Multi-light source correction method and laser processing device

Abstract

The application belongs to the technical field of laser processing, and particularly relates to a multi-light-source correction method and a laser processing device. The method comprises the following steps: processing a first pattern on a first object by a first light source, establishing a first coordinate system on the first object and determining coordinate values of the first pattern in the first coordinate system; constructing a coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system; processing a second pattern on a second object by a second light source, and obtaining coordinate values of the second pattern in the first coordinate system; and adjusting a galvanometer parameter of the laser processing device according to the coordinate mapping relationship, the coordinate values of the first pattern in the first coordinate system and the coordinate values of the second pattern in the first coordinate system, so that the coordinate values in the same coordinate system remain consistent when the first light source and the second light source process the same image. The application can improve the processing effect when multiple light sources are used for laser processing.

Description

[0001] This application claims priority to Chinese Patent Application No. 2023105676664, filed with the State Intellectual Property Office of China on May 18, 2023, entitled "Multi-light source calibration method", the entire contents of which are incorporated herein by reference. Technical Field

[0002] This application belongs to the field of laser printing technology, specifically relating to a multi-source correction method and laser processing equipment. Background Technology

[0003] Most laser processing equipment currently uses a single light source. Due to the inherent characteristics of the light source, such laser equipment is often incompatible with various application scenarios. Even if two light sources are used and operate on a single focal plane, the different wavelengths of the different light sources result in different reflection paths and angles, causing the coordinate systems of each light source to not coincide on the focal plane. The coordinate systems of each light source have various coordinate differences such as rotation, distortion, scaling, and translation, resulting in poor superposition effects of images processed by different light sources. Summary of the Invention

[0004] The purpose of this application is to provide a multi-source correction method and laser processing equipment to improve the processing effect of laser processing equipment using multiple sources.

[0005] According to one aspect of the embodiments of this application, a multi-source correction method is provided, which is applied to a laser processing equipment, the method comprising:

[0006] A first pattern is processed on a first object using a first light source, a first coordinate system is established on the first object, and the coordinate values ​​of the first pattern in the first coordinate system are determined.

[0007] Construct a coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system;

[0008] A second pattern is processed on a second object using a second light source, and the coordinate values ​​of the second pattern in the first coordinate system are obtained.

[0009] The galvanometer parameters of the laser processing equipment are adjusted according to the coordinate mapping relationship and the coordinate values ​​of the first pattern and the second pattern in the first coordinate system, so that the coordinate values ​​of the first light source and the second light source remain consistent in the same coordinate system when processing the same image.

[0010] According to one aspect of the embodiments of this application, a laser processing apparatus is provided, comprising:

[0011] Multiple processing light sources;

[0012] A multi-source correction device is used to perform the multi-source correction method described above.

[0013] In this application, a first pattern is processed on a first object using a first light source. A first coordinate system is established on the first object, and the coordinate values ​​of the first pattern in the first coordinate system are determined. A coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system is constructed. A second pattern is processed on the second object using a second light source, and the coordinate values ​​of the second pattern in the first coordinate system are obtained. Based on the coordinate mapping relationship and the coordinate values ​​of the first and second patterns in the first coordinate system, the galvanometer parameters of the laser processing equipment are adjusted to ensure that the coordinate values ​​of the first and second light sources remain consistent in the same coordinate system when processing the same pattern. This application uses the first coordinate system as a reference coordinate system, ensuring that the coordinate values ​​of both the first and second light sources are based on the first coordinate system, maintaining coordinate system consistency. When switching working light sources, the uniformity of coordinate values ​​of each light source is guaranteed, preventing image blurring and improving the processing effect when using multiple light sources for laser processing.

[0014] Other features and advantages of this application will become apparent from the following detailed description, or may be learned in part from practice of this application.

[0015] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and do not limit this application. Attached Figure Description

[0016] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application. It is obvious that the drawings described below are merely some embodiments of this application, and those skilled in the art can obtain other drawings based on these drawings without any inventive effort.

[0017] Figure 1 A flowchart illustrating the steps of a multi-source correction method proposed in an embodiment of this application is shown.

[0018] Figure 2 A schematic diagram of the first image printed by the first light source and the first coordinate system is shown.

[0019] Figure 3 A schematic diagram showing the generation of the first coordinate system on the second pattern is shown.

[0020] Figure 4 A schematic diagram of the structure of the laser processing equipment is shown.

[0021] Explanation of reference numerals in the attached figures:

[0022] First pattern 100, x-axis of first coordinate system 100-X, y-axis of first coordinate system 100-Y, first positioning point of first pattern 100-A, second positioning point of first pattern 100-C, third positioning point of first pattern 100-B.

[0023] Second pattern 200, x-axis of the second pattern 200-X, y-axis of the second pattern 200-Y, first positioning point of the second pattern 100-A, second positioning point of the second pattern 100-C, third positioning point of the second pattern 100-B;

[0024] Control system 400, laser 410, beam expander 420, reflector 430, dichroic mirror 440, galvanometer 450, F-θ field mirror 460. Detailed Implementation

[0025] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided to make this application more comprehensive and complete, and to fully convey the concept of the exemplary embodiments to those skilled in the art.

[0026] Furthermore, the described features, structures, or characteristics can be combined in any suitable manner in one or more embodiments. Numerous specific details are provided in the following description to give a thorough understanding of embodiments of this application. However, those skilled in the art will recognize that the technical solutions of this application can be practiced without one or more of the specific details, or other methods, components, apparatuses, steps, etc., can be employed. In other instances, well-known methods, apparatuses, implementations, or operations are not shown or described in detail to avoid obscuring various aspects of this application.

[0027] The block diagrams shown in the accompanying drawings are merely functional entities and do not necessarily correspond to physically independent entities. That is, these functional entities can be implemented in software, in one or more hardware modules or integrated circuits, or in different network and / or processor devices and / or microcontroller devices.

[0028] The flowcharts shown in the accompanying drawings are merely illustrative and do not necessarily include all content and operations / steps, nor do they necessarily have to be performed in the described order. For example, some operations / steps can be broken down, while others can be combined or partially combined; therefore, the actual execution order may change depending on the specific circumstances.

[0029] Existing laser processing equipment using a single light source can only process materials with that single light source. Because different light sources have different wavelengths, the wavelength affects the engraving effect on the material, making it difficult to be compatible with different application scenarios. In laser processing equipment with multiple light sources, the different emission paths and reflection angles of the different light sources cause the coordinate systems mapped onto the focal plane to not coincide. Differences in rotation, distortion, scaling, and translation exist between the coordinate systems of each light source, easily causing ghosting effects during material processing.

[0030] Laser processing equipment refers to equipment that prints preset patterns on processing materials using lasers. Printing can refer to subtractive processing such as engraving and cutting, or additive processing.

[0031] Figure 1 This application illustrates a flowchart of a multi-source correction method according to an embodiment of the present application. The method is applied to laser processing equipment and includes:

[0032] S110, Process the first pattern on the first object using the first light source, establish a first coordinate system on the first object, and determine the coordinate values ​​of the first pattern in the first coordinate system.

[0033] Specifically, a first pattern is processed on a first object using a laser processing device with a first light source, and marker points are selected in the first pattern to establish a first coordinate system. After establishing the first coordinate system, the coordinate values ​​of the first pattern are stored based on the first coordinate system.

[0034] The coordinates of the first pattern refer to the position information of the first pattern on the first object, and the position information is established based on the first coordinate system.

[0035] S120, Construct the coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system.

[0036] Specifically, the operating terminal of the laser processing equipment is equipped with a predetermined image coordinate system. For example, a computer, tablet or mobile phone connected and communicating with the laser processing equipment can be used to control the laser processing equipment. The graphical user interface of the computer, tablet or mobile phone can preview the pattern to be processed. The preview image usually corresponds to a coordinate system, that is, the predetermined image coordinate system. The predetermined image coordinate system can be used to display the position of the processing pattern on the processing object.

[0037] However, since the preview position displayed on the operating terminal may differ from the actual position during processing, in order to ensure the accuracy of the position of the processed pattern during processing, the mapping relationship between the first coordinate system and the predetermined image coordinate system is adjusted during laser processing to ensure the processing effect.

[0038] S130, process the second pattern on the second object using the second light source, and obtain the coordinate values ​​of the second pattern in the first coordinate system.

[0039] Specifically, the process is the same as that of processing the first pattern on the first object with the first light source. The second pattern is processed on the second object by switching to the second light source, and a first coordinate system is established on the second pattern to obtain the coordinate values ​​of the second pattern in the first coordinate system.

[0040] In the above embodiments, the first pattern and the second pattern can be a rectangular pattern, a variable regular pattern, or an irregular pattern.

[0041] The first and second patterns can be patterns of the same shape or patterns of different shapes.

[0042] The first and second objects can be paper, wood boards, acrylic materials, etc. of various colors.

[0043] S140, adjust the galvanometer parameters of the laser processing equipment according to the coordinate mapping relationship and the coordinate values ​​of the first pattern and the second pattern in the first coordinate system, so that the coordinate values ​​of the first light source and the second light source are consistent in the same coordinate system when processing the same image.

[0044] Specifically, after establishing the coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system, when performing laser processing through the first light source, the galvanometer parameters of the laser processing equipment are adjusted based on the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system; when performing laser processing through the second light source, the galvanometer parameters of the laser processing equipment are adjusted based on the coordinate mapping relationship and the coordinate values ​​of the second pattern in the first coordinate system.

[0045] When processing patterns on an object, the coordinate values ​​need to be corrected to ensure that the coordinate positions of different light sources correspond to the actual requirements.

[0046] The first and second light sources have different wavelengths, and their coordinate positions mapped to the processed object are different. Therefore, it is necessary to use one of the light sources as a positioning standard. In this embodiment, the marker points of the generated coordinate system are obtained based on the first light source, thereby establishing the first coordinate system. The coordinate values ​​of the first pattern and the second pattern on the first coordinate system are obtained respectively, so that both the first and second light sources use the first coordinate system as a reference coordinate system. When switching between the first and second light sources for processing, the uniformity of the processing coordinates is ensured. Therefore, when multiple light sources are used to process the same pattern, there will be no ghosting, which to a certain extent ensures the processing effect of multi-light source laser processing.

[0047] In this application, a first pattern is processed on a first object using a first light source. A first coordinate system is established on the first object, and the coordinate values ​​of the first pattern in the first coordinate system are determined. A coordinate mapping relationship between the first coordinate system and a predetermined image coordinate system is constructed. A second pattern is processed on the second object using a second light source, and the coordinate values ​​of the second pattern in the first coordinate system are obtained. Based on the coordinate mapping relationship and the coordinate values ​​of the first and second patterns in the first and second coordinate systems, the galvanometer parameters of the laser processing equipment are adjusted to ensure that the coordinate values ​​of the first and second light sources are consistent in the same coordinate system when processing the same pattern. This application uses the first coordinate system as a reference coordinate system, ensuring that the coordinate values ​​of both the first and second light sources are based on the first coordinate system, maintaining the consistency of the coordinate systems. When switching working light sources, the uniformity of the coordinate values ​​of each light source is guaranteed, preventing blurring of the processed image and improving the processing effect when using multiple light sources for laser processing.

[0048] Further, S110, processing the first pattern on the first object using the first light source, establishing a first coordinate system on the first object, and determining the coordinate values ​​of the first pattern in the first coordinate system, includes:

[0049] S111, Obtain the first positioning point and the second positioning point on the first pattern.

[0050] S113, a third positioning point is determined based on the first positioning point and the second positioning point. The third positioning point is located on the straight line determined by the first positioning point and the second positioning point and is between the first positioning point and the second positioning point.

[0051] S115, Generate a first coordinate system based on the first positioning point, the second positioning point and the third positioning point, and determine the coordinate values ​​of the first pattern in the first coordinate system.

[0052] In this embodiment, taking a rectangular pattern as an example, both the first positioning point and the second positioning point are located in the edge region of the first pattern. For example, if the first pattern is rectangular, the first positioning point can be on the far left of the rectangular pattern, and the second positioning point can be on the far right of the rectangular pattern. The x-axis of the first coordinate system is determined by the first positioning point and the second positioning point.

[0053] In the middle region of the rectangular pattern and at the position of the x-axis, determine the third positioning point. The third positioning point is located at the midpoint of the x-axis, therefore it is the intersection of the x-axis and the y-axis. Establish the first coordinate system based on the x-axis and y-axis of the first pattern.

[0054] Taking a circular pattern as an example, the first and second positioning points are located on the outer edge of the circular pattern. The x-axis is determined by the first and second positioning points, and the third positioning point can be confirmed based on the center of the circular pattern.

[0055] Further, S115, a first coordinate system is generated based on the first positioning point, the second positioning point, and the third positioning point, and the coordinate values ​​of the first pattern in the first coordinate system are determined, including:

[0056] S1151, Generate the first axis of the first coordinate system based on the first positioning point and the second positioning point.

[0057] S1153, with the third positioning point as the center, generate a second axis perpendicular to the first axis, and obtain the first coordinate system through the first axis and the second axis.

[0058] S1155, Calculate the coordinate values ​​of the first pattern in the first coordinate system according to the first coordinate system.

[0059] Taking the first pattern as an example, Figure 2 A schematic diagram of the first pattern and the first coordinate system is shown.

[0060] The first positioning point 100-A and the second positioning point 100-C are located in the outer edge region of the first pattern 100, and the third positioning point 100-B is located at the midpoint between the first positioning point 100-A and the second positioning point 100-C.

[0061] The line connecting the first positioning point 100-A and the second positioning point 100-C forms the x-axis, and the straight line passing through the third positioning point and intersecting the x-axis is the y-axis.

[0062] The first axis is the x-axis, and the second axis is the y-axis.

[0063] The calculation method for the coordinate values ​​of the first pattern in the first coordinate system includes, but is not limited to, visual acquisition tools, such as sensors or cameras installed on processing equipment.

[0064] Alternatively, it can be obtained through manual measurement or by measuring scanner.

[0065] Further, S120, constructing the coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system, including:

[0066] S121, Obtain the coordinate values ​​of the predetermined image coordinate system, and compare the difference between the coordinate values ​​of the first coordinate system and the coordinate values ​​of the predetermined image coordinate system.

[0067] S123, construct the coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system based on the difference.

[0068] Specifically, the correspondence between the two coordinate systems is determined based on the coordinate values ​​of the first coordinate system and the coordinate values ​​of the predetermined image coordinate system.

[0069] For example, a predetermined number of marker points are selected in the predetermined image coordinate system and the first coordinate system. The coordinate values ​​of the predetermined number of marker points in the predetermined image coordinate system and the coordinate values ​​of the predetermined number of marker points in the first coordinate system are obtained respectively. The difference between the two is calculated, and the coordinate mapping relationship between the first coordinate value and the predetermined image coordinate value is determined based on the difference.

[0070] S130, Obtain the coordinate values ​​of the second pattern in the first coordinate system, including:

[0071] S131, the first positioning point, the second positioning point and the third positioning point are generated in the second pattern by the first light source.

[0072] S133, Generate a first coordinate system on the second pattern based on the first positioning point, the second positioning point, and the third positioning point.

[0073] S135, Based on the first coordinate system, obtain the coordinate values ​​of the second pattern in the first coordinate system.

[0074] In this embodiment, by obtaining the coordinate values ​​of the second pattern under the first coordinate system, the first light source and the second light source establish a position reference with the first coordinate system. At the same time, a coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system is established. The coordinates of the first light source or the second light source are corrected using a unified reference, so as to achieve the purpose of processing with multiple light sources while ensuring the processing effect.

[0075] Taking the second pattern as an example, Figure 3 A schematic diagram showing the generation of the first coordinate system on the second pattern is shown.

[0076] Figure 2 The first pattern in the middle and Figure 3 The second pattern in the image is for illustrative purposes only and should not be construed as limiting the style or size of the first or second pattern.

[0077] Specifically, the coordinate values ​​of the positioning points when the first light source establishes the first coordinate system are obtained, and the positioning points with the same coordinate values ​​are generated on the second pattern by the first light source, so as to generate the first coordinate system on the second pattern and obtain the coordinate values ​​of the second pattern in the first coordinate system.

[0078] Furthermore, the coordinate values ​​of the second pattern in the first coordinate system are acquired using a visual acquisition tool, including but not limited to the visual acquisition tool itself, such as a sensor or camera installed on the processing equipment.

[0079] Optionally, it can be obtained by manual measurement or by measuring scanner.

[0080] exist Figure 3In the second pattern 200, the first positioning point 200-A and the second positioning point 200-C are located in the outer edge region of the second pattern 200, and the third positioning point 200-B is located at the midpoint between the first positioning point 200-A and the second positioning point 200-C.

[0081] The line connecting the first positioning point 200-A and the second positioning point 200-C forms the x-axis, and the straight line passing through the third positioning point and intersecting the x-axis forms the y-axis.

[0082] In the second pattern, the positions of the first positioning point, the second positioning point, and the third positioning point are the same as those in the first pattern. Since the wavelengths of the first light source and the second light source are different, the size and position of the image printed on the processed object may differ.

[0083] To maintain consistency between the positioning points in the first pattern and the second pattern, the positions of the first object and the second object must be kept the same.

[0084] Furthermore, in step S140, the galvanometer parameters of the laser processing equipment are adjusted according to the coordinate mapping relationship and the coordinate values ​​of the first pattern and the second pattern in the first coordinate system, including:

[0085] S141, Based on the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system, the first adjustment parameter is obtained.

[0086] S143, based on the coordinate mapping relationship and the coordinate values ​​of the second pattern under the first coordinate, the second adjustment parameter is obtained.

[0087] S145, when processing using the first light source, the galvanometer parameters of the laser processing equipment are adjusted by the first adjustment parameter.

[0088] S147, When processing using the second light source, the galvanometer parameters of the processing equipment are adjusted by the second adjustment parameter.

[0089] S141-S143 apply to situations where laser processing equipment uses a first light source to process the object. S145-S147 apply to situations where laser processing equipment uses a second light source to process the object.

[0090] It should be noted that the galvanometer parameters of the laser processing equipment can be obtained based on the coordinate mapping relationship and the coordinate values ​​of each light source in the first coordinate system. The positional correspondence between the actual coordinate system and the predetermined image coordinate system can be obtained through the coordinate mapping relationship and the coordinate values ​​of each light source in the first coordinate system. By unifying the actual coordinate system and the predetermined image coordinate system, the coordinate values ​​of the first light source and the second light source in the same image are kept consistent in the same coordinate system.

[0091] Understandably, the galvanometer of the laser processing equipment corresponds to a predetermined image coordinate system, representing the theoretical coordinate system, while the first coordinate system represents the actual coordinate system of the first or second light source.

[0092] Because the first and second light sources have different wavelengths, they need to be installed in different positions in the laser processing equipment and physically combined using optical elements. However, installation errors of the light sources cause certain errors in the combined light effect after passing through the optical elements, resulting in relative relationships such as rotation and displacement between the first and second patterns.

[0093] This can be understood as follows: when the first pattern and the second pattern are placed overlapping, the first pattern and the second pattern do not overlap, which will cause the processed pattern to have a ghosting effect.

[0094] In this embodiment, both the first light source and the second light source use the first coordinate system as the reference coordinate system. Even if the wavelengths of different light sources are different, there will be deviations between the processing patterns on the processing object. By adjusting the galvanometer parameters through the coordinate mapping relationship, the processing position of the first light source or the second light source on the processing object is the same as the position displayed in the predetermined image coordinate system. The processed image will not have ghosting, thus ensuring the laser processing effect of multiple light sources.

[0095] Furthermore, the galvanometer parameter is the deflection angle of the galvanometer, and the deflection angle of the galvanometer of the laser processing equipment is corrected in reverse by the first adjustment parameter or the second adjustment parameter.

[0096] As an optional implementation, the deflection angle of the galvanometer can be adjusted in the opposite direction based on the displacement data generated by the galvanometer operation controller.

[0097] In this embodiment, by acquiring displacement data of the galvanometer movement, the displacement data can characterize the difference in galvanometer parameters between the first coordinate system and the predetermined image coordinate system when comparing the first coordinate system with the predetermined image coordinate system, thereby quickly obtaining the relative relationship between the first coordinate system and the predetermined image coordinate system.

[0098] Furthermore, the first and second patterns are divided into an array of multiple regions, and the unit spacing between the multiple regions corresponds to the deflection angle increment of the galvanometer.

[0099] In this process, the first / second pattern is formed into an array of multiple regions, and the unit spacing of each region corresponds to the deflection angle increment of the galvanometer.

[0100] This can be understood as the difference in coordinate values ​​being represented in the first pattern as a difference in regions on the array, which is then converted into adjustment parameters used to correct the galvanometer.

[0101] S141, Based on the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system, the first adjustment parameters are obtained, including:

[0102] S141a, based on the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system, the first coordinate difference is obtained. The first coordinate difference has a multiple relationship with the unit spacing of multiple regions.

[0103] S141 b, the adjustment parameters are obtained through the first coordinate difference.

[0104] S143, Based on the coordinate mapping relationship and the coordinate values ​​of the second pattern under the first coordinate system, the second adjustment parameters are obtained, including:

[0105] S143a, based on the coordinate mapping relationship and the coordinate values ​​of the second pattern in the first coordinate system, the second coordinate difference is obtained. The second coordinate difference has a multiple relationship with the unit spacing of multiple regions.

[0106] S143b, the adjustment parameters are obtained through the second coordinate difference.

[0107] Specifically, when the first pattern is a rectangular pattern, the size of the first pattern is N*N, and the value of N is an integer between [5, 50]. The value of N is determined according to the processing precision.

[0108] A first light source processes an N*N rectangular pattern on a first object, and a second light source processes an N*N rectangular pattern on the second object. The spacing between rows and columns of the rectangular pattern corresponds to an increment of the deflection angle of the galvanometer in the laser processing equipment, which is 1 / N of the maximum deflection angle of the galvanometer. For example, if the maximum deflection angle of the galvanometer is 65536, when the laser processing equipment prints an N*N matrix pattern, for each unit movement (e.g., from the first row and first column to the first row and second column), the galvanometer deflects by an angle of 65536 / N. The first row and first column of the rectangular pattern corresponds to an angle of 0 (digital value 0) for the galvanometer, and the last row and last column of the rectangular pattern corresponds to the maximum deflection angle of the galvanometer (digital value 65536).

[0109] The first row can be the top row of the rectangular pattern, the first column can be the leftmost column of the rectangular pattern, the last row is the bottom row of the rectangular pattern, and the last column is the rightmost column of the rectangular pattern.

[0110] Based on the above, when using the first light source for processing, the multiple relationship between the first coordinate difference and the unit spacing of the rectangular area is determined, thereby determining the deflection angle of the galvanometer to correct the processing position of the first light source.

[0111] When using the second light source for processing, the multiple relationship between the second coordinate difference and the unit spacing of the rectangular area is determined, thereby determining the deflection angle of the galvanometer to correct the processing position of the second light source.

[0112] Specifically, based on the relative relationship between the coordinate values ​​of the same coordinate point, the relative relationship between the actual coordinate system and the reference coordinate system is determined, and the rotation angle of the galvanometer is adjusted according to the relative relationship.

[0113] For example, the first image is a rectangular image, and the first positioning information includes the positions of the positioning points on which a coordinate system is established on the rectangular image.

[0114] This application provides a laser processing device, including:

[0115] Multiple processing light sources;

[0116] A multi-source correction device is used to perform the multi-source correction method described above.

[0117] Specifically, the processing light source is emitted by a laser, with each processing light source corresponding to one laser. The processing light source is electrically connected to a multi-light source correction device, which controls the switching between processing light sources; the multi-light source correction device is also used to perform the aforementioned multi-light source correction method.

[0118] The processing light source includes a first light source and a second light source.

[0119] As an optional implementation, if the processing light source includes at least two or more, the first coordinate system established by the first light source is used as the reference for all of them.

[0120] Figure 4 A schematic diagram of the laser processing equipment is shown. Figure 4 As shown, this application provides a laser processing device, including multiple lasers 410, multiple mirrors 430, a dichroic mirror 440, a galvanometer 450, and a control system 400.

[0121] A beam expander 420 is provided on the laser 410. The beam expander 420 is used to adjust the size of the light beam emitted from the laser 410. The light beam is projected onto the reflector 430 after passing through the laser 410 and the beam expander 420. The light reflected from the reflector 430 passes through the dichroic mirror 440 and then through the galvanometer 450. The galvanometer 450 projects the light onto the F-θ field mirror 460 for focusing.

[0122] Specifically, the galvanometer is an XY scanning galvanometer, which can rotate in the x and y directions.

[0123] Specifically, according to embodiments of this application, the processes described in the various method flowcharts can be implemented as computer software programs. For example, embodiments of this application include a computer program product comprising a computer program carried on a computer-readable medium, the computer program containing program code for performing the methods shown in the flowcharts. In such embodiments, the computer program can be downloaded and installed from a network via a communication component, and / or installed from a removable medium. When the computer program is executed by a central processing unit, it performs various functions defined in the system of this application.

[0124] It should be noted that the computer-readable medium shown in the embodiments of this application can be a computer-readable signal medium or a computer-readable storage medium, or any combination of the two. A computer-readable storage medium can be, for example,—but not limited to—an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or any combination thereof. More specific examples of a computer-readable storage medium may include, but are not limited to: an electrical connection having one or more wires, a portable computer disk, a hard disk, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM), flash memory, optical fiber, portable compact disk read-only memory (CD-ROM), optical storage device, magnetic storage device, or any suitable combination thereof. In this application, a computer-readable storage medium can be any tangible medium containing or storing a program that can be used by or in conjunction with an instruction execution system, apparatus, or device. In this application, a computer-readable signal medium can include a data signal propagated in baseband or as part of a carrier wave, carrying computer-readable program code. Such transmitted data signals can take various forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination thereof. The computer-readable signal medium can also be any computer-readable medium other than a computer-readable storage medium, which can send, propagate, or transmit a program for use by or in connection with an instruction execution system, apparatus, or device. The program code contained on the computer-readable medium can be transmitted using any suitable medium, including but not limited to wireless, wired, etc., or any suitable combination thereof.

[0125] The flowcharts and block diagrams in the accompanying drawings illustrate the architecture, functionality, and operation of possible implementations of systems, methods, and computer program products according to various embodiments of this application. In this regard, each block in a flowchart or block diagram may represent a module, segment, or portion of code containing one or more executable instructions for implementing a specified logical function. It should also be noted that in some alternative implementations, the functions indicated in the blocks may occur in a different order than those indicated in the drawings. For example, two consecutively indicated blocks may actually be executed substantially in parallel, and they may sometimes be executed in reverse order, depending on the functions involved. It should also be noted that each block in a block diagram or flowchart, and combinations of blocks in a block diagram or flowchart, may be implemented using a dedicated hardware-based system that performs the specified function or operation, or using a combination of dedicated hardware and computer instructions.

[0126] It should be noted that although several modules or units for the device used to perform actions have been mentioned in the detailed description above, this division is not mandatory. In fact, according to the embodiments of this application, the features and functions of two or more modules or units described above can be embodied in one module or unit. Conversely, the features and functions of one module or unit described above can be further divided and embodied by multiple modules or units.

[0127] Through the above description of the embodiments, those skilled in the art will readily understand that the exemplary embodiments described herein can be implemented by software or by combining software with necessary hardware. Therefore, the technical solutions according to the embodiments of this application can be embodied in the form of a software product, which can be stored in a non-volatile storage medium (such as a CD-ROM, USB flash drive, external hard drive, etc.) or on a network, including several instructions to cause a computing device (such as a personal computer, server, touch terminal, or network device, etc.) to execute the method according to the embodiments of this application.

[0128] Other embodiments of this application will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This application is intended to cover any variations, uses, or adaptations of this application that follow the general principles of this application and include common knowledge or customary techniques in the art not disclosed herein.

[0129] It should be understood that this application is not limited to the precise structure described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from its scope. The scope of this application is limited only by the appended claims.

Claims

1. A multi-source calibration method, characterized in that, The multi-source correction method is applied to laser processing equipment, and the multi-source correction method includes: A first pattern is processed on a first object using a first light source, a first coordinate system is established on the first object, and the coordinate values ​​of the first pattern in the first coordinate system are determined. Obtain coordinate values ​​in a predetermined image coordinate system, and compare the difference between the coordinate values ​​in the first coordinate system and the coordinate values ​​in the predetermined image coordinate system; the predetermined image coordinate system is set at the operating end of the laser processing equipment, and the predetermined image coordinate system is used to display the position of the processing pattern on the processing object; Based on the difference, a coordinate mapping relationship between the first coordinate system and the predetermined image coordinate system is constructed; A second pattern is processed on a second object using a second light source, and the coordinates of the second pattern in the first coordinate system are obtained using a visual acquisition tool; wherein the wavelengths of the first light source and the second light source are different; and the positions of the first object and the second object are the same; The first pattern and the second pattern are divided into an array of multiple regions, and the unit spacing of the multiple regions corresponds to the deflection angle increment of the galvanometer. Based on the coordinate mapping relationship and the coordinate values ​​of the first pattern in the first coordinate system, a first coordinate difference is obtained; the first coordinate difference has a multiple relationship with the unit spacing of the multiple regions; and a first adjustment parameter is obtained through the first coordinate difference. The second adjustment parameter is obtained based on the coordinate mapping relationship and the coordinate values ​​of the second pattern in the first coordinate system; When processing with the first light source, the deflection angle of the galvanometer in the laser processing equipment is adjusted by the first adjustment parameter; when processing with the second light source, the deflection angle of the galvanometer in the laser processing equipment is adjusted by the second adjustment parameter, so that the coordinate values ​​in the same coordinate system are consistent when the first light source and the second light source process the same image.

2. The multi-source correction method according to claim 1, characterized in that, The process of processing a first pattern on a first object using a first light source, establishing a first coordinate system on the first object, and determining the coordinate values ​​of the first pattern in the first coordinate system includes: Obtain a first positioning point and a second positioning point on the first pattern; A third positioning point is determined based on the first positioning point and the second positioning point. The third positioning point is located on the straight line determined by the first positioning point and the second positioning point and is between the first positioning point and the second positioning point. The first coordinate system is generated based on the first positioning point, the second positioning point, and the third positioning point, and the coordinate values ​​of the first pattern in the first coordinate system are determined.

3. The multi-source correction method according to claim 2, characterized in that, The step of generating the first coordinate system based on the first positioning point, the second positioning point, and the third positioning point, and determining the coordinate values ​​of the first pattern in the first coordinate system, includes: The first axis of the first coordinate system is generated based on the first positioning point and the second positioning point; Centered on the third positioning point, a second axis perpendicular to the first axis is generated, and the first coordinate system is obtained through the first axis and the second axis; Calculate the coordinate values ​​of the first pattern in the first coordinate system.

4. The multi-source correction method according to claim 2, characterized in that, The step of processing a second pattern on a second object using a second light source and obtaining the coordinate values ​​of the second pattern in the first coordinate system using a visual acquisition tool includes: The first positioning point, the second positioning point, and the third positioning point are generated on the second pattern by the first light source; Based on the first positioning point, the second positioning point, and the third positioning point, the first coordinate system is generated on the second pattern; Based on the first coordinate system, the coordinate values ​​of the second pattern in the first coordinate system are obtained by a visual acquisition tool.

5. The multi-source correction method according to claim 1, characterized in that, The deflection angle of the galvanometer of the laser processing equipment is reversed by using either the first adjustment parameter or the second adjustment parameter.

6. The multi-source correction method according to claim 1, characterized in that, The step of obtaining the second adjustment parameter based on the coordinate mapping relationship and the coordinate values ​​of the second pattern in the first coordinate system includes: Based on the coordinate mapping relationship and the coordinate values ​​of the second pattern in the first coordinate system, a second coordinate difference is obtained, and the second coordinate difference has a multiple relationship with the unit spacing of the multiple regions; The second adjustment parameter is obtained by using the second coordinate difference.

7. A laser processing device, characterized in that, include: Multiple processing light sources; A multi-source correction device for performing the multi-source correction method as described in any one of claims 1-6.

Images