Non-uniform wave position Rotman lens design method, system, equipment and medium

Abstract

The invention provides a non-uniform beam position Rotman lens design method, system and device and a medium, and relates to the field of lens multi-beam, and the method comprises the steps: obtaining an airspace coverage parameter and target requirement information related to a beam overlapping level; determining a required non-uniformly distributed wave position by using a wave position optimization algorithm; wherein the non-uniformly distributed beam position corresponds to a beam port of the Rotman lens; determining an original structure layout of the lens through a geometrical optical method; performing full-wave simulation on the original structure layout through an electromagnetic simulation technology to obtain a simulation result; and the original structure layout is optimized and adjusted to obtain a target lens structure meeting design requirements. According to the invention, consistent adjacent wave beam overlapping levels can be realized, and the problems of inconsistent adjacent wave beam overlapping levels and redundant wave beam number caused by a uniform wave position Rotman lens are solved; and the same airspace coverage is realized by using a smaller number of wave positions, so that the number of analog and digital receiving channels at the rear end of the lens is reduced and the cost is reduced.

Description

Technical Field

[0001] The present application relates to the field of lens multi-beam technology, and in particular to a method, system, device and medium for designing a non-uniform wave position Rotman lens. Background Art

[0002] As the requirements for multi-target application environments in fields such as tracking radar, satellite communications, and electronic countermeasures continue to increase, lens multi-beam technology based on quasi-optical principles has emerged. Lens multi-beam technology uses microwave lenses as the feeding network and utilizes the inherent characteristics of the lens. When microwave signals with different phase differences are radiated into the air through the antenna radiating element, wavefronts with different directions will be formed, that is, different beam directions will be generated, and multiple beams can be formed at the same time.

[0003] In related technologies, in order to achieve simultaneous reception and detection of broadband signals in multiple directions, a broadband multi-beam antenna system must be used; broadband multi-beam forming methods include analog beamforming, digital beamforming and optical beamforming. Rotman lens is one of the implementation methods of analog beamforming, which can achieve broadband signal synthesis under wide-angle scanning conditions and has the advantages of wide bandwidth spatial domain coverage, high direction finding accuracy and low cost.

[0004] In the traditional Rotman lens design process, the distribution of beam positions is usually uniform, that is, the angle difference between adjacent beam positions is fixed. However, since the beam width increases with the scanning angle, it will inevitably cause inconsistency in the overlapping level of adjacent beams and redundancy in the number of beams, which will affect the system reception performance and increase costs. Summary of the invention

[0005] In view of the deficiencies in the prior art, the present application provides a method, system, device and medium for designing a non-uniform wave position Rotman lens, which solves the problems of inconsistent overlapping levels of adjacent beams and redundant number of beams caused by uniform wave position Rotman lenses.

[0006] To achieve the above object, the present invention adopts the following technical solutions:

[0007] To achieve the above objectives, this application is implemented through the following technical solutions:

[0008] In a first aspect, an embodiment of the present application provides a method for designing a non-uniform waveposition Rotman lens, which includes: obtaining target requirement information related to spatial coverage parameters and beam overlap levels; determining the required non-uniformly distributed waveposition using a waveposition optimization algorithm based on the target requirement information; wherein the non-uniformly distributed waveposition corresponds to the beam port of the Rotman lens; determining the original structural layout of the lens by a geometric optics method based on preset Rotman lens parameters and the non-uniformly distributed waveposition; performing full-wave simulation on the original structural layout by electromagnetic simulation technology to obtain simulation results; and optimizing and adjusting the original structural layout based on the simulation results to obtain a target lens structure that meets the design requirements.

[0009] According to a first aspect of an embodiment of the present application, the aforementioned target requirement information includes spatial coverage, adjacent beam overlap level requirements, and alternate beam overlap level requirements.

[0010] According to a first aspect of an embodiment of the present application, the aforementioned Rotman lens parameters include focal angle, focal ratio and sine ratio.

[0011] According to a first aspect of the embodiment of the present application, the non-uniformly distributed wave position is independent of the type of transmission line for implementing the Rotman lens, and the non-uniformly distributed wave position is one of a microstrip type, a stripline type, and a waveguide type.

[0012] According to a first aspect of an embodiment of the present application, a target lens structure includes a lens, a plurality of array ports, a plurality of beam ports, and a plurality of groups of matching ports; wherein the plurality of array ports are constructed so as to be connected to the peripheral side of the lens; the plurality of beam ports are connected to the peripheral side of the lens and are arranged opposite to the plurality of array ports; and the plurality of groups of matching ports are sandwiched between the array ports and the beam ports.

[0013] According to a first aspect of an embodiment of the present application, each group of matching ports is composed of multiple matching resistors, each matching resistor has a first end adjacent to the lens and a second end away from the lens, and the width of the matching resistor decreases from the first end to the second end along its own extension direction.

[0014] According to a first aspect of an embodiment of the present application, multiple groups of matching ports are arranged in two pairs, the first pair of matching ports are adjacent to the array ports, and the corresponding matching resistors are constructed in a zigzag shape; the second pair of matching ports are adjacent to the beam ports, and the corresponding matching resistors are constructed in a straight line shape.

[0015] In the second aspect, an embodiment of the present application provides a non-uniform waveposition Rotman lens design system, which includes: an acquisition module, a first determination module, a second determination module, a simulation module and an optimization and adjustment module; wherein the acquisition module is used to obtain target requirement information related to spatial coverage parameters and beam overlap levels; the first determination module is used to determine the required non-uniformly distributed waveposition according to the target requirement information using a waveposition optimization algorithm; wherein the non-uniformly distributed waveposition corresponds to the beam port of the Rotman lens; the second determination module is used to determine the original structural layout of the lens by a geometric optics method based on preset Rotman lens parameters and non-uniformly distributed waveposition; the simulation module is used to perform full-wave simulation of the original structural layout by electromagnetic simulation technology to obtain simulation results; the optimization and adjustment module is used to optimize and adjust the original structural layout according to the simulation results to obtain a target lens structure that meets the design requirements.

[0016] In a third aspect, an embodiment of the present application provides an electronic device, comprising: a processor, a memory, and a program stored in the memory and executable on the processor, wherein when the program is executed by the processor, the non-uniform waveposition Rotman lens design method in the first aspect is implemented.

[0017] In a fourth aspect, an embodiment of the present application provides a computer-readable storage medium storing a program or instruction, which, when executed by a processor, implements the non-uniform waveposition Rotman lens design method in the aforementioned first aspect.

[0018] The present application provides a method, system, device and medium for designing a non-uniform wave position Rotman lens. Compared with the prior art, the present application has the following beneficial effects:

[0019] In order to solve the problems of inconsistent overlapping levels of adjacent beams and redundant number of beams caused by the current uniform wave position Rotman lens, the present application determines the required non-uniformly distributed wave position by using a wave position optimization algorithm based on the required spatial coverage parameters and beam overlap level; then, according to the non-uniformly distributed wave position and some preset Rotman lens parameters, determines the original structural layout of the designed Rotman lens, and then performs full-wave simulation on the original structural layout, so as to optimize the original structural layout according to the simulation results until the target lens structure is obtained; it is possible to achieve a consistent adjacent beam overlap level, achieve the same spatial coverage with a smaller number of wave positions, and thus reduce the number of analog and digital receiving channels at the back end of the lens to reduce costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0021] Figure 1 It is a flow chart of a non-uniform wave position Rotman lens design method provided in an embodiment of the present application;

[0022] Figure 2 is a schematic diagram of the layout of the target lens structure provided in an embodiment of the present application;

[0023] Figure 3 It is a schematic diagram of overlapping level distribution obtained by using the traditional uniform wave position design method;

[0024] Figure 4 is a schematic diagram of overlapping level distribution obtained by using the non-uniform wave position Rotman lens design method provided in an embodiment of the present application;

[0025] Figure 5 is a normalized beam pattern provided in an embodiment of the present application;

[0026] Figure 6 It is a schematic diagram comparing the beam overlap level of full-wave simulation and calculation provided in an embodiment of the present application;

[0027] Figure 7 It is a structural schematic diagram of a non-uniform wave position Rotman lens design system provided in an embodiment of the present application;

[0028] Figure 8 It is a structural schematic diagram of an electronic device provided in an embodiment of the present application.

[0029] Description of the drawings: array port 1; beam port 2; matching port 3; lens 4. DETAILED DESCRIPTION

[0030] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention are clearly and completely described. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0031] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0032] The embodiments of the present application provide a non-uniform waveposition Rotman lens design method, system, device and medium to solve the problems of inconsistent adjacent beam overlap levels and redundant beam numbers caused by uniform waveposition Rotman lenses, thereby achieving consistent adjacent beam overlap levels and a smaller number of wavepositions to achieve the same spatial coverage.

[0033] The technical solution in the embodiment of the present application is to solve the above technical problems, and the overall idea is as follows:

[0034] The lens multi-beam technology uses microwave lenses as the feeding network and takes advantage of the inherent characteristics of the lens: when microwave signals are input to different focal arc input ports of the lens, microwave signals with approximately equal amplitude and linear phase difference will be excited simultaneously at different focal arc output ports of the lens. These phase differences have nothing to do with the signal frequency. When microwave signals with different phase differences are radiated into the air through the antenna radiation element, wavefronts with different directions will be formed, that is, different beam directions will be generated, and multiple beams can be formed at the same time.

[0035] After the 1950s, as the requirements for multi-target application environments in fields such as tracking radar, satellite communications, and electronic countermeasures continued to increase, lens multi-beam technology based on quasi-optical principles emerged, of which the most famous is the Rotman lens. The Rotman lens is derived from the Lutz lens and the R-2R lens. The Lutz lens evolved from the traditional metal flat optical lens and has multiple input and output ports, but there is a certain phase error between the ports of the lens, which limits its use.

[0036] In the fields of radar, communication, electronic countermeasures, etc., in order to achieve simultaneous reception and detection of broadband signals in multiple directions, a broadband multi-beam antenna system must be used. Broadband multi-beam forming methods include analog beamforming, digital beamforming, and optical beamforming. Rotman lens is one of the implementation methods of analog beamforming. It can realize broadband signal synthesis under wide-angle scanning conditions and has the advantages of wide bandwidth spatial domain coverage, high direction finding accuracy, and low cost.

[0037] In the traditional Rotman lens design process, the distribution of beam positions is usually uniform, that is, the angle difference between adjacent beam positions is fixed. However, since the beam width increases with the scanning angle, it will inevitably cause inconsistency in the overlapping level of adjacent beams and redundancy in the number of beams, which will affect the system reception performance and increase costs.

[0038] In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0039] The following first introduces a non-uniform wave position Rotman lens design method provided in an embodiment of the present application.

[0040] The present application provides a flowchart of a method for designing a non-uniform wave position Rotman lens. Figure 1 As shown, the non-uniform wave position Rotman lens design method may include the following steps S110-S150.

[0041] S110. Obtain target requirement information related to spatial coverage parameters and beam overlap levels.

[0042] S120. Determine the required non-uniformly distributed wave position using a wave position optimization algorithm according to target requirement information; wherein the non-uniformly distributed wave position corresponds to the beam port of the Rotman lens.

[0043] S130. Based on the preset Rotman lens parameters and the non-uniformly distributed wave position, the original structural layout of the lens is determined by a geometric optics method.

[0044] S140. Perform full-wave simulation on the original structural layout through electromagnetic simulation technology to obtain simulation results.

[0045] S150. According to the simulation results, the original structure layout is optimized and adjusted to obtain a target lens structure that meets the design requirements.

[0046] The above is a specific implementation method of a non-uniform waveposition Rotman lens design method provided in an embodiment of the present application. It can be understood that in order to solve the problems of inconsistent adjacent beam overlap levels and redundant beam numbers caused by the current uniform waveposition Rotman lens, the present application uses a waveposition optimization algorithm to determine the required non-uniformly distributed waveposition based on the required spatial coverage parameters and beam overlap levels; then, based on the non-uniformly distributed waveposition and some preset Rotman lens parameters, the original structural layout of the designed Rotman lens is determined, and then a full-wave simulation is performed on the original structural layout to optimize the original structural layout according to the simulation results until the target lens structure is obtained.

[0047] Based on this, the present application can achieve a consistent adjacent beam overlap level, thereby obtaining consistent system reception performance; the present application uses a smaller number of wave positions to achieve the same spatial coverage, thereby reducing the number of analog and digital receiving channels at the back end of the lens and reducing costs.

[0048] In one example, the wave position optimization algorithm may select a genetic algorithm or other optimization algorithms to obtain an optimal non-uniform wave position distribution, where the optimal non-uniform wave position distribution includes specific wave position values ​​and wave position quantities.

[0049] In another example, the present application establishes a target equation with the overlap level difference as a function according to the spatial coverage parameter requirements and the beam overlap level requirements; wherein the overlap level difference is the difference between the array overlap level and the target overlap level. The target overlap level can select the adjacent beam overlap level value, the alternate beam overlap level value, or the sum of the two to participate in the optimization calculation, and the array overlap level is calculated as the array pattern function.

[0050] Exemplarily, the overlapping level value of adjacent beams may generally be a 3 dB overlapping value, and the overlapping level value of alternate beams may generally be a 13 dB overlapping value.

[0051] In some other optional embodiments, if there is a specified uniform wave position distribution, the step of optimizing the wave position distribution may be skipped. In other words, before determining the original structural layout of the lens by the geometric optics method based on the preset Rotman lens parameters and the non-uniformly distributed wave position, that is, before the aforementioned S130, the non-uniform wave position Rotman lens design method may further include:

[0052] S210. The non-uniformly distributed wave position may also be set based on a specified scanning angle value.

[0053] In the embodiments of the present application, it can be understood that the present application determines the original structural layout of the lens through the geometric optics method based on the aforementioned non-uniformly distributed waveposition, and the non-uniformly distributed waveposition can be calculated through an optimization algorithm based on the spatial coverage parameters and the beam overlap level; the non-uniformly distributed waveposition can also be directly set based on the specified scanning angle value.

[0054] In some embodiments, the target requirement information includes spatial coverage, overlapping level requirements of adjacent beams, and overlapping level requirements of alternate beams; the Rotman lens parameters include focal angle, focal ratio, and sine ratio. The target requirement information and Rotman lens parameters can be set according to the actual required structural layout.

[0055] Exemplarily, the spatial coverage range can be set to ±45 degrees as needed; the overlapping level of adjacent beams is required to be less than 3dB, and the overlapping level of alternate beams is required to be less than 13dB; the focal angle in the Rotman lens parameters can be 22°, the focal ratio can be 1.06, and the sine ratio can be 1.7.

[0056] In some embodiments, the non-uniformly distributed wave position is independent of the type of transmission line implementing the Rotman lens, and the non-uniformly distributed wave position is one of a microstrip type, a stripline type, and a waveguide type.

[0057] In some embodiments, please refer to Figure 2 , Figure 2 A schematic layout diagram of a target lens structure provided in an embodiment of the present application is shown, wherein the target lens structure comprises a lens 4, a plurality of array ports 1, a plurality of beam ports 2, and a plurality of groups of matching ports 3; wherein the lens 4 is a symmetrical arc-shaped structure; the plurality of array ports 1 are constructed so as to be connected to the peripheral side of the lens 4; the plurality of beam ports 2 are connected to the peripheral side of the lens 4 and are arranged opposite to the plurality of array ports 1; and the plurality of groups of matching ports 3 are sandwiched between the array ports 1 and the beam ports 2.

[0058] It can be understood that the structural layout of the target lens structure is determined by the aforementioned non-uniform wave position Rotman lens design method. According to the wave position distribution and related lens design parameters, the relevant lens design parameters include: focal angle 22°, focal ratio 1.06, and sine ratio 1.7, etc., and the original structural layout of the lens is obtained by using the geometric optics method. Finally, the original lens structure is full-wave simulated using electromagnetic simulation software, and the lens structural layout is adjusted according to the simulation results to obtain the final lens structural layout.

[0059] In some embodiments, each group of matching ports 3 is composed of multiple matching resistors, each matching resistor has a first end adjacent to the lens 4 and a second end away from the lens 4, and the width of the matching resistor decreases from the first end to the second end along its own extension direction.

[0060] In an example, see Figure 2 Each group of matching ports 3 can be configured with 5 matching resistors arranged at intervals. The multiple groups of matching ports 3 are arranged in two pairs, the first pair of matching ports 3 is adjacent to the array port 1, and the corresponding matching resistors are constructed in a zigzag shape; the second pair of matching ports 3 is adjacent to the beam port 2, and the corresponding matching resistors are constructed in a straight line shape.

[0061] In order to make the purpose, technical solutions and advantages of the present application clearer, the present application is further described in detail below using a 1×32 line array in combination with specific implementation methods and drawings.

[0062] Determine the airspace coverage range of ±45 degrees, the overlap level of adjacent beams is required to be less than 3dB, and the overlap level of alternate beams is required to be less than 13dB. Please refer to Figure 3 , Figure 3 The figure shows the overlap level distribution diagram obtained by using the traditional uniform beam position design method. Using the traditional uniform beam position design method, at least 28 beams are required to achieve the required spatial coverage and overlap level. Figure 4 , Figure 4 A schematic diagram of the overlapping level distribution obtained by using the non-uniform waveposition Rotman lens design method provided in an embodiment of the present application is shown; the aforementioned waveposition optimization algorithm adopts a genetic optimization algorithm, and the non-uniform waveposition distribution can be obtained as follows: -43.9°, -39.5°, -5.3°, -1.4°, -7.6°, -4°, -0.4°, -7°, -13.5°, -10.1°, -6.7°, -3.4°, 0°, 3.4°, 6.7°, 10.1°, 13.5°, 17°, 20.4°, 24°, 27.6°, 31.4°, 35.3°, 39.5°, 43.9°, a total of 25 beams in the non-uniform waveposition distribution, and the overlapping level is relatively uniform.

[0063] The normalized beam pattern obtained by full-wave simulation is as follows Figure 5 As shown in the figure, it can be seen that the overlapping positions of adjacent and alternating beams are relatively consistent. The comparison of the full-wave simulation and calculated beam overlap levels is shown in the figure. Figure 6 As shown, the two are basically consistent.

[0064] In some embodiments, the present application provides a non-uniform wave position Rotman lens design system 300, such as Figure 7 As shown, the non-uniform wave position Rotman lens design system 300 may include the following modules:

[0065] An acquisition module 310 is used to acquire target requirement information related to spatial coverage parameters and beam overlap levels;

[0066] A first determination module 320 is used to determine the required non-uniformly distributed wave position using a wave position optimization algorithm according to target requirement information; wherein the non-uniformly distributed wave position corresponds to a beam port of a Rotman lens;

[0067] A second determination module 330 is used to determine the original structural layout of the lens by a geometric optics method based on preset Rotman lens parameters and non-uniformly distributed wave positions;

[0068] The simulation module 340 is used to perform full-wave simulation on the original structure layout by electromagnetic simulation technology to obtain simulation results;

[0069] The optimization and adjustment module 350 is used to optimize and adjust the original structure layout according to the simulation results to obtain a target lens structure that meets the design requirements.

[0070] According to an embodiment of the present application, any multiple modules among the acquisition module 310, the first determination module 320, the second determination module 330, the simulation module 340 and the optimization and adjustment module 350 can be combined into one module for implementation, or any one of the modules can be split into multiple modules. Alternatively, at least part of the functions of one or more of these modules can be combined with at least part of the functions of other modules and implemented in one module.

[0071] Figure 7 Each module in the system shown has the function of implementing each step in the aforementioned non-uniform wave position Rotman lens design method and can achieve its corresponding technical effect. For the sake of concise description, it will not be repeated here.

[0072] In some embodiments, the present application provides an electronic device, the structure diagram of the electronic device is as follows Figure 8 shown.

[0073] The electronic device may include a processor 410 and a memory 420 storing computer program instructions.

[0074] Specifically, the processor 410 may include a central processing unit (CPU), or an application specific integrated circuit (ASIC), or may be configured to implement one or more integrated circuits of the embodiments of the present application.

[0075] The memory 420 may include a large capacity memory for data or instructions. By way of example and not limitation, the memory 420 may include a hard disk drive (HDD), a floppy disk drive, a flash memory, an optical disk, a magneto-optical disk, a magnetic tape, or a universal serial bus (USB) drive or a combination of two or more of these. In appropriate cases, the memory 420 may include a removable or non-removable (or fixed) medium. In appropriate cases, the memory 420 may be inside or outside the integrated gateway disaster recovery device. In a specific embodiment, the memory 420 is a non-volatile solid-state memory.

[0076] The memory 420 may include a read-only memory (ROM), a random access memory (RAM), a magnetic disk storage medium device, an optical storage medium device, a flash memory device, an electrical, optical or other physical / tangible memory storage device. Therefore, generally, the memory 420 includes one or more tangible (non-transitory) computer-readable storage media (e.g., a memory device) encoded with software including computer-executable instructions, and when the software is executed (e.g., by one or more processors), it can perform the operations described in any one of the non-uniform wave position Rotman lens design methods in the above embodiments.

[0077] The processor 410 implements any one of the non-uniform wave position Rotman lens design methods in the above embodiments by reading and executing the computer program instructions stored in the memory 420 .

[0078] In one example, the electronic device may further include a communication interface 430 and a bus 400. Figure 8 As shown, the processor 410, the memory 420, and the communication interface 430 are connected via a bus 400 and communicate with each other.

[0079] The communication interface 430 is mainly used to implement communication between various modules, devices, units and / or equipment in the embodiments of the present application.

[0080] Bus 400 includes hardware, software or both, and the parts of online data flow billing equipment are coupled to each other. For example, but not limitation, bus may include accelerated graphics port (AGP) or other graphics bus, enhanced industrial standard architecture (EISA) bus, front-end bus (FSB), hypertransport (HT) interconnection, industrial standard architecture (ISA) bus, infinite bandwidth interconnection, low pin count (LPC) bus, memory bus, micro channel architecture (MCA) bus, peripheral component interconnection (PCI) bus, PCI-Express (PCI-X) bus, serial advanced technology attachment (SATA) bus, video electronics standard association local (VLB) bus or other suitable bus or two or more of these combinations. In appropriate cases, bus 400 may include one or more buses. Although the present application embodiment describes and shows a specific bus, the present application considers any suitable bus or interconnection.

[0081] In addition, in combination with the non-uniform wave position Rotman lens design method in the above embodiment, the embodiment of the present application can provide a computer storage medium for implementation. The computer storage medium stores computer program instructions; when the computer program instructions are executed by the processor, any non-uniform wave position Rotman lens design method in the above embodiment is implemented.

[0082] It should be clear that the present application is not limited to the specific configuration and processing described above and shown in the figures. For the sake of simplicity, a detailed description of the known method is omitted here. In the above embodiments, several specific steps are described and shown as examples. However, the method process of the present application is not limited to the specific steps described and shown, and those skilled in the art can make various changes, modifications and additions, or change the order between the steps after understanding the spirit of the present application.

[0083] The functional blocks shown in the above block diagram can be implemented as hardware, software, firmware or a combination thereof. When implemented in hardware, it can be, for example, an electronic circuit, an application specific integrated circuit (ASIC), appropriate firmware, a plug-in, a function card, etc. When implemented in software, the elements of the present application are programs or code segments that are used to perform the required tasks. The program or code segment can be stored in a machine-readable medium, or transmitted on a transmission medium or a communication link by a data signal carried in a carrier wave. "Machine-readable medium" can include any medium capable of storing or transmitting information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROM, flash memory, erasable ROM (EROM), floppy disks, CD-ROMs, optical disks, hard disks, optical fiber media, radio frequency (RF) links, etc. The code segment can be downloaded via a computer network such as the Internet, an intranet, etc.

[0084] It should also be noted that the exemplary embodiments mentioned in this application describe some methods or systems based on a series of steps or devices. However, this application is not limited to the order of the above steps, that is, the steps can be performed in the order mentioned in the embodiment, or in a different order from the embodiment, or several steps can be performed simultaneously.

[0085] Aspects of the present disclosure are described above with reference to the flowchart and / or block diagram of the method, device (system) and computer program product according to the embodiment of the present disclosure. It should be understood that each box in the flowchart and / or block diagram and the combination of each box in the flowchart and / or block diagram can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, or other programmable data processing device to produce a machine so that these instructions executed by the processor of the computer or other programmable data processing device enable the implementation of the function / action specified in one or more boxes of the flowchart and / or block diagram. Such a processor can be, but is not limited to, a general-purpose processor, a special-purpose processor, a special application processor, or a field programmable logic circuit. It can also be understood that each box in the block diagram and / or flowchart and the combination of boxes in the block diagram and / or flowchart can also be implemented by dedicated hardware that performs a specified function or action, or can be implemented by a combination of dedicated hardware and computer instructions.

[0086] In summary, compared with the prior art, this application has the following beneficial effects:

[0087] 1. This application determines the original structural layout of the Rotman lens according to the required non-uniformly distributed wave position and some preset Rotman lens parameters, and then performs full-wave simulation on the original structural layout. According to the simulation results, the original structural layout can be optimized and adjusted until the ideal target lens structure is obtained.

[0088] 2. The present application can achieve a consistent overlapping level of adjacent beams, solving the problems of inconsistent overlapping levels of adjacent beams and redundant number of beams caused by the uniform wave position Rotman lens; achieving the same spatial coverage with a smaller number of wave positions, thereby reducing the number of analog and digital receiving channels at the back end of the lens and reducing costs.

[0089] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit the same. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for designing a non-uniform wave position Rotman lens, characterized in that: include: Obtain target requirement information related to spatial coverage parameters and beam overlap levels; According to the target requirement information, a required non-uniformly distributed wave position is determined using a wave position optimization algorithm; wherein the non-uniformly distributed wave position corresponds to a beam port of a Rotman lens; Based on the preset Rotman lens parameters and the non-uniformly distributed wave position, the original structural layout of the lens is determined by a geometric optics method; Performing full-wave simulation on the original structural layout by electromagnetic simulation technology to obtain simulation results; According to the simulation results, the original structural layout is optimized and adjusted to obtain a target lens structure that meets the design requirements.

2. The non-uniform wave position Rotman lens design method according to claim 1, characterized in that: The target requirement information includes spatial coverage, overlapping level requirements of adjacent beams, and overlapping level requirements of alternate beams.

3. The non-uniform wave position Rotman lens design method according to claim 1 or 2, characterized in that: The Rotman lens parameters include focal angle, focal ratio and sine ratio.

4. The method for designing a non-uniform wave position Rotman lens according to claim 1 or 2, characterized in that: The non-uniformly distributed wave position is independent of the type of transmission line implementing the Rotman lens, and the non-uniformly distributed wave position is one of a microstrip type, a stripline type, and a waveguide type.

5. The non-uniform wave position Rotman lens design method according to claim 1, characterized in that: The target lens structure includes a lens, a plurality of array ports, a plurality of beam ports, and a plurality of groups of matching ports; Among them, the multiple array ports are constructed to be connected to the peripheral side of the lens; the multiple beam ports are connected to the peripheral side of the lens and are arranged opposite to the multiple array ports; and the multiple groups of matching ports are sandwiched between the array ports and the beam ports.

6. The method for designing a non-uniform wave position Rotman lens according to claim 5, characterized in that: Each group of the matching ports is composed of a plurality of matching resistors, each of the matching resistors has a first end adjacent to the lens and a second end away from the lens, and the width of the matching resistor decreases from the first end to the second end along its own extension direction.

7. The method for designing a non-uniform wave position Rotman lens according to claim 6, wherein: The multiple groups of matching ports are arranged in two pairs, the first pair of matching ports are adjacent to the array ports, and the corresponding matching resistors are constructed in a zigzag shape; the second pair of matching ports are adjacent to the beam ports, and the corresponding matching resistors are constructed in a straight line shape.

8. A non-uniform wave position Rotman lens design system, characterized in that: include: An acquisition module, used to obtain target requirement information related to airspace coverage parameters and beam overlap levels; A first determination module is used to determine the required non-uniformly distributed wave position by using a wave position optimization algorithm according to the target requirement information; wherein the non-uniformly distributed wave position corresponds to the beam port of the Rotman lens; A second determination module is used to determine the original structural layout of the lens by a geometric optics method based on preset Rotman lens parameters and the non-uniformly distributed wave position; A simulation module, used for performing full-wave simulation on the original structural layout by electromagnetic simulation technology to obtain simulation results; The optimization and adjustment module is used to optimize and adjust the original structure layout according to the simulation results to obtain a target lens structure that meets the design requirements.

9. An electronic device, characterized in that: include: A processor, a memory, and a program stored in the memory and executable on the processor, wherein when the program is executed by the processor, the method for designing a non-uniform wave position Rotman lens according to any one of claims 1 to 7 is implemented.

10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores a program or instruction, and when the program or instruction is executed by a processor, the non-uniform wave position Rotman lens design method according to any one of claims 1 to 7 is implemented.

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