roller 331. By turning the adjusting nut 333, the position of the tension roller 331 can be adjusted, thereby adjusting the tension of the belt 311.

[0061] See appendix Figure 6 The inner suction port 22 and the outer suction port 23 of the negative pressure suction chamber 2 are both composed of an outer support net 24 and an inner filter plate 25 stacked together. The filter plate 25 can be inserted, removed and installed.

[0062] In this embodiment, the negative pressure suction chamber 2 is a rectangular hollow chamber structure. An installation port is provided on the side plate 11 for connection and installation. Insertion ports are formed on the side walls of the adjacent inner suction port 22 and outer suction port 23 of the negative pressure suction chamber 2 for disassembling and assembling the filter plate 25.

[0063] To further optimize the above technical solution, the filter plate 25 located in the inner suction port 22 is of a lower grade than the filter plate 25 located in the outer suction port 23.

[0064] To further optimize the above technical solution, an airflow regulating valve 26 is installed on the air pipe connector 21.

[0065] In this embodiment, the negative pressure suction chambers 2 are arranged sequentially from top to bottom, with four chambers on each side as shown in the figure. During use, the negative pressure pipeline is connected to the air pipe connectors 21. Furthermore, it is not necessary to connect all air pipe connectors 21; selective connections can be made based on cleanliness requirements or the needs of the production line. For example, where the cleanliness requirements are high at the screen printing area, all air pipe connectors 21 can be connected and opened.

[0066] Example 2:

[0067] See appendix Figure 7 This embodiment provides a method for arranging a silicon wafer transport cleanliness control device in a photovoltaic cell production line, including a photovoltaic cell production line 4; the niche-shaped support 1 of Embodiment 1 is arranged alternately on both sides along the transport direction of the photovoltaic cell production line 4, and the planar placement direction of the niche-shaped support 1 is inclined relative to the transport direction of the photovoltaic cell production line 4.

[0068] As attached Figure 7As shown, when the niche-shaped stand 1 is placed at an angle, the effective range of the external suction port 23 can be relatively enlarged, which can greatly improve the control range compared with the traditional symmetrical upright placement on both sides of the photovoltaic cell production line 4.

[0069] The silicon wafer transport cleanliness control device and arrangement method provided in this embodiment can be applied to the production line of photovoltaic cells. Since the production line of photovoltaic cells is not suitable for causing large gas fluctuations, this local negative pressure method is adopted. Moreover, the suction pressure of the external suction port 23 is also controlled within the range that does not affect the transport of silicon wafers, so that the gas flow is limited to the collection of particulate dust, without affecting the production and transport of silicon wafers.

[0070] like Figure 7 As shown by the gas flow arrows, due to the air pressure control of the inner suction port (22) and the outer suction port (23), the gas flow in different ranges will also be affected, making the active dust removal effect better.

[0071] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on its differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. For the apparatus disclosed in the embodiments, since they correspond to the methods disclosed in the embodiments, the description is relatively simple; relevant parts can be referred to the method section.

[0072] The above description of the disclosed embodiments enables those skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A silicon wafer transport cleanliness control device for a photovoltaic cell production line, characterized in that, include: A niche-shaped support frame (1) has a particle adsorption part (3) connected to its inner cavity; The negative pressure suction chamber (2) is a plurality of such chambers, which are divided into two groups and connected to the two side walls of the niche-shaped frame (1). The negative pressure suction chamber (2) has a tracheal connector (21). The negative pressure suction chamber (2) has an inner suction port (22) facing the inner cavity of the niche-shaped frame (1) and an outer suction port (23) facing the outer side of the niche-shaped frame (1) and having the same opening direction as the niche-shaped frame (1). The suction pressure of the inner suction port (22) is greater than that of the outer suction port (23). The negative pressure suction surface formed by the two corresponding inner suction ports (22) is located at the opening of the inner cavity of the niche-shaped frame (1) and is located in front of the particle adsorption part (3).

2. The silicon wafer transport cleanliness control device for a photovoltaic cell production line according to claim 1, characterized in that, The particle adsorption unit (3) includes a vertically arranged conveyor belt mechanism (31) connected to both sides of the niche-shaped frame (1), and a dust removal sticker (32) is attached to the belt (311) of the conveyor belt mechanism (31).

3. The silicon wafer transport cleanliness control device for a photovoltaic cell production line according to claim 2, characterized in that, One end of any support roller (312) of the conveyor belt mechanism (31) has a hand crank (313) that extends through the side wall of the niche-shaped stand (1).

4. The silicon wafer transport cleanliness control device for a photovoltaic cell production line according to claim 2, characterized in that, The particle adsorption unit (3) also includes a belt tensioning mechanism (33) connected to the two side walls of the niche-shaped frame (1), and the tensioning roller (331) of the belt tensioning mechanism (33) abuts against the inner side of the belt (311).

5. A silicon wafer transport cleanliness control device for a photovoltaic cell production line according to any one of claims 2-4, characterized in that, The rear side wall of the niche-shaped support (1) is a hinged door panel (13) that can be opened and closed.

6. The silicon wafer transport cleanliness control device for a photovoltaic cell production line according to claim 1, characterized in that, The inner suction port (22) and the outer suction port (23) of the negative pressure suction chamber (2) are both composed of an outer support net (24) and an inner filter plate (25), and the filter plate (25) can be inserted, removed and installed.

7. The silicon wafer transport cleanliness control device for a photovoltaic cell production line according to claim 6, characterized in that, The filter plate (25) located in the inner suction port (22) is of a lower grade than the filter plate (25) located in the outer suction port (23).

8. The silicon wafer transport cleanliness control device for a photovoltaic cell production line according to claim 7, characterized in that, An airflow regulating valve (26) is installed on the tracheal connector (21).

9. A silicon wafer transport cleanliness control device for a photovoltaic cell production line according to any one of claims 1-4 and 6-8, characterized in that, The bottom surface of the niche-shaped support (1) is fixed with a mounting plate (14).

10. A method for arranging a silicon wafer transport cleanliness control device in a photovoltaic cell production line according to any one of claims 1-9, comprising a photovoltaic cell production line (4); characterized in that, The niche-shaped support frame (1) is arranged alternately on both sides along the transmission direction of the photovoltaic cell production line (4), and the plane placement direction of the niche-shaped support frame (1) is tilted relative to the transmission direction of the photovoltaic cell production line (4).

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