Photomask defect inspection device and photomask defect inspection method

Abstract

The present application relates to a photomask defect inspection device and a photomask defect inspection method. The photomask defect inspection device includes: a base; a carrier, which is arranged on the base and used to carry the photomask; a plurality of positioning mechanisms, which are arranged on the base and are arranged at intervals around the outer peripheral side of the carrier; each positioning mechanism can move in a direction close to or away from the carrier; the positioning mechanism is used to contact the side of the photomask to position the photomask; each positioning mechanism is provided with a sensor; a processor, which is connected to the sensor in communication; the sensor responds to the contact between the positioning mechanism and the side of the photomask and transmits basic information of the photomask to the processor. The scanner is arranged on the side of the carrier away from the base and is spaced from the base; the scanner is connected to the processor in communication to transmit the scanning information of the photomask. In this way, there is no need to pre-process the photomask before defect inspection, which facilitates rapid confirmation of the inspection area of ​​the photomask and improves the inspection efficiency.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to a photomask defect inspection device and a photomask defect inspection method. Background Art

[0002] The photolithography mask, also known as the photomask, is the master pattern used in the photolithography process of integrated circuits. The production process of a product chip usually requires up to dozens of photolithography processes, and each photolithography process requires a photomask. Through photolithography technology, the pattern is copied onto the wafer in a manner similar to photo development. The quality of the photomask affects the quality of the product. When the photomask is irradiated by the laser of the photolithography machine for a certain period of time, a haze defect will be generated. Once a haze defect is generated, it will have a great impact on the yield of the product. The photomask can usually only be sent back to the photomask factory for repair. Therefore, it is particularly important to monitor the defect status of the photomask in real time so that the photomask with haze defects can be repaired in advance to ensure product quality and reduce the risk of line stoppage. The photomask defect inspection station combines image scanning technology with advanced image processing technology to capture defects on the photomask. The current photomask defect inspection station has the following problems: the photomask needs to be pre-processed before entering the inspection and calibration steps, which reduces the efficiency of defect inspection. Summary of the invention

[0003] Based on this, it is necessary to provide a photomask defect inspection device and a photomask defect inspection method to address the above problems.

[0004] In a first aspect, the present application provides a photomask defect inspection device, comprising:

[0005] Base;

[0006] A carrying platform, disposed on the base and used for carrying the photomask;

[0007] A plurality of positioning mechanisms are arranged on the base and are arranged at intervals around the outer peripheral side of the supporting platform; each of the positioning mechanisms can move toward or away from the supporting platform; the positioning mechanisms are used to contact the side of the photomask to position the photomask; each of the positioning mechanisms is provided with a sensor;

[0008] A processor is communicatively connected to the sensor; the sensor transmits basic information of the photomask to the processor in response to the contact between the positioning mechanism and the side of the photomask;

[0009] The scanner is arranged on a side of the carrier platform away from the base and spaced apart from the base; the scanner is communicatively connected with the processor to transmit scanning information of the photomask.

[0010] In one embodiment, the positioning mechanism comprises:

[0011] A first sliding block is movably disposed on the base; and

[0012] A limiting member is arranged on a side of the first sliding block away from the base; a limiting surface is arranged on the limiting member, and the limiting surface faces the bearing platform;

[0013] Wherein, the sensor is arranged on the first sliding block, a contact switch is arranged on the limit surface, and the contact switch is electrically connected to the sensor.

[0014] In one embodiment, the scanner comprises a three-dimensional scanner.

[0015] In one embodiment, the photomask defect inspection device further includes a side plate structure and a top plate, wherein the side plate structure is disposed on a side of the base close to the carrier platform and surrounds the outer periphery of the carrier platform and the positioning mechanism, and the top plate is disposed on a side of the side plate structure away from the base;

[0016] Wherein, the three-dimensional scanner is arranged on a side of the top plate close to the base, and can move toward or away from the base.

[0017] In one embodiment, the photomask defect inspection device also includes a mounting plate and a driving member, wherein the mounting plate is disposed on a side of the top plate close to the base, the three-dimensional scanner is disposed on a side of the mounting plate close to the base, the driving member is disposed on the top plate and is transmission-connected to the mounting plate, and the driving member is used to drive the mounting plate to move toward or away from the base.

[0018] In one of the embodiments, a first guide rail is provided on one side of the mounting plate close to the base, and the three-dimensional scanner is movably disposed on the first guide rail.

[0019] In one embodiment, the photomask defect inspection device further comprises a connecting plate and a connecting rod, wherein the connecting plate is disposed on a side of the top plate away from the base, the driving member is disposed between the top plate and the connecting plate, the fixed end of the driving member is connected to the top plate, and the movable end of the driving member is connected to the connecting plate;

[0020] The connecting rod is movably arranged along its own axial direction and penetrates the top plate, and connects the connecting plate and the mounting plate.

[0021] In one of the embodiments, a first light-transmitting plate is further provided on a side of the three-dimensional scanner close to the base, and the first light-transmitting plate is connected to the connecting rod.

[0022] In one embodiment, the side panel structure includes a first side panel and a second side panel, the first side panel and the second side panel are connected to each other and are jointly formed to form a receiving space for accommodating the base and the supporting platform;

[0023] Wherein, a sliding mechanism is provided at the joint between the first side plate and the second side plate, so that the first side plate can slide relative to the second side plate along the gravity direction.

[0024] In one embodiment, a braking mechanism is further provided at the joint between the first side plate and the second side plate.

[0025] In one embodiment, the second side panel is a light-shielding structure;

[0026] The first side plate includes a second light-transmitting plate and an electrochromic layer disposed on the second light-transmitting plate, and the electrochromic layer is used to change the light transmittance of the first side plate.

[0027] In one of the embodiments, the photomask defect inspection device further includes: a memory, a controller and a touch screen, and the memory, the controller and the touch screen are all electrically connected to the processor.

[0028] In one embodiment, the photomask defect inspection device further includes a plurality of second guide rails, which are spaced apart and arranged radially around the outer periphery of the carrier platform; and the plurality of positioning mechanisms are disposed one by one on the plurality of second guide rails.

[0029] In the photomask defect inspection device provided in the embodiment of the present application, when performing defect inspection, the photomask is placed on the carrier, and while the positioning mechanism positions the photomask, the sensor can transmit the basic information of the photomask (such as position information and size information) to the processor, and then the scanner scans the photomask, and the processor obtains the basic information and scanning information for further processing. In this way, there is no need to pre-process the photomask before defect inspection, which facilitates rapid confirmation of the inspection area of ​​the photomask and improves inspection efficiency.

[0030] In a second aspect, an embodiment of the present application provides a photomask defect inspection method, which uses a photomask defect inspection device for inspection, wherein the photomask defect inspection device includes a base, a carrier, a plurality of positioning mechanisms, a processor, and a scanner; the carrier is disposed on the base and is used to carry the photomask; a plurality of positioning mechanisms are disposed on the base and are spaced around the outer periphery of the carrier; a sensor is disposed on each of the positioning mechanisms; the scanner is disposed on a side of the carrier away from the base and is spaced from the base; the sensor, the scanner, and the processor are in communication connection;

[0031] Photomask defect inspection methods include:

[0032] The positioning mechanism positions the photomask;

[0033] The sensor transmits basic information of the photomask to the processor;

[0034] The scanner scans the photomask and transmits scanning information of the photomask to the processor;

[0035] The processor processes the basic information and the scanning information and outputs a visual model.

[0036] In the photomask defect inspection method provided in the embodiment of the present application, when performing defect inspection, the photomask is placed on the carrier, and while the positioning mechanism positions the photomask, the sensor can transmit the basic information of the photomask (such as position information and size information) to the processor, and then the processor processes the acquired scanning information and basic information and outputs a visual model. In this way, there is no need to pre-process the photomask before performing defect inspection, which facilitates rapid confirmation of the inspection area of ​​the photomask and improves inspection efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the conventional technology, the drawings required for use in the embodiments or the conventional technology descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0038] FIG. 1 is a schematic structural diagram of a photomask defect inspection device provided in an embodiment of the present application at a first viewing angle.

[0039] FIG. 2 is a schematic structural diagram of a photomask defect inspection device provided by an embodiment of the present application at a second viewing angle.

[0040] FIG. 3 is a schematic structural diagram of a portion of the photomask defect inspection device shown in FIG. 1 at a third viewing angle.

[0041] FIG. 4 is a schematic structural diagram of a positioning mechanism of the photomask defect inspection device shown in FIG. 3 .

[0042] FIG. 5 is a schematic structural diagram of a portion of the photomask defect inspection device shown in FIG. 1 at a fourth viewing angle.

[0043] FIG. 6 is a schematic structural diagram of a scanning mechanism of the photomask defect inspection device shown in FIG. 1 .

[0044] FIG. 7 is a schematic structural diagram of a light shielding mechanism of the photomask defect inspection device shown in FIG. 1 .

[0045] FIG. 8 is a schematic diagram showing the structure of a data processing mechanism of the photomask defect inspection device shown in FIG. 1 .

[0046] FIG. 9 is a schematic flow chart of a photomask defect inspection method provided in accordance with an embodiment of the present application.

[0047] Reference numerals:

[0048] 1. Photomask defect inspection device; 10. Carrying mechanism; 11. Base; 12. Carrying platform; 13. Second guide rail; 20. Positioning mechanism; 21. First slider; 22. Limiting member; 221. Limiting surface; 222. Contact switch; 23. Sensor; 30. Shading mechanism; 31. Side panel structure; 311. First side panel; 3111. Frame; 3112. Second light-transmitting panel; 3113. Handle; 3114. Electrochromic layer; 312. Second side panel; 313. Slide rail; 314. Second slider; 315. Braking mechanism; 32. Top panel; 40. Scanning mechanism; 41. Three-dimensional scanner; 42. Mounting plate; 43. Driving member; 44. First guide rail; 45. Connecting plate; 46. Connecting rod; 47. First light-transmitting plate; 50. Data processing mechanism; 51. Processor; 52. Memory; 53. Controller; 54. Touch screen; 55. Base; 56. Box body. DETAILED DESCRIPTION

[0049] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0050] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0051] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0052] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0053] In the present application, unless otherwise clearly specified and limited, a first feature being “above” or “below” a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being “above”, “above”, and “above” a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being “below”, “below”, and “below” a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0054] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used herein are for illustrative purposes only and are not intended to be the only implementation method.

[0055] When used herein, the singular forms "a", "an", and "said / the" may also include plural forms, unless the context clearly indicates otherwise. It should also be understood that the terms "include / comprise" or "have" and the like specify the presence of stated features, wholes, steps, operations, components, parts, or combinations thereof, but do not exclude the possibility of the presence or addition of one or more other features, wholes, steps, operations, components, parts, or combinations thereof. At the same time, in this specification, the term "and / or" includes any and all combinations of the relevant listed items.

[0056] In the first aspect, as shown in FIG. 1 , FIG. 2 and FIG. 3 , an embodiment of the present application provides a photomask defect inspection device 1, which includes a base 11, a carrier 12, a scanner and a plurality of positioning mechanisms 20. The carrier 12 is disposed on the base 11, and the carrier 12 is used to carry a photomask. The plurality of positioning mechanisms 20 are disposed on the base 11, and are arranged at intervals around the outer peripheral side of the carrier 12. Each positioning mechanism 20 can move in a direction close to or away from the carrier 12. The positioning mechanism 20 is used to contact the side of the photomask to position the photomask. It can be understood that the photomask can be a mask, a photomask plate, etc. A sensor 23 is provided on each positioning mechanism 20. The processor 51 is connected to the sensor 23 in communication. In response to the contact between the positioning mechanism 20 and the side of the photomask, the sensor 23 transmits basic information of the photomask to the processor 51. The scanner is disposed on the side of the carrier 12 away from the base 11, and is spaced from the base 11. The scanner is connected to the processor 51 for communication so as to transmit the scanning information of the photomask, wherein the scanning information at least includes the surface pattern information of the photomask.

[0057] Exemplarily, the basic information may include size information, position information, etc. of the photomask.

[0058] In the embodiment of the present application, after the positioning mechanism 20 positions the photomask, the side of the photomask contacts the positioning mechanism 20 . At this time, the sensor 23 transmits basic information of the photomask to the processor 51 .

[0059] In a possible embodiment, the sensor 23 is a position sensor 23. When the side of the photomask contacts the positioning mechanism 20, the sensor 23 can obtain current position information, and combined with the position information of the sensor 23 on each positioning mechanism 20, the size information of the photomask can be obtained.

[0060] In the photomask defect inspection device 1 provided in the embodiment of the present application, when performing defect inspection, the photomask is placed on the carrier 12, and while the positioning mechanism 20 positions the photomask, the sensor 23 can transmit the basic information of the photomask (such as position information and size information) to the processor 51, and then the scanner scans the photomask, and the processor 51 obtains the basic information and scanning information and performs further processing. In this way, before performing defect inspection, there is no need to pre-process the photomask, which facilitates rapid confirmation of the inspection area of ​​the photomask, thereby improving inspection efficiency.

[0061] It is understandable that the photomask defect inspection device 1 may further include a carrying mechanism 10, a light shielding mechanism 30, a scanning mechanism 40 and a data processing mechanism 50. The carrying mechanism 10 includes a base 11 and a carrying platform 12, and the scanning mechanism 40 includes a scanner.

[0062] In one embodiment, there are four positioning mechanisms 20, and the four positioning mechanisms 20 are evenly arranged on the outer periphery of the carrier 12. In this way, the photomask can be accurately positioned.

[0063] In one embodiment, as shown in FIG. 3 and FIG. 4 , the positioning mechanism 20 further includes a first slider 21 and a limiter 22. The first slider 21 is movably disposed on the base 11. The limiter 22 is disposed on a side of the first slider 21 away from the base 11. A limit surface 221 is disposed on the limiter 22, and the limit surface 221 faces the support platform 12. The sensor 23 is disposed on the first slider 21, and a contact switch 222 is disposed on the limit surface 221, and the contact switch 222 is electrically connected to the sensor 23.

[0064] In this way, when the side of the photomask contacts the limiting surface 221 , the positioning mechanism 20 realizes the positioning of the photomask. At this time, the contact switch 222 contacts the photomask, and the sensor 23 transmits the basic information of the photomask to the processor 51 .

[0065] In one embodiment, as shown in FIG. 4 , the limiting member 22 is an L-shaped structure, and a surface of the L-shaped structure close to the support platform 12 is a limiting surface 221, that is, the inner surface of the L-shaped structure is the limiting surface 221. In this way, by providing four positioning mechanisms 20, each positioning mechanism 20 can position a corner of a quadrilateral photomask, so that the positioning accuracy of the positioning mechanism 20 is higher.

[0066] Furthermore, the sensor 23 may be disposed at a corner of the L-shaped limiting member 22 .

[0067] It is understandable that the limiting member 22 may also be an arc-shaped structure, so that the limiting member 22 can match the edge of the circular photomask.

[0068] In one embodiment, as shown in FIG. 5 and FIG. 6 , the scanner is a three-dimensional scanner 41. The three-dimensional scanner 41 is connected to the processor 51 for communication to transmit three-dimensional scanning information of the photomask. Here, the three-dimensional scanning information at least includes the surface pattern information of the photomask, the etching depth information of the pattern, the inner wall smoothness information of the etching groove, etc.

[0069] In this way, the processor 51 can obtain the three-dimensional scanning information of the photomask, and thus compare the three-dimensional scanning information of the photomask with the three-dimensional standard information, which is conducive to a comprehensive inspection of the photomask, preventing the photomask from affecting product quality due to etching defects, and improving inspection accuracy.

[0070] Exemplarily, the three-dimensional scanner 41 is a laser scanner, so that the surface pattern information of the photomask, the etching depth information of the pattern, the inner wall smoothness information of the etching groove, etc. can be quickly scanned.

[0071] In one embodiment, as shown in FIG. 2 and FIG. 5 , the shading mechanism 30 includes a side plate structure 31 and a top plate 32. The side plate structure 31 is disposed on a side of the base 11 close to the carrier platform 12 and is disposed around the outer peripheral side of the carrier platform 12 and the positioning mechanism 20. The top plate 32 is disposed on a side of the side plate structure 31 away from the base 11. The shading structure and the base 11 together form a closed inspection cavity, in which the carrier platform 12, the positioning mechanism 20 and the three-dimensional scanner 41 are all located. Among them, the three-dimensional scanner 41 is disposed on a side of the top plate 32 close to the base 11, and can move in a direction close to or away from the base 11. In this way, the scanning height of the three-dimensional scanner 41 can be easily adjusted according to different photomask sizes.

[0072] It is understandable that there may be multiple three-dimensional scanners 41, so that the photomask pattern can be scanned in sections, thereby improving the inspection accuracy.

[0073] In one embodiment, as shown in FIG. 5 and FIG. 6 , the scanning mechanism 40 further includes a mounting plate 42 and a driving member 43. The mounting plate 42 is disposed on a side of the top plate 32 close to the base 11, the three-dimensional scanner 41 is disposed on a side of the mounting plate 42 close to the base 11, and the driving member 43 is disposed on the top plate 32 and is transmission-connected to the mounting plate 42. The driving member 43 is used to drive the mounting plate 42 to move toward or away from the base 11. By providing the mounting plate 42, the three-dimensional scanner 41 can be assembled on the mounting plate 42, thereby reducing the difficulty of assembling the three-dimensional scanner 41.

[0074] It is understandable that the driving member 43 can be directly connected to the mounting plate 42 to drive the mounting plate 42 to move. The driving member 43 can also be connected to the mounting plate 42 through an intermediate member to drive the mounting plate 42 to move.

[0075] In one embodiment, the scanning mechanism 40 further includes a connecting plate 45 and a connecting rod 46, wherein the connecting plate 45 is disposed on a side of the top plate 32 away from the base 11, and the driving member 43 is disposed between the top plate 32 and the connecting plate 45, wherein the fixed end of the driving member 43 is connected to the top plate 32, and the movable end of the driving member 43 is connected to the connecting plate 45. The connecting rod 46 is movably disposed in the top plate 32 along its own axial direction, and connects the connecting plate 45 and the mounting plate 42. Exemplarily, the driving member 43 may be an oil cylinder, an air cylinder, an electric push rod, etc.

[0076] In this way, the movable end of the driving member 43 pushes the connecting plate 45 to move in a direction away from the base 11, thereby driving the connecting rod 46 to move in a direction away from the base 11, and further driving the mounting plate 42 to move in a direction away from the base 11. Alternatively, the movable end of the driving member 43 drives the connecting plate 45 to move in a direction close to the base 11, thereby driving the connecting rod 46 to move in a direction close to the base 11, and further driving the mounting plate 42 to move in a direction close to the base 11. The above arrangement can make the structure of the scanning mechanism 40 relatively simple, and is easy to manufacture and assemble.

[0077] It can be understood that there can be multiple connecting rods 46, so as to increase the connection stability.

[0078] In one embodiment, as shown in FIG5 , a first guide rail 44 is provided on one side of the mounting plate 42 close to the base 11, and the three-dimensional scanner 41 is movably provided on the first guide rail 44. By providing the first guide rail 44, the scanning area of ​​the three-dimensional scanner 41 can be easily adjusted, which helps to improve the inspection accuracy.

[0079] It is understandable that the first guide rail 44 can be a linear guide rail or a curved guide rail. The number of the first guide rail 44 can be one or more. The embodiment of the present application does not limit the number and structure of the first guide rail 44.

[0080] In one embodiment, a first light-transmitting plate 47 is further provided on one side of the three-dimensional scanner 41 close to the base 11, and the first light-transmitting plate 47 is connected to the connecting rod 46. By providing the first light-transmitting plate 47, it is possible to prevent the laser emitted by the three-dimensional scanner 41 from directly irradiating the photomask, thereby preventing the photomask from being damaged due to material reasons. It is understandable that the first light-transmitting plate 47 can be connected to the connecting rod 46.

[0081] In one embodiment, as shown in FIG. 2 and FIG. 7 , the side panel structure 31 includes a first side panel 311 and a second side panel 312, the first side panel 311 and the second side panel 312 are connected to each other, and are jointly enclosed to form a receiving space for accommodating the base 11 and the carrier 12. For example, the first side panel 311 and the second side panel 312 can be a C-shaped structure. A sliding mechanism is provided at the joint of the first side panel 311 and the second side panel 312, so that the first side panel 311 can slide relative to the second side panel 312 along the gravity direction. In this way, when placing a photomask, the first side panel 311 can be slid upward to open the side panel structure 31, so that the photomask is placed on the carrier 12, and then the first side panel 311 is slid downward to close the side panel structure 31. The above arrangement can not only reduce the structural complexity of the side panel structure 31, but also reduce the difficulty of opening and closing the side panel structure 31.

[0082] In one embodiment, the sliding mechanism includes a slide rail 313 and a second slide block 314 . The slide rail 313 is disposed on the docking surface of the second side plate 312 , and the second slide block 314 is disposed on the docking surface of the first side plate 311 .

[0083] In one embodiment, a brake mechanism 315 is further provided at the joint of the first side plate 311 and the second side plate 312. Thus, after the first side plate 311 is slid upward, the brake mechanism 315 can brake the second slider 314, so that the first side plate 311 is kept in a fixed position, thereby eliminating the need to manually fix the first side plate 311.

[0084] In one embodiment, the brake mechanism 315 may be a magnet, and the second slider 314 is a metal part, wherein the brake mechanism 315 is disposed at the end of the slide rail 313. Thus, after the first side plate 311 is pushed upward to the maximum extent, the magnet may absorb the second slider 314, thereby keeping the first side plate 311 fixed.

[0085] In one embodiment, the braking mechanism 315 can be a pin. When the first side plate 311 slides to a certain position, the pin is inserted into the slide rail 313 so that the pin contacts the second slider 314. The friction between the pin and the second slider 314 keeps the first side plate 311 fixed.

[0086] In one embodiment, the second side plate 312 is a light-shielding structure, that is, the material of the second side plate 312 includes a light-shielding material. The first side plate 311 includes a second light-transmitting plate 3112 and an electrochromic layer 3114 disposed on the second light-transmitting plate 3112, and the electrochromic layer 3114 is used to change the light transmittance of the first side plate 311. In this way, when the first side plate 311 needs to remain transparent, the electrochromic layer 3114 can be de-energized, and when the first side plate 311 needs to be opaque, the electrochromic layer 3114 can be energized.

[0087] The above arrangement, on the one hand, can shield the accommodating space from light during the inspection process to prevent errors; on the other hand, when the operator needs to observe the internal conditions of the accommodating space, he can do so without opening the first side panel 311 .

[0088] In one embodiment, as shown in FIG. 7 , the first side plate 311 further includes a frame 3111 and a handle 3113, wherein the frame 3111 is provided at the top and the bottom of the second light-transmitting plate 3112, and the handle 3113 is provided on the frame 3111 at the bottom of the second light-transmitting plate 3112. The frame 3111 can improve the structural strength of the first side plate 311, and the handle 3113 can facilitate the operator to push the first side plate 311.

[0089] In one embodiment, as shown in FIG8 , the data processing mechanism 50 further includes: a memory 52, a controller 53 and a touch screen 54, and the memory 52, the controller 53 and the touch screen 54 are all electrically connected to the processor 51. The memory 52 can be used to store three-dimensional standard information, the touch screen 54 can be used to display the visual model output by the processor 51 and provide a virtual interactive button for the operator, and the controller 53 can control the electronic equipment in the photomask defect inspection device 1.

[0090] In one embodiment, the data processing mechanism 50 also includes a base 55 and a box body 56. The base 55 is arranged on the side of the base 11 away from the top plate 32, the box body 56 is arranged on the base 55, the processor 51, the memory 52, and the controller 53 are all arranged in the box body 56, and the touch screen 54 is arranged on the second side panel 312.

[0091] In a specific embodiment, the electrochromic layer 3114 is electrically connected to the controller 53, so that the controller 53 can control the power on and off of the electrochromic layer 3114. Further, the driving member 43 is electrically connected to the controller 53, so that the controller 53 can control the driving member 43 to work. Further, a first motor is provided on the first guide rail 44, and the first motor drives the three-dimensional scanner 41 to move on the first guide rail 44. The first motor is electrically connected to the controller 53, so that the controller 53 can control the movement of the three-dimensional scanner 41.

[0092] In one embodiment, the bearing mechanism 10 further includes a plurality of second guide rails 13, which are arranged radially and spaced around the outer periphery of the bearing platform 12. The plurality of positioning mechanisms 20 are arranged one by one on the plurality of second guide rails 13. In this way, the sliding connection mechanism between the positioning mechanism 20 and the base 11 can be made simpler, which can reduce the manufacturing cost.

[0093] In one embodiment, four second guide rails 13 are provided on the base 11, and the four second guide rails 13 are arranged at intervals around the outer peripheral side of the carrier 12. Further, a second motor is provided on the second guide rail 13, and the second motor drives the positioning mechanism 20 to move on the second guide rail 13. The second motor is electrically connected to the controller 53, so that the controller 53 can control the movement of the positioning mechanism 20.

[0094] In one embodiment, a third motor is disposed on the second slider 314 , and the third motor is electrically connected to the controller 53 , so that the controller 53 can control the first side panel 311 to be opened or closed.

[0095] In a second aspect, an embodiment of the present application provides a photomask defect inspection method, which can be inspected by a photomask defect inspection device in any embodiment of the first aspect, or by other types of photomask defect inspection devices.

[0096] Specifically, the photomask defect inspection device includes a base, a carrier, a plurality of positioning mechanisms, a processor and a scanner. The carrier is arranged on the base and is used to carry the photomask. A plurality of positioning mechanisms are arranged on the base and are arranged at intervals around the outer peripheral side of the carrier. A sensor is arranged on each positioning mechanism. The scanner is arranged on the side of the carrier away from the base and is spaced from the base. The sensor, the scanner and the processor are in communication connection. The sensor transmits basic information of the photomask to the processor in response to the contact between the positioning mechanism and the side of the photomask.

[0097] 9, the photomask defect inspection method specifically includes the following steps:

[0098] S100: The positioning mechanism positions the photomask. Specifically, the limiting surface of the positioning mechanism contacts the side of the photomask, and the positioning mechanism completes the positioning of the photomask.

[0099] S200: The sensor transmits basic information of the photomask to the processor. It is understandable that a contact switch is provided on the limit surface, and the contact switch is electrically connected to the sensor. When the limit surface contacts the side of the photomask, the contact switch is activated, and the sensor transmits basic information of the photomask to the processor. The basic information may include size information, position information, etc. of the photomask.

[0100] S300: The scanner scans the photomask and transmits the scanning information of the photomask to the processor. It is understandable that the scanner may be a three-dimensional scanner. The scanning information may be three-dimensional scanning information, and the three-dimensional scanning information may include the surface pattern information of the photomask, the etching depth information of the pattern, the inner wall smoothness information of the etching groove, etc.

[0101] S400: The processor processes the basic information and the scanning information and outputs a visual model. In this step, the processor can obtain three-dimensional standard information from the outside or the memory, parse and compare the three-dimensional standard information, the scanning information and the basic information, and output the visual model according to the comparison result, and the visual model can be displayed through the touch screen. It can be understood that the three-dimensional standard information can be recorded in the memory in advance, or it can be recorded in the memory synchronously in this step. The visual model can be a three-dimensional visual model and / or a two-dimensional visual model. The inspector can intuitively obtain the defects of the photomask through the visual model. Exemplarily, the visual model can be a surface pattern comparison diagram of the photomask, and the surface pattern comparison diagram can show the defects of the surface pattern of the photomask. The visual model can also be an etching depth comparison diagram of the pattern, and the etching depth comparison diagram can show the defects of the etching depth of the photomask.

[0102] It is understandable that before S100, the first side plate needs to be manually pushed upwards, and then the photomask is placed on the carrier. In S200, after the sensor transmits the basic information, the controller can control the first side plate to reset, close the first side plate and the second side plate, and then energize the electrochromic layer to make the first side plate opaque, thereby shielding the photomask. After S400, the first side plate can be manually pushed upwards to take out the photomask, and then the first side plate can be pushed downwards.

[0103] In the photomask defect inspection method provided in the embodiment of the present application, when performing defect inspection, the photomask is placed on the carrier, and while the positioning mechanism positions the photomask, the sensor can transmit the basic information of the photomask (such as position information and size information) to the processor, and then the processor processes the acquired scanning information and basic information and outputs a visual model. In this way, there is no need to pre-process the photomask before performing defect inspection, which facilitates rapid confirmation of the inspection area of ​​the photomask and improves inspection efficiency.

[0104] In the description of this specification, the description with reference to the terms "some embodiments", "other embodiments", "ideal embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or example.

[0105] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features of the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0106] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. A photomask defect inspection device, characterized in that: include: Base; A carrying platform, disposed on the base and used for carrying the photomask; A plurality of positioning mechanisms are arranged on the base and are arranged at intervals around the outer peripheral side of the supporting platform; each of the positioning mechanisms can move toward or away from the supporting platform; the positioning mechanisms are used to contact the side of the photomask to position the photomask; each of the positioning mechanisms is provided with a sensor; A processor is communicatively connected to the sensor; the sensor transmits basic information of the photomask to the processor in response to the contact between the positioning mechanism and the side of the photomask, wherein the basic information includes at least size information of the photomask; A scanner is disposed on a side of the carrier away from the base and spaced apart from the base; the scanner is communicatively connected with the processor to transmit scanning information of the photomask; A first sliding block is movably disposed on the base; as well as A limiting member is arranged on a side of the first sliding block away from the base; a limiting surface is arranged on the limiting member, and the limiting surface faces the bearing platform; Wherein, the sensor is arranged on the first slider, a contact switch is arranged on the limit surface, and the contact switch is electrically connected to the sensor; The scanner comprises a three-dimensional scanner, and a first light-transmitting plate is further provided on a side of the three-dimensional scanner close to the base; the scanning information comprises surface pattern information of the photomask, etching depth information of the pattern, and inner wall smoothness information of the etching groove; The photomask defect inspection device further includes a side plate structure and a top plate, wherein the side plate structure includes a first side plate and a second side plate, wherein the first side plate and the second side plate are connected to each other and jointly enclose a containing space for containing the base and the carrying platform; Wherein, a sliding mechanism is provided at the joint of the first side panel and the second side panel, so that the first side panel can slide relative to the second side panel along the gravity direction; the second side panel is a light shielding structure; the first side panel includes a second light-transmitting panel and an electrochromic layer provided on the second light-transmitting panel, and the electrochromic layer is used to change the light transmittance of the first side panel; Before the positioning mechanism positions the photomask, it is necessary to manually push the first side panel upwards and then place the photomask on the supporting platform; after the sensor transmits the basic information of the photomask to the processor, the controller controls the first side panel to reset, so that the first side panel and the second side panel are closed, and then the electrochromic layer is energized to make the first side panel opaque, thereby providing light-shielding protection for the photomask.

2. The photomask defect inspection device according to claim 1, characterized in that: The side plate structure is arranged on a side of the base close to the bearing platform, and is arranged around the outer periphery of the bearing platform and the positioning mechanism, and the top plate is arranged on a side of the side plate structure away from the base; Wherein, the three-dimensional scanner is arranged on a side of the top plate close to the base, and can move toward or away from the base.

3. The photomask defect inspection device according to claim 2, characterized in that: The photomask defect inspection device also includes a mounting plate and a driving member, wherein the mounting plate is arranged on a side of the top plate close to the base, the three-dimensional scanner is arranged on a side of the mounting plate close to the base, the driving member is arranged on the top plate and is transmission-connected to the mounting plate, and the driving member is used to drive the mounting plate to move toward or away from the base.

4. The photomask defect inspection device according to claim 3, characterized in that: The photomask defect inspection device further comprises a connecting plate and a connecting rod, wherein the connecting plate is arranged on a side of the top plate away from the base, the driving member is arranged between the top plate and the connecting plate, the fixed end of the driving member is connected to the top plate, and the movable end of the driving member is connected to the connecting plate; The connecting rod is movably arranged along its own axial direction and penetrates the top plate, and connects the connecting plate and the mounting plate.

5. The photomask defect inspection device according to claim 4, characterized in that: The first light-transmitting plate is connected to the connecting rod.

6. A method for inspecting photomask defects, characterized in that: Conducting inspection using the photomask defect inspection device as described in any one of claims 1 to 5; Photomask defect inspection methods include: The positioning mechanism positions the photomask; The sensor transmits basic information of the photomask to the processor; the basic information at least includes size information of the photomask; The scanner scans the photomask and transmits scanning information of the photomask to the processor; The processor processes the basic information and the scanning information and outputs a visual model.

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