Supporting jig for deposition of adsorbed film coating and method for preparing adsorbed film surface coating

Abstract

The present application relates to a kind of support clamps for adsorptive membrane deposition coating and the preparation method of adsorptive membrane surface coating, support clamps for adsorptive membrane deposition coating include: base, the boss that is set on the upper surface of base and is matched with adsorptive membrane and the annular boss that is set around boss;Center line of base is provided with through-hole array, including first through-hole and second through-hole;First through-hole is set in the center of boss, and second through-hole is set on annular boss.The support clamp provided by the present application avoids the problem that adsorptive membrane appears wrinkled when coating is set, is conducive to improving the bonding effect of film layer and base, so as to improve the service life of adsorptive membrane.

Description

Technical Field

[0001] This invention relates to the field of coating, specifically to a support fixture for adsorption film deposition coating and a method for preparing an adsorption film surface coating. Background Technology

[0002] Currently, chemical mechanical polishing (CMP) is a commonly used surface treatment process used to grind or polish the surface of materials to improve their surface quality. In CMP, a polishing head is typically used. The backing film, an adsorption film formed from silicone material on the polishing head, serves to adsorb the wafer and apply different pressures to the wafer in partitioning.

[0003] CN103084969A discloses a chemical mechanical polishing (CMP) apparatus, comprising: a polishing platform; a polishing pad located on the polishing platform; a wafer carrier head that adsorbs the wafer to be polished and makes the front side of the wafer to be polished contact the polishing pad; a polishing pad conditioner; a device with a visual identification mark connected to a shaft supporting the polishing pad conditioner; a light source configured to illuminate the visual identification mark; and a sensor configured to receive light reflected from the visual identification mark. During the polishing process, the light source illuminates the visual identification mark at the same angle. The sensor sends a control signal to the wafer carrier head based on changes in the incident angle of the light reflected from the visual identification mark. The wafer carrier head adjusts the height of the carrier film on the back side of the wafer to be polished relative to the surface of the polishing pad according to the control signal. This solution allows for timely adjustment of the wafer's position during the polishing process, thereby solving the problem of poor contact between the wafer and the polishing pad surface caused by wear on the polishing pad surface, and maintaining the continuity and stability of the polishing process.

[0004] To ensure the performance of the back film, a coating, such as a parylene coating, is usually applied to its surface. However, currently, the back film is directly placed into the coating chamber for coating. This process results in the inner side of the back film being covered by the coating, causing pressure fluctuations in different areas during use. The vacuum environment also increases the deformation of the back film, leading to wrinkles. Summary of the Invention

[0005] In view of the problems existing in the prior art, the purpose of the present invention is to provide a support fixture for adsorption membrane deposition coating and a method for preparing adsorption membrane surface coating, so as to solve the problems of partition pressure fluctuation and wrinkling of the back film prepared by the prior art during use.

[0006] To achieve this objective, the present invention adopts the following technical solution:

[0007] In a first aspect, the present invention provides a support fixture for adsorption film deposition coating.

[0008] The support fixture for adsorption film deposition coating includes: a substrate, a boss on the upper surface of the substrate that matches the adsorption film, and an annular boss surrounding the boss.

[0009] An array of through holes, including a first through hole and a second through hole, is provided on the center line of the substrate;

[0010] The first through hole is located at the center of the boss, and the second through hole is located on the annular boss;

[0011] The ratio of the thickness of the substrate to the equivalent circular diameter of the through holes in the through-hole array is greater than 4.

[0012] The support fixture provided by this invention, through the design of the fixture and the use of a specific array of through holes, avoids the problem of wrinkled film when the adsorption membrane is coated, which is conducive to improving the bonding effect between the film layer and the substrate, thereby extending the service life of the adsorption membrane.

[0013] As a preferred embodiment of the present invention, the equivalent circle diameter of the through holes in the through hole array is 1-1.2% of the equivalent circle diameter of the base.

[0014] As a preferred embodiment of the present invention, the lower surface of the substrate is provided with an array of blind holes, which are arranged on a straight line parallel to the center line;

[0015] The blind hole array includes a first blind hole and a second blind hole; the first blind hole is disposed at the center of the corresponding projection surface on the upper surface of the boss;

[0016] The second blind hole is disposed on the annular boss on the corresponding projection surface of the upper surface of the annular boss.

[0017] As a preferred embodiment of the present invention, the depth of the blind holes in the blind hole array is 54-55% of the thickness of the substrate.

[0018] As a preferred embodiment of the present invention, the equivalent circle diameter of the blind holes in the blind hole array is 1.5-1.6% of the equivalent circle diameter of the base.

[0019] As a preferred technical solution of the present invention, the distance between the parallel lines obtained by perpendicularly projecting the center line and the straight line onto the same plane is 3-4% of the diameter of the equivalent circle of the base.

[0020] In a second aspect, the present invention provides a method for preparing a coating on the surface of an adsorption membrane, the method comprising: assembling the adsorption membrane and the coating of the adsorption membrane described in the first aspect using a support fixture, and then performing chemical vapor deposition to obtain an adsorption membrane with a coating.

[0021] As a preferred technical solution of the present invention, the material evaporation temperature of the chemical vapor deposition is 150-180℃.

[0022] Preferably, the pyrolysis temperature in the chemical vapor deposition is 650-750℃.

[0023] As a preferred embodiment of the present invention, the absolute vacuum degree during deposition in the chemical vapor deposition is ≤4.0×10⁻⁶. -2 torr.

[0024] As a preferred technical solution of the present invention, the preparation method includes: assembling the adsorption membrane and the adsorption membrane coating described in the first aspect using a support fixture, and then performing chemical vapor deposition to obtain an adsorption membrane with a coating.

[0025] The material evaporation temperature for the chemical vapor deposition is 150-180℃;

[0026] The pyrolysis temperature in the chemical vapor deposition is 650-750℃;

[0027] The absolute vacuum degree during chemical vapor deposition is ≤4.0×10⁻⁶. -2 torr.

[0028] Compared with existing technical solutions, the present invention has the following beneficial effects:

[0029] The support fixture provided by this invention, by adopting a specific through-hole array design, achieves the balance of internal and external air pressure during the coating process by controlling the parameters of the through holes in the through-hole array, thereby preventing wrinkles in the resulting adsorption film, i.e., poor bonding between the film layer and the adsorption film. At the same time, due to the introduction of the support fixture, coating defects on the inner side of the adsorption film can be avoided when the coating is deposited on the adsorption film. Attached Figure Description

[0030] Figure 1 This is a top view of the support fixture for adsorption film deposition coating provided in the embodiments of the present invention;

[0031] Figure 2 This is a cross-sectional view of the support fixture AA for adsorption film deposition coating provided in the embodiments of the present invention;

[0032] Figure 3 This is a cross-sectional view of the support fixture BB for adsorption film deposition coating provided in the embodiments of the present invention.

[0033] In the figure: 1-boss, 2-annular boss, 3.1-first through hole, 3.2-second through hole, 4.1-first blind hole, 4.2-second blind hole.

[0034] The present invention will now be described in further detail. However, the examples described below are merely simplified examples of the present invention and do not represent or limit the scope of protection of the present invention. The scope of protection of the present invention is determined by the claims. Detailed Implementation

[0035] To better illustrate the present invention and facilitate understanding of its technical solutions, typical but non-limiting embodiments of the present invention are as follows:

[0036] Example

[0037] This embodiment provides a support fixture for adsorption film deposition coating, such as... Figure 1-3 As shown, the support fixture for adsorption film deposition coating includes: a substrate, a boss 1 that matches the adsorption film on the upper surface of the substrate, and an annular boss 2 that surrounds the boss 1.

[0038] An array of through holes is provided along the center line of the substrate, including a first through hole 3.1 and a first through hole 3.2;

[0039] The first through hole 3.1 is located at the center of the boss 1, and the first through hole 3.2 is located on the annular boss 2;

[0040] The ratio of the thickness of the substrate to the equivalent circular diameter of the through holes in the through-hole array is greater than 4.

[0041] In this invention, by employing bosses and a substrate to prevent the silicone adsorption membrane from being coated with a coating, thus reducing airtightness, a specific through-hole design is used in the through-hole array to improve the balance of internal and external air pressure during the coating process, thereby ensuring that the resulting adsorption membrane does not exhibit wrinkles, i.e., poor bonding between the membrane layer and the adsorption membrane.

[0042] Specifically, the ratio of the thickness of the substrate to the equivalent circular diameter of the through holes in the through-hole array is greater than 4. For example, it can be 4.2, 4.4, 4.6, 4.8, 5, 5.2, 5.4, 5.6, 5.8, 6, 6.2, 6.4, 6.6, 6.8, 7, 7.2, 7.4, 7.6, 7.8, or 8, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0043] In this invention, the shape of the substrate, the shape of the boss 1, and the shape of the annular boss 2 can be designed according to the shape of the adsorption membrane. For example, when the adsorption membrane is circular, the shape of the substrate is also circular, or it can be a square larger than the adsorption membrane. The shape of the boss 1 and the shape of the annular boss 2 should be designed to correspond and match the groove of the adsorption membrane.

[0044] In this invention, the dimensions of the boss 1 and the annular boss 2, such as the height, diameter of the boss 1, ring width, inner diameter and outer diameter of the annular boss 2, are designed according to the dimensions of the supported adsorption membrane to ensure that they can be well fitted and assembled with the support fixture.

[0045] Furthermore, the boss 1 in this invention can also be designed as an annular groove when the reference object is changed. In this case, the through hole array is set on the boss 1 between adjacent grooves.

[0046] Specifically, the equivalent circle diameter of the through holes in the through-hole array is 1-1.2% of the equivalent circle diameter of the base, for example, it can be 1%, 1.02%, 1.04%, 1.06%, 1.08%, 1.1%, 1.12%, 1.14%, 1.16%, 1.18%, or 1.2%, etc., but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0047] The lower surface of the substrate is provided with an array of blind holes, which are arranged on a straight line parallel to the center line.

[0048] The blind hole array includes a first blind hole 4.1 and a second blind hole 4.2; the first blind hole 4.1 is disposed at the center of the corresponding projection surface on the upper surface of the boss 1;

[0049] The second blind hole 4.2 is provided on the annular boss 2 on the corresponding projection surface of the upper surface of the annular boss 2.

[0050] Specifically, the depth of the blind holes in the blind hole array is 54-55% of the thickness of the substrate, for example, it can be 54%, 54.1%, 54.2%, 54.3%, 54.4%, 54.5%, 54.6%, 54.7%, 54.8%, 54.9%, or 55%, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0051] Specifically, the equivalent circle diameter of the blind holes in the blind hole array is 1.5-1.6% of the equivalent circle diameter of the base, for example, it can be 1.5%, 1.51%, 1.52%, 1.53%, 1.54%, 1.55%, 1.56%, 1.57%, 1.58%, 1.59%, or 1.6%, etc., but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0052] Specifically, the distance between the center line and the parallel line obtained by perpendicularly projecting the straight line onto the same plane is 3-4% of the diameter of the equivalent circle of the base. For example, it can be 3%, 3.1%, 3.2%, 3.3%, 3.4%, 3.5%, 3.6%, 3.7%, 3.8%, 3.9%, or 4%, etc., but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0053] In this invention, a through-hole array is provided on the center line of the substrate, and a blind hole array is provided on a straight line parallel to the center line, meaning that the through holes in the through-hole array are located on the same center line, and the blind holes in the blind hole array are located on the same straight line.

[0054] In this invention, the shape of the through holes and blind holes can be round or polygonal, and the polygonal holes can be square, pentagonal, etc.

[0055] In this invention, the blind hole serves to support the positioning and fixing of the clamp during use, so as to facilitate the installation of the clamp.

[0056] Furthermore, in order to illustrate the excellent effect of the support fixture for adsorption membrane deposition coating provided by the present invention, the present invention also provides a method for preparing an adsorption membrane surface coating, specifically including assembling the adsorption membrane with the aforementioned support fixture for adsorption membrane deposition coating, and then performing chemical vapor deposition to obtain an adsorption membrane with a coating.

[0057] The material evaporation temperature for chemical vapor deposition is 150-180℃, for example, it can be 150℃, 152℃, 154℃, 156℃, 158℃, 160℃, 162℃, 164℃, 166℃, 168℃, 170℃, 172℃, 174℃, 176℃, 178℃ or 180℃, etc., but is not limited to the listed values, and other unlisted values ​​within this range are also applicable.

[0058] The pyrolysis temperature in the chemical vapor deposition is 650-750℃, for example, it can be 650℃, 660℃, 670℃, 680℃, 690℃, 700℃, 710℃, 720℃, 730℃, 740℃ or 750℃, but is not limited to the listed values. Other unlisted values ​​within this range are also applicable.

[0059] Wherein, the absolute vacuum degree during deposition in the chemical vapor deposition is ≤4.0×10⁻⁶. -2 torr, for example, could be 4.0 × 10 -2 torr, 3.5×10 -2 torr, 3×10 -2 torr, 2.5×10 -2 torr, 2×10 -2 torr, 1.5×10 -2 torr, 1×10 -2 torr, 9×10 -3 torr, 5×10 -3 torr or 1×10 -3The values ​​torr, etc., but not limited to those listed, also apply to other unlisted values ​​within this range.

[0060] Wherein, the film deposition rate in the chemical vapor deposition is For example, it could be or The same applies to, but not limited to, the listed values; other unlisted values ​​within this range also apply.

[0061] Specifically, the adsorption membrane can be cleaned before assembly to remove impurities and other substances that affect the coating from the surface of the adsorption membrane. The cleaning process can be carried out by using alcohol reagents, followed by drying at 50-70°C for 50-70 minutes, or other cleaning methods in the art, such as plasma treatment of the adsorption membrane, can be used.

[0062] Furthermore, during the coating deposition preparation stage, the temperature of the hopper door can be controlled at 180-200℃ to prevent the film material powder from sticking to the hopper door. For example, the deposition film material used in this invention is parylene, but it can also be replaced with other film materials. In this case, the temperature during the deposition process can be determined based on the physicochemical properties of the film material.

[0063] To further illustrate the advantages of the fixture and preparation method provided by the present invention, the following specific embodiments are provided:

[0064] Example 1

[0065] This embodiment provides a support fixture for adsorption membrane deposition coating. The support fixture for adsorption membrane deposition coating includes: a substrate, a boss 1 that matches the adsorption membrane and is disposed on the upper surface of the substrate, and an annular boss 2 that surrounds the boss 1.

[0066] An array of through holes is provided along the center line of the substrate, including a first through hole 3.1 and a first through hole 3.2;

[0067] The first through hole 3.1 is located at the center of the boss 1, and the first through hole 3.2 is located on the annular boss 2;

[0068] The lower surface of the substrate is provided with an array of blind holes, which are arranged on a straight line parallel to the center line;

[0069] The blind hole array includes a first blind hole 4.1 and a second blind hole 4.2; the first blind hole 4.1 is disposed at the center of the corresponding projection surface on the upper surface of the boss 1;

[0070] The second blind hole 4.2 is provided on the annular boss 2 on the corresponding projection surface of the upper surface of the annular boss 2;

[0071] In this configuration, both through holes and blind holes are circular holes. The diameter of the through holes in the through hole array is 1.1% of the diameter of the base material. The depth of the blind holes in the blind hole array is 54.5% of the thickness of the base material. The diameter of the blind holes in the blind hole array is 1.55% of the diameter of the base material. The distance between the parallel lines obtained by perpendicularly projecting the center line and the straight line onto the same plane is 3.5% of the equivalent circular diameter of the base material. The ratio of the thickness of the base material to the equivalent circular diameter of the through holes in the through hole array is 7.

[0072] Example 2

[0073] This embodiment provides a support fixture for adsorption membrane deposition coating. The support fixture for adsorption membrane deposition coating includes: a substrate, a boss 1 that matches the adsorption membrane and is disposed on the upper surface of the substrate, and an annular boss 2 that surrounds the boss 1.

[0074] An array of through holes is provided along the center line of the substrate, including a first through hole 3.1 and a first through hole 3.2;

[0075] The first through hole 3.1 is located at the center of the boss 1, and the first through hole 3.2 is located on the annular boss 2;

[0076] The lower surface of the substrate is provided with an array of blind holes, which are arranged on a straight line parallel to the center line;

[0077] The blind hole array includes a first blind hole 4.1 and a second blind hole 4.2; the first blind hole 4.1 is disposed at the center of the corresponding projection surface on the upper surface of the boss 1;

[0078] The second blind hole 4.2 is provided on the annular boss 2 on the corresponding projection surface of the upper surface of the annular boss 2;

[0079] In this configuration, both through holes and blind holes are circular holes. The equivalent circular diameter of the through holes in the through hole array is 1% of the circular diameter of the base material. The depth of the blind holes in the blind hole array is 55% of the thickness of the base material. The circular diameter of the blind holes in the blind hole array is 1.6% of the circular diameter of the base material. The distance between the parallel lines obtained by perpendicularly projecting the center line and the straight line onto the same plane is 4% of the equivalent circular diameter of the base material. The ratio of the thickness of the base material to the equivalent circular diameter of the through holes in the through hole array is 8.3.

[0080] Example 3

[0081] This embodiment provides a support fixture for adsorption membrane deposition coating. The support fixture for adsorption membrane deposition coating includes: a substrate, a boss 1 that matches the adsorption membrane and is disposed on the upper surface of the substrate, and an annular boss 2 that surrounds the boss 1.

[0082] An array of through holes is provided along the center line of the substrate, including a first through hole 3.1 and a first through hole 3.2;

[0083] The first through hole 3.1 is located at the center of the boss 1, and the first through hole 3.2 is located on the annular boss 2;

[0084] The lower surface of the substrate is provided with an array of blind holes, which are arranged on a straight line parallel to the center line;

[0085] The blind hole array includes a first blind hole 4.1 and a second blind hole 4.2; the first blind hole 4.1 is disposed at the center of the corresponding projection surface on the upper surface of the boss 1;

[0086] The second blind hole 4.2 is provided on the annular boss 2 on the corresponding projection surface of the upper surface of the annular boss 2;

[0087] In this configuration, both through holes and blind holes are circular holes. The equivalent circular diameter of the through holes in the through hole array is 1.2% of the circular diameter of the base material. The depth of the blind holes in the blind hole array is 54% of the thickness of the base material. The equivalent circular diameter of the blind holes in the blind hole array is 1.5% of the circular diameter of the base material. The distance between the parallel lines obtained by perpendicularly projecting the center line and the straight line onto the same plane is 3% of the circular diameter of the base material. The ratio of the thickness of the base material to the equivalent circular diameter of the through holes in the through hole array is 6.9.

[0088] Application Example 1

[0089] This application example provides a method for preparing a coating on the surface of an adsorption membrane. Specifically, the support fixture provided in Example 1 is used as the fixture for coating. The method includes: assembling the adsorption membrane and the coating of the adsorption membrane with the support fixture, and then performing chemical vapor deposition to obtain an adsorption membrane with a coating.

[0090] The material evaporation temperature for the chemical vapor deposition is 165°C;

[0091] The pyrolysis temperature in the chemical vapor deposition is 700℃;

[0092] The absolute vacuum during chemical vapor deposition is 3.0 × 10⁻⁶. -2 torr;

[0093] The film deposition rate in the chemical vapor deposition is as follows:

[0094] Application Example 2

[0095] This application example provides a method for preparing a coating on the surface of an adsorption membrane. Specifically, the support fixture provided in Example 2 is used as the fixture for coating. The method includes: assembling the adsorption membrane and the coating of the adsorption membrane with the support fixture, and then performing chemical vapor deposition to obtain an adsorption membrane with a coating.

[0096] The material evaporation temperature for the chemical vapor deposition is 150°C;

[0097] The pyrolysis temperature in the chemical vapor deposition is 750°C;

[0098] The absolute vacuum during chemical vapor deposition is 2.0 × 10⁻⁶. -2 torr;

[0099] The film deposition rate in the chemical vapor deposition is

[0100] Application Example 3

[0101] This application example provides a method for preparing a coating on the surface of an adsorption membrane. Specifically, the support fixture provided in Example 3 is used as the fixture for coating. The method includes: assembling the adsorption membrane and the coating of the adsorption membrane with the support fixture, and then performing chemical vapor deposition to obtain an adsorption membrane with a coating.

[0102] The material evaporation temperature for the chemical vapor deposition is 180°C;

[0103] The pyrolysis temperature in the chemical vapor deposition is 650°C;

[0104] The absolute vacuum during chemical vapor deposition is 4.0 × 10⁻⁶. -3 torr;

[0105] The film deposition rate in the chemical vapor deposition is

[0106] Application Example 4

[0107] The only difference from Application Example 1 is that the fixture does not have a through-hole array.

[0108] Application Example 5

[0109] The only difference from Application Example 1 is that the blind holes in the blind hole array are replaced with through holes of the same diameter.

[0110] Application Example 6

[0111] The only difference from Application Example 1 is that the through holes in the through-hole array are replaced with blind holes of the same diameter, and the depth of the blind holes is the same as the depth of the blind holes in the blind hole array.

[0112] Application Example 7

[0113] The only difference from Application Example 1 is that no first through hole is provided in the through hole array, that is, no through hole is provided in the center of the boss.

[0114] Application Example 8

[0115] The only difference from Application Example 1 is the replacement of the diameter of the through hole and the diameter of the blind hole. That is, the diameter of the through hole is 1.55% of the diameter of the base circle, and the diameter of the blind hole is 1.1% of the diameter of the base circle.

[0116] In the preparation process of Application Examples 1-8 above, the film material used is parylene. The state of the back film after deposition is detailed in Table 1. The corresponding back film includes a groove with a diameter of 66.5 mm and a depth of 4 mm, and a first annular groove, a second annular groove, and a third annular groove surrounding the groove. The depth of each annular groove is 4 mm, and the radial widths are 12 mm, 15.5 mm, and 11 mm respectively, with inner diameters of 95 mm, 149 mm, and 210 mm respectively. The corresponding bosses in the support fixture can then be matched accordingly. At this point, the diameter of the substrate is 254 mm, the thickness of the substrate is 21 mm, and the height of both the boss and the annular boss is 4 mm.

[0117] Table 1

[0118] Does it have wrinkles? membrane adhesion rate Application Example 1 none 100％ Application Example 2 none 100％ Application Example 3 none 100％ Application Example 4 have 82.5％ Application Example 5 have 84.5％ Application Example 6 have 86.4％ Application Example 7 have 95.1％ Application Example 8 have 89.4％

[0119] In this invention, a wrinkled film refers to a deposited film layer that does not contact the adsorption membrane substrate, meaning that there are voids in some areas after the coating is applied, or that the film layer and the adsorption membrane substrate are not bonded together in some regions. The film bonding rate in this invention is the ratio of the area of ​​the film layer bonded to the adsorption membrane to the total area of ​​the film layer. When the film bonding rate is 100%, it indicates that the film layer and the substrate are completely bonded; when it is less than 100%, the film layer and the substrate are not bonded in some areas.

[0120] In summary, the support fixture provided by the present invention, through its design, avoids the problem of wrinkled film during coating of the adsorption membrane, which is beneficial to improving the bonding effect between the film layer and the substrate, thereby extending the service life of the adsorption membrane.

[0121] The present invention is described in detail through the above embodiments, but the present invention is not limited to the above detailed structural features, that is, it does not mean that the present invention must rely on the above detailed structural features to be implemented. Those skilled in the art should understand that any improvements to the present invention, equivalent substitutions for the components used in the present invention, additions of auxiliary components, and selection of specific methods, etc., all fall within the protection scope and disclosure scope of the present invention.

[0122] The preferred embodiments of the present invention have been described in detail above. However, the present invention is not limited to the specific details in the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0123] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0124] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

Claims

1. A support fixture for adsorption film deposition coating, characterized in that, The support fixture for adsorption film deposition coating includes: a substrate, a boss and an annular boss disposed on the upper surface of the substrate; the annular boss is disposed around the boss, and the whole formed by the boss and the annular boss matches the groove of the adsorption film. An array of through holes, including a first through hole and a second through hole, is provided on the center line of the substrate; The first through hole is located at the center of the boss, and the second through hole is located on the annular boss; The ratio of the thickness of the substrate to the equivalent circle diameter of the through holes in the through-hole array is >4; the equivalent circle diameter of the through holes in the through-hole array is 1-1.2% of the equivalent circle diameter of the substrate.

2. The support fixture for adsorption film deposition coating as described in claim 1, characterized in that, The lower surface of the substrate is provided with an array of blind holes, which are arranged on a straight line parallel to the center line; The blind hole array includes a first blind hole and a second blind hole; the first blind hole is disposed on the corresponding projection surface of the upper surface of the boss; The second blind hole is disposed on the corresponding projection surface of the upper surface of the annular boss.

3. The support fixture for adsorption film deposition coating as described in claim 2, characterized in that, The depth of the blind holes in the blind hole array is 54-55% of the thickness of the substrate.

4. The support fixture for adsorption film deposition coating as described in claim 2, characterized in that, The equivalent circle diameter of the blind holes in the blind hole array is 1.5-1.6% of the equivalent circle diameter of the base.

5. The support fixture for adsorption film deposition coating as described in claim 2, characterized in that, The distance between the parallel lines obtained by perpendicularly projecting the center line and the straight line onto the same plane is 3-4 times the diameter of the equivalent circle of the base.

6. A method for preparing a coating on the surface of an adsorption membrane, characterized in that, The preparation method includes: assembling the adsorption membrane with the adsorption membrane deposition coating according to any one of claims 1-5 using a support fixture, and then performing chemical vapor deposition to obtain an adsorption membrane with a coating.

7. The preparation method according to claim 6, characterized in that, The material evaporation temperature for the chemical vapor deposition is 150-180℃.

8. The preparation method according to claim 6, characterized in that, The pyrolysis temperature in the chemical vapor deposition is 650-750℃.

9. The preparation method according to claim 6, characterized in that, The absolute vacuum degree during chemical vapor deposition is ≤4.0×10⁻⁶. -2 torr.

10. The preparation method according to claim 6, characterized in that, The deposition rate of the film in the chemical vapor deposition is 1-10 Å / s.

11. The preparation method according to claim 6, characterized in that, The preparation method includes: assembling the adsorption membrane with the adsorption membrane coating according to any one of claims 1-5 using a support fixture, and then performing chemical vapor deposition to obtain an adsorption membrane with a coating. The material evaporation temperature for the chemical vapor deposition is 150-180℃; The pyrolysis temperature in the chemical vapor deposition is 650-750℃; The absolute vacuum degree during chemical vapor deposition is ≤4.0×10⁻⁶. -2 torr; The deposition rate of the film in the chemical vapor deposition is 1-10 Å / s.

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