A magnetron sputtering coating method and coating equipment for waterproof shoe upper

Abstract

The invention relates to a magnetron sputtering coating method and coating equipment for waterproof shoe uppers, and relates to the technical field of magnetron sputtering, comprising a vacuum chamber, a swinging material system, a vacuum device, an argon gas introduction device, an ion source and a target material, wherein the vacuum chamber is surrounded by an upper cover and a box body, the argon gas introduction device and the vacuum device are both connected to the vacuum chamber, the swinging material system is mounted on the upper cover, the ion source is mounted on the upper cover, the target material is mounted on the box body, the swinging material system is opposite to the target material, the swinging material system comprises a swinging material rotating rod, a rotating device and an inertial deflection frame, the swinging material rotating rod is rotatably mounted on the upper cover, the inertial deflection frame is rotatably mounted on the swinging material rotating rod, the rotating device is mounted at the bottom of the swinging material rotating rod, the rotating device rotates relative to the inertial deflection frame, the inertial deflection frame is axially fixed on the swinging material rotating rod, and the coating area is large.

Description

Technical Field

[0001] The invention relates to the technical field of magnetron sputtering, and in particular to a magnetron sputtering coating method and coating equipment for waterproof shoe uppers. Background Art

[0002] Magnetron sputtering is a type of physical vapor deposition (PVD). The general sputtering method can be used to prepare multiple materials such as metals, semiconductors, insulators, etc., and has the advantages of simple equipment, easy control and strong adhesion. The magnetron sputtering method developed in the 1970s has achieved high speed, low temperature and low damage. Magnetron sputtering introduces a magnetic field on the surface of the target cathode and uses the magnetic field to confine the charged particles to increase the plasma density and increase the sputtering rate.

[0003] The existing vacuum sputtering has a small working area and a relatively fixed sputtering range on the workpiece, which is difficult to meet the needs of waterproof shoe uppers. Summary of the invention

[0004] In order to overcome the technical defects of the prior art, the present invention provides a magnetron sputtering coating method and coating equipment for waterproof shoe uppers, which has a large coating area.

[0005] The technical solution adopted by the present invention is:

[0006] A magnetron sputtering coating device for waterproof shoe uppers comprises a vacuum chamber, a swinging material system, a vacuum device, an argon gas introduction device, an ion source and a target material, wherein the vacuum chamber is surrounded by an upper cover and a box body, the argon gas introduction device and the vacuum device are both connected to the vacuum chamber, the swinging material system is mounted on the upper cover, the ion source is mounted on the box body, the target material is mounted on the box body, the swinging material system is opposite to the target material, the swinging material system comprises a swinging material rotating rod, a rotating device and an inertial deflection frame, the swinging material rotating rod is rotatably mounted on the upper cover, the inertial deflection frame is rotatably mounted on the swinging material rotating rod, the rotating device is mounted on the bottom of the swinging material rotating rod, the rotating device rotates relative to the inertial deflection frame, and the inertial deflection frame is axially fixed on the swinging material rotating rod.

[0007] Preferably, the swing material rotating rod is rotatably mounted on the upper cover via a bearing, a sprocket is provided on the swing material rotating rod, the sprocket transmission of the swing material rotating rod is connected to a motor, and the motor is mounted on the upper cover.

[0008] Preferably, a fixing groove is provided on the swing material rotating rod.

[0009] Preferably, the rotating device is a rotating disk, and radial friction patterns are provided on the bottom of the rotating disk.

[0010] Preferably, the inertial deflection frame includes a rotary swing arm and a guide arm, the rotary swing arm is rotatably mounted on the swing material rotary rod, the guide arm is mounted on the rotary swing arm, the guide arm is arc-shaped, and the end of the guide arm is provided with a chamfer.

[0011] Preferably, the direction of the ion source is parallel to that of the target.

[0012] Preferably, a roller with a brake is provided at the bottom of the box.

[0013] Preferably, the box body is provided with a plurality of observation windows.

[0014] A magnetron sputtering coating method for waterproof shoe uppers comprises the following steps:

[0015] S1: vacuum device evacuates the air;

[0016] S2: The argon gas introduction device is filled with argon gas;

[0017] S3: Install the upper fabric on the swing material rotating rod and the rotating device;

[0018] S4: The ion source generates a glow discharge to allow ionized argon gas to impact and clean the upper fabric;

[0019] S5: After the target is filled with argon gas, glow discharge is generated, so that the ionized argon gas is accelerated to impact the surface of the target material, so that atoms on the surface of the target material fly out and accumulate on the upper fabric to form a coating;

[0020] S6: The swing material rotating rod rotates repeatedly, causing the upper fabric to deflect along the inertia deflection frame to increase the coating area.

[0021] The beneficial effects of the present invention are:

[0022] The vacuum chamber is surrounded by an upper cover and a box body, thereby forming a vacuum chamber. The argon gas introduction device and the vacuum device are both connected to the vacuum chamber to supply argon gas. Before the argon gas introduction device introduces argon gas, the vacuum device first evacuates the vacuum chamber. The argon gas introduction device and the vacuum device are both existing technologies and will not be described in detail here. The swing material system is installed on the upper cover, and the upper fabric is installed on the swing material system. The ion source is installed on the box body to generate ionized argon gas. The target material is installed on the box body, and a magnetic field source is provided at the bottom of the target material. The magnetic field source is a common commercially available magnetic field source in the field of vacuum magnetron sputtering. The swing material system is opposite to the target material, and the target material is a nickel block. The nickel block is arranged in the vacuum chamber. When argon gas is filled, a glow discharge is generated, so that the ionized argon gas is accelerated to impact the surface of the target material under the action of the magnetic field, so that the atoms on the surface of the target material fly out and accumulate into a coating on the surface of the upper fabric. In this embodiment, the target material is a nickel target material, which gives the upper fabric wear resistance and waterproofness.

[0023] In order to make the upper fabric approach the target material in a wider range, a swinging material system is set, which includes a swinging material rotating rod, a rotating device and an inertial deflection frame. The swinging material rotating rod is rotatably installed on the upper cover, and the inertial deflection frame is rotatably installed on the swinging material rotating rod. The rotating device is installed at the bottom of the swinging material rotating rod. When the swinging material rotating rod reciprocates, the inertial deflection frame will temporarily not rotate with the swinging material rotating rod due to inertia. Of course, there is friction between the upper fabric and the inertial deflection frame, and this friction drives the inertial deflection frame to rotate when needed. Driving the inertial deflection frame to rotate with the swing material rotating rod will occur after the swing material rotating rod rotates for a period of time, thereby causing the rotating device to rotate relative to the inertial deflection frame, and sleeve the upper fabric on the rotating device and the swing material rotating rod. Driven by the inertial deflection frame, the upper fabric deflects under the rotating device, that is, the area of ​​the upper fabric exposed on the lower side of the rotating device will change, thereby greatly increasing the area where the upper fabric is splashed, and thereby allowing more upper fabric to be coated, and the inertial deflection frame is axially fixed to the swing material rotating rod through a bearing. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 This is a schematic diagram of the structure after the upper cover is hidden in the present invention.

[0025] Figure 2 It is a schematic diagram of the structure of the present invention.

[0026] Figure 3 This is a schematic diagram of the swing system structure.

[0027] Figure 4 It is a schematic diagram of the lower structure of the swing system.

[0028] Figure 5 This is a schematic diagram of the relationship between the material placement system and the upper fabric installation.

[0029] Figure 6 This is another schematic diagram of the relationship between the material placement system and the upper fabric installation state.

[0030] Description of reference numerals:

[0031] 1. Vacuum chamber; 11. Upper cover; 12. Box body; 13. Observation window;

[0032] 2. Swinging system; 21. Swinging rotating rod; 211. Fixed slot; 22. Rotating device; 221. Friction pattern; 23. Inertial deflection frame; 231. Rotating swing arm; 232. Guide arm;

[0033] 3. Ion source;

[0034] 4. Target material;

[0035] 5. Upper fabric. DETAILED DESCRIPTION

[0036] The present invention will be further described below in conjunction with the accompanying drawings:

[0037] like Figure 1 and Figure 6 Please note that Figure 1 for Figure 2 The structural diagram after hiding the upper cover 11, the present embodiment provides a magnetron sputtering coating device for waterproof shoe uppers, including a vacuum chamber 1, a swinging material system 2, a vacuum device, an argon gas introduction device, an ion source 3 and a target material 4, the vacuum chamber 1 is surrounded by the upper cover 11 and the box body 12, and then the vacuum chamber 1 is surrounded, the argon gas introduction device and the vacuum device are both connected to the vacuum chamber 1 to supply argon gas, before the argon gas introduction device introduces argon gas, the vacuum device first evacuates the vacuum chamber 1, the argon gas introduction device and the vacuum device are both prior art, and will not be repeated here, the swinging material system 2 is installed on the upper cover 11, the upper fabric 5 is installed on the swinging material system 2, and the ion source 3 is installed on the box body 12 to generate ionized Argon gas, ion source 3, is arranged on the bottom wall of the vacuum chamber 1. When filled with argon gas, the ion source 3 generates glow discharge to make the ionized argon gas impact and clean the upper fabric 5. The target material 4 is installed on the box body 12. A magnetic field source is provided at the bottom of the target material 4. The magnetic field source is a commercially available magnetic field source commonly used in the field of vacuum magnetron sputtering. The swing system 2 is opposite to the target material 4. The target material 4 is a nickel block. The nickel block is arranged in the vacuum chamber 1. When filled with argon gas, a glow discharge is generated, so that the ionized argon gas is accelerated to impact the surface of the target material 4 under the action of the magnetic field, so that the atoms on the surface of the target material 4 fly out and accumulate into a coating on the surface of the upper fabric 5. In this embodiment, the target material 4 is a nickel target material, which gives the upper fabric 5 wear resistance and waterproofness.

[0038] In order to make the upper fabric 5 approach the target material 4 in a wider range, a swinging material system 2 is set, which includes a swinging material rotating rod 21, a rotating device 22 and an inertial deflection frame 23. The swinging material rotating rod 21 is rotatably mounted on the upper cover 11, and the inertial deflection frame 23 is rotatably mounted on the swinging material rotating rod 21. The rotating device 22 is mounted at the bottom of the swinging material rotating rod 21. When the swinging material rotating rod 21 reciprocates, the inertial deflection frame 23 will not rotate with the swinging material rotating rod 21 temporarily due to inertia. Of course, there is friction between the upper fabric 5 and the inertial deflection frame 23, and this friction drives the inertial deflection frame 23 to rotate when needed. Driving the inertial deflection frame 23 to rotate with the swing material rotating rod 21 will occur after the swing material rotating rod 21 rotates for a period of time, thereby causing the rotating device 22 to rotate relative to the inertial deflection frame 23, and the upper fabric 5 is sleeved on the rotating device 22 and the swing material rotating rod 21. The upper fabric 5 is deflected under the rotating device 22 driven by the inertial deflection frame 23. That is to say, the area of ​​the upper fabric 5 exposed on the lower side of the rotating device 22 will change, thereby greatly increasing the sputtering area of ​​the upper fabric 5, and thereby allowing more upper fabric 5 to be coated. The inertial deflection frame 23 is axially fixed to the swing material rotating rod 21 through a bearing.

[0039] Specifically, the swing material rotating rod 21 is rotatably mounted on the upper cover 11 through a bearing, a sprocket is provided on the swing material rotating rod 21, the sprocket of the swing material rotating rod 21 is connected to a motor through a transmission belt, the motor is mounted on the upper cover 11, and the motor drives the swing material rotating rod 21 to rotate back and forth.

[0040] Specifically, a fixing groove 211 is provided on the swinging material rotating rod 21 for fixing the upper fabric 5 with a cable tie. The cable tie buckles the upper fabric 5 into the fixing groove 211 to fix the upper fabric 5 .

[0041] Specifically, the rotating device 22 is a rotating disk, and a radial friction pattern 221 is provided at the bottom of the rotating disk to transmit the rotational torque while reducing the friction between the guide arm 232 and the upper fabric 5 and the effect of dragging the upper fabric 5. In other words, the guide arm 232 and the upper fabric 5 will slide against each other.

[0042] Specifically, the inertial deflection frame 23 includes a rotating swing arm 231 and a guide arm 232. The rotating swing arm 231 is rotatably installed on the swing material rotating rod 21, and the guide arm 232 is installed on the rotating swing arm 231. The guide arm 232 is arc-shaped, and the end of the guide arm 232 is chamfered to facilitate sliding on the cloth. The rotating guide arm 232 drags the cloth to slide along the bottom of the turntable, thereby increasing the coating area.

[0043] It is worth noting that the friction between the inertial deflection frame 23 and the upper fabric 5 is inevitable and needs to be reduced as much as possible, so a chamfer is designed on the guide arm 232. On the other hand, since radial friction lines 221 are provided at the bottom of the turntable, the upper fabric 5 will quickly follow the movement driven by the friction lines 221 after the swing material rotating rod 21 rotates, thereby reducing the influence of the inertial deflection frame 23 on the movement of the upper fabric 5. Since the inertial deflection frame 23 is axially fixed to the swing material rotating rod 21 through a bearing, the inertial deflection frame 23 will not rotate immediately under the influence of its own inertia, resulting in relative rotation between the inertial deflection frame 23 and the swing material rotating rod 21, which also causes the inertial deflection frame 23 to pull the upper fabric 5 to slide on the lower side of the rotating device 22, thereby changing the sputtering area (such as Figure 5 and Figure 6 As shown in the figure, the change in position of the upper fabric 5 in the bold part reveals that after the relative rotation between the inertial deflection frame 23 and the swing material rotating rod 21, the upper fabric 5 slides on the bottom of the rotating device 22.

[0044] Specifically, the ion source 3 is directed parallel to the target 4 to generate ionized argon gas.

[0045] Specifically, a roller with a brake is provided at the bottom of the box 12 to enable the box 12 to move.

[0046] Specifically, the box body 12 is provided with a plurality of observation windows 13 for observing the coating conditions.

[0047] A magnetron sputtering coating method for waterproof shoe uppers comprises the following steps:

[0048] S1: vacuum device evacuates the air;

[0049] S2: The argon gas introduction device is filled with argon gas;

[0050] S3: Install the upper fabric 5 on the swing material rotating rod 21 and the rotating device 22;

[0051] S4: the ion source 3 generates glow discharge to make the ionized argon gas impact and clean the shoe upper fabric 5;

[0052] S5: After the target 4 is filled with argon gas, glow discharge is generated, so that the ionized argon gas is accelerated to impact the surface of the target 4, so that atoms on the surface of the target 4 fly out and accumulate on the upper fabric 5 to form a coating;

[0053] S6: The swing material rotating rod 21 rotates repeatedly, so that the upper fabric 5 deflects along the inertial deflection frame 23 to increase the coating area.

[0054] The above shows and describes the basic principles and main features of the present invention and the advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for illustrating the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which shall fall within the scope of the present invention to be protected. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. A magnetron sputtering coating device for waterproof shoe uppers, characterized in that: The invention comprises a vacuum chamber, a swinging material system, a vacuum device, an argon gas introducing device, an ion source and a target material, wherein the vacuum chamber is surrounded by an upper cover and a casing, the argon gas introducing device and the vacuum device are both connected to the vacuum chamber, the swinging material system is mounted on the upper cover, the ion source is mounted on the casing, the target material is mounted on the casing, the swinging material system is opposite to the target material, the swinging material system comprises a swinging material rotating rod, a rotating device and an inertial deflection frame, the swinging material rotating rod is rotatably mounted on the upper cover, the inertial deflection frame is rotatably mounted on the swinging material rotating rod, the rotating device is mounted on the bottom of the swinging material rotating rod, the rotating device rotates relative to the inertial deflection frame, the inertial deflection frame is axially fixed on the swinging material rotating rod, the inertial deflection frame comprises a rotating swing arm and a guide arm, the rotating swing arm is rotatably mounted on the swinging material rotating rod, the guide arm is mounted on the rotating swing arm, the guide arm is arc-shaped, and the end of the guide arm is provided with a chamfer.

2. The magnetron sputtering coating equipment for waterproof shoe uppers according to claim 1, characterized in that: The swing material rotating rod is rotatably mounted on the upper cover via a bearing, a sprocket is provided on the swing material rotating rod, the sprocket of the swing material rotating rod is transmission-connected with a motor, and the motor is mounted on the upper cover.

3. The magnetron sputtering coating equipment for waterproof shoe uppers according to claim 1, characterized in that: A fixing groove is arranged on the swing material rotating rod.

4. The magnetron sputtering coating equipment for waterproof shoe uppers according to claim 1, characterized in that: The rotating device is a rotating disk, and radial friction lines are arranged on the bottom of the rotating disk.

5. The magnetron sputtering coating equipment for waterproof shoe uppers according to claim 1, characterized in that: The ion source is directed in parallel with the target.

6. The magnetron sputtering coating equipment for waterproof shoe uppers according to claim 1, characterized in that: A roller with a brake is arranged at the bottom of the box.

7. The magnetron sputtering coating equipment for waterproof shoe uppers according to claim 1, characterized in that: The box body is provided with a plurality of observation windows.

8. A method for magnetron sputtering coating for waterproof shoe uppers, using the magnetron sputtering coating device for waterproof shoe uppers as claimed in claim 1, characterized in that: The steps include: S1: vacuum device evacuates the air; S2: The argon gas introduction device is filled with argon gas; S3: Install the upper fabric on the swing material rotating rod and the rotating device; S4: The ion source generates a glow discharge to allow ionized argon gas to impact and clean the upper fabric; S5: After the target is filled with argon gas, glow discharge is generated, so that the ionized argon gas is accelerated to impact the surface of the target material, so that atoms on the surface of the target material fly out and accumulate on the upper fabric to form a coating; S6: The swing material rotating rod rotates repeatedly, causing the upper fabric to deflect along the inertia deflection frame to increase the coating area.

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