Workpiece table and exposure apparatus

Abstract

The present application relates to a kind of workpiece table and exposure device, workpiece table includes scanning slider, step slider, platform, first drive motor and force compensation mechanism;Scanning slider is located on foundation, scanning slider can be moved along scanning direction relative to foundation;Step slider is located on scanning slider, step slider can be moved along step direction relative to scanning slider;Platform is connected to step slider, platform is used to support workpiece;First drive motor is located on foundation, and is connected with scanning slider, first drive motor is used to drive scanning slider to move along scanning direction;Force compensation mechanism is located on foundation, and is connected with scanning slider;Wherein, step slider moves along step direction relative to scanning slider, force compensation mechanism applies the force opposite to the moving direction of step slider to scanning slider, to offset the force of step slider to scanning slider, scanning direction is perpendicular to step direction.

Description

Technical Field

[0001] This invention relates to the field of semiconductor and display panel manufacturing equipment technology, and in particular to an exposure apparatus. Background Technology

[0002] Photolithography is the most complex and critical process in semiconductor chip manufacturing, characterized by its long processing time and high cost. The difficulty and key to semiconductor chip production lies in creating the target circuit pattern on a silicon wafer, a process achieved through photolithography. The level of photolithography directly determines the chip's manufacturing process and performance. Similarly, in the production of display panels, photolithography is used to manufacture the crucial thin-film transistors (TFTs), and the photolithography process determines the display panel's performance.

[0003] As crucial equipment for photolithography processes in semiconductors and display panels, the stability and reliability of exposure equipment play a key role in the effectiveness of the photolithography process. In recent years, the market has placed increasingly higher demands on the three major performance indicators of display panel exposure equipment. The requirement for high resolution primarily stems from market demands for display screens, while the high requirement for overlay accuracy mainly arises from the needs of Organic Light Emitting Display (OLED) panel manufacturing processes. Compared to Liquid Crystal Display (LCD) panels, OLED panel manufacturing requires significantly more layers to be exposed, necessitating even higher overlay accuracy. Furthermore, to meet market demands for reduced panel production costs, exposure equipment has been continuously developing towards larger sizes and higher speeds.

[0004] In related exposure apparatuses, the technical solutions for suppressing the driving reaction force when the stage moves in the scanning and stepping directions are as follows: The driving reaction force in the scanning direction is suppressed by externally directing the reaction force of the drive motor to the foundation; the driving reaction force in the stepping direction is suppressed by directing it to the foundation through auxiliary workpiece stage and rigid guide rail constraints. However, this method of suppressing driving reaction force is not only structurally complex but also increases the moving mass of the workpiece stage, leading to increased heat generation of the drive motor and affecting the deformation of its surrounding structural components, thereby reducing the exposure quality. Summary of the Invention

[0005] Therefore, it is necessary to provide a workpiece stage and an exposure device to address the technical problem that the schemes for suppressing reaction forces in exposure devices in related technologies are complex in structure and easily lead to a reduction in exposure quality.

[0006] A workpiece stage, the workpiece stage comprising:

[0007] A scanning slider is disposed above the foundation, and the scanning slider can move relative to the foundation along the scanning direction;

[0008] A stepping slider is disposed on the scanning slider, and the stepping slider can move relative to the scanning slider in a stepping direction perpendicular to the scanning direction;

[0009] A platform, connected to the stepper slider, is used to support the workpiece;

[0010] A first drive motor is mounted on the foundation and connected to the scanning slider. The first drive motor is used to drive the scanning slider to move along the scanning direction.

[0011] A force-counteracting mechanism is mounted on the foundation and connected to the scanning slider;

[0012] When the stepping slider moves relative to the scanning slider along the stepping direction, the force cancellation mechanism applies a force to the scanning slider that is opposite to the direction of movement of the stepping slider, so as to cancel the force exerted by the stepping slider on the scanning slider.

[0013] In one embodiment, the workpiece stage further includes:

[0014] The first support column is supported on the foundation and fixedly connected to the foundation. The first support column is respectively provided on the side of both ends of the scanning slider along the stepping direction. The first support column extends along the scanning direction.

[0015] Both the first drive motor and the force cancellation mechanism are mounted on the first support column.

[0016] In one embodiment, the force-canceling mechanism includes:

[0017] A force-canceling stator is fixedly connected to the first support column, and the force-canceling stator extends along the scanning direction;

[0018] A force-canceling mover is connected to the scanning slider. The force-canceling mover is guided and engaged with the force-canceling stator. The force-canceling mover can move relative to the force-canceling stator and apply a force to the scanning slider.

[0019] In one embodiment, there are two force-canceling movers, which are spaced apart on the force-canceling stator. The sum of the torque of the driving force exerted by the two force-canceling movers on the scanning slider about the center of gravity of the scanning slider and the torque of the reaction force exerted by the stepper slider on the scanning slider about the center of gravity of the scanning slider is zero.

[0020] In one embodiment, the first drive motor includes:

[0021] A first linear stator is fixedly connected to the first support column, and the extension direction of the first linear stator is consistent with the extension direction of the first support column.

[0022] A first mover is connected to the scanning slider and is guided and engaged with the first linear stator. The first mover provides driving force for the movement of the scanning slider relative to the foundation.

[0023] In one embodiment, the workpiece stage further includes:

[0024] A base is provided on the foundation, the base is located between the two first support columns, and is spaced apart from and independent of the first support columns, and the scanning slider is slidably connected to the base.

[0025] In one embodiment, the workpiece stage further includes:

[0026] A first vibration isolation component, wherein a plurality of first vibration isolation components are spaced apart between the base and the foundation, and the first vibration isolation components are capable of absorbing vibrations from the foundation.

[0027] In one embodiment, the workpiece stage further includes:

[0028] The second drive motor includes a second linear stator and a second mover. The second linear stator is fixedly connected to the scanning slider, and the second mover is connected to the stepping slider. The second mover is guided and cooperates with the second linear stator. The second mover is used to provide driving force for the movement of the stepping slider relative to the scanning slider.

[0029] In one embodiment, the workpiece stage further includes:

[0030] The first guide rail is fixed on the base;

[0031] A first bearing is fixed below the scanning slider and coupled to the first guide rail, causing the scanning slider to move relative to the first guide rail;

[0032] A second guide rail is disposed between the scanning slider and the stepping slider, and the second guide rail is fixedly connected to the scanning slider.

[0033] The second air bearing is fixed to the stepper slider and coupled to the first guide rail, and moves the stepper slider relative to the second guide rail.

[0034] An exposure apparatus that utilizes the above-described worktable, the exposure apparatus comprising:

[0035] The second support column is located outside the first support column and is spaced apart from and independent of the first support column, or the two are fixedly connected together without any gap between them.

[0036] The second vibration isolation component is installed on the second support column;

[0037] The projection optics assembly, mask stage, and measurement unit are fixed to the mounting frame on the second vibration isolation assembly via structural components.

[0038] The projection optics assembly is arranged above the workpiece stage;

[0039] The mask stage is arranged above the projection optical components;

[0040] The measuring unit is arranged above the mask stage;

[0041] The third drive motor is used to drive the mask stage to perform scanning motion and non-scanning motion perpendicular to the scanning direction;

[0042] The third linear stator of the third drive motor is fixedly connected to the second support column;

[0043] The third actuator of the third drive motor is fixedly connected to both sides of the mask stage.

[0044] The beneficial effects of this invention are:

[0045] This invention provides a workpiece stage, which supports a workpiece, i.e., a substrate, to be exposed. A scanning slider is positioned above a base and is movable relative to the base along the scanning direction. A stepper slider is mounted on the scanning slider and is movable relative to the scanning slider along a stepping direction perpendicular to the scanning direction. The stage is connected to the stepper slider so that when the scanning slider moves relative to the base along the scanning direction, it drives the stepper slider mounted on it to move along the scanning direction, thereby moving the stage and the workpiece mounted on it relative to the base along the scanning direction. When the stepper slider moves relative to the scanning slider along the stepping direction, the stage moves relative to the scanning slider along the stepping direction under the drive of the stepper slider, thereby moving the workpiece relative to the scanning slider along the stepping direction. It can be understood that if the base is consistently used as a reference, the workpiece moves relative to the base along the scanning direction via the scanning slider, driving the stepper slider and the stage; and the stepper slider moves the stage relative to the base along the stepping direction, thus achieving movement of the workpiece relative to the base along both the scanning and stepping directions. By mounting the first linear stator of the first drive motor on the foundation, the vibration generated on the first linear stator of the first drive motor can be directly transmitted to the foundation and absorbed by the foundation when the first drive motor drives the scanning slider along the scanning direction. On the other hand, the second linear stator of the second drive motor is fixed to the scanning slider, while the second mover is fixed to the stepper slider. Furthermore, the stator of the linear motor used for the force cancellation mechanism is mounted on the foundation, and its mover is connected to the scanning slider. When the stepper slider moves relative to the scanning slider by driving the second drive motor, the reaction force generated on the second linear stator acts on the scanning slider. At this time, the force cancellation mechanism applies a force to the scanning slider in the opposite direction to the movement of the stepper slider to cancel the force exerted by the stepper slider on the scanning slider. In this application, a force-canceling mechanism directly cancels the driving reaction force, thereby effectively counteracting the vibration of the scanning slider caused by driving the stepper slider. Furthermore, the force-canceling stator of the mechanism is mounted on the foundation, directly diverting the vibration caused by the mechanism to the foundation. This ensures that the force-canceling mechanism does not significantly cause vibration in the scanning slider and stepper slider, thus guaranteeing the motion accuracy and reliability of the workpiece stage. Moreover, there is no need to add an auxiliary workpiece stage to divert the driving force to the foundation. Therefore, while suppressing or eliminating vibration caused by the reaction force, the moving weight of the exposure device is not increased, effectively suppressing heat generation and improving exposure quality.

[0046] This invention provides an exposure apparatus that utilizes the workpiece stage of the aforementioned invention in an exposure machine. The exposure machine supports the workpiece stage and other components of the exposure machine with independent vibration isolation units, effectively isolating the workpiece stage from the influence of other units. This improves the scanning and stepping speeds of the exposure machine, thereby increasing its production efficiency. The other units mainly include the mask stage, projection optics, measurement unit, and other components of the exposure machine. Attached Figure Description

[0047] Figure 1 This is a schematic diagram of the structure of a workpiece stage provided in an embodiment of the present invention;

[0048] Figure 2 This is a schematic diagram of the structure of a workpiece table force cancellation mechanism using two force cancellation movers according to an embodiment of the present invention;

[0049] Figure 3 This is a schematic diagram of a workpiece stage with two force cancellation mechanisms provided in an embodiment of the present invention;

[0050] Figure 4 This is a schematic diagram of the structure of a workpiece stage provided in an embodiment of the present invention, in which two force cancellation mechanisms are provided and connected to the top surface of the scanning slide.

[0051] Figure 5 This is a schematic diagram of the structure of an exposure apparatus provided in an embodiment of the present invention.

[0052] Figure 6 This is another schematic diagram of the exposure apparatus provided in an embodiment of the present invention.

[0053] Figure 7 This is another schematic diagram of the exposure apparatus provided in an embodiment of the present invention.

[0054] Figure label:

[0055] Workpiece stage mechanism 100; scanning slider 110; first drive motor 111; first linear stator 1111; first mover 1112; stepper slider 120; second guide rail 121; second air bearing 122; second drive motor 123; second linear stator 1231; second mover 1232; platform 130; first displacement measuring element 131; first reflector 1311; first displacement measuring device 1312; force cancellation mechanism 140; force cancellation stator 141; force cancellation mover 142; first support column 150; base 160; load-bearing guide rail 161; air bearing 162; first guide rail 163; first air bearing 164; First vibration isolation component 165; Second support column 170; Foundation 200; Mask stage 300; Second displacement measuring component 310; Second reflector 311; Second displacement measuring device 312; Third linear stator 320; Third mover 330; First support column 340; Stator bracket 350; Third guide rail 360; Third air bearing 370; Mask template 380; Support frame 390; Base plate 400; Focusing and positioning measuring component 500; Mounting frame 510; Second support column 520; Measuring unit 530; Second vibration isolation component 540; Mounting frame 550; Projection optical component 600, stepping direction Y; vertical direction Z. Detailed Implementation

[0056] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of the present invention. However, the present invention can be practiced in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0057] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0058] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0059] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0060] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above" or "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0061] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementation.

[0062] Before describing the specific embodiments of this application, the working principle of the exposure apparatus will be briefly explained:

[0063] Semiconductor and display panel exposure apparatuses typically include a light source, a photomask, a stage, and projection optics. The stage includes a platform for supporting the workpiece (in semiconductor exposure machines, this is a wafer coated with photoresist, while in display panel exposure machines, it's a glass substrate coated with photoresist). Uniformly intense exposure light (e.g., ultraviolet light) emitted from the light source is adjusted by the illumination optics to be directed in the same direction. The exposure light then passes through the photomask, which serves as a prototype for the etched circuit pattern, and is transferred to the substrate or semiconductor device via the projection optics. The following explanation uses a substrate as an example. Since the exposure field of view formed by the projection optics of the exposure apparatus is generally a spliced ​​elongated strip or arc shape, during exposure, the photomask stage supporting the photomask and the stage supporting the substrate need to move synchronously and uniformly along the scanning direction. This ensures that the position on the substrate to be exposed, and the position corresponding to the photomask, are simultaneously moved to the position corresponding to the projection optics. Since photomasks are typically much smaller than the substrate—for example, in a G8.5 exposure machine, the photomask is about a quarter the size of the substrate—exposing the entire substrate requires dividing it into four exposure areas. At least four simultaneous scanning movements are needed for these four areas. Therefore, the stage supporting the substrate needs to perform at least four stepping movements along the stepping direction to align the photomask with the different exposure areas of the substrate. The scanning direction refers to the movement of both the photomask and the substrate in the same direction to achieve exposure, ensuring that the exposure light illuminates the entire photomask and the designated exposure area on the substrate. The stepping direction refers to the direction in which the stage moves the substrate relative to the photomask along a direction perpendicular to the scanning direction to expose the next exposure area.

[0064] See Figures 1 to 7 One embodiment of the present invention provides a workpiece stage and an exposure apparatus using the workpiece stage, in Figures 1 to 7 The same numerical symbol in the code represents a component with the same function.

[0065] See Figures 1 to 7An embodiment of the workpiece stage of the present invention includes a scanning slider 110, a stepping slider 120, a platform 130, a first drive motor 111, a second drive motor 123, and a force cancellation mechanism 140. The scanning slider 110 is disposed above the foundation 200 and can move relative to the foundation 200 along the scanning direction X. The stepping slider 120 is disposed on the scanning slider 110 and can move relative to the scanning slider 110 along the stepping direction Y. The platform 130 is connected to the stepping slider 120 and is used to support the workpiece. The first drive motor 111 is disposed on the foundation 200 and connected to the scanning slider 110. 11 is used to drive the scanning slider 110 to move along the scanning direction X; the second drive motor 123 is mounted on the scanning slider 110 and connected to the stepping slider 120. The second drive motor 123 is used to drive the stepping slider 120 to move along the stepping direction Y. The force cancellation mechanism 140 is mounted on the foundation 200 and connected to the scanning slider 110. When the stepping slider 120 moves relative to the scanning slider 110 along the stepping direction Y, the force cancellation mechanism 140 applies a force to the scanning slider 110 that is opposite to the direction of movement of the stepping slider 120, so as to cancel the force of the stepping slider 120 on the scanning slider 110. The scanning direction is perpendicular to the stepping direction Y.

[0066] This technical solution provides a workpiece stage and an exposure device. A stage 130 is used to support the workpiece to be exposed. A scanning slider 110 is disposed above a base 200 and can move relative to the base 200 along the scanning direction X. A stepping slider 120 is disposed on the scanning slider 110 and can move relative to the scanning slider 110 along the stepping direction Y. The stage 130 is connected to the stepping slider 120 so that when the scanning slider 110 moves relative to the base 200 along the scanning direction X, the scanning slider 110 can drive the stepping slider 120 disposed on it to move along the scanning direction, thereby driving the stage 130 and the workpiece disposed on the stage 130 to move relative to the base 200 along the scanning direction X. When the stepping slider 120 moves relative to the scanning slider 110 along the stepping direction Y, the stage 130 moves relative to the scanning slider 110 along the stepping direction Y under the drive of the stepping slider 120, thereby driving the workpiece to move relative to the scanning slider 110 along the stepping direction Y. It is understandable that if the base 200 is uniformly taken as the reference object, the workpiece moves relative to the base 200 along the scanning direction X via the scanning slider 110, driving the stepping slider 120 and the stage 130 to move relative to the base 200 along the stepping direction Y; the stepping slider 120 drives the stage 130 to move relative to the base 200 along the stepping direction Y, thereby realizing the movement of the workpiece relative to the base 200 along the scanning direction and the stepping direction Y. By placing the first drive motor 111 on the base 200, when the first drive motor 111 drives the scanning slider 110 along the scanning direction, the vibration generated by the first drive motor 111 can be directly transmitted to the base 200 and absorbed by the base 200. The second drive motor 123 is mounted on the scanning slider 110 and connected to the stepping slider 120. The second drive motor 123 is used to drive the stepping slider 120 to move along the stepping direction Y. The force cancellation mechanism 140 is mounted on the foundation 200 and connected to the scanning slider 110. When the stepping slider 120 moves relative to the scanning slider 110, the stepping slider 120 applies a force along the stepping direction Y to the scanning slider 110. At this time, the force cancellation mechanism 140 applies a force to the scanning slider 110 that is opposite to the direction of movement of the stepping slider 120, so as to cancel the force of the stepping slider 120 on the scanning slider 110. In this application, the force cancellation mechanism 140 directly cancels the driving reaction force, thereby helping to suppress the vibration of the scanning slider 110 caused by the driving force. Furthermore, by mounting the force cancellation mechanism 140 on the foundation 200, the vibration caused by the force cancellation mechanism 140 is directly transferred to the foundation 200, ensuring that the force cancellation mechanism 140 does not substantially cause vibration of the scanning slider 110 and the stepper slider 120, thus guaranteeing the motion accuracy and reliability of the workpiece stage. Moreover, there is no need to add an auxiliary workpiece stage to transfer the driving force to the foundation, thus ensuring sufficient vibration suppression without increasing the moving weight of the exposure device, effectively suppressing heat generation of the exposure device, and improving exposure quality.

[0067] It should be noted that, for ease of understanding, in this application, as... Figure 1 The scanning direction is along the direction perpendicular to the paper, that is, the front-to-back direction; the stepping direction Y is the left-to-right direction.

[0068] In this embodiment, the scanning slider 110, the stepping slider 120, and the stage 130 are all rectangular plate structures. Considering that the stepping slider 120 is connected to the scanning slider 110 and can move relative to the scanning slider 110, in order to ensure that the stepping slider 120 provides sufficient travel relative to the scanning slider 110, the size of the scanning slider 110 should be set larger than the size of the stepping slider 120; while the size difference between the stepping slider 120 and the stage 130 is not significant.

[0069] There are no restrictions on the connection method between the first drive motor 111 and the force cancellation mechanism 140 and the foundation 200. For example... Figure 1 , Figure 3 and Figure 4 As shown, in one embodiment, the workpiece stage further includes a first support column 150, which is supported on and fixedly connected to the foundation 200. A first support column 150 is respectively arranged on the sides of both ends of the scanning slider 110 along the stepping direction Y, and the first support column 150 extends along the stepping direction Y. A first drive motor 111 and a force cancellation mechanism 140 are both mounted on the first support column 150. By providing a first support column 150 on the sides of both ends of the scanning slider 110 along the stepping direction Y, and by mounting the first drive motor 111 and the force cancellation mechanism 140 on the first support column 150, it can be understood that the top surface of the first support column 150 can be flush with the bottom surface of the scanning slider 110, or it can be higher or lower than the top surface of the scanning slider 110. The specific arrangement of the vision cancellation mechanism 140, the first support column 150, and the scanning slider 110 depends on the specific arrangement of these components. For example, as... Figure 1 As shown, in some embodiments, the force cancellation mechanism 140 is connected to the side end face of the scanning slider 110 along the stepping direction Y, and to the top surface of the first support column 150. In this case, the top surface of the first support column 150 is flush with or slightly lower than the bottom surface of the scanning slider 110. Figure 4 As shown, in some other embodiments, the first support column 150 is constructed as an inverted L-shaped structure, and the force cancellation mechanism 140 is connected to the side of the long plate segment of the first support column 150 facing the scanning slider 110 and the side end face of the scanning slider 110 facing the first support column 150. In this case, in order to facilitate the arrangement of the first drive motor 111, the top surface of the first support column 150 is set to be higher than the top surface of the scanning slider 110.

[0070] The connection position between the first drive motor 111 and the first support column 150 is not limited, such as... Figure 1 and Figure 3 As shown, in some embodiments, a support step is provided on the first support column 150, the support step is located below the scanning slider 110, and the first drive motor 111 is supported and connected to the support step and connected to the bottom surface of the scanning slider 110. Figure 4 As shown, in some other embodiments, the first drive motor 111 is connected to the top surface of the scanning slider 110 and to the side of the first support column 150 facing the scanning slider 110.

[0071] Specifically, the first drive motor 111 includes a first linear stator 1111 and a first mover 1112. The first linear stator 1111 is fixedly connected to the first support column 150, and the extension direction of the first linear stator 1111 is consistent with the extension direction of the first support column 150. The first mover 1112 is connected to the scanning slider 110, and the first mover 1112 is guided and engaged with the first linear stator 1111. The first mover 1112 provides driving force for the movement of the scanning slider 110 relative to the foundation 200.

[0072] By fixing the first linear stator 1111 to the first support column 150 and setting the extension direction of the first linear stator 1111 to be consistent with the extension direction of the first support column 150; connecting the first mover 1112 to the scanning slider 110 and guiding the first mover 1112 to the first linear stator 1111, the scanning slider 110 can be moved along the extension direction of the first linear stator 1111 when the first mover 1112 moves relative to the first linear stator 1111. Specifically, when the stage 130 needs to perform scanning motion, the controller (not shown in the figure) sends a command to the first drive motor 111, causing the first drive motor 111 to drive the scanning slider 110 to move along the scanning direction. At this time, the driving force generated in the first drive motor 111 is transmitted to the scanning slider 110 through the first mover 1112, and the scanning slider 110 carries the components mounted on it to perform scanning motion. The driving reaction force is transmitted through the first linear stator 1111 to the first support column 150 and then into the foundation 200.

[0073] In one embodiment, the workpiece stage of the exposure apparatus further includes a second drive motor 123, which includes a second linear stator 1231 and a second mover 1232. The second linear stator 1231 is fixedly connected to the scanning slider 110, and the second mover 1232 is connected to the stepping slider 120. The second mover 1232 is guided and engaged with the second linear stator 1231, and the second mover 1232 is used to provide driving force for the movement of the stepping slider 120 relative to the scanning slider 110.

[0074] By fixing the second linear stator 1231 to the top surface of the scanning slider 110 and connecting the second mover 1232 to the bottom of the stepping slider 120, the movement of the second mover 1232 relative to the second linear stator 1231 drives the stepping slider 120 to move relative to the scanning slider 110. Specifically, the second linear stator 1231 extends along the stepping direction Y to ensure that the second mover 1232 carries the stepping slider 120 the required movement distance in the stepping direction.

[0075] When the stage 130 needs to perform stepping motion, the controller sends a command to the second drive motor 123, causing the second drive motor 123 to drive the stepping slider 120 to move along the stepping direction Y. At this time, the driving force generated in the second drive motor 123 is transmitted to the stepping slider 120 through the second mover 1232, and the stepping slider 120, along with the components mounted on it, performs stepping motion. The reaction force on the stepping slider 120 is transmitted to the scanning slider 110 through the second linear stator 1231, and the direction of the reaction force is opposite to the direction of movement of the stepping slider 120. It should be understood that at the same time as the controller sends a command to the second drive motor 123, it also sends a drive command of the same magnitude but opposite direction to the force cancellation mechanism 140. The force generated in the force cancellation mechanism 140 cancels out the reaction force generated in the scanning slider 110.

[0076] In one embodiment, the workpiece stage of the exposure apparatus further includes a second guide rail 121 and a second air bearing 122. The second guide rail 121 is disposed between the scanning slider 110 and the stepping slider 120, and the second guide rail 121 is fixedly connected to the scanning slider 110. The second air bearing 122 is connected to the second guide rail 121 and the stepping slider 120 to guide the movement of the stepping slider 120 relative to the scanning slider 110.

[0077] By setting a second guide rail 121 and a second air bearing 122 between the scanning slider 110 and the stepping slider 120, the movement of the stepping slider 120 relative to the scanning slider 110 is guided. By setting a second air bearing 122 between the scanning slider 110 and the stepping slider 120, the frictional resistance of the air bearing is almost zero, which has a low frictional effect and has a homogenizing effect on the surface shape error of the guide rail. Therefore, high-precision linear motion can be achieved, so that the movement of the stepping slider 120 relative to the scanning slider 110 is smooth and the displacement accuracy is high.

[0078] In one embodiment, the force cancellation mechanism 140 includes a force cancellation stator 141 and a force cancellation mover 142. The force cancellation stator 141 is fixedly connected to the first support column 150 and extends along the scanning direction. The force cancellation mover 142 is connected to the scanning slider 110 and is guided to the force cancellation stator 141. The force cancellation mover 142 can move relative to the force cancellation stator 141 and apply a force to the scanning slider 110.

[0079] Specifically, the force-canceling stator 141 is a linear stator. Since the force-canceling mechanism 140 is set as a linear motor, the force-canceling mover 142 is physically isolated from the force-canceling stator 141. Therefore, the vibration of the force-canceling stator 141 will not be transmitted to the force-canceling mover 142, thereby suppressing the influence of the reaction force in the stepping direction Y, thus ensuring the stability of the exposure equipment operation and the exposure accuracy.

[0080] It should be understood that, in order to improve the operation and reliability of the force cancellation mechanism 140, a sensor for measuring the acceleration generated by the reaction force in the Y-direction of the stepping direction can be installed on the scanning slider 110, or the magnitude of the reaction force in the Y-direction of the stepping direction can be calculated using other motion parameters to determine and control the driving force required for the force cancellation mechanism 140. Specifically, an acceleration sensor is installed at an appropriate location on the scanning slider 110 to obtain the acceleration generated by the reaction force. By quantitatively determining the acceleration generated by the reaction force using the acceleration sensor, the force cancellation mechanism 140 can be effectively controlled by the controller to cancel the reaction force generated on the scanning slider 110, thereby improving the reliability of force cancellation.

[0081] like Figure 2 As shown, in one embodiment, there are two force-canceling movers 142, which are spaced apart on the force-canceling stator 141. The sum of the torque of the driving force applied by the two force-canceling movers 142 to the scanning slider 110 about the center of gravity of the scanning slider 110 and the torque of the reaction force applied by the stepping slider 120 to the scanning slider 110 about the center of gravity of the scanning slider 110 is zero.

[0082] It is worth noting that because the force-canceling mover 142 of the force-canceling mechanism 140 in the stepping direction Y is fixed on the scanning slider 110, the force-canceling mover 142 moves along with the scanning slider 110 when the stage 130 performs scanning motion. The force-canceling stator 141 extends along the scanning direction, its length covering the stroke in the scanning direction; that is, the force-canceling stator 141 is a long strip stator. If the force-canceling mechanism 140 for the reaction force in the stepping direction Y uses only one force-canceling mover 142, the force generated by the force-canceling mechanism 140 for the reaction force in the stepping direction Y must always be kept within the center of mass of the scanning slider 110 in the scanning direction. If it is difficult to achieve this, the force-canceling mechanism 140 for the reaction force in the stepping direction Y can be controlled by two force-canceling movers 142, that is, two spaced-apart force-canceling movers 142 are set on one force-canceling stator 141. This approach requires that the resultant force of the driving forces of the two force-cancelling movers 142 be properly distributed to be equal to the driving reaction force on the scanning slider 110. Furthermore, the sum of the torque of the reaction force around the center of mass of the scanning slider 110 and the torque of the driving forces of the two force-cancelling movers 142 around the center of mass of the scanning slider 110 must be zero. By setting two force-cancelling movers 142 on a single force-cancelling stator 141, the force-cancelling effect is more easily controlled compared to setting a single force-cancelling mover 142.

[0083] like Figure 1 As shown, in this embodiment, a force cancellation mechanism 140 is provided on one side of the scanning slider 110 along the stepping direction Y; as Figure 3 and Figure 4 As shown, in another embodiment, force cancellation mechanisms 140 can also be arranged at both ends of the scanning slider 110 along the stepping direction Y. It should be noted that with this symmetrical arrangement of the force cancellation mechanisms 140, when canceling the reaction force, the force cancellation mechanisms 140 on both sides need to work together to control the reaction force.

[0084] like Figure 1 , Figure 3 and Figure 4 As shown, in one embodiment, the workpiece stage further includes a base 160, which is disposed on the foundation 200. The base 160 is located between two first support columns 150 and is spaced apart from and independent of the first support columns 150. The scanning slider 110 is slidably connected to the base 160. Further, the exposure apparatus also includes first vibration isolation components 165, a plurality of which are spaced apart between the base 160 and the foundation 200. The first vibration isolation components 165 are capable of absorbing impact forces on the base 160.

[0085] By setting a base 160 between the two first support columns 150 and spaced apart from them, the base 160 and the first support columns 150 are made independent of each other and do not affect each other. By sliding the scanning slider 110 to the base 160, the base 160 supports the scanning slider 110 while allowing the scanning slider 110 to move relative to the foundation 200 along the scanning direction. Furthermore, by setting multiple spaced first vibration isolation components 165 between the foundation 200 and the base 160, vibrations from the foundation 200 are absorbed, resulting in smoother movement of the scanning slider 110 and improved exposure accuracy. Understandably, since the scanning slider 110, the stepping slider 120 and the stage 130 are arranged on the base 160, and the base 160 is separated from the foundation 200 by the first vibration isolation component 165, the reaction force generated during the scanning motion enters the foundation 200, but hardly is transmitted to the stage 130. This makes the scanning slider 110 move more smoothly, thereby improving the exposure accuracy.

[0086] Specifically, the first vibration isolation component 165 is an active vibration isolation device, consisting of an air spring made of corrugated airbags, a servo control valve, a sensor for monitoring the vibration of the foundation 200, and a controller. The upper end of the first vibration isolation component 165 is connected to the base 160, and the other end is connected to the foundation 200. The air spring absorbs the vibration on the base 160 and keeps the base 160 horizontal, thus keeping the platform mounted on it horizontal as well.

[0087] Furthermore, such as Figure 1 , Figure 3 and Figure 4 As shown, the scanning slider 110 is movable relative to the base 160. A load-bearing guide rail 161 and an air bearing 162 are provided between the base 160 and the scanning slider 110. The load-bearing guide rail 161 is mounted on the base 160, and the air bearing 162 is mounted on the scanning slider 110. The air bearing 162 and the load-bearing guide rail 161 are in a guiding engagement. There are two load-bearing guide rails 161, spaced apart along the stepping direction Y. Each air bearing 162 corresponds to one load-bearing guide rail 161. A first guide rail 163 and a first air bearing 164 are provided between the two load-bearing guide rails 161. The first guide rail 163 is fixedly connected to the base 160, and the first air bearing 164 is mounted on the scanning slider 110. The first air bearing 164 and the first guide rail 163 are in a guiding engagement. It should be understood that, in this embodiment, both the load-bearing guide rail 161 and the first guide rail 163 extend along the scanning direction to guide the scanning slider 110 as it moves relative to the base 160 along the scanning direction.

[0088] like Figures 5 to 7As shown, one embodiment of the present invention also provides an exposure apparatus. The exposure apparatus utilizes the workpiece stage described above. The exposure apparatus includes a second support column 170, a second vibration isolation component 540, a projection optical component 600, and a third drive motor. The second support column 170 is disposed outside the first support column 150. The second support column 170 and the first support column 150 are spaced apart and independent of each other, or the second support column 170 and the first support column 150 are fixedly connected without any gap between them. The second vibration isolation component 540 is disposed on the second support column 170. A mask stage 300 and... The measuring unit is fixed to the mounting frame 550 on the second vibration isolation assembly 540 by structural components; the projection optical assembly 600 is arranged above the workpiece stage; the mask stage 300 is arranged above the projection optical assembly 600; the measuring unit is arranged above the mask stage 300; the third drive motor is used to drive the mask stage 300 to perform scanning motion and non-scanning motion perpendicular to the scanning direction; the third linear stator 320 of the third drive motor is fixedly connected to the second support column 170; the third mover 330 of the third drive motor is fixedly connected to both sides of the mask stage 300.

[0089] It should be understood that, in this embodiment, for the technical solution where the second support column 170 and the first support column 150 are fixedly connected without any gap, in some embodiments, such as... Figure 6 As shown, the first support column 150 and the second support column 170 are two components, which are fixedly connected together by a fastener; in another embodiment, as... Figure 7 As shown, the first support column 150 and the second support column 170 can be set in the same component.

[0090] In one embodiment, the exposure apparatus further includes a second support column 170 and a mask stage 300. A second support column 170 is respectively provided on the side of the two first support columns 150 away from the scanning slider 110. The second support column 170 is spaced apart from the first support column 150 and is independent of each other.

[0091] The mask stage 300 is connected to two second support columns 170 at both ends, and the mask stage 300 can move relative to the second support columns 170 along the scanning direction; wherein, the mask stage 300 is located above the stage 130.

[0092] By spacing the second support pillar 170 and the first support pillar 150, the first support pillar 150 and the second support pillar 170 are independent of each other and do not affect each other. By connecting both ends of the mask stage 300 to the two second support pillars 170 respectively, the mask stage 300 is supported by the second support pillars 170. By configuring the mask stage 300 to move relative to the second support pillars 170 along the scanning direction, the mask stage 300 and the stage 130 can move synchronously along the scanning direction, thereby exposing corresponding portions of the substrate 400 on the stage 130.

[0093] like Figure 5 As shown, the exposure apparatus provided in this embodiment of the invention also includes a light source (not shown in the figure) and a focusing and positioning measurement component 500. Viewed vertically in the Z direction, the focusing and positioning measurement component 500 is positioned above the mask stage 300, and the light source is positioned above the focusing and positioning measurement component 500. The mask stage 300 carries the mask template 380 and mainly performs scanning motion. A projection optical component 600 is arranged below the mask stage 300. The stage 130 carries the substrate 400 coated with photoresist and performs scanning and stepping motions. The exposure process of the substrate 400 is achieved through the above components. To ensure the movement accuracy of the mask stage 300 and the stage 130, a second displacement measuring element 310 is provided on the mask stage 300 to measure the displacement of the mask stage 300 along the scanning direction; a first displacement measuring element 131 is provided on the stage 130 to measure the displacement of the stage 130 along the scanning direction and the stepping direction Y.

[0094] Furthermore, a first support column 340 is provided at the top of each second support column 170, a stator support 350 is provided on the first support column 340, a third linear stator 320 is connected to the stator support 350, a third mover 330 is connected to the mask stage 300, the third mover 330 and the third linear stator 320 are linked together, and the third mover 330 provides driving force for the mask stage 300 to move along the scanning direction.

[0095] like Figure 5As shown, a mounting frame 550 is also provided on the second support column 170. A focusing and positioning measurement assembly 500 is fixed on the mounting frame 550. The focusing and positioning measurement assembly 500 includes a measurement unit 530, a mounting frame 510, and a second support column 520. The second support column 520 is disposed on the mounting frame 550, and the mounting frame 510 is fixedly connected to the second support column 520. It is understood that in this embodiment, the number of mounting frames 550 and the number of second support columns 520 correspond to the number of second support columns 170. The measurement unit 530 is disposed on the mounting frame 510 and consists of one or more microscopes with variable magnification. A second vibration isolation assembly 540 is disposed between the mounting frame 550 and the second support column 170. A projection optical assembly 600 is disposed slightly midway between the two mounting frames 550. The projection optical assembly 600 is connected to both mounting frames 550 and is disposed between the mask stage 300 and the stage 130.

[0096] Furthermore, such as Figure 5 As shown, a support frame 390 is also provided on the mounting frame 550, a third guide rail 360 is provided on the support frame 390, and a third air bearing 370 is provided below the mask stage 300. The third air bearing 370 and the third guide rail 360 are guided and cooperated.

[0097] Through the above structure, the projection optical component 600, the mask stage 300, and the focusing and positioning measurement component 500 each have their own vibration isolation devices with the base 160. This arrangement not only makes them independent in terms of support, but also isolates them from each other in terms of vibration and prevents them from being affected by each other.

[0098] The second displacement measuring component 310 for measuring the moving displacement of the mask stage 300 includes a second reflector 311 and a second displacement measuring device 312. The second reflector 311 is mounted on the mask stage 300, and the second displacement measuring device 312 is fixed on the second support 520 of the focusing and positioning measuring assembly 500.

[0099] The first displacement measuring component 131 for measuring the moving displacement of the stage 130 also includes a first reflector 1311 and a first displacement measuring device 1312. The first reflector 1311 is disposed on the stage 130, and the first displacement measuring device 1312 is fixed on the mounting frame 550 of the projection optical assembly 600.

[0100] For ease of description, the components used to move the substrate 400 along the scanning direction X and the stepping direction Y are collectively referred to as the workpiece stage mechanism 100 described above. The workpiece stage mechanism 100 includes a base 160, a scanning slider 110, a stepping slider 120, a stage 130, and drive motors, guide components, force-reducing mechanisms 140, etc., that enable these components to move relative to each other.

[0101] In this application, the second vibration isolation device for the projection optical assembly 600, the mask stage 300, and the focusing and positioning measurement assembly 500 is disposed between the mounting frame 550 and the second support column 170, while the first vibration isolation device for the stage 130 is disposed between the base 160 and the foundation 200. These two devices are mutually isolated and independent in terms of vibration. With this arrangement, when the large-mass workpiece stage mechanism 100 and the relatively small-mass mask stage 300 undergo high-acceleration motion, the resulting driving reaction forces will not be transmitted to each other's mechanical structures. It is known that the reaction force generated by the movement of the workpiece stage mechanism 100 is generally several times greater than that generated by the movement of the mask stage 300, especially during high-acceleration motion, which has a significant impact on the vibration of the entire exposure apparatus and is one of the main obstacles to improving the cycle time of the exposure apparatus. By supporting the workpiece stage mechanism 100 with an independent vibration isolation device, the influence of the workpiece stage mechanism 100 on the projection optical assembly 600, the mask stage 300, and the measuring components is basically suppressed, providing a strong prerequisite for ensuring exposure accuracy.

[0102] When the mask stage 300 accelerates, the driving reaction force of the third drive motor is transmitted through the third linear stator 320, stator support 350, and first support column 340 to the second support column 170 extending from the foundation 200. Since the third mover 330 of the third drive motor is not structurally connected to the third linear stator 320, the reaction force is directly transmitted to the foundation 200 through the second support column 170, and is not transmitted to the surrounding structural components of the mask stage 300, thus suppressing the influence of the reaction force of the mask stage 300 on the surrounding area.

[0103] The exposure apparatus provided by this invention sets up the mask stage 300, projection optical component 600, measurement unit 530, and workpiece stage mechanism 100 as independent support structures and vibration isolation devices. Without increasing the weight and size of the exposure apparatus, high-acceleration movement of the mask stage 300 and workpiece stage can be achieved while ensuring exposure accuracy, thereby significantly improving the exposure machine cycle time. Specifically, due to the above-mentioned configuration, without increasing the weight and size of the exposure apparatus, and with a fixed power of the driving device, the heat generated during driving is not increased, thus effectively suppressing the impact of heat generation on exposure accuracy. Furthermore, without increasing the weight and size of the exposure apparatus, it does not occupy a large installation area and does not increase the operating costs of the device. In addition, by setting independent support structures and vibration isolation devices for the mask stage 300 and the workpiece stage mechanism 100, the accelerated movement of the mask stage 300 and the accelerated movement of the workpiece stage mechanism 100 do not affect each other. This allows the use of a higher power drive motor, thereby achieving high acceleration movement of the mask stage 300 and the workpiece stage mechanism 100, which greatly improves the cycle time and thus greatly reduces the panel production cost.

[0104] Figure 6 This represents another embodiment of the exposure apparatus, with Figure 5 The difference in the embodiment is that the first support column 150 and the second support column 170 are fixedly connected together.

[0105] in addition, Figure 7 This represents another embodiment of the exposure apparatus, with Figure 5 and Figure 6 The difference in the embodiment is that the first support column 150 and the second support column 170 are not designed as two separate parts, but as a single integral part.

[0106] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0107] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A workpiece stage, characterized in that, The workpiece stage includes: A scanning slider is disposed above the foundation, and the scanning slider can move relative to the foundation along the scanning direction; A stepping slider is disposed on the scanning slider, and the stepping slider can move relative to the scanning slider in a stepping direction perpendicular to the scanning direction; A platform, connected to the stepper slider, is used to support the workpiece; A first drive motor is mounted on the foundation and connected to the scanning slider. The first drive motor is used to drive the scanning slider to move along the scanning direction. A first support column is supported on the foundation and fixedly connected to the foundation. A first support column is respectively provided on the side of each end of the scanning slider along the stepping direction. The first support column extends along the scanning direction. The first drive motor is provided on the first support column. A force-canceling mechanism includes a force-canceling stator and a force-canceling mover; the force-canceling stator is fixedly connected to the first support column and extends along the scanning direction; the force-canceling mover is connected to the scanning slider and is guidedly engaged with the force-canceling stator, and the force-canceling mover can move relative to the force-canceling stator and apply a force to the scanning slider; When the stepping slider moves relative to the scanning slider along the stepping direction, the force cancellation mechanism applies a force to the scanning slider that is opposite to the direction of movement of the stepping slider, so as to cancel the force exerted by the stepping slider on the scanning slider.

2. The workpiece stage according to claim 1, characterized in that, The number of force-canceling movers is two, and the two force-canceling movers are spaced apart on the force-canceling stator. The sum of the torque of the driving force applied to the scanning slider by the two force-canceling movers about the center of gravity of the scanning slider and the torque of the reaction force applied to the scanning slider by the stepper slider about the center of gravity of the scanning slider is zero.

3. The workpiece stage according to claim 1, characterized in that, The first drive motor includes: A first linear stator is fixedly connected to the first support column, and the extension direction of the first linear stator is consistent with the extension direction of the first support column. A first mover is connected to the scanning slider and is guided and engaged with the first linear stator. The first mover provides driving force for the movement of the scanning slider relative to the foundation.

4. The workpiece stage according to claim 1, characterized in that, The workpiece stage also includes: A base is provided on the foundation, the base is located between the two first support columns, and is spaced apart from and independent of the first support columns, and the scanning slider is slidably connected to the base.

5. The workpiece stage according to claim 4, characterized in that, The workpiece stage also includes: A first vibration isolation component, wherein a plurality of first vibration isolation components are spaced apart between the base and the foundation, and the first vibration isolation components are capable of absorbing vibrations from the foundation.

6. The workpiece stage according to any one of claims 1-5, characterized in that, The workpiece stage also includes: The second drive motor includes a second linear stator and a second mover. The second linear stator is fixedly connected to the scanning slider, and the second mover is connected to the stepping slider. The second mover is guided and cooperates with the second linear stator. The second mover is used to provide driving force for the movement of the stepping slider relative to the scanning slider.

7. The workpiece stage according to claim 4 or 5, characterized in that, The workpiece stage also includes: The first guide rail is fixed on the base; A first air bearing is fixed below the scanning slider and coupled to the first guide rail, and moves the scanning slider relative to the first guide rail; A second guide rail is disposed between the scanning slider and the stepping slider, and the second guide rail is fixedly connected to the scanning slider. The second air bearing is fixed to the stepper slider and coupled to the second guide rail, causing the stepper slider to move relative to the second guide rail.

8. An exposure apparatus, characterized in that, The exposure apparatus utilizes a workpiece stage as described in any one of claims 1-7, and the exposure apparatus comprises: The second support column is disposed outside the first support column. The second support column is spaced apart from the first support column and is independent of each other, or the second support column is not spaced apart from the first support column and is fixedly connected together. The second vibration isolation component is mounted on the second support column; the projection optical component, the mask stage and the measurement unit are fixed to the mounting frame on the second vibration isolation component by structural components. The projection optics assembly is arranged above the workpiece stage; The mask stage is arranged above the projection optical components; The measuring unit is arranged above the mask stage; The third drive motor is used to drive the mask stage to move in the scanning direction and in the non-scanning direction perpendicular to the scanning direction; The third linear stator of the third drive motor is fixedly connected to the second support column; The third actuator of the third drive motor is fixedly connected to both sides of the mask stage.

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