Rectification system cleaning method and device, electronic equipment and readable storage medium

Abstract

The invention provides a rectification system cleaning method and device, electronic equipment and a readable storage medium, and belongs to the technical field of rectification system cleaning, and the method comprises the following steps: determining reagent information and cleaning duration based on impurity information of a rectification system; the reagent information comprises a first reagent and a second reagent, and the cleaning duration comprises a first cleaning duration and a first duration. And removing the first impurity in the rectification system based on the first reagent and the first cleaning duration. And removing a second impurity in the rectification system based on the second reagent and the first duration to obtain a discharged material, and determining the cleaning effect of the rectification system based on a detection result of the discharged material. According to the rectification system cleaning method and device, the electronic equipment and the readable storage medium provided by the invention, the cleaning efficiency of the rectification system can be improved.

Description

Technical Field

[0001] The present disclosure belongs to the technical field of distillation system cleaning, and more specifically, to a distillation system cleaning method and device, electronic equipment, and a readable storage medium. Background Art

[0002] Electronic grade silicon dichloride products are mainly used in silicon epitaxial growth and thin film deposition production processes such as silicon oxide, silicon nitride and metal silicide in advanced integrated circuit chip manufacturing processes. The industry has very high requirements for the purity, metal impurities and particles of silicon dichloride products. After the equipment is installed, the remaining grease, moisture, impurity particles and metal impurities in it need to be removed; and during the system cleaning operation, due to the physical and chemical properties of silicon dichloride and its flammability and explosion, if the equipment pipelines are not connected properly during the production operation, it is easy to leak and cause flammability and explosion accidents.

[0003] At present, in the chemical industry, instrument gas, nitrogen, high-purity nitrogen and other purge replacement systems are commonly used. Subsequently, the distillation system will be put into trial production with raw materials for secondary cleaning and replacement of the equipment. This process requires the system to run continuously for 3-6 months to ensure that the entire distillation system is cleaned, which is inefficient. Although ordinary chemical cleaning methods can meet the requirements of producing electronic-grade dichlorosilane, they consume a large amount of raw materials, water, electricity, etc. Summary of the invention

[0004] The purpose of the present disclosure is to provide a distillation system cleaning method and device, an electronic device, and a readable storage medium to improve the cleaning efficiency of the distillation system.

[0005] A first aspect of the embodiments of the present disclosure provides a distillation system cleaning method, which is applied to an electronic grade dichlorosilane distillation system, comprising: The reagent information and the cleaning time are determined based on the impurity information of the distillation system. The reagent information includes a first reagent and a second reagent, and the cleaning time includes a first cleaning time and a first time.

[0006] A first impurity in the distillation system is removed based on the first reagent and the first cleaning time.

[0007] The second impurities in the distillation system are removed based on the second reagent and the first time period to obtain a discharge material, and the cleaning effect of the distillation system is determined based on a detection result of the discharge material.

[0008] A second aspect of the embodiments of the present disclosure provides a distillation system cleaning device, which is applied to an electronic grade dichlorosilane distillation system, comprising: The first calculation module is used to determine reagent information and cleaning time based on impurity information of the distillation system. The reagent information includes a first reagent and a second reagent, and the cleaning time includes a first cleaning time and a first time.

[0009] The first cleaning module is used to remove first impurities in the distillation system based on a first reagent and a first cleaning time.

[0010] The second cleaning module is used to remove second impurities in the distillation system based on the second reagent and the first time period to obtain a discharge material, and determine a cleaning effect of the distillation system based on a detection result of the discharge material.

[0011] According to a third aspect of an embodiment of the present disclosure, an electronic device is provided, including a memory, a processor, and a computer program stored in the memory and running on the processor, wherein the processor implements the steps of the above-mentioned distillation system cleaning method when executing the computer program.

[0012] According to a fourth aspect of the embodiments of the present disclosure, a computer-readable storage medium is provided, wherein the computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps of the above-mentioned distillation system cleaning method are implemented.

[0013] The distillation system cleaning method and device, electronic device, and readable storage medium provided by the embodiments of the present disclosure have the following beneficial effects: On the one hand, the embodiments of the present disclosure use different reagents for cleaning in stages, which is highly targeted and can make the entire cleaning process more orderly and efficient. High-purity nitrogen is used to remove moisture first, and then high-purity silicon tetrachloride is used to remove other impurities, avoiding the complications that may arise from simultaneously treating multiple impurities.

[0014] On the other hand, the disclosed embodiments accurately select reagents according to the impurity type, avoiding the use of a large amount of unnecessary general cleaning agents. Silicon tetrachloride can fully utilize its polar solvent properties during cleaning, effectively clean impurities at a suitable liquid level and flow rate, and reduce the waste of reagents.

[0015] On the other hand, the disclosed embodiment adopts a staged cleaning method and a method of testing and evaluating the discharged material to ensure high-quality cleaning. The moisture content is precisely controlled, and the composition and particle size of the discharged material are tested during the silicon tetrachloride cleaning stage to ensure that the impurity content and particle size meet the requirements, thereby ensuring the high cleanliness of the distillation system, which is conducive to the subsequent production of high-quality electronic-grade dichlorosilane. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0017] Figure 1 A schematic diagram of a distillation system cleaning method according to an embodiment of the present disclosure; Figure 2 A structural block diagram of a distillation system cleaning device provided in one embodiment of the present disclosure; Figure 3 A structural block diagram of a distillation system cleaning device provided by another embodiment of the present disclosure; Figure 4 A schematic block diagram of an electronic device provided by an embodiment of the present disclosure. DETAILED DESCRIPTION

[0018] In the following description, specific details such as specific system structures and technologies are provided for the purpose of illustration rather than limitation, so as to provide a thorough understanding of the embodiments of the present disclosure. However, it should be clear to those skilled in the art that the present disclosure may be implemented in other embodiments without these specific details. In other cases, detailed descriptions of well-known systems, devices, circuits, and methods are omitted to avoid obstructing the description of the present disclosure with unnecessary details.

[0019] In order to make the purpose, technical solutions and advantages of the present disclosure more clear, specific embodiments will be described below in conjunction with the accompanying drawings.

[0020] Please refer to Figure 1 , Figure 1 A schematic flow chart of a distillation system cleaning method provided in one embodiment of the present disclosure, the method is applied to an electronic grade dichlorosilane distillation system, and may include S101 to S103.

[0021] S101: Determine reagent information and cleaning time based on impurity information of the distillation system. The reagent information includes a first reagent and a second reagent, and the cleaning time includes a first cleaning time and a first time.

[0022] In this embodiment, the distillation system is an electronic grade dichlorosilane distillation system, and the distillation system may include a distillation tower, a condenser, a reboiler, a reflux tank, a shielded pump and a filler. The impurity information of the distillation system may include moisture, grease, impurity particles and metal impurities, etc. The reagent information and the cleaning time are respectively the reagent information and cleaning time set for the entire distillation system for cleaning. The reagent information may include the reagent type, the reagent content, the reagent concentration, etc., and the cleaning time may include multiple time lengths, for example: in the first stage, it is set to the first cleaning time length, in the second stage, it is set to the second cleaning time length, and in the third stage (if any), it is set to the third cleaning time length.

[0023] In the present embodiment, the first reagent and the second reagent are different reagents. The first reagent can be high-purity nitrogen to remove water impurities, and the second reagent can be high-purity silicon tetrachloride, which is a polar solvent that can effectively remove impurities such as grease, dust and other particles. The boiling points of dichlorosilane and silicon tetrachloride are quite different and easy to separate. Compared with other cleaning media, such as ethanol, surfactants, etc., silicon tetrachloride will not introduce other carbon-containing impurities into the system while achieving the cleaning purpose. Even if there is a small amount of residue in the cleaning system with high-purity silicon tetrachloride, that is, electronic grade dichlorosilane contains ppm-level silicon tetrachloride, there is no impact on product quality.

[0024] Exemplarily, for an electronic grade dichlorosilane distillation system, cleaning is performed in stages.

[0025] First, use high-purity nitrogen as the first reagent to remove water impurities. For example, before feeding the distillation system, use high-purity nitrogen to replace the system, and continue to replace until the water content of the system is less than 20ppb. This process requires a specific cleaning time, such as several hours to dozens of hours, depending on the size and complexity of the system. This is the first cleaning time.

[0026] Use high-purity silicon tetrachloride as the second reagent. Fill the raw material storage tank with high-purity silicon tetrachloride purchased from outside or imported through pipelines, maintain a high liquid level, and then input it into the distillation tower. The distillation tower is fully refluxed and cleaned for 72 hours (second cleaning time), and then the material is passed. Regular inspections are carried out during the process. The whole process takes about 20-30 days, which can effectively remove grease, particles and metal impurities.

[0027] S102: removing first impurities in the distillation system based on the first reagent and the first cleaning time.

[0028] In this embodiment, the impurity information of the distillation system can be divided into first impurities and second impurities, the first impurities can include water, and the second impurities can include grease, impurity particles, metal impurities, etc. The distillation system is replaced by high-purity nitrogen gas, so that the nitrogen gas flows in the system. Since nitrogen gas is gaseous at normal temperature and pressure and does not chemically react with water, the nitrogen gas can gradually squeeze out the original air containing water in the system, thereby reducing the moisture content in the system.

[0029] Exemplarily, the high-purity nitrogen supply pipeline is reasonably connected to each inlet and outlet of the distillation system (including the distillation tower, condenser, reboiler, reflux tank, shielded pump and packing, etc.), and other irrelevant inlets and outlets are closed to form a relatively closed space for the distillation system. Then open the nitrogen valve and introduce high-purity nitrogen into the distillation system at an appropriate flow rate (depending on the size and structure of the system, for example, for a small system, it can be set to 10-20m³ / h; for a medium-sized system, 20-30m³ / h; for a large system, 30-50m³ / h). Moisture detection points are set at key parts of the distillation system (such as the bottom of the distillation tower, the top of the reflux tank, etc.), and the moisture content is detected regularly (such as every 2-4 hours). When the moisture content is less than 20ppb, the first impurity (moisture) is removed. This process is the first cleaning time.

[0030] S103: removing second impurities in the distillation system based on the second reagent and the first time period to obtain a discharge material, and determining a cleaning effect of the distillation system based on a detection result of the discharge material.

[0031] In this embodiment, the discharged material refers to a mixture of silicon tetrachloride, cleaned grease, impurity particles, and metal impurities, etc., which is discharged from the distillation system during the process of using high-purity silicon tetrachloride (second reagent) to clean the distillation system. The test results of the discharged material include the results obtained by component analysis, particle size detection, etc. of the discharged material, which can reflect the type and content of impurities therein. The cleaning effect of the distillation system includes data for evaluating the degree of impurity removal in the distillation system by analyzing the test results of the discharged material, such as whether the impurity content meets the standard and whether the particle size meets the requirements.

[0032] In this embodiment, high-purity silicon tetrachloride is used as a polar solvent to interact with grease, impurity particles and metal impurities to dissolve or entrain the impurities, so that the impurities are detached from the surfaces of various components of the distillation system and discharged from the distillation system along with the silicon tetrachloride.

[0033] Exemplarily, high-purity silicon tetrachloride is charged into the distillation system, and the high-purity silicon tetrachloride is fully circulated in the system, such as by total reflux and other methods to make silicon tetrachloride flow through the distillation tower, condenser and other components. After running for a period of time (the first duration), the material in the distillation system is discharged. The discharged material is collected, and the impurity composition and content thereof are detected by chemical analysis methods, and the particle size is detected by a particle counter. The cleaning effect is evaluated based on these test results. If the impurity content and particle size meet the expected standards, the cleaning effect is good.

[0034] It can be concluded from the above that, on the one hand, this embodiment is highly targeted by using different reagents for cleaning in stages. High-purity nitrogen is used to remove moisture first, and then high-purity silicon tetrachloride is used to remove other impurities, thereby avoiding the complications that may arise from simultaneously treating multiple impurities. For example, there is no need to repeatedly adjust the cleaning conditions to take into account the removal of different impurities, which can make the entire cleaning process more orderly and efficient. Moreover, in the silicon tetrachloride cleaning stage, it is fully circulated by means of total reflux, etc., which can quickly and effectively remove impurities and shorten the overall cleaning time.

[0035] On the other hand, this embodiment accurately selects reagents according to the type of impurities, avoiding the use of a large amount of unnecessary general cleaning agents. For example, the method of replacing water with nitrogen is simple and direct, and does not waste too much nitrogen. Silicon tetrachloride can make full use of its polar solvent characteristics in cleaning, effectively clean impurities at a suitable liquid level and flow rate, and reduce the waste of reagents.

[0036] On the other hand, the present embodiment adopts a staged cleaning method and a method of testing and evaluating the discharged material to ensure high-quality cleaning. The moisture content is precisely controlled, and the composition and particle size of the discharged material are tested during the silicon tetrachloride cleaning stage to ensure that the impurity content and particle size meet the requirements, thereby ensuring the high cleanliness of the distillation system, which is conducive to the subsequent production of high-quality electronic-grade dichlorosilane.

[0037] In one embodiment of the present disclosure, the impurity information includes impurity type, impurity content and impurity position.

[0038] Determine reagent information and cleaning time based on the impurity information of the distillation system, including: Determine reagent information based on impurity type and impurity content.

[0039] The cleaning time is determined based on the location of the impurity.

[0040] In this embodiment, the reagent information also includes the first reagent dosage and the first dosage, the first reagent dosage is the dosage of the first reagent corresponding to the distillation system, and the first dosage is the dosage of the second reagent corresponding to the distillation system. The impurity type includes the first impurity and the second impurity.

[0041] Determine reagent information based on impurity type and impurity content, including: If the impurity type is the first impurity, the impurity content of the first impurity is determined, and the amount of the first reagent is determined based on the impurity content of the first impurity.

[0042] If the impurity type is a second impurity, the impurity content of the second impurity is determined, and the first dosage is determined based on the impurity content of the second impurity.

[0043] In this embodiment, the impurity type refers to the type of impurity in the distillation system, and the impurity type may include water (first impurity) and grease, impurity particles, metal impurities, etc. (second impurities). The impurity content refers to the amount of each impurity in the distillation system, expressed in a specific concentration unit, such as ppb. The impurity position refers to the distribution of impurities in various components of the distillation system (rectification tower, condenser, reboiler, reflux tank, shielded pump, packing, etc.). The first reagent dosage is the amount of high-purity nitrogen used to remove the first impurity (water). The first dosage is the amount of high-purity silicon tetrachloride used to remove the second impurity.

[0044] In this embodiment, the appropriate amount of reagent is determined according to the type and content of the impurities to ensure that there are enough reagents to fully react or act with the impurities to achieve the purpose of removing the impurities. At the same time, the cleaning time is determined according to the location distribution of the impurities in the system, because impurities at different locations may require different times to be contacted and removed by the reagents, thereby ensuring that the entire distillation system can be effectively cleaned.

[0045] Exemplarily, determining the amount of reagent based on the type and content of impurities may include: For the first impurity (water): by setting up detection points at key parts of the distillation system (such as the bottom of the tower, the top of the tank, etc.), use professional moisture detection instruments (such as Karl Fischer titrator) to detect the moisture content. Calculate the required amount of high-purity nitrogen based on the total volume and complexity of the distillation system and the detected moisture content. The larger the volume of the distillation system and the higher the initial moisture content, the greater the amount of nitrogen required. The specific dosage relationship can be determined by establishing a mathematical model or referring to previous experience in cleaning similar systems.

[0046] For secondary impurities (grease, particles, metal impurities, etc.): Samples taken from different locations in the distillation system are subjected to component analysis, particle counting and other tests to determine the content of various secondary impurities. Then, based on parameters such as the surface area of ​​the equipment in the system and the volume of the filler, combined with the impurity content, the required amount of high-purity silicon tetrachloride is calculated. For example, if the surface area in the distillation system is large and the impurity content is high, more silicon tetrachloride is required to fully contact and remove the impurities.

[0047] Exemplarily, determining the cleaning time based on the impurity location may include: Analyze the distribution of impurities in various components such as distillation towers, condensers, reboilers, reflux tanks, shielded pumps, and packings. For locations that are difficult to reach or prone to impurities accumulation (such as inside the packing, at pipe elbows, etc.), appropriately extend the cleaning time. For example, when using high-purity nitrogen to replace water, if it is found that the water at the end of some pipes is discharged slowly, increase the detection frequency and replacement time in these areas. When using high-purity silicon tetrachloride for cleaning, for distillation towers with a large amount of packing, determine the duration of full reflux or circulation cleaning based on the height of the packing layer and the distribution of impurities in the packing to ensure that silicon tetrachloride can fully flow through all parts of the packing and bring out impurities. At the same time, set detection points at key locations of the system (such as the bottom of the reboiler, the inlet and outlet of the condenser, etc.), regularly detect the removal of impurities, and dynamically adjust the cleaning time based on the test results.

[0048] This embodiment determines the amount of reagents by accurately analyzing the type and content of impurities to avoid reagent waste, such as accurately using nitrogen according to the moisture content and the distillation system conditions, and reasonably using silicon tetrachloride according to the second impurity conditions. It ensures that the reagents and impurities fully interact and efficiently remove impurities. This embodiment also determines the cleaning time based on the location of the impurities, focusing on areas where impurities are easily accumulated, such as the inside of the packing and the elbows of the pipe. By increasing the detection frequency, extending the cleaning time, dynamically adjusting the duration, etc., it is ensured that every corner of the distillation system can be effectively cleaned, the cleanliness of the entire distillation system is improved, and the subsequent distillation work is guaranteed to proceed smoothly.

[0049] In one embodiment of the present disclosure, the distillation system comprises: a distillation tower, characterized in that it also comprises: The second amount and the second duration are determined based on the impurity information of the distillation tower, wherein the second amount is the amount of the second reagent corresponding to the distillation tower and the second duration is the cleaning duration corresponding to the distillation tower.

[0050] The distillation column is cleaned based on the second amount and the second time period.

[0051] In this embodiment, determining the second amount and the second duration based on the impurity information of the distillation tower includes: During a first time period, solution data of the distillation tower is collected based on a first collection frequency, and impurity information of the distillation tower is determined based on the solution data of the distillation tower.

[0052] The first dosage is adjusted based on the impurity information of the distillation tower to obtain a second dosage.

[0053] The first duration is adjusted based on the impurity information of the distillation tower and the second dosage to obtain a second duration.

[0054] In this embodiment, the second amount refers specifically to the amount of high-purity silicon tetrachloride used to clean the distillation tower. The second duration refers to the time required for the distillation tower to be cleaned with high-purity silicon tetrachloride. The first acquisition frequency refers to the time interval for collecting the relevant data of the solution in the distillation tower (such as composition, impurity concentration, etc.) within the first duration. The solution data includes information such as the composition of the solution in the distillation tower, the content of various impurities, and the physical properties of the solution (such as density, viscosity, etc.). These solution data can reflect the impurity situation.

[0055] In this embodiment, within the first time period initially set, the solution data in the distillation tower is collected at the first frequency to analyze the impurity information in the distillation tower. According to the impurity information, the amount of high-purity silicon tetrachloride previously planned for the entire distillation system (the first amount) is adjusted to obtain an amount suitable for the distillation tower (the second amount). At the same time, in combination with the impurity information and the adjusted amount of silicon tetrachloride, the cleaning time (the first time period) is also adjusted accordingly to determine the cleaning time (the second time period) of the distillation tower, thereby achieving more accurate and effective cleaning of the distillation tower.

[0056] For example, within the first time period (which can be preliminarily set based on experience, such as 15 days) of starting to clean the distillation tower, solution samples are collected from different positions of the distillation tower (such as the bottom, middle, top, etc.) at a specific first collection frequency (such as once a day). The samples are tested using professional analytical instruments to obtain solution data, including using a spectrometer to determine the solution composition, using a chemical analysis method to detect the impurity content, and using a viscometer and a density meter to measure relevant physical properties.

[0057] Based on the collected solution data, the impurity type (such as oil, metal impurities, etc.) and content are analyzed to determine the distribution of impurities in the distillation tower, such as whether the concentration is higher in certain parts.

[0058] The first amount (high-purity silicon tetrachloride) originally used for the entire distillation system is adjusted according to parameters such as the impurity content and the volume and internal surface area of ​​the distillation tower. If the impurity content is high, the volume of the distillation tower is large, or the internal surface area is large, the second amount is increased.

[0059] The first duration is adjusted to obtain the second duration based on the stubbornness of the impurities (determined by the impurity type) and the second dosage. For example, if more stubborn metal impurities are detected and the dosage of silicon tetrachloride is increased, the cleaning time can be appropriately extended to ensure that the impurities can be fully cleaned. During the cleaning process, the solution data can be continuously monitored to further optimize the cleaning parameters.

[0060] This embodiment can accurately grasp the impurity status in the distillation tower by collecting solution data to determine impurity information. Adjusting the amount of silicon tetrachloride based on this information can avoid incomplete cleaning due to insufficient dosage or waste caused by excessive dosage, making the cleaning more targeted. In addition, adjusting the cleaning time in combination with the impurity situation and dosage can reasonably arrange the time. For stubborn impurities and increased dosage, the time is appropriately extended to ensure the cleaning effect, while avoiding unnecessary long-term cleaning, improving the efficiency of the entire cleaning process, and ensuring the cleanliness and subsequent operating performance of the distillation tower.

[0061] In one embodiment of the present disclosure, the distillation system comprises: a reflux drum, characterized in that it also comprises: The third amount and the third duration are determined based on the impurity information of the reflux tank, wherein the third amount is the amount of the second reagent corresponding to the reflux tank, and the third duration is the cleaning duration corresponding to the reflux tank.

[0062] The reflux tank is cleaned based on the third amount and the third time period.

[0063] In this embodiment, determining the third amount and the third duration based on the impurity information of the reflux tank includes: During the first time period, the solution data of the reflux tank is collected based on the second collection frequency, and the impurity information of the reflux tank is determined based on the solution data of the reflux tank.

[0064] The first dosage is adjusted based on the impurity information of the reflux tank to obtain a third dosage.

[0065] The first duration is adjusted based on the impurity information of the reflux tank and the third dosage to obtain a third duration.

[0066] In this embodiment, the third amount is the amount of high-purity silicon tetrachloride specifically used for cleaning the reflux tank. The third duration is the time required for the reflux tank to be cleaned with high-purity silicon tetrachloride. The second acquisition frequency is the time interval for collecting solution data (such as composition, impurity concentration, etc.) in the reflux tank within the first duration. The solution data includes information such as the composition of the solution in the reflux tank, the impurity content, and the physical properties of the solution, and these solution data can reflect the impurity situation in the reflux tank.

[0067] In this embodiment, during the first time period, the solution data in the reflux tank is collected according to the second collection frequency to analyze the impurity information in the reflux tank. According to the impurity information, the amount of high-purity silicon tetrachloride (first amount) originally planned for the entire distillation system is adjusted to obtain the amount (third amount) suitable for the reflux tank. At the same time, combined with the impurity information of the reflux tank and the determined third amount, the first time period is adjusted to obtain the cleaning time (third time period) of the reflux tank, so as to achieve more reasonable and effective cleaning of the reflux tank.

[0068] For example, within a set first time period (such as 10 days, which can be set based on experience and the situation of the reflux tank), solution samples are collected from different parts of the reflux tank (such as inlet and outlet, different heights in the tank, etc.) according to a second collection frequency (such as once every two days). Use professional testing equipment to analyze the samples and obtain solution data. For example, the solution composition is determined by a chromatogram-mass spectrometer, the impurity content is detected by a specific chemical analysis method, and the relevant physical properties are measured using a density meter, a conductivity meter, etc.

[0069] Based on the collected solution data, analyze the impurity type (such as solid particles, organic impurities, etc.) and content, and clarify the distribution characteristics of impurities in the reflux tank, such as whether there is a high concentration of impurities at the bottom of the tank or near the inlet and outlet.

[0070] The first dosage (high-purity silicon tetrachloride) is adjusted to obtain the third dosage according to factors such as the impurity content and the volume and inner surface area of ​​the reflux tank. If the impurity content is high, the volume of the reflux tank is large, or the inner surface area is large, the third dosage is increased accordingly.

[0071] Combined with the characteristics of the impurities (determine the stubbornness according to the type of impurities) and the third dosage, the first duration is adjusted to obtain the third duration. If the impurities are stubborn and the third dosage increases, the third duration is appropriately extended. For example, if there are more organic impurities with strong adhesion and the dosage of silicon tetrachloride increases, the cleaning time can be appropriately extended to ensure that the impurities are completely removed. During the cleaning process, the solution data can be continuously monitored to further optimize the cleaning parameters.

[0072] In this embodiment, the equipment differences are taken into account: the distillation tower and the reflux tank are different in structure and function. There are complex packing or tray structures inside the distillation tower, and the gas-liquid contact is frequent. The impurity distribution is affected by mass transfer and heat transfer, and the impurity situation is different at different heights and positions. The reflux tank mainly plays a temporary storage and buffering role, and the impurity distribution is relatively simple, but impurities are easily accumulated in the inlet and outlet. Therefore, targeted detection data is required.

[0073] Considering the difference in impurities: The sources and types of impurities in the distillation tower and the reflux tank are different. The impurities in the distillation tower come from the feed, internal reactions, etc., and there are solid and liquid impurities of various types. The impurities in the reflux tank mainly come from the reflux liquid and may be concentrated in specific parts. Therefore, adjusting the cleaning amount and duration according to the respective impurity conditions can more effectively remove impurities.

[0074] Through targeted data detection and adjustment, the shortcomings of unified cleaning solutions, such as excessive or insufficient cleaning, can be avoided, cleaning efficiency and quality can be improved, resource waste and potential damage to equipment can be reduced, and equipment performance and product quality can be guaranteed.

[0075] This embodiment avoids the problems caused by unified cleaning with other equipment such as distillation towers by collecting data and adjusting cleaning parameters according to the characteristics of the reflux tank itself. It can accurately clean the reflux tank inlet and outlet, the bottom of the tank and other parts prone to impurity accumulation, as well as its specific impurity types and contents, improve the cleaning efficiency, and ensure that impurities are effectively removed. This embodiment can prevent the waste of silicon tetrachloride caused by excessive cleaning, and at the same time avoid damage to the equipment caused by residual impurities due to insufficient cleaning. Accurate cleaning ensures the performance of the reflux tank, thereby ensuring the stable operation of the entire distillation system, which helps to improve product quality.

[0076] Corresponding to the distillation system cleaning method of the above embodiment, Figure 2 This is a structural block diagram of a distillation system cleaning device provided by an embodiment of the present disclosure. For ease of description, only the parts related to the embodiment of the present disclosure are shown. Figure 2 The distillation system cleaning device 20 is applied to an electronic grade dichlorosilane distillation system, and includes: a first calculation module 21, a first cleaning module 22 and a second cleaning module 23.

[0077] The first calculation module 21 is used to determine the reagent information and the cleaning time based on the impurity information of the distillation system. The reagent information includes the first reagent and the second reagent, and the cleaning time includes the first cleaning time and the first time.

[0078] The first cleaning module 22 is used to remove first impurities in the distillation system based on a first reagent and a first cleaning time.

[0079] The second cleaning module 23 is used to remove second impurities in the distillation system based on the second reagent and the first time period to obtain a discharge material, and determine a cleaning effect of the distillation system based on a detection result of the discharge material.

[0080] In one embodiment of the present disclosure, the impurity information includes impurity type, impurity content and impurity position.

[0081] The first calculation module 21 is specifically used to determine reagent information based on impurity type and impurity content.

[0082] The cleaning time is determined based on the location of the impurity.

[0083] In one embodiment of the present disclosure, the reagent information also includes a first reagent dosage and a first dosage, wherein the first reagent dosage is the dosage of the first reagent corresponding to the distillation system, and the first dosage is the dosage of the second reagent corresponding to the distillation system. The impurity type includes a first impurity and a second impurity. The first calculation module 21 is further specifically used to determine the impurity content of the first impurity if the impurity type is the first impurity, and determine the first reagent dosage based on the impurity content of the first impurity.

[0084] If the impurity type is a second impurity, the impurity content of the second impurity is determined, and the first dosage is determined based on the impurity content of the second impurity.

[0085] In one embodiment of the present disclosure, reference Figure 3 The distillation system includes: a distillation tower, and the distillation system cleaning device 20 also includes: The second calculation module 24 is used to determine a second amount and a second duration based on the impurity information of the distillation tower, wherein the second amount is the amount of the second reagent corresponding to the distillation tower and the second duration is the cleaning duration corresponding to the distillation tower.

[0086] The distillation column is cleaned based on the second amount and the second time period.

[0087] In one embodiment of the present disclosure, reference Figure 3 The second calculation module 24 is specifically used to collect solution data of the distillation tower based on the first collection frequency within the first time period, and determine the impurity information of the distillation tower based on the solution data of the distillation tower.

[0088] The first dosage is adjusted based on the impurity information of the distillation tower to obtain a second dosage.

[0089] The first duration is adjusted based on the impurity information of the distillation tower and the second dosage to obtain a second duration.

[0090] In one embodiment of the present disclosure, reference Figure 3 , the distillation system includes: a reflux tank, and the distillation system cleaning device 20 also includes: The third calculation module 25 is used to determine a third amount and a third duration based on the impurity information of the reflux tank, wherein the third amount is the amount of the second reagent corresponding to the reflux tank and the third duration is the cleaning duration corresponding to the reflux tank.

[0091] The reflux tank is cleaned based on the third amount and the third time period.

[0092] In one embodiment of the present disclosure, reference Figure 3 The third calculation module 25 is specifically used to collect the solution data of the reflux tank based on the second collection frequency within the first time period, and determine the impurity information of the reflux tank based on the solution data of the reflux tank.

[0093] The first dosage is adjusted based on the impurity information of the reflux tank to obtain a third dosage.

[0094] The first duration is adjusted based on the impurity information of the reflux tank and the third dosage to obtain a third duration.

[0095] See also Figure 4 , Figure 4 A schematic block diagram of an electronic device provided by an embodiment of the present disclosure. Figure 4The electronic device 300 in the embodiment shown may include: one or more processors 301, one or more input devices 302, one or more output devices 303 and one or more memories 304. The processors 301, input devices 302, output devices 303 and memories 304 communicate with each other via a communication bus 305. The memory 304 is used to store computer programs, which include program instructions. The processor 301 is used to execute the program instructions stored in the memory 304. The processor 301 is configured to call the program instructions to execute the functions of the modules in the above-mentioned device embodiments, such as Figure 2 The functions of modules 21 to 23 are shown.

[0096] It should be understood that in the embodiment of the present disclosure, the processor 301 may be a central processing unit (CPU), and the processor may also be other general-purpose processors, digital signal processors (DSP), application-specific integrated circuits (ASIC), field-programmable gate arrays (FPGA) or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components, etc. A general-purpose processor may be a microprocessor or the processor may also be any conventional processor, etc.

[0097] The input device 302 may include a touch panel, a fingerprint collection sensor (for collecting the user's fingerprint information and fingerprint direction information), a microphone, etc., and the output device 303 may include a display (LCD, etc.), a speaker, etc.

[0098] The memory 304 may include a read-only memory and a random access memory, and provide instructions and data to the processor 301. A portion of the memory 304 may also include a non-volatile random access memory. For example, the memory 304 may also store information about the device type.

[0099] In a specific implementation, the processor 301, input device 302, and output device 303 described in the embodiments of the present disclosure may execute the implementation methods described in the first and second embodiments of the distillation system cleaning method provided in the embodiments of the present disclosure, and may also execute the implementation methods of the electronic device 300 described in the embodiments of the present disclosure, which will not be repeated here.

[0100] In another embodiment of the present disclosure, a computer-readable storage medium is provided, wherein the computer-readable storage medium stores a computer program, wherein the computer program includes program instructions, and when the program instructions are executed by the processor, all or part of the processes in the above-mentioned embodiment method are implemented, and the computer program can also be completed by instructing the relevant hardware through the computer program. The computer program can be stored in a computer-readable storage medium, and when the computer program is executed by the processor, the steps of each of the above-mentioned method embodiments can be implemented. Among them, the computer program includes computer program code, and the computer program code can be in source code form, object code form, executable file or some intermediate form, etc. The computer-readable medium can include: any entity or device capable of carrying computer program code, recording medium, U disk, mobile hard disk, magnetic disk, optical disk, computer memory, read-only memory (ROM, Read-Only Memory), random access memory (RAM, Random Access Memory), electric carrier signal, telecommunication signal and software distribution medium, etc.

[0101] The computer-readable storage medium may be an internal storage unit of the electronic device of any of the aforementioned embodiments, such as a hard disk or memory of the electronic device. The computer-readable storage medium may also be an external storage device of the electronic device, such as a plug-in hard disk, a smart memory card (Smart Media Card, SMC), a secure digital (SecureDigital, SD) card, a flash card (Flash Card), etc. equipped on the electronic device. Furthermore, the computer-readable storage medium may also include both an internal storage unit of the electronic device and an external storage device. The computer-readable storage medium is used to store computer programs and other programs and data required by the electronic device. The computer-readable storage medium may also be used to temporarily store data that has been output or is to be output.

[0102] Those of ordinary skill in the art will appreciate that the units and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, computer software, or a combination of the two. In order to clearly illustrate the interchangeability of hardware and software, the composition and steps of each example have been generally described in terms of function in the above description. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Professional and technical personnel can use different methods to implement the described functions for each specific application, but such implementation should not be considered to be beyond the scope of this disclosure.

[0103] Those skilled in the art can clearly understand that, for the convenience and brevity of description, the specific working processes of the electronic devices and units described above can refer to the corresponding processes in the aforementioned method embodiments and will not be repeated here.

[0104] In the several embodiments provided in the present application, it should be understood that the disclosed electronic devices and methods can be implemented in other ways. For example, the device embodiments described above are only schematic, for example, the division of units is only a logical function division, and there may be other division methods in actual implementation, such as multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. In addition, the mutual coupling or direct coupling or communication connection shown or discussed can be an indirect coupling or communication connection through some interfaces or units, or it can be an electrical, mechanical or other form of connection.

[0105] The units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the embodiments of the present disclosure.

[0106] In addition, each functional unit in each embodiment of the present disclosure may be integrated into one processing unit, or each unit may exist physically separately, or two or more units may be integrated into one unit. The above-mentioned integrated unit may be implemented in the form of hardware or in the form of software functional units.

[0107] The above are only specific embodiments of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed in the present disclosure, and these modifications or replacements should be included in the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be based on the protection scope of the claims.

Claims

1. A distillation system cleaning method, applied to electronic grade dichlorosilane distillation system, characterized in that: include: Determining reagent information and cleaning duration based on impurity information of the distillation system; The reagent information includes a first reagent and a second reagent, and the cleaning time includes a first cleaning time and a first time; removing a first impurity in the distillation system based on the first reagent and the first cleaning time; Based on the second reagent and the first time period, second impurities in the distillation system are removed to obtain a discharge material, and based on a detection result of the discharge material, a cleaning effect of the distillation system is determined.

2. The distillation system cleaning method according to claim 1, characterized in that: The impurity information includes impurity type, impurity content and impurity location; The determining of reagent information and cleaning time based on the impurity information of the distillation system includes: determining the reagent information based on the impurity type and the impurity content; The cleaning time is determined based on the impurity location.

3. The distillation system cleaning method according to claim 2, characterized in that: The reagent information also includes a first reagent dosage and a first dosage, wherein the first reagent dosage is the dosage of the first reagent corresponding to the distillation system, and the first dosage is the dosage of the second reagent corresponding to the distillation system; The impurity types include the first impurities and the second impurities; The determining the reagent information based on the impurity type and the impurity content includes: If the impurity type is the first impurity, determining the impurity content of the first impurity, and determining the amount of the first reagent based on the impurity content of the first impurity; If the impurity type is the second impurity, the impurity content of the second impurity is determined, and the first usage amount is determined based on the impurity content of the second impurity.

4. The distillation system cleaning method according to claim 1, characterized in that: The distillation system comprises: a distillation tower; The cleaning method further comprises: Determine a second amount and a second duration based on the impurity information of the distillation tower, wherein the second amount is the amount of the second reagent corresponding to the distillation tower; and the second duration is the cleaning duration corresponding to the distillation tower; The distillation tower is cleaned based on the second amount and the second time period.

5. The distillation system cleaning method according to claim 4, characterized in that: The determining the second amount and the second duration based on the impurity information of the distillation tower comprises: During the first time period, collecting solution data of the distillation tower based on a first collection frequency, and determining impurity information of the distillation tower based on the solution data of the distillation tower; Adjusting the first amount based on the impurity information of the distillation tower to obtain the second amount; The first duration is adjusted based on the impurity information of the distillation tower and the second usage to obtain the second duration.

6. The distillation system cleaning method according to claim 1, characterized in that: The distillation system comprises: a reflux tank; The cleaning method further comprises: Determine a third amount and a third duration based on the impurity information of the reflux tank, wherein the third amount is the amount of the second reagent corresponding to the reflux tank; and the third duration is the cleaning duration corresponding to the reflux tank; The reflux tank is cleaned based on the third amount and the third time period.

7. The distillation system cleaning method according to claim 6, characterized in that: The determining the third amount and the third duration based on the impurity information of the reflux tank includes: During the first time period, the solution data of the reflux tank is collected based on a second collection frequency, and the impurity information of the reflux tank is determined based on the solution data of the reflux tank; Adjusting the first dosage based on the impurity information of the reflux tank to obtain the third dosage; The first duration is adjusted based on the impurity information of the reflux tank and the third dosage to obtain the third duration.

8. A distillation system cleaning device, characterized in that: Applied to electronic grade dichlorosilane distillation system, including: A first calculation module, configured to determine reagent information and a cleaning time based on impurity information of the distillation system; the reagent information includes a first reagent and a second reagent, and the cleaning time includes a first cleaning time and a first time; a first cleaning module, configured to remove first impurities in the distillation system based on the first reagent and the first cleaning time; The second cleaning module is used to remove second impurities in the distillation system based on the second reagent and the first time to obtain a discharge material, and determine a cleaning effect of the distillation system based on a detection result of the discharge material.

9. An electronic device comprising a memory, a processor, and a computer program stored in the memory and running on the processor, characterized in that: When the processor executes the computer program, the steps of the method according to any one of claims 1 to 7 are implemented.

10. A computer-readable storage medium storing a computer program, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 7 are implemented.

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