A kind of UV ink which is resistant to electroplating and can be alkali-stripped and its preparation method

Abstract

The present invention discloses a UV ink that is resistant to electroplating and can be alkali-stripped and a preparation method thereof, belonging to the technical field of photosensitive materials. The UV ink that is resistant to electroplating and can be alkali-stripped comprises the following raw materials in parts by weight: 50 to 85 parts of photosensitive resin, 10 to 45 parts of filler, 1 to 8 parts of photoinitiator, 1 to 5 parts of first active diluent, and 1 to 5 parts of auxiliary agent; the UV ink of the present invention has excellent electroplating resistance and etching resistance, and can be alkali-stripped. The UV ink has no VOC volatilization, can be formed after printing and UV curing, has a simple production process, saves costs, does not require high-temperature baking, and the copper layer is not easy to oxidize and also saves electricity. The present invention designs the structure of the main resin so that the ink has good sensitivity and electroplating resistance, and also has good film stripping performance, which is a very important process protection material in the electroplating field.

Description

Technical Field

[0001] The invention relates to the technical field of photosensitive materials, and in particular to an electroplating-resistant alkali-strippable UV ink and a preparation method thereof. Background Art

[0002] In the fields of electronics and circuit board manufacturing, anti-plating performance is one of the important performance indicators of materials. Materials with good anti-plating performance can maintain stable structure and performance during the electroplating process, preventing the electroplating solution from corroding and damaging the material. Although photosensitive resins and alkali-soluble resins have made significant progress in their respective fields, there are still many challenges in combining the two to prepare photosensitive resins that are both alkali-soluble and have excellent anti-plating performance.

[0003] Traditional anti-plating inks are mostly solvent-based inks, which have many limitations in use. On the one hand, volatile solvents are used, and a large amount of VOC gas is emitted during drying, polluting the environment. On the other hand, solvent drying requires baking at a high temperature. Under high temperature conditions, the copper in the electroplated seed layer is easily oxidized, seriously affecting the electroplating effect.

[0004] In view of this, this application is filed. Summary of the invention

[0005] The purpose of the present invention is to overcome the shortcomings of the prior art and provide a UV ink of the present invention which has excellent electroplating resistance and etching resistance and can be alkali-retarded.

[0006] To achieve the above object, the technical solution adopted by the present invention is:

[0007] An alkali-strippable UV ink for resisting electroplating comprises the following raw materials in parts by weight: 50 to 85 parts of photosensitive resin, 10 to 45 parts of filler, 1 to 8 parts of photoinitiator, 1 to 5 parts of first active diluent, and 1 to 5 parts of auxiliary agent;

[0008] The structural formula of the photosensitive resin is shown in Formula I:

[0009]

[0010] In formula I, R1 is hydrogen or methyl; R2 is (CH2) n CH3 or at least one of the following groups:

[0011]

[0012] n is an integer from 0 to 18; a: (x+y): z=1: (1 to 3): (0.5 to 2).

[0013] As a preferred embodiment of the present invention, the preparation method of the photosensitive resin is:

[0014] (1) reacting a polymerization monomer, a chain transfer agent, an initiator, and a dispersant in water to obtain a precursor;

[0015] (2) adding the precursor to a second reactive diluent, adding a catalyst and a modifier, reacting to obtain a photosensitive resin;

[0016] The polymerizable monomers include acryloyl morpholine, acrylic acid monomers and acrylic acid ester monomers; the molar ratio of acryloyl morpholine, acrylic acid monomers and acrylic acid ester monomers is 1: (1-3): (0.5-2);

[0017] The modifier is glycidyl methacrylate;

[0018] The second reactive diluent includes at least one of β-hydroxyethyl methacrylate, isobornyl acrylate, β-carboxyethyl acrylate, 2-phenoxyethyl acrylate, 1,6-hexanediol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate.

[0019] As a preferred embodiment of the present invention, the acrylic acid monomer includes at least one of acrylic acid and methacrylic acid;

[0020] The structural formula of the acrylic acid ester monomer is shown in Formula II:

[0021]

[0022] In formula II, R1 is hydrogen or methyl; R2 is (CH2) n CH3, n is an integer from 0 to 18.

[0023] As a preferred embodiment of the present invention, R2 in the formula II is one of the following groups:

[0024]

[0025] As a preferred embodiment of the present invention, the mass ratio of the polymerization monomer, chain transfer agent, initiator, dispersant and water is (23-48): (0.05-0.3): (0.5-3): (0.5-1.5): (50-75);

[0026] The mass ratio of the precursor, the second active diluent, the modifier and the catalyst is (40-65): (30-55): (5-15): (0.3-1.5).

[0027] As a preferred embodiment of the present invention, the chain transfer agent includes at least one of 3-mercaptopropionate, tert-dodecyl mercaptan, n-dodecyl mercaptan, secondary dodecyl mercaptan, and mercaptoethanol;

[0028] The initiator comprises at least one of azobisisobutylnitrile, diphenylphthalide peroxide, di-tert-amyl peroxide, diisopropylbenzene peroxide, and di-tert-butyl peroxide;

[0029] The dispersant includes at least one of polypropylene alcohol, polyacrylates, methyl cellulose, hydroxypropyl cellulose, gelatin, and sodium alginate;

[0030] The catalyst comprises at least one of aluminum acetylacetonate, triphenylphosphine, hexadecyltrimethylammonium bromide, 4,2-methylaminopyridine, triethylamine, and N,N-dimethylaniline.

[0031] As a preferred embodiment of the present invention, the filler includes at least one of barium sulfate, titanium dioxide and silicon dioxide.

[0032] As a preferred embodiment of the present invention, the photoinitiator includes at least one of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 1-hydroxycyclohexyl phenyl ketone, (2,4,6-trimethylbenzoyl) diphenyl phosphine oxide, phenyl bis (2,4,6-trimethylbenzoyl) phosphine oxide, 2-methyl-1-(4-methylthiophenyl)-2-morpholinyl-1-propanone, 2-isopropylthioxanthone, and benzophenone;

[0033] The auxiliary agent includes at least one of a dispersant, a leveling agent, and a defoaming agent;

[0034] The first reactive diluent includes at least one of β-hydroxyethyl methacrylate, isobornyl acrylate, β-carboxyethyl acrylate, 2-phenoxyethyl acrylate, 1,6-hexanediol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate.

[0035] The present invention also provides a method for preparing an electroplating resistant alkali-strippable UV ink, comprising the following steps:

[0036] The photosensitive resin, filler, first active diluent, photoinitiator and auxiliary agent are mixed evenly, reacted at 55-75° C. for 2-5 hours, and ground to obtain the electroplating-resistant alkali-strippable UV ink.

[0037] The beneficial effects of the present invention are as follows: the UV ink of the present invention has excellent electroplating resistance and etching resistance, and can be alkali-removed. The UV ink has no VOC volatilization, can be formed after printing and UV curing, has a simple production process, saves costs, does not require high-temperature baking, and the copper layer is not easy to oxidize and also saves electricity. The present invention designs the structure of the main resin so that the ink has good sensitivity and electroplating resistance, and also has good film removal performance, and is a very important process protection material in the electroplating field. DETAILED DESCRIPTION

[0038] In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application are described clearly and completely below. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present application.

[0039] In the present application, the technical features described in an open manner include closed technical solutions composed of the listed features, and also include open technical solutions containing the listed features.

[0040] In this application, when it comes to numerical ranges, unless otherwise specified, the above numerical ranges are deemed to be continuous and include the minimum and maximum values ​​of the range, as well as each value between such minimum and maximum values. Further, when a range refers to an integer, each integer between the minimum and maximum values ​​of the range is included. In addition, when multiple ranges are provided to describe features or characteristics, the ranges can be merged. In other words, unless otherwise specified, all ranges disclosed herein should be understood to include any and all subranges included therein.

[0041] In the present application, there is no particular limitation on the specific dispersion and stirring treatment methods.

[0042] Unless otherwise specified, the components, raw materials or instruments used in the embodiments and comparative examples of the present invention are all commercially available raw materials or instruments, and the components and raw materials used in each parallel experiment are all of the same kind.

[0043] The following examples are provided to facilitate understanding of the present invention. These examples are not provided to limit the scope of the claims.

[0044] Example 1

[0045] The invention discloses an alkali-strippable UV ink which is resistant to electroplating, comprising the following raw materials in parts by weight: 64 parts of photosensitive resin, 25 parts of barium sulfate, 5 parts of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 4 parts of beta-hydroxyethyl acrylate, 1 part of TEGO-270 leveling agent and 1 part of Hypermer KD-1 dispersant.

[0046] The preparation method of the photosensitive resin is:

[0047] (1) reacting a polymerization monomer, 3-isooctyl mercaptopropionate, azobisisobutyronitrile, and hydroxypropyl cellulose in water at 75° C. for 4 hours to obtain a precursor;

[0048] The polymerizable monomers include acryloyl morpholine, acrylate monomers and acrylic acid; the molar ratio of acryloyl morpholine, acrylate monomers and acrylic acid is 1:2:1;

[0049] The structural formula of the acrylic acid ester monomer is shown in Formula II:

[0050]

[0051] In formula II, R1 is methyl;

[0052] R2 is

[0053] The mass ratio of the polymerization monomer, 3-mercaptopropionate isooctyl ester, azobisisobutyronitrile, hydroxypropyl cellulose and water is 36:0.2:1:1:60;

[0054] (2) Add the precursor to β-hydroxyethyl methacrylate, add aluminum acetylacetonate and glycidyl methacrylate, and react at 75° C. for 4 hours to obtain a photosensitive resin; the mass ratio of the precursor, β-hydroxyethyl methacrylate, glycidyl methacrylate, and aluminum acetylacetonate is 50:40:10:1.

[0055] The preparation method of the electroplating resistant alkali-strippable UV ink comprises the following steps:

[0056] The photosensitive resin, filler, first active diluent, photoinitiator and auxiliary agent are mixed evenly, reacted at 65° C. for 4 hours, and ground to obtain UV ink that is resistant to electroplating and can be alkali-stripped.

[0057] Example 2

[0058] The invention discloses an alkali-strippable UV ink which is resistant to electroplating, comprising the following raw materials in parts by weight: 64 parts of photosensitive resin, 25 parts of barium sulfate, 5 parts of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 4 parts of beta-hydroxyethyl acrylate, 1 part of TEGO-270 leveling agent and 1 part of Hypermer KD-1 dispersant.

[0059] The preparation method of the photosensitive resin is:

[0060] (1) reacting a polymerization monomer, 3-isooctyl mercaptopropionate, azobisisobutyronitrile, and hydroxypropyl cellulose in water at 75° C. for 4 hours to obtain a precursor;

[0061] The polymerizable monomers include acryloyl morpholine, acrylate monomers and acrylic acid; the molar ratio of acryloyl morpholine, acrylate monomers and acrylic acid is 1:3:0.5;

[0062] The structural formula of the acrylic acid ester monomer is shown in Formula II:

[0063]

[0064] In formula II, R1 is methyl;

[0065] R2 is

[0066] The mass ratio of the polymerization monomer, 3-mercaptopropionate isooctyl ester, azobisisobutyronitrile, hydroxypropyl cellulose and water is 36:0.2:1:1:60;

[0067] (2) Add the precursor to β-hydroxyethyl methacrylate, add aluminum acetylacetonate and glycidyl methacrylate, and react at 75° C. for 4 hours to obtain a photosensitive resin; the mass ratio of the precursor, β-hydroxyethyl methacrylate, glycidyl methacrylate, and aluminum acetylacetonate is 50:40:10:1.

[0068] The preparation method of the electroplating resistant alkali-strippable UV ink comprises the following steps:

[0069] The photosensitive resin, filler, first active diluent, photoinitiator and auxiliary agent are mixed evenly, reacted at 65° C. for 4 hours, and ground to obtain UV ink that is resistant to electroplating and can be alkali-stripped.

[0070] Example 3

[0071] The invention discloses an alkali-strippable UV ink which is resistant to electroplating, comprising the following raw materials in parts by weight: 64 parts of photosensitive resin, 25 parts of barium sulfate, 5 parts of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 4 parts of beta-hydroxyethyl acrylate, 1 part of TEGO-270 leveling agent and 1 part of Hypermer KD-1 dispersant.

[0072] The preparation method of the photosensitive resin is:

[0073] (1) reacting a polymerization monomer, 3-isooctyl mercaptopropionate, azobisisobutyronitrile, and hydroxypropyl cellulose in water at 75° C. for 4 hours to obtain a precursor;

[0074] The polymerizable monomers include acryloyl morpholine, acrylate monomers and acrylic acid; the molar ratio of acryloyl morpholine, acrylate monomers and acrylic acid is 1:1:2;

[0075] The structural formula of the acrylic acid ester monomer is shown in Formula II:

[0076]

[0077] In formula II, R1 is methyl;

[0078] R2 is

[0079] The mass ratio of the polymerization monomer, 3-mercaptopropionate isooctyl ester, azobisisobutyronitrile, hydroxypropyl cellulose and water is 36:0.2:1:1:60;

[0080] (2) Add the precursor to β-hydroxyethyl methacrylate, add aluminum acetylacetonate and glycidyl methacrylate, and react at 75° C. for 4 hours to obtain a photosensitive resin; the mass ratio of the precursor, β-hydroxyethyl methacrylate, glycidyl methacrylate, and aluminum acetylacetonate is 50:40:10:1.

[0081] The preparation method of the electroplating resistant alkali-strippable UV ink comprises the following steps:

[0082] The photosensitive resin, filler, first active diluent, photoinitiator and auxiliary agent are mixed evenly, reacted at 65° C. for 4 hours, and ground to obtain UV ink that is resistant to electroplating and can be alkali-stripped.

[0083] Example 4

[0084] The invention discloses an alkali-strippable UV ink which is resistant to electroplating. The ink comprises the following raw materials in parts by weight: 77 parts of photosensitive resin, 15 parts of barium sulfate, 2 parts of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 2 parts of beta-hydroxyethyl acrylate, 2 parts of TEGO-270 leveling agent and 2 parts of Hypermer KD-1 dispersant.

[0085] The preparation method of the photosensitive resin is:

[0086] (1) reacting a polymerization monomer, 3-isooctyl mercaptopropionate, azobisisobutyronitrile, and hydroxypropyl cellulose in water at 75° C. for 4 hours to obtain a precursor;

[0087] The polymerizable monomers include acryloyl morpholine, acrylate monomers and acrylic acid; the molar ratio of acryloyl morpholine, acrylate monomers and acrylic acid is 1:2:1;

[0088] The structural formula of the acrylic acid ester monomer is shown in Formula II:

[0089]

[0090] In formula II, R1 is methyl;

[0091] R2 is

[0092] The mass ratio of the polymerization monomer, 3-mercaptopropionate isooctyl ester, azobisisobutyronitrile, hydroxypropyl cellulose and water is 36:0.2:1:1:60;

[0093] (2) Add the precursor to β-hydroxyethyl methacrylate, add aluminum acetylacetonate and glycidyl methacrylate, and react at 75° C. for 4 hours to obtain a photosensitive resin; the mass ratio of the precursor, β-hydroxyethyl methacrylate, glycidyl methacrylate, and aluminum acetylacetonate is 50:40:10:1.

[0094] The preparation method of the electroplating resistant alkali-strippable UV ink comprises the following steps:

[0095] The photosensitive resin, filler, first active diluent, photoinitiator and auxiliary agent are mixed evenly, reacted at 65° C. for 4 hours, and ground to obtain UV ink that is resistant to electroplating and can be alkali-stripped.

[0096] Example 5

[0097] The invention discloses an alkali-strippable UV ink which is resistant to electroplating, comprising the following raw materials in parts by weight: 50 parts of photosensitive resin, 34 parts of barium sulfate, 6 parts of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 5 parts of beta-hydroxyethyl acrylate, 3 parts of TEGO-270 leveling agent and 2 parts of Hypermer KD-1 dispersant.

[0098] The preparation method of the photosensitive resin is:

[0099] (1) reacting a polymerization monomer, 3-isooctyl mercaptopropionate, azobisisobutyronitrile, and hydroxypropyl cellulose in water at 75° C. for 4 hours to obtain a precursor;

[0100] The polymerizable monomers include acryloyl morpholine, acrylate monomers and acrylic acid; the molar ratio of acryloyl morpholine, acrylate monomers and acrylic acid is 1:2:1;

[0101] The structural formula of the acrylic acid ester monomer is shown in Formula II:

[0102]

[0103] In formula II, R1 is methyl;

[0104] R2 is

[0105] The mass ratio of the polymerization monomer, 3-isooctyl mercaptopropionate, azobisisobutyronitrile, hydroxypropyl cellulose and water is 36:0.2:1:1:60;

[0106] (2) Add the precursor to β-hydroxyethyl methacrylate, add aluminum acetylacetonate and glycidyl methacrylate, and react at 75° C. for 4 hours to obtain a photosensitive resin; the mass ratio of the precursor, β-hydroxyethyl methacrylate, glycidyl methacrylate, and aluminum acetylacetonate is 50:40:10:1.

[0107] The preparation method of the electroplating resistant alkali-strippable UV ink comprises the following steps:

[0108] The photosensitive resin, filler, first active diluent, photoinitiator and auxiliary agent are mixed evenly, reacted at 65° C. for 4 hours, and ground to obtain UV ink that is resistant to electroplating and can be alkali-stripped.

[0109] Comparative Example 1

[0110] The difference between Comparative Example 1 and Example 1 is that the photosensitive resin in Comparative Example 1 is not modified by glycidyl methacrylate, and the other properties are the same.

[0111] The preparation method of the photosensitive resin is:

[0112] (1) reacting a polymerization monomer, 3-isooctyl mercaptopropionate, azobisisobutyronitrile, and hydroxypropyl cellulose in water at 75° C. for 4 hours to obtain a photosensitive resin;

[0113] The polymerizable monomers include acryloyl morpholine, acrylate monomers and acrylic acid; the molar ratio of acryloyl morpholine, acrylate monomers and acrylic acid is 1:2:1;

[0114] The structural formula of the acrylic acid ester monomer is shown in Formula II:

[0115]

[0116] In formula II, R1 is methyl;

[0117] R2 is

[0118] The mass ratio of the polymerization monomer, 3-mercaptopropionate isooctyl ester, azobisisobutyronitrile, hydroxypropyl cellulose and water is 36:0.2:1:1:60.

[0119] Comparative Example 2

[0120] The difference between Comparative Example 2 and Example 1 is that an equal amount of methacrylic acid is used in Comparative Example 2 to replace acryloylmorpholine, and the other aspects are the same.

[0121] The preparation method of the photosensitive resin is:

[0122] (1) reacting a polymerization monomer, 3-isooctyl mercaptopropionate, azobisisobutyronitrile, and hydroxypropyl cellulose in water at 75° C. for 4 hours to obtain a precursor;

[0123] The polymerizable monomers include methacrylic acid, acrylate monomers and acrylic acid; the molar ratio of methacrylic acid, acrylate monomers and acrylic acid is 1:2:1;

[0124] The structural formula of the acrylic acid ester monomer is shown in Formula II:

[0125]

[0126] In formula II, R1 is methyl;

[0127] R2 is

[0128] The mass ratio of the polymerization monomer, 3-mercaptopropionate isooctyl ester, azobisisobutyronitrile, hydroxypropyl cellulose and water is 36:0.2:1:1:60;

[0129] (2) Add the precursor to β-hydroxyethyl methacrylate, add aluminum acetylacetonate and glycidyl methacrylate, and react at 75° C. for 4 hours to obtain a photosensitive resin; the mass ratio of the precursor, β-hydroxyethyl methacrylate, glycidyl methacrylate, and aluminum acetylacetonate is 50:40:10:1.

[0130] Comparative Example 3

[0131] The difference between Comparative Example 3 and Example 1 is that the amount of each raw material is different, and the others are the same.

[0132] The invention discloses an alkali-strippable UV ink which is resistant to electroplating. The ink comprises the following raw materials in parts by weight: 90 parts of photosensitive resin, 5 parts of barium sulfate, 1 part of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 1 part of beta-hydroxyethyl acrylate, 2 parts of TEGO-270 leveling agent and 1 part of Hypermer KD-1 dispersant.

[0133] Comparative Example 4

[0134] The difference between Comparative Example 4 and Example 1 is that the amount of each raw material is different, and the others are the same.

[0135] The invention discloses an alkali-strippable UV ink which is resistant to electroplating. The ink comprises the following raw materials in parts by weight: 40 parts of photosensitive resin, 50 parts of barium sulfate, 0.5 parts of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 6 parts of beta-hydroxyethyl acrylate, 2.5 parts of TEGO-270 leveling agent and 1 part of Hypermer KD-1 dispersant.

[0136] Test Case

[0137] 1. Tested according to GB / T 29846-2013 (A.3.2, coating method is spin coating, film thickness is 20μm, exposure energy is 200mJ / cm 2 , the developer is 1wt% sodium carbonate solution, and the developing temperature is 30°C) etching resistance and electroplating resistance.

[0138] 2. According to the standard imaging of GB / T 29846-2013 (A.3.2, the coating method is spin coating, the film thickness is 20μm, and the exposure energy is 200mJ / cm 2 , the developer is 1wt% sodium carbonate solution, the developing temperature is 30°C) at 45°C, the photoresist film is stripped in 5% sodium hydroxide solution, and the stripping time is within 40 to 80s, which is qualified.

[0139] Table 1

[0140]

[0141] It can be seen that the UV ink of the present invention has excellent electroplating resistance and etching resistance, and can be alkali-reduced.

[0142] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention rather than to limit the scope of protection of the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solution of the present invention can be modified or replaced by equivalents without departing from the essence and scope of the technical solution of the present invention.

Claims

1. A UV ink that is resistant to electroplating and can be alkali-stripped, characterized in that: The preparation method comprises the following raw materials in parts by weight: 50 to 77 parts of photosensitive resin, 15 to 34 parts of filler, 2 to 6 parts of photoinitiator, 2 to 5 parts of first active diluent, and 2 to 5 parts of auxiliary agent; the structural formula of the photosensitive resin includes the structure shown in Formula I: In formula I, R1 is hydrogen or methyl; R2 is (CH2) n CH3 or the following groups: n is an integer of 0 to 18; a: (x+y): z=1: (1 to 3): (0.5 to 2); The preparation method of the photosensitive resin is: (1) reacting a polymerization monomer, a chain transfer agent, an initiator, and a dispersant in water to obtain a precursor; (2) adding the precursor to a second reactive diluent, adding a catalyst and a modifier, reacting to obtain a photosensitive resin; The polymerizable monomers include acryloyl morpholine, acrylic acid monomers and acrylic acid ester monomers; the molar ratio of acryloyl morpholine, acrylic acid monomers and acrylic acid ester monomers is 1: (1-3): (0.5-2); The modifier is glycidyl methacrylate; The second reactive diluent includes at least one of β-hydroxyethyl methacrylate, isobornyl acrylate, β-carboxyethyl acrylate, 2-phenoxyethyl acrylate, 1,6-hexanediol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate.

2. The electroplating alkali-strippable UV ink according to claim 1, characterized in that: The acrylic acid monomer includes at least one of acrylic acid and methacrylic acid; The structural formula of the acrylic acid ester monomer is shown in Formula II: In formula II, R1 is hydrogen or methyl; R2 is (CH2) n CH3, n is an integer from 0 to 18.

3. The electroplating alkali-strippable UV ink according to claim 1, characterized in that: R2 in the formula II is the following group:

4. The electroplating alkali-strippable UV ink according to claim 1, characterized in that: The mass ratio of the polymerization monomer, chain transfer agent, initiator, dispersant and water is (23-48): (0.05-0.3): (0.5-3): (0.5-1.5): (50-75).

5. The electroplating alkali-strippable UV ink according to claim 1, characterized in that: The mass ratio of the precursor, the second active diluent, the modifier and the catalyst is (40-65): (30-55): (5-15): (0.3-1.5).

6. The electroplating alkali-strippable UV ink according to claim 1, characterized in that: The chain transfer agent includes at least one of 3-mercaptopropionate, tert-dodecyl mercaptan, n-dodecyl mercaptan, secondary dodecyl mercaptan, and mercaptoethanol; The initiator comprises at least one of azobisisobutylnitrile, di-tert-amyl peroxide, diisopropylbenzene peroxide, and di-tert-butyl peroxide; The dispersant includes at least one of polypropylene alcohol, polyacrylates, methyl cellulose, hydroxypropyl cellulose, gelatin, and sodium alginate; The catalyst comprises at least one of aluminum acetylacetonate, triphenylphosphine, hexadecyltrimethylammonium bromide, 4,2-methylaminopyridine, triethylamine, and N,N-dimethylaniline.

7. The electroplating alkali-strippable UV ink according to claim 1, characterized in that: The filler includes at least one of barium sulfate, titanium dioxide and silicon dioxide.

8. The electroplating alkali-strippable UV ink according to claim 1, characterized in that: The photoinitiator includes at least one of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 1-hydroxycyclohexyl phenyl ketone, (2,4,6-trimethylbenzoyl) diphenyl phosphine oxide, phenyl bis (2,4,6-trimethylbenzoyl) phosphine oxide, 2-methyl-1-(4-methylthiophenyl)-2-morpholinyl-1-propanone, 2-isopropylthioxanthone, and benzophenone; The auxiliary agent includes at least one of a dispersant, a leveling agent, and a defoaming agent; The first reactive diluent includes at least one of β-hydroxyethyl methacrylate, isobornyl acrylate, β-carboxyethyl acrylate, 2-phenoxyethyl acrylate, 1,6-hexanediol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate.

9. The method for preparing the electroplating alkali-strippable UV ink according to any one of claims 1 to 8, characterized in that: The following steps are involved: Mix the photosensitive resin, filler, first active diluent, photoinitiator and additives evenly, and react at 55-75°C for 2-5h. Grinding to obtain UV ink that is resistant to electroplating and can be alkali-stripped.

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