Direct write imaging apparatus splicing area superposition method, device, equipment and storage medium

Abstract

The application discloses a direct writing imaging equipment splicing area superposition method and device, equipment and storage medium, the method of the application adjusts the parameter in the initial gamma distribution function, obtains the optimized target gamma distribution function, and determines the target energy distribution curve of the to-be-optimized overlapping area based on the function, which can improve the uniformity and accuracy of the exposure effect, helps to improve the uniformity of the energy distribution in the writing process of the photomask data pattern on the substrate, thereby improving the imaging quality; by determining the to-be-optimized overlapping area of the adjacent two spatial light modulator imaging units and adjusting the initial gamma distribution function based on the real-time energy distribution data, the non-uniformity of the splicing area can be effectively reduced, the energy distribution non-uniformity problem at the splicing gap can be reduced, the smooth transition of the splicing area is realized, and the exposure effect consistency of the whole substrate is improved.

Description

Technical Field

[0001] This invention belongs to the field of photolithography technology, specifically relating to a method, apparatus, device, and storage medium for overlaying splicing areas in a direct-write imaging device. Background Technology

[0002] When processing large-area patterns using direct-write imaging equipment (such as laser direct-write, electron beam direct-write, etc.), the area of ​​a single exposure (called the "stitching area") is usually small. To cover a larger area, multiple small areas need to be stitched together. In this stitching process, the alignment and superposition between areas are key technical challenges, directly affecting the accuracy and quality of the final pattern. Existing technologies have presented various superposition methods, such as those disclosed in US6312134B1, US7023526B2, and US7630054B2, but all lack an energy adjustment mechanism, resulting in an uneven transition between overlapping areas. Summary of the Invention

[0003] To address the shortcomings of existing technologies, the present invention aims to provide a method, apparatus, device, and storage medium for overlaying stitching areas in a direct-write imaging device, thereby solving the problem of insufficiently smooth transition between overlapping areas in existing technologies.

[0004] According to one aspect of this application, a method for overlaying stitching regions in a direct-write imaging device is disclosed, the method comprising:

[0005] Obtain the substrate to be written;

[0006] The substrate to be written is divided into multiple areas to be written, wherein each area to be written is covered with a spatial light modulator imaging unit;

[0007] Obtain the photomask data pattern of the substrate to be written;

[0008] The photomask data pattern is divided into multiple photomask differentiation data patterns, and each photomask differentiation data pattern corresponds to a region to be written on the substrate to be written.

[0009] Determine the overlapping region to be optimized between two adjacent spatial modulator imaging units;

[0010] Obtain the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized;

[0011] The initial parameters in the initial gamma distribution function are adjusted based on the real-time energy distribution data to obtain the target gamma distribution function.

[0012] Determine the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function;

[0013] The spatial light modulator imaging unit on each of the areas to be written is controlled to expose the photomask-distinguished data pattern on the corresponding area to be written according to the target energy distribution curve, so as to write each of the photomask-distinguished data patterns onto the substrate to be written.

[0014] In some embodiments, each of the write-to-areas is identical, and dividing the write-to-area substrate into multiple write-to-areas includes:

[0015] Acquire imaging information of the spatial light modulator imaging unit, wherein the imaging information includes an imaging size having a target imaging resolution;

[0016] Obtain the arrangement of the plurality of spatial light modulator imaging units;

[0017] Based on the arrangement of the multiple spatial light modulator imaging units and the imaging size of each spatial light modulator imaging unit, the substrate to be written is divided into multiple areas to be written according to the arrangement, wherein the size of each area to be written is matched with the imaging size it covers, so that the optimized overlapping area of ​​two adjacent spatial modulator imaging units is obtained after matching.

[0018] In some embodiments, obtaining the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized includes:

[0019] Obtain a function database, which includes multiple preset gamma distribution functions;

[0020] Based on historical experience and experimental data, one of the multiple preset gamma distribution functions is selected as the initial gamma distribution function;

[0021] The initial gamma distribution function is expressed based on the following formula:

[0022]

[0023] Where x is the energy intensity;

[0024] g(x) is the value of the initial gamma distribution function at x;

[0025] e is used as the base of the exponential function and describes the decay rate of the distribution;

[0026] k is the initial shape parameter that determines the shape of the gamma distribution. When the value of x is fixed, k is a positive number. A smaller value of k will lead to a more asymmetrical distribution, while a larger value of k will make the distribution more symmetrical.

[0027] θ is the initial scale parameter, which determines the degree of diffusion of the distribution. θ is a positive number. With a fixed x value, a smaller θ value will make the distribution more concentrated, while a larger θ value will make the distribution more diffuse.

[0028] Γ(k) is the gamma function, defined as:

[0029]

[0030] Where t is the integration variable, t∈[0,∞);

[0031] is a normalization factor to make the total probability of the gamma distribution function equal to 1;

[0032] Acquire real-time energy distribution data of the overlapping region to be optimized, as perceived by the sensor.

[0033] In some embodiments, adjusting the initial parameters in the initial gamma distribution function based on the real-time energy distribution data to obtain the target gamma distribution function includes:

[0034] The real-time energy distribution data is preprocessed;

[0035] Define the objective function and the objective optimization algorithm;

[0036] Based on the objective function and the objective optimization algorithm, the initial parameters in the initial gamma distribution function are adjusted to obtain the optimized gamma distribution function; wherein, the initial parameters include k1 and θ1.

[0037] Based on the optimized gamma distribution function, the target energy distribution data of the overlapping region to be optimized is determined;

[0038] The target energy distribution data is compared with the real-time energy distribution data;

[0039] When the target error between the target energy distribution data and the real-time energy distribution data is within a preset error range, the optimized gamma distribution function is used as the target gamma distribution function.

[0040] The optimized gamma distribution function is:

[0041]

[0042] Where, k target The target shape parameter for the optimized gamma distribution function;

[0043] θ target The target scale parameter is the optimized gamma distribution function.

[0044] In some embodiments, the objective function is a mean squared error function, the objective optimization algorithm is gradient descent, and adjusting the initial parameters in the initial gamma distribution function based on the objective function and the objective optimization algorithm to obtain the optimized gamma distribution function includes:

[0045] Determine the partial derivatives of the mean square error function with respect to the initial parameters k and θ;

[0046] Based on the partial derivatives, the initial parameters are updated using the gradient descent method;

[0047] Repeat the above steps until the mean squared error function reaches the preset number of iterations;

[0048] The function obtained after a preset number of iterations is used as the optimized gamma distribution function.

[0049] In some embodiments, determining the target energy distribution data of the overlapping region to be optimized based on the optimized gamma distribution function includes:

[0050] Determine the spatial range of the overlapping region to be optimized, [x min ,x max ];

[0051] Based on the optimized gamma distribution function, calculate the energy distribution value E(x) at each x in the overlapping region to be optimized;

[0052] Where, E(x)=g target (x);

[0053] The calculated energy distribution values ​​are combined to form the target energy distribution data.

[0054] In some embodiments, determining the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function includes:

[0055] Obtain the target energy distribution data of the overlapping region to be optimized corresponding to the target gamma distribution function;

[0056] The target energy distribution curve is plotted based on the target energy distribution data.

[0057] According to another aspect of this application, a device for overlaying stitching areas in a direct-write imaging device is also disclosed, the device comprising:

[0058] The substrate acquisition module is used to acquire the substrate to be written;

[0059] The write-to-area division module is used to divide the write-to-area substrate into multiple write-to-area regions, wherein each write-to-area region is covered with a spatial light modulator imaging unit.

[0060] The pattern acquisition module is used to acquire the photomask data pattern of the substrate to be written.

[0061] The pattern division module is used to divide the photomask data pattern into multiple photomask differentiation data patterns, each of the photomask differentiation data patterns corresponding to a region to be written on the substrate to be written;

[0062] The module for determining the overlapping region to be optimized is used to determine the overlapping region to be optimized between two adjacent spatial modulator imaging units.

[0063] The real-time energy distribution data acquisition module is used to acquire the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized;

[0064] The target gamma distribution function determination module is used to adjust the initial parameters in the initial gamma distribution function according to the real-time energy distribution data to obtain the target gamma distribution function;

[0065] The target energy distribution curve determination module is used to determine the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function;

[0066] An exposure writing module is used to control the spatial light modulator imaging unit on each of the areas to be written to expose the photomask differentiation data pattern on the corresponding area to be written according to the target energy distribution curve, so as to write each of the photomask differentiation data patterns onto the substrate to be written.

[0067] According to another aspect of this application, an electronic device is also disclosed, the electronic device including a memory and at least one processor, the memory storing instructions; the at least one processor invokes the instructions in the memory to cause the electronic device to perform the steps of the stitching region overlay method of any of the above direct-write imaging devices.

[0068] According to another aspect of this application, a computer-readable storage medium is also disclosed, on which instructions are stored, which, when executed by a processor, implement the various steps of the overlay method for stitching regions of a direct-write imaging device as described in any of the preceding claims.

[0069] The present invention includes, but is not limited to, the following beneficial effects: (1) In this application, by adjusting the parameters in the initial gamma distribution function, an optimized target gamma distribution function is obtained, and the target energy distribution curve of the overlapping area to be optimized is determined based on the function. This can improve the uniformity and accuracy of the exposure effect, and help to improve the uniformity of energy distribution during the writing process of the photomask data pattern on the substrate, thereby improving the imaging quality; (2) By determining the overlapping area to be optimized between two adjacent spatial light modulator imaging units, and adjusting the initial gamma distribution function based on real-time energy distribution data, the non-uniformity of the splicing area can be effectively reduced, the problem of uneven energy distribution at the splicing gap can be reduced, a smooth transition of the splicing area can be achieved, and the uniformity of the exposure effect of the entire substrate can be improved; (3) By dividing the photomask data pattern into multiple photomask distinguishing data patterns, and exposing each area to be written separately, the writing accuracy of the photomask data pattern can be improved, the accuracy and clarity of the photomask data pattern on each area to be written can be improved, thereby improving the imaging of the entire substrate. (4) By controlling the spatial light modulator imaging unit on each area to be written to expose according to the target energy distribution curve, the uniformity of energy distribution during the writing process of photomask data pattern on the substrate can be improved, thereby improving the imaging quality; (5) By preprocessing the real-time energy distribution data, this application can remove noise and outliers, improve the accuracy and reliability of the data, which helps to ensure that the subsequent optimization process is based on accurate data, thereby improving the optimization effect; (6) By determining the target energy distribution data of the overlapping area to be optimized based on the optimized gamma distribution function, the accuracy of energy distribution fitting can be improved, which helps to ensure that the fitted energy distribution is closer to the actual situation, thereby improving the uniformity and accuracy of the exposure effect; (7) By using the mean square error function as the objective function and the gradient descent method as the objective optimization algorithm, the accuracy and efficiency of the optimization process can be improved; the mean square error function can effectively measure the fitting error, and the gradient descent method can efficiently adjust the parameters, thereby improving the optimization effect. Attached Figure Description

[0070] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the accompanying drawings used in the description of the embodiments or the prior art will be briefly introduced below.

[0071] Figure 1 This is a flowchart of a method for overlaying stitched areas in a direct-write imaging device as described in this application;

[0072] Figure 2 This is another flowchart of the stitching region superposition method of the direct-write imaging device described in this application;

[0073] Figure 3 This is another flowchart of the stitching region superposition method of the direct-write imaging device described in this application;

[0074] Figure 4 This is another flowchart of the stitching region superposition method of the direct-write imaging device described in this application;

[0075] Figure 5 This is another flowchart of the stitching region superposition method of the direct-write imaging device described in this application;

[0076] Figure 6 This is another flowchart of the stitching region superposition method of the direct-write imaging device described in this application;

[0077] Figure 7 This is another flowchart of the stitching region superposition method of the direct-write imaging device described in this application;

[0078] Figure 8 This is a structural block diagram of the overlay device for splicing areas of the direct-write imaging equipment described in this application;

[0079] Figure 9 This is a schematic diagram of the structure of the electronic device provided in an embodiment of the present invention. Detailed Implementation

[0080] The terms “first,” “second,” “third,” “fourth,” etc. (if present) in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms “comprising” or “having,” and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0081] For ease of understanding, the specific process of the embodiments of the present invention will be described below. Figure 1 This is a flowchart of a method for overlaying stitched areas in a direct-write imaging device according to this application, such as... Figure 1 As shown, it includes the following steps:

[0082] S100: Obtain the substrate to be written.

[0083] Specifically, the substrate to be written to refers to the material surface used in processes such as photolithography or electron beam writing, and is usually the basis for generating circuit patterns in semiconductor manufacturing. The substrate to be written to can be taken off the production line. Preferably, after taking off the substrate to be written to, the surface of the substrate can be inspected to see if it is clean and undamaged, so as to reduce writing defects caused by damage to the substrate to be written to.

[0084] S102, Divide the substrate to be written into multiple areas to be written.

[0085] In one example, the size of the spatial modulator imaging unit and the size of the substrate to be written can be used to calculate how many writing regions the substrate can be divided into. Computer-aided design (CAD) software or a dedicated partitioning tool can be used to divide the substrate into multiple writing regions. After partitioning, each writing region is covered with a spatial light modulator imaging unit so that the spatial modulator imaging unit can be exposed in different regions.

[0086] Furthermore, such as Figure 2 The diagram illustrates another flowchart of a method for overlaying stitched areas in a direct-write imaging device. This flowchart specifically describes dividing the substrate to be written into multiple regions to be written. For details, please refer to [link to relevant documentation]. Figure 2 Dividing the substrate to be written into multiple writing regions includes the following steps:

[0087] S200: Acquire imaging information from the spatial light modulator imaging unit.

[0088] The imaging information includes the imaging size with the target imaging resolution;

[0089] S202. Obtain the arrangement of multiple spatial light modulator imaging units.

[0090] Specifically, multiple spatial light modulator imaging units can be arranged in an N x 1 matrix or an N x M matrix, where N and M can be the same or different. This means arranging multiple spatial light modulator imaging units in a matrix.

[0091] S204. Based on the arrangement of multiple spatial light modulator imaging units and the imaging size of each spatial light modulator imaging unit, the substrate to be written is divided into multiple areas to be written according to the arrangement.

[0092] In this process, the size of each region to be written is matched with the size of the imaging it covers, so that the overlapping region to be optimized between two adjacent spatial modulator imaging units is obtained after matching.

[0093] S104. Obtain the photomask data pattern to be written to the substrate.

[0094] Specifically, a photomask data pattern is a design template used in photolithography processes. It contains a precise layout of circuits or graphics, which are transferred onto a substrate through the photolithography process. In one example, photomask data patterns can be retrieved from a pre-set database, and their format and integrity can be checked to ensure they meet the requirements of the exposure equipment.

[0095] S106. Divide the photomask data pattern into multiple photomask differentiation data patterns, each photomask differentiation data pattern corresponding to a writing area on the substrate to be written.

[0096] Specifically, the photomask data pattern can be divided into multiple photomask differentiation data patterns according to the division of the substrate to be written, so that after division, each photomask differentiation data pattern corresponds to a writing area on the substrate to be written.

[0097] S108. Determine the overlapping region to be optimized between two adjacent spatial modulator imaging units.

[0098] In one example, the extent and location of each overlapping region can be calculated using computer simulation software based on the size and layout of the spatial modulator imaging units, thereby determining the overlapping region of two adjacent spatial modulator imaging units.

[0099] S110. Obtain the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized.

[0100] In one example, a preset initial gamma distribution function can be obtained from a pre-defined function database or a design document. Real-time energy distribution data of the overlapping region to be optimized is acquired using energy distribution measurement equipment, such as a light intensity distribution meter or a CCD camera.

[0101] Furthermore, Figure 3 Another flowchart for the overlay method of stitching regions in a direct-write imaging device is presented. This flowchart describes in detail the acquisition of the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized. For details, please refer to [link to relevant documentation]. Figure 3 Obtaining the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized includes the following steps:

[0102] S300. Obtain the function database, which includes multiple preset gamma distribution functions.

[0103] The function database is pre-built, and its construction can be based on long-term data and experience. Understandably, the gamma distribution function is highly flexible, capable of adapting to different energy distributions by adjusting its shape and scale parameters. This flexibility allows the gamma distribution function to fit actual energy distribution data well, even when the data has a large range of variation.

[0104] S302. Based on historical experience and experimental data, select one of the multiple preset gamma distribution functions as the initial gamma distribution function.

[0105] The initial gamma distribution function is expressed based on the following formula:

[0106]

[0107] Where x is the energy intensity;

[0108] g(x) is the value of the initial gamma distribution function at x;

[0109] e is used as the base of the exponential function and describes the decay rate of the distribution;

[0110] k is the initial shape parameter that determines the shape of the gamma distribution. When the value of x is fixed, k is a positive number. A smaller value of k will lead to a more asymmetrical distribution, while a larger value of k will make the distribution more symmetrical.

[0111] θ is the initial scale parameter, which determines the degree of diffusion of the distribution. θ is a positive number. With a fixed x value, a smaller θ value will make the distribution more concentrated, while a larger θ value will make the distribution more diffuse.

[0112] Γ(k) is the gamma function, defined as:

[0113]

[0114] Here, t is the integration variable, t∈[0,∞), meaning that during the integration process, t takes values ​​from 0 to infinity, and is used to calculate the value of the gamma function. By integrating t from 0 to infinity, the accuracy of the gamma function calculation can be improved.

[0115] is a normalization factor to make the total probability of the gamma distribution function equal to 1.

[0116] S304. Obtain real-time energy distribution data of the overlapping area to be optimized as sensed by the sensor.

[0117] S112. Adjust the initial parameters in the initial gamma distribution function according to the real-time energy distribution data to obtain the target gamma distribution function.

[0118] In one example, Figure 4 Another flowchart illustrating the method for overlaying stitched regions in a direct-write imaging device is presented. This flowchart details how the initial parameters in the initial gamma distribution function are adjusted based on real-time energy distribution data to obtain the target gamma distribution function. For specific details, please refer to [link to relevant documentation]. Figure 4 The process of adjusting the initial parameters in the initial gamma distribution function based on real-time energy distribution data to obtain the target gamma distribution function includes the following steps:

[0119] S400: Preprocesses real-time energy distribution data.

[0120] Preprocessing of real-time energy distribution data can include cleaning, denoising, and normalizing the data.

[0121] S402. Define the objective function and the objective optimization algorithm.

[0122] S404. Based on the objective function and the objective optimization algorithm, adjust the initial parameters in the initial gamma distribution function to obtain the optimized gamma distribution function.

[0123] The initial parameters include k and θ. In one example, the objective function can be the mean squared error (MSE) function, the objective optimization algorithm can be gradient descent, and the objective function can be represented as follows:

[0124]

[0125] Wherein, g(x) i ) is the value of the gamma distribution function, y i This is the value of the real-time energy distribution data, and N is the number of data points.

[0126] In one example, Figure 5 This is another flowchart based on the stitching region overlay method of direct-write imaging device. This flowchart describes step S404 in detail. For details, please refer to [link / reference]. Figure 5 Step S404, based on the objective function and the objective optimization algorithm, adjusts the initial parameters in the initial gamma distribution function to obtain the optimized gamma distribution function, which may include the following steps:

[0127] S500. Determine the partial derivatives of the mean squared error function with respect to the initial parameters k and θ.

[0128] First, calculate the partial derivative of g(x) with respect to k:

[0129]

[0130] Using the chain rule and the derivative rule, we get:

[0131]

[0132] in,

[0133]

[0134] Calculate the partial derivatives of each term:

[0135]

[0136] Where Γ′(k) is the derivative of the gamma function, also known as the multi-gamma function, therefore:

[0137]

[0138] Then, calculate the partial derivative of the mean squared error function with respect to k:

[0139]

[0140] Furthermore, calculate the partial derivative of g(x) with respect to θ:

[0141]

[0142] Using the chain rule and the derivative rule, we get:

[0143]

[0144] in,

[0145]

[0146] Calculate the partial derivatives of each term:

[0147]

[0148] therefore,

[0149]

[0150] Then, calculate the partial derivative of the mean squared error function with respect to θ:

[0151]

[0152] S502. Based on partial derivatives, the initial parameters are updated using gradient descent.

[0153] Specifically, after the update,

[0154]

[0155] Where, k new To update the shape parameters, θ new To update the scaling parameter, α is the learning rate.

[0156] S504. Repeat the above steps until the mean squared error function reaches the preset number of iterations.

[0157] S506. Use the function obtained after a preset number of iterations as the optimized gamma distribution function.

[0158] S406. Based on the optimized gamma distribution function, determine the target energy distribution data of the overlapping region to be optimized.

[0159] S408. Compare the target energy distribution data with the real-time energy distribution data.

[0160] S410. When the target error between the target energy distribution data and the real-time energy distribution data is within the preset error range, the optimized gamma distribution function will be used as the target gamma distribution function.

[0161] Specifically, the optimized gamma distribution function is as follows:

[0162]

[0163] Where, k target To optimize the target shape parameters of the gamma distribution function;

[0164] θ target To optimize the target scale parameter of the gamma distribution function.

[0165] Furthermore, in one example, Figure 6 Another flowchart illustrating a method for overlaying stitched regions in a direct-write imaging device is presented. This flowchart details the determination of the target energy distribution data of the overlapping region to be optimized based on the optimized gamma distribution function. For details, please refer to [link to relevant documentation]. Figure 6 Based on the optimized gamma distribution function, the target energy distribution data of the overlapping region to be optimized is determined by the following steps:

[0166] S600. Determine the spatial range of the overlapping region to be optimized, [x] min ,x max ].

[0167] S602. Based on the optimized gamma distribution function, calculate the energy distribution value E(x) at each x in the overlapping region to be optimized;

[0168] Where, E(x)=g target (x);

[0169] S604. Combine the calculated energy distribution values ​​into target energy distribution data.

[0170] In one example, a data structure (such as an array or matrix) can be created to store the target energy distribution data of the overlapping regions.

[0171] S114. Determine the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function.

[0172] In one example, Figure 7 Another flowchart illustrating the stitching region overlay method for a direct-write imaging device is presented. This flowchart details the determination of the target energy distribution curve of the overlapping region to be optimized, corresponding to the target gamma distribution function. For specific details, please refer to [link to relevant documentation]. Figure 7 Determining the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function may include the following steps:

[0173] S700: Obtain the target energy distribution data of the overlapping region to be optimized corresponding to the target gamma distribution function.

[0174] As can be understood, step S604 above has already calculated the target energy distribution data corresponding to the optimized gamma distribution function and stored it in the data structure. When the target gamma distribution function is consistent with the optimized gamma distribution function, the target energy distribution data corresponding to the target gamma distribution function can be directly obtained from the data structure in this step.

[0175] S702. Draw the target energy distribution curve based on the target energy distribution data.

[0176] S116. Control the spatial light modulator imaging unit on each area to be written to expose the photomask differentiation data pattern on the corresponding area to be written according to the target energy distribution curve, so as to write each photomask differentiation data pattern into the substrate to be written.

[0177] The present invention includes, but is not limited to, the following beneficial effects: (1) In this application, by adjusting the parameters in the initial gamma distribution function, an optimized target gamma distribution function is obtained, and the target energy distribution curve of the overlapping area to be optimized is determined based on this function. This can improve the uniformity and accuracy of the exposure effect, and help to improve the uniformity of energy distribution during the writing process of the photomask data pattern on the substrate, thereby improving the imaging quality; (2) By determining the overlapping area to be optimized between two adjacent spatial light modulator imaging units, and adjusting the initial gamma distribution function based on real-time energy distribution data, the non-uniformity of the splicing area can be effectively reduced, the problem of uneven energy distribution at the splicing gap can be reduced, a smooth transition of the splicing area can be achieved, and the consistency of the exposure effect of the entire substrate can be improved; (3) By dividing the photomask data pattern into multiple photomask distinguishing data patterns, and (3) By exposing each area to be written separately, the writing accuracy of the photomask data pattern can be improved, the accuracy and clarity of the photomask data pattern on each area to be written can be improved, thereby improving the imaging accuracy of the entire substrate; (4) By controlling the spatial light modulator imaging unit on each area to be written to expose according to the target energy distribution curve, the uniformity of energy distribution during the writing process of the photomask data pattern on the substrate can be improved, thereby improving the imaging quality; (5) By preprocessing the real-time energy distribution data, this application can remove noise and outliers, improve the accuracy and reliability of the data, which helps to ensure that the subsequent optimization process is based on accurate data, thereby improving the optimization effect; (6) By determining the target energy distribution data of the overlapping area to be optimized based on the optimized gamma distribution function, the accuracy of energy distribution fitting can be improved. This helps to ensure that the fitted energy distribution is closer to the actual situation, thereby improving the uniformity and accuracy of the exposure effect; (7) By using the mean square error function as the objective function and the gradient descent method as the objective optimization algorithm, the accuracy and efficiency of the optimization process can be improved. The mean square error function can effectively measure the fitting error, and the gradient descent method can efficiently adjust the parameters, thereby improving the optimization effect.

[0178] Furthermore, according to another aspect of this application, a device for overlaying stitching areas in a direct-write imaging device is also disclosed, such as... Figure 8 As shown, the device includes:

[0179] The substrate acquisition module is used to acquire the substrate to be written;

[0180] The write-to-area division module is used to divide the write-to-area substrate into multiple write-to-area regions, wherein each write-to-area region is covered with a spatial light modulator imaging unit.

[0181] The pattern acquisition module is used to acquire the photomask data pattern of the substrate to be written.

[0182] The pattern division module is used to divide the photomask data pattern into multiple photomask differentiation data patterns, each of the photomask differentiation data patterns corresponding to a region to be written on the substrate to be written;

[0183] The module for determining the overlapping region to be optimized is used to determine the overlapping region to be optimized between two adjacent spatial modulator imaging units.

[0184] The real-time energy distribution data acquisition module is used to acquire the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized;

[0185] The target gamma distribution function determination module is used to adjust the initial parameters in the initial gamma distribution function according to the real-time energy distribution data to obtain the target gamma distribution function;

[0186] The target energy distribution curve determination module is used to determine the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function;

[0187] An exposure writing module is used to control the spatial light modulator imaging unit on each of the areas to be written to expose the photomask differentiation data pattern on the corresponding area to be written according to the target energy distribution curve, so as to write each of the photomask differentiation data patterns onto the substrate to be written.

[0188] The application of the relevant modules of the device in this example can be referred to the relevant introduction of the method principle above, and will not be repeated here.

[0189] above Figure 8 The grid warehouse billing device based on operational status in this embodiment of the invention will be described in detail from the perspective of modular functional entities. The electronic equipment in this embodiment of the invention will be described in detail from the perspective of hardware processing.

[0190] Figure 9This is a schematic diagram of the structure of an electronic device 900 provided in an embodiment of the present invention. The electronic device 900 can vary significantly due to different configurations or performance characteristics. It may include one or more central processing units (CPUs) 910 (e.g., one or more processors) and a memory 920, and one or more storage media 930 (e.g., one or more mass storage devices) for storing application programs 933 or data 932. The memory 920 and storage media 930 can be temporary or persistent storage. The program stored in the storage media 930 may include one or more modules (not shown in the diagram), each module including a series of instruction operations on the electronic device 900. Furthermore, the processor 910 may be configured to communicate with the storage media 930 and execute the series of instruction operations in the storage media 930 on the electronic device 900.

[0191] Electronic device 900 may also include one or more power supplies 940, one or more wired or wireless network interfaces 950, one or more input / output interfaces 950, and / or one or more operating systems 931, such as Windows Server, Mac OS X, Unix, Linux, FreeBSD, etc. Those skilled in the art will understand that... Figure 9 The illustrated electronic device structure does not constitute a limitation on electronic devices and may include more or fewer components than illustrated, or combine certain components, or have different component arrangements.

[0192] The present invention also provides a computer-readable storage medium, which can be a non-volatile computer-readable storage medium or a volatile computer-readable storage medium, wherein the computer-readable storage medium stores instructions that, when executed on a computer, cause the computer to perform the steps of the order settlement method for mis-collected logistics packages.

[0193] Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the specific working process of the system, device, or unit described above can be referred to the corresponding process in the foregoing method embodiments, and will not be repeated here.

[0194] If the integrated unit is implemented as a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods of the various embodiments of the present invention. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0195] The above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for overlaying stitching regions in a direct-write imaging device, characterized in that, The method includes: Obtain the substrate to be written; The substrate to be written is divided into multiple areas to be written, wherein each area to be written is covered with a spatial light modulator imaging unit; Obtain the photomask data pattern of the substrate to be written; The photomask data pattern is divided into multiple photomask differentiation data patterns, and each photomask differentiation data pattern corresponds to a writing area on the substrate to be written. Determine the overlapping region to be optimized between two adjacent spatial modulator imaging units; Obtain the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized; The initial parameters in the initial gamma distribution function are adjusted based on the real-time energy distribution data to obtain the target gamma distribution function; Determine the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function; The spatial light modulator imaging unit on each of the areas to be written is controlled to expose the photomask-distinguished data pattern on the corresponding area to be written according to the target energy distribution curve, so as to write each of the photomask-distinguished data patterns onto the substrate to be written.

2. The method for overlaying stitching areas in a direct-write imaging device according to claim 1, characterized in that, Each of the areas to be written is identical, and dividing the substrate to be written into multiple areas to be written includes: Acquire imaging information of the spatial light modulator imaging unit, wherein the imaging information includes an imaging size having a target imaging resolution; Obtain the arrangement of the plurality of spatial light modulator imaging units; Based on the arrangement of the multiple spatial light modulator imaging units and the imaging size of each spatial light modulator imaging unit, the substrate to be written is divided into multiple areas to be written according to the arrangement, wherein the size of each area to be written is matched with the imaging size it covers, so that the optimized overlapping area of ​​two adjacent spatial modulator imaging units is obtained after matching.

3. The method for overlaying stitching areas in a direct-write imaging device according to claim 1, characterized in that, The process of obtaining the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized includes: Obtain a function database, which includes multiple preset gamma distribution functions; Based on historical experience and experimental data, one of the multiple preset gamma distribution functions is selected as the initial gamma distribution function; The initial gamma distribution function is expressed based on the following formula: Where x is the energy intensity; g(x) is the value of the initial gamma distribution function at x; e is used as the base of the exponential function; It describes the decay rate of the distribution; k is the initial shape parameter that determines the shape of the gamma distribution. When the value of x is fixed, k is a positive number. A smaller value of k will lead to a more asymmetrical distribution, while a larger value of k will make the distribution more symmetrical. θ is the initial scale parameter, which determines the degree of diffusion of the distribution. θ is a positive number. With a fixed x value, a smaller θ value will make the distribution more concentrated, while a larger θ value will make the distribution more diffuse. Γ(k) is the gamma function, defined as: Where t is the integration variable, t∈[0,∞); is a normalization factor to make the total probability of the gamma distribution function equal to 1; Acquire real-time energy distribution data of the overlapping region to be optimized, as perceived by the sensor.

4. The method for overlaying stitching areas in a direct-write imaging device according to claim 1, characterized in that, The step of adjusting the initial parameters in the initial gamma distribution function based on the real-time energy distribution data to obtain the target gamma distribution function includes: The real-time energy distribution data is preprocessed; Define the objective function and the objective optimization algorithm; Based on the objective function and the objective optimization algorithm, the initial parameters in the initial gamma distribution function are adjusted to obtain the optimized gamma distribution function; wherein, the initial parameters include k and θ; Based on the optimized gamma distribution function, the target energy distribution data of the overlapping region to be optimized is determined; The target energy distribution data is compared with the real-time energy distribution data; When the target error between the target energy distribution data and the real-time energy distribution data is within a preset error range, the optimized gamma distribution function is used as the target gamma distribution function. The optimized gamma distribution function is: Where, k target The target shape parameter for the optimized gamma distribution function; θ target The target scale parameter is the optimized gamma distribution function.

5. The method for overlaying stitching areas in a direct-write imaging device according to claim 4, characterized in that, The objective function is the mean squared error function, the objective optimization algorithm is the gradient descent method, and the step of adjusting the initial parameters in the initial gamma distribution function based on the objective function and the objective optimization algorithm to obtain the optimized gamma distribution function includes: Determine the partial derivatives of the mean square error function with respect to the initial parameters k and θ; Based on the partial derivatives, the initial parameters are updated using the gradient descent method; Repeat the above steps until the mean squared error function reaches the preset number of iterations; The function obtained after a preset number of iterations is used as the optimized gamma distribution function.

6. The method for overlaying stitching areas in a direct-write imaging device according to claim 4, characterized in that, The determination of the target energy distribution data of the overlapping region to be optimized based on the optimized gamma distribution function includes: Determine the spatial range of the overlapping region to be optimized, [x min ,x max ]; Based on the optimized gamma distribution function, calculate the energy distribution value E(x) at each x in the overlapping region to be optimized; Where, E(x)=g target (x); The calculated energy distribution values ​​are combined to form the target energy distribution data.

7. The method for overlaying stitching areas in a direct-write imaging device according to claim 4, characterized in that, The step of determining the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function includes: Obtain the target energy distribution data of the overlapping region to be optimized corresponding to the target gamma distribution function; The target energy distribution curve is plotted based on the target energy distribution data.

8. A device for overlaying stitching areas in a direct-write imaging apparatus, characterized in that, The device includes: The substrate acquisition module is used to acquire the substrate to be written to; The write-to-area division module is used to divide the write-to-area substrate into multiple write-to-area regions, wherein each write-to-area region is covered with a spatial light modulator imaging unit. The pattern acquisition module is used to acquire the photomask data pattern of the substrate to be written. The pattern division module is used to divide the photomask data pattern into multiple photomask differentiation data patterns, each of the photomask differentiation data patterns corresponding to a region to be written on the substrate to be written; The module for determining the overlapping region to be optimized is used to determine the overlapping region to be optimized between two adjacent spatial modulator imaging units. The real-time energy distribution data acquisition module is used to acquire the preset initial gamma distribution function and the real-time energy distribution data of the overlapping region to be optimized; The target gamma distribution function determination module is used to adjust the initial parameters in the initial gamma distribution function according to the real-time energy distribution data to obtain the target gamma distribution function; The target energy distribution curve determination module is used to determine the target energy distribution curve of the overlapping region to be optimized corresponding to the target gamma distribution function; An exposure writing module is used to control the spatial light modulator imaging unit on each of the areas to be written to expose the photomask differentiation data pattern on the corresponding area to be written according to the target energy distribution curve, so as to write each of the photomask differentiation data patterns onto the substrate to be written.

9. An electronic device, characterized in that, The electronic device includes a memory and at least one processor, the memory storing instructions; the at least one processor invokes the instructions in the memory to cause the electronic device to perform the steps of the stitching region overlay method of any one of claims 1-7.

10. A computer-readable storage medium storing instructions thereon, characterized in that, When the instructions are executed by the processor, they implement each step of the stitching region overlay method of the direct-write imaging device as described in any one of claims 1-7.

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