Design methods and related equipment for glass substrate manufacturing furnace structure and electrode configuration

Abstract

This invention discloses a design method and related apparatus for the structure and electrode configuration of a glass substrate manufacturing furnace, belonging to the field of glass substrate manufacturing technology. By selecting a reference furnace, equivalent relationships for melting capacity, interference effects, and edge effects are established based on the relevant parameters of the reference furnace. Parameters such as the liquid level height, furnace length, furnace width, electrode size, number of electrode pairs, and configuration (installation distribution) of the designed furnace are calculated based on these relationships, thereby completing the design of the novel furnace structure and electrode configuration. Based on the reference furnace structure and electrode configuration, and the equivalence of melting capacity, interference effects, and edge effects, a design benchmark for the furnace structure and electrode configuration to improve extraction yield is established, taking into account both electrode interference effects and edge effects, meeting the technical requirements of high efficiency and high melting capacity, thus satisfying the needs of higher generations and higher extraction yields. The novel furnace design optimization evaluation standard achieves target-oriented, digital, and parameterized implementation.

Description

Technical Field

[0001] This invention belongs to the field of glass substrate manufacturing technology, and relates to a design method and related apparatus for the structure of a glass substrate manufacturing furnace and the configuration of electrodes. Background Technology

[0002] In the manufacturing of flat panel displays such as TFT-LCDs (Thin Film Transistor Displays) and PDPs (Plasma Display Panels), glass substrates are typically manufactured using an overflow-pull method. Glass substrate furnaces generally employ a coupled heating system of a combustion lance and an electric flux system. The electric flux uses alternating current to prevent electrolysis of the molten glass and electrode oxidation. Electric melting technology has a much higher thermal efficiency than flame technology. The energy release of electric melting technology is related to the conductivity of the molten glass itself. The conductivity of glass is a function of temperature (related to the composition of the raw material), and the conductivity at room temperature is approximately 10. -13 ~10 -15 Ω -1 cm -1 (Insulator), with a molten state conductivity of approximately 0.1–1.0 Ω. -1 cm -1 (Conductor). Under the action of an alternating electric field, conductive ions (mainly alkali metals such as Na, K, and Li) collide and rub against each other to generate Joule heat, which heats the glass to achieve melting, clarification, and homogenization.

[0003] Controlling the surface load of the electrode is one of the key design considerations; the surface load should not exceed 0.3 A / cm. 2 The erosion of the electrodes by the glass and the alternating electrolysis of the electrodes are related to the movement of the glass; high-temperature, high-speed molten glass can cause excessively rapid erosion of refractory bricks; the current density and lifespan of the electrode surface are closely related to the tendency of bubbles. Constant current control keeps the current constant, thus keeping the temperature constant. If the temperature / conductivity increases, the current tends to increase when the voltage remains unchanged. The constant current meter automatically lowers the output voltage through feedback signals to maintain a constant current, thus reducing the output power / heat generation of electric heating; conversely, it also reduces the temperature, thus achieving automatic temperature control within a certain range. Constant current control is unaffected by the addition of raw materials, accelerating the melting of raw materials and improving the melting quality.

[0004] The kiln structure (including liquid level), electrode size, electrode configuration, and power supply scheme are the core of kiln design; the limiting relationship between electrode power supply and electrode configuration is crucial to ensuring melting quality. Extraction rate and melting quality are two separate technical issues. The extraction rate must be based on melting quality (related to the kiln's melting capacity), which is closely related to melting quality and effective melting rate. To ensure melting quality, the energy consumption per unit extraction rate (residence time × electrode power) should be equivalent to that of the reference kiln. Shorter residence time results in higher average electrode power, and fewer electrode pairs also result in higher average electrode power. Residence time can be as short as 1.36 days or even shorter, but the electrode power needs to be increased significantly to meet the melting capacity requirements. When power (current) increases abnormally, electrode edge effects and electric field interference effects must be considered, which simulation software currently cannot achieve.

[0005] Kiln design should reference mature production lines, selecting lines with large process margins to improve process adjustment efficiency and reduce initial waste. Traditional melting rate calculation methods can only evaluate the numerical relationship between the known output and melting area of ​​a specific kiln, and are unrelated to melting quality. They cannot explain the fundamental reasons for different melting rates among kilns with the same melting area. Traditional melting rate calculations cannot be used for kiln melting capacity design.

[0006] The temperature gradient distribution in the material mountain area varies across different reference kilns, which is related to the kiln structure, residence time, and electrode power allocation (to meet melting capacity). The shape and operating mode of the material mountain differ significantly depending on the extraction rate; the current field also varies considerably depending on the electrode structure and configuration. These differences cannot be realistically reproduced by current software, and there is no logical basis for subjectively judging pressure loss. The fundamental cause of pressure loss is the superposition of currents between electrode groups due to the electric field interference effect, and more specifically, the need for higher power to achieve melting quality within a limited residence time. Current kiln simulations cannot achieve automatic optimization; they rely on trial and error, have long calculation cycles, and are inefficient. They only verify trends and cannot objectively and accurately judge the consistency of convection circulation, temperature gradient, and circulation speed (especially when structural dimensions differ, the error is uncontrollable).

[0007] In recent years, to improve production line efficiency, glass substrates have become increasingly larger and have higher lead-out rates. To meet the demands of higher generations and higher lead-out rates, there is an urgent need to develop a design method for the structure of glass substrate manufacturing furnaces and electrode configurations. Summary of the Invention

[0008] The purpose of this invention is to solve the technical problems that the existing kiln structure and electrode configuration design cannot meet the requirements of higher generation and higher extraction volume, and that the evaluation criteria for new kiln design optimization are subjective. This invention provides a design method and related apparatus for the structure and electrode configuration of glass substrate manufacturing kilns.

[0009] To achieve the above objectives, the present invention employs the following technical solution:

[0010] In a first aspect, the present invention provides a design method for the structure of a glass substrate manufacturing furnace and the configuration of electrodes, comprising the following steps:

[0011] A reference kiln is selected, and equivalent relationships for melting capacity, interference effect, and edge effect are established based on the relevant parameters of the reference kiln.

[0012] Based on the equivalent relationships of melting capacity, interference effect, and edge effect of the reference kiln, the relevant parameters for designing the kiln structure and electrode configuration are calculated.

[0013] In a second aspect, the present invention provides a design system for the structure of a glass substrate manufacturing furnace and the configuration of electrodes, comprising:

[0014] The equivalence relation module is used to select a reference kiln and establish equivalence relations for melting capacity, interference effect, and edge effect based on the relevant parameters of the reference kiln.

[0015] The design module is used to calculate the relevant parameters of the designed kiln structure and electrode configuration based on the equivalent relationships of melting capacity, interference effect, and edge effect of the reference kiln.

[0016] Thirdly, the present invention provides a computer device including a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor executes the computer program to implement the steps of the method described above.

[0017] Fourthly, the present invention provides a computer-readable storage medium storing a computer program that, when executed by a processor, implements the steps of the method described above.

[0018] Compared with the prior art, the present invention has the following beneficial effects:

[0019] This invention discloses a design method and related apparatus for the structure and electrode configuration of a glass substrate manufacturing furnace. By acquiring parameters such as the design drawdown amount, liquid level, furnace length, furnace width, electrode size, number of electrode pairs, and configuration (installation distribution) of a reference furnace, equivalent relationships for melting capacity, electrode interference effect, and electrode edge effect are established. Based on these relationships, parameters such as the liquid level, furnace length, furnace width, electrode size, number of electrode pairs, and configuration (installation distribution) of the designed furnace are calculated, thereby completing the design of a novel furnace structure and electrode configuration. This invention, based on the reference furnace structure and electrode configuration and the equivalence of melting capacity, interference effect, and edge effect, establishes a design benchmark for furnace structure and electrode configuration that improves drawdown amount, while also considering electrode interference and edge effects. This meets the technical requirements of high efficiency and high melting capacity, thus satisfying the needs of higher generations and higher drawdown amounts. It enables the optimization and evaluation criteria for novel furnace design to be targeted, digitized, and parameterized. Attached Figure Description

[0020] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a flowchart of the method of the present invention;

[0022] Figure 2 This is a schematic diagram of the system of the present invention;

[0023] Figure 3 This is a front view schematic diagram of the kiln structure and electrode configuration according to an embodiment of the present invention;

[0024] Figure 4 This is a top view schematic diagram of the kiln structure and electrode configuration according to an embodiment of the present invention;

[0025] Figure 5 This is a schematic diagram of the computer device structure of the present invention.

[0026] Wherein: 1-feeding port; 2-molten glass; 3-discharge port; 4-electric furnace; 5-electrode. Detailed Implementation

[0027] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0028] Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0029] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0030] In the description of the embodiments of the present invention, it should be noted that if terms such as "upper," "lower," "horizontal," or "inner" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of the invention is in use, they are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention. Furthermore, terms such as "first" and "second" are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0031] Furthermore, the use of the term "horizontal" does not imply that the component must be absolutely horizontal, but rather that it can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal than "vertical," and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0032] In the description of the embodiments of the present invention, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in the present invention according to the specific circumstances.

[0033] The present invention will now be described in further detail with reference to the accompanying drawings:

[0034] See Figure 1 This invention discloses a design method for the structure and electrode configuration of a glass substrate manufacturing furnace, comprising the following steps:

[0035] S1. Select a reference kiln and establish equivalent relationships for melting capacity, interference effect, and edge effect based on the relevant parameters of the reference kiln.

[0036] S2. Based on the equivalent relationships of melting capacity, interference effect, and edge effect of the reference kiln, the relevant parameters for designing the kiln structure and electrode configuration are calculated.

[0037] In one feasible embodiment of the present invention, the step of selecting a reference kiln and establishing equivalent relationships for melting capacity, interference effects, and edge effects based on relevant parameters of the reference kiln specifically includes:

[0038] S101, establish the equivalent relationship of melting capacity based on the kiln's design lead-out amount, number of electrode pairs, design average power, and design residence time;

[0039] S102, establish an equivalent relationship of interference effect (inter-electrode electric field interference effect limits power adjustment margin) based on the average electrode current density, electrode edge spacing, electrode-to-front and rear wall spacing and electrode width of the reference kiln;

[0040] S103, establish the equivalent relationship of edge effect (power adjustment margin limited by edge electric field effect between electrodes) based on the average current density of reference kiln electrodes, electrode edge spacing and electrode-to-front and rear wall spacing.

[0041] In a feasible embodiment of the present invention, the specific formula for the equivalent relationship of melting capacity is as follows:

[0042]

[0043] in, To design the number of electrode pairs in the kiln, To design the average power of the kiln, To design the kiln dwell time, To design the kiln exhaust volume, For reference, the number of electrode pairs in the kiln. For reference, average kiln power, For reference, kiln dwell time, For reference, the amount of material drawn from the kiln.

[0044] In one feasible embodiment of the present invention, the kiln residence time is designed. and reference kiln residence time They respectively satisfy the following relations:

[0045]

[0046]

[0047] in, To design the kiln dwell time, To design the width of the kiln, To design the liquid level height in the kiln, To design the kiln length, For reference, kiln dwell time, For reference kiln width, For reference to the liquid level in the kiln, For reference kiln length;

[0048] The average power of the designed kiln Compared with the average power of the reference kiln The following relationship must be satisfied:

[0049]

[0050] in, To design the height of the kiln electrodes, For parameters related to the design of the kiln structure and electrode configuration, For reference to the height of the kiln electrode, These are parameters related to the reference kiln structure and electrode configuration;

[0051] When designing, relative values ​​are taken based on the average current density and average power of the kiln, that is:

[0052]

[0053]

[0054] Design average current density of the kiln and the average power of the designed kiln All calculated values ​​are relative.

[0055] In a feasible embodiment of the present invention, the specific formula for the equivalent relationship of the interference effect is as follows:

[0056]

[0057] in, To design the average current density of the kiln, To design the electrode edge spacing of the kiln, To design the width of the kiln electrode, To design the distance between the kiln electrodes and the front and rear walls, For reference, the average current density of the kiln, For reference, the distance between the edges of the kiln electrodes, For reference to the width of the kiln electrode, The distance between the furnace electrode and the front and rear walls is for reference.

[0058] In a feasible embodiment of the present invention, the specific formula for the edge effect equivalence relationship is as follows:

[0059]

[0060] in, To design the average current density of the kiln, To design the electrode edge spacing of the kiln, To design the distance between the kiln electrodes and the front and rear walls, For reference, the average current density of the kiln, For reference, the distance between the edges of the kiln electrodes, The distance between the furnace electrode and the front and rear walls is for reference.

[0061] In one feasible embodiment of the present invention, the relevant parameters for designing the kiln structure and electrode configuration are calculated using the following formula:

[0062]

[0063]

[0064] in, To design the distance between the bottom of the kiln electrode and the bottom of the kiln, For reference, the distance between the bottom of the kiln electrode and the bottom of the kiln, ρ is the resistivity of the glass.

[0065] See Figure 2 This invention discloses a design system for the structure of a glass substrate manufacturing furnace and the configuration of electrodes, comprising:

[0066] The equivalence relation module is used to select a reference kiln and establish equivalence relations for melting capacity, interference effect, and edge effect based on the relevant parameters of the reference kiln.

[0067] The design module is used to calculate the relevant parameters of the designed kiln structure and electrode configuration based on the equivalent relationships of melting capacity, interference effect, and edge effect of the reference kiln.

[0068] This invention discloses a computer device, including a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, it implements the steps of the design method for the structure of the glass substrate manufacturing furnace and the electrode configuration.

[0069] See Figure 5 This invention discloses a computer-readable storage medium storing a computer program that, when executed by a processor, implements the steps of the design method for the structure of the glass substrate manufacturing furnace and the electrode configuration.

[0070] Example:

[0071] See Figure 3 The electric melting furnace includes a feeding port 1, molten glass 2, a discharge port 3, an electric melting furnace 4, and electrodes 5. The upper part of the electric melting furnace is the gas furnace part. The electrodes 5 are arranged in pairs along the length of the furnace and at the width of the furnace.

[0072] In glass substrate manufacturing, glass substrate furnaces typically employ a coupled heating system of a combustion lance and an electric melting system. The electric melting system uses alternating current to prevent electrolysis of the molten glass and oxidation of the electrodes. The thermal efficiency of electric melting technology is far greater than that of flame technology. The energy release of electric melting technology is related to the conductivity of the molten glass itself. The conductivity of glass is a function of temperature (related to the composition of the raw material), and the conductivity at room temperature is approximately 10. -13 ~10 -15 Ω -1 cm -1 (Insulator), with a molten state conductivity of approximately 0.1–1.0 Ω. -1 cm -1 (Conductor). Under the action of an alternating electric field, conductive ions (mainly alkali metals such as Na, K, and Li) collide and rub against each other to generate Joule heat, which heats the glass to achieve melting, clarification, and homogenization.

[0073] The kiln structure (including liquid level), electrode dimensions, electrode configuration, and power supply scheme are the core of kiln design; the limiting relationship between electrode power supply and electrode configuration is crucial to ensuring melting quality. Extraction rate and melting quality are two technical issues at different levels. The extraction rate must be based on melting quality (related to the kiln's melting capacity), and melting capacity is closely related to melting quality and effective melting rate. To ensure melting quality, the energy consumption per unit extraction rate (residence time) is... The electrode power is equivalent to that of the reference furnace. The shorter the residence time, the higher the average electrode power; the fewer the number of electrode pairs, the higher the average electrode power. The residence time can be as short as 1.36 days or even shorter, but the electrode power needs to be increased significantly to meet the melting capacity.

[0074] The kiln design references mature production lines, prioritizing lines with large process margins to improve process adjustment efficiency and reduce initial waste. Different reference kilns exhibit varying temperature gradient distributions in the material hill area, which is related to kiln structure, residence time, and electrode power allocation (to meet melting capacity). Different lead-out rates result in significant differences in material hill shape and operating modes; different electrode structures and configurations also correspond to substantial differences in the current field, which current software cannot accurately reproduce.

[0075] In recent years, to improve production line efficiency, glass substrates have become increasingly larger in size and higher in lead count. To meet the demands of higher generation and higher lead counts, the structure of the glass substrate manufacturing furnace and the electrode configuration are among the core elements of the entire glass substrate manufacturing equipment design. According to... Figure 3 As shown, This refers to the height of the liquid level in the kiln. The width of the kiln electrode; This refers to the height of the kiln electrodes. This is the distance between the top of the kiln electrode and the surface of the kiln liquid. This is the distance between the bottom of the kiln electrode and the bottom of the kiln. The width of the kiln electrode; This refers to the distance between the kiln electrodes and the front and rear walls. According to... Figure 4 As shown, The width of the kiln; The kiln length is defined as follows. Based on the reference kiln structure and electrode configuration, as well as the equivalent melting capacity, interference effect, and edge effect, a design benchmark for improving the kiln structure and electrode configuration to enhance the extraction rate was established. This benchmark also takes into account electrode interference and edge effects, meeting the technical requirements of high efficiency and high melting capacity, thereby satisfying the needs of higher generations and higher extraction rates. The new kiln design optimization evaluation standard has achieved target-oriented, digital, and parameterized implementation.

[0076] The reference kiln and the designed kiln satisfy the following relationship:

[0077]

[0078] The specific formula for the equivalent relationship of melting capacity is:

[0079]

[0080] in, To design the number of electrode pairs in the kiln, To design the average power of the kiln, To design the kiln dwell time, To design the kiln exhaust volume, For reference, the number of electrode pairs in the kiln. For reference, average kiln power, For reference, kiln dwell time, For reference, the amount of material drawn from the kiln.

[0081] The specific formula for the equivalence relationship of interference effects is as follows:

[0082]

[0083] in, To design the average current density of the kiln, To design the electrode edge spacing of the kiln, To design the width of the kiln electrode, To design the distance between the kiln electrodes and the front and rear walls, For reference, the average current density of the kiln, For reference, the distance between the edges of the kiln electrodes, For reference to the width of the kiln electrode, The distance between the furnace electrode and the front and rear walls is for reference.

[0084] The specific formula for the equivalence relationship of edge effects is as follows:

[0085]

[0086] in, To design the average current density of the kiln, To design the electrode edge spacing of the kiln, To design the distance between the kiln electrodes and the front and rear walls, For reference, the average current density of the kiln, For reference, the distance between the edges of the kiln electrodes, The distance between the furnace electrode and the front and rear walls is for reference.

[0087] Duration of stay and They respectively satisfy the following relations:

[0088]

[0089] in, To design the kiln dwell time, To design the width of the kiln, To design the liquid level height in the kiln, To design the kiln length, For reference, kiln dwell time, For reference kiln width, For reference to the liquid level in the kiln, For reference kiln length.

[0090] The average electrode power and the average current density satisfy the following relationship:

[0091]

[0092] in, To design the height of the kiln electrodes, For parameters related to the design of the kiln structure and electrode configuration, For reference to the height of the kiln electrode, These are parameters related to the reference kiln structure and electrode configuration. During the design, the average current density and average power of the reference kiln are taken as relative values, i.e.:

[0093]

[0094]

[0095] Therefore, the average current density of the kiln is designed. and the average power of the designed kiln All calculated values ​​are relative.

[0096] The glass substrate furnace involved in this embodiment employs a coupled heating system of a combustion lance and an electric melting system. The electric melting system uses alternating current to prevent electrolysis of the molten glass and oxidation of the electrodes. The thermal efficiency of the electric melting technology is much greater than that of the flame technology. Table 1 shows the reference furnace and the designed furnace structure and related parameters of this embodiment.

[0097] Table 1: Reference and Design Kiln Structures and Related Parameters in This Embodiment

[0098]

[0099] Reference glass substrate furnace: Design output Liquid level height Kiln length Kiln width Electrode width Electrode height Number of electrode pairs Electrode edge spacing Distance between electrodes and front and rear walls .

[0100] New Design Glass Substrate Furnace: Design Output Liquid level height Kiln length Kiln width Electrode width Electrode height Number of electrode pairs Electrode edge spacing Distance between electrodes and front and rear walls .

[0101] To verify the melting capacity, calculations were performed:

[0102]

[0103] To verify the interference effect, calculations were performed:

[0104]

[0105] To verify the edge effect, calculations were performed:

[0106]

[0107] The novel kiln designed using the method described in this embodiment has the same melting efficiency as the reference kiln, meaning it consumes the same amount of electrical energy per unit output. It also takes into account electrode interference and edge effects, meeting the technical requirements of high efficiency and high melting capacity, thus satisfying the needs of higher generations and higher output. The novel kiln design optimization evaluation criteria are targeted, digitized, and parameterized.

[0108] Those skilled in the art will understand that embodiments of the present invention can be provided as methods, systems, or computer program products. Therefore, the present invention can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present invention can take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0109] This invention is described with reference to flowchart illustrations and / or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of the invention. It will be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, generate instructions for implementing the flowchart illustrations and / or block diagrams. Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.

[0110] These computer program instructions may also be stored in a computer-readable storage medium that can direct a computer or other programmable data processing device to function in a particular manner, such that the instructions stored in the computer-readable storage medium produce an article of manufacture including instruction means, which are implemented in a process Figure 1 One or more processes and / or boxes Figure 1 The function specified in one or more boxes.

[0111] These computer program instructions may also be loaded onto a computer or other programmable data processing equipment to cause a series of operational steps to be performed on the computer or other programmable equipment to produce a computer-implemented process, thereby providing instructions that execute on the computer or other programmable equipment for implementing the process. Figure 1 One or more processes and / or boxes Figure 1 The steps of the function specified in one or more boxes.

[0112] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that modifications or equivalent substitutions can still be made to the specific implementation of the present invention. Any modifications or equivalent substitutions that do not depart from the spirit and scope of the present invention should be covered within the scope of protection of the claims of the present invention.

Claims

1. A design method for the structure and electrode configuration of a glass substrate manufacturing furnace, characterized in that, Includes the following steps: A reference kiln is selected, and equivalence relationships for melting capacity, interference effect, and edge effect are established based on the relevant parameters of the reference kiln; specifically including: S101, establish an equivalent relationship for melting capacity based on the kiln's design draw-out amount, number of electrode pairs, design average power, and design residence time; the specific formula for the equivalent relationship for melting capacity is: in, To design the number of electrode pairs in the kiln, To design the average power of the kiln, To design the kiln dwell time, To design the kiln exhaust volume, For reference, the number of electrode pairs in the kiln. For reference, average kiln power, For reference, kiln dwell time, For reference kiln output; S102, establish an equivalent relationship for the interference effect based on the average electrode current density, electrode edge spacing, electrode-to-front and rear wall spacing, and electrode width of the reference kiln; the specific formula for the equivalent relationship for the interference effect is as follows: in, To design the average current density of the kiln, To design the electrode edge spacing of the kiln, To design the width of the kiln electrode, To design the distance between the kiln electrodes and the front and rear walls, For reference, the average current density of the kiln, For reference, the distance between the edges of the kiln electrodes, For reference to the width of the kiln electrode, For reference, the distance between the furnace electrodes and the front and rear walls; S103, establish an equivalent relationship for edge effects based on the average current density of the reference kiln electrodes, the electrode edge spacing, and the distance between the electrodes and the front and rear walls; the specific formula for the equivalent relationship for edge effects is as follows: in, To design the average current density of the kiln, To design the electrode edge spacing of the kiln, To design the distance between the kiln electrodes and the front and rear walls, For reference, the average current density of the kiln, For reference, the distance between the edges of the kiln electrodes, For reference, the distance between the furnace electrodes and the front and rear walls; Based on the equivalent relationships of melting capacity, interference effect, and edge effect of the reference kiln, the relevant parameters for designing the kiln structure and electrode configuration are calculated.

2. The design method for the structure and electrode configuration of a glass substrate manufacturing furnace according to claim 1, characterized in that, The designed kiln dwell time and reference kiln residence time They respectively satisfy the following relations: in, To design the kiln dwell time, To design the width of the kiln, To design the liquid level height in the kiln, To design the kiln length, For reference, kiln dwell time, For reference kiln width, For reference to the liquid level in the kiln, For reference kiln length; The average power of the designed kiln Compared with the average power of the reference kiln The following relationship must be satisfied: in, To design the height of the kiln electrodes, For parameters related to the design of the kiln structure and electrode configuration, For reference to the height of the kiln electrode, These are parameters related to the reference kiln structure and electrode configuration; To design the average current density of the kiln; To design the width of the kiln electrodes; For reference, the average current density of the kiln; For reference furnace electrode width; When designing, relative values ​​are taken based on the average current density and average power of the kiln, that is: Design average current density of the kiln and the average power of the designed kiln All calculated values ​​are relative.

3. The design method for the structure and electrode configuration of a glass substrate manufacturing furnace according to claim 2, characterized in that, The calculation formulas for the parameters related to the design of the kiln structure and electrode configuration are as follows: The calculation formulas for the parameters related to the reference kiln structure and electrode configuration are as follows: in, To design the distance between the bottom of the kiln electrode and the bottom of the kiln, For reference, the distance between the bottom of the kiln electrode and the bottom of the kiln, ρ is the resistivity of the glass.

4. A design system for the structure and electrode configuration of a glass substrate manufacturing furnace, characterized in that, A design method for the structure and electrode configuration of a glass substrate manufacturing furnace according to any one of claims 1 to 3 includes: The equivalence relation module is used to select a reference kiln and establish equivalence relations for melting capacity, interference effect, and edge effect based on the relevant parameters of the reference kiln. The design module is used to calculate the relevant parameters of the designed kiln structure and electrode configuration based on the equivalent relationships of melting capacity, interference effect, and edge effect of the reference kiln.

5. A computer device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that, When the processor executes the computer program, it implements the steps of the method as described in any one of claims 1-3.

6. A computer-readable storage medium storing a computer program, characterized in that, When the computer program is executed by a processor, it implements the steps of the method as described in any one of claims 1-3.

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