Sliding shaft valve

Abstract

The sleeve (222) has a first surface-treated section (29) formed through an electroless nickel plating film on at least both axial end sections of the inner peripheral surface thereof, the first surface-treated section (29) being smaller than the inner diameter of the other sections of the inner peripheral surface by the film thickness (t11) of the first plating film, and being capable of supporting the sliding of the sliding shaft valve body (221).

Description

Technical Field

[0001] The invention relates to a sliding shaft valve. Background Art

[0002] In the RIE (Reactive Ion Etching) type plasma processing device used in semiconductor manufacturing, the processing gas is introduced into the processing container, and the wafer is etched while the wafer is held by the susceptor in the processing container. Etching uses multiple processing gases, and different processing conditions are set for each type of processing gas. The processing conditions also include the temperature of the wafer to be processed, and the wafer temperature must meet the processing conditions. Therefore, the temperature of the susceptor used to hold the wafer is controlled.

[0003] Here, as a technology for controlling the temperature of the susceptor, a temperature adjustment flow control unit disclosed in Patent Document 1 is widely known, which adjusts the temperature of the susceptor by circulating a temperature adjustment fluid in the susceptor. In the temperature adjustment flow control unit, the temperature of the temperature adjustment fluid is adjusted by adjusting the flow rate of a high-temperature fluid that increases the temperature of the temperature adjustment fluid and the flow rate of a low-temperature fluid that decreases the temperature of the temperature adjustment fluid by the slide valve.

[0004] A slide shaft valve using a flow control unit for temperature adjustment is widely known, such as the slide shaft valve disclosed in Patent Document 2. This slide shaft valve has a cylindrical sleeve and a slide shaft valve body that slides in the sleeve along the axial direction. In addition, the sleeve has two or more input ports and two or more output ports that are connected inside the sleeve. As described above, the slide shaft valve slides in the sleeve to adjust the open area of ​​the input port and the output port. Prior art literature Patent Literature

[0005] [Patent Document 1] Japanese Patent Application Publication No. 2020-160731. [Patent Document 2] Japanese Patent Application Publication No. 2020-106123. Summary of the invention Problems to be solved by the invention

[0006] However, the above-mentioned conventional spool valve has the following problems.

[0007] The gap between the outer circumference of the sliding shaft valve body and the inner surface of the sleeve (hereinafter referred to as the gap) is designed to be uniform in the axial direction of the sleeve. However, the shapes of the sleeve and the sliding shaft valve body are obtained through cutting, so there is a risk of deformation due to processing. As a result, the gap is not uniform in the axial direction of the sleeve, and the outer circumference of the sliding shaft valve body and the inner circumference of the sleeve may interfere with each other. Moreover, since the position where this interference occurs cannot be controlled, interference may occur at multiple positions. When interference occurs at multiple positions, the sliding performance of the sleeve of the sliding shaft valve body deteriorates. In addition, such interference will shorten the life of the sliding shaft valve because it will cause wear of the sleeve or the sliding shaft valve body.

[0008] In view of the above problems, the object of the present invention is to control the interference position between the outer circumference of the sliding shaft valve body and the inner circumference of the sleeve to prevent the sliding performance of the sliding shaft valve body from deteriorating and the sleeve or the sliding shaft valve body from wearing. Technical means to solve problems

[0009] In order to solve the above-mentioned problems, a spool valve according to one aspect of the present invention has the following structure.

[0010] (1): A cylindrical sleeve, wherein the sleeve has two or more input ports and two or more output ports communicating with the interior of the sleeve; a spool valve body sliding in the sleeve along the axial direction of the sleeve, wherein in the spool valve, the open areas of the input port and the output port are adjusted by sliding the spool valve body; and a support portion provided on at least one of the sleeve and the spool valve body, so that the gap between the inner circumference of the sleeve and the outer circumference of the spool valve body at both ends in the axial direction of the sleeve is smaller than that at other parts, and the sliding of the spool valve body is supported. In addition, the gap referred to herein is obtained by assuming that the spool valve body and the sleeve are provided coaxially and the difference between the diameter of the inner circumference of the sleeve and the diameter of the outer circumference of the spool valve body is divided by 2.

[0011] (2): In the sliding shaft valve as described in (1), preferably, the sleeve has a first surface treatment portion formed through a first coating film at both ends of its inner circumferential surface in the axial direction, and the first surface treatment portion is the supporting portion.

[0012] (3): In the sliding shaft valve as described in (1), preferably, the outer circumferential surface of the aforementioned sliding shaft valve body and the inner circumferential surface of the aforementioned sleeve at the two end portions facing each other in the aforementioned axial direction have a surface treatment portion formed through an electroplating film; and the aforementioned surface treatment portion is the aforementioned supporting portion.

[0013] (4): In the slide shaft valve described in (2), preferably, the width of the support portion in the axial direction is not less than 1 mm and is not more than 15% of the total length of the sleeve in the axial direction.

[0014] According to the sliding shaft valve described in (1), at least one of the sleeve and the sliding shaft valve body has a support portion at both ends of the sleeve in the axial direction, which makes the gap between the inner circumference of the sleeve and the outer circumference of the sliding shaft valve body smaller than other parts and supports the sliding of the sliding shaft valve body. Therefore, the sliding shaft valve body can be actively supported through the support portion. The "support" referred to here does not mean fixing the sliding shaft valve body, but refers to guiding the sliding of the sliding shaft valve body in the inner circumference of the sleeve without interfering with parts other than the support portion. In other words, the part where the outer circumference of the sliding shaft valve body interferes with the inner circumference of the sleeve is limited to the support portion, which can prevent interference at multiple positions. Therefore, it is possible to prevent the sliding performance of the sliding shaft valve body from being reduced, and to prevent wear of the sleeve or the sliding shaft valve body.

[0015] Preferred as the supporting portion is a sliding shaft valve as described in (2), in which a first surface treatment portion formed by a first coating is provided at both ends of the inner circumferential surface of the sleeve in the axial direction, or a sliding shaft valve as described in (3), in which a surface treatment portion formed by a coating is provided at portions where the outer circumferential surface of the sliding shaft valve body and the two ends of the inner circumferential surface of the sleeve in the axial direction are opposite to each other.

[0016] In addition, in the case of the slide shaft valve described in (2), when the support portion is formed as the first surface treatment portion through the first coating, in the case of the slide shaft valve described in (4), the width of the support portion in the axial direction is preferably not less than 1 mm and not more than 15% of the total length of the sleeve in the axial direction. This is because if the width of the support portion in the axial direction is less than 1 mm, that is, if the surface area of ​​the support portion supporting the slide shaft valve body is small, the stress per unit area becomes large, and the sliding of the slide shaft valve body may cause the support portion to wear. If wear occurs, the sliding of the slide shaft valve body may be hindered, which is disadvantageous. In addition, if the width of the support portion in the axial direction is less than 1 mm, the surface treatment such as the coating cannot obtain stable quality, which is disadvantageous. In addition, if the width of the support portion in the axial direction is greater than 15% of the total length of the sleeve in the axial direction, that is, if the surface area of ​​the support portion supporting the slide shaft valve body is large, there may be many contact points between the slide shaft valve body and the support portion. This is because processing deformation occurs in the slide shaft valve body or the sleeve. If there are many contact points between the slidable valve body and the support portion, there is a risk that the effect of preventing the degradation of the sliding performance of the slidable valve body and the effect of preventing wear on the sleeve or the slidable valve body may be insufficient.

[0017] (5): In the sliding shaft valve as described in (2), it is preferred that the sliding shaft valve body has a second surface treatment portion formed through a second coating on at least a portion of the outer peripheral surface opposite to the first surface treatment portion; and the hardness of the second coating is higher than the hardness of the first coating.

[0018] In order to improve wear resistance and corrosion resistance, a coating is applied to the outer circumference of the sliding shaft valve body and the inner circumference of the sleeve. At this time, if the hardness of the coating on the outer circumference of the sliding shaft valve body and the hardness of the coating on the inner circumference of the sleeve are the same, the coating may wear when the sliding shaft valve body slides. This wear phenomenon may cause the sliding performance of the sliding shaft valve body to decrease, and in the worst case, it may become impossible to slide. In this case, the inventor has verified that the sliding shaft valve described in (4) can prevent the occurrence of wear by making the hardness of the second coating on the outer circumference of the sliding shaft valve body higher than the hardness of the first coating on the inner circumference of the sleeve. By extension, it can prevent the sliding performance of the sliding shaft valve body from decreasing.

[0019] (6): In the spool valve described in (5), preferably, the first plating film is a chemical plating film; and the second plating film is an electroplating film.

[0020] In order to manage the size of the gap between the outer circumference (outer diameter) of the slide shaft valve body and the inner circumference (inner diameter) of the sleeve, it is very important to set the first surface treatment part and the second surface treatment part to a uniform film thickness. After plating, in order to achieve the specified inner and outer diameter dimensions, the plated surface is ground and the dimensions are adjusted through post-processing. At this time, it is easy to adjust the size of the outer diameter of the slide shaft valve body through processing such as outer diameter grinding, but it is difficult to process the inner diameter of the sleeve. Therefore, as described in (5), the electroplated film (second plating film) that is easy to form an uneven film thickness is processed on the outer circumference of the slide shaft valve body, and the chemical plating film (first plating film) that is easy to process with a uniform film is processed on the inner circumference of the sleeve, so that the size of the gap can be properly managed. In addition, the inventor has verified through experiments that by treating the first plating film and the second plating film in different ways, wear can be prevented when the slide shaft valve body slides.

[0021] (7): In the slide shaft valve as described in any one of (1) to (6), it is preferred that the slide shaft valve, in a temperature adjustment flow control unit for adjusting the temperature of the base by circulating the temperature adjustment fluid in the base of the semiconductor manufacturing device, adjusts the temperature of the temperature adjustment fluid by adjusting the flow rate of a high-temperature fluid input to a first input port among the two or more input ports for increasing the temperature of the temperature adjustment fluid and outputting from a first output port among the two or more output ports, and the flow rate of a low-temperature fluid input to a second input port among the two or more input ports for decreasing the temperature of the temperature adjustment fluid and outputting from a second output port among the two or more output ports; wherein the gap is greater than 7 μm and less than 55 μm, except for a portion that becomes smaller due to the support portion.

[0022] In order to prevent fluid leakage (so-called internal leakage) caused by the gap between the inner circumference of the sleeve and the outer circumference of the slidable shaft valve body, it is necessary to seal between the inner circumference of the sleeve and the outer circumference of the slidable shaft valve body. However, if the sealing is performed, the sliding performance of the slidable shaft valve body will be reduced. Since the slidable shaft valve using the temperature adjustment flow control unit emphasizes the responsiveness, it is disadvantageous that the sliding performance of the slidable shaft valve body is reduced due to the sealing. In order to suppress internal leakage as much as possible without sealing, it is conceivable to reduce the gap between the inner circumference of the sleeve and the outer circumference of the slidable shaft valve body as small as possible. However, if it is reduced too much, the sleeve and the slidable shaft valve body will interfere with each other, which will reduce the sliding performance of the slidable shaft valve body. Therefore, in the slidable shaft valve described in (4), in addition to supporting the slidable shaft valve body through the first surface treatment part, if the gap between the outer circumference of the slidable shaft valve body and the inner circumference outside the first surface treatment part is set to 7μm or less and 55μm or less, the sliding performance of the slidable shaft valve body can be ensured while suppressing the internal leakage of the high-temperature fluid and the low-temperature fluid.

[0023] (8): In the sliding shaft valve described in (1), preferably, the sleeve has the support portion formed by reducing the inner diameter at both ends of the inner peripheral surface in the axial direction; and the reduction amount of the support portion is greater than 4 μm and less than 60 μm.

[0024] (9): In the sliding shaft valve described in (8), it is preferred that the axial width of the support portion is not less than 2% and not more than 15% of the entire axial length of the sleeve.

[0025] According to the sliding shaft body described in (8) or (9), since the sleeve has support portions formed by reducing the inner diameter at both ends of the inner circumferential surface in the axial direction, the sliding shaft valve body can be actively supported through the support portions. Therefore, the area where the sliding shaft valve body and the sleeve interfere with each other is limited to the support portions, which can prevent interference from occurring in multiple places. At this time, the reduction in diameter of the support portion is preferably greater than 4μm and less than 60μm. If the reduction in diameter is less than 4μm, the sliding shaft valve body cannot be fully supported, and interference may occur in areas other than the support portion; in addition, if the reduction in diameter is greater than 60μm, internal leakage may occur between the inner circumferential surface of the sleeve and the sliding shaft valve body.

[0026] In addition, the width of the support portion in the axial direction is preferably not less than 2% and not more than 15% of the total length of the sleeve in the axial direction. This is because if the width of the support portion in the axial direction is less than 2% of the total length of the sleeve in the axial direction, that is, the stress per unit area becomes large, and the sliding of the slide shaft valve body may cause wear of the support portion. If wear occurs, the sliding of the slide shaft valve body may be hindered, which is disadvantageous. In addition, if the width of the support portion in the axial direction is less than 2% of the total length of the sleeve in the axial direction, surface treatment such as plating cannot obtain stable quality, which is disadvantageous. In addition, if the width of the support portion in the axial direction is greater than 15% of the total length of the sleeve in the axial direction, that is, if the surface area of ​​the support portion supporting the slide shaft valve body is large, there may be many contact points between the slide shaft valve body and the support portion. This is because processing deformation occurs in the slide shaft valve body or the sleeve. If there are many contact points between the slide shaft valve body and the support portion, there is a risk that the effect of preventing the slide shaft valve body from being reduced in sliding performance and preventing wear on the sleeve or the slide shaft valve body may be insufficient. Effects of the Invention

[0027] According to the slide shaft valve of the present invention, the interference position between the outer circumference of the slide shaft valve body and the inner circumference of the sleeve can be controlled to prevent the sliding performance of the slide shaft valve from deteriorating and the sleeve or the slide shaft valve body from wearing. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 This is a circuit diagram of a flow control unit for temperature adjustment using the spool valve of the first embodiment. Figure 2 This is a cross-sectional view of a sliding shaft valve. Figure 3 for Figure 2 A partial enlarged view of part A. Figure 4 A cross-sectional view showing the shape of the sleeve. Figure 5 The slide shaft valve of the second embodiment and Figure 3 The corresponding partial enlarged image. Figure 6 It is a cross-sectional view showing the shape of a sleeve of a spool valve according to a third embodiment. DETAILED DESCRIPTION

[0029] <First Embodiment> A first embodiment of the spool valve 21 of the present invention will be described in detail with reference to the drawings.

[0030] <Schematic Configuration of Flow Control Unit for Temperature Adjustment> First, a schematic configuration of a temperature adjustment flow control unit 1 (hereinafter referred to as "unit 1") using the spool valve 21 of the present embodiment will be described. Figure 11 is a circuit diagram of a flow control unit 1 for temperature adjustment using the spool valve 21 of this embodiment. This unit 1 is used in a temperature control system 1001 for controlling the temperature of a semiconductor manufacturing apparatus 1000, for example.

[0031] The semiconductor manufacturing apparatus 1000 of the present embodiment is configured as a RIE (Reactive Ion Etching) type plasma processing apparatus. The semiconductor manufacturing apparatus 1000 performs an etching process controlled at a predetermined temperature on a wafer W held by a susceptor 1002 provided in a processing container (not shown).

[0032] When etching is performed using multiple types of processing gases, different processing conditions are set for each type of processing gas. The processing conditions include the temperature of the wafer W to be processed, and the temperature of the wafer W needs to be consistent with the processing conditions. Therefore, the temperature of the susceptor 1002 holding the wafer W is controlled through the temperature control system 1001.

[0033] The temperature control system 1001 includes a temperature adjustment section 1003 (hereinafter referred to as “temperature adjustment section 1003 ”), a unit 1 , and a cooling unit 1004 .

[0034] The temperature regulating part 1003 is arranged inside the base 1002, so that the temperature regulating fluid outputted from the unit 1 circulates in the base 1002. The temperature regulating fluid is a fluorine-based inert fluid, and its physical properties change little in a wide temperature range. The fluorine-based inert fluid is, for example, an electronic fluorinated liquid manufactured by 3M.

[0035] The cooling unit 1004 includes a cold chiller 1020 and a hot chiller 1010. The cold chiller 1020 circulates a fluorine-based inert fluid (hereinafter referred to as low-temperature fluid) whose temperature is controlled to be lower than the set temperature of the temperature control fluid between the cooling unit 1004 and the unit 1 in order to lower the temperature of the temperature control fluid. The circulation pressure of the low-temperature fluid is controlled by a low-temperature side control valve 1023. In addition, the hot chiller 1010 circulates a fluorine-based inert fluid (hereinafter referred to as high-temperature fluid) whose temperature is controlled to be higher than the set temperature of the temperature control fluid in order to raise the temperature of the temperature control fluid between the cooling unit 1004 and the unit 1. The circulation pressure of the high-temperature fluid is controlled by a high-temperature side control valve 1013. In addition, the temperatures of the above-mentioned low-temperature fluid and high-temperature fluid are appropriately set in accordance with the required set temperature of the temperature control fluid.

[0036] The unit 1 includes a first connecting pipe 1005 for inputting a temperature-controlled fluid into the base 1002, and a second connecting pipe 1006 for outputting the temperature-controlled fluid (hereinafter referred to as the circulated temperature-controlled fluid) after circulating the base 1002. The unit 1 is connected to the base 1002 through the first connecting pipe 1005 and the second connecting pipe 1006.

[0037] Unit 1 includes an output piping 4 connected to the first combined piping 1005, an input piping 3 connected to the second combined piping 1006, a low-temperature fluid input piping 5 and a low-temperature fluid output piping 6 for the flow of low-temperature fluid, a high-temperature fluid input piping 7 and a high-temperature fluid output piping 8 for the flow of high-temperature fluid, a pump 14 for circulating the temperature-regulating fluid, a fluid control unit 9, and a control device 1030.

[0038] The input pipe 3 is provided with a third filter block 43 , a buffer tank 12 , and a pump 14 in this order from the upstream side.

[0039] The circulating temperature-controlled fluid is input to the input pipe 3 from the second combined pipe 1006. Here, the second combined pipe 1006 is provided with a second temperature sensor 61 (an example of a second temperature measuring unit) which can measure the current temperature of the circulating temperature-controlled fluid. The temperature control system 1001 obtains the current temperature of the susceptor 1002 by measuring the current temperature of the circulating temperature-controlled fluid. Since the circulating temperature-controlled fluid is the temperature-controlled fluid after circulating the susceptor 1002, its temperature can be regarded as the temperature of the susceptor 1002. In addition, since the second temperature sensor 61 is provided in the first combined pipe 1005, it is provided on the upstream side of the pump 14. Therefore, it is not affected by the heat generated by the pump 14, and the temperature of the circulating temperature-controlled fluid can be measured. It is difficult to directly measure the temperature of the susceptor in the RIE type plasma processing device due to the influence of the plasma-formed processing gas, etc., but by measuring the current temperature of the circulating temperature-controlled fluid after circulating the susceptor 1002, the temperature of the susceptor 1002 can be stably monitored.

[0040] The output pipe 4 outputs the temperature-controlled fluid to the first connecting pipe 1005. The output pipe 4 is provided with a flow sensor 53 and a first temperature sensor 64 (an example of a first temperature measuring unit) in order from the upstream side. The first temperature sensor 64 measures the temperature of the temperature-controlled fluid output from the output pipe 4.

[0041] The fluid control unit 9 is connected to the temperature control unit 1003 through the input pipe 3 and the output pipe 4. Figure 1 As shown by the dotted arrow D1 , the temperature adjustment fluid circulates between the temperature adjustment part 1003 and the fluid control part 9 .

[0042] The low temperature fluid input pipe 5 and the low temperature fluid output pipe 6 connect the fluid control unit 9 to the cold water chiller 1020. Therefore, if Figure 1 As shown by the dotted arrow D2, the cryogenic fluid is input and output to the fluid control unit 9. The temperature and pressure of the cryogenic fluid input to the fluid control unit 9 are measured by the third temperature sensor 62 and the first pressure sensor 51 provided in the cryogenic fluid input piping 5. In addition, the cryogenic fluid input piping 5 is provided with a first filter block 41. The first filter block 41 is used to remove foreign matter from the cryogenic fluid input from the cryogenic fluid input piping 5 to the fluid control unit 9.

[0043] The high temperature fluid input pipe 7 and the high temperature fluid output pipe 8 connect the fluid control unit 9 to the hot water chiller 1010. Figure 1 As shown by the dotted arrow D3, the high-temperature fluid is input and output to the fluid control unit 9. The temperature and pressure of the high-temperature fluid flowing into the fluid control unit 9 are measured by the fourth temperature sensor 63 and the second pressure sensor 52 provided in the high-temperature fluid input piping 7. In addition, the high-temperature fluid input piping 7 is provided with a second filter block 42. The second filter block 42 is used to remove foreign matter from the high-temperature fluid input piping 7 to the fluid control unit 9.

[0044] The fluid control unit 9 has a branching portion X that branches the input pipe 3 into a first branch line L11, a second branch line L12, and a third branch line L13. The first branch line L11 is connected to the spool valve 21. In addition, the first branch line L11 is provided with a first check valve 54. In addition, the first branch line L11 is connected to a purge mechanism 10 having a purge on / off valve 101 between the spool valve 21 and the first check valve 54. Therefore, for example, during maintenance of the semiconductor manufacturing device 1000, by opening the purge on / off valve 101, purge air can be supplied to the unit 1. The second branch line L12 is connected to the cryogenic fluid output pipe 6. In addition, the second branch line L12 is provided with a second check valve 55. The third branch line L13 is provided with a third check valve 56.

[0045] The low-temperature fluid input pipe 5, the high-temperature fluid input pipe 7, and the first branch line L11 are all connected to the slide valve 21. The slide valve 21 controls and discharges the flow rate (flow distribution ratio) of the fluid supplied from the low-temperature fluid input pipe 5, the high-temperature fluid input pipe 7, and the first branch line L11. In addition, the fluid discharged from the slide valve 21 is mixed at the confluence portion Y and output to the output pipe 4 connected to the confluence portion Y. In addition, the detailed configuration of the slide valve 21 will be described later.

[0046] The fluid mixed at the confluence portion and output to the output pipe 4 is a temperature-adjusting fluid for adjusting the temperature of the susceptor 1002. In other words, the spool valve 21 adjusts the temperature of the temperature-adjusting fluid and outputs it to the output pipe 4 by adjusting the flow distribution ratio of the circulated temperature-adjusting fluid input to the spool valve 21 from the input pipe 3, the low-temperature fluid input to the spool valve 21 from the low-temperature fluid input pipe 5, and the high-temperature fluid input to the spool valve 21 from the high-temperature fluid input pipe 7.

[0047] The flow distribution ratio adjustment by the spool valve 21 (that is, the adjustment of the temperature of the temperature-controlled fluid output to the output pipe 4) is controlled based on a temperature control value generated by the control device 1030 as described later.

[0048] The first to third check valves 54, 55, 56 are automatically adjusted in valve opening according to the flow distribution ratio controlled by the slide shaft valve 21. Therefore, the circulating temperature-adjusting fluid of approximately the same amount of the low-temperature fluid and the high-temperature fluid supplied to the slide shaft valve 21 will return to the cold water chiller 1020 and the hot water chiller 1010.

[0049] Unit 1 has a control device 1030 for controlling the operation of the temperature control system 1001. The control device 1030 can be communicatively connected to various sensors and valves of unit 1. The control device 1030 includes a control substrate 1031, a pump driver 1033, and a valve controller 1032.

[0050] The control substrate 1031 generates a temperature control value for adjusting the temperature control fluid to the desired set temperature. In addition, the temperature measurement values ​​measured by the temperature sensors 61, 62, 63, and 64 and the pressure measurement values ​​measured by the first and second pressure sensors 51 and 52 are obtained from the unit 1 to generate a valve operation signal so that the temperature of the temperature control fluid matches the temperature control value, and is transmitted to the unit 1 through the valve controller 1032. The unit 1 adjusts the flow distribution ratio of the temperature control fluid and the low-temperature fluid and the high-temperature fluid by the spool valve 21 operating according to the valve operation signal to adjust the temperature of the temperature control fluid to the set temperature. Therefore, the temperature of the temperature control fluid is feedback controlled and made uniform.

[0051] In addition, the control substrate 1031 obtains the flow measurement value measured by the flow sensor 53 from the unit 1, generates a pump operation signal, controls the flow of the temperature-controlled fluid to a desired set amount, and transmits it to the unit 1 through the pump driver 1033. The pump 14 operates according to the pump operation signal, and the unit 1 adjusts the flow of the temperature-controlled fluid to the set flow. Therefore, the circulation flow of the temperature-controlled fluid is feedback-controlled and made uniform.

[0052] <Configuration of Sliding Shaft Valve> Next, the configuration of the spool valve 21 of this embodiment will be described in detail using drawings. Figure 2It is a cross-sectional view of the sliding shaft valve 21. Figure 3 for Figure 2 A partial enlarged view of part A. Figure 4 It is a cross-sectional view showing the shape of the sleeve 222.

[0053] The slide shaft valve 21 of this embodiment, as Figure 2 As shown, it includes a valve portion 22 ; a driving portion 23 connected to one end of the valve portion in the axial direction; and a position sensor 25 connected to the other end of the valve portion 22 .

[0054] The driving part 23 is a linear actuator. The driving part 23 includes a movable part 65, a pair of permanent magnets 66, 66 arranged to sandwich the movable part 65, and a coil 67 that generates a magnetic field in the same direction as the pair of permanent magnets 66, 66. The movable part 65 can move in a direction perpendicular to the magnetic field of the permanent magnets 66, 66, and is fixed to one end of the slide shaft valve body 221 (described in detail later) in a state where its moving direction is the same as the sliding direction of the slide shaft valve body 221. The position of the movable part 65 (that is, the position (stroke position) of the axial direction of the slide shaft valve body 221) is based on the direction of power supply to the coil 67 based on the valve operation signal generated by the control substrate 1031, and the magnitude of the power supply voltage and current. In addition, the movable part 65 is sandwiched by springs 68 from both sides in the axial direction. Therefore, when the coil 67 is not energized and the control fluid does not flow into the spool valve 21, the movable member 65 is maintained near the neutral valve position (ie, the stroke position is maintained at the neutral valve position) by the additional force of the spring 68.

[0055] The valve portion 22 includes a slide shaft valve body 221 , a sleeve 222 that slidably holds the slide shaft valve body 221 , and a body 223 that accommodates the slide shaft valve body 221 and the sleeve 222 .

[0056] The body 223 is a substantially rectangular box body, and has first body through holes 224A, 224B, 224C and second body through holes 225A, 225B, 225C communicating with the inside and outside thereof. The first through hole 224A is connected to the low temperature fluid input pipe 5. Thus, the low temperature fluid is supplied to the slide shaft valve 21. The first through hole 224B is connected to the low first branch line L11. Thus, the temperature-adjusted fluid after circulation is supplied to the slide shaft valve 21. The first through hole 224C is connected to the high temperature fluid input pipe 7. Thus, the high temperature fluid is supplied to the slide shaft valve 21. In addition, the second body through hole 225A discharges the low temperature fluid supplied to the slide shaft valve 21 and having its flow rate adjusted therethrough from the slide shaft valve 21. The second body through hole 225B discharges the temperature-adjusted fluid supplied to the slide shaft valve 21 and having its flow rate adjusted therethrough from the slide shaft valve 21. The second body through hole 225C discharges the high temperature fluid supplied to the spool valve 21 and having its flow rate adjusted therethrough from the spool valve 21. The second body through holes 225A, 225B, and 225C are all connected to a confluence portion Y for mixing the fluids discharged from the spool valve 21.

[0057] The sleeve 222 accommodated in the body 223 is made of stainless steel and is cylindrical. The sleeve 222 has a valve chamber 24, and the slide shaft valve body 221 is inserted into the valve chamber 24.

[0058] In addition, the sleeve 222 has input ports 26A, 26B, and 26C on the outer peripheral surface leading to the valve chamber 24. The input port 26A is provided at a position corresponding to the first body through hole 224A, the input port 26B is provided at a position corresponding to the first body through hole 224B, and the input port 26C is provided at a position corresponding to the first body through hole 224C. Therefore, the fluid supplied to the spool valve 21 from the first body through holes 224A, 224B, and 224C can flow into the valve chamber 24.

[0059] In addition, the sleeve 222 has output ports 27A, 27B, and 27C on the outer peripheral surface leading to the valve chamber 24. The output port 27A is provided at a position corresponding to the second body through hole 225A, the output port 27B is provided at a position corresponding to the second body through hole 225B, and the output port 27C is provided at a position corresponding to the second body through hole 225C. Therefore, the fluid flowing into the valve chamber 24 can be discharged from the second through holes 225A, 225B, and 225C through the output ports 27A, 27B, and 27C.

[0060] In addition, the sleeve 222, such as Figure 4 As shown, the inner peripheral surface of the sleeve 222 (valve chamber 24) has first surface treatment portions 29, 29 treated with chemical nickel plating (an example of a first plating film) at both ends in the axial direction. Figure 3As shown, the inner diameter of the first surface treatment portion 29 in the inner circumference of the sleeve 222 (valve chamber 24) is smaller than the other parts of the inner circumference of the sleeve 222 (valve chamber 24) by the thickness t11 of the chemical nickel plating. Therefore, the first surface treatment portions 29, 29 can actively support the sliding shaft valve body 221 sliding in the sleeve 222 (valve chamber 24). In other words, the sliding shaft valve body 221 is supported by both ends of the sleeve 222 in the axial direction. In this way, when the sliding shaft valve body 221 slides, the position where the outer circumference 221a of the sliding shaft valve body 221 interferes with the inner circumference of the sleeve 222 (valve chamber 24) is limited to the first surface treatment portions 29, 29, thereby preventing interference from occurring at multiple positions. Therefore, it is possible to prevent the sliding performance of the sliding shaft valve body 221 from being reduced, and prevent the sleeve 222 or the sliding shaft valve body 221 from being worn. In addition, Figure 2 The film thickness t11 is for ease of understanding and does not represent actual thickness, size, etc.

[0061] The film thickness t11 of the chemical nickel plating is not particularly limited, and is about 3 to 25 μm in the present embodiment. In addition, the chemical nickel plating of the first surface treatment portion 29 is baked at 200 degrees C, and its hardness is a Vickers hardness of 400 to 500 Hv. In addition, in order to achieve the purpose of improving the adhesion of the plated film and not being easy to peel off, the temperature of the baking treatment is set to 200 degrees C, but this is only an example. Chemical nickel plating is that once the temperature of the baking treatment is increased, the hardness will become higher, and the temperature of the baking treatment can be adjusted according to the required hardness.

[0062] The axial coating range PA12 of the first surface treatment portion 29 is greater than 1 mm and less than 15% of the total axial length L51 of the sleeve 222 , and is appropriately set according to the sliding amount of the sliding shaft valve body 221 .

[0063] The slide shaft valve body 221 is cylindrical and made of stainless steel. The outer peripheral surface of the slide shaft valve body 221 is formed with slide shaft circumferential grooves 28A, 28B, and 28C arranged in an array. The slide shaft circumferential groove 28A is formed along the entire circumference of the slide shaft valve body 221 in the circumferential direction. In addition, the axial width dimension of the slide shaft circumferential groove 28A is set to be larger than the axial spacing distance between the input port 26A and the output port 27A of the sleeve 222.

[0064] When the slide shaft circumferential groove 28A overlaps with the input port 26A and the output port 27A, since both the input port 26A and the output port 27A are connected to the slide shaft circumferential groove 28A, the input port 26A and the output port are connected through the slide shaft circumferential groove 28A. Therefore, a series of flow paths are formed from the first body through hole 224A to the second body through hole 225A through the input port 26A, the slide shaft circumferential groove 28A, and the output port 27A. The overlapping width of the slide shaft circumferential groove 28A and the input port 26A and the output port 27A increases or decreases according to the stroke position of the slide shaft valve body 221. In other words, the open area of ​​the input port 26A and the output port 27A is adjusted according to the stroke position of the slide shaft valve body 221 to control the flow rate of the fluid flowing through the above series of flow paths. Furthermore, when at least one of the input port 26A and the output port 27A does not overlap with the slide shaft peripheral groove 28A, the above series of flow paths is blocked. In other words, the fluid cannot flow through the above series of flow paths. In addition, the relationship between the input port 26B, the output port 27B and the slide shaft peripheral groove 28B, and the relationship between the input port 26C, the output port 27C and the slide shaft peripheral groove 28C are the same as described above.

[0065] The outer peripheral surface 221a of the slidable shaft valve body 221 is set to have the same diameter in the entire axial direction except for the portion where the close-sliding shaft circumferential grooves 28A, 28B, and 28C are provided. In addition, the outer diameter of the slidable shaft valve body 221 is set so that the gap g11 between the outer peripheral surface 221a of the slidable shaft valve body 221 and the inner peripheral surface of the sleeve 222 (valve chamber 24) is 7 μm or more and 55 μm or less. This is to ensure the sliding performance of the slidable shaft valve body 221 and suppress leakage (so-called internal leakage) caused by the gap g11. In addition, the gap g11 referred to here is obtained by assuming that the slidable shaft valve body 221 and the sleeve 222 are provided coaxially, and the difference between the diameter of the inner peripheral surface of the sleeve 222 and the diameter of the outer peripheral surface of the slidable shaft valve body 221 is divided by 2.

[0066] When the gap g11 is larger than 55 μm, the amount of internal leakage of the fluid may increase between the series of flow paths from the first body through hole 224A to the second body through hole 225A, the series of flow paths from the first body through hole 224B to the second body through hole 225B, and the series of flow paths from the first body through hole 224C to the second body through hole 225C. In order to suppress internal leakage, it is conceivable to make the gap g11 as small as possible, but when the gap g11 is smaller than 7 μm, interference between the sleeve 222 and the slide shaft valve body 221 may occur, and the sliding performance of the slide shaft valve body 221 may be reduced. Therefore, as described above, the gap g11 is set to be greater than 7 μm and less than 55 μm.

[0067] In addition, the outer peripheral surface 221a of the slide shaft valve body 221 is a second surface treatment portion 30 in which the outer peripheral surface 221a of the slide shaft valve body 221 (including the slide shaft peripheral grooves 28A, 28B, and 28C) is fully plated (specifically, plated with hard chrome). The hardness of this hard chrome plating film is about 800 Hv in Vickers hardness.

[0068] When the slide shaft valve body 221 slides in the valve chamber 24, the first surface treatment part 29 actively supports the slide shaft valve body 221, so the first surface treatment part 29 and the second surface treatment part 30 (the outer peripheral surface 221a of the slide shaft valve body 221) are in a state of mutual friction. In this case, the first surface treatment part 29 relative to the sleeve 222 is a chemical nickel plating film, and the second surface treatment part 30 is a hard chrome plating film. Moreover, the hardness of the first surface treatment part 29 is 400 to 500 Hv Vickers hardness, and the hardness of the second surface treatment part 30 is about 800 Hv Vickers hardness, which is higher than the hardness of the first surface treatment part 29. In other words, different types of plating films and plating films with different hardnesses rub against each other. Therefore, the phenomenon of plating film wear can be prevented, and the sliding performance of the slide shaft valve body can be prevented from being reduced.

[0069] In addition, it is not easy to plate the inner circumference of the sleeve 222, but it is easier to plate the outer circumference of the slide shaft valve body 221. Therefore, as described above, the first surface treatment portion 29 is made of chemical nickel plating, which is expensive but easy to control the film thickness, and the second surface treatment portion 30 is made of hard chrome plating, which is cheaper than chemical plating, to optimize the cost.

[0070] The position sensor 25 is a sensor for detecting the stroke position of the spool valve body 221. Feedback control of the stroke position can be performed based on the result of detection by the position sensor 25. As the position sensor 25, for example, a magnetostrictive sensor can be used.

[0071] As described above, the slide shaft valve 21 of the present embodiment (1) comprises a cylindrical sleeve 222, a slide shaft valve body 221, and a support portion. The sleeve 222 comprises two or more input ports 26A, 26B, 26C and two or more output ports 27A, 27B, 27C communicating with the inside of the sleeve 222. The slide shaft valve body 221 slides in the sleeve 222 along the axial direction of the sleeve 222. In the slide shaft valve 21 in which the open areas of the input ports 26A, 26B, 26C and the output ports 27A, 27B, 27C are adjusted by sliding the slide shaft valve body 221, the support portion makes the gap g11 between the inner peripheral surface of the sleeve 222 and the outer peripheral surface of the slide shaft valve body 221 smaller than other portions at at least one of the sleeve 222 and the slide shaft valve body 221 at both ends in the axial direction of the sleeve 222, and supports the sliding of the slide shaft valve body 221.

[0072] (2): In the sliding shaft valve 21 described in (1), preferably, the sleeve 222 has a first surface treatment portion 29 formed by a first plating film (such as chemical nickel plating) at both ends of its inner circumference in the axial direction, and the first surface treatment portion 29 is the aforementioned support portion.

[0073] According to the slidable shaft valve 21 described in (1) and (2), the sleeve 222 has a support portion (first surface treatment portion 29) at both ends of the sleeve 222 in the axial direction, which makes the gap between the inner circumference of the sleeve 222 and the outer circumference of the slidable shaft valve body 221 smaller than other portions and supports the sliding of the slidable shaft valve body. Therefore, the slidable shaft valve body 221 can be actively supported by the support portion (first surface treatment portion 29). The "support" referred to here does not mean that the slidable shaft valve body 221 is fixed, but means that the sliding of the slidable shaft valve body 221 is guided so that the slidable shaft valve body 221 does not interfere with the portion other than the support portion (first surface treatment portion 29) in the inner circumference of the sleeve 222. In other words, the portion where the outer circumference of the slidable shaft valve body 221 interferes with the inner circumference of the sleeve 222 is limited to the support portion (first surface treatment portion 29), and interference at multiple positions can be prevented. Therefore, it is possible to prevent the sliding performance of the slidable shaft valve body 221 from being degraded and the occurrence of wear on the sleeve 222 or the slidable shaft valve body 221 .

[0074] In addition, (4): In the slide shaft valve described in (2), the axial width PA12 of the support portion (first surface treatment portion 29) is preferably not less than 1 mm and not more than 15% of the total axial length L51 of the sleeve 222. This is because if the width of the support portion (first surface treatment portion 29) is less than 1 mm, that is, if the surface area of ​​the support portion (first surface treatment portion 29) used to support the slide shaft valve body 221 is small, the stress per unit area becomes large, and the support portion (first surface treatment portion 29) may be worn due to the sliding of the slide shaft valve body 221. If wear occurs, it may hinder the sliding of the slide shaft valve body 221, which is disadvantageous. In addition, if the axial width of the support portion (first surface treatment portion 29) is less than 1 mm, it is not possible to obtain a stable quality of the surface treatment such as plating (for example, chemical nickel plating), which is disadvantageous. Furthermore, if the width PA12 of the support portion (first surface treatment portion 29) is greater than 15% of the total length L51 of the sleeve, that is, if the surface area of ​​the support portion (first surface treatment portion 29) for supporting the slide shaft valve body 221 is large, there may be many contact points between the slide shaft valve body 221 and the support portion (first surface treatment portion 29). This is because machining deformation occurs in the slide shaft valve body 221 or the sleeve 222. If there are many contact points between the slide shaft valve body 221 and the support portion (first surface treatment portion 29), there is a risk that the effect of preventing the slide shaft valve body 221 from deteriorating in sliding performance and preventing wear on the sleeve 222 or the slide shaft valve body 221 may be insufficient.

[0075] (5): In the sliding shaft valve 21 described in (2), the sliding shaft valve body 221 preferably has a second surface treatment portion 30 formed by a second plating film (for example, a hard chrome plating film) in a portion of the outer peripheral surface opposite to at least the first surface treatment portion 29, and the hardness of the second plating film (hard chrome plating film) (for example, a Vickers hardness of approximately 800 Hv) is higher than the hardness of the first plating film (chemical nickel plating film) (for example, a Vickers hardness of 400 to 500 Hv).

[0076] If the hardness of the first plating film and the second plating film is the same, the inventors of the present invention have verified through experiments that the plating films may wear when the slide shaft valve body 221 slides. This wear phenomenon may cause the sliding performance of the slide shaft valve body 221 to decrease. In this case, as in the slide shaft valve 21 described in (2), by making the hardness of the second plating film (hard chrome plating film) on the outer peripheral surface of the slide shaft valve body 221 higher than the hardness of the first plating film (chemical nickel plating film) on the inner peripheral surface of the sleeve 222, the inventors have verified that the wear phenomenon can be prevented, and by extension, the sliding performance of the slide shaft valve body 221 can be prevented from decreasing.

[0077] (6) In the spool valve 21 described in (5), preferably, the first plating film is a chemical plating film (chemical nickel plating film), and the second plating film is an electroplating film (hard chrome plating film).

[0078] In order to manage the size of the gap g11 between the outer circumference (outer diameter) of the slidable shaft valve body 221 and the inner circumference (inner diameter) of the sleeve 222, it is important to set the film thickness of the first surface treatment part 29 and the second surface treatment part 30 to be uniform. After plating, in order to achieve the specified inner and outer diameter dimensions, the plated surface is polished, etc., and the dimensions are adjusted through post-processing. At this time, it is easy to adjust the size of the outer diameter of the slidable shaft valve body 221 through processing such as outer diameter polishing, but it is difficult to process the inner diameter of the sleeve 222. Therefore, as described in (5), the slidable shaft valve 21 processes the electroplated film (second plating film) that is easy to form uneven film thickness on the outer circumference of the slidable shaft valve body 221, and processes the chemical plating film (first plating film) that is easy to process as a uniform film on the inner circumference of the sleeve 222, so that the size of the gap g11 can be appropriately managed. Furthermore, the inventor has verified through experiments that by subjecting the first coating and the second coating to different types of treatments, it is possible to prevent the sliding shaft valve body 221 from being worn when sliding.

[0079] (7) In the slide shaft valve 21 described in (1) to (6), the slide shaft valve 21 is a temperature adjustment flow control unit 1 for adjusting the temperature of the base 1002 of the semiconductor manufacturing device 1000 by circulating the temperature adjustment fluid on the base 1002. Preferably, the temperature of the temperature adjustment fluid is adjusted by adjusting the flow rate of the low-temperature fluid input from the first input port 26A among the two or more input ports for lowering the temperature of the temperature adjustment fluid and the flow rate of the high-temperature fluid input from the second input port 26C among the two or more input ports for raising the temperature of the temperature adjustment fluid and the flow rate of the high-temperature fluid input from the second output port 27C among the two or more output ports, and the gap g11 between the outer peripheral surface of the slide shaft valve body 221 and the aforementioned inner peripheral surface other than the first surface treatment portion 29 is greater than 7 μm and less than 55 μm.

[0080] In order to prevent fluid leakage (so-called internal leakage) caused by the gap g11 between the inner circumference of the sleeve 222 and the outer circumference of the slidable shaft valve body 221, a seal is required between the inner circumference of the sleeve 222 and the outer circumference of the slidable shaft valve body 221. However, if the seal is performed, the sliding performance of the slidable shaft valve body 221 will be reduced. Since the slidable shaft valve 21 of the temperature adjustment flow control unit 1 emphasizes the responsiveness, it is disadvantageous that the sliding performance of the slidable shaft valve body 221 is reduced due to the seal. In order to suppress internal leakage as much as possible without sealing, it is conceivable to reduce the gap g11 between the inner circumference of the sleeve 222 and the outer circumference of the slidable shaft valve body 221 as much as possible. However, if it is reduced too much, the sleeve 222 and the slidable shaft valve body 221 will interfere with each other, which will reduce the sliding performance of the slidable shaft valve body 221. Therefore, in the sliding shaft valve described in (4), in addition to supporting the sliding shaft valve body 221 through the first surface treatment portion 29, if the gap g11 between the outer peripheral surface of the sliding shaft valve body 221 and the inner peripheral surface outside the first surface treatment portion 29 is set to be less than 7μm and less than 55μm, the sliding performance of the sliding shaft valve body 221 can be ensured while suppressing internal leakage of high-temperature fluid and low-temperature fluid.

[0081] <Second Embodiment> Next, the differences between the spool valve of the second embodiment and the first embodiment will be described. Figure 5 The slide shaft valve of the second embodiment and Figure 3 The corresponding partial enlargement.

[0082] In the slidable shaft valve of the second embodiment, the slidable shaft valve body 221 has a support portion for supporting the sliding of the slidable shaft valve body 221. This support portion is composed of a surface treatment portion 31; the surface treatment portion 31 is formed by electroplating on the outer peripheral surface of the slidable shaft valve 21 and is opposite to the two ends in the axial direction of the inner peripheral surface of the sleeve 222. The gap g11 between the surface treatment portion 31 (support portion) and the two ends in the axial direction of the sleeve 222 is smaller than that of other portions, so that the sliding of the slidable shaft valve body 221 can be supported.

[0083] The thickness t12 of the electroplated film is not particularly limited, but is about 3 to 25 μm in this embodiment. In addition, the electroplating range PA22 of the first surface treatment portion 29 in the axial direction is set to at least twice the axial sliding distance of the slidable valve body 221 in consideration of tolerances, etc.

[0084] The inner peripheral surface of the sleeve 222 is a surface treatment portion 32 formed by chemical nickel plating. The chemical nickel plating film is baked at 200 degrees C, and its hardness is 400 to 500 Hv Vickers hardness. In addition, in order to improve the adhesion of the plating film and make it difficult to peel off, the baking temperature is set to 200 degrees C, but this is an example. It is well known that the hardness of the chemical nickel plating film increases when the baking temperature is increased, so the baking temperature can be adjusted according to the required hardness.

[0085] In this way, since the slide valve body 221 has a support portion (surface treatment portion 31) that supports the sliding of the slide shaft valve body 221, the region where the outer peripheral surface of the slide shaft valve body 221 interferes with the inner peripheral surface of the sleeve 222 is limited to the support portion (surface treatment portion 31), so interference at multiple positions can be prevented. Therefore, it is possible to prevent the sliding performance of the slide shaft valve body 221 from being reduced and the sleeve 222 or the slide shaft valve body 221 from being worn.

[0086] <Third Embodiment> Next, the differences between the spool valve of the third embodiment and the first embodiment will be described. Figure 6 This is a cross-sectional view showing the shape of the sleeve 226 of the spool valve of the third embodiment. Please note that the referenced drawings are deformed for easier understanding of the description and do not accurately show the shapes and dimensions.

[0087] At both ends of the sleeve 226 in the axial direction, the inner circumferential surface 228 thereof gradually reduces in diameter toward the outside in the axial direction according to the inclined portion 229. Therefore, support portions 227 are formed at both ends of the sleeve 226 in the axial direction. By forming the support portions 227 in this way, the slide shaft valve body 221 inserted into the sleeve 226 is actively supported by the support portions 227. Therefore, the region where the slide shaft valve body 221 and the sleeve 226 interfere is limited to the support portions 227, and interference can be prevented from occurring at multiple locations. In addition, the slide shaft valve body 221 referred to here is the same object as the slide shaft valve body 221 of the first embodiment.

[0088] At this time, the reduction amount, that is, the value of the inner diameter D12 of the sleeve 226 minus the inner diameter D11 of the support portion 227, is preferably 4 μm or more and 60 μm or less. This is because if the reduction amount is less than 4 μm, the slide shaft valve body 221 cannot be fully supported, and interference may occur in the area outside the support portion 227; in addition, if the reduction amount is greater than 60 μm, internal leakage may occur between the inner circumferential surface 228 of the sleeve 226 and the slide shaft valve body 221.

[0089] Furthermore, the width A11 of the support portion 227 in the axial direction is preferably not less than 2% and not more than 15% of the total length L52 of the sleeve 226 in the axial direction. This is because if the width A11 of the support portion 227 is less than 2% of the total length L52 of the sleeve 226, that is, the surface area of ​​the support portion 227 for supporting the slide shaft valve body 221 is small, the stress per unit area will increase, and the sliding of the slide valve body 221 may cause the support portion 227 to wear. If wear occurs, it will hinder the sliding of the slide shaft valve body 221, which is disadvantageous. Furthermore, if the width A11 of the support portion 227 in the axial direction is less than 2% of the total length L52 of the sleeve in the axial direction, the surface treatment such as plating (for example, chemical nickel plating) cannot obtain stable quality, which is disadvantageous. Furthermore, if the width A11 of the support portion 227 is greater than 15% of the total length L52 of the sleeve 226, that is, the surface area of ​​the support portion 227 for supporting the slide shaft valve body 221 is large, there may be many contact points between the slide shaft valve body 221 and the support portion 226 because of processing deformation in the slide shaft valve body 221 or the sleeve 226. If there are many contact points between the slide shaft valve body 221 and the support portion 227, there is a risk that the effect of preventing the slide shaft valve body 221 from deteriorating in sliding performance and from wearing in the sleeve 226 or the slide shaft valve body 221 may be insufficient.

[0090] Note that in this embodiment, the inner circumference of the sleeve 226 including the support portion 227 and the inclined portion 229 is treated with chemical nickel plating. In contrast, the outer circumference of the slide shaft valve body 221 inserted into the sleeve 226 is treated with electroplating (hard chrome plating) on ​​the entire surface.

[0091] In addition, the above embodiments are merely exemplary and are not intended to limit the present invention. Therefore, various improvements and changes may be made to the present invention without departing from the spirit of the present invention. For example, in the above embodiments, an example in which the spool valve 21 is used in the semiconductor manufacturing device 1000 is described, but the spool valve 21 may be used in devices other than the semiconductor manufacturing device 1000. Explanation of symbols

[0092] 21 Sliding shaft valve 26A input port 26B input port 26C input port 27A output port 27B output port 27C output port 291st Surface Treatment Department 221 sliding shaft valve body 222 sleeve

Claims

1. A sliding shaft valve, comprising: A cylindrical sleeve; Wherein, the sleeve has more than two input ports and more than two output ports, which are connected to the interior of the sleeve; A sliding shaft valve body slides inside the sleeve along the axial direction of the sleeve; Wherein, in the slide shaft valve, the open areas of the input port and the output port are adjusted by sliding the slide shaft valve body; The support portion is provided on at least one of the sleeve and the sliding shaft valve body, so that the gap between the inner peripheral surface of the sleeve and the outer peripheral surface of the sliding shaft valve body at both ends of the sleeve in the axial direction is smaller than other parts, and supports the sliding of the sliding shaft valve body.

2. The spool valve according to claim 1, wherein The sleeve has a first surface treatment portion formed by a first plating film at both ends of the inner circumferential surface of the sleeve in the axial direction; The first surface treatment portion is the support portion.

3. The spool valve according to claim 1, wherein The outer peripheral surface of the slide shaft valve body and the inner peripheral surface of the sleeve have surface treatment portions formed by a transparent electroplating film at the portions facing each other at both ends in the axial direction; The surface treatment portion is the support portion.

4. The spool valve according to claim 2, wherein The width of the support portion in the axial direction is greater than or equal to 1 mm and less than or equal to 15% of the total length of the sleeve in the axial direction.

5. The spool valve according to claim 2, wherein The slide shaft valve body has a second surface treatment portion formed through a second plating film on at least a portion of the outer peripheral surface facing the first surface treatment portion; The second plating film has a higher hardness than the first plating film.

6. The spool valve according to claim 5, wherein The first coating is a chemical coating; The second plating film is an electroplating film.

7. The spool valve according to any one of claims 1 to 6, wherein The spool valve is used in a temperature regulating flow control unit for regulating the temperature of a susceptor by circulating a temperature regulating fluid in the susceptor of a semiconductor manufacturing device. The temperature of the temperature regulating fluid is adjusted by the flow rate of the low-temperature fluid input into the first input port of the two or more input ports for lowering the temperature of the temperature regulating fluid and output from the first output port of the two or more output ports, and the flow rate of the high-temperature fluid input into the second input port of the two or more input ports for raising the temperature of the temperature regulating fluid and output from the second output port of the two or more output ports; in, The gap is not less than 7 μm and not more than 55 μm, excluding a portion that is narrowed by the support portion.

8. The spool valve of claim 1, wherein The sleeve has the support portion formed by reducing the inner diameter at both ends in the axial direction of the inner peripheral surface; The support portion has a diameter reduction amount of 4 μm or more and 60 μm or less.

9. The spool valve according to claim 8, wherein The width of the support portion in the axial direction is not less than 2% and not more than 15% of the entire length of the sleeve in the axial direction.

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