A plane arc DC sputtering ion plating machine

Abstract

The present application relates to the technical field of coating equipment, and discloses a plane arc DC sputtering ion coating machine, which is mainly composed of a clamping assembly, wherein two groups of clamping assemblies are arranged on the rotating mechanism, and the number of each group of clamping assemblies is three, and the two groups of clamping assemblies are arranged alternately, and the motion states of the clamping assemblies in the same group are the same, and the motion states of the clamping assemblies in different groups are different. When the present invention places a substrate on the top of a rotating plate, a group of clamping assemblies is controlled to move so that the adjustment assembly on the group of clamping assemblies clamps and fixes the side wall of the substrate, and after a certain period of time, the adjustment assembly on the other group of clamping assemblies is controlled to clamp and fix the substrate. The alternating clamping of the two groups of clamping assemblies can intermittently change the clamping position of the substrate while ensuring the stability of the substrate setting, so that the clamping position of the substrate has time and space for coating, thereby enhancing the uniformity of substrate coating and improving the coating quality.

Description

Technical Field

[0001] The present application relates to the technical field of coating equipment, and in particular to a plane arc DC sputtering ion coating machine. Background Art

[0002] Physical vapor deposition technology refers to the technology of vaporizing the surface of the material source into gaseous atoms, molecules or partially ionizing them into ions under vacuum conditions by physical methods, and depositing a thin film with some special functions on the surface of the substrate. The main methods of physical vapor deposition include vacuum evaporation, sputtering, arc plasma plating, ion plating, molecular beam epitaxy, etc.

[0003] In the semiconductor manufacturing process, it is necessary to deposit a thin film layer on the silicon wafer substrate, that is, to stack a thin film on the silicon wafer substrate to form a conductive layer. The above process is usually completed using a magnetron sputtering ion plating machine. The existing magnetron sputtering ion plating machine is mainly composed of a clamping component, a target material, etc. When in use, the silicon wafer substrate (i.e., substrate) is placed on a fixed table and clamped and fixed using a clamping component. Then, the vacuum box is closed, the vacuum box is first evacuated, and then filled with reaction gas, and then a DC power supply is connected, so that high-energy ions are accelerated to bombard the target surface under the action of the electric field, sputtering target atoms and depositing them on the surface of the substrate. The vacuum coating operation of the semiconductor silicon wafer substrate is achieved through the above actions.

[0004] However, the existing coating machines still have some defects during use: in order to ensure the stability of substrate clamping, the clamping assembly will always be in contact with the outer wall of the substrate, causing the coating in this area of ​​the substrate to be affected, resulting in uneven substrate coating and affecting the coating quality. Summary of the invention

[0005] The present application proposes a planar arc DC sputtering ion plating machine, which has the advantages of effectively changing the way of clamping substrates and improving the quality of substrate coating, and is used to solve the problem that the clamping component is always in contact with the wall of the substrate and the coating on the substrate surface is uneven.

[0006] To achieve the above-mentioned purpose, the present application adopts the following technical solution: a plane arc DC sputtering ion plating machine, comprising:

[0007] A vacuum mechanism, used for setting a vacuum environment;

[0008] A rotating mechanism, wherein the vacuum mechanism comprises a rotating mechanism for providing a space for placing the substrate and providing power for rotating the substrate;

[0009] The clamping assembly is provided with two groups of clamping assemblies on the rotating mechanism, and the number of clamping assemblies in each group is three. The two groups of clamping assemblies are alternately arranged, and the two groups of clamping assemblies are evenly arranged around the rotating mechanism. The motion states of the clamping assemblies in the same group are the same, and the motion states of the clamping assemblies in different groups are different, which are used to alternately clamp and fix the substrate.

[0010] Furthermore, the vacuum mechanism also includes:

[0011] A vacuum box, wherein the vacuum box is designed as a box with an opening on one side;

[0012] An inflation pipe, wherein one side of the top of the vacuum box is fixedly connected with an inflation pipe;

[0013] An exhaust pipe, the other side of the top of the vacuum box is fixedly connected with an exhaust pipe, and the exhaust pipe is located at a diagonal position of the inflation pipe;

[0014] A sealing door, wherein the sealing door is arranged at an opening position of the vacuum box;

[0015] A working mechanism, wherein the inner top of the vacuum mechanism is provided with a working mechanism for sputtering atoms;

[0016] A fixing mechanism is provided at the inner bottom end of the vacuum mechanism, and the fixing mechanism is located directly below the working mechanism, so as to enhance the working stability of the rotating mechanism.

[0017] Furthermore, the working mechanism includes:

[0018] A magnetic pole assembly, wherein the inner top of the vacuum box is fixedly connected to the upper end of the magnetic pole assembly;

[0019] A target material, wherein the lower end of the magnetic pole assembly is fixedly connected to the target material;

[0020] A shielding cover is fixedly connected to the inner top of the vacuum box, and the magnetic pole assembly and the target material are located inside the shielding cover.

[0021] Furthermore, the fixing mechanism comprises:

[0022] A fixing platform, wherein the fixing platform is circular in shape;

[0023] Fixed balls, the top edge of the fixed platform is provided with an annular groove, and a plurality of fixed balls are movably connected to the bottom of the annular groove;

[0024] An annular heating device, a circular groove is opened in the middle of the top of the fixing platform, and the bottom of the circular groove is fixedly connected with the annular heating device.

[0025] Furthermore, the rotating mechanism comprises:

[0026] A rotating plate, the rotating plate is arranged on the top of the fixed platform, and the circular size of the rotating plate is equal to that of the fixed platform, and the rotating plate is provided with a plurality of heat-transmitting holes;

[0027] A rotating ring, the bottom edge of the rotating plate is fixedly connected with the rotating ring, the rotating ring is movably engaged with the ring groove of the fixed platform, and the bottom end of the rotating ring contacts the outer wall of the fixed ball;

[0028] A rotating shaft, one end of which is fixedly connected to the middle of the bottom end of the rotating plate, and the other end of which passes through the fixing mechanism and is movably connected to the rotating motor.

[0029] Furthermore, the clamping assembly comprises:

[0030] A clamping frame, wherein the clamping frame is fixedly embedded in the top end of the rotating plate, and the top surface of the clamping frame is flush with the top surface of the rotating plate;

[0031] A threaded rod, wherein one end of the threaded rod is movably connected to an inner side of the clamping frame, and the other end of the threaded rod is movably connected to the motor;

[0032] Limit blocks, wherein the inner walls on both sides of the clamping frame are fixedly connected with a plurality of limit blocks, and one side of the limit blocks is arc-shaped;

[0033] An adjustment component is movably sleeved with the threaded rod and is used to clamp and fix the substrate.

[0034] Furthermore, the adjustment component includes:

[0035] A lower block, wherein the lower block is movably arranged inside the clamping frame and is threadedly sleeved with the threaded rod;

[0036] An upper block, the top end of the lower block is fixedly connected to the upper block, and the upper block is movably arranged above the clamping frame;

[0037] A limit assembly is provided inside the adjustment assembly to provide power for the operation of the movable assembly;

[0038] A movable component is also provided in the adjustment component, which is used to change the direction of the reaction gas and improve the coating efficiency;

[0039] An auxiliary component is arranged on the outside of the adjustment component, and the auxiliary component is located on the side of the adjustment component close to the center of the rotating mechanism, so as to enhance the clamping stability of the adjustment component on the substrate.

[0040] Furthermore, the limiting component includes:

[0041] A transverse bladder, wherein transverse grooves are provided on both sides of the lower block, and an inner wall of one end of the transverse groove is fixedly connected to one end of the transverse bladder, the transverse bladder is made of rubber material that can be deformed laterally, and is filled with a water solution;

[0042] A transverse block, the other end of the transverse sac is fixedly connected to the transverse block, and the shape of the transverse block is a hemisphere;

[0043] A connecting pipe, wherein the connecting pipe is fixedly sleeved in the adjustment assembly, and one end of the connecting pipe is fixedly connected to the transverse bag;

[0044] Vertical bag, vertical grooves are provided on both sides of the bottom end of the upper block, and the bottom end of the vertical groove is fixedly connected to one end of the vertical bag, the vertical bag is made of rubber material that can be deformed vertically, and the vertical bag is filled with aqueous solution, and the other end of the connecting pipe is fixedly connected to the vertical bag;

[0045] A vertical block, the other end of the vertical bag is fixedly connected with the vertical block, and the top of the vertical block is in contact with the movable component.

[0046] Furthermore, the activity components include:

[0047] An active bag, wherein an active cavity is provided inside the upper block, and the top of the active cavity is fixedly connected to the top of the active bag. The active bag is made of rubber material that can be deformed vertically, and the upper and lower inner walls of the active bag are connected by an active spring;

[0048] A movable plate, the bottom end of the movable bag is fixedly connected to the movable plate, and the bottom end of the movable plate is in contact with the limiting assembly;

[0049] An air intake pipe, the air intake pipe is fixedly sleeved in the adjustment assembly, and there are a number of air intake pipes, one end of the air intake pipe is connected to the outside, and the other end of the air intake pipe is connected to the inside of the movable bag, a one-way valve is arranged inside the air intake pipe, and the air flow direction of the air intake pipe is from the outside to the movable bag, the air intake pipe is arranged obliquely, and the upper end of the air intake pipe is biased toward the edge of the rotating mechanism, and the lower end of the air intake pipe is biased toward the center of the rotating mechanism;

[0050] An exhaust pipe, wherein the exhaust pipe is fixedly sleeved in the adjustment assembly, and there are a plurality of exhaust pipes, the intake pipe and the exhaust pipe are alternately arranged, one end of the exhaust pipe is connected with the outside, and the other end of the exhaust pipe is connected with the inside of the movable bag, a one-way valve is arranged inside the exhaust pipe, and the air flow direction of the exhaust pipe is from the movable bag to the outside, the exhaust pipe is arranged obliquely, and the upper end of the exhaust pipe is biased toward the center of the rotating mechanism, and the lower end of the exhaust pipe is biased toward the edge of the rotating mechanism.

[0051] Furthermore, the auxiliary components include:

[0052] Deformable capsules, the number of which is an odd number greater than one, and the deformable capsules are fixedly connected to the outer wall of the lower block, the deformable capsules are made of rubber, and the deformable capsules are filled with a water solution;

[0053] A connecting pipe, through which two adjacent deformation bags are connected;

[0054] A contact sensor is fixedly connected to the front and rear inner walls of the deformation capsule located in the middle.

[0055] This application has the following beneficial effects:

[0056] The present application provides a plane arc DC sputtering ion plating machine, which arranges two groups of clamping assemblies on a rotating mechanism, and the number of clamping assemblies in each group is three. When a substrate is placed on the top of a rotating plate, one group of clamping assemblies is controlled to move so that the adjustment assemblies on the group of clamping assemblies clamp and fix the side wall of the substrate, and after a certain period of time, the adjustment assemblies on the other group of clamping assemblies are controlled to clamp and fix the substrate. The alternating clamping of the two groups of clamping assemblies can intermittently change the clamping position of the substrate while ensuring the stability of the substrate setting, so that the clamping position of the substrate has time and space for coating, thereby enhancing the uniformity of substrate coating and improving the coating quality.

[0057] By setting a rotating shaft at the bottom end of the rotating plate, the substrate on the rotating plate can be rotated to fully contact with the ions, and the two sets of adjustment components are alternately clamped to effectively adjust the position of the substrate continuously, so that the substrate and the rotating plate are concentrically set, and the wall surface of one side of the substrate is prevented from being damaged by excessive centrifugal force due to the eccentric setting during the rotation process, thereby effectively improving the protection of the substrate.

[0058] By arranging an auxiliary component on the clamping component, when the adjustment component contacts the substrate, the auxiliary component is deformed by the shape of the substrate, so that the middle part of the auxiliary component is compressed and the two sides are expanded, thereby further improving the clamping effect of the adjustment component on the substrate. At the same time, the compression of the middle part of the auxiliary component effectively makes the two contact sensors contact and transmit signals, so that the control system stops moving after receiving three signals, thereby further improving the protection of the substrate and preventing the adjustment component from excessive movement and squeezing and damaging the substrate.

[0059] By arranging a limit assembly, a movable assembly and a limit block on the clamping assembly, when a group of adjustment assemblies that are not clamped moves within the clamping frame, the limit block pushes the limit assembly back and forth, thereby reciprocatingly applying a deformation force to the movable assembly, effectively changing the air pressure environment in the movable bag, so that the reaction gas is continuously applied with thrust to move in the direction of the target material, thereby providing power for continuously bombarding the target material, and effectively improving the sputtering coating efficiency of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0060] The accompanying drawings, which constitute a part of the specification, illustrate the embodiments disclosed in the present application and, together with the description, serve to explain the principles disclosed in the present application.

[0061] The present application can be more clearly understood from the following detailed description with reference to the accompanying drawings, in which:

[0062] Figure 1 It is a three-dimensional structural diagram of the present invention as a whole;

[0063] Figure 2 It is an overall three-dimensional structural diagram of the vacuum mechanism section of the present invention;

[0064] Figure 3 It is a three-dimensional structural diagram of the fixing mechanism in the present invention;

[0065] Figure 4 It is a cross-sectional three-dimensional structural diagram of the fixing mechanism in the present invention;

[0066] Figure 5 It is a three-dimensional structural diagram of the fixed platform, the fixed ball, the annular heating device and the rotating shaft in the present invention;

[0067] Figure 6 It is a three-dimensional structural diagram of the rotating plate, the rotating ring and the clamping assembly in the present invention;

[0068] Figure 7 A three-dimensional structural diagram of a clamping assembly in the present invention;

[0069] Figure 8 It is a cross-sectional three-dimensional structural diagram of a clamping assembly in the present invention;

[0070] Fig. 9 is a three-dimensional structural diagram of an adjustment component in the present invention;

[0071] Fig.10 A side cross-sectional perspective structural diagram of an adjustment component in the present invention;

[0072] Fig.11 A top-view cross-sectional three-dimensional structural diagram of an adjustment component in the present invention;

[0073] Fig.12 It is a side cross-sectional plan view of the structure of an adjustment component in the present invention.

[0074] In the figure: 1. vacuum mechanism; 11. vacuum box; 12. filling tube; 13. exhaust tube; 14. sealing door; 141. sealing pad; 142. sealing plug; 2. working mechanism; 21. magnetic pole assembly; 22. target material; 23. shielding cover; 3. fixing mechanism; 31. fixing table; 32. fixing ball; 33. annular heating device; 4. rotating mechanism; 41. rotating plate; 42. rotating ring; 43. rotating shaft; 5. clamping Assembly; 51. Clamping frame; 52. Threaded rod; 53. Limit block; 6. Adjustment assembly; 61. Lower block; 62. Upper block; 7. Limit assembly; 71. Horizontal bag; 72. Horizontal block; 73. Connecting pipe; 74. Vertical bag; 75. Vertical block; 8. Movable assembly; 81. Movable bag; 82. Movable plate; 83. Intake pipe; 84. Exhaust pipe; 9. Auxiliary assembly; 91. Deformation bag; 92. Connecting pipe; 93. Contact sensor. DETAILED DESCRIPTION

[0075] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0076] Embodiment 1

[0077] A plane arc DC sputtering ion plating machine, comprising:

[0078] See also Figure 1-Figure 2 , a vacuum mechanism 1 is used to set a vacuum environment. A control system is provided in the vacuum mechanism 1 to control the operation of each mechanism. The vacuum mechanism 1 includes a vacuum box 11, a gas charging pipe 12, an exhaust pipe 13 and a sealing door 14. The vacuum box 11 is designed as a box with an opening on one side, which is convenient for taking a substrate. A gas charging pipe 12 is fixedly connected to one side of the top of the vacuum box 11 for filling a reaction gas, such as argon, into the vacuum box 11. An exhaust pipe 13 is fixedly connected to the other side of the top of the vacuum box 11, and the exhaust pipe 13 is located at a diagonal position of the gas charging pipe 12 for The gas in the vacuum box 11 is evacuated to make its internal environment tend to vacuum, in preparation for the subsequent filling of reaction gas and coating. The sealing door 14 is set at the opening position of the vacuum box 11, and the sealing door 14 is movably connected to the vacuum box 11 through a sealing bolt 142. The staff can open and close the opening of the vacuum box 11 by installing and disassembling the sealing door 14. A sealing gasket 141 is provided between the vacuum box 11 and the sealing door 14, which can effectively improve the connection tightness between the vacuum box 11 and the sealing door 14, thereby improving the sealing of the vacuum mechanism 1.

[0079] See also Figure 2, working mechanism 2, a working mechanism 2 is arranged at the inner top of the vacuum mechanism 1, which is used to sputter out atoms. The working mechanism 2 includes a magnetic pole assembly 21, a target material 22 and a shielding cover 23. The inner top of the vacuum box 11 is fixedly connected to the upper end of the magnetic pole assembly 21, and the lower end of the magnetic pole assembly 21 is fixedly connected to the target material 22. The inner top of the vacuum box 11 is fixedly connected to the shielding cover 23, and the magnetic pole assembly 21 and the target material 22 are located inside the shielding cover 23. When a DC power supply is connected to the vacuum mechanism 1, the reaction gas glow discharges and hits the target material 22 under the action of the electric field, knocking out the atoms on the surface of the target material 22 and sputtering them toward the substrate.

[0080] See also Figure 2-Figure 5 , a fixing mechanism 3 is provided at the bottom end of the interior of the vacuum mechanism 1, and the fixing mechanism 3 is located directly below the working mechanism 2, for enhancing the working stability of the rotating mechanism 4, the fixing mechanism 3 comprises a fixing table 31, a fixing ball 32 and an annular heating device 33, the fixing table 31 is circular in shape, and a fixing column is fixedly connected to the bottom end of the fixing table 31, which can improve the stability of the fixing table 31 arranged inside the vacuum box 11, an annular groove is provided at the top edge of the fixing table 31, and a number of fixing balls 32 are movably connected to the bottom end of the annular groove, and the fixing balls 32 can rotate by themselves under external force, a circular groove is provided in the middle part of the top end of the fixing table 31, and an annular heating device 33 is fixedly connected to the bottom end of the circular groove, the annular heating device 33 can set the heating time and heating temperature according to the actual coating situation, and heat the substrate by heating under the control of the control system.

[0081] See also Figure 2-Figure 6 , a rotating mechanism 4 is provided inside the vacuum mechanism 1, which is used to provide space for placing the substrate and provide power for the rotation of the substrate. The rotating mechanism 4 includes a rotating plate 41, a rotating ring 42 and a rotating shaft 43. The rotating plate 41 is arranged on the top of the fixed table 31, and the circular size of the rotating plate 41 is equal to that of the fixed table 31. A plurality of heat-transmitting holes are provided on the rotating plate 41 to facilitate the heat of the annular heating device 33 to pass through the rotating plate 41 and act on the substrate. The bottom edge of the rotating plate 41 is fixedly connected with a rotating ring 42, and the rotating ring 42 is movably engaged with the annular groove of the fixed table 31, and The bottom end of the rotating ring 42 contacts the outer wall of the fixed ball 32. When the rotating mechanism 4 rotates, due to the rolling effect of the fixed ball 32, the friction between the rotating mechanism 4 and the fixed mechanism 3 is rolling friction, which effectively reduces the movement resistance of the rotating mechanism 4. One end of the rotating shaft 43 is fixedly connected to the middle of the bottom end of the rotating plate 41, and the other end of the rotating shaft 43 passes through the fixed mechanism 3 and is movably connected to the rotating motor. When the rotating mechanism 4 is working, the rotating shaft 43 can drive the rotating plate 41 to rotate, thereby realizing the rotation of the substrate, prompting the substrate to fully contact with the sputtered target atoms, and improving the coating effect of the substrate.

[0082] See also Figure 2-Figure 4, Figure 6-Figure 8 , the clamping assembly 5, two groups of clamping assemblies 5 are arranged on the rotating mechanism 4, and the number of each group of clamping assemblies 5 is three, the two groups of clamping assemblies 5 are arranged alternately, and the two groups of clamping assemblies 5 are evenly arranged around the rotating mechanism 4, the clamping assemblies 5 in the same group have the same motion state, and the clamping assemblies 5 in different groups have different motion states, which are used to alternately clamp and fix the substrate, that is, when one group of clamping assemblies 5 clamps and fixes the substrate, the other group of clamping assemblies 5 does not clamp and fix the substrate, and after a period of time, the two groups of clamping assemblies 5 clamp and switch, which not only effectively ensures the placement stability of the substrate, but also makes the clamping position of the substrate fully coated, thereby improving the coating quality The clamping assembly 5 is composed of a clamping frame 51, a threaded rod 52 and an adjustment assembly 6. The clamping frame 51 is fixedly embedded in the top of the rotating plate 41, and the top surface of the clamping frame 51 is flush with the top surface of the rotating plate 41, which effectively improves the stability of substrate placement and ensures that the substrate is not affected when adjusting its position. One side of the inner side of the clamping frame 51 is movably connected to one end of the threaded rod 52, and the other end of the threaded rod 52 is movably connected to the motor. The threaded rod 52 has forward and reverse rotation functions under the action of the motor. When working, the forward rotation of the threaded rod 52 can drive the adjustment assembly 6 close to the substrate, and the reverse rotation of the threaded rod 52 can drive the adjustment assembly 6 away from the substrate.

[0083] See also Figure 2-Figure 4 , Figure 7-Figure 12 , adjustment component 6, the adjustment component 6 is movably sleeved with the threaded rod 52, and is used to clamp and fix the substrate. The adjustment component 6 includes a lower block 61 and an upper block 62, the lower block 61 is movably arranged inside the clamping frame 51, and the lower block 61 is threadedly sleeved with the threaded rod 52, the top of the lower block 61 is fixedly connected with the upper block 62, and the upper block 62 is movably arranged above the clamping frame 51. When working, the lower block 61 can move horizontally along the clamping frame 51 under the rotation of the threaded rod 52, thereby driving the upper block 62 to move, thereby realizing the clamping and fixing or release and separation of the substrate by the three upper blocks 62.

[0084] Embodiment 2

[0085] On the basis of the first embodiment, the adjustment component 6 further includes:

[0086] See also Figure 2-Figure 4 , Figure 7-Figure 12, auxiliary component 9, an auxiliary component 9 is arranged on the outside of the adjustment component 6, and the auxiliary component 9 is located on one side of the adjustment component 6 close to the center of the rotating mechanism 4, and is used to enhance the clamping stability of the adjustment component 6 on the substrate. The auxiliary component 9 includes a deformation capsule 91, a connecting tube 92 and a contact sensor 93. The number of deformation capsules 91 is an odd number greater than one, and the deformation capsule 91 is fixedly connected to the outer wall of the lower block 61, so that the deformation capsule 91 can be symmetrically deformed, thereby expanding the clamping area between the adjustment component 6 and the substrate and enhancing the clamping stability. The deformation capsule 91 is made of rubber, and the deformation capsule 91 is filled with an aqueous solution. When the deformation capsule 91 is not under pressure, each deformation capsule 91 is in an incompletely expanded state, and each deformation capsule 91 is filled with an aqueous solution, which can provide conditions for the subsequent change of the pressure state of the deformation capsule 91. When the deformation capsule 91 is under pressure, the aqueous solution is used to The middle part moves toward both sides to change the shape of each deformation capsule 91, so that the deformation capsule 91 is fully fitted with the substrate. The two adjacent deformation capsules 91 are connected by a connecting tube 92, which can realize the movement of the aqueous solution in each deformation capsule 91. The front and rear inner walls of the deformation capsule 91 located in the middle are fixedly connected with contact sensors 93, and the distance between the two contact sensors 93 is small. When the adjustment component 6 is fitted with the substrate, it is ensured that the substrate can overcome the resistance of the deformation capsule 91 and make the two contact sensors 93 contact. When the two contact sensors 93 are in contact, the contact sensor 93 will transmit a signal to the control system. After the control system receives three signals in the same group, the control system will stop the movement of the three adjustment components 6 in the group, that is, complete the clamping and fixing of the substrate by the adjustment component 6 in the group, and avoid the three adjustment components 6 from excessively clamping the substrate and damaging the substrate.

[0087] Embodiment 3

[0088] On the basis of the second embodiment, the adjustment component 6 further includes:

[0089] See also Figure 7-Figure 10, a limiting component 7 is arranged in the adjustment component 6 to provide power for the operation of the movable component 8. The limiting component 7 includes a transverse bag 71, a transverse block 72, a connecting pipe 73, a vertical bag 74 and a vertical block 75. Transverse grooves are provided on both sides of the lower block 61, and the inner wall of one end of the transverse groove is fixedly connected to one end of the transverse bag 71, and the other end of the transverse bag 71 is fixedly connected to the transverse block 72. The transverse bag 71 is made of a rubber material that can be deformed laterally, and the transverse bag 71 is filled with an aqueous solution. The shape of the transverse block 72 is a hemisphere. When the transverse block 72 contacts the clamping frame 51, the transverse bag 71 is in an expanded and elongated state due to the action of the aqueous solution. When the transverse block 72 contacts and squeezes the limiting block 53, the transverse block 72 is pushed into the transverse groove to make the transverse bag 71 in a compressed state, thereby transferring the aqueous solution therein. The connecting pipe 73 is fixedly sleeved in the adjustment component 6, and one end of the connecting pipe 73 The end is fixedly connected with the transverse bag 71, and the other end of the connecting tube 73 is fixedly connected with the vertical bag 74, which can connect the transverse bag 71 and the vertical bag 74 to realize the movement of the aqueous solution inside the two. Vertical grooves are opened on both sides of the bottom end of the upper block 62, and the bottom end of the vertical groove is fixedly connected to one end of the vertical bag 74, and the other end of the vertical bag 74 is fixedly connected with a vertical block 75, and the top of the vertical block 75 is in contact with the movable component 8. The vertical bag 74 is made of rubber material that can be deformed vertically, and the vertical bag 74 is filled with aqueous solution. When the transverse bag 71 is in an expanded and elongated state, the vertical bag 74 is in a compressed state. At this time, most of the aqueous solution is located in the transverse bag 71, and the vertical block 75 is located in the vertical groove. When the transverse bag 71 is in a compressed state, the vertical bag 74 is in an expanded and elongated state. At this time, most of the aqueous solution is located in the vertical bag 74, and at the same time, most of the vertical block 75 moves out of the vertical groove, thereby being able to push the movable component 8 to deform.

[0090] See also Figure 7-Figure 12, movable component 8, the adjustment component 6 is also provided with a movable component 8, which is used to change the direction of the reaction gas and improve the coating efficiency. The movable component 8 includes a movable capsule 81, a movable plate 82, an air inlet pipe 83 and an exhaust pipe 84. An movable cavity is provided inside the upper block 62, and the top of the movable cavity is fixedly connected to the top of the movable capsule 81. The movable capsule 81 is made of rubber material that can be deformed vertically, and the upper and lower inner walls of the movable capsule 81 are connected by a movable spring. When the movable capsule 81 is not subjected to external force, the movable capsule 81 is in a stretched state under the action of the movable spring. When the movable bag 81 is subjected to external force, the movable bag 81 overcomes the action of the movable spring and is in a compressed state. The bottom end of the movable bag 81 is fixedly connected to the movable plate 82, and the bottom end of the movable plate 82 contacts the limit assembly 7. When the vertical bag 74 expands and stretches, it can push the vertical block 75 to move upward, thereby applying an upward pushing force to the movable plate 82, that is, the compression of the movable bag 81 is realized, thereby changing the air pressure environment in the movable bag 81. The air inlet pipe 83 is fixedly sleeved in the adjustment assembly 6, and the number of the air inlet pipes 83 is several, one end of the air inlet pipe 83 is connected to the outside world, and the air inlet pipe The other end of 83 is connected to the interior of the movable bag 81, a one-way valve is arranged inside the air inlet pipe 83, and the air flow direction of the air inlet pipe 83 is from the outside to the movable bag 81, the air inlet pipe 83 is arranged obliquely, and the upper end of the air inlet pipe 83 is biased toward the edge of the rotating mechanism 4, and the lower end of the air inlet pipe 83 is biased toward the center of the rotating mechanism 4, so that the gas located outside the working mechanism 2 can be collected into the movable bag 81, the exhaust pipe 84 is fixedly sleeved in the adjustment component 6, and the number of exhaust pipes 84 is several, the air inlet pipe 83 and the exhaust pipe 84 are arranged alternately, and the exhaust pipe 8 4 is connected to the outside, and the other end of the exhaust pipe 84 is connected to the inside of the movable bag 81, a one-way valve is arranged inside the exhaust pipe 84, and the air flow direction of the exhaust pipe 84 is from the movable bag 81 to the outside, the exhaust pipe 84 is arranged obliquely, and the upper end of the exhaust pipe 84 is biased toward the center of the rotating mechanism 4, and the lower end of the exhaust pipe 84 is biased toward the edge of the rotating mechanism 4, so that the gas in the movable bag 81 can be discharged to the inside of the working mechanism 2. In summary, the cooperation of the air inlet pipe 83 and the exhaust pipe 84 effectively improves the thrust applied to the gas, thereby improving the coating effect.

[0091] The clamping assembly 5 also includes:

[0092] See also Figure 2-Figure 4 , Figure 7-Figure 8 , limit blocks 53, the inner walls on both sides of the clamping frame 51 are fixedly connected with a plurality of limit blocks 53, and one side of the limit block 53 is arc-shaped. When the adjustment component 6 moves, the cross block 72 is limited by the limit block 53 and moves back and forth in the cross groove, thereby changing the state of the limit component 7 and realizing the operation of the movable component 8.

[0093] The working principle of the method of the present invention is as follows:

[0094] When the substrate needs to be coated, the substrate is first placed on the rotating plate 41, and then the two groups of clamping components 5 are used to clamp and fix the substrate. Then, the vacuum mechanism 1 is sealed with the sealing door 14, and the air in the vacuum box 11 is extracted with the exhaust pipe 13, and the exhaust is stopped after the vacuum degree in the vacuum box 11 reaches the set value. Then, the reaction gas is injected into the vacuum box 11 with the inflation pipe 12, and the inflation is stopped after the pressure value in the vacuum box 11 reaches the set pressure value. At the same time, the annular heating device 33 heats up, and its heat passes through the heat-transmitting holes to heat the substrate. When the substrate reaches the set temperature, the annular heating device 33 stops heating. At this time, the preparation work in the device is completed, the power supply is started, and direct current is connected to the vacuum box 11. The reaction gas bombards the target material 22 under the action of the electric field, so that ions on the surface of the target material 22 are sputtered and shot toward the surface of the substrate.

[0095] During the substrate coating process, the two groups of adjustment components 6 work asynchronously, that is, when one group of adjustment components 6 moves toward the center of the rotating plate 41 and clamps the substrate, the other group of adjustment components 6 moves away from the center of the rotating plate 41 and does not clamp the substrate. Then, after the other group of adjustment components 6 moves back and forth along the clamping frame 51 once, the states of the two groups of adjustment components 6 are interchanged, and so on. The alternating clamping of the adjustment components 6 on the two groups of clamping components 5 can intermittently change the clamping position of the substrate while ensuring the stability of the substrate setting, so that the clamping position of the substrate has the coating. Time and space, thereby enhancing the uniformity of substrate coating and improving the coating quality. At the same time, the rotating shaft 43 is started to drive the rotating plate 41 to rotate, so that the substrate on the rotating plate 41 is fully in contact with the ions due to the rotation, further improving the coating effect of the substrate. The two groups of adjustment components 6 alternately clamp the substrate, effectively adjusting the position of the substrate at the top of the rotating plate 41, so that the substrate is continuously fine-tuned and always set concentrically with the rotating plate 41, preventing the eccentric setting of the substrate during the rotation process from causing excessive centrifugal force to damage the wall surface on one side, effectively improving the protection of the substrate.

[0096] When a group of adjustment components 6 is about to clamp the substrate, the deformation capsule 91 is affected by the shape of the substrate and the aqueous solution therein moves, thereby changing the shape of the deformation capsule 91, that is, the middle part of the deformation capsule 91 is compressed and the two sides are expanded, effectively increasing the contact area between the auxiliary component 9 and the substrate, and further improving the clamping effect of the adjustment component 6 on the substrate. At this time, the compression of the middle part of the auxiliary component 9 effectively makes the two contact sensors 93 contact and transmit signals to the control system. When the control system receives three signals in the same group, the group of adjustment components 6 stops moving, further improving the protection of the substrate and preventing the adjustment components 6 from moving excessively and squeezing and damaging the substrate. At the same time, another group of adjustment components 6 is controlled by the control system to break contact with the substrate and move in the clamping frame 51. During this process, the auxiliary component 9 is restored to its original state by the action of the aqueous solution therein, and the two contact sensors 93 break contact.

[0097] When the adjustment component 6 moves in the clamping frame 51, if the limit block 53 contacts the horizontal block 72, the aqueous solution in the horizontal bag 71 moves toward the vertical bag 74, so that the vertical block 75 pushes the movable bag 81 to compress upward; if the clamping frame 51 contacts the horizontal block 72, the aqueous solution in the vertical bag 74 moves toward the horizontal bag 71, so that the movable bag 81 returns to its original state downward. Due to the number of limit blocks 53, the movable component 8 will deform back and forth, so that the movable component 8 collects the gas located on the outside of the working mechanism 2 into the movable bag 81 through the air inlet pipe 83, and discharges the gas located in the movable bag 81 to the inside of the working mechanism 2, so that the reaction gas is continuously applied with thrust to move in the direction of the target material 22, thereby providing power for continuously bombarding the target material 22, effectively improving the sputtering coating efficiency of the device.

Claims

1. A plane arc DC sputtering ion coating machine, characterized in that: include: A vacuum mechanism (1), used for setting a vacuum environment; A rotating mechanism (4), the vacuum mechanism (1) comprising a rotating mechanism (4), which is used to provide space for placing a substrate and to provide power for rotating the substrate, the rotating mechanism (4) comprising a rotating plate (41); Clamping components (5), wherein two groups of clamping components (5) are arranged on the rotating mechanism (4), and the number of clamping components (5) in each group is three, the two groups of clamping components (5) are arranged alternately, and the two groups of clamping components (5) are evenly arranged around the rotating mechanism (4), the clamping components (5) in the same group have the same motion state, and the clamping components (5) in different groups have different motion states, and are used to alternately clamp and fix the substrate; The clamping assembly (5) comprises: A clamping frame (51), wherein the clamping frame (51) is fixedly embedded in the top end of the rotating plate (41), and the top surface of the clamping frame (51) is flush with the top surface of the rotating plate (41); A threaded rod (52), wherein one side of the interior of the clamping frame (51) is movably connected to one end of the threaded rod (52), and the other end of the threaded rod (52) is movably connected to the motor; An adjustment component (6), the adjustment component (6) being movably sleeved with the threaded rod (52) and used for clamping and fixing the substrate; The adjustment component (6) comprises: A lower block (61), the lower block (61) being movably disposed inside the clamping frame (51), and the lower block (61) being threadedly sleeved with the threaded rod (52); An upper block (62), the top end of the lower block (61) is fixedly connected to the upper block (62), and the upper block (62) is movably arranged above the clamping frame (51); An auxiliary component (9), wherein the auxiliary component (9) is arranged on the outer side of the adjustment component (6), and the auxiliary component (9) is located on a side of the adjustment component (6) close to the center of the rotating mechanism (4); The auxiliary component (9) comprises: Deformable capsules (91), the number of the deformable capsules (91) is an odd number greater than one, and the deformable capsules (91) are fixedly connected to the outer wall of the lower block (61), the deformable capsules (91) are made of rubber material, and the deformable capsules (91) are filled with an aqueous solution; A connecting pipe (92), wherein two adjacent deformation bags (91) are connected to each other via the connecting pipe (92); The front and rear inner walls of the deformation capsule (91) located in the middle are both fixedly connected with the contact sensors (93). When two contact sensors (93) are in contact, the contact sensors (93) transmit signals to the control system. After the control system receives three signals in the same group, the control system stops the movement of the three adjustment components (6) in the group, thus completing the clamping and fixing of the substrate by the adjustment components (6) in the group.

2. A plane arc DC sputtering ion plating machine according to claim 1, characterized in that: The vacuum mechanism (1) further comprises: A vacuum box (11), wherein the vacuum box (11) is designed as a box with an opening on one side; An air filling pipe (12), wherein one side of the top end of the vacuum box (11) is fixedly connected to the air filling pipe (12); An air extraction pipe (13), wherein the other side of the top end of the vacuum box (11) is fixedly connected to the air extraction pipe (13), and the air extraction pipe (13) is located at a diagonal position of the inflation pipe (12); A sealing door (14), wherein the sealing door (14) is arranged at an opening position of the vacuum box body (11); A working mechanism (2), wherein the inner top of the vacuum mechanism (1) is provided with a working mechanism (2) for sputtering atoms; A fixing mechanism (3), wherein the fixing mechanism (3) is disposed at the inner bottom end of the vacuum mechanism (1), and the fixing mechanism (3) is located directly below the working mechanism (2), and is used to enhance the working stability of the rotating mechanism (4).

3. A plane arc DC sputtering ion plating machine according to claim 2, characterized in that: The working mechanism (2) comprises: A magnetic pole assembly (21), wherein the inner top end of the vacuum box (11) is fixedly connected to the upper end of the magnetic pole assembly (21); A target material (22), wherein the lower end of the magnetic pole assembly (21) is fixedly connected to the target material (22); A shielding cover (23), wherein the top end of the interior of the vacuum box (11) is fixedly connected to the shielding cover (23), and the magnetic pole assembly (21) and the target material (22) are located inside the shielding cover (23).

4. A plane arc DC sputtering ion plating machine according to claim 2, characterized in that: The fixing mechanism (3) comprises: A fixing platform (31), wherein the fixing platform (31) is circular in shape; Fixed balls (32), the top edge of the fixed platform (31) is provided with an annular groove, and a plurality of fixed balls (32) are movably engaged at the bottom of the annular groove; An annular heating device (33), wherein a circular groove is provided in the middle of the top end of the fixing platform (31), and the bottom end of the circular groove is fixedly connected to the annular heating device (33).

5. A plane arc DC sputtering ion plating machine according to claim 4, characterized in that: The rotating mechanism (4) comprises: A rotating plate (41), the rotating plate (41) being arranged at the top of the fixed platform (31), and the circular size of the rotating plate (41) being equal to that of the fixed platform (31), and the rotating plate (41) being provided with a plurality of heat-transmitting holes; A rotating ring (42), wherein the bottom edge of the rotating plate (41) is fixedly connected with the rotating ring (42), the rotating ring (42) is movably engaged with the annular groove of the fixed platform (31), and the bottom end of the rotating ring (42) is in contact with the outer wall of the fixed ball (32); A rotating shaft (43), one end of which is fixedly connected to the middle of the bottom end of the rotating plate (41), and the other end of which passes through the fixing mechanism (3) and is movably connected to the rotating motor.

6. A plane arc DC sputtering ion plating machine according to claim 5, characterized in that: The clamping assembly (5) further comprises: Limit blocks (53), wherein a plurality of limit blocks (53) are fixedly connected to the inner walls on both sides of the clamping frame (51), and one side of the limit blocks (53) is arc-shaped.

7. A plane arc DC sputtering ion plating machine according to claim 6, characterized in that: The adjustment component (6) further comprises: A limit assembly (7), wherein the limit assembly (7) is arranged in the adjustment assembly (6) and is used to provide power for the operation of the movable assembly (8); A movable component (8), wherein the adjustment component (6) is further provided with a movable component (8) for changing the direction of the reaction gas to improve the coating efficiency; The auxiliary component (9) is used to enhance the clamping stability of the substrate by the adjustment component (6).

8. A plane arc DC sputtering ion plating machine according to claim 7, characterized in that: The limiting component (7) comprises: A transverse bladder (71), wherein transverse grooves are provided on both sides of the lower block (61), and an inner wall of one end of the transverse groove is fixedly connected to one end of the transverse bladder (71), the transverse bladder (71) is made of a rubber material capable of being deformed laterally, and the transverse bladder (71) is filled with an aqueous solution; A transverse block (72), the other end of the transverse sac (71) being fixedly connected to the transverse block (72), and the transverse block (72) is in the shape of a hemisphere; A connecting tube (73), wherein the connecting tube (73) is fixedly sleeved in the adjustment assembly (6), and one end of the connecting tube (73) is fixedly connected to the transverse bag (71); A vertical bag (74), wherein vertical grooves are provided on both sides of the bottom end of the upper block (62), and the bottom ends of the vertical grooves are fixedly connected to one end of the vertical bag (74), the vertical bag (74) is made of rubber material that can be deformed vertically, and the vertical bag (74) is filled with aqueous solution, and the other end of the connecting pipe (73) is fixedly connected to the vertical bag (74); A vertical block (75), the other end of the vertical bag (74) is fixedly connected to the vertical block (75), and the top end of the vertical block (75) is in contact with the movable component (8).

9. A plane arc DC sputtering ion plating machine according to claim 8, characterized in that: The active component (8) comprises: An active bladder (81), wherein an active cavity is provided inside the upper block (62), and the top of the active cavity is fixedly connected to the top of the active bladder (81), the active bladder (81) is made of a rubber material that can be deformed vertically, and the upper and lower inner walls of the active bladder (81) are connected via an active spring; A movable plate (82), wherein the bottom end of the movable bag (81) is fixedly connected to the movable plate (82), and the bottom end of the movable plate (82) is in contact with the limiting assembly (7); an air intake pipe (83), the air intake pipe (83) being fixedly sleeved in the adjustment assembly (6), and the number of the air intake pipes (83) being several, one end of the air intake pipe (83) being in communication with the outside, and the other end of the air intake pipe (83) being in communication with the inside of the movable bag (81), a one-way valve being arranged inside the air intake pipe (83), and an air flow direction of the air intake pipe (83) being from the outside to the movable bag (81), the air intake pipe (83) being arranged obliquely, and the upper end of the air intake pipe (83) being inclined toward the edge of the rotating mechanism (4), and the lower end of the air intake pipe (83) being inclined toward the center of the rotating mechanism (4); An exhaust pipe (84), wherein the exhaust pipe (84) is fixedly sleeved in the adjustment assembly (6), and the exhaust pipes (84) are of a plurality of numbers. The air intake pipe (83) and the exhaust pipe (84) are alternately arranged, one end of the exhaust pipe (84) is in communication with the outside, and the other end of the exhaust pipe (84) is in communication with the inside of the movable bag (81), a one-way valve is arranged inside the exhaust pipe (84), and the airflow direction of the exhaust pipe (84) is from the movable bag (81) to the outside, and the exhaust pipe (84) is arranged obliquely, and the upper end of the exhaust pipe (84) is biased toward the center of the rotating mechanism (4), and the lower end of the exhaust pipe (84) is biased toward the edge of the rotating mechanism (4).

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