Method for manufacturing a solar cell electrode and a solar cell

Abstract

The present application relates to a method for manufacturing a solar cell electrode and a solar cell. The method includes: disposing a metal seed layer on the surface of a cell body; forming a first anti-plating layer on the metal seed layer, a first groove is provided on the first anti-plating layer, and the first groove penetrates the first anti-plating layer along a first direction; the first direction is the thickness direction of the cell body; depositing a first metal material on the area of the metal seed layer exposed by the first groove by means of electroplating to obtain a sub-grid; forming a second anti-plating layer on the side of the first anti-plating layer facing away from the cell body, a second groove is provided on the second anti-plating layer, and the second groove penetrates the second anti-plating layer and the first anti-plating layer along the first direction; depositing a second metal material on the area of the metal seed layer exposed by the second groove by means of electroplating to obtain a main grid; removing the first anti-plating layer, the second anti-plating layer, and the metal seed layer not in contact with the sub-grid and the main grid. In this way, the conversion efficiency of the solar cell can be improved.

Description

Technical Field

[0001] The present application relates to the technical field of photovoltaic cells, and in particular to a method for manufacturing a solar cell electrode and a solar cell. Background Art

[0002] Solar cells, also known as photovoltaic cells, are semiconductor devices that convert sunlight directly into electrical energy. As they are green and environmentally friendly products that do not cause environmental pollution, and solar energy is a renewable resource, solar cells are a new type of battery with broad development prospects.

[0003] Solar cells include crystalline silicon cells, thin-film cells and emerging cells (such as organic photovoltaic cells). Solar cells mainly include power generation semiconductor units and electrodes; power generation semiconductor units use photovoltaic effects to convert sunlight into photogenerated carriers; electrodes can collect and converge the photogenerated carriers generated by the power generation semiconductor units on photovoltaic cells.

[0004] In the related technology, the electrode includes a main grid and a sub-grid. The sub-grid is mainly used to collect photogenerated carriers, and the main grid is mainly used to export the photogenerated carriers collected by the sub-grid. During the electrode manufacturing process, problems such as poor uniformity of line width and line height of the sub-grid and the main grid and poor reliability of main-sub-grid overlap are prone to occur, which affects the collection and export of photogenerated carriers by the electrode, thereby affecting the conversion efficiency of the solar cell. Summary of the invention

[0005] Based on this, the present application provides a method for manufacturing a solar cell electrode and a solar cell to improve the conversion efficiency of the solar cell.

[0006] The embodiment of the first aspect of the present application provides a method for manufacturing a solar cell electrode, comprising:

[0007] forming a metal seed layer on a surface of the battery body, the battery body comprising a silicon substrate;

[0008] forming a first anti-plating layer on the metal seed layer, wherein a first slot body is provided on the first anti-plating layer, and the first slot body penetrates the first anti-plating layer along a first direction; the first direction is a thickness direction of the battery body;

[0009] Depositing a first metal material on the metal seed layer in the area exposed by the first slot body by an electroplating process to obtain a secondary gate;

[0010] A second anti-plating layer is formed on a side of the first anti-plating layer away from the battery body, a second groove body is provided on the second anti-plating layer, and the second groove body penetrates the second anti-plating layer and the first anti-plating layer along the first direction;

[0011] A second metal material is deposited on the area of the metal seed layer exposed by the second tank body by electroplating to obtain a main grid;

[0012] The first anti-plating layer, the second anti-plating layer, and the metal seed layer that is not in contact with the sub-grid and the main grid are removed.

[0013] In one embodiment, the step of forming a first anti-plating layer on the metal seed layer and providing a first tank body on the first anti-plating layer, where the first tank body penetrates the first anti-plating layer in a first direction, includes:

[0014] A first anti-plating material layer is formed on the metal seed layer;

[0015] The first anti-plating material layer is patterned to obtain the first anti-plating layer provided with the first tank body.

[0016] In one embodiment, the step of patterning the first anti-plating material layer to obtain the first anti-plating layer provided with the first tank body includes:

[0017] The first anti-plating material layer is exposed and developed to obtain the first anti-plating layer provided with the first tank body.

[0018] In one embodiment, the step of patterning the first anti-plating material layer to obtain the first anti-plating layer provided with the first tank body includes:

[0019] A laser is used to cut a groove in the first anti-plating material layer to obtain the first anti-plating layer provided with the first tank body.

[0020] In one embodiment, the step of forming a second anti-plating layer on the side of the first anti-plating layer facing away from the battery body, where the second anti-plating layer is provided with a second tank body that penetrates the second anti-plating layer and the first anti-plating layer in the first direction, includes:

[0021] A second anti-plating material layer is formed on the side of the first anti-plating layer facing away from the battery body;

[0022] The second anti-plating material layer and the first anti-plating layer are patterned to obtain the second anti-plating layer provided with the second tank body.

[0023] In one embodiment, the step of patterning the second anti-plating material layer and the first anti-plating layer to obtain the second anti-plating layer provided with the second tank body includes:

[0024] The second anti-plating layer and the first anti-plating layer are subjected to exposure and development processes to obtain the second anti-plating layer provided with the second groove.

[0025] In one embodiment, the step of patterning the second anti-plating material layer and the first anti-plating layer to obtain the second anti-plating layer provided with the second groove includes:

[0026] A laser is used to cut grooves in the second anti-plating material layer and the first anti-plating layer to obtain the second anti-plating layer provided with the second groove.

[0027] In one embodiment, the step of removing the first anti-plating layer, the second anti-plating layer, and the metal seed layer that is not in contact with the sub-gate and the main gate includes:

[0028] Remove the first anti-plating layer and the second anti-plating layer;

[0029] Remove the metal seed layer that is not in contact with the sub-gate and the main gate.

[0030] In one embodiment, after the step of removing the first anti-plating layer, the second anti-plating layer, and the metal seed layer that is not in contact with the sub-gate and the main gate, it further includes:

[0031] Form a protective layer on the surface of the main gate and the surface of the sub-gate.

[0032] In one embodiment, after the step of forming a protective layer on the surface of the main gate and the surface of the sub-gate, it further includes:

[0033] Clean and dry the battery body.

[0034] In one embodiment, the material of the first anti-plating layer includes one of hot melt wax, ink, and photoresist; the material of the second anti-plating layer includes one of hot melt wax, ink, and photoresist.

[0035] An embodiment of the second aspect of the present application provides a solar cell, including a battery body and an electrode provided on the surface of the battery body; the electrode is manufactured by using the manufacturing method of the solar cell electrode described in any one of the above embodiments.

[0036] The above method for manufacturing a solar cell electrode includes forming a metal seed layer on the surface of the cell body, forming a first anti-plating layer on the metal seed layer, and providing a first groove on the first anti-plating layer, the first groove penetrating the first anti-plating layer along a first direction; depositing a first metal material in the area where the metal seed layer is exposed by the first groove using an electroplating process to obtain a sub-grid; forming a second anti-plating layer on the side of the first anti-plating layer facing away from the cell body, providing a second groove on the second anti-plating layer, the second groove penetrating the second anti-plating layer and the first anti-plating layer along the first direction; depositing a second metal material in the area where the metal seed layer is exposed by the second groove using an electroplating process to obtain a main grid. That is, the sub-grid and the main grid are manufactured step by step using an electroplating process. In this way, it is convenient to control the line width and line height of the main and sub-grids, improve the uniformity of the line width and line height of the main and sub-grids, and at the same time, improve the lap reliability between the main grid and the sub-grid, which is beneficial to the collection and extraction of photo-generated carriers by the electrode, and thus beneficial to improving the conversion efficiency of the solar cell. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] Figure 1 The flowchart of the method for manufacturing a solar cell provided by some embodiments of the present application.

[0038] Figure 2 For Figure 1 Another flowchart of the method for manufacturing the solar cell shown.

[0039] Figure 3 For Figure 1 Another flowchart of the method for manufacturing the solar cell shown.

[0040] Figure 4 For Figure 1 Another flowchart of the method for manufacturing the solar cell shown.

[0041] Figure 5 For Figure 1 Another flowchart of the method for manufacturing the solar cell shown.

[0042] Figure 6 For Figure 1 Another flowchart of the method for manufacturing the solar cell shown.

[0043] Figure 7 For Figure 1 Another flowchart of the method for manufacturing the solar cell shown.

[0044] Figure 8 For Figure 1 Another flowchart of the method for manufacturing the solar cell shown.

[0045] Figure 9Flowchart of the manufacturing method of a solar cell provided by other embodiments of the present application. Detailed implementation manners

[0046] To make the above objects, features, and advantages of the present application more apparent and understandable, the following provides a detailed description of the specific implementation manners of the present application with reference to the accompanying drawings. Many specific details are set forth in the following description to facilitate a thorough understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the spirit of the present application. Therefore, the present application is not limited by the specific embodiments disclosed below.

[0047] In the description of the present application, it should be understood that if terms such as "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or positional relationship indicated by these terms is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as a limitation to the present application.

[0048] In addition, if terms such as "first" and "second" appear, these terms are only used for descriptive purposes and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In the description of the present application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise specifically defined.

[0049] In the present application, unless otherwise clearly defined and limited, if terms such as "install", "connect", "couple", "fix", etc. appear, these terms should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral body; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the internal communication of two elements or the interaction relationship between two elements, unless otherwise clearly limited. For those of ordinary skill in the art, the specific meanings of the above terms in the present application can be understood according to specific circumstances.

[0050] In this application, unless otherwise clearly defined and limited, if there is a description such as a first feature being "on" or "under" a second feature, its meaning can be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature can be that the first feature is directly above or obliquely above the second feature, or simply means that the horizontal height of the first feature is higher than that of the second feature. The first feature being "under", "beneath" and "underneath" the second feature can be that the first feature is directly below or obliquely below the second feature, or simply means that the horizontal height of the first feature is less than that of the second feature.

[0051] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or there can also be an intermediate element. If an element is considered to be "connected" to another element, it can be directly connected to the other element or there may be an intermediate element at the same time. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are only for the purpose of illustration and do not represent the only implementation.

[0052] Solar cells include crystalline silicon cells, thin film cells, and emerging cells (such as organic photovoltaic cells), etc. Solar cells mainly include a power generation semiconductor unit and electrodes; the power generation semiconductor unit uses the photovoltaic effect to convert sunlight into photo-generated carriers; the electrodes can collect and converge the photo-generated carriers generated by the power generation semiconductor unit on the photovoltaic cell.

[0053] In the related art, the electrodes include main grids and sub-grids. The sub-grids are mainly used to collect photo-generated carriers, and the main grids are mainly used to export the photo-generated carriers collected by the sub-grids; during the electrode manufacturing process, problems such as poor line width and line height uniformity of the sub-grids and main grids, and poor reliability of the overlap between the main and sub-grids are likely to occur, affecting the collection and export of photo-generated carriers by the electrodes, and thus affecting the conversion efficiency of solar cells.

[0054] Based on the above technical problems, this application provides a method for manufacturing a solar cell electrode and a solar cell to improve the conversion efficiency of the solar cell.

[0055] In the first aspect, referring to Figure 1 , an embodiment of this application provides a method for manufacturing a solar cell electrode, including:

[0056] S10. Form a metal seed layer on the surface of the cell body, and the cell body includes a silicon substrate;

[0057] The material of the metal seed layer includes at least one of nickel Ni, copper Cu, titanium Ti, tin Sn, and silver Ag; the metal seed layer can be fabricated by physical vapor deposition (PVD).

[0058] S20, forming a first anti-plating layer on the metal seed layer, wherein a first groove body is disposed on the first anti-plating layer, and the first groove body penetrates the first anti-plating layer along a first direction; the first direction is a thickness direction of the battery body.

[0059] S30, depositing a first metal material in the area of ​​the metal seed layer exposed by the first groove body by an electroplating process to obtain a secondary gate.

[0060] S40, forming a second anti-plating layer on a side of the first anti-plating layer away from the battery body, wherein a second groove body is disposed on the second anti-plating layer, and the second groove body penetrates the second anti-plating layer and the first anti-plating layer along a first direction.

[0061] S50 , depositing a second metal material in the area of ​​the metal seed layer exposed by the second slot body by an electroplating process to obtain a main grid.

[0062] S60, removing the first anti-plating layer, the second anti-plating layer, and the metal seed layer that is not in contact with the secondary gate and the main gate.

[0063] The manufacturing method of the solar cell electrode provided in the embodiment of the present application is as follows: a metal seed layer is arranged on the surface of the battery body, a first anti-plating layer is formed on the metal seed layer, a first groove body is arranged on the first anti-plating layer, and the first groove body penetrates the first anti-plating layer along a first direction; a first metal material is deposited in the area of ​​the metal seed layer exposed by the first groove body by an electroplating process to obtain a secondary grid; a second anti-plating layer is formed on the side of the first anti-plating layer away from the battery body, a second groove body is arranged on the second anti-plating layer, and the second groove body penetrates the second anti-plating layer and the first anti-plating layer along a first direction; a second metal material is deposited in the area of ​​the metal seed layer exposed by the second groove body by an electroplating process to obtain a main grid. That is to say, the anti-plating layer mask protection and the electroplating process are combined to manufacture the secondary grid and the main grid in steps, so that the line width and line height of the main and secondary grids can be easily controlled, and the uniformity of the line width and line height of the main and secondary grids can be improved. At the same time, the overlap reliability between the main grid and the secondary grid can be improved, which is beneficial to the collection and extraction of photogenerated carriers by the electrode, and further beneficial to improving the conversion efficiency of the solar cell.

[0064] It should be noted that the battery body includes a first surface and a second surface oppositely arranged along a first direction. The surface of the battery body may include at least one of the first surface and the second surface of the battery body; that is to say, the present application is applicable to solar cells with single-sided electrodes, such as IBC cells, and is also applicable to solar cells with double-sided electrodes, such as heterojunction solar cells, tunnel oxide passivated contact cells, etc. When electrodes are fabricated on the first surface of the battery body and no electrodes need to be fabricated on the second surface, a mask layer can be used to protect the second surface. After the electrodes on the first surface are fabricated, the mask layer is removed. The material of the mask layer can be the same as that of the first anti-plating layer and the second anti-plating layer. In this way, the mask layer, the first anti-plating layer, and the second anti-plating layer can be removed synchronously. Of course, when the second surface of the battery body itself is an anti-plating film layer, such as an IBC cell, which has electrodes fabricated on the back and no electrodes need to be fabricated on the front, since the outermost layer on the front is a silicon nitride film layer and the silicon nitride film layer is an anti-plating film layer, no mask layer needs to be set when fabricating the electrodes.

[0065] It should be noted that both the first anti-plating layer and the second anti-plating layer are electroplating mask layers, which can protect the underlying metal seed layer and the battery body during the electroplating process, so that the electroplated first metal material is deposited on the metal seed layer exposed in the first tank to obtain the sub-grid; the electroplated second metal material is deposited on the metal seed layer exposed in the second tank to obtain the main grid. This can help improve the electroplating efficiency and electroplating yield, and further improve the fabrication yield of the electrodes and the conversion efficiency of the solar cell.

[0066] As Figure 2 shown, in one embodiment, in S20, a first anti-plating layer is formed on the metal seed layer, and a first tank is provided on the first anti-plating layer. The first tank penetrates the first anti-plating layer along the first direction, specifically including:

[0067] S210: Form a first anti-plating material layer on the metal seed layer;

[0068] Specifically, fabrication methods such as spraying, coating, roll coating, dip coating, inkjet printing, screen printing, etc. can be used to form the first anti-plating material layer on the metal seed layer. The thickness of the first anti-plating material layer can be 1um - 10um, which can be designed according to the line width and line height of the sub-grid. A drying process can be added according to the material of the first anti-plating material layer. Specifically, the first anti-plating material layer can be made of hot melt wax, ink, photoresist, etc. For example, when the first anti-plating material layer is made of ink, the formed first anti-plating material layer can be dried for subsequent patterning. When the first anti-plating material layer is made of hot melt wax, the hot melt wax can solidify in one step and does not need to be dried.

[0069] S220: Pattern the first anti-plating material layer to obtain a first anti-plating layer provided with a first tank.

[0070] Thus, by forming a first anti-plating material layer on the metal seed layer and patterning the first anti-plating material layer, a first anti-plating layer provided with a first groove can be conveniently obtained, thereby facilitating the independent fabrication of the sub-grid, improving the uniformity of the height and width of the sub-grid lines, being conducive to the sub-grid collecting photo-generated carriers, improving the fabrication yield, and improving the conversion efficiency of the solar cell.

[0071] As Figure 3 shown, in one embodiment, in S220, when patterning the first anti-plating material layer to obtain a first anti-plating layer provided with a first groove, it specifically includes:

[0072] Performing exposure and development on the first anti-plating material layer to obtain a first anti-plating layer provided with a first groove.

[0073] Thus, by patterning the first anti-plating material layer through exposure and development technology, the first anti-plating material layer can be patterned using existing exposure and development processes and equipment, without introducing new technologies and equipment, thereby reducing the investment in production costs.

[0074] As Figure 4 shown, in one embodiment, in S220, when patterning the first anti-plating material layer to obtain a first anti-plating layer provided with a first groove, it specifically includes:

[0075] Using a laser to form a groove in the first anti-plating material layer to obtain a first anti-plating layer provided with a first groove.

[0076] Specifically, a laser can be used to form a groove in the first anti-plating material layer to obtain a first anti-plating layer provided with a first groove. The laser can be a small-spot planar square laser. The laser can be one of an infrared laser, a green laser, an ultraviolet laser, a continuous laser, a microsecond laser, and a picosecond laser. It can be selected according to the actual situation.

[0077] Thus, on the one hand, the width of the first groove can be adjusted by adjusting the spot size of the laser, thereby flexibly adjusting the line width of the sub-grid, facilitating the fabrication of thinner sub-grids. In this way, the number of sub-grids can be increased, the series resistance can be reduced, which is conducive to the transmission of photo-generated carriers; when the number of sub-grids remains unchanged, the light shielding by the sub-grids can be reduced, the light utilization rate of the solar cell can be improved, and the conversion efficiency of the solar cell can be improved. On the other hand, the time required for patterning can be shortened, the efficiency of patterning can be improved, the chemical consumption during patterning can be reduced, environmental pollution can be reduced, and costs can be reduced. In addition, during the laser grooving process, the metal seed layer can reflect the laser energy, thereby effectively reducing the damage of the laser to the battery body, reducing the probability of fragmentation, and improving the fabrication yield.

[0078] As Figure 5As shown, in one embodiment, in S40, a second anti-plating layer is formed on a side of the first anti-plating layer facing away from the battery body, and a second groove is provided on the second anti-plating layer, and the second groove penetrates through the second anti-plating layer and the first anti-plating layer along a first direction. Specifically, it includes:

[0079] S410. Form a second anti-plating material layer on a side of the first anti-plating layer facing away from the battery body.

[0080] Specifically, manufacturing methods such as spraying, coating, roll coating, dip coating, inkjet printing, screen printing, etc. can be used to form the second anti-plating material layer on a side of the first anti-plating layer facing away from the battery body. The thickness of the second anti-plating material layer can be 1um to 10um, and it can be designed according to the line width and line height of the main grid. A drying process can be added according to the material of the second anti-plating material layer. Specifically, the second anti-plating material layer can be made of hot melt wax, ink, photoresist, etc. For example, when the second anti-plating material layer uses ink, the formed second anti-plating material layer can be dried for subsequent patterning. When the second anti-plating material layer uses hot melt wax, the hot melt wax can be solidified in one step and does not need to be dried.

[0081] S420. Pattern the second anti-plating material layer and the first anti-plating layer to obtain a second anti-plating layer provided with a second groove.

[0082] Thus, by forming a second anti-plating material layer on a side of the first anti-plating layer facing away from the battery body and patterning the second anti-plating material layer and the first anti-plating layer, in this way, it is convenient to obtain a second anti-plating layer provided with a second groove, thereby facilitating the independent manufacture of the main grid, improving the uniformity of the line width and line height of the main grid, improving the lap reliability between the main grid and the sub-grid, and further facilitating the main grid to export the photo-generated carriers collected by the sub-grid, improving the conversion efficiency of the solar cell.

[0083] As Figure 6 shown, in one embodiment, in S420, patterning the second anti-plating material layer and the first anti-plating layer to obtain a second anti-plating layer provided with a second groove includes:

[0084] Perform exposure and development processing on the second anti-plating material layer and the first anti-plating layer to obtain a second anti-plating layer provided with a second groove.

[0085] Thus, by using exposure and development technology to pattern the second anti-plating material layer and the first anti-plating layer, in this way, the existing exposure and development processes and equipment can be used to pattern the second anti-plating material layer and the first anti-plating layer, without introducing new technologies and equipment, thereby reducing the investment in manufacturing costs.

[0086] As Figure 7As shown, in one embodiment, in S420, patterning the second anti-plating material layer and the first anti-plating layer to obtain a second anti-plating layer provided with a second groove body, including:

[0087] Using a laser to groove on the second anti-plating material layer and the first anti-plating layer to obtain a second anti-plating layer provided with a second groove body.

[0088] Specifically, a laser can be used to groove on the second anti-plating material layer and the first anti-plating layer to obtain a second anti-plating layer provided with a second groove body. The laser can be a small-spot planar square laser. The laser can be one of an infrared laser, a green laser, an ultraviolet laser, a continuous laser, a microsecond laser, and a picosecond laser, which can be selected according to actual situations.

[0089] Thus, the time required for patterning can be shortened, the efficiency of patterning can be improved, the consumption of chemicals during patterning can be reduced, environmental pollution can be reduced, and costs can be lowered. In addition, during the laser grooving process, the metal seed layer can reflect the laser energy, thereby effectively reducing the damage of the laser to the battery body, reducing the probability of debris occurrence, and improving the production yield.

[0090] As Figure 8 shown, in one embodiment, in S60, removing the first anti-plating layer, the second anti-plating layer, and the metal seed layer not in contact with the sub-grid and the main grid, including:

[0091] S610. Removing the first anti-plating layer and the second anti-plating layer;

[0092] An alkaline solution can be used to remove the first anti-plating layer and the second anti-plating layer.

[0093] S620. Removing the metal seed layer not in contact with the sub-grid and the main grid;

[0094] An acidic solution can be used to remove the metal seed layer.

[0095] As Figure 9 shown, in one embodiment, after S60, it further includes:

[0096] S70. Forming a protective layer on the surfaces of the main grid and the sub-grid.

[0097] The material of the protective layer includes one of an antioxidant, tin, and silver. Specifically, when the material of the protective layer includes one of tin and silver, an electroplating process can be used to form a protective layer on the surfaces of the main grid and the sub-grid, and the electroplating process can be direct electroplating, electroless plating, photoinduced electroplating, immersion plating, etc. When the material of the protective layer includes an antioxidant, a coating process can be used to coat the antioxidant on the surfaces of the main grid and the sub-grid. The antioxidant can react with the copper grid line to form an antioxidant coating, and the antioxidant in other areas can be removed by cleaning, thereby obtaining the protective layer.

[0098] Thus, oxidation of the main grid and the secondary grid surfaces can be prevented, which is beneficial to subsequent welding.

[0099] It should be noted that the order of S60 and S70 can be adjusted. Preferably, S70 is located after S60.

[0100] As Figure 9 shown, in one embodiment, after S70, it further includes:

[0101] S80, cleaning and drying the battery body.

[0102] Thus, chemical residues and impurity residues on the surface of the battery body can be removed, avoiding the influence of chemical residues and impurity residues on the conversion efficiency of the solar cell.

[0103] In one embodiment, the material of the first anti-plating layer includes one of hot melt wax, ink, and photoresist; the material of the second anti-plating layer includes one of hot melt wax, ink, and photoresist. Of course, the materials of the first anti-plating layer and the second anti-plating layer are not limited to this, and other materials can also be used.

[0104] In a second aspect, an embodiment of the present application provides a solar cell, including a battery body and an electrode disposed on the surface of the battery body; the electrode is manufactured by using the manufacturing method of the solar cell electrode in any of the above embodiments. Thus, the conversion efficiency of the solar cell can be improved.

[0105] It should be noted that the solar cell may include an Interdigitated backcontact (IBC) cell, a Heterojunction with Intrinsic Thin film (HJT) cell, a Tunnel Oxide Passivated Contact (TOPCon) cell, a Metallization wrapthrough (MWT) cell, a Passivated Emitter and Rear Cell (PERC) cell, etc.

[0106] It can be understood that the battery body refers to the part of the solar cell other than the electrode. Taking the heterojunction solar cell as an example, the battery body may include a silicon substrate, and an intrinsic amorphous silicon layer, a doped semiconductor film layer, and a transparent conductive layer are sequentially stacked on both opposite surfaces of the silicon substrate.

[0107] The technical features of the above embodiments can be combined arbitrarily. For the sake of concise description, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope described in this specification.

[0108] The above embodiments only express several implementation manners of the present application, and the description is relatively specific and detailed, but it should not be understood as a limitation to the scope of the patent application. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present application, several deformations and improvements can still be made, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the appended claims.

Claims

1. A method for manufacturing a solar cell electrode, characterized in that: include: forming a metal seed layer on a surface of the battery body, the battery body comprising a silicon substrate; forming a first anti-plating layer on the metal seed layer, wherein a first slot body is provided on the first anti-plating layer, and the first slot body penetrates the first anti-plating layer along a first direction; the first direction is a thickness direction of the battery body; Depositing a first metal material on the metal seed layer in the area exposed by the first slot body by an electroplating process to obtain a secondary gate; A second anti-plating layer is formed on a side of the first anti-plating layer away from the battery body, a second groove body is provided on the second anti-plating layer, and the second groove body penetrates the second anti-plating layer and the first anti-plating layer along the first direction; Depositing a second metal material on the metal seed layer in the area exposed by the second slot body by an electroplating process to obtain a main grid; The first anti-plating layer, the second anti-plating layer, and the metal seed layer not in contact with the secondary gate and the main gate are removed.

2. The method for manufacturing a solar cell electrode according to claim 1, characterized in that: The step of forming a first anti-plating layer on the metal seed layer, wherein a first groove body is provided on the first anti-plating layer, and the first groove body penetrates the first anti-plating layer along a first direction, comprises: forming a first anti-plating material layer on the metal seed layer; The first anti-plating material layer is patterned to obtain the first anti-plating layer provided with the first groove body.

3. The method for manufacturing a solar cell electrode according to claim 2, characterized in that: The step of patterning the first anti-plating material layer to obtain the first anti-plating layer provided with the first slot body comprises: The first anti-plating material layer is subjected to exposure and development processing to obtain the first anti-plating layer provided with the first groove body.

4. The method for manufacturing a solar cell electrode according to claim 2, characterized in that: The step of patterning the first anti-plating material layer to obtain the first anti-plating layer provided with the first slot body comprises: The first anti-plating material layer is grooved by using laser to obtain the first anti-plating layer provided with the first groove body.

5. The method for manufacturing a solar cell electrode according to claim 1, characterized in that: The step of forming a second anti-plating layer on a side of the first anti-plating layer away from the battery body, providing a second slot body on the second anti-plating layer, and penetrating the second anti-plating layer and the first anti-plating layer along the first direction comprises: forming a second anti-plating material layer on a side of the first anti-plating layer away from the battery body; The second anti-plating material layer and the first anti-plating layer are patterned to obtain the second anti-plating layer provided with the second groove body.

6. The method for manufacturing a solar cell electrode according to claim 5, characterized in that: The step of patterning the second anti-plating material layer and the first anti-plating layer to obtain the second anti-plating layer provided with the second groove body comprises: The second anti-plating material layer and the first anti-plating layer are subjected to exposure and development treatment to obtain the second anti-plating layer provided with the second groove body.

7. The method for manufacturing a solar cell electrode according to claim 5, characterized in that: The step of patterning the second anti-plating material layer and the first anti-plating layer to obtain the second anti-plating layer provided with the second groove body comprises: The second anti-plating material layer and the first anti-plating layer are grooved by using laser to obtain the second anti-plating layer provided with the second groove body.

8. The method for manufacturing a solar cell electrode according to claim 1, characterized in that: The step of removing the first anti-plating layer, the second anti-plating layer and the metal seed layer not in contact with the secondary grid and the main grid comprises: removing the first anti-plating layer and the second anti-plating layer; The metal seed layer that is not in contact with the secondary gate and the main gate is removed.

9. The method for manufacturing a solar cell electrode according to claim 1, characterized in that: After the step of removing the first anti-plating layer, the second anti-plating layer and the metal seed layer not in contact with the auxiliary grid and the main grid, the method further includes: A protection layer is formed on the surface of the main grid and the surface of the auxiliary grid.

10. The method for manufacturing a solar cell electrode according to claim 9, characterized in that: After the step of forming a protective layer on the surface of the main grid and the surface of the auxiliary grid, the method further includes: The battery body is cleaned and dried.

11. The method for manufacturing a solar cell electrode according to claim 1, characterized in that: The material of the first anti-plating layer includes one of hot melt wax, ink, and photoresist; the material of the second anti-plating layer includes one of hot melt wax, ink, and photoresist.

12. A solar cell, characterized in that: It comprises a battery body and an electrode arranged on the surface of the battery body; the electrode is manufactured by the manufacturing method of the solar cell electrode according to any one of claims 1 to 11.

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