A structure parallelism measurement method and device, electronic equipment and storage medium

Abstract

The present application relates to the technical field of measurement, and provides a structure parallelism measurement method and device, electronic equipment and storage medium, based on a measurement device, the method comprises: determining a first measurement position and a second measurement position according to the size of the target structure; obtaining the measurement values obtained by the measuring instrument in the first measurement position and the second measurement position on the end face; obtaining the first end face model and the second end face model based on the measurement values; obtaining the parallelism of the target structure according to the first end face model and the second end face model. The present application sets different measurement positions according to the size of each target structure, improves the accuracy and universality of structure parallelism measurement. Based on the measured measurement values, the corresponding end face model is constructed, and the parallelism is fitted in the end face model, so that the end face measurement values are more intuitive and more accurate, effectively improving the parallelism fitting efficiency and accuracy, and further improving the efficiency and accuracy of structure parallelism measurement.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of hot rolling, in particular to a structure parallelism measurement method and device, electronic equipment and storage medium. BACKGROUND

[0002] In the process of making a contact type steel tower, it is necessary to know the flatness and parallelism of the upper and lower end faces of the steel tower to ensure the tight contact effect of the upper and lower segments of the steel tower. At this time, the detection accuracy of the upper and lower end faces of the steel tower is particularly important.

[0003] The existing steel structure measurement mainly uses a level, a theodolite, a total station and a small amount of laser scanning technology for measurement. However, when facing target structures such as steel tower structures, especially when high-precision measurement is required, such as 0.01mm-level precision measurement, the measurement size of traditional measurement instruments is not enough, resulting in reduced measurement accuracy and efficiency, and further affecting the quality of the steel tower. SUMMARY

[0004] The problem solved by the present application is how to improve the measurement accuracy and efficiency of the parallelism of a target structure (such as a steel tower segment).

[0005] To solve the above problems, the present application provides a structure parallelism measurement method, device, electronic equipment and storage medium.

[0006] In a first aspect, the present application provides a structure parallelism measurement method based on a measurement device, the measurement device comprising at least one measurement instrument, the structure parallelism measurement method comprising:

[0007] determining a first measurement position and a second measurement position according to the size of the target structure, wherein the target structure comprises a first end face and a second end face arranged oppositely, the first measurement position is close to the first end face, and the second measurement position is close to the second end face;

[0008] obtaining a first measurement value obtained by the measurement instrument measuring a plurality of measurement points pre-set on the first end face at the first measurement position, and a second measurement value obtained by the measurement instrument measuring a plurality of measurement points pre-set on the second end face at the second measurement position;

[0009] constructing a first end face model and a second end face model based on the first measurement value and the second measurement value;

[0010] obtaining the parallelism of the target structure according to the first end face model and the second end face model.

[0011] Optionally, the obtaining of the parallelism of the target structure according to the first end face model and the second end face model comprises:

[0012] an axis of the target structure is obtained, wherein a center point of the first end surface model and a center point of the second end surface model are connected to obtain the axis;

[0013] a first angle between the first end surface model and the axis is determined, wherein the first angle comprises an included angle between a first connecting line and the axis, the first connecting line being obtained by connecting the measuring point to an edge of the first end surface model, and the first connecting line being perpendicular to the connected edge of the first end surface model;

[0014] a second angle between the second end surface model and the axis is determined, wherein the second angle comprises an included angle between a second connecting line and the axis, the second connecting line being obtained by connecting the measuring point to an edge of the second end surface model, and the second connecting line being perpendicular to the connected edge of the second end surface model;

[0015] the parallelism is obtained according to the first angle and the second angle.

[0016] Optionally, the measuring device comprises at least one transfer station, the transfer station being arranged between the first measuring position and the second measuring position; and the first measuring position and the second measuring position are determined according to the obtained size of the target structure, comprising:

[0017] a first relative position of the transfer station relative to the first measuring position is obtained by measuring a position of the transfer station at the first measuring position, wherein the first measuring position is at a preset distance from the center point of the first end surface;

[0018] a second relative position of the transfer station relative to a preset initial position is obtained by measuring a position of the transfer station at the preset initial position;

[0019] when the first relative position and the second relative position satisfy a preset adjustment condition, the preset initial position is adjusted based on the first relative position and the second relative position to obtain the second measuring position.

[0020] Optionally, when the first relative position and the second relative position satisfy a preset adjustment condition, the preset initial position is adjusted based on the first relative position and the second relative position to obtain the second measuring position, comprising:

[0021] if a deviation between the first relative position and the second relative position is greater than a preset deviation, the preset initial position is adjusted according to the deviation to obtain the second measuring position;

[0022] If a deviation between the first relative position and the second relative position is less than a preset deviation, the preset initial position is taken as the second measurement position.

[0023] Optionally, the constructing the first end face model and the second end face model based on the first measurement values and the second measurement values comprises:

[0024] The first distances between the plurality of measurement points in the first end face and a center point of the first end face are obtained, the first measurement values corresponding to the first distances are sorted in ascending order of the first distances to obtain a first sequence, the second distances between the plurality of measurement points in the second end face and the center point of the first end face are obtained, and the second measurement values corresponding to the second distances are sorted in ascending order of the second distances to obtain a second sequence.

[0025] A first difference value of adjacent first measurement values in the first sequence is determined, adjacent first measurement values with a first difference value less than a preset difference value are obtained, the adjacent first measurement values are fused to construct a first initial end face model, and adjacent first measurement values with a first difference value greater than the preset difference value and first measurement values greater than a preset measurement value are taken into the first initial end face model to obtain the first end face model.

[0026] A second difference value of adjacent second measurement values in the second sequence is determined, adjacent second measurement values with a second difference value less than the preset difference value are obtained, the adjacent second measurement values are fused to construct a second initial end face model, and adjacent second measurement values with a second difference value greater than the preset difference value and second measurement values greater than the preset measurement value are taken into the second initial end face model to obtain the second end face model.

[0027] Optionally, after the first measurement values obtained by the measuring instrument measuring a plurality of preset measurement points on the first end face at the first measurement position and the second measurement values obtained by the measuring instrument measuring a plurality of preset measurement points on the second end face at the second measurement position, the method further comprises:

[0028] The flatness of the first end face and the flatness of the second end face are compared with a preset flatness respectively, wherein the flatness of the first end face comprises a sum of the plurality of first measurement values, and the flatness of the second end face comprises a sum of the plurality of second measurement values.

[0029] When the flatness of the first end face is greater than the preset flatness and / or the flatness of the second end face is greater than the preset flatness, it is determined that the target structure is unqualified.

[0030] When the flatness of the first end face and the flatness of the second end face are both less than the preset flatness, the first end face model and the second end face model are respectively generated according to the first measurement value and the second measurement value.

[0031] Optionally, after the parallelism of the target structure is obtained according to the first end face model and the second end face model, the following steps are included:

[0032] The parallelism is compared with a preset parallelism;

[0033] When the parallelism is less than the preset parallelism, the target structure is qualified;

[0034] When the parallelism is greater than the preset parallelism, the target structure is unqualified.

[0035] In the present application, the first measurement position and the second measurement position are determined according to the size of the target structure, and the measurement values obtained by measuring the two end faces at the two measurement positions by using a measuring instrument such as a laser measuring instrument are acquired, and the first end face model and the second end face model are constructed according to the measurement values, and then the parallelism of the target structure is obtained according to the first end face model and the second end face model. Compared with the prior art, a measuring instrument with high precision such as a laser measuring instrument is used, and different measurement positions are set according to the size of each target structure, which avoids the measuring instrument being blocked when measuring the two end faces due to the large size of the target structure, and improves the precision and universality of the structure parallelism measurement to some extent. At the same time, the first end face model and the second end face model are constructed according to the measurement values, so that the end face measurement values are more intuitive and accurate, and the parallelism is fitted in the first end face model and the second end face model, which effectively improves the fitting efficiency and precision of the parallelism, reduces the calculation pressure, and further improves the efficiency and precision of the structure parallelism measurement.

[0036] In a second aspect, the present application also discloses a structure parallelism measurement device based on a measuring device, wherein the measuring device includes at least one measuring instrument, and the structure parallelism measurement device includes:

[0037] A positioning unit is configured to determine a first measurement position and a second measurement position according to the size of a target structure, wherein the target structure includes a first end face and a second end face arranged oppositely, the first measurement position is close to the first end face, and the second measurement position is close to the second end face;

[0038] A measuring unit is configured to acquire a first measurement value obtained by measuring a plurality of preset measurement points on the first end face at the first measurement position by using the measuring instrument, and a second measurement value obtained by measuring a plurality of preset measurement points on the second end face at the second measurement position by using the measuring instrument;

[0039] a modeling unit configured to construct a first end face model and a second end face model based on the first measurement value and the second measurement value;

[0040] a processing unit configured to obtain parallelism of the target structure according to the first end face model and the second end face model.

[0041] The structural parallelism measurement device provided by the present application has basically the same technical effects as the structural parallelism measurement method described above, and thus will not be described here again.

[0042] In a third aspect, the present application further discloses an electronic device, comprising a memory and a processor;

[0043] The memory is configured to store a computer program.

[0044] The processor is configured to implement the structural parallelism measurement method described above when executing the computer program.

[0045] The electronic device provided by the present application has basically the same technical effects as the structural parallelism measurement method described above, and thus will not be described here again.

[0046] In a fourth aspect, the present application further discloses a computer readable storage medium, wherein the storage medium stores a computer program, and the computer program is executed by a processor to implement the structural parallelism measurement method described above.

[0047] The computer readable storage medium provided by the present application has basically the same technical effects as the structural parallelism measurement method described above, and thus will not be described here again. BRIEF DESCRIPTION OF DRAWINGS

[0048] Figure 1 The structural parallelism measurement method of the embodiment of the present application Figure 1 ;

[0049] Figure 2 The target structure and the measurement device structure of the embodiment of the present application Figure 1 ;

[0050] Figure 3 The first end face model and the second end face model of the embodiment of the present application Figure 1 ;

[0051] Figure 4 The first end face model and the second end face model of the embodiment of the present application Figure 2 ;

[0052] Figure 5 The target structure end face preset measurement point position and number schematic diagram of the embodiment of the present application. DETAILED DESCRIPTION

[0053] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Although some embodiments of the present invention are shown in the drawings, it should be understood that the present invention can be implemented in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of the present invention. It should be understood that the accompanying drawings and embodiments of the present invention are for illustrative purposes only and are not intended to limit the scope of protection of the present invention.

[0054] It should be understood that the various steps described in the method embodiments of the present invention may be performed in different orders and / or in parallel. Furthermore, the method embodiments may include additional steps and / or omit the steps shown. The scope of the present invention is not limited in this respect.

[0055] The term "comprising" and its variations as used herein are open-ended, meaning "including but not limited to". The term "based on" means "at least partially based on". The term "one embodiment" means "at least one embodiment"; the term "another embodiment" means "at least one additional embodiment"; the term "some embodiments" means "at least some embodiments"; the term "optionally" means "optional embodiments". Definitions of other terms will be given in the following description. It should be noted that the concepts of "first", "second", etc., mentioned in this invention are used only to distinguish different devices, modules, or units, and are not intended to limit the order of functions performed by these devices, modules, or units or their interdependencies.

[0056] It should be noted that the terms "a" and "a plurality of" used in this invention are illustrative rather than restrictive. Those skilled in the art should understand that, unless otherwise expressly indicated in the context, they should be understood as "one or more".

[0057] It is understood that any part of this application relating to data acquisition or collection has been authorized.

[0058] like Figure 1 and Figure 4 As shown, the present invention provides a method for measuring structural parallelism, based on a measuring device, the measuring device including at least one measuring instrument, such as a laser measuring instrument, and the method for measuring structural parallelism including:

[0059] Step S1: Determine the first measurement position and the second measurement position based on the obtained dimensions of the target structure, wherein the target structure includes a first end face and a second end face that are set opposite to each other, the first measurement position is closer to the first end face, and the second measurement position is closer to the second end face.

[0060] It should be noted that before measuring the target structure, the target structure should be placed horizontally, and the measurement should be performed during the time of day with the smallest temperature difference, such as 1:00 AM to 2:00 AM. In this embodiment, the measurement is mainly for large structures, such as structures with a length, width, and height exceeding 6800mm x 5000mm x 9000mm. The method for measuring the parallelism of a structure is illustrated using a steel tower segment as an example.

[0061] Specifically, the dimensions of the steel tower segment should first be determined, such as length, width, and height, and the position of the measuring instrument's measuring end face should be determined based on these dimensions. In this embodiment, it is necessary to measure both end faces of the steel tower segment, namely the first end face and the second end face. Therefore, when determining the measurement position, it is important to avoid measurement blind spots and ensure that all measuring points can be measured when the measuring instrument measures the end face at that position. The measurement position can be set directly opposite or diagonally opposite the end face, such as... Figure 2 As shown in the diagram, the measurement position closer to the first end face is the first measurement position, and the measurement position closer to the second end face is the second measurement position.

[0062] Step S2: Obtain the first measurement value obtained by the measuring instrument measuring multiple preset measurement points on the first end face at the first measurement position, and the second measurement value obtained by the measuring instrument measuring multiple preset measurement points on the second end face at the second measurement position.

[0063] Specifically, multiple measuring points are evenly arranged on the first and second end faces, as shown in the figures. Figure 5 As shown, 1-112 are the preset measurement point numbers. The measurement points on both end faces have the same position and number. The measuring instrument measures the first end face at the first measurement position, obtaining the first measurement value for each measurement point on the first end face. This first measurement value represents the flatness of the first end face. For example, if measurement point A on the first end face is recessed 0.09mm into the steel tower segment, then the first measurement value for measurement point A is -0.09. If measurement point B on the first end face protrudes 0.056mm into the steel tower segment, then the first measurement value for measurement point A is +0.056. The method for obtaining the second measurement value is the same as that for obtaining the first measurement value, and will not be described again here.

[0064] Step S3: Construct a first end face model and a second end face model based on the first measurement value and the second measurement value.

[0065] Specifically, first, the difference between the first measurement values corresponding to the measurement points close in position is determined, and the first measurement values are fused based on the difference to construct an initial end face model, and the remaining larger first measurement values are brought into the initial end face model to obtain a final first end face model, wherein the larger first measurement values are represented in the form of arrows. Figure 3 As shown in FIG. 8, the arrow pointing to the positive direction of the y-axis is positive, and the arrow pointing to the negative direction of the y-axis is negative. The north box opening is the first end face model in the embodiment, and the south box opening is the second end face model in the embodiment.

[0066] In step S4, the parallelism of the target structure is obtained according to the first end face model and the second end face model.

[0067] Specifically, based on the first end face model and the second end face model, the parallelism of one of the end face models is compared with the parallelism of the other end face model to evaluate the parallelism of the steel tower segment.

[0068] In the embodiment, the first measurement position and the second measurement position are determined according to the size of the target structure, and the measurement values obtained by measuring the two end faces at the two measurement positions by using a measuring instrument such as a laser measuring instrument are obtained. The first end face model and the second end face model are constructed according to the measurement values, and the parallelism of the target structure is obtained according to the first end face model and the second end face model. Compared with the prior art, a measuring instrument with high precision such as a laser measuring instrument is used, and different measurement positions are set according to the size of each target structure to avoid the measuring instrument being blocked when measuring the two end faces due to the large size of the target structure, thereby improving the precision and universality of the structure parallelism measurement to a certain extent. At the same time, the first end face model and the second end face model are constructed according to the measurement values, so that the end face measurement values are more intuitive and accurate, and the parallelism is fitted in the first end face model and the second end face model, which effectively improves the fitting efficiency and precision of the parallelism, reduces the calculation pressure, and further improves the efficiency and precision of the structure parallelism measurement.

[0069] Optionally, the parallelism of the target structure is obtained according to the first end face model and the second end face model, including:

[0070] An axis line of the target structure is obtained, wherein the axis line is obtained by connecting the center point of the first end face model and the center point of the second end face model, as shown by the dashed line 1 in FIG. 8. Figure 4

[0071] ​Determine a first angle between the first end face model and the axis, wherein the first angle includes the angle between the first connecting line and the axis, and the first connecting line is obtained by connecting the measurement point to the edge of the first end face model, and the first connecting line is perpendicular to the edge of the first end face model to which it is connected;

[0072] Determine a second angle between the second end face model and the axis, wherein the second angle includes the angle between the second connecting line and the axis, and the second connecting line is obtained by connecting the measurement point to the edge of the second end face model, and the second connecting line is perpendicular to the edge of the second end face model to which it is connected;

[0073] The parallelism is obtained based on the first angle and the second angle.

[0074] Specifically, such as Figure 4 As shown, in the first end face model, the first connecting line is obtained by connecting the center point of the first end face model to the edge of the first end face model of the target structure (e.g., Figure 4 (See dashed lines 2 and 3 in the diagram). It should be noted that this first connecting line is perpendicular to the edge of the first end face model being connected. Solve for the angle between each first connecting line and the axis to obtain the first angle (e.g., ...). Figure 4 (Angles a-89.992° and b-90.002° in the original text). The method for obtaining the second angle is the same as that for the first angle, and will not be repeated here. Then, using, for example, CAD software and / or corresponding calculation methods, the first and second angles are converted into numerical values. For example, when the first angle is 90°, the value is 0. All values ​​are added together to obtain the parallelism of the target structure, such as... Figure 4 In the calculation, using the south-facing opening as the reference, the parallelism between the north-facing opening and the south-facing opening is 0.155. This effectively improves the accuracy and efficiency of calculating the parallelism of the target structure's end faces.

[0075] Optionally, the measuring device includes at least one transfer station, which is disposed between the first measuring position and the second measuring position; determining the first measuring position and the second measuring position based on the obtained dimensions of the target structure includes:

[0076] The measuring instrument measures the position of the transfer station at a preset initial position to obtain a second relative position of the transfer station relative to the preset initial position, wherein the preset initial position and the first measuring position are symmetrical about the central cross-section of the target structure, and the central cross-section passes through the center of the target structure and is parallel to the first end face or the second end face;

[0077] When the first relative position and the second relative position satisfy a preset adjustment condition, the preset initial position is adjusted based on the first relative position and the second relative position to obtain the second measurement position.

[0078] Specifically, a first measurement position is set at a preset position away from the first end face, which can be directly opposite to the first end face or obliquely opposite to the first end face, such as position C in FIG. 1. Figure 2 However, it should be noted that the measuring instrument should be able to detect all preset measurement points in the first end face at any position to ensure measurement accuracy. The first measurement position is symmetric about a central cross section of the target structure, such as position D in FIG. 1, where the central cross section passes through the center of the target structure and is perpendicular to the bottom surface of the target structure. It should be noted that the structure needs to be placed horizontally before parallelism measurement, and the bottom surface of the target structure is parallel to the ground. Figure 2

[0079] The measuring device further comprises at least one transfer station, which can be a marker such as a steel ball. In the present embodiment, the number of transfer stations is set to four, such as transfer station 1, transfer station 2, transfer station 3 and transfer station 4 shown in FIG. 1. Figure 2 First, the transfer stations are measured at the preset first measurement position using the measuring instrument, and four first relative positions are obtained. A coordinate system is then constructed based on the first relative positions, for example, with the first measurement position as the origin, the first measurement position (0, 0), the first relative positions (1, 0), (2, 0), (1.25, -1) and (1.75, -1). Then, the transfer stations are measured at the preset initial position using the measuring instrument, and four second relative positions are obtained. Based on the constructed coordinate system, it is determined whether the first relative positions and the second relative positions satisfy the preset adjustment condition, for example, whether the first relative positions and the second relative positions are the same. The second measurement position is adjusted according to the first relative positions and the second relative positions, so that the second relative positions measured by the measuring instrument at the adjusted second measurement position satisfy the preset adjustment condition. In the present embodiment, the preset at least one transfer station is used to obtain the first relative positions and the second relative positions at the first measurement position and the preset initial position respectively, and it is determined whether the first relative positions and the second relative positions satisfy the preset adjustment condition, so as to further accurately determine the second measurement position and increase the accuracy of the second end face measurement.

[0080] Optionally, when the first relative position and the second relative position satisfy a preset adjustment condition, the preset initial position is adjusted based on the first relative position and the second relative position to obtain the second measurement position, comprising:

[0081] ​if the deviation between the first relative position and the second relative position is greater than a preset deviation, adjusting the preset initial position according to the deviation to obtain the second measurement position;

[0082] if the deviation between the first relative position and the second relative position is less than a preset deviation, taking the preset initial position as the second measurement position.

[0083] Specifically, in the embodiment, the preset adjustment condition is set as that the deviation between the first relative position and the second relative position is greater than a preset deviation, for example, the preset deviation is 0.2 mm, the first relative position includes (1, 0), (2, 0), (1.25, -1), (1.75, -1), and the second relative position includes (1, 0), (2, 0.1), (1.25, -1), (1.75, -1), the deviation between (2, 0) in the first relative position and (2, 0.1) in the second relative position is 0.1, and the deviation between the first relative position and the second relative position is 0.1 which is less than the preset deviation 0.2, so the preset adjustment condition is not met, and the preset initial position is taken as the second measurement position; if the first relative position includes (1, 0), (2, 0), (1.25, -1), (1.75, -1), and the second relative position includes (1, 0), (2, 0), (2, -1), (1.75, -1), the deviation between (1.25, -1) in the first relative position and (2, -1) in the second relative position is 0.75, and the deviation between the first relative position and the second relative position is 0.75 which is greater than the preset deviation 0.2, so the preset adjustment condition is met, and the preset initial position needs to be adjusted to make the corresponding second relative position measured between (1.05, -1) and (1.45, -1). The preset deviation is set in the embodiment to verify the preset initial position, and the second measurement position is obtained based on the verification result, thereby improving the accuracy of the target structure end face measurement.

[0084] Optionally, the constructing the first end face model and the second end face model based on the first measurement value and the second measurement value comprises:

[0085] obtaining first distances between the plurality of measurement points in the first end face and a center point of the first end face, sorting the corresponding first measurement values according to the first distances from small to large to obtain a first sequence, obtaining second distances between the plurality of measurement points in the second end face and the center point of the first end face, and sorting the corresponding second measurement values according to the second distances from small to large to obtain a second sequence;

[0086] Determine the first difference between adjacent first measurement values ​​in the first sequence, obtain adjacent first measurement values ​​whose first difference is less than a preset difference, fuse adjacent first measurement values ​​to construct a first initial end face model, and input adjacent first measurement values ​​whose first difference is greater than the preset difference and first measurement values ​​greater than the preset measurement value into the first initial end face model to obtain the first end face model.

[0087] Determine the second difference between adjacent second measurements in the second sequence, obtain adjacent second measurements whose second difference is less than the preset difference, fuse the adjacent second measurements to construct a second initial end face model, and input the adjacent second measurements whose second difference is greater than the preset difference and the second measurements greater than the preset difference into the second initial end face model to obtain the second end face model.

[0088] Specifically, before constructing the first end face model and the second end face model, a preset end face model perpendicular to the bottom surface, or a preset end face model parallel to the first or second end face, can be set as the basis for constructing the first and second end face models. For example... Figure 5 As shown, for example, the first distance between measurement point 83 and the center point is the smallest, followed by measurement points 85, 86, and 87. The first measurement value corresponding to measurement point 85 is 0.028, the first measurement value corresponding to measurement point 86 is -0.007, the first measurement value corresponding to measurement point 83 is -0.046, and the first measurement value corresponding to measurement point 87 is 0.007. Therefore, the first sequence is {-0.046, 0.028, -0.007, 0.007...}. The method for obtaining the second sequence is the same as the method for obtaining the first sequence, and will not be described again here.

[0089] The process involves determining the first difference between any two adjacent first measurements and comparing this first difference with a preset difference. When the first difference is less than the preset difference, the two adjacent first measurements are merged. For example, if the difference between measurement point 85 and measurement point 83 is 0.074 and the preset difference is 0.080, then the measurements of 85 and 83 are merged to construct a first initial end face model. This includes: obtaining the ratio of each adjacent first measurement to the first difference to obtain a first ratio and a second ratio; when the absolute value of the first ratio is greater than the absolute value of the second ratio, determining the offset direction based on the positive / negative value of the first measurement corresponding to the first ratio; and based on the corresponding first spacing, offsetting a first distance in the offset direction with a direction perpendicular to the ground (or with a pre-constructed preset cross-sectional model as a reference) to obtain a first model construction point. The first distance includes the difference between the absolute values ​​of adjacent first measurements. For example, if the difference between measurement point 85 and measurement point 83 is 0.074 and the preset difference is 0.080, then the first ratio is - The second ratio is If the absolute value of the first ratio is greater than the absolute value of the second ratio, then the direction is towards the first measured value corresponding to measurement point number 85 (e.g., Figure 3 In the middle, the first model construction point is obtained by offsetting a first distance (0.046-0.028=0.018) in the negative y-axis direction. Conversely, when the second ratio is greater than the first ratio, the offset is made in the direction determined by the positive / negative value of the first measurement corresponding to the second ratio. This process is repeated until all first measurement values ​​are calculated, resulting in multiple first model construction points. Each first model construction point is connected, and a first initial end face model is generated based on the connecting lines and the dimensions of the first end face (e.g., the length, width, and height of the first end face). Then, adjacent first measurement values ​​with a first difference greater than a preset difference (it should be noted that if one of the first measurement values ​​has been merged with other first measurement values, only the first measurement values ​​that have not been merged are obtained) and first measurement values ​​greater than the preset measurement value are obtained and substituted into the first initial end face model. The positive and negative values ​​are marked with arrows to obtain the first end face model, as shown below. Figure 3 The north-facing opening of the box.

[0090] Determine the second difference value of each two adjacent second measurement values, and compare the second difference value with the preset difference value, when the second difference value is less than the preset difference value, fuse the adjacent two second measurement values, construct the second initial end face model, including: obtain the ratio of each of the adjacent second measurement values and the second difference value, get the third ratio and the fourth ratio, when the absolute value of the third ratio is greater than the absolute value of the fourth ratio, determine the offset direction according to the positive / negative value of the second measurement value corresponding to the third ratio, offset a second distance in the direction perpendicular to the ground (or take the pre-constructed preset section model as the reference) based on the corresponding second spacing, get the second model construction point, wherein the second distance includes the difference of the absolute values of the adjacent second measurement values. Conversely, when the fourth ratio is greater than the third ratio, offset to the offset direction determined by the positive / negative value of the second measurement value corresponding to the fourth ratio. By analogy, until all second measurement values are calculated, get a plurality of second model construction points, connect each of the second model construction points, generate a second initial end face model based on the connecting line and the size of the second end face (such as the length, width and height of the second end face). Then obtain the adjacent second measurement values whose second difference value is greater than the preset difference value (it should be noted that if one of the second measurement values has been fused with other second measurement values, only the second measurement values that have not been fused are obtained) and the second measurement values that are greater than the preset measurement value, and bring them into the second initial end face model, and identify them in the form of arrows according to the positive / negative values, get the second end face model, such as Figure 3 the south box opening in

[0091] Optionally, after the first measurement values obtained by the measuring instrument measuring the plurality of measurement points preset on the first end face at the first measurement position, and the second measurement values obtained by the measuring instrument measuring the plurality of measurement points preset on the second end face at the second measurement position, the method further comprises:

[0092] Compare the flatness of the first end face and the flatness of the second end face with the preset flatness respectively, wherein the flatness of the first end face includes the sum of the plurality of first measurement values, and the flatness of the second end face includes the sum of the plurality of second measurement values;

[0093] When the flatness of the first end face is greater than the preset flatness, and / or the flatness of the second end face is greater than the preset flatness, it is judged that the target structure is unqualified;

[0094] When the flatness of the first end face and the flatness of the second end face are both less than the preset flatness, generate the first end face model and the second end face model according to the first measurement values and the second measurement values respectively.

[0095] Specifically, after obtaining the first measurement value and the second measurement value, sums of the first measurement value and the second measurement value are obtained respectively to obtain the flatness of the first end face and the second end face, such as Figure 3 In the embodiment, the flatness of the north box mouth (the first end face) is 0.123, and the flatness of the south box mouth (the second end face) is 0.150. Comparing the flatness of each end face with a preset flatness, in the embodiment, the preset flatness is 0.25 mm. When the flatness of any end face is greater than 0.25 mm, it indicates that the end face of the target structure does not meet the building requirements, and the target structure is directly determined to be unqualified. If the flatness of the two end faces is less than the preset flatness, it indicates that the end face of the target structure meets the building requirements, and the steps of constructing the first end face model and the second end face model are executed. The target structure is preliminarily inspected according to the flatness of the end face before the first end face model and the second end face model are constructed, so as to avoid subsequent invalid measurement, reduce useless work, and increase measurement efficiency.

[0096] Optionally, after the parallelism of the target structure is obtained according to the first end face model and the second end face model, the method further includes:

[0097] Comparing the parallelism with a preset parallelism;

[0098] When the parallelism is less than the preset parallelism, the target structure is qualified;

[0099] When the parallelism is greater than the preset parallelism, the target structure is unqualified.

[0100] The embodiment further discloses a structure parallelism measurement device based on the measurement device, the measurement device including at least one measuring instrument, and the structure parallelism measurement device including:

[0101] A positioning unit is configured to determine a first measurement position and a second measurement position according to the size of the target structure, wherein the target structure includes a first end face and a second end face arranged oppositely, the first measurement position is close to the first end face, and the second measurement position is close to the second end face;

[0102] A measurement unit is configured to obtain a first measurement value obtained by measuring a plurality of preset measurement points on the first end face by the measuring instrument at the first measurement position, and a second measurement value obtained by measuring a plurality of preset measurement points on the second end face by the measuring instrument at the second measurement position;

[0103] A modeling unit is configured to construct a first end face model and a second end face model based on the first measurement value and the second measurement value;

[0104] A processing unit is configured to obtain the parallelism of the target structure according to the first end face model and the second end face model.

[0105] The structural parallelism measurement device and the structural parallelism measurement method provided by the present application can produce basically the same technical effects, which will not be repeated here.

[0106] The embodiment also discloses an electronic device, including a memory and a processor; the memory is used for storing a computer program; the processor is used for realizing the structural parallelism measurement method as described above when the computer program is executed.

[0107] The electronic device and the structural parallelism measurement method provided by the present application can produce basically the same technical effects, which will not be repeated here.

[0108] The embodiment also discloses a computer readable storage medium, the storage medium stores a computer program, when the computer program is executed by a processor, the structural parallelism measurement method as described above is realized.

[0109] The computer readable storage medium and the structural parallelism measurement method provided by the present application can produce basically the same technical effects, which will not be repeated here.

[0110] Electronic devices that can be servers or clients of the present application will now be described, which are examples of hardware devices that can be applied to various aspects of the present application. The electronic devices are intended to represent a wide range of digital electronic computing devices, such as laptops, desktops, workstations, personal digital assistants, servers, blade servers, mainframes, and other appropriate computing devices. The electronic devices can also represent a wide range of mobile devices, such as personal digital processing, cellular phones, smart phones, wearable devices, and other similar computing devices. The components, their connections, and relationships, and their functions, as described herein, are meant to be examples only, and are not intended to limit implementations of the present application described and / or claimed in this document.

[0111] The electronic device includes a computing unit that can perform various appropriate actions and processes according to a computer program stored in a read-only memory (ROM) or a computer program loaded from a storage unit into a random access memory (RAM). In the RAM, various programs and data required for device operation can also be stored. The computing unit, the ROM, and the RAM are connected to each other through a bus. An input / output (I / O) interface is also connected to the bus.

[0112] Those skilled in the art can understand that all or part of the processes in the above-mentioned embodiment methods can be completed by a computer program instructing relevant hardware, and the program can be stored in a computer readable storage medium. When the program is executed, the program can include the processes of the above-mentioned embodiment methods. The storage medium can be a magnetic disc, an optical disc, a read-only memory (ROM), a random access memory (RAM), or the like. In this application, the units described as separate components can or can not be physically separated, and the components shown as units can or can not be physical units, that is, they can be located in one place, or they can be distributed on multiple network units. Part or all of the units can be selected according to actual needs to achieve the purpose of the embodiment of the present application. In addition, the functional units in each embodiment of the present application can be integrated in one processing unit, or each unit can exist physically independently, or two or more units can be integrated in one unit. The integrated unit can be realized in the form of hardware or in the form of a software functional unit.

[0113] Although the present application is disclosed as above, the protection scope of the present application is not limited to this. Those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present application, and these changes and modifications will fall within the protection scope of the present application.

Claims

1. A method of measuring the parallelism of a structure, characterized by, The structure parallelism measurement method comprises the following steps of: According to the size of the target structure, a first measurement position and a second measurement position are determined, wherein the target structure comprises a first end face and a second end face arranged oppositely, the first measurement position is close to the first end face, the second measurement position is close to the second end face, and the measurement device comprises at least one transfer station, and the transfer station is arranged between the first measurement position and the second measurement position; the first measurement position and the second measurement position are determined according to the size of the target structure, comprising the following steps of: A first relative position of the transfer station relative to the first measurement position is obtained by measuring the position of the transfer station at the first measurement position by the measurement instrument, wherein the first measurement position is at a preset distance from the center point of the first end face; A second relative position of the transfer station relative to a preset initial position is obtained by measuring the position of the transfer station at the preset initial position by the measurement instrument; When the first relative position and the second relative position satisfy a preset adjustment condition, the preset initial position is adjusted based on the first relative position and the second relative position to obtain the second measurement position; First measurement values obtained by measuring a plurality of measurement points preset on the first end face at the first measurement position by the measurement instrument and second measurement values obtained by measuring a plurality of measurement points preset on the second end face at the second measurement position by the measurement instrument are obtained; First end face models and second end face models are constructed based on the first measurement values and the second measurement values, comprising the following steps of: First intervals between the plurality of measurement points in the first end face and the center point of the first end face are obtained, the corresponding first measurement values are sorted in ascending order of the first intervals to obtain a first sequence, second intervals between the plurality of measurement points in the second end face and the center point of the first end face are obtained, and the corresponding second measurement values are sorted in ascending order of the second intervals to obtain a second sequence; First difference values of adjacent first measurement values in the first sequence are determined, adjacent first measurement values with first difference values less than a preset difference value are obtained, adjacent first measurement values are fused, a first initial end face model is constructed, adjacent first measurement values with first difference values greater than the preset difference value and first measurement values greater than a preset measurement value are brought into the first initial end face model, and the first end face model is obtained; Second difference values of adjacent second measurement values in the second sequence are determined, adjacent second measurement values with second difference values less than the preset difference value are obtained, adjacent second measurement values are fused, a second initial end face model is constructed, adjacent second measurement values with second difference values greater than the preset difference value and second measurement values greater than the preset measurement value are brought into the second initial end face model, and the second end face model is obtained; The parallelism of the target structure is obtained according to the first end face model and the second end face model.

2. The method of claim 1, wherein The parallelism of the target structure is obtained according to the first end face model and the second end face model, and the method comprises the steps of: obtaining an axis of the target structure, wherein the axis is obtained by connecting a center point of the first end face model and a center point of the second end face model; determining a first angle between the first end face model and the axis, wherein the first angle comprises an included angle between a first connecting line and the axis, the first connecting line being obtained by connecting the measuring point to an edge of the first end face model, and the first connecting line being perpendicular to the connected edge of the first end face model; determining a second angle between the second end face model and the axis, wherein the second angle comprises an included angle between a second connecting line and the axis, the second connecting line being obtained by connecting the measuring point to an edge of the second end face model, and the second connecting line being perpendicular to the connected edge of the second end face model; obtaining the parallelism according to the first angle and the second angle.

3. The method of claim 1, wherein When the first relative position and the second relative position satisfy a preset adjustment condition, the preset initial position is adjusted based on the first relative position and the second relative position to obtain the second measurement position, and the method comprises the steps of: if a deviation between the first relative position and the second relative position is greater than a preset deviation, then the preset initial position is adjusted according to the deviation to obtain the second measurement position; if the deviation between the first relative position and the second relative position is less than the preset deviation, then the preset initial position is taken as the second measurement position.

4. The method of claim 1, wherein After the first measurement values obtained by the measuring instrument at the first measurement position on the plurality of preset measurement points on the first end face, and the second measurement values obtained by the measuring instrument at the second measurement position on the plurality of preset measurement points on the second end face are obtained, the method further comprises the steps of: comparing the flatness of the first end face and the flatness of the second end face with a preset flatness, respectively, wherein the flatness of the first end face comprises a sum of the plurality of first measurement values, and the flatness of the second end face comprises a sum of the plurality of second measurement values; when the flatness of the first end face is greater than the preset flatness, and / or the flatness of the second end face is greater than the preset flatness, it is determined that the target structure is unqualified; when the flatness of the first end face and the flatness of the second end face are both less than the preset flatness, the first end face model and the second end face model are respectively generated according to the first measurement values and the second measurement values.

5. The method of claim 1, wherein After the parallelism of the target structure is obtained according to the first end face model and the second end face model, the method comprises the steps of: comparing the parallelism with a preset parallelism; when the parallelism is less than the preset parallelism, then the target structure is qualified; when the parallelism is greater than the preset parallelism, then the target structure is unqualified.

6. A structure parallelism measuring device characterized by comprising: The structure parallelism measurement device comprises at least one measuring instrument. The positioning unit is configured to determine a first measurement position and a second measurement position according to the obtained size of the target structure, wherein the target structure comprises a first end face and a second end face arranged oppositely, the first measurement position is close to the first end face, and the second measurement position is close to the second end face, the measurement device comprises at least one transfer station, and the transfer station is arranged between the first measurement position and the second measurement position; the first measurement position and the second measurement position are determined according to the obtained size of the target structure, comprising: obtaining a first relative position of the transfer station relative to the first measurement position by measuring the position of the transfer station at the first measurement position by the measuring instrument, wherein the first measurement position is at a preset distance from the center point of the first end face; obtaining a second relative position of the transfer station relative to a preset initial position by measuring the position of the transfer station at the preset initial position by the measuring instrument; when the first relative position and the second relative position satisfy a preset adjustment condition, adjusting the preset initial position based on the first relative position and the second relative position to obtain the second measurement position; The measurement unit is configured to obtain first measurement values obtained by measuring a plurality of measurement points pre-set on the first end face at the first measurement position by the measuring instrument, and second measurement values obtained by measuring a plurality of measurement points pre-set on the second end face at the second measurement position by the measuring instrument; The modeling unit is configured to construct a first end face model and a second end face model based on the first measurement values and the second measurement values, comprising: obtaining first intervals between a plurality of the measurement points in the first end face and a center point of the first end face, sorting the corresponding first measurement values in a descending order of the first intervals to obtain a first sequence, obtaining second intervals between a plurality of the measurement points in the second end face and the center point of the first end face, sorting the corresponding second measurement values in a descending order of the second intervals to obtain a second sequence; determining first difference values of adjacent first measurement values in the first sequence, obtaining adjacent first measurement values with first difference values less than a preset difference value, fusing the adjacent first measurement values to construct a first initial end face model, and bringing adjacent first measurement values with first difference values greater than the preset difference value and the first measurement values greater than a preset measurement value into the first initial end face model to obtain the first end face model; determining second difference values of adjacent second measurement values in the second sequence, obtaining adjacent second measurement values with second difference values less than the preset difference value, fusing the adjacent second measurement values to construct a second initial end face model, and bringing adjacent second measurement values with second difference values greater than the preset difference value and the second measurement values greater than the preset measurement value into the second initial end face model to obtain the second end face model; The processing unit is configured to obtain parallelism of the target structure according to the first end face model and the second end face model.

7. An electronic device, comprising: comprising a memory and a processor; The memory is configured to store a computer program. The processor is configured to implement the structural parallelism measurement method according to any one of claims 1-5 when executing the computer program.

8. A computer-readable storage medium, characterized in that, The storage medium has a computer program stored thereon, and the computer program, when executed by a processor, implements the structural parallelism measurement method according to any one of claims 1-5.

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