Waste residue treatment device for preparing cuprous chloride by dry method and operation method of waste residue treatment device

Abstract

The invention relates to the technical field of waste recycling, and discloses a waste residue treatment device for preparing cuprous chloride through a dry method and an operation method thereof.The waste residue treatment device comprises an acid dissolution tank, a reaction cavity and a cleaning cavity are formed in the acid dissolution tank, a separation base is arranged in the reaction cavity, smooth and arc-shaped faces are arranged on the two sides of the separation base, and the separation base is arranged in the acid dissolution tank; the reaction cavity is divided into two parts by the separation seat, air blowing openings are formed in the two sides of the separation seat, and the positions of the air blowing openings in the two sides are staggered. According to the waste residue treatment device for preparing cuprous chloride by the dry method and the operation method of the waste residue treatment device, waste residues and a solution at the bottom are blown by wind power, so that the solution and the waste residues rapidly flow, the waste residues are always suspended in the solution, are more uniformly distributed in the solution and are in full contact with the solution, and the reaction rate is ensured; through full contact of air with a proper temperature and a solution, local overhigh temperature can be avoided, and the control capability on the temperature can be enhanced, so that the acid dissolution reaction is always kept at the optimal temperature.

Description

Technical Field

[0001] The present application relates to the technical field of waste recycling, and in particular to a waste residue treatment device for preparing cuprous chloride by dry method and an operation method thereof. Background Art

[0002] The dry method for preparing cuprous chloride is usually to heat and melt copper powder and then introduce chlorine gas to obtain a cuprous chloride melt, which is then poured into a suitable container and naturally cooled and dried to obtain a cuprous chloride solid. The unreacted copper powder and other waste residues are insoluble in cuprous chloride and will remain at the bottom of the container or adhere to the surface of the cuprous chloride solid. The waste residues can be separated from the cuprous chloride by simple physical methods such as scraping and screening. The main component of the waste residues is the unreacted copper powder and other waste residues. In order to protect the environment and improve the utilization rate of raw materials, these waste residues are usually reused in the preparation process of cuprous chloride. However, since the waste residues contain a lot of impurities, which will affect the subsequent reaction, the waste residues need to be purified first.

[0003] Acid dissolution is a commonly used purification method. The acid dissolution reaction is usually carried out in a reactor or a stirred leaching tank / tower. Due to the large difference in density between the waste residue and the solution, the waste residue tends to aggregate under the action of centrifugal force during stirring, resulting in poor mixing effect between the waste residue and the solution. In addition, in an acidic environment, the stirring blades are easily worn and corroded, increasing the equipment maintenance cost.

[0004] On the other hand, in the acid dissolution reaction, too low a temperature will lead to a low reaction rate, while too high a temperature will increase impurities and affect the purification effect. During the reaction, there may be a problem of local excessive temperature at the location where local materials gather and near the heating element. Summary of the invention

[0005] The present application proposes a waste residue treatment device for preparing cuprous chloride by dry method and an operation method thereof. The waste residue and the solution at the bottom are blown by wind force, so that the solution and the waste residue flow quickly, and the waste residue is always suspended in the solution. The waste residue is more evenly distributed in the solution and fully contacts with the solution, so as to ensure the reaction rate. Secondly, through the full contact between the wind of suitable temperature and the solution, it can avoid the local temperature from being too high and can also enhance the ability to control the temperature, so that the acid-dissolving reaction is always maintained at the optimal temperature.

[0006] To achieve the above-mentioned purpose, the present application adopts the following technical scheme: a waste residue treatment device for dry preparation of cuprous chloride, comprising an acid dissolving tank, a reaction chamber and a cleaning chamber are arranged in the acid dissolving tank, a heating rod is arranged in the reaction chamber, a partition seat is arranged in the reaction chamber, both sides of the partition seat are provided with smooth, arc-shaped surfaces, the partition seat divides the reaction chamber into two parts, both sides of the partition seat are provided with blowing ports, the blowing ports on both sides are staggered, the spray outlets of the two blowing ports are facing the partition seat, the blowing port is connected to a fan, a liquid extraction part is arranged between the reaction chamber and the cleaning chamber, the liquid extraction part is connected to an acid-resistant pump, after the acid dissolving reaction in the reaction chamber is completed, the liquid extraction part sucks the solution and waste residue in the reaction chamber into the cleaning chamber, a filter box is arranged in the cleaning chamber, the filter box includes a collecting chamber, a filter screen is arranged on the side of the collecting chamber facing the cleaning chamber, the filter box is connected to a discharge port, the discharge port is connected to an acid container for collecting the solution, and after the valve on the filter box is opened, the solution flows into the acid container for storage.

[0007] Furthermore, the separating seat includes a connecting seat, and a return slope and a blowing slope are provided on both sides of the connecting seat, and the return slope is opposite to the blowing slope on the opposite side, and the blowing slope is lower than the return slope. The height gradually increases from one side of the return slope close to the blowing slope to the other side, and the nozzle of the blowing port is aligned with the blowing slope to reduce the width of the blowing port and reduce the power requirement of the heating component. In this process, the wind force breaks the equilibrium state, so that the solution and waste residue move continuously and quickly, and the waste residue and temperature in the solution are evenly distributed.

[0008] Furthermore, a cover plate is provided above the reaction chamber and the cleaning chamber, and the cover plate seals the top of the reaction chamber and the cleaning chamber. The fan is arranged at the top of the acid dissolving tank, and the air inlet of the fan passes through the cover plate and is located at the top of the acid dissolving tank. The fan takes air from the top of the reaction chamber and the cleaning chamber, and the gas always circulates in the reaction chamber and the cleaning chamber to avoid the gas carrying excessive temperature.

[0009] Furthermore, a feeding chamber is provided on one side of the acid dissolving tank, and the bottom of the feeding chamber is connected to the reaction chamber.

[0010] Furthermore, the fan is provided with a heating component, which heats the gas flowing through it through a thermoelectric heating plate. A temperature sensor is provided in the cleaning chamber. When it is detected that the temperature of the solution in the cleaning chamber is higher than the upper limit value, the heating component cools down. When the temperature sensor detects that the temperature of the solution in the cleaning chamber is lower than the upper limit value, the heating component heats up. The temperature of the gas heated by the heating component does not exceed the set solution reaction temperature.

[0011] Furthermore, a partition seat and an air blowing port are also provided in the cleaning chamber. When the liquid extraction component transfers the solution and waste residue in the reaction chamber to the cleaning chamber, the fan and heating component corresponding to the air blowing port in the cleaning chamber are kept turned on, and the heating component is in a heating state.

[0012] Furthermore, the top of the filter box is connected to a water pipe, which is connected to an external water source. The bottom of the filter box is connected to a discharge port. The discharge port is provided with a three-position three-way valve. The water outlet of the three-way valve is connected to the acid container and the wastewater collection container. When cleaning the waste residue, the three-position three-way valve is closed. After the cleaning is completed, the three-position three-way valve is switched to connect the filter box and the wastewater collection container. When the acid solution flows out, the water pipe injects deionized water into the filter box. The deionized water is heated to the same temperature as the solution, so that the acid solution and its dissolved substances remaining on the surface of the waste residue are quickly dissolved into the water and separated from the waste residue. At the same time, water flows into the cleaning chamber from the back of the filter screen on the filter box to backwash the filter screen and wash away the waste residue stuck on the filter screen.

[0013] An operating method of a waste residue treatment device for preparing cuprous chloride by dry method, comprising the steps of: S1, inject an appropriate amount of acid solution into the reaction chamber and heat it to a set temperature through a heating rod; S2, turn on the fan and heating assembly corresponding to the reaction chamber, and put the waste slag into the feed port, and the waste slag flows to the blowing port on one side under the guidance of the inclined surface; S3. When the acid dissolution reaction reaches the set time, the liquid extraction part is turned on to extract the solution and waste residue in the reaction chamber into the cleaning chamber. After the extraction is completed, the fan corresponding to the reaction chamber is turned off; S4. In step S3, the three-position three-way valve is switched to connect the acid container and the filter box, and the fan and heating assembly corresponding to the cleaning chamber are turned on at the same time; S5. When the acid solution is completely drained, the three-position three-way valve is switched to the closed state, and the waste residue is started to be cleaned. Whether it is completely drained is determined by the discharge speed of the discharge port. The water pipe is opened to inject an appropriate amount of deionized water into the filter box and the cleaning chamber. The deionized water is heated to the same temperature as the solution. S6. When the first cleaning is completed, the three-position three-way valve is switched to connect the wastewater collection container and the filter box to discharge the wastewater. After the wastewater is completely discharged, the three-position three-way valve is switched to a closed state; S7. After completing the set cleaning times, remove the waste residue.

[0014] The beneficial effects of the present invention are as follows: The present application provides a waste residue treatment device for preparing cuprous chloride by dry method and an operation method thereof. By blowing the waste residue and the solution at the bottom with wind, the waste residue and part of the solution are moved along the surface of the separator to above the solution on the other side, thereby destroying the equilibrium state of the solution, making the solution and the waste residue flow rapidly, and making the waste residue always suspended in the solution. On the one hand, the waste residue is more evenly distributed in the solution and fully contacts with the solution, thereby ensuring the reaction rate. On the other hand, the waste residue is less affected by the acid and has higher reliability.

[0015] Secondly, the waste residue in the solution is more evenly distributed to avoid over-concentration of the reaction. Moreover, through the full contact of the wind at the appropriate temperature with the solution, it can not only avoid excessive local temperature, but also enhance the ability to control the temperature, so that the acid-dissolving reaction is always maintained at the optimal temperature. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art are briefly introduced below. Obviously, the drawings in the following description are only embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on the provided drawings without creative work: Figure 1 It is a three-dimensional schematic diagram of the present invention; Figure 2 For the present invention Figure 1 Partial cross-sectional view after cutting at AA in the middle; Figure 3 For the present invention Figure 2 A front view of Figure 4 For the present invention Figure 2 Top view of (cover plate removed); Figure 5 For the present invention Figure 4 A three-dimensional schematic diagram of Figure 6 It is a schematic diagram of the separator in the present invention.

[0017] In the figure: 1. Acid dissolving tank; 2. Reaction chamber; 3. Cleaning chamber; 4. Partition seat; 401. Connecting seat; 402. Blowing slope; 403. Reflux slope; 5. Blowing port; 6. Fan; 7. Liquid extraction part; 701. Transfer port; 702. Discharge collection chamber; 703. Discharge port; 8. Filter box; 9. Discharge port; 10. Collection port; 11. Heating component; 12. Water pipe; 13. Feeding chamber; 14. Discharge port. DETAILED DESCRIPTION

[0018] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0019] For example, see Figure 1-Figure 5A waste residue treatment device for preparing cuprous chloride by dry method comprises an acid dissolving tank 1, wherein a reaction chamber 2 and a cleaning chamber 3 are arranged in the acid dissolving tank 1, wherein the reaction chamber 2 and the cleaning chamber 3 are independent of each other, wherein a heating rod is arranged in the reaction chamber 2, which can heat the solution to make the solution reach the optimal reaction temperature, wherein a partition seat 4 is arranged in the middle of the reaction chamber 2 and the cleaning chamber 3, wherein both sides of the partition seat 4 are provided with smooth, arc-shaped surfaces, and the partition seat 4 is made of a material resistant to acid corrosion, for example, 316L Stainless steel, the partition seat 4 is fixedly installed at the bottom of the reaction chamber 2 or the cleaning chamber 3, the partition seat 4 divides the reaction chamber 2 or the cleaning chamber 3 into two parts, and blowing ports 5 are provided on both sides of the partition seat 4. The blowing ports 5 on both sides are staggered, and the nozzles of the two blowing ports 5 are facing the partition seat 4. The blowing ports 5 are connected to the fan 6, and the fan 6 provides high-energy air. The air is blown out from the partition seat 4, blowing the waste residue and the nearby solution to move, so that the waste residue and the nearby solution move along the surface of the partition seat 4, and the waste residue and the nearby solution flow to the other side at the top of the partition seat 4. In this process, the waste residue and the solution circulate in the horizontal direction and in the vertical direction, and the flow speed is fast, so that the waste residue is always evenly suspended in the acid solution, and the waste residue is fully in contact with the acid to ensure the reaction speed. A liquid extraction member 7 is provided between the reaction chamber 2 and the cleaning chamber 3, and the liquid extraction member 7 is connected to an acid-resistant pump. The liquid extraction member 7 includes a discharge port 703, and the discharge port 703 is provided at the lowest point of the reaction chamber 2. The discharge port 703 is connected to the discharge collection chamber 702, and the discharge collection chamber 702 is connected to the transfer port 701. The liquid outlet of the transfer port 701 is located in the cleaning chamber 3. After the acid dissolution reaction in the reaction chamber 2 is completed, that is, after the set time is reached, the liquid extraction member 7 sucks the solution and waste residue in the reaction chamber 2 into the cleaning chamber 3. In this embodiment, the reaction chamber 2 and the cleaning chamber 3 are connected. The height is the same. In other embodiments, the height of the cleaning chamber 3 is lower than that of the reaction chamber 2. Gravity can also be used to allow the solution and waste residue in the reaction chamber 2 to naturally flow into the cleaning chamber 3. A filter box 8 is provided in the cleaning chamber 3. The filter box 8 includes a collecting chamber. A filter screen is provided on the side of the collecting chamber facing the cleaning chamber 3. The solution passes through the filter box 8, while the waste residue is intercepted by the filter box 8 and retained in the cleaning chamber 3. The filter box 8 is connected to the discharge port 9, and the discharge port 9 is connected to an acid container for collecting the solution. After the valve on the filter box 8 is opened, the solution flows into the acid container for storage.

[0020] See also Figure 6The partition seat 4 includes a connecting seat 401, and both sides of the connecting seat 401 are provided with a return slope 402 and a blowing slope 403, and the return slope 402 is opposite to the blowing slope 403 on the opposite side, and the blowing slope 403 is lower than the return slope 402. Along the return slope 402 close to the blowing slope 403 from one side to the other side, the height gradually increases, that is, the radius of the return slope 402 gradually decreases, and the nozzle of the blowing port 5 is aligned with the blowing slope 403, and the waste residue is blown along the blowing slope 403. 03 moves over the top of the connecting seat 401 and reaches the range of the return slope 402 on the other side. Under the action of gravity and solution, the waste residue gradually flows to the blowing slope 403 on the other side, and is finally blown back to the range of the return slope 402 on the initial side by the blowing port 5 on the opposite side, effectively reducing the width of the blowing port 5 and the power requirement of the heating component 11. In this process, the wind force breaks the equilibrium state, causing the solution and waste residue to move continuously and quickly, so that the waste residue and temperature in the solution are evenly distributed.

[0021] See also Figure 1-Figure 3 The fan 6 is arranged at the top of the acid dissolving tank 1, and the air inlet of the fan 6 is located at the top of the acid dissolving tank 1. There is a cover plate above the reaction chamber 2 and the cleaning chamber 3, and the cover plate seals the top of the reaction chamber 2 and the cleaning chamber 3. The fan 6 takes air from the top of the reaction chamber 2 and the cleaning chamber 3, and the gas always circulates in the reaction chamber 2 and the cleaning chamber 3 to avoid the gas from carrying too much temperature. Since the gas contains volatile acid, the fan 6 and its pipeline are resistant to acid corrosion. A heating component 11 is provided on the fan 6, and the heating component 11 heats the flowing gas through a thermoelectric heating plate. A temperature sensor is provided in the cleaning chamber 3. When it is detected that the temperature of the solution in the cleaning chamber 3 is higher than the upper limit value, the heating component 11 is cooled, and the gas blown out of the blowing port 5 has a low temperature, and the gas and the solution are quickly The mixing of the solution lowers the solution temperature, avoids the solution temperature being too high and generates a large amount of impurities. When the temperature sensor detects that the solution temperature in the cleaning chamber 3 is lower than the upper limit value, the heating component 11 heats, and the gas temperature blown out of the air outlet 5 is relatively high. The gas and solution mix quickly to increase the solution temperature, avoid the solution temperature being too low and the reaction speed being too slow. Whether the heating component 11 is heating or cooling, the heated gas temperature does not exceed the set solution reaction temperature. When the heating component 11 is heating, the gas temperature is close to the upper limit value of the solution temperature. When the heating component 11 is cooling, the gas temperature is close to the lower limit value of the solution. In this way, it can also be ensured that the solution that is initially in contact with the gas will not contact the gas beyond the range, and the solution will not have a locally high temperature.

[0022] A feeding chamber 13 is provided on one side of the acid dissolving tank 1, and the bottom of the feeding chamber 13 is connected to the reaction chamber 2. A slope is provided on the feeding chamber 13 to guide the waste residue to the blowing port 5. For acids that are not volatile, the feeding chamber 13 can be kept in an open state. The connecting port between the feeding chamber 13 and the reaction chamber 2 is lower than the liquid level, which can seal the gas at the top of the reaction chamber 2 and the cleaning chamber 3. If a volatile acid is used, a cover plate that can seal the feeding chamber 13 of the acid dissolving tank needs to be provided on the feeding chamber 13.

[0023] When the liquid extraction component 7 transfers the solution and waste residue in the reaction chamber 2 to the cleaning chamber 3, the fan 6 and the heating component 11 corresponding to the blowing port 5 in the cleaning chamber 3 are kept open, and the heating component 11 is in a heating state. The fast-flowing hot air repeatedly blows the waste residue and the solution to move. On the one hand, it keeps them warm to avoid the precipitation of low-temperature substances dissolved in the solution. On the other hand, when the solution content is low, the solution is more easily blown away, which accelerates the separation of the solution and the waste residue, and at the same time avoids the waste residue from accumulating and blocking the filter box 8.

[0024] See also Figure 1-Figure 5 The top of the filter box 8 is connected with a water pipe 12, which is connected to an external water source. The bottom of the filter box 8 is connected with a discharge port 9, and a valve is provided on the discharge port 9. When the acid solution is exhausted, the water pipe 12 injects deionized water into the filter box 8. The deionized water is heated to the same temperature as the solution, so that the acid solution and its dissolved substances remaining on the surface of the waste residue are quickly dissolved into the water and separated from the waste residue. At the same time, water flows into the cleaning chamber 3 from the back of the filter screen on the filter box 8 to backwash the filter screen and wash away the waste residue stuck on the filter screen. The discharge port 9 is connected with a three-way valve, and the outlet of the three-way valve is connected to the acid container and the wastewater collection container. When cleaning the waste residue, the three-way valve is closed. After the cleaning is completed, the three-way valve is switched to connect the filter box 8 and the wastewater collection container to collect the wastewater. After the wastewater is collected, it can be cleaned again as needed.

[0025] After the waste water is separated from the waste residue, the waste residue is taken out for further treatment. If the waste residue is inconvenient to take out, for example, a new round of waste residue treatment has been started in the reaction chamber 2 and the cover plate cannot be opened, water can be injected into the cleaning chamber 3 again, the water and waste residue are mixed, and pumped out by a pump. A discharge port 14 is provided in the cleaning chamber 3, and the discharge port 14 is arranged at the lowest point of the cleaning chamber 3. The discharge port 14 is connected to the collecting port 10. After the cleaning time is reached, the collecting port 10 is opened to discharge the waste water and waste residue. The collecting port 10 is connected to the solid-liquid separator to further separate the water and waste residue.

[0026] Embodiment 2, an operation method of a waste residue treatment device for preparing cuprous chloride by dry process, comprising the steps of: S1, inject an appropriate amount of acid solution into the reaction chamber 2, and heat it to a set temperature through a heating rod; S2, turn on the fan 6 and the heating assembly corresponding to the reaction chamber 2, and put the waste slag into the feed port 13, and the waste slag flows to the blowing port 5 on one side under the guidance of the inclined surface; S3, when the acid dissolution reaction reaches the set time, the liquid pumping part 7 is turned on to pump the solution and waste residue in the reaction chamber 2 into the cleaning chamber 3, and the fan 6 corresponding to the reaction chamber 2 is turned off after the suction is completed; S4. In step S3, the three-position three-way valve is switched to connect the acid container and the filter box 8, and the fan 6 and the heating component corresponding to the cleaning chamber 3 are turned on at the same time; S5. When the acid solution is completely drained, the three-position three-way valve is switched to the closed state, and the waste residue is started to be cleaned. Whether it is completely drained is determined by the discharge speed of the discharge port 9. The water pipe 12 is opened to inject an appropriate amount of deionized water into the filter box 8 and the cleaning chamber 3. The deionized water is heated to the same temperature as the solution. S6. When the first cleaning is completed, the three-position three-way valve is switched to connect the wastewater collection container and the filter box 8 to discharge the wastewater. After the wastewater is completely discharged, the three-position three-way valve is switched to a closed state; S7. After completing the set cleaning times, remove the waste residue.

[0027] The above description of the disclosed embodiments enables one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be apparent to one skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but rather to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A waste residue treatment device for preparing cuprous chloride by dry method, comprising an acid dissolving tank (1), wherein a reaction chamber (2) and a cleaning chamber (3) are provided in the acid dissolving tank (1), and a heating rod is provided in the reaction chamber (2), characterized in that: A partition seat (4) is provided in the reaction chamber (2). Both sides of the partition seat (4) are provided with smooth, arc-shaped surfaces. The partition seat (4) divides the reaction chamber (2) into two parts. Both sides of the partition seat (4) are provided with air blowing ports (5). The positions of the air blowing ports (5) on both sides are staggered. The spray outlets of the two air blowing ports (5) are both facing the partition seat (4). The air blowing ports (5) are connected to a fan (6). A liquid extraction member (7) is provided between the reaction chamber (2) and the cleaning chamber (3). The liquid extraction member (7) is connected to an acid-resistant pump. After the acid dissolution reaction in the reaction chamber (2) is completed, the liquid extraction member (7) extracts the solution and waste residue in the reaction chamber (2) into the cleaning chamber (3). A filter box (8) is provided in the cleaning chamber (3). The filter box (8) includes A collecting chamber, a filter screen is provided on one side of the collecting chamber facing the cleaning chamber (3), a filter box (8) is connected to a discharge port (9), and the discharge port (9) is connected to an acid container for collecting solution. After the valve on the filter box (8) is opened, the solution flows into the acid container for storage. The partition seat (4) comprises a connecting seat (401), and both sides of the connecting seat (401) are provided with a return slope (402) and a blowing slope (403), and the return slope (402) is opposite to the blowing slope (403) on the opposite side, and the blowing slope (403) is lower than the return slope (402). The height gradually increases from one side of the return slope (402) close to the blowing slope (403) to the other side, and the spray outlet of the blowing port (5) is aligned with the blowing slope (403).

2. A waste residue treatment device for preparing cuprous chloride by dry method according to claim 1, characterized in that: A cover plate is provided above the reaction chamber (2) and the cleaning chamber (3), and the cover plate seals the reaction chamber (2) and the cleaning chamber (3). The fan (6) is arranged at the top of the acid dissolving tank (1), and an air inlet of the fan (6) passes through the cover plate and is located at the top of the acid dissolving tank (1).

3. A waste residue treatment device for preparing cuprous chloride by dry method according to claim 2, characterized in that: A feeding chamber (13) is provided on one side of the acid dissolving tank (1), and the bottom of the feeding chamber (13) is connected to the reaction chamber (2).

4. A waste residue treatment device for preparing cuprous chloride by dry method according to claim 3, characterized in that: The fan (6) is provided with a heating component (11), and the heating component (11) heats the gas flowing through it through a thermoelectric heating plate. The cleaning chamber (3) is provided with a temperature sensor. When it is detected that the temperature of the solution in the cleaning chamber (3) is higher than an upper limit value, the heating component (11) cools the gas. When the temperature sensor detects that the temperature of the solution in the cleaning chamber (3) is lower than the upper limit value, the heating component (11) heats the gas. The temperature of the gas heated by the heating component (11) does not exceed the set solution reaction temperature.

5. A waste residue treatment device for preparing cuprous chloride by dry method according to claim 4, characterized in that: The cleaning chamber (3) is also provided with a partition seat (4) and an air blowing port (5). When the liquid extraction member (7) transfers the solution and waste residue in the reaction chamber (2) to the cleaning chamber (3), the fan (6) and the heating component (11) corresponding to the air blowing port (5) in the cleaning chamber (3) are both kept turned on, and the heating component (11) is in a heating state.

6. A waste residue treatment device for preparing cuprous chloride by dry method according to claim 5, characterized in that: The top of the filter box (8) is connected to a water pipe (12), the water pipe (12) is connected to an external water source, the bottom of the filter box (8) is connected to a discharge port (9), the discharge port (9) is provided with a three-position three-way valve, the water outlet of the three-way valve is connected to an acid container and a wastewater collection container, when cleaning the waste residue, the three-position three-way valve is closed, and after cleaning is completed, the three-position three-way valve is switched to connect the filter box (8) and the wastewater collection container.

7. An operating method of a waste residue treatment device for dry process preparation of cuprous chloride, using the waste residue treatment device for dry process preparation of cuprous chloride as claimed in claim 6 to treat waste residue generated during dry process preparation of cuprous chloride, characterized in that: Includes steps: S1, injecting an appropriate amount of acid solution into the reaction chamber (2), and heating it to a set temperature through a heating rod; S2, turning on the fan (6) and the heating assembly corresponding to the reaction chamber (2), and feeding waste slag through the feeding port (13); S3, when the acid dissolution reaction reaches the set time, the liquid extraction component (7) is turned on to extract the solution and waste residue in the reaction chamber (2) into the cleaning chamber (3), and after the extraction is completed, the fan (6) corresponding to the reaction chamber (2) is turned off; S4. In step S3, the three-position three-way valve is switched to connect the acid container and the filter box (8), and the fan (6) and the heating component corresponding to the cleaning chamber (3) are turned on at the same time; S5. When the acid solution is completely drained, the three-position three-way valve is switched to a closed state, and the waste residue is started to be cleaned. Whether the waste residue is completely drained is determined by the discharge speed of the discharge port (9), and the water pipe (12) is opened to inject an appropriate amount of deionized water of an appropriate temperature into the filter box (8) and the cleaning chamber (3); S6. When the first cleaning is completed, the three-position three-way valve is switched to connect the wastewater collection container and the filter box (8) to discharge the wastewater. After the wastewater is completely discharged, the three-position three-way valve is switched to a closed state; S7. After completing the set cleaning times, remove the waste residue.

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