A device and method for preparing crystalline silicon velvet

Abstract

The present invention discloses a crystalline silicon velvet preparation device and preparation method, including a velvet box, a crystalline silicon plate, the crystalline silicon plate is located in the velvet box, the top of the velvet box is open, a guide plate is installed on the bottom surface of the velvet box, the crystalline silicon plate is located above the guide plate, the lower end surface of the crystalline silicon plate is provided with a velvet, the velvet is a processing surface, the velvet is close to the upper end surface of the guide plate, and a circulation channel for the flow of a velvet agent is formed between the lower end surface of the crystalline silicon plate and the upper end surface of the guide plate, the velvet box includes a wall body 1 and a wall body 2 located on both sides of the guide plate, the velvet agent in the circulation channel flows from the side of the crystalline silicon plate close to the wall body 1 to the side of the crystalline silicon plate close to the wall body 2, the upper end surface of the guide plate is provided with a protrusion 2, the protrusion 2 is spaced along the Y direction and arranged in multiple layers along the X direction, and the adjacent two layers of protrusions 2 are staggered along the Y direction. The present invention provides a crystalline silicon velvet preparation device and preparation method, the crystalline silicon velvet molding quality is stable, and the crystalline silicon light energy absorption rate is high.

Description

Technical Field

[0001] The present invention relates to the technical field of crystalline silicon manufacturing, and in particular to a crystalline silicon texture preparation device and method. Background Art

[0002] At present, in the manufacturing process of crystalline silicon used to manufacture solar photovoltaic panels, it is necessary to texturize the crystalline silicon. In the texturizing process, the crystalline silicon is immersed in a texturizing agent, which corrodes the surface of the crystalline silicon and forms an uneven velvet surface. When in use, sunlight shines on the crystalline silicon velvet surface, and the light is reflected multiple times on the velvet surface to obtain a higher light energy utilization rate. Since the formation of the concave and convex points on the velvet surface of the crystalline silicon when it is immersed in the texturizing agent is uncertain and irregular, the molding quality of the velvet surface is less controllable, resulting in poor product consistency. The poor molding quality of some products causes the problem of insufficient light energy absorption rate. Summary of the invention

[0003] The purpose of the present invention is to overcome the deficiencies of the above-mentioned prior art and to provide a device and method for preparing a crystalline silicon texture surface, wherein the crystalline silicon texture surface has stable molding quality and a high crystalline silicon light energy absorption rate.

[0004] The invention discloses a crystalline silicon texture preparation device, comprising a texture box and a crystalline silicon plate. The crystalline silicon plate is located in the texture box, the top of the texture box is open, a guide plate is installed on the bottom of the texture box, the crystalline silicon plate is located above the guide plate, a texture is provided on the lower end surface of the crystalline silicon plate, the texture is a processed surface, the texture is close to the upper end surface of the guide plate, and a flow channel for a texture agent to flow is formed between the lower end surface of the crystalline silicon plate and the upper end surface of the guide plate. The texture box comprises a wall body 1 and a wall body 2 located on both sides of the guide plate, the texture agent in the flow channel flows from the side of the crystalline silicon plate close to the wall body 1 to the side of the crystalline silicon plate close to the wall body 2, a protrusion 2 is provided on the upper end surface of the guide plate, the protrusion 2 is spaced apart along the Y direction and arranged in multiple layers along the X direction, and the protrusions 2 of two adjacent layers are staggered along the Y direction.

[0005] Furthermore, the second protrusion is provided with a bevel portion, and the bevel portion is gradually inclined toward the lower end surface of the crystalline silicon plate along the flow direction of the texturing agent in the flow channel.

[0006] Furthermore, the hypotenuse is provided with a concave body, and the concave body is axially arranged along the inclination direction of the hypotenuse.

[0007] Furthermore, the wall body 1 is provided with a flow channel 1, which is a liquid inlet, and the wall body 2 is provided with a flow channel 2, which is a liquid outlet, and the flow channel 2 is connected to the right end of the upper end surface of the guide plate.

[0008] Furthermore, it also includes a clamping body, which includes an extension plate 2 located at the bottom, a groove body 1 is provided at the bottom of the extension plate 2, the crystalline silicon plate is located in the groove body 1, and the extension plate 2 is installed with an elastic component, the elastic component is located on the left and right sides of the crystalline silicon plate, and the elastic component includes a top block, and the top blocks located on the left and right sides of the crystalline silicon plate respectively abut against the left and right ends of the crystalline silicon plate to form a clamp.

[0009] Furthermore, the extended plate 2 is provided with a countersunk hole 1, which is located on the left and right sides of the groove body 1. The top block is inserted into the countersunk hole 1 and can move left and right along the inner wall of the countersunk hole 1. The top block is abutted against a spring 2 on the side away from the crystalline silicon plate. The end of the spring 2 away from the top block abuts against the inner wall of the countersunk hole 1. The side of the countersunk hole 1 close to the crystalline silicon plate is an opening, and the top block can at least partially extend out of the opening of the countersunk hole 1.

[0010] Furthermore, the velvet making box also includes three walls that are arranged opposite to each other, and the length of the extension plate two along the direction of the connecting line between the two walls three matches the distance between the two walls three.

[0011] Furthermore, the clamp body also includes an extension plate 1 located at the top, the extension plate 1 can be hung on the upper end of the wall body 1 and the upper end of the wall body 2, and the extension plate 2 extends into the velvet making box.

[0012] The present invention also discloses a method for preparing a crystalline silicon texture surface, which uses a crystalline silicon texture surface preparation device to prepare a crystalline silicon plate texture surface, comprising the following steps:

[0013] ① The crystalline silicon plate extends downward into the velvet making box, with the velvet surface of the crystalline silicon plate to be formed facing downward and close to the upper end surface of the guide plate;

[0014] ② The texturing agent flows from left to right along the flow channel, corroding the lower end surface of the crystalline silicon plate during the flow process, so that a texturing surface is formed on the lower end surface of the crystalline silicon plate.

[0015] Beneficial effects of the present invention:

[0016] 1. The velvet surface is corroded by the flowing velvet-making agent, which improves the efficiency of the velvet-making agent in corroding the velvet surface and improves the consistency of velvet surface forming.

[0017] 2. The hypotenuse of protrusion 2 is gradually inclined upward, so that the texturing agent passing through the hypotenuse can flow upward along the inclined surface of the hypotenuse and impact the velvet surface of the crystalline silicon plate, thereby causing the velvet surface to be more eroded by the impact area, forming protrusion 1 distributed in the upper position, and the area with less impact force forms protrusion 1 extending downward from the bottom position to a lower position, so that protrusion 1 forms a high and low distribution, thereby greatly increasing the probability that the light entering the R1 area is reflected by the protrusion 1 in the R1 area and hits the protrusion 1 in the R2 area, thereby improving the absorption rate of the velvet surface to sunlight. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 is a cross-sectional view of an embodiment;

[0019] Figure 2 for Figure 1 The enlarged view of point A in the middle;

[0020] Figure 3 for Figure 1 Sectional view along the MM direction;

[0021] Figure 4 for Figure 2 Sectional view along the NN axis;

[0022] Figure 5 for Figure 1 A view of the middle guide plate 5 in the direction of P;

[0023] Figure 6 is a three-dimensional diagram of protrusion 2 in the embodiment;

[0024] Figure 7 is a cross-sectional view of a crystalline silicon plate in an embodiment;

[0025] Figure 8 for Figure 7 Enlarged view of point B in the middle.

[0026] Figure markings: velvet making box 1, wall body 11, flow channel 1 111, wall body 2 12, flow channel 2 121, wall body 3 14, joint 2, connecting hole 21, clamp body 3, extension plate 1 31, extension plate 2 32, trough body 1 321, countersunk hole 1 322, through hole 33, crystalline silicon plate 4, velvet surface 41, protrusion 1 411, guide plate 5, protrusion 2 51, beveled edge 511, recess 512, handle 6, countersunk hole 2 61, insertion rod 62, spring 1 63, extension rod 64, elastic component 7, main rod 71, spring 2 72, top block 73, baffle 8, circulation channel 9. DETAILED DESCRIPTION

[0027] The following will be combined with the drawings in this embodiment to clearly and completely describe the technical solution in this embodiment. Obviously, the described embodiment is only a part of the embodiment of the present invention, not all of the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0028] like Figure 1-Figure 8 As shown, a crystalline silicon texture preparation device includes a texture box 1, such as Figure 1 As shown, the velvet making box 1 is a box structure with an open top, and a cavity is provided in the velvet making box 1. The velvet making box 1 includes a wall body 11 and a wall body 12 on the left and right sides. The wall body 11 is provided with a flow channel 111, and the flow channel 111 is located at the upper part of the wall body 11. Figure 3, the flow channel 111 penetrates the wall body 11, and the flow channel 111 is a long strip trough. The flow channel 111 is a liquid inlet, and the flow channel 111 is externally connected to a joint 2, and the joint 2 is provided with a connecting hole 21 and can pass the texturing agent, and the texturing agent flows into the texturing box 1 through the flow channel 111.

[0029] like Figure 1 As shown, the wall body 11 is installed with a baffle 8, which is located outside the right end outlet of the flow channel 111. The baffle 8 is only provided with an opening at the bottom to guide the texturing agent flowing out of the flow channel 111, so that the texturing agent flows downward along the inner wall surface close to the wall body 11.

[0030] The second wall body 12 is provided with a second flow channel 121 . The second flow channel 121 is a liquid outlet. The second flow channel 121 is located at the lower part of the second wall body 12 and penetrates the second wall body 12 . The height position of the second flow channel 121 is lower than the height position of the first flow channel 111 .

[0031] A clamp body 3 is hung on the wall body 11 and the wall body 2 12, and the clamp body 3 includes an extension plate 1 31 located at the top and an extension plate 2 32 located at the bottom. The bottom surfaces of the left and right ends of the extension plate 1 31 respectively abut against the upper end of the wall body 1 11 and the upper end of the wall body 2 12, and the wall body 11 and the wall body 2 12 form a support for the extension plate 1 31.

[0032] The clamp body 3 is provided with a through hole 33 in the axial direction, and the through hole 33 passes through the clamp body 3 from top to bottom. A handle 6 is fixedly installed on the upper end of the extension plate 1 31, and the bottom surface of the handle 6 is in contact with the top surface of the extension plate 1 31. A countersunk hole 2 61 is provided at the bottom of the handle 6, and the countersunk hole 2 61 is recessed upward along the bottom surface of the handle 6. The lower end of the countersunk hole 2 61 is connected with the upper end of the through hole 33. The countersunk hole 2 61 is coaxially arranged with the through hole 33, and the aperture of the countersunk hole 2 61 is larger than the aperture of the through hole 33. A plug rod 62 is slidably connected to the inner wall of the through hole 33, and the plug rod 62 can slide up and down. The plug rod 62 includes a convex ring at the top, which is located in the countersunk hole 2 61 and can move up and down along the inner wall of the countersunk hole 2 61. The outer diameter of the convex ring matches the inner diameter of the countersunk hole 2 61. A spring 1 63 is abutted at the bottom of the convex ring, and the bottom of the spring 1 63 abuts against the top of the extension plate 1 31. An extension rod 64 is fixedly mounted on the top of the insertion rod 62, and the extension rod 64 passes upward through the handle 6 and comes out of the top of the handle 6. The clamp body 3 can be taken by holding the outer periphery of the handle 6 and moving the handle 6. By pressing the extension rod 64 downward, the bottom of the insertion rod 62 can be extended out of the bottom of the through hole 33. After the extension rod 64 is released, the insertion rod 62 is pushed upward under the restoring force of the spring 63, so that the insertion rod 62 is retracted into the through hole 33.

[0033] Combination Figure 1 , Figure 4The velvet making box 1 also includes three wall bodies 14 arranged relatively to each other. The two wall bodies 14 and the wall body 11 and the wall body 2 12 together form a rectangular box inner cavity. The extension plate 2 32 extends into the velvet making box 1 and is close to the inner bottom surface of the velvet making box 1. The extension plate 2 32 is a rectangular plate-like structure. The length of the extension plate 2 32 along the direction of the line connecting the two wall bodies 14 matches the distance between the two wall bodies 14.

[0034] like Figure 1 , Figure 2 As shown, the second extension plate 32 is detachably mounted with a crystalline silicon plate 4, which is a rectangular plate-shaped structure and is the manufacturing material of the solar panel. Specifically, a groove 321 is provided at the bottom of the second extension plate 32, and the groove 321 is recessed upward along the bottom surface of the second extension plate 32 to form a rectangular groove that matches the shape of the crystalline silicon plate 4. The outer periphery of the groove 321 penetrates the side wall of the second extension plate 32. The second extension plate 32 is installed with an elastic component 7, combined with Figure 4 The elastic components 7 are distributed on the left and right sides of the crystalline silicon plate 4, and four elastic components are arranged on each side along the direction of the line 14 connecting the two walls. Figure 2 In the embodiment, the extension plate 2 32 is provided with a countersunk hole 1 322, which corresponds to the elastic component 7 one by one, and is located on the left and right sides of the slot body 1 321. A top block 73 is slidably connected in the countersunk hole 1 322, and the top block 73 is inserted into the countersunk hole 1 322 and can move left and right along the inner wall of the countersunk hole 1 322. The top block 73 abuts against the spring 2 72 on the side away from the crystalline silicon plate 4, and the end of the spring 2 72 abuts against the inner wall of the countersunk hole 1 322. The side of the countersunk hole 1 322 close to the crystalline silicon plate 4 is an opening, and the top block 73 can at least partially extend out of the opening of the countersunk hole 1 322. The top block 73 is connected to a main rod 71 at one side away from the opening of the first countersunk hole 322. The main rod 71 extends out of the outer wall of the second extension plate 32. A convex ring body is provided at the end of the main rod 71 extending out of the outer wall of the second extension plate 32. When the top block 73 extends out of the opening of the first countersunk hole 322, the convex ring body of the main rod 71 can abut against the outer wall of the second extension plate 32 to prevent the top block 73 from completely detaching from the first countersunk hole 322. The end face of the top block 73 close to the crystalline silicon plate 4 is an arc surface.

[0035] The crystalline silicon plate 4 is inserted into the groove body 1 321 for installation. During installation, the crystalline silicon plate 4 pushes away the top block 73. After installation, the top blocks 73 on the left and right sides of the crystalline silicon plate 4 respectively abut against the left and right ends of the crystalline silicon plate 4 to form a clamp.

[0036] like Figure 1 As shown, a guide plate 5 is installed on the bottom of the texturing box 1. The guide plate 5 is a rectangular plate structure, and the four outer walls of the guide plate 5 are in contact with the inner wall of the texturing box 1. The bottom of the second flow channel 121 is flush with the upper end surface of the guide plate 5 to facilitate the texturing agent on the guide plate 5 to pass through the second flow channel 121.

[0037] like Figure 2As shown, the crystalline silicon plate 4 is located above the guide plate 5, the lower end surface of the crystalline silicon plate 4 is close to the upper end surface of the guide plate 5, and a flow channel 9 for the texturing agent to flow is formed between the lower end surface of the crystalline silicon plate 4 and the upper end surface of the guide plate 5. Figure 1 The texturing agent flowing out from the bottom outlet of the baffle plate 8 flows downward into the upper left end of the guide plate 5, flows along the flow channel 9 from left to right and flows out from the second flow channel 121, and the liquid level of the texturing agent is controlled to be slightly higher than the bottom surface of the second extension plate 32. The space between the crystalline silicon plate 4 and the guide plate 5 is filled with the texturing agent, so that the texturing agent can corrode the bottom surface of the crystalline silicon plate 4, thereby forming an uneven velvet surface 41 (such as Figure 7 , Figure 8 shown), in Figure 8 In the embodiment, the velvet surface 41 includes a protrusion 411, which is formed downward along the bottom surface of the crystalline silicon plate 4. The protrusion 411 is a fine protrusion, which is generally observed under a microscope to check its molding quality. The size of the protrusion 411 varies. When the crystalline silicon plate 4 is in use, the velvet surface 41 is set upward, and the sunlight shines on the velvet surface 41, and the velvet surface 41 absorbs part of the sunlight. The setting of the protrusion 411 prevents the light from being immediately reflected back to the atmosphere, but can bounce part of the light between the protrusions 411, so that the velvet surface 41 of the crystalline silicon plate 4 can absorb more solar energy.

[0038] like Figure 1 , Figure 2 As shown, the upper end surface of the guide plate 5 is provided with a protrusion 51, combined with Figure 6 The second protrusion 51 protrudes upward along the upper end surface of the guide plate 5 to form a three-dimensional right-angled trapezoidal structure. The second protrusion 51 is provided with a bevel portion 511. The bevel portion 511 is an inclined surface of a three-dimensional right-angled trapezoid. The bevel portion 511 gradually inclines toward the lower end surface of the crystalline silicon plate 4 along the flow direction of the texturing agent in the flow channel 9. That is, Figure 2 In the embodiment, along the texturing agent flow direction L in the flow channel 9, the bevel portion 511 gradually tilts upward, so that the texturing agent passing through the bevel portion 511 can flow upward along the inclined surface of the bevel portion 511 and impact the velvet surface 41 of the crystalline silicon plate 4, thereby causing the velvet surface 41 to be more corroded by the impact area. Figure 8 On the velvet surface 41, the velvet surface 41 at the bottom of the crystalline silicon plate 4 is greatly eroded upward in the area with great impact, forming a protrusion 411 distributed in the upper position as shown in the R1 area, and the area with small impact force forms a protrusion 411 extending downward from the bottom position to a lower position in the R2 area, so that the protrusions 411 in R1 and R2 form a high and low distribution, so that the probability of light entering the R1 area being reflected by the protrusion 411 in the R1 area and hitting the protrusion 411 in the R2 area is greatly increased, thereby improving the absorption rate of sunlight by the velvet surface 41.

[0039] like Figure 6As shown, the bevel portion 511 is provided with a concave body 512, which is semi-cylindrical, and is recessed along the bevel portion 511. The concave body 512 is axially arranged along the inclination direction of the bevel portion 511, and the concave body 512 is radially arranged along the inclined surface perpendicular to the bevel portion 511. The texturing agent flows along Figure 6 As shown in the direction of the middle arrow, when the texturing agent flows in the concave body 512 , it can be concentrated in the internal area of ​​the concave body 512 and flow obliquely upward along the axial direction of the concave body 512 , preventing it from dispersing on both sides of the flow direction to cause the impact force to be weakened, thereby enhancing the impact erosion effect of the texturing agent on the velvet surface 41 .

[0040] like Figure 5 As shown, Figure 5 for Figure 1 In the P-direction view of the middle guide plate 5, the protrusions 51 are spaced apart in the Y direction and arranged in multiple layers in the X direction. Figure 5 In the orientation shown, the Y direction is from left to right, which is the flow direction of the texturing agent in the flow channel 9. The adjacent two layers of protrusions 51 are staggered along the Y direction, so that the impact area of ​​the texturing agent on the velvet surface 41 due to the action of the protrusions 51 is also regularly spaced and staggered. Figure 8 A protrusion 411 in the R2 region is formed at the periphery of the protrusion 411 in the R1 region. After the sunlight is reflected by the protrusion 411 in the R1 region, it is easily absorbed again by the protrusion 411 in the R2 region near the periphery of the protrusion 411 in the R1 region, thereby improving the absorption efficiency of sunlight and facilitating the improvement of energy collection efficiency.

[0041] The method for preparing the texture of the crystalline silicon texture preparation device is specifically as follows:

[0042] ①Install the crystalline silicon board 4, such as Figure 2 As shown, the crystalline silicon plate 4 is inserted into the groove body 1 321 , and the top blocks 73 on both sides abut against the left and right sides of the crystalline silicon plate 4 , and the bottom surface of the crystalline silicon plate 4 is flush with the bottom surface of the extension plate 2 32 ;

[0043] ② Install the clamp body 3, hang the extension plate 1 31 of the clamp body 3 on the upper ends of the wall body 1 11 and the wall body 2 12, and extend the crystalline silicon plate 4 downward into the velvet box 1, with the velvet surface 41 of the crystalline silicon plate 4 facing downward and close to the upper end surface of the guide plate 5.

[0044] ③ The texturing agent is introduced into the flow channel 111, and the texturing agent flows from left to right along the circulation channel 9, that is, the texturing agent flows from the left side of the crystalline silicon plate 4 along the bottom surface of the crystalline silicon plate 4 to the right side of the crystalline silicon plate 4, and the bottom surface of the crystalline silicon plate 4 is corroded during the flow process, so that a velvet surface 41 is formed on the bottom surface of the crystalline silicon plate 4.

[0045] When the texturing agent flows through the concave body 512, the texturing agent flows upward along the axial direction of the concave body 512 and impacts a part of the crystalline silicon plate 4, so as to produce a greater erosion effect on the crystalline silicon plate 4 and form a Figure 8 The protrusion 411 in the R1 region is not impacted and is eroded by the lateral flow of the texturing agent, forming the R2 region where the protrusion 411 has a smaller erosion degree. The bottom position of the protrusion 411 in the R2 region is higher than the bottom position of the protrusion 411 in the R1 region. In addition, since the protrusions 411 are spaced and staggered, Figure 8 A protrusion 411 in the R2 region is formed at the periphery of the protrusion 411 in the R1 region. After the sunlight is reflected by the protrusion 411 in the R1 region, it is easily reflected to the protrusion 411 in the R2 region near the periphery of the protrusion 411 in the R1 region and absorbed again.

[0046] The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should also be regarded as the protection scope of the present invention.

Claims

1. A crystalline silicon texture preparation device, characterized in that: The invention comprises a texturing box (1) and a crystalline silicon plate (4), wherein the crystalline silicon plate (4) is located in the texturing box (1), the top of the texturing box (1) is open, a guide plate (5) is installed on the bottom surface of the texturing box (1), the crystalline silicon plate (4) is located above the guide plate (5), a velvet surface (41) is provided on the lower end surface of the crystalline silicon plate (4), the velvet surface (41) is a processed surface, the velvet surface (41) is close to the upper end surface of the guide plate (5), and a space for texturing agent to flow is formed between the lower end surface of the crystalline silicon plate (4) and the upper end surface of the guide plate (5). The texturing box (1) comprises a wall body one (11) and a wall body two (12) located on both sides of the guide plate (5); the texturing agent in the circulation channel (9) flows from the side of the crystalline silicon plate (4) close to the wall body one (11) to the side of the crystalline silicon plate (4) close to the wall body two (12); the upper end surface of the guide plate (5) is provided with a protrusion two (51); the protrusions two (51) are spaced apart along the Y direction and are arranged in multiple layers along the X direction; the protrusions two (51) of two adjacent layers are staggered along the Y direction; The second protrusion (51) is provided with a bevel portion (511), and the bevel portion (511) is gradually inclined toward the lower end surface of the crystalline silicon plate (4) along the flow direction of the texturing agent in the circulation channel (9); The oblique edge portion (511) is provided with a concave body (512), and the concave body (512) is axially arranged along the inclination direction of the oblique edge portion (511); It also comprises a clamping body (3), the clamping body (3) comprising an extension plate 2 (32) located at the bottom, a groove body 1 (321) being provided at the bottom of the extension plate 2 (32), the crystalline silicon plate (4) being located in the groove body 1 (321), the extension plate 2 (32) being installed with an elastic component (7), the elastic component (7) being located at the left and right sides of the crystalline silicon plate (4), the elastic component (7) comprising a top block (73), the top blocks (73) being located at the left and right sides of the crystalline silicon plate (4) respectively abutting against the left and right ends of the crystalline silicon plate (4) to form a clamping structure; The texturing agent flows through the velvet surface (41) so that the velvet surface (41) is formed with a protrusion one (411), the area of ​​the protrusion one (411) that is greatly eroded by the texturing agent is R1, the area of ​​the protrusion one (411) that is less eroded by the texturing agent is R2, and the protrusion one (411) in the R1 area is formed at the peripheral position of the protrusion one (411) in the R2 area.

2. A crystalline silicon texture preparation device according to claim 1, characterized in that: The wall body one (11) is provided with a flow channel one (111), and the flow channel one (111) is a liquid inlet. The wall body two (12) is provided with a flow channel two (121), and the flow channel two (121) is a liquid outlet. The flow channel two (121) is connected to the right end of the upper end surface of the guide plate (5).

3. The device for preparing crystalline silicon texture surface according to claim 1, characterized in that: The second extension plate (32) is provided with a countersunk hole (322), and the countersunk hole (322) is located on the left and right sides of the first groove body (321). The top block (73) is inserted into the countersunk hole (322) and can move left and right along the inner wall of the countersunk hole (322). The side of the top block (73) away from the crystalline silicon plate (4) is abutted against a spring (72), and one end of the spring (72) away from the top block (73) abuts against the inner wall of the countersunk hole (322). The side of the countersunk hole (322) close to the crystalline silicon plate (4) is an opening, and the top block (73) can at least partially extend out of the opening of the countersunk hole (322).

4. The device for preparing crystalline silicon texture surface according to claim 1, characterized in that: The velvet making box (1) also includes three walls (14) arranged opposite to each other, and the length of the second extension plate (32) along the direction of the line connecting the two three walls (14) matches the distance between the two three walls (14).

5. The device for preparing crystalline silicon texture surface according to claim 1, characterized in that: The clamp body (3) also includes an extension plate 1 (31) located at the top, and the extension plate 1 (31) can be hung on the upper end of the wall body 1 (11) and the upper end of the wall body 2 (12), and the extension plate 2 (32) extends into the velvet making box (1).

6. A method for preparing a crystalline silicon texture, comprising preparing a texture on a crystalline silicon plate (4) using a crystalline silicon texture preparation device according to any one of claims 1 to 5, characterized in that: The steps include: ① The crystalline silicon plate (4) extends downward into the velvet-making box (1), with the velvet surface (41) of the crystalline silicon plate (4) to be formed facing downward and close to the upper end surface of the guide plate (5); ② The texturing agent flows from left to right along the circulation channel (9), and forms an erosion effect on the lower end surface of the crystalline silicon plate (4) during the flow process, so that the texturing surface (41) is formed on the lower end surface of the crystalline silicon plate (4); The texturing agent flows through the velvet surface (41) so that the velvet surface (41) is formed with a protrusion one (411), the area of ​​the protrusion one (411) that is greatly eroded by the texturing agent is R1, the area of ​​the protrusion one (411) that is less eroded by the texturing agent is R2, and R1 is distributed around R2.

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