Chemical liquid supply end cap and liquid supply structure for reducing liquid residue and bubble amount

Abstract

The present application belongs to the field of liquid supply system, in particular to a chemical liquid supply end cover and a liquid supply structure for reducing the amount of liquid residue and bubbles, the end cover is provided with a liquid inlet and a liquid outlet respectively, and is further provided with an annular groove and a liquid inlet channel respectively, the liquid inlet is communicated with the annular groove, and the liquid entering the liquid inlet overflows from the liquid inlet channel after filling the annular groove; a guide part for breaking and guiding bubbles during the liquid supply process is arranged below the bottom of the end cover, and a liquid outlet channel communicated with the liquid outlet is arranged between the guide part and the bottom of the end cover; the stretch pipe in the liquid supply structure is accommodated in the tank body, and a gas delivery interface communicated with the inner cavity of the tank body is arranged on the tank body; the upper end of the end cover is inserted with the sealing cover, and the lower end is inserted into the stretch pipe, and the end cover and the stretch pipe are clamped and fixed through the connection of the tank body and the sealing cover. The present application can reduce the amount of bubbles generated during the liquid entering process, break and guide the bubbles during the liquid supply process, so that the discharged liquid almost does not contain bubbles.

Description

TECHNICAL FIELD

[0001] The present application belongs to the field of liquid supply system, in particular to a chemical liquid supply end cover and liquid supply structure for reducing the residual liquid amount and the bubble amount. BACKGROUND

[0002] In the process of semiconductor wafer processing, various solvents are needed to clean the wafer surface of impurities and remove the unnecessary photoresist on the wafer surface, etc. Therefore, a chemical liquid supply system is needed to supply the solvents to the wafer surface and other locations requiring solvents. In the process of solvent supply, the solvents are first filled into the chemical liquid supply tank, and then supplied to the required location from the chemical liquid supply tank. This process involves the replenishment of solvents in the chemical liquid supply tank, the pumping of solvents, and the discharge of bubbles in the liquid supply tank. If there are bubbles in the liquid supply pipeline, it will affect the amount of real solution supplied, because the amount of supply is set, and the amount used at the terminal is also determined. If there are bubbles in the liquid, it is impossible to achieve the real set value, which is harmful to the processing of the wafer.

[0003] The existing liquid supply system mainly has the following two shortcomings:

[0004] 1. When the chemical liquid supply tank reaches the supply limit position, there is a lot of residual liquid in the tank. After replenishing new solvents, the old and new solvents are mixed together, which may affect the subsequent process, and it is required to reduce the residual amount as much as possible;

[0005] 2. There is no structure in the chemical tank for breaking and guiding the separation of bubbles (this structure plays a role in breaking bubbles and separating bubbles and liquid to prevent bubbles from being pumped out) and liquid inlet flow channel overflow structure (this structure plays a role in reducing the amount of bubbles generated during the liquid inlet process), thereby reducing the amount of bubbles generated during the liquid inlet process and the amount of bubbles pumped out during the liquid supply process. SUMMARY

[0006] In view of the above problems existing in the process of solvent replenishment, solvent pumping and bubble discharge in the existing chemical liquid supply tank, the purpose of the present application is to provide a chemical liquid supply end cover and liquid supply structure for reducing the residual liquid amount and the bubble amount.

[0007] The purpose of the present application is achieved by the following technical solutions:

[0008] The application reduces the liquid residual amount and the bubble amount, and the liquid inlet and the liquid outlet are respectively arranged on the chemical liquid supply end cover, the annular groove and the liquid inlet channel are respectively arranged on the end cover, the liquid inlet is communicated with the annular groove, and the liquid entering the liquid inlet overflows from the liquid inlet channel after filling the annular groove; the guiding part for breaking and guiding the bubbles during the liquid supply is arranged below the bottom of the end cover, and the liquid outlet channel communicated with the liquid outlet is arranged between the guiding part and the bottom of the end cover.

[0009] The lower surface of the guiding part is a conical surface, and the lowest part of the lower surface of the guiding part is a pointed protrusion.

[0010] The guiding part is connected with the end cover through the plurality of connecting blocks, or the guiding part, the connecting blocks and the end cover are an integrated structure, and the liquid outlet channel of the liquid inlet and the liquid outlet is formed between the adjacent two connecting blocks.

[0011] The waste outlet is further arranged on the end cover and communicated with the annular groove.

[0012] The groove depth direction of the annular groove is a vertical direction, the liquid inlet channel is a horizontal direction, and the liquid inlet channel is located above the groove bottom of the annular groove.

[0013] The liquid inlet channel can be one or more, or the liquid inlet channel is annular.

[0014] The chemical liquid supply structure for reducing the liquid residual amount and the bubble amount comprises a tank body, a sealing cover and a stretch pipe, the sealing cover is sealingly connected with the tank body, the stretch pipe is accommodated in the tank body, a gas conveying interface communicated with the inner cavity of the tank body is arranged on the tank body; an end cover is further arranged, the upper end of the end cover is inserted with the sealing cover, the lower end of the end cover is inserted into the stretch pipe, and the end cover and the stretch pipe are clamped and fixed through the connection of the tank body and the sealing cover; the part of the end cover located in the stretch pipe is respectively provided with an annular groove and a liquid inlet channel, and the liquid entering the liquid inlet channel overflows into the stretch pipe from the liquid inlet channel after filling the annular groove.

[0015] The bottom surface of the stretch pipe is a conical surface corresponding to the lower surface of the guiding part.

[0016] The end cover has an end cover outer edge with an outer diameter larger than that of other parts, the top of the stretch pipe is open, the bottom is closed, the stretch pipe opening extends outward to form a stretch pipe outer edge, the stretch pipe outer edge is arranged on the top of the tank body, the end cover outer edge is arranged on the stretch pipe outer edge, and the tank body top is sealingly and fixedly connected with the sealing cover, so that the end cover outer edge and the stretch pipe outer edge are pressed tightly.

[0017] The sensor for monitoring the liquid level height in the stretch pipe is arranged on the tank body.

[0018] The advantages and positive effects of the application are as follows:

[0019] 1. The present application can reduce the amount of bubbles generated in the liquid entering process, break and guide bubbles in the liquid supply process, so that the discharged liquid contains almost no bubbles.

[0020] 2. The end cap of the present application can reduce the residual amount of solvent in combination with the stretch pipe. BRIEF DESCRIPTION OF DRAWINGS

[0021] Figure 1 is a schematic diagram of the external structure of the end cap of the present application;

[0022] Figure 2 is a sectional view of the internal structure of the end cap of the present application;

[0023] Figure 3 is a schematic diagram of the external structure of the liquid supply structure of the present application;

[0024] Figure 4 is a sectional view of the internal structure of the liquid supply structure of the present application;

[0025] Figure 5 is a sectional view of the structure of the end cap inserted into the stretch pipe of the present application;

[0026] Figure 6 is a schematic diagram of the external structure of the stretch pipe of the present application;

[0027] Figure 7 is a sectional view of the internal structure of the stretch pipe of the present application;

[0028] Wherein: 1 is a gas inlet, 2 is a tank body, 3 is a sealing cap, 4 is a liquid inlet, 5 is a liquid outlet, 6 is an end cap, 7 is a waste outlet, 8 is a sensor, 9 is a stretch pipe, 10 is an annular groove, 11 is a liquid inlet channel, 12 is a guide part, 13 is a connecting block, 14 is the outer edge of the end cap, 15 is the outer edge of the stretch pipe. DETAILED DESCRIPTION

[0029] The present application will be further described in detail below with reference to the accompanying drawings.

[0030] As shown in Figure 1 , Figure 2 , the end cap 6 of the present application is provided with a liquid inlet 4 and a liquid outlet 5 respectively, and is further provided with an annular groove 10 and a liquid inlet channel 11 respectively, the liquid inlet 4 is in communication with the annular groove 10, and the liquid entering the liquid inlet 4 overflows from the liquid inlet channel 11 after filling the annular groove 10; a guide part 12 for breaking and guiding bubbles in the liquid supply process is arranged below the bottom of the end cap 6, and an outlet flow channel in communication with the liquid outlet 5 is arranged between the guide part 12 and the bottom of the end cap 6.

[0031] The end cover 6 of the embodiment is further provided with a waste discharge port 7, and the liquid outlet 5 of the end cover 6 is arranged at the middle position, and the liquid inlet 4 and the waste discharge port 7 are respectively arranged at the left and right sides of the vertical direction section of the liquid outlet 5, and the waste discharge port 7 is also communicated with the annular groove 10.

[0032] The lower surface of the guide part 12 of the embodiment is a conical surface, and the lowest position of the lower surface of the guide part 12 is a pointed protrusion. The guide part 12 is connected with the end cover 6 through a plurality of connecting blocks 13, or the guide part 12, the connecting block 13 and the end cover 6 are integrated structures, and the liquid inflow channel of the liquid flowing into the liquid outlet 5 is formed between the adjacent two connecting blocks 13. The groove depth direction of the annular groove 10 of the embodiment is the vertical direction, the liquid inflow channel 11 is the horizontal direction, and the liquid inflow channel 11 is arranged above the groove bottom of the annular groove 10. The liquid inflow channel 11 can be one or more, or the liquid inflow channel 11 is annular, and the liquid inflow channel 11 of the embodiment is annular.

[0033] As shown in the figure, Figures 3-5 The liquid supply structure of the present application includes a tank body 2, a sealing cover 3, an end cover 6 and a stretch pipe 9, the sealing cover 3 is sealingly connected with the tank body 2, the stretch pipe 9 is accommodated in the tank body 2, the tank body 2 is provided with a gas conveying interface 1 communicated with the inner cavity of the tank body, the gas conveying interface 1 is used for conveying or pumping gas to the inner cavity of the tank body 2; the upper end of the end cover 6 is inserted with the sealing cover 3, the lower end of the end cover 6 is inserted into the stretch pipe 9, and the end cover 6 and the stretch pipe 9 are clamped and fixed through the connection of the tank body 2 and the sealing cover 3; the part of the end cover 6 located in the stretch pipe 9 is respectively provided with an annular groove 10 and a liquid inflow channel 11, and the liquid entering through the liquid inlet 4 overflows into the stretch pipe 9 through the liquid inflow channel 11 after filling the annular groove 10.

[0034] The tank body 2 of the embodiment is a cylindrical structure with an open top and a closed bottom, and the gas conveying interface 1 is arranged at a position close to the bottom of the tank body 2. A sensor 8 for monitoring the liquid level in the stretch pipe 9 is arranged on the tank body 2, and the sensor 8 of the embodiment is three, arranged along the height direction of the tank body 2. The sensor 8 monitors the liquid level in the stretch pipe 9, which is a prior art and will not be described here.

[0035] The stretch pipe 9 is a bag type structure, as shown in the figure, Figures 5-7 The stretch pipe 9 of the embodiment is a stretchable corrugated pipe arranged uniformly along the vertical direction, which is a place for containing solvent, and vacuum suction and nitrogen pressurization are operations on the stretch pipe 9. The bottom surface of the stretch pipe 9 is a conical surface corresponding to the lower surface of the guide part 12, so that the residual amount of liquid (i.e. solvent) in the liquid supply tank can be reduced at the limit position of liquid supply.

[0036] As shown in the figure, Figures 1-7As shown, the end cover 6 of the embodiment has an end cover outer edge 14 with a larger outer diameter than other parts, the top opening of the stretch tube 9 is closed at the bottom, the stretch tube opening extends outward to form a stretch tube outer edge 15, the stretch tube outer edge 15 is placed on the top of the tank body 2, the end cover outer edge 14 is placed on the stretch tube outer edge 15, and the top of the tank body 2 is sealingly connected to the sealing cover 3 by bolts, thereby pressing the end cover outer edge 14 and the stretch tube outer edge 15 tightly.

[0037] The vertical center lines of the tank body 2, the sealing cover 3, the end cover 6 and the stretch tube 9 of the embodiment are collinear.

[0038] The working principle of the present application is as follows:

[0039] The lower surface of the guide portion 12 of the end cover 6 is designed as a conical surface, which can break and guide the gas bubbles floating in the liquid. The gas bubbles in the liquid will float upward, and the breaking function refers to the fact that the gas bubbles will break after contacting the sharp protrusions on the guide portion 12 during the floating process. The guiding function refers to the fact that a large number of gas bubbles do not exist at the position of the liquid outlet channel communicating with the liquid outlet, and the gas bubbles will float along the conical surface of the guide portion 12 and will not be taken out with the liquid.

[0040] The annular groove 10 provided on the end cover 6 functions to buffer the liquid inlet speed. After the liquid enters from the liquid inlet 4, it will first fill the annular groove 10, and then the liquid will overflow from the liquid inlet channel 11 around it. At this time, the liquid flow rate is reduced, which will reduce the generation of gas bubbles.

[0041] During the gas bubble discharge process, the waste discharge port 7 is located at a higher position in the liquid surface, and the gas bubbles are suspended around the waste discharge port 7, so that the gas bubbles are discharged more smoothly.

[0042] If the amount of residual solvent in the chemical liquid supply tank is too large and the time is too long, the solvent will deteriorate, which will affect the process. The end cover 6 cooperates with the stretch tube 9 to reduce the residual amount of solvent in the chemical liquid supply tank (when reaching the supply limit position, the residual solvent in the liquid supply tank will be greatly reduced compared with the prior art).

Claims

1. A chemical supply end cap for reducing liquid residue and air bubble content, characterized in that: The end cap (6) is provided with an inlet (4) and an outlet (5). The end cap (6) is also provided with an annular groove (10) and an inlet channel (11). The inlet (4) is connected to the annular groove (10). The liquid entering through the inlet (4) overflows through the inlet channel (11) after filling the annular groove (10). The bottom of the end cap (6) is provided with a guide part (12) for breaking and guiding bubbles during the liquid supply process. An outlet channel connected to the outlet (5) is provided between the guide part (12) and the bottom of the end cap (6). The lower surface of the guide (12) is a conical surface, and the lowest point of the lower surface of the guide (12) is a pointed protrusion; the guide (12) is connected to the end cap (6) through multiple connecting blocks (13), or the guide (12), connecting blocks (13) and end cap (6) are an integral structure, and a liquid flow channel is formed between two adjacent connecting blocks (13) to the liquid outlet (5).

2. The chemical supply cap for reducing liquid residue and air bubble quantity according to claim 1, characterized in that: The end cap (6) is also provided with a waste discharge port (7), which is connected to the annular groove (10).

3. The chemical supply cap for reducing liquid residue and air bubble quantity according to claim 1, characterized in that: The depth direction of the annular groove (10) is vertical, the liquid inlet channel (11) is horizontal, and the liquid inlet channel (11) is located above the bottom of the annular groove (10).

4. The chemical supply cap for reducing liquid residue and air bubble quantity according to claim 1, characterized in that: The liquid inlet channel (11) may be one or more, or the liquid inlet channel (11) may be annular.

5. A chemical supply structure for reducing liquid residue and air bubble content, comprising a tank, a sealing cap, and a stretching tube, wherein the sealing cap is sealed to the tank, the stretching tube is housed within the tank, and the tank has a gas delivery interface communicating with the inner cavity of the tank; characterized in that: It also includes an end cap (6) as described in any one of claims 1 to 4, wherein the upper end of the end cap (6) is inserted into the sealing cap (3), and the lower end of the end cap (6) is inserted into the stretching tube (9). The end cap (6) and the stretching tube (9) are clamped and fixed by the connection between the tank body (2) and the sealing cap (3). The portion of the end cap (6) located inside the stretching tube (9) is provided with an annular groove (10) and a liquid inlet channel (11). The liquid entering through the liquid inlet (4) overflows into the stretching tube (9) through the liquid inlet channel (11) after filling the annular groove (10). The bottom surface of the stretching tube (9) is a conical surface corresponding to the lower surface of the guide (12).

6. The chemical supply structure for reducing liquid residue and bubble volume according to claim 5, characterized in that: The end cap (6) has an outer diameter larger than the outer edge (14) of the end cap. The top of the stretch tube (9) is open and the bottom is closed. The opening of the stretch tube (9) extends outward to form the outer edge (15) of the stretch tube. The outer edge (15) of the stretch tube rests on the top of the tank body (2). The outer edge (14) of the end cap is placed on the outer edge (15) of the stretch tube. The top of the tank body (2) is sealed and fixed to the sealing cap (3) by bolts, thereby pressing the outer edge (14) of the end cap and the outer edge (15) of the stretch tube together.

7. The chemical supply structure for reducing liquid residue and bubble volume according to claim 5, characterized in that: The tank (2) is equipped with a sensor (8) for monitoring the liquid level inside the stretching tube (9).

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