A method for purifying fluorine-containing silicon dioxide co-produced with sodium fluoride
By controlling process parameters through water immersion, hydrofluoric acid treatment, and alkaline reaction steps, the problem of removing sodium silicate impurities in sodium fluoride purification was solved, enabling the preparation of high-purity sodium fluoride, simplifying the process and reducing costs.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- GUIZHOU WENGFU LANTIAN FLUORCHEM CO LTD
- Filing Date
- 2023-09-14
- Publication Date
- 2026-07-03
AI Technical Summary
In existing technologies, sodium fluoride purification processes suffer from several problems, including the inability to effectively remove sodium silicate impurities, resulting in low purity; the accumulation of potassium salts in the mother liquor circulation, affecting yield; harsh process conditions; and high production costs.
The process involves water immersion, hydrofluoric acid treatment, filtration, alkaline reaction, and drying. By controlling process parameters such as temperature and chemical concentration, high-modulus sodium silicate is converted into silicon dioxide using hydrofluoric acid. The silicon dioxide is then treated with NaOH solution to generate water-soluble low-modulus sodium silicate. Finally, high-purity sodium fluoride is obtained through drying.
This method achieves efficient removal of sodium silicate and silicon dioxide impurities, improves the purity of sodium fluoride, simplifies the process, reduces production costs, and increases yield.
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