Method and device for determining factors influencing image generation, equipment, medium and product

Abstract

The invention discloses a method, a device and equipment for determining factors influencing image generation, a medium and a product, and the method comprises the steps: obtaining image parameters of an image collected by charged particle beam imaging equipment, and enabling the charged particle beam imaging equipment to emit a charged particle beam to a collection object under the condition that the image is the charged particle beam emitted by the charged particle beam imaging equipment; an image generated by a charged particle beam reflected by an acquisition object is collected, and image parameters are image acquisition parameters when charged particle beam equipment acquires the image; detecting whether an image quality parameter in the image parameters belongs to a preset parameter range or not to obtain a first detection result; and when the first detection result includes that the image quality parameter does not belong to the preset parameter range, according to a target factor corresponding to the target parameter, determining a factor influencing image generation. Factors influencing image generation can be determined through image detection, and the efficiency of determining the factors influencing image generation is improved.

Description

Technical Field

[0001] The present application belongs to the field of data processing technology, and in particular, relates to a method, device, equipment, medium and product for determining factors affecting image generation. Background Art

[0002] At present, charged particle beam imaging equipment such as a scanning electron microscope may be required to collect images of semiconductor products during the production process of semiconductors. However, the images collected by the charged particle beam imaging equipment may have problems of low image quality, such as low image clarity or bright spots in the image. The prior art relies on manual observation of the quality problems of the collected images and determination of factors affecting the generated images, which results in low efficiency in determining the factors affecting the generated images. Summary of the invention

[0003] The embodiments of the present application provide a method, apparatus, device, medium and product for determining factors affecting image generation, which can improve the efficiency of determining factors affecting image generation.

[0004] In a first aspect, an embodiment of the present application provides a method for determining factors affecting image generation, including:

[0005] Acquiring image parameters of an image acquired by a charged particle beam imaging device, where the image is generated by collecting charged particle beams reflected by a collection object when the charged particle beam imaging device emits a charged particle beam to the collection object, and the image parameters are image acquisition parameters when the charged particle beam device acquires the image;

[0006] Detecting whether an image quality parameter in the image parameters falls within a preset parameter range, and obtaining a first detection result;

[0007] In a case where the first detection result includes that the image quality parameter does not belong to the preset parameter range, factors affecting the generated image are determined according to target factors corresponding to the target parameters.

[0008] In a second aspect, an embodiment of the present application provides a device for determining factors affecting image generation, including:

[0009] An acquisition module is used to acquire image parameters of an image acquired by a charged particle beam imaging device, wherein the image is an image generated by collecting a charged particle beam reflected by a collection object when the charged particle beam imaging device emits a charged particle beam to the collection object, and the image parameters are image acquisition parameters when the charged particle beam device acquires the image;

[0010] A detection module, used to detect whether a target parameter in the image parameters belongs to a preset parameter range, and obtain a first detection result, wherein the target parameter is a parameter characterizing the image quality;

[0011] The determination module is used to determine factors affecting the generated image according to target factors corresponding to the target parameters when the first detection result includes that the target parameters do not belong to the preset parameter range.

[0012] In a third aspect, an embodiment of the present application provides an electronic device, the device comprising:

[0013] a processor and a memory storing computer program instructions;

[0014] When the processor executes the computer program instructions, it is used to execute the method for determining factors affecting image generation in the first aspect mentioned above.

[0015] In a fourth aspect, an embodiment of the present application provides a computer storage medium having computer program instructions stored thereon, and when the computer program instructions are executed by a processor, the method for determining factors affecting image generation according to the first aspect described above is implemented.

[0016] In a fifth aspect, an embodiment of the present application provides a computer program product, including a computer program, which, when processed by a processor, implements the method for determining factors affecting image generation of the first aspect described above.

[0017] The embodiments of the present application provide a method, device, equipment, medium and product for determining factors affecting image generation. By acquiring image parameters of an image captured by a charged particle beam imaging device, the image quality parameters are detected to determine whether they fall within a preset range, and a detection result is obtained. The image quality can be determined by detecting the image quality parameters. If the detection result includes that the image quality parameters do not fall within the preset parameter range, the factors affecting the generation of the image can be determined based on the target factors corresponding to the target parameters. Image parameters that do not fall within the preset parameter range can be associated with the types of factors affecting the generation of the image. The factors affecting the generation of the image are determined through the target factors, thereby improving the efficiency of determining the factors affecting the generation of the image. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solution of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0019] Figure 1 A schematic diagram of the structure of an exemplary scanning electron microscope provided for some embodiments of the present application.

[0020] Figure 2 A flowchart of a method for determining factors affecting image generation provided in some embodiments of the present application.

[0021] Figure 3A flowchart of another method for determining factors affecting image generation provided in some embodiments of the present application.

[0022] Figure 4 A flowchart of another method for determining factors affecting image generation provided in some embodiments of the present application.

[0023] Figure 5 A flowchart of another method for determining factors affecting image generation provided in some embodiments of the present application.

[0024] Figure 6 A schematic diagram of a device for determining factors affecting image generation provided in some embodiments of the present application.

[0025] Figure 7 A schematic diagram of the hardware structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0026] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain the present application, rather than to limit the present application. For those skilled in the art, the present application can be implemented without the need for some of these specific details. The following description of the embodiments is only to provide a better understanding of the present application by illustrating the examples of the present application.

[0027] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the statement "include..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0028] Before describing the technical solutions provided by the embodiments of the present application, in order to facilitate the understanding of the embodiments of the present application, the present application first specifically describes the problems existing in the related art:

[0029] During the production process of semiconductor products, images of semiconductor products may be collected by charged particle beam imaging equipment such as a scanning electron microscope, so that users can observe the semiconductor products through the images. Figure 1 As shown, Figure 1 is a schematic diagram of an exemplary charged particle beam imaging device, such as Figure 1 The charged particle beam imaging device includes a high voltage power supply 101, a first ion pump 102, a second ion pump 103, an electron microscope 104, a first cavity 105, a second cavity 106, a molecular pump 107, a charged particle beam emitting device 108, a gun valve 109, a Faraday cup 110, and a moving platform 111.

[0030] The first ion pump 102 and the second ion pump 103 in the above-mentioned charged particle beam imaging device can respectively keep the first cavity 105 and the second cavity 106 in a vacuum state, wherein the collection object can be placed on the above-mentioned mobile platform 111, and is located in the second cavity 106 at the same time as the mobile platform 111, the charged particle beam emitting device 108 can emit a charged particle beam to the collection object based on the high voltage of the high-voltage power supply 101, and the electron microscope 104 can collect the charged particle beam reflected by the collection object to generate an image, wherein the Faraday cup 111 can detect the current of the charged particle beam emitted by the charged particle beam emitting device 108 to the collection object and the current of the charged particle beam reflected by the collection object, the molecular pump 107 can accelerate the charged particle beam, and the gun valve 109 can be closed in response to a control instruction to stop the above-mentioned charged particle beam imaging device from generating an image in time.

[0031] It is conceivable that the charged particle beam imaging device described above may have problems with low image quality, such as low image clarity or bright spots in the image. The prior art relies on manual observation of the quality issues of the collected images and determination of factors affecting the generated images, which results in low efficiency in determining the factors affecting the generated images.

[0032] Based on this, an embodiment of the present application provides a method, device, equipment, medium and product for determining factors affecting image generation, which can solve the above-mentioned problems. Below, a method for determining factors affecting image generation provided in an embodiment of the present application is described in detail.

[0033] In some embodiments, Figure 2 As shown, the embodiment of the present application provides a method for determining factors affecting image generation, the method comprising the following steps S210-S230:

[0034] S210: Acquire image parameters of an image acquired by a charged particle beam imaging device, where the image is generated by collecting a charged particle beam reflected by a collection object when the charged particle beam imaging device emits a charged particle beam to the collection object, and the image parameters are image acquisition parameters when the charged particle beam device acquires the image.

[0035] The image parameters of the image collected by the charged particle beam imaging device can be obtained. The above image parameters may include the memory size occupied by the image, the acquisition time and the image quality parameters. The above image quality parameters may include multiple parameters such as image brightness, image clarity, image resolution and image drift.

[0036] Here, the above-mentioned image quality parameters are parameters obtained by detecting the image based on a preset image detection algorithm. For example, the image parameters can be detected based on a preset image detection algorithm, such as determining the image brightness based on a brightness detection algorithm, determining the image clarity based on a clarity detection algorithm, and detecting the image drift amount based on an image drift detection algorithm, etc.

[0037] It can be imagined that the image captured by the above-mentioned charged particle beam imaging device is an image generated by collecting the charged particle beam reflected by the collection object when the charged particle beam imaging device emits a charged particle beam to the collection object. The above-mentioned image is the image captured by the charged particle beam imaging device after the parameters are adjusted to meet the viewing conditions.

[0038] S220: Detect whether an image quality parameter in the image parameters belongs to a preset parameter range, and obtain a first detection result.

[0039] It is possible to detect whether the image quality parameters in the image parameters belong to the preset parameter range to obtain the detection results. It can be imagined that the above-mentioned image quality parameters are parameters that characterize the image quality. For example, it is possible to detect whether the image brightness belongs to the preset brightness parameter range, whether the image clarity belongs to the clarity parameter range, or whether the image drift amount belongs to the drift amount parameter range to obtain the detection results.

[0040] S230: When the first detection result includes that the image quality parameter does not fall within a preset parameter range, determining factors affecting the generated image according to target factors corresponding to the target parameters.

[0041] When the first detection result includes that the target parameter does not fall within the preset parameter range, the factors affecting the generated image can be determined based on the target factors corresponding to the target parameters. For example, if it is detected that both the image brightness and the image clarity do not fall within the corresponding brightness parameter range and clarity parameter range, the first target parameter corresponding to the image brightness and the second target parameter corresponding to the image clarity can be determined respectively, and then the factors affecting the generated image are determined based on the first target factor corresponding to the first target parameter and the second target factor corresponding to the second target parameter.

[0042] The embodiment of the present application obtains image parameters of an image captured by a charged particle beam imaging device, detects whether an image quality parameter falls within a preset range, and obtains a first detection result. Then, when the detection result includes that the image quality parameter does not fall within the preset parameter range, the parameters that may cause the image abnormality can be determined by detecting the image quality parameters. Then, by determining the target factors corresponding to the target parameters, the factors affecting the generation of the image are determined, thereby improving the efficiency of determining the factors for generating the image.

[0043] In some embodiments, Figure 3 As shown, the target factor is a factor corresponding to the change amount of the target parameter. When the first detection result includes that the image quality parameter does not belong to the preset parameter range, the factors affecting the generated image are determined according to the target factor corresponding to the target parameter, including the following steps S310-S320:

[0044] S310: Detect whether the change amount of the parameter of the target time period in the image parameters is greater than or equal to a preset threshold, and obtain a second detection result, wherein the target time period includes the acquisition time of the image.

[0045] The above-mentioned target factors are factors corresponding to the change in the target parameters. The target time period can be determined based on the acquisition time of the above-mentioned image. The above-mentioned target time period includes the acquisition time of the above-mentioned image. After determining the target time period, it can be determined whether the change in the parameters within the target time period is greater than or equal to the preset threshold. The above-mentioned target parameters are device parameters of the charged particle beam. It is possible to detect whether the changes in multiple parameters are greater than or equal to the corresponding preset thresholds, for example, detecting whether the change in the current emitted by the charged particle beam imaging device in the target time period is greater than or equal to the current preset threshold, detecting whether the change in the power supply voltage of the charged particle beam imaging device in the target time period is greater than or equal to the voltage preset threshold, or detecting whether the change in the emission current of the charged particle beam imaging device in the target time period and the current of the charged particle beam reflected by the collected collection object is greater than or equal to the preset threshold of the collection current, etc. It can be imagined that the above examples are only exemplary, and it is possible to detect whether the changes in the parameters of multiple charged particle beam devices are greater than or equal to the preset threshold to obtain a second detection result.

[0046] S320: When the second detection result includes that the change amount of the target parameter is greater than or equal to a preset threshold, determine factors that affect the generated image based on the target factor corresponding to the change amount.

[0047] When the change in the above-mentioned target parameter is greater than or equal to a preset threshold, the factors affecting the generation of the image can be determined based on the target factors corresponding to the above-mentioned change. For example, when it is determined that the change in the current emitted by the charged particle beam imaging device is greater than or equal to the preset threshold of the current, the target factor affecting the image quality is determined to be abnormal current fluctuation. When it is determined that the change in the power supply voltage of the charged particle beam imaging device is greater than or equal to the preset threshold of the voltage, the target factor affecting the image quality can be determined to be abnormal power supply voltage fluctuation. By analogy, different target factors affecting the image quality can be determined. Through the above-mentioned multiple target factors, the factors affecting image generation can be determined. For example, the factors affecting image generation include the above-mentioned multiple target factors.

[0048] The embodiment of the present application obtains a second detection result by detecting whether the change in the parameter of the target time period in the image parameter is greater than or equal to a preset threshold value when it is determined that the image quality parameter does not fall within the preset parameter range. When it is determined that the change in the target parameter is greater than or equal to the preset threshold value, the factors affecting image generation can be determined based on the target factors corresponding to the target parameters, thereby realizing analysis of the factors affecting image generation based on the image quality parameters and improving the efficiency and accuracy of determining the factors for generating an image.

[0049] In some embodiments, the image quality parameter includes image brightness, the change in the target parameter includes the change in the current emitted by the charged particle beam imaging device, and the target factor includes abnormal current fluctuation; or

[0050] The image quality parameter includes image clarity, the target parameter variation includes the power supply voltage variation of the charged particle beam imaging device, and the target factor includes abnormal power supply voltage fluctuation; or

[0051] The image quality parameters include the image drift, the target parameter variation includes the variation of the current emitted by the charged particle beam imaging device and the current of the charged particle beam reflected by the collected collection object, and the target factor includes the residual charge of the collection object.

[0052] Here, when the image quality parameter includes image brightness, based on the above steps S310-S320, it can be determined that when the image brightness does not belong to the preset brightness parameter range, the change amount of the target parameter includes the change amount of the current emitted by the charged particle beam imaging device, and the target factor includes abnormal current fluctuation;

[0053] The image quality parameter includes a target clarity, and when it is determined that the image clarity does not fall within a preset clarity parameter range, the change in the target parameter includes a change in the power supply voltage of the charged particle beam imaging device, and the target factor includes abnormal power supply voltage fluctuation;

[0054] The image quality parameters include image drift. When the image drift does not fall within a preset drift parameter range, the change in the target parameter includes the change in the current emitted by the charged particle beam imaging device and the current of the charged particle beam reflected by the collected collection object, and the target factor includes the residual charge of the collection object.

[0055] The embodiment of the present application determines that the above-mentioned image quality parameters include multiple different parameters, and based on the above-mentioned steps S310-S320, respectively determines the change amount of the target parameters corresponding to different image quality parameters, and further determines the target factor based on the change amount of the target parameter, and then facilitates determining the factors for generating the image based on different target factors, thereby improving the efficiency of determining the factors for generating the image.

[0056] The embodiment of the present application establishes a one-to-one correspondence between image quality parameters and target factors. Based on the above relationship, the corresponding target factors can be determined based on the image quality parameters, and the factors for generating images can be determined in a timely manner during the semiconductor production process, so that users can make targeted changes to the generation process.

[0057] It is conceivable that, when the above target parameters include the target image drift amount, the image drift amount may be detected based on a drift amount detection algorithm.

[0058] In some embodiments, Figure 3 As shown, in the case where the image quality parameter includes the image drift amount, before the above step S210 acquires the image parameters of the image acquired by the charged particle beam imaging device, the method may further include steps S410-S420:

[0059] S410: Perform feature point matching on the image and the reference image to determine at least one feature point pair.

[0060] Here, a feature point detection algorithm (Oriented FAST and Rotated BRIEF, ORB) may be used to obtain feature points of the image to be detected and feature points of the reference image, respectively, and feature point matching is performed on the feature points of the image and the reference image to obtain at least one feature point pair.

[0061] S420: Determine the image drift amount of the image based on the length of the feature point pair.

[0062] The image drift amount of the image may be determined according to the length of the feature point pair and the length of the center point of the image and the center point of the reference image.

[0063] In some examples, when the feature point pairs include multiple pairs, the image drift amount of the image may be determined based on an average value of the lengths of the multiple feature point pairs and the lengths of the center point of the image and the center point of the reference image.

[0064] In the embodiment of the present application, when the image quality parameters include the image drift amount, by matching the feature points of the paired image and the reference image, at least one feature point pair is determined, and based on the length of the feature point pair, the image drift amount of the image is determined, thereby being able to accurately identify the image drift amount.

[0065] It is conceivable that when the determination target factor includes the residual charge of the acquisition object, the type of the residual charge of the acquisition object can be determined by the current value detected by the Faraday cup in the charged particle beam imaging device.

[0066] In some embodiments, step S230: when the first detection result includes that the image quality parameter does not fall within the preset parameter range, after determining the factors affecting the generated image according to the target factors corresponding to the target parameters, the method may further include:

[0067] A first current value of a charged particle beam emitted by a charged particle beam imaging device to a collection object and a second current value of a charged particle beam reflected by the collection object collected by the charged particle beam imaging device are obtained; based on the first current value and the second current value, the type of residual charge of the collection object is determined.

[0068] The Faraday cup in the charged particle beam imaging device can detect a first current value of the charged particle beam emitted by the charged particle beam imaging device to the collection object, and a second current value of the charged particle beam reflected by the collection object collected by the charged particle beam imaging device, and can determine the type of residual charge of the collection object based on the first current value and the second current value. Here, the type of residual charge includes whether the residual charge is positive or negative.

[0069] It is conceivable that the charged particle beam may be an electron beam, and the type of residual charge of the collected object may be determined based on the magnitude relationship between the first current value and the second current value. For example, when the first current value is less than the second current value, the type of residual charge may be a negative charge, and when the first current value is greater than the second current value, the type of residual charge may be a positive charge.

[0070] The embodiment of the present application obtains a first current value of a charged particle beam emitted by a charged particle beam imaging device to a collection object, and a second current value of a charged particle beam reflected by the collection object and collected by the charged particle beam imaging device, and determines the type of residual charge of the collection object through the above-mentioned first current value and second current value. The type of residual charge of the collection object can be detected in time, so that the user can determine the process flow or equipment that may have abnormalities in the semiconductor production process based on the above-mentioned type.

[0071] In order to improve the safety during the semiconductor production process, it can be determined whether the action of the charged particle beam imaging device needs to be cut off in time based on the first current value and the second current value.

[0072] In some embodiments, after determining the type of the participating charge of the collection object based on the first current value and the second current value, the method further includes:

[0073] The absolute value of the difference between the first current value and the second current value is calculated; when the absolute value is greater than a threshold value, the charged particle beam imaging device is controlled to stop emitting the charged particle beam to the collection object.

[0074] Here, the absolute value of the difference between the first current value and the second current value can be calculated. When it is determined that the above absolute value is greater than the threshold, the charged particle beam imaging device can be controlled to stop emitting a charged particle beam to the collection object, that is, the action of the charged particle beam imaging device can be cut off in time, which can protect the safety of the production process.

[0075] In some examples, the charged particle beam imaging device is as follows Figure 1 When using the scanning electron microscope shown in the figure, the real-time data of the high-voltage power supply 101, the first ion pump 102, the second ion pump 103, the first cavity 105 or the second cavity 106 can be obtained respectively, and each data can be detected whether it is greater than the corresponding threshold value. When it is determined that any of the above data is greater than the corresponding threshold value, the action of the scanning electron microscope can be cut off in time to protect the safety of the equipment and the user.

[0076] It is conceivable that after determining the factors that affect the generated image, the target solution corresponding to the target factor can be determined based on the correspondence between the factors and the solutions, so as to recommend the above target solution to the user.

[0077] In some embodiments, Figure 5 As shown, in the above step S230: when the first detection result includes that the image quality parameter does not belong to the preset parameter range, after determining the factors affecting the generated image according to the target factors corresponding to the target parameters, the method may further include the following steps S510-S520:

[0078] S510: Determine a target solution corresponding to the target factor from the correspondence between the preset factors and solutions.

[0079] The correspondence between factors and solutions can be preset to determine the target solution corresponding to the target factor. For example, when the target factor is abnormal power supply voltage fluctuation, the target solution may be to cut off the connection between the charged particle beam imaging device and the power supply.

[0080] S520: Send prompt information to the user equipment, where the prompt information includes target factors and target solutions.

[0081] Prompt information can be sent to the user device, and the prompt information can include target factors and target solutions. The prompt information can prompt the user to perform corresponding operations based on the target solution to avoid equipment failure and improve the production yield of semiconductor products.

[0082] It is conceivable that when the above factors include multiple target factors, a target solution corresponding to each target factor may be determined, and prompt information including the multiple target factors and multiple target solutions may be sent to the user equipment.

[0083] The embodiment of the present application determines the target solution corresponding to the target factor from the correspondence between the preset factors and the solution, and sends a prompt message to the user device, so as to promptly notify the user of the factors that generate the above-mentioned image and the corresponding solution, and can efficiently solve the technical problems encountered in the semiconductor production process and improve the production yield of semiconductor products.

[0084] Based on the same inventive concept, an embodiment of the present application also provides a device for determining factors affecting image generation.

[0085] In some embodiments, Figure 6 As shown, an embodiment of the present application provides a device for determining factors affecting image generation, and the device may include:

[0086] An acquisition module 601 is used to acquire image parameters of an image acquired by a charged particle beam imaging device. The image is an image generated by collecting charged particle beams reflected by a collection object when the charged particle beam imaging device emits a charged particle beam to the collection object. The image parameters are parameters that characterize the image quality of the image.

[0087] A detection module 602 is used to detect whether the image quality parameters in the image parameters belong to the preset parameter range, and obtain a first detection result;

[0088] The determination module 603 is used to determine factors affecting the generated image according to target factors corresponding to the target parameters when the detection result includes that the image quality parameter does not fall within the preset parameter range.

[0089] The embodiment of the present application obtains image parameters of an image collected by a charged particle beam imaging device through an acquisition module, detects whether the image quality parameters are within a preset range through a detection module, and obtains a first detection result. Then, when the detection result includes that the image quality parameters do not fall within the preset parameter range, the determination module determines the factors affecting the generation of the image based on the target factors corresponding to the target parameters. The target parameters that may cause abnormalities in the image can be determined, and the target factors corresponding to the target parameters can be determined. The factors affecting the generation of the image are determined, thereby improving the efficiency of determining the factors for generating the image.

[0090] In some embodiments, the target factor includes a factor corresponding to the amount of change in the target parameter,

[0091] Determine the module, which can be used for:

[0092] Detecting whether a change amount of a target parameter in a target time period in the image parameters is greater than or equal to a preset threshold, and obtaining a second detection result, wherein the target time period includes an acquisition time of the image;

[0093] When the second detection result includes that the variation is greater than or equal to a preset threshold, factors affecting the generated image are determined based on the target factor corresponding to the variation.

[0094] In some embodiments, the image quality parameter includes image brightness, the change in the target device parameter includes the change in the current emitted by the charged particle beam imaging device, and the target factor includes abnormal current fluctuation; or

[0095] The image quality parameter includes image clarity, the change in the target device parameter includes the change in the power supply voltage of the charged particle beam imaging device, and the target factor includes abnormal voltage fluctuation; or

[0096] The image quality parameters include the image drift, the change in the target device parameters includes the change in the current emitted by the charged particle beam imaging device and the current of the charged particle beam reflected by the collected collection object, and the target factors include the residual charge of the collection object.

[0097] In some embodiments, the determination module may also be used to:

[0098] Performing feature point matching on the image and the reference image to determine at least one feature point pair;

[0099] Based on the length of the feature point pairs, the image drift amount of the image is determined.

[0100] In some embodiments, the determination module may also be used to:

[0101] Acquire a first current value of a charged particle beam emitted by a charged particle beam imaging device to a collection object, and a second current value of a charged particle beam reflected by the collection object and collected by the charged particle beam imaging device;

[0102] Based on the first current value and the second current value, a type of residual charge of the acquisition object is determined.

[0103] In some embodiments, the determination module may also be used to:

[0104] Calculate the absolute value of the difference between the first current value and the second current value;

[0105] When the absolute value is greater than the threshold, the charged particle beam imaging device is controlled to stop emitting the charged particle beam to the acquisition object.

[0106] In some embodiments, the device further comprises a prompt module for:

[0107] From the correspondence between the preset factors and solutions, determine the target solution corresponding to the target factor;

[0108] Prompt information is sent to the user device, where the prompt information includes a target factor and a target solution.

[0109] The device of the above embodiment is used to implement the corresponding method for determining factors affecting image generation in any of the above embodiments, and has the beneficial effects of the corresponding method embodiments, which will not be described in detail here.

[0110] Figure 7 A schematic diagram of the hardware structure of an electronic device provided in an application embodiment.

[0111] The electronic device 700 may include a processor 701 and a memory 702 storing computer program instructions.

[0112] Specifically, the processor 701 may include a central processing unit (CPU), or an application specific integrated circuit (ASIC), or may be configured to implement one or more integrated circuits of the embodiments of the present application.

[0113] The memory 702 may include a large capacity memory for data or instructions. By way of example and not limitation, the memory 702 may include a hard disk drive (HDD), a floppy disk drive, a flash memory, an optical disk, a magneto-optical disk, a magnetic tape, or a universal serial bus (USB) drive or a combination of two or more of these. In appropriate cases, the memory 702 may include a removable or non-removable (or fixed) medium. In appropriate cases, the memory 702 may be inside or outside the integrated gateway disaster recovery device. In a specific embodiment, the memory 702 is a non-volatile solid-state memory.

[0114] In certain embodiments, memory 702 includes a read-only memory (ROM). The ROM may be a mask-programmed ROM, a programmable ROM (PROM), an erasable PROM (EPROM), an electrically erasable PROM (EEPROM), an electrically alterable ROM (EAROM), or flash memory, or a combination of two or more of the above, where appropriate.

[0115] The memory may include a read-only memory (ROM), a random access memory (RAM), a magnetic disk storage medium device, an optical storage medium device, a flash memory device, an electrical, optical or other physical / tangible memory storage device. Thus, typically, the memory includes one or more tangible (non-transitory) computer-readable storage media (e.g., a memory device) encoded with software including computer-executable instructions, and when the software is executed (e.g., by one or more processors), it is operable to perform the operations described with reference to the method according to the first aspect of the present application.

[0116] The processor 701 reads and executes the computer program instructions stored in the memory 702 to implement any one of the methods for determining factors affecting image generation in the above embodiments.

[0117] In one example, the electronic device may further include a communication interface 703 and a bus 704. Figure 7 The processor 701, the memory 702, and the communication interface 703 are connected via a bus 704 and communicate with each other.

[0118] The communication interface 703 is mainly used to implement communication between various modules, devices, units and / or equipment in the embodiments of the present application.

[0119] Bus 704 includes hardware, software or both, and the parts of online data flow billing equipment are coupled to each other. For example, but not limitation, bus may include accelerated graphics port (AGP) or other graphics bus, enhanced industrial standard architecture (EISA) bus, front-end bus (FSB), hypertransport (HT) interconnection, industrial standard architecture (ISA) bus, infinite bandwidth interconnection, low pin count (LPC) bus, memory bus, micro channel architecture (MCA) bus, peripheral component interconnection (PCI) bus, PCI-Express (PCI-X) bus, serial advanced technology attachment (SATA) bus, video electronics standard association local (VLB) bus or other suitable bus or two or more of these combinations. In appropriate cases, bus 704 may include one or more buses. Although the present application embodiment describes and shows a specific bus, the present application considers any suitable bus or interconnection.

[0120] The electronic device of the above embodiment is used to implement the corresponding method for determining factors affecting image generation in any of the above embodiments, and has the beneficial effects of the corresponding method embodiments, which will not be described in detail here.

[0121] In addition, in combination with the method for determining factors affecting image generation in the above embodiments, the present application embodiment may provide a computer storage medium for implementation. The computer storage medium stores computer program instructions; when the computer program instructions are executed by a processor, any method for determining factors affecting image generation in the above embodiments is implemented.

[0122] In addition, in combination with the method for determining factors affecting image generation in the above embodiments, the present application embodiment may provide a computer program product for implementation. When the computer program product instructions are executed by a processor of an electronic device, any method for determining factors affecting image generation in the above embodiments is implemented.

[0123] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present application (including the claims) is limited to these examples. In line with the concept of the present application, the technical features in the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of the different aspects of the embodiments of the present application as described above, which are not provided in detail for the sake of simplicity.

[0124] The functional blocks shown in the above-described block diagram can be implemented as hardware, software, firmware or a combination thereof. When implemented in hardware, it can be, for example, an electronic circuit, an application specific integrated circuit (ASIC), appropriate firmware, a plug-in, a function card, etc. When implemented in software, the elements of the present application are programs or code segments that are used to perform the required tasks. The program or code segment can be stored in a machine-readable medium, or transmitted on a transmission medium or a communication link by a data signal carried in a carrier wave. "Machine-readable medium" can include any medium capable of storing or transmitting information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROM, flash memory, erasable ROM (EROM), floppy disks, CD-ROMs, optical disks, hard disks, optical fiber media, radio frequency (RF) links, etc. The code segment can be downloaded via a computer network such as the Internet, an intranet, etc.

[0125] It should also be noted that the exemplary embodiments mentioned in this application describe some methods or devices based on a series of steps or devices. However, this application is not limited to the order of the above steps, that is, the steps can be performed in the order mentioned in the embodiment, or in a different order from the embodiment, or several steps can be performed simultaneously.

[0126] The above reference is according to the method of the embodiment of the present application, the flow chart of the device (device) and the computer program product and / or the block diagram described various aspects of the present application.It should be understood that each square box in the flow chart and / or the block diagram and the combination of each square box in the flow chart and / or the block diagram can be realized by computer program instructions.These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer or other programmable data processing device to produce a machine so that these instructions executed by the processor of the computer or other programmable data processing device enable the realization of the function / action specified in one or more square boxes of the flow chart and / or the block diagram.Such a processor can be but is not limited to a general-purpose processor, a special-purpose processor, a special application processor or a field programmable logic circuit.It can also be understood that each square box in the block diagram and / or the flow chart and the combination of the square boxes in the block diagram and / or the flow chart can also be realized by the dedicated hardware that performs the specified function or action, or can be realized by the combination of dedicated hardware and computer instructions.

[0127] The above is only a specific implementation of the present application. Those skilled in the art can clearly understand that for the convenience and simplicity of description, the specific working processes of the above-described devices, modules and units can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the protection scope of the present application is not limited to this. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed in the present application, and these modifications or replacements should be included in the protection scope of the present application.

Claims

1. A method for determining factors affecting image generation, characterized in that: include: Acquiring image parameters of an image acquired by a charged particle beam imaging device, wherein the image is an image generated by collecting a charged particle beam reflected by a collection object when the charged particle beam imaging device emits a charged particle beam to the collection object, and the image parameters are image acquisition parameters when the charged particle beam device acquires the image; Detecting whether an image quality parameter in the image parameters falls within a preset parameter range, and obtaining a first detection result; In a case where the first detection result includes that the image quality parameter does not fall within a preset parameter range, factors affecting generation of the image are determined according to target factors corresponding to target parameters.

2. The method for determining factors affecting image generation according to claim 1, characterized in that: The target factor includes a factor corresponding to the change amount of the target parameter, When the first detection result includes that the image quality parameter does not fall within the preset parameter range, determining the factors affecting the generated image according to the target factor corresponding to the target parameter includes: Detecting whether a change in a parameter of a target time period in the image parameters is greater than or equal to a preset threshold, and obtaining a second detection result, wherein the target time period includes the acquisition time of the image; In a case where the second detection result includes that the change amount of the target parameter is greater than or equal to a preset threshold, a factor affecting the generation of the image is determined based on the target factor corresponding to the change amount.

3. The method for determining factors affecting image generation according to claim 2, characterized in that: The image quality parameter includes image brightness, the change amount of the target parameter includes the change amount of the current emitted by the charged particle beam imaging device, and the target factor includes abnormal current fluctuation; or The image quality parameter includes image clarity, the change amount of the target parameter includes the change amount of the power supply voltage of the charged particle beam imaging device, and the target factor includes abnormal power supply voltage fluctuation; or The image quality parameter includes the image drift amount, the target parameter change amount includes the change amount of the current emitted by the charged particle beam imaging device and the current of the collected charged particle beam reflected by the collection object, and the target factor includes the residual charge of the collection object.

4. The method for determining factors affecting image generation according to claim 1, characterized in that: In the case where the image quality parameter includes the image drift amount, before acquiring the image parameter of the image acquired by the charged particle beam imaging device, the method further includes: Performing feature point matching on the image and a reference image to determine at least one feature point pair; The image drift amount of the image is determined based on the length of the feature point pair.

5. The method for determining factors affecting image generation according to claim 3, characterized in that: In the case where the first detection result includes that the image quality parameter does not fall within a preset parameter range, after determining factors affecting the generation of the image according to target factors corresponding to target parameters, the method further includes: Acquire a first current value of the charged particle beam emitted by the charged particle beam imaging device to the collection object, and a second current value of the charged particle beam reflected by the collection object and collected by the charged particle beam imaging device; Based on the first current value and the second current value, a type of residual charge of the acquisition object is determined.

6. The method for determining factors affecting image generation according to claim 1, characterized in that: In the case where the first detection result includes that the image quality parameter does not fall within a preset parameter range, after determining factors affecting the generation of the image according to target factors corresponding to target parameters, the method further includes: Determine a target solution corresponding to the target factor from the correspondence between the preset factors and solutions; Prompt information is sent to a user device, where the prompt information includes the target factor and the target solution.

7. A device for determining factors affecting image generation, characterized in that: include: an acquisition module, used to acquire image parameters of an image acquired by a charged particle beam imaging device, wherein the image is an image generated by collecting a charged particle beam reflected by a collection object when the charged particle beam imaging device emits a charged particle beam to the collection object, and the image parameters are image acquisition parameters when the charged particle beam device acquires the image; A detection module, used to detect whether an image quality parameter in the image parameters belongs to a preset parameter range, and obtain a first detection result; A determination module is used to determine factors affecting the generation of the image according to target factors corresponding to target parameters when the first detection result includes that the image quality parameter does not fall within a preset parameter range.

8. An electronic device, characterized in that: The device comprises: a processor, and a memory storing computer program instructions; The processor reads and executes the computer program instructions to implement the method for determining factors affecting image generation as described in any one of claims 1 to 6.

9. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer program instructions, and when the computer program instructions are executed by a processor, the method for determining factors affecting image generation according to any one of claims 1 to 6 is implemented.

10. A computer program product, comprising a computer program, characterized in that When the computer program is processed by a processor, the method for determining factors affecting image generation as claimed in any one of claims 1 to 6 is implemented.

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