Tongue arrangement for retaining support element of substrate support

Abstract

Embodiments of a substrate support are provided herein. In some embodiments, a substrate support includes a first plate having a plurality of openings extending from an upper surface of the first plate into the first plate to a bottom surface of each respective opening of the plurality of openings; a plurality of tongues (tab), the plurality of tongues including three or more tongues disposed in each respective opening and extending toward the upper surface of the first plate; and a plurality of support elements disposed in each of the plurality of openings, with the plurality of tongues disposed around each of the plurality of support elements and configured to retain the plurality of support elements in the plurality of openings.

Description

Technical Field

[0001] Embodiments of the present disclosure generally relate to substrate processing equipment. Background Art

[0002] A substrate processing system typically includes a process chamber for performing a desired process, such as a degassing process, on one or more substrates disposed in the process chamber. Typically, semiconductor substrates are degassed in a dedicated degassing process module as part of a standard process flow prior to subsequent process steps, such as deposition, to outgas unwanted materials and contaminants prior to further processing. The degassing chamber may include a heated substrate support. The heated substrate support may provide one or more of: a controlled sealing gap, reduced metal contamination, and reduced heat conduction to the substrate. To achieve such features, the heated substrate support may include a heater plate having a support element disposed in the heater plate, the support element being used to elevate the substrate and support the substrate with minimal contact with the rest of the heated substrate support.

[0003] The support element may be disposed in a pocket or opening in the heated substrate support. However, conventional means for retaining the support element in the pocket or opening may exert excessive pressure or force on the support element when swaged, causing the support element to crack or break.

[0004] Accordingly, the inventors provide embodiments of improved substrate supports. Summary of the invention

[0005] Embodiments of substrate supports are provided herein. In some embodiments, a substrate support includes: a first plate having a plurality of openings extending from an upper surface of the first plate into the first plate to a bottom surface of each corresponding opening of the plurality of openings; a plurality of tongues including three or more tongues disposed in each corresponding opening and extending toward the upper surface of the first plate; and a plurality of support elements disposed in each of the plurality of openings, wherein the plurality of tongues are disposed around each of the plurality of support elements and are configured to hold the plurality of support elements in the plurality of openings.

[0006] In some embodiments, a substrate support comprises: a first plate, the first plate comprising: a plurality of openings extending from an upper surface of the first plate into the first plate to a bottom surface of each corresponding opening of the plurality of openings; a plurality of tongues comprising three or more tongues disposed in each corresponding opening and extending toward the upper surface of the first plate; and a plurality of support elements disposed in each of the plurality of openings, wherein the plurality of tongues are disposed around each of the plurality of support elements and are configured to hold the plurality of support elements in the plurality of openings; a second plate coupled to a lower surface of the first plate, the second plate having one or more heater elements; and a support shaft coupled to the first plate and the second plate.

[0007] In some embodiments, a degassing chamber includes: a chamber body, the chamber body defining an internal volume in the chamber body; a substrate support, the substrate support being used to support a substrate, the substrate support being disposed in the internal volume, the substrate support comprising: a base, the base having a first plate, the first plate having a plurality of openings, the plurality of openings extending from an upper surface of the first plate to a bottom surface of each corresponding opening in the first plate to the plurality of openings, a plurality of tongues, the plurality of tongues comprising three or more tongues disposed in each corresponding opening and extending toward the upper surface of the first plate, and a plurality of support elements, the plurality of support elements being disposed in each of the plurality of openings, wherein the plurality of tongues are disposed around each of the plurality of support elements and are configured to hold the plurality of support elements in the plurality of openings; and a support shaft, the support shaft being coupled to the base; and a heating lamp, the heating lamp being disposed in the internal volume opposite to the substrate support.

[0008] Other and further embodiments of the disclosure are described below. BRIEF DESCRIPTION OF THE DRAWINGS

[0009] Embodiments of the present disclosure briefly summarized above and discussed in more detail below may be understood by reference to the illustrative embodiments of the present disclosure depicted in the accompanying drawings. However, the drawings illustrate only typical embodiments of the present disclosure and are not to be considered limiting of scope, as the present disclosure may admit to other equally effective embodiments.

[0010] Figure 1 Depicted is a schematic side view of a degassing chamber according to at least some embodiments of the present disclosure.

[0011] Figure 2 Depicted are schematic cross-sectional views of substrate supports in accordance with at least some embodiments of the present disclosure.

[0012] Figure 3 Depicting isometric views of a plurality of tongues in accordance with at least some embodiments of the present disclosure.

[0013] Figure 4 Depicting isometric views of a plurality of tongues in accordance with at least some embodiments of the present disclosure.

[0014] Figure 5A Depicts a cross-sectional side view of a tongue according to at least some embodiments of the present disclosure.

[0015] Figure 5B Depicts a cross-sectional side view of a tongue according to at least some embodiments of the present disclosure.

[0016] Figure 5C Depicts a cross-sectional side view of a tongue according to at least some embodiments of the present disclosure.

[0017] Figure 6 A schematic cross-sectional view of a portion of a first plate is depicted, according to at least some embodiments of the present disclosure.

[0018] Figure 7 A schematic cross-sectional view depicting a portion of a first plate having a plurality of tongues in a bent position, according to at least some embodiments of the present disclosure.

[0019] To facilitate understanding, where possible, the same reference numerals have been used to represent the same elements common to the figures. For clarity, the figures are not drawn to scale and may be simplified. Elements and features of one embodiment may be advantageously incorporated into other embodiments without further description. DETAILED DESCRIPTION

[0020] Provided herein are embodiments of substrate supports for use in semiconductor process chambers (e.g., degassing chambers). The substrate support typically includes a plurality of support elements, which are used to raise the substrate above the upper surface of the substrate support. The inventors have observed that when the plurality of support elements are fixed or held to the upper plate of the substrate support, the plurality of support elements may be susceptible to cracking or breaking due to the forces applied to the plurality of support elements. The upper plate or first plate provided herein includes a plurality of tongues arranged around the plurality of support elements, so that when forging to hold the plurality of support elements, the plurality of tongues advantageously apply reduced pressure or no pressure on the plurality of support elements. In some embodiments, the plurality of tongues may include more than two tongues, so that less force is required to forge the plurality of tongues, thereby applying less pressure on the plurality of support elements. The curved surfaces or geometric shapes of the plurality of tongues may also be appropriately selected to advantageously apply reduced pressure or no pressure on the plurality of support elements.

[0021] Figure 1 A schematic side view of a degas chamber or chamber 100 is depicted in accordance with at least some embodiments of the present disclosure. The chamber 100 includes a chamber body 102 having sidewalls 132 and a lid 134 that enclose an interior volume 104 of the chamber 100. The chamber body 102 may be made of a suitable material, such as aluminum or the like. A substrate support 120 is disposed in the interior volume 104 and is configured to support a substrate 112 thereon. The substrate support 120 may include a base 106 coupled to a support shaft 108. The support shaft 108 may be hollow to accommodate a conduit (e.g., a fluid line, a power line, or the like) extending therethrough to the base 106. The base 106 may include a heater plate (at the bottom) of the support shaft. Figure 2 discussed in more detail in ).

[0022] The heating lamps 110 may be disposed in the interior volume 104 opposite the substrate support 120 and configured to heat the interior volume 104 to perform the degassing process. The heating lamps 110 may include any suitable heating components, such as one or more heater lamps, heater coils, resistive heater elements, or the like.

[0023] In some embodiments, a gas source 118 is coupled to the chamber body 102 and is configured to supply one or more gases to the interior volume 104. For example, the gas source 118 can supply an inert gas such as argon. The gas source 118 can also supply one or more suitable process gases. In some embodiments, a pump 122 is coupled to the chamber body 102 and is configured to exhaust from the interior volume 104, including outgassing materials and process gases. The pump 122 or a second pump (not shown) can regulate the pressure of the interior volume 104. A slit valve 130 can be coupled to the chamber body 102 and configured to transfer the substrate 112 into and out of the interior volume 104.

[0024] Figure 2A schematic cross-sectional view of a substrate support 120 according to at least some embodiments of the present disclosure is depicted. The substrate support 120 generally includes a first plate 204 having a plurality of openings 226 or pockets extending from an upper surface 208 of the first plate 204 into the first plate 204. A plurality of support elements 218 are disposed on a bottom surface 260 of the plurality of openings 226. The plurality of support elements 218 in each of the plurality of openings 226 are configured to elevate the substrate 112 above the upper surface 208 and provide a low contact area between the substrate 112 and the pedestal 106. In some embodiments, the first plate 204 is formed of a process compatible metallic material, such as stainless steel. The first plate 204 may be at least as large as the substrate 112 to be supported on the first plate 204. The substrate diameter may be, for example, 200, 300 or 450 mm (7.87, 11.81 or 17.72 inches), although larger and smaller diameter substrates may also benefit from the features of the present disclosure.

[0025] In some embodiments, the second plate 206 is coupled to the lower surface 264 of the first plate 204. The second plate 206 may generally include one or more heater elements 228. In some embodiments, the one or more heater elements 228 include one or more internal heater elements 234 disposed in the inner region 232 of the second plate 206 and one or more external heater elements 244 disposed in the outer region 242 of the second plate 206. The one or more heater elements 228 may be any suitable heating element, such as a resistive heating element, a lamp, or the like. The one or more heater elements 228 may be coupled to a heater power supply 236 for providing power to the one or more heater elements 228. In some embodiments, the heater power supply 236 may provide power to the one or more internal heater elements 234 and the one or more external heater elements 244. In some embodiments, the heater power supply 236 includes a first power supply for the one or more internal heater elements 234 and a second power supply for the one or more external heater elements 244.

[0026] In some embodiments, the second plate includes a thermal break 224 disposed between the one or more internal heater elements 234 and the one or more external heater elements 244. In some embodiments, the thermal break 224 is a gap configured to reduce thermal crosstalk between the internal region 232 and the external region 242. In some embodiments, the support shaft 108 is coupled to the first plate 204 and the second plate 206.

[0027] In some embodiments, the plurality of openings 226 are arranged at regular intervals along a circle concentric with the center 268 of the first plate 204. In some embodiments, the plurality of support elements 218 may be arranged on the upper surface 208 along a random pattern. In some embodiments, the plurality of support elements 218 are spherical or have other suitable shapes. In some embodiments, the plurality of support elements 218 are made of non-metallic balls or sapphire balls. The plurality of support elements 218 may be complete spherical, spherical with a flattened bottom, or the like.

[0028] The low contact area facilitated by the plurality of support elements 218 may also help reduce or prevent contamination and allow the substrate 112 to be raised to degas the back side of the substrate 112 without having to flip the substrate 112. The low contact area between the upper surface 208 and the substrate 112 also reduces or prevents scratching or sticking of the substrate. The plurality of support elements 218 may stick out very slightly from the upper surface 208 so that there is sufficient thermal coupling between the substrate 112 and the first plate 204. For example, the plurality of support elements 218 may be raised from the upper surface 208 of the first plate 204 by about 0.005 inches to about 0.02 inches.

[0029] In some embodiments, the first plate 204 can include gas grooves 248 on the upper surface 208 for diffusing the backside gas. The gas grooves 248 can be arranged in any suitable shape. The gas grooves 248 can be coupled to a backside gas source 246. In some embodiments, the backside gas source 246 can deliver the backside gas at a first location proximate to the center 268 of the first plate 204, and the gas grooves 248 can extend radially outward from the first location. The backside gas source 246 can extend through the support shaft 108 to the base 106.

[0030] In some embodiments, the first plate 204 includes an outer perimeter notch 252. The outer perimeter notch can be configured to support chamber components, such as process accessory components (such as an edge or focus ring). In some embodiments, an outer lip 262 extends downward from the outer edge of the first plate 204. In some embodiments, the outer lip 262 surrounds the second plate 206. In some embodiments, the pedestal 106 includes a base plate 212 coupled to the first plate 204 (e.g., coupled to the outer lip 262 of the first plate 204). The base plate 212 can be directly coupled to the support shaft 108. In some embodiments, the first plate 204 includes one or more grooves 254 in a peripheral area of ​​the first plate 204. The one or more grooves 254 can include alignment features or openings for lift pin assemblies.

[0031] Figure 3An isometric view of a plurality of tongues 310 is depicted, in accordance with at least some embodiments of the present disclosure. Figure 4 An isometric view of a plurality of tongues according to at least some embodiments of the present disclosure is depicted. The plurality of tongues 310 includes three or more tongues disposed in each respective opening of the plurality of openings 226 and extending from a first base plate 312 of the plurality of openings 226 toward the upper surface 208 of the first plate 204. The three or more tongues advantageously require less force to swage the plurality of tongues than less than three tongues used to hold the plurality of support elements 218. The plurality of tongues 310 are disposed around each of the plurality of support elements 218 and are configured to hold the plurality of support elements 218 in the plurality of openings 226. In some embodiments, the plurality of tongues 310 include four or more tongues. In some embodiments, the plurality of tongues 310 are comprised of four or more tongues. Figure 3 The four tongues depicted in Figure 4 The plurality of tongues 310 may be arranged at regular intervals around each of the plurality of support elements 218. In use, the plurality of tongues 310 are swaged to plastically deform inwardly toward each other to retain the support elements disposed therein via any suitable swaging tool. In some embodiments, the plurality of tongues 310 are made of metal. In some embodiments, the plurality of tongues 310 are made of the same material as the first plate 204.

[0032] Each of the plurality of tongues 310 includes an inner surface 322 facing one of the plurality of support elements 218 and an outer surface 324 opposite the inner surface 322. In some embodiments, the surface area of ​​the inner surface 322 is smaller than the surface area of ​​the outer surface 324. In some embodiments, the inner surface 322 is curved to conform with the geometry of one or more support elements 218.

[0033] Figure 5A A cross-sectional side view of a tongue of the plurality of tongues 310 is depicted according to at least some embodiments of the present disclosure. In some embodiments, the bottom surface 260 of each corresponding opening includes a first bottom plate 312 and a second bottom plate 510 extending from the first bottom plate 312 toward the lower surface 264 of the first plate 204. The second bottom plate 510 is configured to accommodate the plurality of support elements 218 so that the plurality of support elements 218 can rest on the second bottom plate 510. In some embodiments, the second bottom plate 510 is rounded corresponding to the shape of the plurality of support elements 218.

[0034] The plurality of tongues 310 may extend upward from the first bottom plate 312. In some embodiments, the outer surface 324 of each of the plurality of tongues 310 extends at an angle 564 relative to an axis (e.g., axis 502) that is orthogonal to the upper surface 208 of the first plate 204. In some embodiments, the angle 564 is about 5 degrees to about 20 degrees. In such embodiments, the thickness of the plurality of tongues 310 decreases from the lower portion 504 of the plurality of tongues 310 to the upper portion 506 of the plurality of tongues 310, so that less force or pressure is required to swage the plurality of tongues 310.

[0035] Figure 5B A cross-sectional side view of a tongue in the plurality of tongues 310 is depicted according to at least some embodiments of the present disclosure. The inner surface 322 of each of the plurality of tongues 310 is a surface that faces the support element. In some embodiments, the base 518 of the inner surface 322 is spaced apart from the support element 218 by a distance 520. In some embodiments, the distance 520 is about 0.1 to about 0.8 mm. When the tongue is swaged, the spacing between the tongue and the support element prevents the base 518 from contacting the support element, thereby removing any force or pressure on the portion of the support element opposite the base 518. In such an embodiment, when swaged, the plurality of tongues 310 may minimally contact the plurality of support elements 218 at a location corresponding to the upper portion 506 of the plurality of tongues 310. In some embodiments, when swaged, the plurality of tongues 310 may bend but not directly contact the plurality of support elements 218, thereby not applying force or pressure to the plurality of support elements 218.

[0036] Figure 5CA cross-sectional side view of a tongue of the plurality of tongues 310 is depicted according to at least some embodiments of the present disclosure. In some embodiments, the curved plane 550 of the plurality of tongues 310 is disposed above the horizontal center plane 560 of the plurality of support elements 218. The curved plane 550 may correspond to an interface between the first base plate 312 and the lower portion 504 of the plurality of tongues 310. When stress or force is applied along the horizontal center plane 560 of the plurality of support elements 218, the plurality of support elements 218 may be more susceptible to cracking, chipping, or breaking. In some embodiments, the curved plane 550 is disposed vertically above the horizontal center plane 560 to reduce stress or force proximate to the horizontal center plane 560 of the plurality of support elements 218. In some embodiments, the first base plate 312 may include an annular groove 562 at the interface between the first base plate 312 and the second base plate 510. The annular groove 562 advantageously forms a space between the plurality of support elements 218 and the first plate 204 along the horizontal center plane 560 such that no stress or pressure is exerted on the plurality of support elements 218 proximate the horizontal center plane 560. In some embodiments, the annular groove 562 has a height 566 of about 0.2 to about 0.8 mm from the first bottom plate 312 to a lower surface 568 of the annular groove 562.

[0037] Figure 6 A schematic cross-sectional view depicting a portion of first plate 204 according to at least some embodiments of the present disclosure. In some embodiments, inner surface 322 of plurality of tongues 310 has a width 606 that is less than width 608 of outer surface 324. In some embodiments, second bottom plate 510 is substantially flat.

[0038] Figure 7 Schematic cross-sectional view of a portion of a first plate 204 having a plurality of tongues 310 in a bent position, according to at least some embodiments of the present disclosure. Figure 7 As shown in , in some embodiments, the plurality of tongues 310 may minimally contact the plurality of support elements 218 at the upper portion of the plurality of support elements 218 when bent. In some embodiments, the plurality of tongues 310 may bend over the plurality of support elements 218 without contacting the plurality of support elements 218.

[0039] While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the present disclosure may be devised without departing from the basic scope thereof.

Claims

1. A substrate support, comprising: a first plate having a plurality of openings extending from an upper surface of the first plate into the first plate to a bottom surface of each respective one of the plurality of openings; a plurality of tongues, the plurality of tongues comprising three or more tongues disposed in each respective opening and extending toward the upper surface of the first plate; and A plurality of support elements are disposed in corresponding ones of the plurality of openings, wherein the plurality of tongues are disposed around each of the plurality of support elements and are configured to retain the plurality of support elements in the plurality of openings.

2. The substrate support of claim 1, wherein the plurality of support elements are spherical.

3. The substrate support of claim 1, wherein the plurality of tongues comprises four or more tongues.

4. The substrate support of claim 1, wherein an inner surface of each of the plurality of tongues faces a corresponding support element of the plurality of support elements, and wherein a base of the inner surface is spaced apart from the corresponding support element. 5 . The substrate support of claim 1 , wherein a thickness of the plurality of tongues decreases from a lower portion of the plurality of tongues to an upper portion of the plurality of tongues.

6. The substrate support of any one of claims 1 to 5, wherein an outer surface of each of the plurality of tongues extends at an angle of about 5 degrees to about 20 degrees relative to an axis normal to the upper surface of the first plate.

7. A substrate support as described in any one of claims 1 to 5, wherein the bottom surface of each corresponding opening includes a first bottom plate and a second bottom plate, the first bottom plate is arranged below the plurality of tongues, and the second bottom plate extends from the first bottom plate toward the lower surface of the first plate to accommodate the plurality of support elements.

8. The substrate support as claimed in any one of claims 1 to 5, wherein the plurality of openings are arranged at regular intervals along a circle concentric with the center of the first plate.

9. The substrate support of any one of claims 1 to 5, wherein the plurality of tongues comprises a lower portion and an upper portion, wherein the lower portion is thicker than the upper portion.

10. The substrate support of any one of claims 1 to 5, wherein a plane of bending of the plurality of tongues is disposed above a horizontal center plane of the plurality of support elements.

11. The substrate support of any one of claims 1 to 5, wherein an inner surface of the plurality of tongues has a width that is smaller than a width of an outer surface of the plurality of tongues.

12. The substrate support of any one of claims 1 to 5, further comprising: a second plate coupled to a lower surface of the first plate, the second plate having one or more heater elements; and A support shaft is coupled to the first plate and the second plate.

13. The substrate support of claim 12, wherein the one or more heater elements comprise one or more internal heater elements and one or more external heater elements.

14. The substrate support of claim 13, wherein the second plate comprises a thermal disconnect between the one or more inner heater elements and the one or more outer heater elements.

15. The substrate support of claim 12, wherein the plurality of tongues consists of 4 tongues or 6 tongues.

16. The substrate support of claim 12, wherein the plurality of support elements extend above the upper surface of the first plate.

17. A degassing chamber comprising: a chamber body defining an interior volume therein; The substrate support of any one of claims 1 to 5, the substrate support for supporting a substrate disposed in the interior volume, the substrate support further comprising a support shaft coupled to the first plate; and A heating lamp is disposed in the interior volume opposite the substrate support.

18. The degassing chamber of claim 17, further comprising a second plate coupled to the first plate, wherein the second plate comprises one or more resistive heating elements disposed in the second plate.

19. The degassing chamber of claim 17, wherein a bending plane of the plurality of tongues is disposed above a horizontal center plane of the plurality of support elements.

20. The degas chamber of claim 17, further comprising a gas source coupled to the chamber body to supply one or more process gases to the interior volume.

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