A method for preparing a high peel strength bottom antireflective coating resin

Abstract

The application provides a high-peeling-strength bottom anti-reflective coating resin, which comprises a structural formula shown in chemical formula (1); wherein the structure represented by R1 in formula (1) is one or more of trimethylsilyl, dimethylsilyl, tert-butyl dimethylsilyl, trimethylsiloxy and tert-butyl dimethylsiloxy; and the weight average molecular weight is 20,000-100,000, and the PDI is less than or equal to 2.0. The resin is prepared by carrying out multivariate copolymerization of a silicon-containing monomer, glycidyl methacrylate and 9-methyl anthracene acrylate, and has high heat resistance and high peeling strength, and can be applied to a bottom anti-reflective coating in the field of semiconductor manufacturing.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of base resins for semiconductors, in particular to a preparation method for preparing a bottom anti-reflective coating resin. BACKGROUND

[0002] With the rapid application of deep ultraviolet exposure and extreme ultraviolet exposure technology, the development of miniaturization and integration of semiconductor devices is promoted, and the development of related materials such as KrF photoresist, ArF photoresist and anti-reflective coating resins is also promoted. However, in the application of low radiation wavelength exposure technology, a series of problems have also appeared, such as the reflection of silicon substrate to ultraviolet light exposure forming a significant standing wave effect inside the photoresist, resulting in a wavy sawtooth pattern of the photoresist line groove, thereby causing the photoresist line groove to appear broken, detached, distorted and other problems.

[0003] At present, anti-reflective coatings are divided into inorganic anti-reflective coatings and organic anti-reflective coatings. Inorganic anti-reflective coatings are used by optimizing reflectivity, have excellent shape retention, but are not easy to remove in subsequent processes, and are prone to Footing aggregation. Organic anti-reflective coatings do not require vacuum evaporation, chemical vapor deposition, sputtering and other equipment, can reduce the chip manufacturing process, and have adjustable refractive index, excellent light absorption, and have been widely used in the manufacturing process of semiconductor materials.

[0004] However, with the improvement of chip manufacturing process, higher requirements are put forward for chip yield and manufacturing cycle. The existing bottom anti-reflective coating is prone to problems such as insufficient peeling strength and insufficient heat resistance during use, which seriously affects the improvement of chip yield and restricts the reduction of chip manufacturing cost.

[0005] A bottom anti-reflective coating composition used in cooperation with a photoresist and a photoresist relief image forming method are disclosed in patent CN113621278A. By adjusting the proportions of styrene, acrylic ester, chloroacryl, and other components, the resin curing film shrinkage rate and thickness change rate are reduced, and the stability of the attached photoresist lines is improved. However, due to the use of chloroacryl monomers, which contain chlorine atoms, chlorine ions generated during the ultraviolet exposure and development process easily diffuse to the photoresist layer and the substrate layer, generating corresponding acids, which seriously affect the stability of the photoresist. Patent CN116589921A discloses a silicon-rich anti-reflective coating resin material and its preparation method. By copolymerizing cyclosiloxane and siloxane-containing crosslinking groups, the optical parameters of the resin are controlled, and the prepared resin meets the corresponding optical performance indicators. However, the prepared resin has a small molecular weight and poor heat resistance, and is prone to drift and collapse during post-baking, affecting the improvement of chip manufacturing yield. Patent CN115725216A discloses a bottom anti-reflective coating composition and its use. By adjusting the proportions of acrylic anthracene ester, glycidyl acrylate, and methyl acrylate, the prepared resin meets the optical performance indicators. However, since the main chain is acrylic ester, it is rigid and brittle, and it is prone to anti-etching layer fracture and delamination during multiple exposure processes. SUMMARY

[0006] Technical problem to be solved: The purpose of the present application is to provide a high peel strength bottom anti-reflective coating resin and its preparation method. Based on 9-methacrylic anthracene ester and glycidyl methacrylate, silicon-containing monomers are introduced for copolymerization to prepare a bottom anti-reflective coating resin with high heat resistance and high peel strength, which can be applied in the field of semiconductor manufacturing.

[0007] Technical solution: A high peel strength bottom anti-reflective coating resin, the resin has the structure shown in formula (1):

[0008]

[0009] wherein the structure represented by R1 in formula (1) is one or more of trimethylsilyl, dimethylsilyl, tert-butyldimethylsilyl, trimethylsiloxy, and tert-butyldimethylsiloxy;

[0010] The weight average molecular weight is 2000-100,000, and the PDI is ≤2.0.

[0011] Preferably, the resin is polymerized from the following three monomers:

[0012] Monomer x of the compound with R1 group structure: one or more of 4-trimethylsilyl styrene, 4-dimethylsilyl styrene, 4-tert-butyldimethylsilyl styrene, 4-trimethylsilyloxy styrene, 4-tert-butyldimethylsilyloxy styrene; mainly to improve the adhesion of the bottom antireflection coating to the silicon substrate, and too small a proportion will result in insufficient or too low adhesion;

[0013] Monomer y of the structure: glycidyl methacrylate; the purpose is to provide certain crosslinking properties and improve the rigidity of the resin matrix, and too small a proportion will result in too low crosslinking degree, which is difficult to guarantee the necessary support degree, and too high a proportion will result in too large brittleness of the resin matrix, which is prone to cracks after curing;

[0014] Monomer z of the structure: 9-methacryl anthracene; the purpose is to provide certain light absorbance, especially obvious absorption effect in deep ultraviolet and extreme ultraviolet, which can greatly reduce the reflection energy of incident light, thereby eliminating the influence of standing wave effect on photoresist lines. Preferably, the total mole proportion of monomer x of the structure in the resin is ≥50%, the total mole proportion of monomer y of the structure is 10%-30%, and the total mole proportion of monomer z of the structure is ≤40%.

[0015] The preparation method of the above-mentioned high-peeling-strength bottom antireflection coating resin comprises the following steps:

[0016] S1. Dry the dissolving kettle, replace nitrogen, then add solvent and initiator, stir and dissolve to obtain an initiator solution, the dissolving temperature is controlled below 30°C, and the solvent is 5wt%-30wt% of the total solvent mass of the reaction;

[0017] S2. Dry the reaction kettle, replace nitrogen, then add solvent and monomer, and stir to obtain a reaction monomer mixed solution;

[0018] S3. Start the heating circulating pump to heat the reaction kettle, after the temperature reaches, transfer the initiator solution in the dissolving kettle to the reaction kettle, the transfer time is controlled within 20 min, start the reaction, since the boiling point of methanol is low, a cooling reflux device can be used to avoid solvent volatilization and reduction, and the reaction time is within 24 h;

[0019] S4. After the reaction is completed, start the refrigeration circulating pump to reduce the temperature to below 20°C to stop the reaction and obtain a resin solution. Preferably, the solvent is one or more of methanol, ethanol, isopropyl alcohol, propylene glycol methyl ether, propylene glycol methyl ether acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl lactate, γ-butyrolactone, N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl pyrrolidone.

[0020] Preferably, the initiator is one or more of azobisisobutyronitrile, azobisisoheptyl nitrile, dimethyl azobisisobutyrate, azobisisopropylimidazoline hydrochloride, benzoyl peroxide, lauroyl peroxide, t-butyl peroxybenzoate, t-butyl peroxy-tert-amylate, diisopropyl peroxydicarbonate, dicyclohexyl peroxydicarbonate, and the amount of the initiator is 0.1wt%-15wt% of the total weight of all monomers.

[0021] Preferably, the reaction monomers account for 10wt%-70wt% of the total weight of the monomers and the solvent.

[0022] Preferably, the reaction temperature is 50℃-120℃, and the reaction time is 2h-24h.

[0023] Preferably, the 180 degree peeling strength of the resin is ≥1.8N / mm, and the T5% thermal decomposition temperature is ≥340℃.

[0024] Beneficial effects: the preparation method has the following advantages:

[0025] 1. The present application introduces a silicon-containing monomer for copolymerization on the basis of 9-methyl anthracene methacrylate and glycidyl methacrylate, to prepare a bottom anti-reflective coating resin. Since the silicon-containing monomer has a benzene ring and a silicon-oxygen side chain, the heat resistance of the base resin can be improved, and high-temperature gas overflow can be inhibited.

[0026] 2. The resin structure of the present application has a silicon side group similar to the silicon layer of the substrate, which can fully increase the adhesion of the anti-reflective coating to the substrate after high-temperature curing, avoid problems such as line groove peeling, slipping, and twisting during subsequent multiple exposure and development processes, and improve the stability of the anti-reflective coating after exposure and the line groove of the attached photoresist, and the product yield in the semiconductor manufacturing process. DETAILED DESCRIPTION

[0027] The present application will be further described below in conjunction with examples, which are an explanation of the present application, and the present application is not limited to the following examples:

[0028] Example 1

[0029] The preparation method of the high-peeling-strength bottom anti-reflective coating resin comprises the following steps:

[0030] S1. After purging nitrogen three times in a dry dissolving kettle, 16.4g of azobisisobutyronitrile and 48.4g of methanol were added and stirred to dissolve, and nitrogen protection was performed to obtain an initiator solution;

[0031] S2. After purging nitrogen into the dried reaction kettle and replacing nitrogen three times, 88.2 g of 4-trimethylsilyl styrene, 14.2 g of glycidyl methacrylate, 104.9 g of 9-methacryl anthracene, 435.3 g of methanol were added, stirred uniformly to obtain a reaction monomer mixed solution;

[0032] S3. Start the heating circulating pump, heat the reaction kettle, and after the temperature reaches 70°C, transfer the initiator solution in the dissolving kettle to the reaction kettle, the transfer time is 10 min, start the reaction after adding, and use the cooling reflux device;

[0033] S4. After 15 h of reaction, start the refrigeration circulating pump, and reduce the temperature to below 20°C to stop the reaction to obtain a resin solution. Take 50 g of the resin solution to precipitate in 300 g of methanol, take 1 g of the sample to test GPC, and then put the precipitated solid into a 70°C vacuum oven to dry for 12 h, and test the thermal decomposition temperature and peeling performance of the solid.

[0034] Example 2

[0035] The preparation method of the high-peeling-strength bottom anti-reflective coating resin comprises the following steps:

[0036] S1. After purging nitrogen into the dried dissolving kettle and replacing nitrogen three times, 16.4 g of azobisisobutyronitrile and 44.6 g of methanol were added and stirred to dissolve, and nitrogen protection was obtained to obtain an initiator solution;

[0037] S2. After purging nitrogen into the dried reaction kettle and replacing nitrogen three times, 96.2 g of 4-trimethylsilyl styrene, 42.6 g of glycidyl methacrylate, 52.5 g of 9-methacryl anthracene, and 401.7 g of methanol were added and stirred uniformly to obtain a reaction monomer mixed solution;

[0038] S3. Start the heating circulating pump, heat the reaction kettle, and after the temperature reaches 70°C, transfer the initiator solution in the dissolving kettle to the reaction kettle, the transfer time is 10 min, start the reaction after adding, and use the cooling reflux device;

[0039] S4. After 15 h of reaction, start the refrigeration circulating pump, and reduce the temperature to below 20°C to stop the reaction to obtain a resin solution. Take 50 g of the resin solution to precipitate in 300 g of methanol, take 1 g of the sample to test GPC, and then put the precipitated solid into a 70°C vacuum oven to dry for 12 h, and test the thermal decomposition temperature and peeling performance of the solid.

[0040] Example 3

[0041] The preparation method of the high-peeling-strength bottom anti-reflective coating resin comprises the following steps:

[0042] S1. After nitrogen is introduced into the dried dissolving kettle and replaced three times, 16.4 g of azobisisobutyronitrile, 47.4 g of methanol are added, stirred and dissolved, and nitrogen protection is introduced, to obtain an initiator solution;

[0043] S2. After nitrogen is introduced into the dried reaction kettle and replaced three times, 96.2 g of 4-trimethylsilylstyrene, 28.4 g of glycidyl methacrylate, 78.7 g of 9-methacryl anthracene, 426.9 g of methanol are added and stirred uniformly, to obtain a reaction monomer mixed solution;

[0044] S3. The heating circulating pump is started, the reaction kettle is warmed, after the temperature reaches 70℃, the initiator solution in the dissolving kettle is transferred into the reaction kettle, the transfer time is 10 min, after addition, the reaction is started, and a cooling reflux device is configured for use;

[0045] S4. After reaction for 15 h, the refrigeration circulating pump is started, the temperature is lowered to below 20℃, the reaction is stopped, and a resin solution is obtained. 50 g of the resin solution is precipitated in 300 g of methanol, 1 g of a sample is taken for GPC testing, then the precipitated solid is placed in a 70℃ vacuum oven for drying for 12 h, and the thermal decomposition temperature and peeling performance of the solid are tested.

[0046] Example 4

[0047] A preparation method of a high-peeling-strength bottom anti-reflective coating resin, comprising the following steps:

[0048] S1. After nitrogen is introduced into the dried dissolving kettle and replaced three times, 16.4 g of azobisisobutyronitrile, 47.4 g of methanol are added, stirred and dissolved, and nitrogen protection is introduced, to obtain an initiator solution;

[0049] S2. After nitrogen is introduced into the dried reaction kettle and replaced three times, 96.2 g of 4-trimethylsilylstyrene, 28.4 g of glycidyl methacrylate, 78.7 g of 9-methacryl anthracene, 426.9 g of methanol are added and stirred uniformly, to obtain a reaction monomer mixed solution;

[0050] S3. The heating circulating pump is started, the reaction kettle is warmed, after the temperature reaches 70℃, the initiator solution in the dissolving kettle is transferred into the reaction kettle, the transfer time is 10 min, after addition, the reaction is started, and a cooling reflux device is configured for use;

[0051] S4. After reaction for 15 h, the refrigeration circulating pump is started, the temperature is lowered to below 20℃, the reaction is stopped, and a resin solution is obtained. 50 g of the resin solution is precipitated in 300 g of methanol, 1 g of a sample is taken for GPC testing, then the precipitated solid is placed in a 70℃ vacuum oven for drying for 12 h, and the thermal decomposition temperature and peeling performance of the solid are tested.

[0052] Example 5

[0053] A preparation method of a high peel strength bottom anti-reflective coating resin, comprising the following steps:

[0054] S1. After introducing nitrogen into a dried dissolution kettle and replacing nitrogen three times, 16.4 g of azobisisobutyronitrile and 48.6 g of methanol were added, stirred and dissolved, and nitrogen protection was performed to obtain an initiator solution;

[0055] S2. After introducing nitrogen into a dried reaction kettle and replacing nitrogen three times, 115.3 g of 4-trimethylsilylstyrene, 14.2 g of glycidyl methacrylate, 78.7 g of 9-methacrylate anthracene, and 437.2 g of methanol were added and stirred uniformly to obtain a reaction monomer mixed solution;

[0056] S3. The heating circulating pump was started, the reaction kettle was warmed up, and after the temperature reached 70°C, the initiator solution in the dissolution kettle was transferred into the reaction kettle, the transfer time was 10 min, the reaction was started after addition, and a cooling reflux device was configured for use;

[0057] S4. After 15 h of reaction, the refrigeration circulating pump was started, the temperature was lowered to below 20°C, and the reaction was stopped to obtain a resin solution. 50 g of the resin solution was precipitated in 300 g of methanol, 1 g of the sample was tested by GPC, and then the precipitated solid was placed in a 70°C vacuum oven for drying for 12 h, and the thermal decomposition temperature and peel performance of the solid were tested.

[0058] Example 6

[0059] A preparation method of a high peel strength bottom anti-reflective coating resin, comprising the following steps:

[0060] S1. After introducing nitrogen into a dried dissolution kettle and replacing nitrogen three times, 16.4 g of azobisisobutyronitrile and 48.6 g of methanol were added, stirred and dissolved, and nitrogen protection was performed to obtain an initiator solution;

[0061] S2. After introducing nitrogen into a dried reaction kettle and replacing nitrogen three times, 115.3 g of 4-trimethylsilylstyrene, 14.2 g of glycidyl methacrylate, 78.7 g of 9-methacrylate anthracene, and 437.2 g of methanol were added and stirred uniformly to obtain a reaction monomer mixed solution;

[0062] S3. The heating circulating pump was started, the reaction kettle was warmed up, and after the temperature reached 70°C, the initiator solution in the dissolution kettle was transferred into the reaction kettle, the transfer time was 10 min, the reaction was started after addition, and a cooling reflux device was configured for use;

[0063] S4. After 15h of reaction, open the refrigeration circulating pump, reduce the temperature to below 20℃, stop the reaction, and obtain a resin solution. Take 50g of the resin solution and precipitate in 300g of methanol, take 1g of sample to test GPC, then put the precipitated solid into a 70℃ vacuum oven to dry for 12h, and test the thermal decomposition temperature and peeling performance of the solid.

[0064] Comparative Example 1

[0065] A method for preparing a high-peeling-strength bottom anti-reflective coating resin, comprising the following steps:

[0066] S1. After introducing nitrogen into a dried dissolution kettle and replacing the nitrogen three times, 16.4g of azobisisobutyronitrile and 39.9g of methanol are added, stirred and dissolved, and nitrogen protection is introduced, to obtain an initiator solution;

[0067] S2. After introducing nitrogen into a dried reaction kettle and replacing the nitrogen three times, 52.1g of styrene, 14.2g of glycidyl methacrylate, 104.9g of 9-methacrylate anthracene, and 359.5g of methanol are added and stirred uniformly, to obtain a reaction monomer mixed solution;

[0068] S3. The heating circulating pump is started, the reaction kettle is heated, and after the temperature reaches 70℃, the initiator solution in the dissolution kettle is transferred to the reaction kettle, the transfer time is 10min, the reaction is started after addition, and a cooling reflux device is configured for use;

[0069] S4. After 15h of reaction, the refrigeration circulating pump is started, the temperature is reduced to below 20℃, the reaction is stopped, and a resin solution is obtained. Take 50g of the resin solution and precipitate in 300g of methanol, take 1g of sample to test GPC, then put the precipitated solid into a 70℃ vacuum oven to dry for 12h, and test the thermal decomposition temperature and peeling performance of the solid.

[0070] Comparative Example 2

[0071] A method for preparing a high-peeling-strength bottom anti-reflective coating resin, comprising the following steps:

[0072] S1. After introducing nitrogen into a dried dissolution kettle and replacing the nitrogen three times, 16.4g of azobisisobutyronitrile and 39.9g of methanol are added, stirred and dissolved, and nitrogen protection is introduced, to obtain an initiator solution;

[0073] S2. After introducing nitrogen into a dried reaction kettle and replacing the nitrogen three times, 96.2g of 4-trimethylsilyl styrene, 131.2g of 9-methacrylate anthracene, and 477.5g of methanol are added and stirred uniformly, to obtain a reaction monomer mixed solution;

[0074] S3. Start the heating circulating pump, and heat the reactor. When the temperature reaches 70°C, transfer the initiator solution in the dissolving reactor to the reactor, and transfer for 10 minutes. Start the reaction after adding the initiator solution, and use the cooling reflux device.

[0075] S4. After 15 hours of reaction, start the refrigeration circulating pump, and cool the temperature to below 20°C. Stop the reaction, and obtain the resin solution. Take 50 g of the resin solution, precipitate in 300 g of methanol, take 1 g of the sample to test the GPC, and then put the precipitated solid in a 70°C vacuum oven to dry for 12 hours. Test the thermal decomposition temperature and the peeling performance of the solid.

[0076] Comparative Example 3

[0077] The preparation method of the high-peeling-strength bottom anti-reflective coating resin comprises the following steps:

[0078] S1. After introducing nitrogen into the dried dissolving reactor and replacing the nitrogen three times, add 16.4 g of azobisisobutyronitrile and 52.1 g of methanol, stir and dissolve, and introduce nitrogen protection to obtain an initiator solution.

[0079] S2. After introducing nitrogen into the dried reactor and replacing the nitrogen three times, add 76.9 g of 4-trimethylsilylstyrene, 14.2 g of glycidyl methacrylate, 132.2 g of 9-methacrylate anthracene, and 468.9 g of methanol, and stir to obtain a reaction monomer mixed solution.

[0080] S3. Start the heating circulating pump, and heat the reactor. When the temperature reaches 70°C, transfer the initiator solution in the dissolving reactor to the reactor, and transfer for 10 minutes. Start the reaction after adding the initiator solution, and use the cooling reflux device.

[0081] S4. After 15 hours of reaction, start the refrigeration circulating pump, and cool the temperature to below 20°C. Stop the reaction, and obtain the resin solution. Take 50 g of the resin solution, precipitate in 300 g of methanol, take 1 g of the sample to test the GPC, and then put the precipitated solid in a 70°C vacuum oven to dry for 12 hours. Test the thermal decomposition temperature and the peeling performance of the solid.

[0082] Comparative Example 4

[0083] The preparation method of the high-peeling-strength bottom anti-reflective coating resin comprises the following steps:

[0084] S1. After introducing nitrogen into the dried dissolving reactor and replacing the nitrogen three times, add 16.4 g of azobisisobutyronitrile and 41.8 g of methanol, stir and dissolve, and introduce nitrogen protection to obtain an initiator solution.

[0085] S2. After the dry reactor was purged with nitrogen three times, 96.2 g of 4-trimethylsilyloxy styrene, 56.9 g of glycidyl methacrylate, 26.2 g of 9-methacryl anthracene, 376.5 g of methanol were added and stirred to obtain a reaction monomer mixed solution;

[0086] S3. The heating circulating pump was started to heat the reactor. After the temperature reached 70°C, the initiator solution in the dissolving reactor was transferred to the reaction reactor, and the transfer time was 10 min. After the addition, the reaction was started, and a cooling reflux device was configured for use.

[0087] S4. After 15 h of reaction, the refrigeration circulating pump was started to reduce the temperature to below 20°C, and the reaction was stopped to obtain a resin solution. 50 g of the resin solution was precipitated in 300 g of methanol, 1 g of the sample was tested by GPC, and then the precipitated solid was placed in a 70°C vacuum oven for drying for 12 h. The thermal decomposition temperature and peeling performance of the solid were tested.

[0088] Performance test: for the analysis and characterization method of the high peeling strength bottom anti-reflective coating resin, the specific test procedure is as follows: molecular weight test: the weight average molecular weight (Mw) and molecular weight distribution (PDI) of the polymer in this specification are tested by gel permeation chromatography, and the test instrument is Waters 2695 machine table of Waters Company;

[0089] Peeling strength test: the peeling strength test of the resin in this specification is tested by EZ-LX Shimadzu electronic universal testing machine, and the test method is tested according to ASTM D903-98 standard;

[0090] Thermal stability test: the thermal gravimetric analyzer (TGA) model TGA-Q500 was used for testing, and the sample was heated at a rate of 10°C / min from 50-500°C in a nitrogen atmosphere.

[0091] Table 1 is the resin synthesis material table

[0092]

[0093]

[0094] Table 1 is the test results of examples and comparative examples, from example 1, example 4 and comparative example 1, the silicon-based styrene resin has very obvious peeling strength and heat resistance advantage compared with the styrene without silicon group. From example 4, example 5, example 6, with the increase of the proportion of silicon-containing monomer, the peeling strength, heat resistance gradually increases. Mainly the structure of the proportion of silicon-containing monomer is improved, thereby improving the heat resistance and peeling strength of the resin. Comparative example 2, example 3, example 4 and comparative example 2, comparative example 4, with the increase of the proportion of glycidyl methacrylate, the heat resistance is further improved, but the proportion is too low, which cannot provide certain crosslinking characteristics, the heat resistance is insufficient, the proportion is too high, the crosslinking density is too large, the resin is too brittle, which leads to the decrease of the peeling performance. Through the copolymerization of the silicon-containing monomer, glycidyl methacrylate and 9-methyl anthracene acrylate in the application, and adjusting the proportion of different components, the heat resistance can reach above 340 DEG C, the peeling strength is above 1.8 N / mm, which is applied in the bottom anti-reflective coating of semiconductor, can improve the peeling strength and heat resistance of the reflective coating, thereby avoiding the peeling, deformation of photoresist line and inhibiting the gas overflow, which is beneficial to the improvement of the chip yield in the semiconductor manufacturing process.

[0095] Obviously, the above examples are only examples for clearly illustrating, but not limitation of the embodiments. For ordinary skilled in the art, other different forms of changes or variations can be made on the basis of the above description. Here, all the embodiments need not and can not be exhausted. The obvious changes or variations derived therefrom are still within the protection scope of the present application.

Claims

1. A high peel strength bottom antireflective coating resin characterized by, The resin has a structure shown in formula (1): ; In formula (1), R1 represents one or more of trimethylsilyl group, dimethylsilyl group, tert-butyl dimethylsilyl group, trimethylsiloxy group, and tert-butyl dimethylsiloxy group; the weight average molecular weight is 2000-100,000, and the PDI is less than or equal to 2.0; the total mole percentage of the x structure monomer is greater than or equal to 50%, the total mole percentage of the y structure monomer is 10%-30%, and the total mole percentage of the z structure monomer is less than or equal to 40%.

2. The high peel strength bottom antireflective coating resin according to claim 1, wherein The resin is polymerized from the following three monomers: the x structure monomer is one or more of 4-trimethylsilyl styrene, 4-dimethylsilyl styrene, 4-tert-butyl dimethylsilyl styrene, 4-trimethylsiloxy styrene, and 4-tert-butyl dimethylsiloxy styrene; the y structure monomer is glycidyl methacrylate; and the z structure monomer is 9-methacryl anthracene.

3. The method of producing a high peel strength bottom antireflective coating resin according to any one of claims 1 to 2, characterized in that, The method comprises the following steps: S1. drying a dissolving kettle, replacing nitrogen, then adding a solvent and an initiator, stirring and dissolving to obtain an initiator solution; S2. drying a reaction kettle, replacing nitrogen, then adding a solvent and monomers, stirring to obtain a reaction monomer mixed solution; S3. starting a heating circulating pump, heating the reaction kettle, and when the temperature reaches a target temperature, transferring the initiator solution in the dissolving kettle to the reaction kettle to start the reaction; S4. after the reaction is completed, starting a refrigeration circulating pump, reducing the temperature to below 20℃, stopping the reaction, and obtaining a resin solution.

4. The method for preparing the high peel strength bottom anti-reflective coating resin according to claim 3, characterized in that, The solvent is one or more of methanol, ethanol, isopropyl alcohol, propylene glycol methyl ether, propylene glycol methyl ether acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl lactate, gamma-butyrolactone, N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl pyrrolidone.

5. The method for preparing the high peel strength bottom anti-reflective coating resin according to claim 3, characterized in that, The initiator is one or more of azobisdimethyl isobutyl cyanide, azobisdimethyl isohexyl cyanide, azobisdimethyl isobutyl cyanide dimethyl ester, azobisdimethyl isopropyl imidazoline hydrochloride, benzoyl peroxide, lauroyl peroxide, tert-butyl benzoyl peroxide, tert-butyl tert-amyl peroxide, diisopropyl peroxydicarbonate, and dicyclohexyl peroxydicarbonate; the amount of the initiator is 0.1wt%-15wt% of the total weight of the monomers.

6. The method for preparing the high peel strength bottom anti-reflective coating resin according to claim 3, characterized in that, The monomer concentration of the resin is 10wt%-70wt%, the reaction temperature is 50℃-120℃, and the reaction time is 2h-24h.

7. The method for preparing the high peel strength bottom anti-reflective coating resin according to claim 3, characterized in that, The 180 degree peeling strength of the resin is greater than or equal to 1.8N / mm, and the T5% thermal decomposition temperature is greater than or equal to 340℃.

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