A display panel and its manufacturing method

By forming a pixel definition layer on the insulating layer and removing a portion of the insulating layer before printing each sub-emissive functional layer, the color mixing problem of sub-emissive functional layers in OLED display panels is solved, improving display effect and accuracy.

CN117769323BActive Publication Date: 2025-10-31SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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Patent Information

Application Number
CN202311762678.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-12-20
Publication Date
2025-10-31
Estimated Expiration
2043-12-20

AI Technical Summary

Technical Problem

In existing technologies, when OLED display panels are fabricated using printing methods, color mixing issues can easily occur between sub-light-emitting functional layers of different colors, affecting the display effect.

Method used

During the fabrication process, a pixel definition layer is formed on the insulating layer, and the corresponding insulating layer portion is removed before printing each sub-light-emitting functional layer to ensure that each sub-light-emitting functional layer is connected to the first electrode, thus avoiding the risk of color mixing.

Benefits of technology

It effectively reduces the risk of color mixing in different color sub-light-emitting functional layers, and improves the display effect and accuracy of the display panel.

✦ Generated by Eureka AI based on patent content.

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Abstract

This application provides a display panel and its fabrication method, including a substrate, a planarization layer covering the substrate, first electrodes spaced apart on the planarization layer, an insulating layer covering the first electrodes and the planarization layer, a pixel definition layer, and a light-emitting functional layer. The insulating layer includes openings exposing each of the first electrodes, and the pixel definition layer is located on the insulating layer and includes multiple pixel opening regions corresponding to the first electrodes. The light-emitting functional layer includes sub-light-emitting functional layers of different colors, each sub-light-emitting functional layer located within a pixel opening region and connected to the first electrode through an opening in the insulating layer. Therefore, the insulating layer of the corresponding pixel opening region can be removed before sequentially printing the sub-light-emitting functional layers to form the openings of the corresponding pixel opening regions. When printing a sub-light-emitting functional layer in one pixel opening region, the first electrodes in other pixel opening regions are still protected by the insulating layer, thus preventing the risk of color mixing from the previously printed sub-light-emitting functional layers of different colors.
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Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a display panel and a method for manufacturing the same. Background Technology

[0002] As display technology continues to evolve, large size, high resolution, high color saturation, energy saving, high brightness, flexibility, and transparency are gradually becoming the mainstream trends in technological development. Organic light-emitting diode (OLED) displays (including QLED) can ultimately achieve these ultimate performance characteristics.

[0003] Currently, the organic light-emitting layer of OLEDs can be fabricated using methods such as vapor deposition, printing, or Eleap technology. Among these, inkjet printing offers advantages such as high material utilization and low cost.

[0004] However, the printing of organic light-emitting layers is inevitably affected by printing accuracy and product pixel density. Common printing problems include R / G / B color mixing, which leads to abnormal light emission.

[0005] Application content

[0006] The purpose of this application is to provide a display panel and a method for manufacturing the same, which aims to reduce the risk of color mixing during printing of sub-light-emitting functional layers of different colors.

[0007] On one hand, this application provides a display panel, the display panel comprising:

[0008] substrate;

[0009] A planarization layer covers the substrate;

[0010] The first electrode is disposed at intervals on the planarization layer;

[0011] An insulating layer covers the first electrode and the planarization layer, and includes openings exposing each of the first electrodes;

[0012] A pixel definition layer is located on the insulating layer and includes a plurality of pixel opening regions corresponding to the first electrode;

[0013] The light-emitting functional layer includes sub-light-emitting functional layers of different colors, which are located in the pixel opening area and connected to each of the first electrodes through the opening.

[0014] In some embodiments, the orthographic projection of the insulating layer on the substrate coincides with the orthographic projection of the pixel definition layer on the substrate, or;

[0015] The orthographic projection of the pixel definition layer on the substrate is located within the range of the orthographic projection of the insulating layer on the substrate.

[0016] In some embodiments, the thickness of the insulating layer is less than 1 micrometer.

[0017] In some embodiments, the material of the insulating layer is different from the material of the pixel definition layer.

[0018] In some embodiments, the display panel further includes:

[0019] The second electrode covers the pixel definition layer and the light-emitting functional layer.

[0020] On the other hand, this application provides a method for manufacturing a display panel, the method comprising:

[0021] Provide substrate;

[0022] Forming a planar layer covering the substrate;

[0023] A first electrode is formed at intervals on the planarization layer;

[0024] An initial insulating layer is applied to the first electrode and the planarization layer;

[0025] A pixel definition layer is formed on the initial insulating layer, the pixel definition layer including a plurality of pixel opening regions corresponding to the first electrode;

[0026] Remove the initial insulating layer located in the pixel opening area to form an opening that exposes the underlying first electrode;

[0027] A light-emitting functional layer is formed in the pixel opening area. The light-emitting functional layer includes sub-light-emitting functional layers of different colors and is connected to each of the first electrodes through the opening.

[0028] In some embodiments, the pixel opening region includes a first pixel opening region, a second pixel opening region, and a third pixel opening region disposed sequentially adjacent to each other; the step of removing the initial insulating layer located in the pixel opening region and the step of forming a light-emitting functional layer in the pixel opening region include:

[0029] Remove the initial insulating layer located in the first pixel opening area to form an opening that exposes the underlying first electrode, and form a first sub-light-emitting functional layer in the first pixel opening area that connects to the first electrode;

[0030] Remove the initial insulating layer located in the second pixel opening area to form an opening that exposes the underlying first electrode, and form a second sub-light-emitting functional layer in the second pixel opening area that connects to the first electrode;

[0031] Remove the initial insulating layer located in the third pixel opening area to form an opening that exposes the underlying first electrode, and form a third sub-light-emitting functional layer connected to the first electrode in the third pixel opening area;

[0032] The first, second, and third sub-light-emitting functional layers have different colors.

[0033] In some embodiments, the step of removing the initial insulating layer located in the first pixel opening region includes:

[0034] A solution is dropped into the first pixel opening area to dissolve the initial insulating layer that is not covered by the pixel definition layer.

[0035] In some embodiments, the step of covering the first electrode and the planarization layer with an initial insulating layer includes:

[0036] An initial insulating layer is formed on the first electrode and the planarization layer by coating.

[0037] In some embodiments, the solution comprises alcohol, the insulating layer comprises an organic insulating layer, and the material of the insulating layer is different from the material of the pixel definition layer.

[0038] This application provides a display panel and its fabrication method, including a substrate, a planarization layer covering the substrate, first electrodes spaced apart on the planarization layer, an insulating layer covering the first electrodes and the planarization layer, a pixel definition layer, and a light-emitting functional layer. The insulating layer includes openings exposing each of the first electrodes, and the pixel definition layer is located on the insulating layer and includes multiple pixel opening regions corresponding to the first electrodes. The light-emitting functional layer includes sub-light-emitting functional layers of different colors, located in the pixel opening regions and connected to the first electrodes through openings in the insulating layer. Therefore, the insulating layer of the corresponding pixel opening region can be removed before sequentially printing the sub-light-emitting functional layers to form the openings of the corresponding pixel opening regions. When printing a sub-light-emitting functional layer in one pixel opening region, the first electrodes in other pixel opening regions are still protected by the insulating layer. Thus, the sub-light-emitting functional layers printed first will not cause color mixing risk to the subsequently printed sub-light-emitting functional layers of different colors, thereby reducing the color mixing risk of different sub-light-emitting functional layers. Attached Figure Description

[0039] The technical solution and other beneficial effects of this application will become apparent from the following detailed description of specific embodiments in conjunction with the accompanying drawings.

[0040] Figure 1 These are schematic diagrams of the display panel structure provided in some embodiments of this application;

[0041] Figure 2 These are schematic diagrams of the display panel structure provided in some embodiments of this application;

[0042] Figure 3 This is a schematic flowchart of a method for manufacturing a display panel according to some embodiments of this application;

[0043] Figures 4a-4f This is a schematic diagram of the structure of a semiconductor device provided in some embodiments of this application during the fabrication process. Detailed Implementation

[0044] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0045] In the description of this application, it should be understood that the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, features defined as "first" or "second" may explicitly or implicitly include one or more of the stated features. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0046] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0047] The following disclosure provides many different embodiments or examples for implementing different structures of this application. To simplify the disclosure, specific examples of components and arrangements are described below. Of course, these are merely examples and are not intended to limit the scope of this application. Furthermore, reference numerals and / or letters may be repeated in different examples; such repetition is for simplification and clarity and does not in itself indicate a relationship between the various embodiments and / or arrangements discussed. In addition, various specific examples of processes and materials are provided in this application, but those skilled in the art will recognize the application of other processes and / or the use of other materials.

[0048] Please see Figure 1 , Figure 1 This is a schematic diagram of the structure of a display panel provided in some embodiments of this application. The display panel 100 is intended for use in an organic light-emitting diode (OLED) display.

[0049] The display panel 100 includes a substrate 10, a planarization layer 11 covering the substrate 10, first electrodes 12 spaced apart on the planarization layer 11, an insulating layer 13 covering the first electrodes 12 and the planarization layer 11, a pixel definition layer 14 located on the insulating layer 13, and a light-emitting functional layer 15. The insulating layer 13 includes openings 121 exposing each of the first electrodes 12, and the pixel definition layer 14 includes multiple pixel opening regions corresponding to the first electrodes. The light-emitting functional layer 15 includes sub-light-emitting functional layers 150 of different colors, each sub-light-emitting functional layer 150 located in a pixel opening region P and connected to the first electrodes 12 through the openings 121 of the insulating layer 13.

[0050] The substrate 10 may include a driving substrate, which may include a base, a buffer layer, an active layer, a first gate insulating layer, a first gate, a second gate insulating layer, a second gate, an interlayer dielectric layer, a source, and a drain. The buffer layer is located on the base, the active layer is located on the buffer layer, and the first gate insulating layer is located on the buffer layer and covers the active layer. The first gate is located on the first gate insulating layer, and the second gate insulating layer is located on the first gate insulating layer and covers the first gate. The second gate is located on the second gate insulating layer, and the interlayer dielectric layer is located on the second gate insulating layer and covers the second gate. The source and drain are located on the interlayer dielectric layer and are respectively connected to both sides of the active layer through vias.

[0051] The planarization layer 11 can cover the entire driving substrate, and the planarization layer 11 may include organic materials.

[0052] The first electrode 12 can be an anode, which can be fabricated using physical vapor deposition (PVD) technology. Its structure includes, but is not limited to, a stacked structure of ITO / Ag / ITO or a single-layer ITO structure. Multiple first electrodes 12 can be arranged in an array with spacing, meaning there is a gap between adjacent first electrodes 12. This gap forms a pixel definition layer 14, and a light-emitting functional layer 15 is formed above the first electrodes 12, between adjacent pixel definition layers 14.

[0053] An insulating layer 13 covers the first electrode 12 and a planarization layer 11 located between adjacent first electrodes 12 (spaced area). That is, the insulating layer 13 covers the first electrode 12 and the planarization layer 11 not covered by the first electrode 12. The insulating layer 13 includes an opening 121 that exposes the surface of the first electrode 12 facing away from the substrate 10. That is, the insulating layer 13 has an opening 121 above the corresponding first electrode 12, and the opening 121 is used to form a light-emitting functional layer 15 connected to the first electrode 12.

[0054] In some embodiments, the insulating layer 13 can be made of either an inorganic or an organic material. For example, the insulating layer 13 can be an organic insulating layer that can be dissolved by solvents such as alcohol.

[0055] In some embodiments, the insulating layer 13 may be a black light-shielding material, used to replace the black matrix layer in the display panel 100.

[0056] The pixel definition layer 14 is formed on the insulating layer 13 and includes a plurality of pixel opening regions P corresponding to the first electrode 12, that is, the pixel opening regions P of the pixel definition layer 14 expose the first electrode 12.

[0057] In some embodiments, the pixel definition layer 14 may be an organic material.

[0058] The light-emitting functional layer 15 may include a first sub-light-emitting functional layer 151, a second sub-light-emitting functional layer 152, and a third sub-light-emitting functional layer 153. Sub-light-emitting functional layers 150 of different colors are located in different pixel opening regions P and are connected to the first electrode 12 through the opening 121 of the insulating layer 13. The first sub-light-emitting functional layer 151 may be a red sub-light-emitting functional layer, the second sub-light-emitting functional layer 152 may be a green sub-light-emitting functional layer, and the third sub-light-emitting functional layer 153 may be a blue sub-light-emitting functional layer.

[0059] It should be noted that the sub-light-emitting functional layer 150 can refer to the first sub-light-emitting functional layer 151, the second sub-light-emitting functional layer 152, or the third sub-light-emitting functional layer 153.

[0060] In some embodiments, the light-emitting functional layer 15 may include a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, and an electron injection layer in the direction perpendicular to the substrate 10. The material of the light-emitting layer in different pixel opening regions P can determine that the light-emitting functional layer 15 in the pixel opening region P forms sub-light-emitting functional layers 150 of different colors. Different colored sub-light-emitting functional layers 150 correspond to different colored pixel opening regions P. For example, the first sub-light-emitting functional layer 151 is formed in the red pixel opening region, the second sub-light-emitting functional layer 152 is formed in the green pixel opening region, and the third sub-light-emitting functional layer 153 is formed in the blue pixel opening region.

[0061] By first covering the first electrode 12 layer with an insulating layer 13, when forming the first sub-light-emitting functional layer 151, the insulating layer 13 of the corresponding red pixel opening area is removed to form an opening 121, and then the first sub-light-emitting functional layer 151 is printed. Then the insulating layer 13 of the green pixel opening area is removed to form an opening 121, and then the second sub-light-emitting functional layer 152 is printed. Finally, the insulating layer 13 of the blue pixel opening area is removed to form an opening 121, and then the third sub-light-emitting functional layer 153 is printed. In this way, the insulating layer 13 can protect the other first electrodes 12 that have not yet formed sub-light-emitting functional layers 150, and the sub-light-emitting functional layers 150 printed first will not cause color mixing to the sub-light-emitting functional layers 150 or pixel opening areas P printed later.

[0062] In some embodiments, the material of the insulating layer 13 is different from the material of the pixel definition layer 14, so that when the insulating layer 13 of different pixel opening regions P is removed by solvent dissolution to form openings 121, it will not affect the pixel definition layer 14, thus ensuring the pattern structure of the pixel definition layer 14.

[0063] In some embodiments, such as Figure 1 As shown, the orthographic projection of the pixel definition layer 14 onto the substrate 10 is within the range of the orthographic projection of the insulating layer 13 onto the substrate 10, meaning that the pixel definition layer 14 does not completely cover the insulating layer 13.

[0064] Specifically, the insulating layer 13 extends from the bottom of the pixel definition layer 14 and includes a protrusion 131 located in the pixel opening region P. The top dimension of the opening 121 of the insulating layer 13 is smaller than the bottom dimension of the opening of the pixel definition layer 14.

[0065] In some embodiments, the thickness of the insulating layer 13 is less than 1 micrometer, which does not affect the overall thickness of the display panel, and the process of forming an opening 121 in the insulating layer to expose the first electrode 12 is relatively easy. The term "thickness" as used herein refers to the thickness along a direction perpendicular to the substrate 10.

[0066] In some embodiments, the thickness of the first sub-light-emitting functional layer 151 is greater than the thickness of the second sub-light-emitting functional layer 152, and the thickness of the second sub-light-emitting functional layer 152 is greater than the thickness of the third sub-light-emitting functional layer 153, to improve the uniformity of light emission in different pixel aperture regions P. For example, the thickness of the first sub-light-emitting functional layer 151 can be 200nm to 300nm, the thickness of the second sub-light-emitting functional layer 152 can be 120nm to 200nm, and the thickness of the third sub-light-emitting functional layer 153 can be 100nm to 120nm. In a specific embodiment, the thickness of the first sub-light-emitting functional layer 151 can be 250nm, the thickness of the second sub-light-emitting functional layer 152 can be 160nm, and the thickness of the third sub-light-emitting functional layer 153 can be 110nm.

[0067] In some embodiments, the sub-light-emitting functional layer 150 covers the protrusion 131 and fills the opening 121.

[0068] In some embodiments, the display panel 100 further includes a second electrode (not shown) that covers the pixel definition layer 14 and the light-emitting functional layer 15, and the second electrode can directly contact the pixel definition layer 14 and the light-emitting functional layer 15. The second electrode can be a cathode, so different sub-light-emitting functional layers 150 can share a cathode. The material of the second electrode can be the same as the material of the first electrode 12.

[0069] Please see Figure 2 , Figure 2 This is a schematic diagram of the structure of a display panel provided in some embodiments of this application. For ease of understanding and brief explanation, the same structures as those in the above embodiments will continue to use the same reference numerals, and the same structures will not be described in detail. This embodiment will only describe the different structures in detail.

[0070] The display panel 200 and Figure 1 The difference between the display panel 100 and the insulating layer 13a lies in the insulating layer 13a. The insulating layer 13a in the pixel opening area P is completely dissolved, that is, the pixel definition layer 14 completely covers the insulating layer 13a, and the insulating layer 13a has no Figure 1 The protrusion 131 in the middle. The orthographic projection of the insulating layer 13a on the substrate 10 coincides with the orthographic projection of the pixel definition layer 14 on the substrate 10. Specifically, the top dimension of the opening 121 of the insulating layer 13a is the same as the bottom dimension of the opening of the pixel definition layer 14, and the bottom surface of the light-emitting functional layer 15 can contact the pixel definition layer 14.

[0071] The display panel provided in this application embodiment includes a substrate 10, a planarization layer 11 covering the substrate 10, first electrodes 12 spaced apart on the planarization layer 11, an insulating layer 13 / 13a covering the first electrodes 12 and the planarization layer 11, a pixel definition layer 14 located on the insulating layer 13 / 13a, and a light-emitting functional layer 15. The insulating layer 13 / 13a includes openings 121 exposing each of the first electrodes 12, and the pixel definition layer 14 includes multiple pixel opening regions P corresponding to the first electrodes 12. The light-emitting functional layer 15 includes sub-light-emitting functional layers 150 of different colors. The sub-light-emitting functional layers 150 are located in the pixel opening regions P and are connected to the first electrodes 12 through the openings 121 of the insulating layer 13 / 13a. Therefore, the sub-light-emitting functional layers 150 can be printed sequentially, and before printing each sub-light-emitting functional layer 150, the insulating layer 13 corresponding to the pixel opening region P is removed to form the opening 121. Since the first electrode 12 of other pixel opening regions P is protected by insulating layer 13 / 13a when printing the sub-light-emitting functional layer 150 of a pixel opening region P, the sub-light-emitting functional layer 150 printed first will not cause color mixing risk to the sub-light-emitting functional layers 150 of different colors printed later, thereby reducing the color mixing risk of sub-light-emitting functional layers 150 of different colors.

[0072] Please see Figure 3 , Figure 3 This is a schematic flowchart illustrating the manufacturing method of a display panel according to some embodiments of this application. Please also refer to... Figures 4a-4f , Figures 4a-4f This is a schematic diagram of the semiconductor device provided in some embodiments of this application during the fabrication process. This embodiment uses the fabrication of the above-mentioned display panel 100 as an example to illustrate the fabrication method of the display panel; therefore, please refer to the following... Figure 1 The method for manufacturing the display panel includes the following steps S1-S8.

[0073] Step S1: Provide substrate 10.

[0074] Step S2: Form a planarization layer 11 covering the substrate 10.

[0075] Step S3: Form a first electrode 12 spaced apart on the planarization layer 11.

[0076] like Figure 4a and 4b As shown, a first electrode layer 12a is first formed on the planarization layer 11, then a photoresist 12b is formed on the first electrode layer 12a, and then a patterned photoresist is formed on the photoresist 12b by photolithography through the photomask M above the photoresist 12b, and then a multiple first electrodes 12 are formed by etching the first electrode layer 12a using the patterned photoresist.

[0077] Step S4: Cover the first electrode 12 and the planarization layer 11 with an initial insulating layer 13a.

[0078] like Figure 4c As shown, the initial insulating layer 13a can be coated on the planarization layer 11 without increasing the cost of the mask.

[0079] Step S5: A pixel definition layer 14 is formed on the initial insulating layer 13a, the pixel definition layer 14 including a plurality of pixel opening regions P corresponding to the first electrode 12.

[0080] like Figure 4d As shown, an initial pixel definition layer is first formed, and then a patterning process is performed to form the pixel definition layer 14 and the pixel opening region P corresponding to the first electrode 12. The pixel opening region P includes a first pixel opening region P1, a second pixel opening region P2, and a third pixel opening region P3 arranged sequentially and adjacently. The first pixel opening region P1 can be a red pixel opening region, the second pixel opening region P2 can be a green pixel opening region, and the third pixel opening region P3 can be a blue pixel opening region.

[0081] If the initial insulating layer 13a is not formed, material from the initial pixel definition layer will fall onto the first electrode 12 during the patterning process, causing dark spots in the display. In this embodiment, the initial insulating layer 13a can protect the first electrode 12. Subsequently, when removing the initial insulating layer 13a from the corresponding pixel opening region P, residual pixel definition layer material can be removed, preventing material residue from the pixel definition layer 14 from affecting the display of the pixel opening region P.

[0082] Step S6: Remove the initial insulating layer 13a located in the first pixel opening area P1 to form an opening 121 that exposes the lower first electrode 12, and form a first sub-light-emitting functional layer 151 connected to the first electrode 12 in the first pixel opening area P1.

[0083] like Figure 4e and 4f As shown, a solution can be dropped into the first pixel opening region P1 to dissolve the initial insulating layer 13a not covered by the pixel definition layer 14. The solution in the first pixel opening region P1 can then be removed by evaporation to expose the upper surface of the first electrode 12 in the first pixel opening region P1. If the initial insulating layer 13a not covered by the pixel definition layer 14 is not completely dissolved, a protrusion 131 will be formed.

[0084] In some embodiments, if the initial insulating layer 13a not covered by the pixel definition layer 14 is completely dissolved, the resulting insulating layer 13 structure is as follows: Figure 2 As shown. The first sub-light-emitting functional layer 151 can be formed by inkjet printing.

[0085] Step S7: Remove the initial insulating layer 13a located in the second pixel opening area P2 to form an opening 121 that exposes the lower first electrode 12, and form a second sub-light-emitting functional layer 152 connected to the first electrode 12 in the second pixel opening area P2.

[0086] The formation process of the second sub-light-emitting functional layer 152 can be referred to Figure 4e-4f The formation steps of the first sub-light-emitting functional layer 151 also involve first removing the initial insulating layer 13a of the corresponding pixel opening area P before printing the second sub-light-emitting functional layer 152. Even if the light-emitting material of the first sub-light-emitting functional layer 151 falls into the second pixel opening area P2 during printing, the color-mixing light-emitting material can be carried away when the initial insulating layer 13a of the second pixel opening area P2 is removed, thereby reducing the risk of color mixing.

[0087] Step S8: Remove the initial insulating layer 13a located in the third pixel opening region P3 to form an opening 121 that exposes the lower first electrode 12, and form a third sub-light-emitting functional layer 153 connected to the first electrode 12 in the third pixel opening region P3.

[0088] The formation process of the third sub-luminescent functional layer 153 can be referred to Figure 4e-4f The formation steps of the first sub-light-emitting functional layer 151. Even if the light-emitting material of the first sub-light-emitting functional layer 151 and the second sub-light-emitting functional layer 152 falls into the third pixel opening area P3 during printing, the mixed-color light-emitting material can be removed when the initial insulating layer 13a of the third pixel opening area P3 is removed, so as to reduce the risk of color mixing.

[0089] like Figure 2 As shown, the initial insulating layer 13a is formed after the opening 121 is formed in the corresponding pixel opening region P. The insulating layer 13 is patterned using the pixel definition layer 14, without increasing the cost of the mask.

[0090] The first sub-light-emitting functional layer 151, the second sub-light-emitting functional layer 152, and the third sub-light-emitting functional layer 153 are different colors. Because the first electrodes 12 of the second pixel opening region P2 and the third pixel opening region P3 are protected by the initial insulating layer 13a during the printing of the first sub-light-emitting functional layer 151, the printing of the first sub-light-emitting functional layer 151 will not cause any risk of color mixing with other color sub-light-emitting functional layers 150. Because the first electrode 12 of the third pixel opening region P3 is protected by the initial insulating layer 13a during the printing of the second sub-light-emitting functional layer 152, the printing of the second sub-light-emitting functional layer 152 will not cause any color mixing effect on the third pixel opening region P3.

[0091] The above description of the embodiments is only for the purpose of helping to understand the technical solutions and core ideas of this application; those skilled in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or make equivalent substitutions for some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A method for manufacturing a display panel, characterized in that, The method for manufacturing the display panel includes: Provide substrate; Forming a planar layer covering the substrate; A first electrode is formed at intervals on the planarization layer; An initial insulating layer is applied to the first electrode and the planarization layer; A pixel definition layer is formed on the initial insulating layer. The pixel definition layer includes a plurality of pixel opening regions corresponding to the first electrode. The pixel opening regions include a first pixel opening region, a second pixel opening region, and a third pixel opening region arranged sequentially and adjacently. Remove the initial insulating layer located in the first pixel opening area to form an opening that exposes the underlying first electrode, and form a first sub-light-emitting functional layer in the first pixel opening area that connects to the first electrode; Remove the initial insulating layer located in the second pixel opening area to form an opening that exposes the underlying first electrode, and form a second sub-light-emitting functional layer in the second pixel opening area that connects to the first electrode; Remove the initial insulating layer located in the third pixel opening area to form an opening that exposes the underlying first electrode, and form a third sub-light-emitting functional layer connected to the first electrode in the third pixel opening area; The first, second, and third sub-light-emitting functional layers have different colors.

2. The method for manufacturing a display panel according to claim 1, characterized in that, The step of removing the initial insulating layer located in the first pixel opening region includes: A solution is dropped into the first pixel opening area to dissolve the initial insulating layer that is not covered by the pixel definition layer.

3. The method for manufacturing a display panel according to claim 1, characterized in that, The step of covering the first electrode and the planarization layer with an initial insulating layer includes: An initial insulating layer is formed on the first electrode and the planarization layer by coating.

4. The method for manufacturing a display panel according to claim 2, characterized in that, The solution includes alcohol, the initial insulating layer includes an organic insulating layer, and the material of the initial insulating layer is different from the material of the pixel definition layer.

5. A display panel, characterized in that, The display panel is formed by the method of manufacturing the display panel as described in claim 1, wherein the display panel comprises: substrate; A planarization layer covering the substrate; The first electrode is disposed at intervals on the planarization layer; An insulating layer covers the first electrode and the planarization layer, and includes openings exposing each of the first electrodes; A pixel definition layer is located on the insulating layer and includes a plurality of pixel opening regions corresponding to the first electrode; The light-emitting functional layer includes sub-light-emitting functional layers of different colors, which are located in the pixel opening area and connected to each of the first electrodes through the opening.

6. The display panel according to claim 5, characterized in that, The orthographic projection of the insulating layer on the substrate coincides with the orthographic projection of the pixel definition layer on the substrate, or; The orthographic projection of the pixel definition layer on the substrate is located within the range of the orthographic projection of the insulating layer on the substrate.

7. The display panel according to claim 5, characterized in that, The thickness of the insulating layer is less than 1 micrometer.

8. The display panel according to claim 5, characterized in that, The material of the insulating layer is different from the material of the pixel definition layer.

9. The display panel according to claim 5, characterized in that, The display panel also includes: The second electrode covers the pixel definition layer and the light-emitting functional layer.

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