Substrate processing apparatus and substrate processing method

Abstract

The invention provides a substrate processing apparatus and a substrate processing method, which can restrain reduction of productivity. According to one embodiment, a substrate processing apparatus includes: a transfer robot provided in a transfer chamber and configured to transfer a substrate; a moving mechanism which is provided in the transport chamber and moves the transport robot; and a control unit (72). The control unit (72) is provided with: an identification unit (73) for detecting the position of a person in the transport room; a setting unit (74) that sets a region including the position of the person detected by the recognition unit (73); a following unit (75) that moves the region set by the setting unit (74) in accordance with the movement of the person; and a robot controller (72d) that controls the transfer robot and the moving mechanism such that the transfer robot transfers the substrate while avoiding the area.

Description

[0001] The present invention is a divisional application of the invention patent application with application number 202110335107.1 filed on March 29, 2021 and invention name “Substrate processing device and substrate processing method”. Technical Field

[0002] Embodiments of the present invention relate to a substrate processing apparatus and a substrate processing method. Background Art

[0003] The substrate processing device is a single-chip substrate processing device, and various processes (such as etching, cleaning, rinsing, drying, etc.) are performed one by one on various substrates such as semiconductor wafers, glass substrates for photomasks, and glass substrates for liquid crystals, for example, using multiple processing chambers. The substrate processing device is a device that is configured with multiple processing chambers along a transport chamber (robot chamber) where a transport robot that transports substrates moves. Sometimes, an operator performs maintenance work on the processing chamber from the transport chamber side. The transport chamber is a clean environment with downflow. The operator enters the transport chamber and walks to the processing chamber of the maintenance object to perform maintenance work on the processing chamber.

[0004] When an operator performs maintenance work on the processing chamber from the transport chamber side, the operator needs to cut off the power of the transport robot or the substrate processing device before entering the transport chamber so that the transport robot does not interfere with (collide with, etc.) the operator in the transport chamber. In this case, since the maintenance work is performed after the power of the transport robot or the substrate processing device is cut off, the substrate processing is also stopped. Therefore, productivity (e.g., productivity = production volume / time) is reduced.

[0005] [Prior art literature]

[0006] [Patent Document]

[0007] [Patent Document 1] Japanese Patent No. 4101166 Summary of the invention

[0008] [Problems to be solved by the invention]

[0009] The problem to be solved by the present invention is to provide a substrate processing device and a substrate processing method that can suppress the reduction of productivity.

[0010] [Technical means to solve the problem]

[0011] A substrate processing device according to an embodiment of the present invention includes: a transport robot, which is disposed in a transport chamber and transports a substrate; a moving mechanism, which is disposed in the transport chamber and moves the transport robot; a detection unit, which detects a position of a person in the transport chamber; a setting unit, which sets an area including the position of the person detected by the detection unit; a following unit, which moves the area set by the setting unit in response to the movement of the person; and a control unit, which controls the transport robot and the moving mechanism in such a manner that the transport robot avoids the area moved by the following unit and transports the substrate.

[0012] A substrate processing method according to an embodiment of the present invention includes the following steps: using a detection unit to detect the position of a person in a transport chamber, wherein a transport robot for transporting substrates and a moving mechanism for moving the transport robot are provided in the transport chamber; using a setting unit to set an area including the position of the person detected by the detection unit; using a following unit to move the area set by the setting unit in response to the movement of the person; and using a control unit to control the transport robot and the moving mechanism in such a manner that the transport robot avoids the area moved by the following unit and transports the substrate.

[0013] [Effects of the Invention]

[0014] According to the embodiment of the present invention, a decrease in productivity can be suppressed. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a diagram showing a schematic configuration of a substrate processing apparatus according to a first embodiment.

[0016] Figure 2 It is a diagram for explaining the operating range of the transfer robot according to the first embodiment.

[0017] Figure 3 It is a diagram showing a schematic configuration of a control unit according to the first embodiment.

[0018] Figure 4 This is a first diagram for explaining the adjustment of the motion range of the transfer robot according to the first embodiment.

[0019] Figure 5 This is a second diagram for explaining the adjustment of the motion range of the transfer robot according to the first embodiment.

[0020] Figure 6 It is a diagram for explaining the adjustment of the motion range of the transfer robot according to the second embodiment.

[0021] Figure 7 It is a diagram for explaining a partition member according to a second embodiment.

[0022] [Explanation of Symbols]

[0023] 10: Substrate processing equipment

[0024] 20: Opening and closing unit

[0025] 30: First transport unit

[0026] 31: First moving mechanism

[0027] 32: First Transport Robot

[0028] 32a: Roundabout

[0029] 32b: Swivel axis

[0030] 33: First transfer room

[0031] 33a: Entrance and Exit

[0032] 33b: Camera Department

[0033] 33c: Input section

[0034] 40: Buffer unit

[0035] 50: Second transport unit

[0036] 51: Second moving mechanism

[0037] 52: Second transport robot

[0038] 52a: Roundabout

[0039] 52b: Swivel axis

[0040] 53: Second transport room

[0041] 53a: entrance and exit 53b: camera unit

[0042] 60: Substrate processing unit

[0043] 61: Processing Room

[0044] 70: Device attached unit

[0045] 71: Liquid supply unit

[0046] 72: Control unit

[0047] 72a: Computer

[0048] 72b: Storage

[0049] 72c: Zone Controller

[0050] 72d: Robot controller (control unit)

[0051] 73: Identification unit (detection unit)

[0052] 74: Setting Department

[0053] 75: Followers

[0054] H1: Action range (movement range)

[0055] H2: Range of motion

[0056] R1: Region

[0057] R2: Operation area

[0058] R2a: Separating member

[0059] W: substrate DETAILED DESCRIPTION

[0060] <First embodiment>

[0061] Reference Figures 1 to 5 A first embodiment will be described.

[0062] (Basic structure)

[0063] like Figure 1 As shown, the substrate processing apparatus 10 of the first embodiment includes a plurality of opening and closing units 20, a first conveying unit 30, a buffer unit 40, a second conveying unit 50, a plurality of substrate processing units 60, and an apparatus accessory unit 70. The substrate processing apparatus 10 is an apparatus for processing the surface of a substrate by supplying a processing liquid (e.g., a resist stripping liquid, a rinse liquid, or a cleaning liquid) to the surface of the substrate, and each substrate processing unit 60 performs a plurality of processing steps (e.g., a resist stripping step, a rinse step, or a cleaning step).

[0064] The opening and closing units 20 are arranged in a row. These opening and closing units 20 open and close the door of a special box (for example, a front-opening-unified-pod (FOUP)) that functions as a transfer container. In addition, when the special box is a FOUP, the opening and closing unit 20 is called a FOUP opener. In the special box, substrates W are stacked and stored at predetermined intervals.

[0065] The first transfer unit 30 includes a first moving mechanism 31 and a first transfer robot 32. The first moving mechanism 31 and the first transfer robot 32 are provided in a first transfer room 33. The first transfer room 33 is a rectangular parallelepiped room extending in parallel with the direction in which the opening and closing units 20 are arranged in a row. The opening and closing units 20 are arranged next to the first transfer room 33.

[0066] The first transfer chamber 33 is provided with two entrances and exits 33a. These entrances and exits 33a are respectively provided on the wall surfaces at both ends of the extension direction of the first transfer chamber 33. People (for example, operators) enter and exit the first transfer chamber 33 from the respective entrances and exits 33a. In addition, a plurality of camera units 33b for photographing the interior of the chamber are provided in the first transfer chamber 33. For example, camera units 33b are respectively provided at both ends of the extension direction of the ceiling portion of the first transfer chamber 33. As the camera unit 33b, for example, a camera for photographing can be used. In addition, an air conditioning unit (not shown) for flowing clean air in the form of a downward flow from the ceiling portion is arranged in the first transfer chamber 33, and the clean air flows downward from the top of the substrate W being transported. Thus, dust or dirt generated on the periphery of the substrate, etc., can be prevented from being attached to the substrate W, and dust or dirt generated by the first moving mechanism 31 or the first transfer robot 32, etc., can be prevented from floating and attaching to the substrate W.

[0067] The first moving mechanism 31 extends parallel to the extension direction of the first transfer chamber 33, and is a mechanism for moving the first transfer robot 32 on a straight line parallel to the extension direction of the first transfer chamber 33. The first transfer robot 32 is provided on the first moving mechanism 31, and the first moving mechanism 31 is configured to enable the first transfer robot 32 to move back and forth from end to end of each opening and closing unit 20 arranged in a row. As the first moving mechanism 31, for example, a moving mechanism having a linear guide can be used.

[0068] The first transfer robot 32 can move along the extension direction of the first moving mechanism 31, and is arranged on the first moving mechanism 31 via a rotating platform 32a. The rotating platform 32a is formed to be able to rotate around a rotating axis 32b located on a straight line of the first moving mechanism 31. The first transfer robot 32 is placed on the end of the rotating platform 32a on the opposite side of the rotating axis 32b. The first transfer robot 32 rotates on the rotating platform 32a, thereby offsetting from directly above the first moving mechanism 31. In other words, it is offset to either the opening and closing unit 20 side or the buffer unit 40 side. ( Figure 1 The rotating table 32a supports the first transfer robot 32 and moves together with the first transfer robot 32 along the extension direction of the first transfer mechanism 31 through the first moving mechanism 31. Thus, the first transfer robot 32 can move to a position where it can receive the substrate W from the opening and closing unit 20 or the buffer unit 40. Moreover, the first transfer robot 32 can rotate while moving, and can transfer the substrate W through the passages of the opening and closing units 20 and the buffer unit 40 in the shortest path. In addition, the rotating table 32a can rotate by a rotating mechanism (not shown).

[0069] The first transport robot 32 has, for example, a lifting shaft and a rotating shaft (neither of which is shown in the figure), and can be lifted and lowered along the lifting shaft, and can rotate on the rotating table 32a with the rotating shaft as the center, so that the two telescopic arms can be moved independently. The telescopic arms are provided with substrate hands for holding the substrate W. By making the two arms continuously hold the substrate W and place the held substrate W in the setting place (hand opening), the substrate W can be replaced in a short time. The first transport robot 32 performs the replacement of the substrate W in the dedicated box in a state where it rotates from the rotating table 32a to the side of the first moving mechanism 31 close to the opening and closing unit 20 with the rotating shaft 32b as the center. In addition, the first transport robot 32 performs the replacement of the substrate W in the buffer unit 40 in a state where it rotates from the rotating table 32a to the side of the first moving mechanism 31 far from the closing unit 20 (the side close to the buffer unit 40) with the rotating shaft 32b as the center.

[0070] Here, if Figure 2 As shown, the action range (movement range) H1 of the first transfer robot 32 is the movement range of the three-dimensional region of the first transfer robot 32 (including the movement range of the arm or hand) required for performing the replacement operation of the substrate W with each opening and closing unit 20 or the buffer unit 40. When the first transfer robot 32 is located on the side of each opening and closing unit 20 in the first transfer chamber 33, it can move back and forth from end to end of the first transfer mechanism 31 along the extension direction of the first moving mechanism 31, and perform the replacement operation of the substrate W facing the opening and closing unit 20. Moreover, when the first transfer robot 32 is located on the side of the second transfer unit 50 in the first transfer chamber 33, it can perform the replacement operation of the substrate W facing the buffer unit 40.

[0071] The buffer unit 40 is located on the second transfer unit 50 side in the first transfer chamber 33, and is provided slightly offset from the center of the extension direction of the first moving mechanism 31. The buffer unit 40 is a buffer table, and temporarily places the substrate W in order to transfer (exchange) the substrate W between the first transfer unit 30 and the second transfer unit 50. In the buffer unit 40, unprocessed or processed substrates W are stacked and stored at predetermined intervals.

[0072] The second transfer unit 50 has a second moving mechanism 51 and a second transfer robot 52. These second moving mechanism 51 and the second transfer robot 52 are arranged in a second transfer chamber 53. The second transfer chamber 53 is a rectangular parallelepiped room extending in parallel with a direction perpendicular to the extension direction of the first moving mechanism 31 in a horizontal plane. The second transfer chamber 53 is connected to the first transfer chamber 33 near the center of the extension direction, and the first transfer chamber 33 and the second transfer chamber 53 form a transfer chamber (substrate transfer chamber) in a T-shape when viewed in a plane. Four substrate processing units 60 are arranged facing each other in a manner that the second transfer chamber 53 is sandwiched in the short side direction.

[0073] The second transfer chamber 53 is provided with an entrance 53a for the device accessory unit 70. The entrance 53a is provided on a wall surface at one end of the second transfer chamber 53 in the extension direction. A person (e.g., an operator) enters and exits the device accessory unit 70 through the entrance 53a. In addition, a plurality of camera units 53b for photographing the interior are provided in the second transfer chamber 53. For example, camera units 53b are provided at both ends of the extension direction of the ceiling of the second transfer chamber 53. As the camera unit 53b, for example, a camera for photographing can be used. In addition, in the second transfer chamber 53, an air conditioning unit (not shown) for flowing clean air in a downward flow form from the ceiling is provided in the same manner as in the first transfer chamber 33, and the clean air flows downward from above the substrate W being transported. Thus, dust or dirt generated on the periphery of the substrate can be prevented from adhering to the substrate W, and dust or dirt generated by the second moving mechanism 51 or the second transfer robot 52 can be prevented from floating and adhering to the substrate W.

[0074] The second moving mechanism 51 extends in a direction perpendicular to the extending direction of the first moving mechanism 31 in the horizontal plane, and is a mechanism for moving the second transfer robot 52 in a straight line, and the straight line is parallel to the direction perpendicular to the extending direction of the first moving mechanism 31 in the horizontal plane. The second transfer robot 52 is provided on the second moving mechanism 51, and the second moving mechanism 51 is configured to enable the second transfer robot 52 to move back and forth from end to end of each substrate processing unit 60 arranged in a row. As the second moving mechanism 51, for example, a moving mechanism having a linear guide rail can be used.

[0075] The second transfer robot 52 can move along the extension direction of the second moving mechanism 51, and is arranged on the second moving mechanism 51 via a rotating platform 52a. The rotating platform 52a can rotate around a rotating axis 52b located on a straight line of the second moving mechanism 51. The second transfer robot 52 is placed on the end of the rotating platform 52a on the opposite side of the rotating axis 52b. The second transfer robot 52 is offset from the top of the second moving mechanism 51 by the rotating platform 52a. That is, the second transfer robot 52 is offset to either side of the extension direction of the second moving mechanism 51 (refer to Figure 1 ). The rotary table 52a supports the second transfer robot 52 and moves together with the second transfer robot 52 along the extension direction of the second transfer mechanism 51 through the second moving mechanism 51. Thus, the second transfer robot 52 can move to a position where it can receive the substrate W from the substrate processing unit 60 or the buffer unit 40. Moreover, the second transfer robot 52 can rotate while moving, and can transfer the substrate W through the passages of each processing chamber 61 and the buffer unit 40 in the shortest path. In addition, the rotary table 52a can rotate by a rotating mechanism (not shown).

[0076] The second transport robot 52 is similar to the first transport robot 32, for example, it has a lifting axis and a rotating axis (neither of which is shown in the figure), can be lifted and lowered along the lifting axis, and can rotate on the rotating table 52a with the rotating axis as the center, so that the two telescopic arms can be moved independently. A substrate hand for holding the substrate W is installed on each telescopic arm. By making the two arms continuously perform the action of holding the substrate W and the action of placing the held substrate W in the setting place (hand opening), the substrate W can be replaced in a short time. The second transport robot 52 performs the replacement action of the substrate W in the substrate processing unit 60 of the second moving mechanism 51, which is the replacement object of the substrate W, while rotating from the rotating table 32a to the side of the substrate processing unit 60 of the second moving mechanism 51 close to the replacement object of the substrate W. In addition, the second transport robot 52 performs the replacement action of the substrate W in the buffer unit 40, while moving to the side of the buffer unit 40 of the second moving mechanism 51.

[0077] Here, if Figure 2 As shown, the action range (movement range) H2 of the second transfer robot 52 is the movement range of the three-dimensional region of the second transfer robot 52 (including the movement range of the arm or hand) required for performing the replacement operation of the substrate W with each substrate processing unit 60 or the buffer unit 40. When the second transfer robot 52 is located on the side of each substrate processing unit 60 arranged in a row in the second transfer chamber 53, it can move back and forth from end to end of the second movement mechanism 51 along the extension direction of the second movement mechanism 51, and perform the replacement operation of the substrate W facing the substrate processing unit 60. Moreover, when the second transfer robot 52 is located on the side of the buffer unit 40 in the second transfer chamber 53, it performs the replacement operation of the substrate W facing the buffer unit 40.

[0078] The substrate processing units 60 are provided on both sides of the robot moving path in which the second transfer robot 52 moves along the extension direction of the second moving mechanism 51, for example, four of each. The substrate processing unit 60 has a processing chamber 61, for example, a single-chip substrate processing unit. The processing chamber 61 is formed in a rectangular parallelepiped shape, for example. In this processing chamber 61, a substrate holding part or a processing liquid supply part (neither of which is shown in the figure) is provided. As the substrate holding part, for example, a rotating table that holds the substrate W in a horizontal state and rotates can be used. And, as the processing liquid supply part, for example, a processing liquid supply part that supplies a processing liquid (for example, a chemical liquid or a rinse liquid, a cleaning liquid) to the processed surface of the substrate W held by the substrate holding part from a nozzle (not shown) can be used.

[0079] The processing chamber 61 has a substrate gate (not shown) serving as an entrance and exit for the substrate. The substrate gate is formed on the wall surface of the processing chamber 61 on the side of the second transfer chamber 53 so as to be openable and closable. In the processing chamber 61, an air conditioning unit (not shown) is arranged to flow clean air from the ceiling in the form of a downward flow, and the clean air flows downward from the top of the substrate W being transported. As a result, dust or dirt generated on the periphery of the substrate, etc. can be prevented from adhering to the substrate W, and dust or dirt generated by the second transfer robot 52, etc. can be prevented from floating and adhering to the substrate W. In addition, the operator who performs maintenance work opens the substrate gate and performs maintenance work on the processing chamber 61 from the side of the second transfer chamber 53.

[0080] The device accessory unit 70 is located on the side of the second transfer chamber 53 opposite to the first transfer chamber 33 (first transfer unit 30), and is provided next to the second transfer chamber 53. The device accessory unit 70 includes a liquid supply unit 71 and a control unit 72. The liquid supply unit 71 is configured to supply various processing liquids to each substrate processing unit 60.

[0081] like Figure 3 As shown, the control unit 72 includes a computer 72a, a storage unit 72b, a zone controller 72c, and a robot controller (control unit) 72d. Each of these units is composed of, for example, hardware (e.g., an electrical circuit) and software, or either one of them. The computer 72a is a main control unit (e.g., a microcomputer) that centrally controls each unit. The storage unit 72b stores various information or various programs.

[0082] The computer 72a controls each opening and closing unit 20 or each of the first conveying unit 30, the buffer unit 40, the second conveying unit 50, and each of the substrate processing units 60 based on the substrate processing information or various programs stored in the storage unit 72b. In addition, the computer 72a can obtain mechanical position information from the first moving mechanism 31 or the first conveying robot 32, the second moving mechanism 51, the second conveying robot 52, etc. at any time, for example, it can obtain respective position information (for example, plane coordinates or space coordinates) from a plurality of encoders included in these respective parts at any time. Furthermore, the computer 72a can obtain respective image information from each camera unit 33b and camera unit 53b at any time. In addition, each camera unit 33b and camera unit 53b respectively shoots the interior of the conveying room of the first conveying room 33 or the second conveying room 53 in real time, and sends image information related to the image obtained by shooting to the area controller 72c.

[0083] The area controller 72c includes a recognition unit (detection unit) 73, a setting unit 74, and a tracking unit 75. The recognition unit 73 analyzes images based on image information obtained by the camera units 33b and 53b, detects people (presence or absence of people), the first transfer robot 32, and the second transfer robot 52 in the first transfer room 33 or the second transfer room 53, and recognizes their positions or areas (three-dimensional areas). The setting unit 74 sets the area R1, which is a spatial area of ​​a desired size including the position of the person detected by the recognition unit 73 (see Figure 4 and Figure 5 ), and stores information including the shape, size, position, etc. of the region R1 in the storage unit 72b. The region R1 is, for example, a cylindrical space region of a desired size that includes at least the detected person, and the region R1 is set by spatial coordinates. The tracking unit 75 moves the region R1 set by the setting unit 74 in accordance with the movement of the person. For example, the tracking unit 75 changes the position information of the region R1 in the information stored in the storage unit 72b in accordance with the movement of the person.

[0084] If the recognition unit 73 detects the position of a person in the first transfer chamber 33 or the second transfer chamber 53, the computer 72a switches the operation mode from the normal operation mode to the maintenance operation mode (an example of the operation mode). The normal operation mode is a mode in which the substrate processing apparatus 10 performs normal operation and a person does not enter the first transfer chamber 33 or the second transfer chamber 53. The maintenance operation mode is a mode in which a person enters the first transfer chamber 33 or the second transfer chamber 53 to perform maintenance work. For example, if the recognition unit 73 detects the position of a person in the first transfer chamber 33 or the second transfer chamber 53, the computer 72a grasps that the person has entered the first transfer chamber 33 or the second transfer chamber 53, and switches the operation mode from the normal operation mode to the maintenance operation mode. Furthermore, if the recognition unit 73 does not detect the position of a person in the first transfer chamber 33 and the second transfer chamber 53, the computer 72a grasps that the person is not in the first transfer chamber 33 or the second transfer chamber 53, and switches the operation mode from the maintenance operation mode to the normal operation mode. In this way, the computer 72a functions as a switching unit.

[0085] The robot controller 72d controls the first moving mechanism 31, the first conveying robot 32 (including the turntable 32a, the same below), the second moving mechanism 51, the second conveying robot 52 (including the turntable 52a, the same below), etc., in such a manner that the first conveying robot 32 or the second conveying robot 52 moves away from the area R1 only when the operation mode is the maintenance operation mode. That is, the robot controller 72d identifies the motion range H1 of the first conveying robot 32 or the motion range H2 of the second conveying robot 52 based on the motion range information related to the motion range H1 of the first conveying robot 32 or the motion range H2 of the second conveying robot 52, changes the identified motion range H1 and motion range H2 according to the movement of the area R1 in a manner that does not contact the area R1, and stores the changed motion range H1 and motion range H2 in the storage unit 72b at any time. In addition, the robot controller 72d controls the first moving mechanism 31, the first transport robot 32, the second moving mechanism 51, the second transport robot 52, etc., so that the first transport robot 32 and the second transport robot 52 transport the substrate W only within the motion range H1 and the motion range H2 stored in the storage unit 72b. In addition, the motion range information mentioned above is information that specifies the motion range H1 and the motion range H2 by space coordinates, for example, and is pre-stored in the storage unit 72b.

[0086] (Maintenance work)

[0087] Next, maintenance work performed by an operator in the substrate processing apparatus 10 will be described. Figure 4 and Figure 5 A case where maintenance work is performed on the processing chamber 61 of A1 in FIG.

[0088] like Figure 4 As shown, the operator enters the first transfer chamber 33 from the entrance 33a of the first transfer chamber 33 and moves to the vicinity of the buffer unit 40. Figure 5 As shown, the second transfer chamber 53 is entered from the vicinity of the buffer unit 40 and moved to the position facing the second transfer chamber 53. Figure 5 Next, the operator performs maintenance work on each part in the processing chamber 61 of A1. When the maintenance work is completed, the operator moves in the reverse direction along the path from the entrance 33a of the first transfer chamber 33 to the position facing the processing chamber 61 of A1, and exits from the entrance 33a of the first transfer chamber 33.

[0089] In this way, the operator moves to perform maintenance work, and in the first transfer room 33 and the second transfer room 53, each camera unit 33b and the camera unit 53b take real-time pictures of the room. If the operator enters the first transfer room 33, the recognition unit 73 detects the operator based on the image information obtained by each camera unit 33b, and the computer 72a switches the normal operation mode to the maintenance operation mode. On the other hand, if the operator completes the maintenance work and exits the first transfer room 33 and the second transfer room 53, the recognition unit 73 does not detect the operator based on the image information obtained by each camera unit 33b and the camera unit 53b, and the computer 72a switches the maintenance operation mode to the normal operation mode. In the normal operation mode, the recognition action of the recognition unit 73, the setting action of the setting unit 74, the tracking action of the tracking unit 75, and the avoidance control action (control action to make the second transfer robot 52 avoid the area R1) of the robot controller 72d are prohibited, and the above-mentioned actions are allowed in the maintenance operation mode.

[0090] Furthermore, based on the image information obtained by the imaging units 33b and 53b, the recognition unit 73 detects the operator, the first transfer robot 32, and the second transfer robot 52, and recognizes the presence and position of the operator, the position of the first transfer robot 32, and the position of the second transfer robot 52. The setting unit 74 sets the region R1 including the position of the operator detected by the recognition unit 73, and stores the information including the shape, size, position, etc. of the region R1 in the storage unit 72b. Based on the image information obtained by the imaging units 33b and 53b, the presence and position of the operator, the position of the first transfer robot 32, and the position of the second transfer robot 52 are recognized in real time. Therefore, the position information of the region R1 in the information stored in the storage unit 72b changes at any time according to the movement of the operator.

[0091] The robot controller 72d identifies the motion range H1 of the first conveying robot 32 or the motion range H2 of the second conveying robot 52 based on the motion range information stored in the storage unit 72b, and based on the information stored in the storage unit 72b, changes the identified motion range H1, motion range H2 according to the movement of the area R1 in a manner that does not contact the area R1. Figure 5 In the process, the robot controller 72d changes the identified motion range H2 according to the movement of the area R1 in a manner that does not contact the area R1, and based on the changed motion range H2, controls the second moving mechanism 51 and the second transport robot 52 in a manner that the second transport robot 52 avoids the area R1 and transports the substrate W, that is, in a manner that the second transport robot 52 transports the substrate W only within the changed motion range H2.

[0092] Here, the first transfer robot 32 basically transfers the substrate between each opening and closing unit 20 and the buffer unit 40, but transfers the substrate W in such a manner that the transfer path of the substrate W becomes the shortest distance within the operating range H1 of the first transfer robot 32. In addition, the second transfer robot 52 transfers the substrate between the processing chamber 61 and the buffer unit 40, and further transfers the substrate between each processing chamber 61, but transfers the substrate W in such a manner that the transfer path of the substrate W becomes the shortest distance within the operating range H2 of the second transfer robot 52. Therefore, the transfer path of the substrate W is set by the robot controller 72d in such a manner that the transfer path of the substrate W becomes the shortest distance within the operating range H1 of the first transfer robot 32 or the operating range H2 of the second transfer robot 52. That is, the substrate transfer operation within the operating range H1 of the first transfer robot 32 or the operating range H2 of the second transfer robot 52 is realized based on the shortest distance (shortest path) of the transfer path of the substrate W.

[0093] For example, in a case where the rotation direction of the second transfer robot 52 is a rotation direction (for example, counterclockwise) in which the second transfer robot 52 rotates outside the motion range H2 due to the rotation action, the rotation direction is set to a rotation direction opposite to the rotation direction (for example, clockwise), that is, a rotation direction in which the second transfer robot 52 rotates within the motion range H2 due to the rotation action. Moreover, in a case where the second transfer robot 52 rotates outside the motion range H2 due to the rotation action when only the rotation direction is changed, the second transfer robot 52 rotates while moving in a direction away from the operator (in a state offset to the processing chamber side opposite to the processing chamber where the operator performs the operation) through the second moving mechanism 51, or rotates while retracting the two telescopic arms. As the rotation action, there is an action in which the second transfer robot 52 rotates through the turntable 32a, or an action in which the second transfer robot 52 rotates on the turntable 32a alone (refer to Figure 2 ) The robot controller 72 d appropriately selects various operations including the above-mentioned operations and performs control, but the operation is selected so that the transport path of the substrate W between each processing chamber 61 and the buffer unit 40 becomes the shortest distance.

[0094] In addition, in the above description, it is assumed that the operator Figure 4 and Figure 5The case where maintenance work is performed on the processing chamber 61 of A1 in the first transfer chamber 33 is considered, but it is not limited to this. For example, it is assumed that the first transfer chamber 33 is entered from the entrance 33a of the first transfer chamber 33 and maintenance work is performed on the nearest opening and closing unit 20. At this time, the robot controller 72d changes the motion range H1 of the first transfer robot 32 according to the movement of the area R1 in a manner that does not contact the area R1. That is, the robot controller 72d changes the recognized motion range H1 according to the movement of the area R1 in a manner that does not contact the area R1, and based on the changed motion range H1, the first moving mechanism 31 and the first transfer robot 32 are controlled in a manner that the first transfer robot 32 avoids the area R1 to transfer the substrate W, that is, in a manner that the first transfer robot 32 transfers the substrate W only within the changed motion range H1.

[0095] Furthermore, the robot controller 72d determines whether the distance between the first transfer robot 32 and the region R1 is less than a predetermined distance based on the position of the first transfer robot 32 and the position of the region R1 identified by the identification unit 73. The predetermined distance is the distance that the first transfer robot 32 moves at a low speed. If the robot controller 72d determines that the distance between the first transfer robot 32 and the region R1 is less than the predetermined distance, the moving speed of the first transfer robot 32 is reduced, so that the moving motion of the first transfer robot 32 transitions to a low-speed motion. For example, when the first transfer robot 32 approaches the operator, the moving speed of the first transfer robot 32 is reduced from the predetermined speed. In addition, when the first transfer robot 32 moves away from the operator, the moving speed of the first transfer robot 32 may be maintained at the predetermined speed without being reduced. Furthermore, the robot controller 72d determines whether the distance between the second transfer robot 52 and the region R1 is less than a predetermined distance based on the position of the second transfer robot 52 and the position of the region R1 identified by the identification unit 73, and performs the same processing as described above on the second transfer robot 52 according to the determination result. The predetermined distance is a distance that the second transfer robot 52 moves at a low speed.

[0096] Figure 4 In the embodiment, the operator enters the first transfer chamber 33 from the entrance 33a of the first transfer chamber 33 and moves to the vicinity of the buffer unit 40. The first transfer robot 32 is offset from the upper side of the first moving mechanism 31 toward the side of each opening and closing unit 20, and the distance between the first transfer robot 32 and the region R1 is not less than the prescribed distance, so the movement of the first transfer robot 32 is not set to a low-speed movement. On the other hand, if the operator is located near the buffer unit 40 and the first transfer robot 32 performs an action for transferring a substrate to the buffer unit 40, the distance between the first transfer robot 32 and the region R1 is less than the prescribed distance, so the movement of the first transfer robot 32 is set to a low-speed movement. Moreover, Figure 5In the maintenance operation, the operator is located at a position facing the processing chamber 61 of A1. Therefore, when the second transfer robot 52 performs an operation for transferring a substrate to the buffer unit 40, the distance between the second transfer robot 52 and the region R1 becomes less than a predetermined distance, and thus the movement of the second transfer robot 52 is set to a low-speed operation.

[0097] Furthermore, the robot controller 72d determines whether the distance between the first transfer robot 32 and the region R1 is less than the prescribed stop distance (less than the prescribed stop distance) based on the position of the first transfer robot 32 and the position of the region R1 identified by the identification unit 73. The prescribed stop distance is pre-set to the following distance: the distance between the first transfer robot 32 and the region R1 is shorter than the prescribed stop distance described above, and the first transfer robot 32 does not contact the region R1. If the operator is too close to the first transfer robot 32, the robot controller 72d determines that the distance between the first transfer robot 32 and the region R1 is less than the prescribed stop distance, and prohibits the movement of the first transfer robot 32 until the distance between them is longer than the prescribed stop distance. For example, if the operator passes by the vicinity of the buffer unit 40 or stops at the vicinity of the buffer unit 40, the robot controller 72d determines that the distance between the first transfer robot 32 and the region R1 is less than the prescribed stop distance, and prohibits the movement of the first transfer robot 32, interrupting the first transfer robot 32 from reaching the buffer unit 40. Furthermore, the robot controller 72d determines whether the distance between the second transfer robot 52 and the region R1 is less than the prescribed stopping distance based on the position of the second transfer robot 52 and the position of the region R1 identified by the identification unit 73, and performs the same processing as described above on the second transfer robot 52 according to the determination result. The prescribed stopping distance is preset to the following distance: the distance between the second transfer robot 52 and the region R1 is shorter than the prescribed stopping distance described above, and the first transfer robot 32 does not contact the region R1.

[0098] Here, if the process of substrate transport is described, two types of treatments are performed on the substrate W, and thus the substrate W is sequentially transported to the opening and closing unit 20, the buffer unit 40, the first processing chamber 61, the second processing chamber 61, the buffer unit 40, and the opening and closing unit 20. In the first processing chamber 61 and the second processing chamber 61, the substrate W is processed using different processing liquids. In detail, Figure 4 and Figure 5As shown, among the eight processing chambers 61 arranged across the second moving mechanism 51, there are four processing chambers (first processing chambers) 61 arranged in a row on one side, and four processing chambers (second processing chambers) 61 arranged in a row on the other side. In the case where two types of processing are performed on the substrate W, different processing is performed in the four first processing chambers 61 arranged in a row on one side and the four second processing chambers 61 arranged in a row on the other side. At this time, the first processing chamber 61 and the second processing chamber 61 that are directly opposite to each other across the second moving mechanism 51 form a group. When the processing in the first processing chamber 61 is completed, the second transfer robot 52 transfers the substrate W from the first processing chamber to the second processing chamber 61. In addition, Figure 5 In the process, based on the movement range H2 of the second transfer robot 52, it is prohibited to reach the processing chamber 61 of A1 which is the maintenance object, and thus the transportation of substrates to the processing chamber 61 of A1 and the transportation of substrates from the processing chamber (first processing chamber) 61 of A1 to the second processing chamber 61 as a group are also prohibited.

[0099] The first transfer robot 32 takes out an unprocessed substrate W from the dedicated box in the opening and closing unit 20, rotates (or moves and rotates), and sets the unprocessed substrate W in the buffer unit 40. The second transfer robot 52 takes out an unprocessed substrate W from the buffer unit 40, rotates (or rotates and moves), and sets the unprocessed substrate W in the desired first processing chamber 61. Then, the substrate W is processed in the first processing chamber 61. If the processing in the first processing chamber 61 is completed, the second transfer robot 52 takes out the substrate W from the first processing chamber 61, rotates 180 degrees, and sets the substrate W in the second processing chamber 61. Then, the substrate W is processed in the second processing chamber 61. If the processing in the second processing chamber 61 is completed, the second transfer robot 52 takes out the substrate W from the second processing chamber 61, rotates (or rotates and moves), and places the substrate W in the buffer unit 40. The first transfer robot 32 takes out the processed substrate W from the buffer unit 40 , rotates (or rotates and moves), and places the processed substrate W in a desired dedicated cassette.

[0100] However, the substrate transport process performed by the second transport robot 52 is performed for each group of the first processing chamber 61 and the second processing chamber 61 directly facing it, but the processing contents in the first processing chamber 61 and the second processing chamber 61 are different, and thus the processing time is also different. In order to improve productivity, the second transport robot 52 uses one of its arms to take out the processed substrate W in each of the buffer unit 40, the first processing chamber 61, and the second processing chamber 61, and uses the other arm to set the unprocessed substrate W. That is, the second transport robot 52 performs the removal action of the processed substrate W and the handover action of the unprocessed substrate W (substrate replacement action) as a set of actions in each of the buffer unit 40, the first processing chamber 61, and the second processing chamber 61. Moreover, the first transport robot 32 also performs the removal action of the processed substrate W and the handover action of the unprocessed substrate W (substrate replacement action) as a set of actions in the buffer unit 40. Furthermore, in order to improve productivity, unprocessed substrates W are respectively placed in each first processing chamber 61 and processed simultaneously in each first processing chamber 61, and the processed substrates W are taken out from the first processing chamber 61 where the processing is completed, placed in the corresponding second processing chamber 61 and processed simultaneously in each second processing chamber 61. Therefore, the actual substrate transfer process is more complicated than the substrate transfer process described above.

[0101] In this substrate transport, the operator can move to the substrate without interfering with the first transport robot 32 and the second transport robot 52. Figure 4 and Figure 5 In front of the processing chamber 61 of A1, you can reach Figure 4 and Figure 5The processing chamber 61 of A1 in the processing chamber 61 of A1 is maintained. That is, even if the operator enters the transport chamber (the first transport chamber 33, the second transport chamber 53), the transport robot (the first transport robot 32, the second transport robot 52) ​​can continue the transport action. If it is recognized that the operator is in the transport chamber, the motion range H1, the motion range H2 and the area R1 of the transport robot are identified, and the transport robot is controlled in a manner that avoids the operator and moves. The transport robot continues the transport operation of transporting the substrate W while avoiding contact with the operator performing the maintenance operation. Even if the transport operation is not stopped by stopping the power of the transport robot or the power of the substrate processing device 10, the operator and the transport robot can share the transport chamber and perform their respective operations (realization of collaborative operation). Therefore, even if the operator enters the transport chamber, the transport robot can continue the transport operation without stopping the substrate transport, and the substrate processing device 10 can continue the substrate processing. Thus, the substrate processing can be prevented from being stopped due to maintenance work, and the reduction of productivity can be suppressed. Moreover, even if the maintenance work is extended, the transfer robot continues the transfer work, so the substrate processing apparatus 10 can continue to process the substrate, and the reduction of productivity can be suppressed.

[0102] Furthermore, the first transfer robot 32 is offset from directly above the first moving mechanism 31 by the rotating platform 32a, and approximately half of the area of ​​the first transfer chamber 33 (the area on the second transfer chamber 53 side of the first transfer chamber 33) becomes outside the action range of the first transfer robot 32. Therefore, a person can move on foot outside the action range of the first transfer robot 32, and it is possible to suppress contact with the first transfer robot 32 compared to the case where the first transfer robot 32 is located directly above the first moving mechanism 31 (the case where a person enters the action range of the first transfer robot 32 and moves). Therefore, by adding the rotating platform 32a between the first transfer robot 32 and the first moving mechanism 31, the first transfer robot 32 is offset from directly above the first moving mechanism 31, and a space that does not interfere with a person can be set, and even if a person enters the first transfer chamber 33 for maintenance work, etc., the first transfer robot 32 can continue to transfer substrates.

[0103] Furthermore, when the operator needs to perform maintenance work on a specific processing chamber 61 among the multiple processing chambers 61 for a long time, the operator can continue to process or transport the substrate without stopping the substrate processing device 10, and the operator can perform maintenance work in the second transport chamber 53. In addition, the operator can perform maintenance work in the second transport chamber 53, so that the maintenance space (space for the operator to reach the processing chamber 61 from the outside of the substrate processing device 10) which is sometimes provided on the side opposite to the second transport chamber 53 can be omitted. As a result, the maintenance area outside the device can be reduced, so that the space utilization efficiency of the clean room with expensive maintenance costs can be improved. That is, there is no need to expand the area outside the substrate processing device 10 as a maintenance space, so even if a plurality of substrate processing devices 10 are installed in the clean room, the device intervals of these substrate processing devices 10 can be narrowed, and the clean room can be effectively used. In addition, as long as the maintenance work can be performed in the transport room where the cleanliness required for substrate transport is maintained, it is also possible to make the cleanliness of the space outside the device lower than the current situation, and the maintenance products for maintaining the cleanliness of the clean room can be reduced. Furthermore, since the maintenance work is performed from the transfer chamber side which is less affected by dust, the time required for the cleanliness recovery after the processing chamber is released can be shortened, and a decrease in productivity can be suppressed.

[0104] Furthermore, in addition to controlling the first transfer robot 32 and the second transfer robot 52 based on mechanical position information (e.g., position information from an encoder), control is also performed based on position information generated by the recognition unit 73 based on image information obtained by the imaging units 33b and 53b, thereby enabling more accurate position control and reliable monitoring of the first transfer robot 32 and the second transfer robot 52. Furthermore, the actual positions of the first transfer robot 32 and the second transfer robot 52 can be grasped, and safety can be improved compared to control using only mechanical position information.

[0105] As described above, according to the first embodiment, the position of a person in the transport chamber (the first transport chamber 33, the second transport chamber 53) is detected and identified, and an area R1 including the identified position of the person is set, and the set area R1 is moved in accordance with the movement of the person, so that the transport robot (the first transport robot 32, the second transport robot 52) ​​avoids the moved area R1 and transports the substrate W, thereby controlling the movement of the transport robot and the moving mechanism (the first moving mechanism 31, the second moving mechanism 51). Thus, even if an operator enters the transport chamber, the transport robot can continue the transport operation without stopping the substrate transport, and the substrate processing device 10 can continue the substrate processing. Thus, the substrate processing can be prevented from being stopped due to maintenance work, and the reduction in productivity can be suppressed. Moreover, even if the maintenance work is prolonged, the transport robot continues the transport operation, so that the substrate processing device 10 can continue the substrate processing, and the reduction in productivity can be suppressed.

[0106] <Second embodiment>

[0107] Reference Figure 6 and Figure 7 The second embodiment will be described. In the second embodiment, the points (input unit and setting unit) different from the first embodiment will be described, and the other descriptions will be omitted.

[0108] like Figure 6 As shown in FIG. 1 , the first transfer chamber 33 of the second embodiment is provided with an input unit 33c. The input unit 33c is arranged near the entrance 33a of the first transfer chamber 33 and receives input operations from a person (e.g., an operator). As the input unit 33c, for example, a switch, a button, a touch screen, etc. can be used. The input unit 33c is electrically connected to the area controller 72c, and when receiving an input operation from a person, the input signal is sent to the area controller 72c (see FIG. 1 ). Figure 3 ). For example, when the operator operates the input unit 33c to instruct the processing chamber 61 to be maintained, input information indicating the processing chamber 61 to be maintained is input to the zone controller 72c as an input signal.

[0109] The setting unit 74 of the area controller 72c sets the work area R2 for people to work in front of the processing chamber 61 indicated by the input information based on the input information input from the input unit 33c, and stores the work area information related to the set work area R2 in the storage unit 72b. Figure 6 If the processing chamber 61 of A2 in the figure is designated as the processing chamber of the maintenance object, the operation area R2 is set in front of the designated processing chamber 61 of the maintenance object. The so-called operation area R2 is, for example, a rectangular space area of ​​required size in front of the processing chamber 61 where the detected person can safely perform maintenance work on the processing chamber 61 of the maintenance object. The operation area R2 is set by spatial coordinates in front of the processing chamber 61 of the maintenance object. In addition, the information input by the operator to set the operation area R2 only needs to be information that can determine the area where the operator performs the operation, and is not limited to the information of the processing chamber 61 of the maintenance object. For example, if it is information indicating any place in the device that the operator can enter, it can be set as input information. Therefore, the information specifying the operation area R2 itself can be set as input information, and the information indicating any place in the conveying area can also be set as input information. Moreover, the operation area R2 is set separately from the area R1.

[0110] During maintenance work, the operator Figure 6 When performing maintenance work on the processing chamber 61 of A2, the operator enters the first transfer chamber 33 from the entrance 33a of the first transfer chamber 33, operates the input unit 33c, and Figure 6The processing chamber 61 of A2 is designated as the maintenance object. Next, the operator moves from the vicinity of the entrance 33a of the first transfer chamber 33 to the vicinity of the buffer unit 40, enters the second transfer chamber 53 from the vicinity of the buffer unit 40, and moves to the position facing the processing chamber 61 of A2. Next, the operator performs maintenance work on each part in the processing chamber 61 of A2. When the maintenance work is completed, the operator moves in the reverse direction along the path just moved from the entrance 33a of the first transfer chamber 33 to the position facing the processing chamber 61 of A2, and exits from the entrance 33a of the first transfer chamber 33.

[0111] When the operator operates the input unit 33c to designate Figure 6 In the embodiment, if the processing chamber 61 of A2 is the maintenance target, input information indicating that the processing chamber 61 of A2 is the maintenance target is sent to the area controller 72c. Based on the sent input information, the setting unit 74 sets the working area R2 in front of the processing chamber 61 of A2. The other processes are the same as those in the first embodiment, but the robot controller 72d controls the second transfer robot 52 and the second moving mechanism 51 in a manner that the second transfer robot 52 transfers the substrate W avoiding the area R1 and the working area R2 based on the working area information related to the set working area R2.

[0112] During substrate transport, the operator can move to the substrate without interfering with the first transport robot 32 and the second transport robot 52. Figure 6 In the embodiment, the processing chamber 61 of A2 can be reached in front of the processing chamber 61 of A2 and maintenance work can be performed on the processing chamber 61 of A2. That is, similar to the first embodiment, even if the operator enters the transfer chamber (the first transfer chamber 33, the second transfer chamber 53), the transfer robot (the first transfer robot 32, the second transfer robot 52) ​​can continue the transfer action. Therefore, it is possible to suppress the substrate processing from being stopped due to maintenance work, and suppress the reduction in productivity. Moreover, even if the maintenance work is extended, the transfer robot continues to perform the transfer work, so that the substrate processing device 10 can continue to process the substrate, and the reduction in productivity can be suppressed. Moreover, the working area R2 is set in front of the processing chamber 61 that becomes the maintenance object. As a result, the second transfer robot 52 moves away from the working area R2, so that the second transfer robot 52 can be reliably prevented from contacting the operator during the maintenance work, and the operator can perform the maintenance work more safely.

[0113] In addition, you can Figure 7As shown, the working area R2 is surrounded by a partition member R2a. As the partition member R2a, for example, a curtain can be used. When using this curtain, a curtain track is set on the ceiling part of the working area R2 located in front of each processing chamber 61. After the operator moves to the working area R2, a partition member R2a is set in the working area R2 (for example, the curtain is installed on the curtain track), and the working area R2 is surrounded by the partition member R2a. Moreover, if it is set as a gate, etc., it can become a protective wall. In this way, the inside of the processing chamber 61 and the working area R2 can be distinguished from the inside of the second transfer chamber 53 (transport area), and the contamination can be suppressed from spreading from the inside of the processing chamber 61 and the working area R2 to the inside of the second transfer chamber 53, thereby suppressing the operator's maintenance work from causing dust to spread to the surroundings.

[0114] As described above, according to the second embodiment, the same effects as those of the first embodiment can be obtained. Furthermore, by setting the work area R2 in front of the processing chamber 61 to be maintained, the second transfer robot 52 moves away from the work area R2. Thus, the second transfer robot 52 can be reliably prevented from contacting the operator during the maintenance work, so that the operator can perform the maintenance work more safely.

[0115] <Other embodiments>

[0116] In the above description, the one-axis first moving mechanism 31 and the rotating table 32a are used for the movement of the first transfer robot 32, and the one-axis second moving mechanism 51 and the rotating table 52a are used for the movement of the second transfer robot 52, but the present invention is not limited thereto. For example, a moving table and a two-axis moving mechanism may be provided to support the first transfer robot 32 or the second transfer robot 52, and the two-axis moving mechanism may be used to move the moving table in two directions (e.g., the X direction and the Y direction) orthogonal to each other in a plane. The first transfer robot 32 or the second transfer robot 52 can move in two directions simultaneously by the two-axis moving mechanism, and can transfer the substrate W in the shortest path.

[0117] Moreover, in the description mentioned above, the camera unit 33b and the camera unit 53b are used as components for grasping the presence or position of a person, but it is not limited to this. For example, a distance sensor using ultrasound or light, a pad switch for confirming the position of the foot on the ground (contact sensor, weight sensor, strain sensor, etc.), a thermal camera, a sound (a sound that attracts attention), etc. may also be used.

[0118] Furthermore, as such a component, a transmitter that transmits radio waves can also be used. A person holds this transmitter or wears this transmitter on the body, and the identification unit (detection unit) 73 identifies (detects) the position of the person based on the transmitted radio waves. Thus, a specified area centered on the transmitter, that is, an area R1 including the position of the person is set. For example, a receiver pre-set in the substrate processing device 10 and registered with position information receives the radio waves emitted from the transmitter. Thus, the identification unit 73 can set the position of the receiver with the strongest radio wave intensity from the transmitter as the position of the person, and calculate the position of the person based on the radio wave intensity received by multiple receivers. More specifically, information communication terminals such as mobile phones, smart phones, wearable devices, tablet terminals, and identification (ID) cards can be used as transmitters, and terminals such as access points and routers that receive beacons emitted from the transmitter can be used as receivers.

[0119] Moreover, in the above description, a cylindrical space area is illustrated as the area R1, but it is not limited to this. For example, a rectangular space area or a spindle-shaped space area or a human-shaped space area that can at least contain the required size of the detected person can also be used. Moreover, a rectangular space area is illustrated as the operation area R2, but it is not limited to this. For example, a cylindrical space area or a spindle-shaped space area that can also contain the required size of the detected person during the operation can also be used. When the area R1 overlaps with the operation area R2, either one can be given priority. For example, any larger area between the area R1 and the operation area R2 can be given priority. Moreover, in the case where a person walks out of the operation area R2, the camera unit 33b and the camera unit 53b can also recognize the operator and immediately set it as the area R1, and the first transfer robot 32 and the second transfer robot 52 can be controlled in a manner to avoid the set area R1.

[0120] Furthermore, in the above description, the maintenance operation is performed by one person, but the present invention is not limited thereto. For example, the maintenance operation may be performed by multiple persons. When the maintenance operation is performed by multiple persons, a region R1 is set for each person, and the first transfer robot 32 or the second transfer robot 52 transfers the substrate W while avoiding the region R1 (multiple regions R1) set for each person.

[0121] In the above description, the moving speed of the first transfer robot 32 or the second transfer robot 52 is reduced based on the distance between the first transfer robot 32 or the second transfer robot 52 and the region R1, but the present invention is not limited thereto. For example, when the operator moves, the moving speed of the first transfer robot 32 or the second transfer robot 52 may be reduced. In addition, the moving speed of the first transfer robot 32 or the second transfer robot 52 may be changed according to the moving speed of the operator. For example, the robot controller 72d reduces the moving speed of the first transfer robot 32 or the second transfer robot 52 if the moving speed of the operator increases, and increases the moving speed of the first transfer robot 32 or the second transfer robot 52 if the moving speed of the operator decreases. In addition, the tracking unit 75 changes the position information of the region R1 in the information stored in the storage unit 72b according to the movement of the person, but the moving speed of the operator may be obtained according to the change of the position information of the region R1.

[0122] Furthermore, in the above description, the example of reducing the moving speed when the first transfer robot 32 or the second transfer robot 52 approaches the operator is illustrated, but the present invention is not limited thereto. For example, even when the first transfer robot 32 or the second transfer robot 52 approaches the operator, the moving speed may not be reduced, and the moving speed may be reduced when the first transfer robot 32 or the second transfer robot 52 moves away from the operator. Furthermore, in the above description, the transport path is selected in such a way that the transport path for the first transfer robot 32 and the second transfer robot 52 to transport the substrate W has the shortest distance, but a transport path with a short distance and low speed movement may be preferentially selected according to the distance from the region R1. In this way, the substrate transport time is shortened.

[0123] In the above description, the operation area R2 (see FIG. 1 ) is set in front of the processing chamber 61 to be maintained. Figure 6 or Figure 7), but not limited to this, in addition to the working area R2, the setting unit 74 may also set a moving area (not shown) for the operator detected by the recognition unit 73 (the operator who enters the first transfer chamber 33 from the entrance 33a of the first transfer chamber 33) to move from the entrance 33a of the first transfer chamber 33 to the working area R2. The so-called moving area is a space area of ​​a required size in which the operator can enter the transfer chamber and move to the working area R2 without contacting the first transfer robot 32 and the second transfer robot 52. The robot controller 72d controls the actions of the first moving mechanism 31, the first transfer robot 32, the second moving mechanism 51, the second transfer robot 52, etc. in such a way that the first transfer robot 32 or the second transfer robot 52 avoids the working area R2 and the moving area and transfers the substrate W. In the above processing, the setting or tracking of the area R1 may not be performed. Then, when the recognition unit 73 detects that the operator moves and is in the working area R2, the setting unit 74 deletes the moving area. When the operator is working in the working area R2, the robot controller 72d controls the actions of the first moving mechanism 31, the first transport robot 32, the second moving mechanism 51, the second transport robot 52, etc. in such a way that the first transport robot 32 or the second transport robot 52 only avoids the working area R2 and transports the substrate W.

[0124] Furthermore, in the above description, two types of processing are performed on the substrate W, but the present invention is not limited thereto. For example, one type of processing may be performed, and three types of processing may be performed. When one type of processing is performed on the substrate W, the second transfer robot 52 transfers the substrate W in the order of the buffer unit 40, the processing chamber 61, and the buffer unit 40. When three types of processing are performed on the substrate W, the second transfer robot 52 transfers the substrate W in the order of the buffer unit 40, the first processing chamber 61, the second processing chamber 61, the third processing chamber 61, and the buffer unit 40. That is, the processing is performed in the order of processing 1 → processing 2 → processing 3, and then the processed substrate is returned to the buffer unit 40. For example, the number of the first processing chambers 61 for processing 1 is set to two, the number of the second processing chambers 61 for processing 2 is set to four, and the number of the third processing chambers 61 for processing 3 is set to two. This is because it is assumed that processing 2 requires twice as much time as processing 1 or processing 3, and the number of the transfer robots is set in multiples.

[0125] In addition, the robot movement is restricted by detecting that the operator is within the robot's movement range H1 or H2 by the sensor of the camera unit 33b or 53b, but the operator's entry and exit from the door of the entrance 33a or 53a is set as the basic movement. Therefore, in the event that the operator appears in the robot's movement range or disappears from the movement range without entering or exiting the door, it can be regarded as an abnormal movement of the operator or an abnormality of the sensor, and the operator's movement can be confirmed by a warning or an alarm.

[0126] Furthermore, when two cameras are used to shoot images and the operator is not recognized by the cameras at both locations, it can be considered that the cameras are abnormal and the operation of the transport robot is temporarily stopped.

[0127] Furthermore, when a plurality of sensors are used and any one of the sensors recognizes a worker, the operation of the transfer robot may be temporarily stopped or the maintenance operation mode may not be returned to the normal operation mode.

[0128] Furthermore, the temporary stop of the action of the transport robot may be displayed on the operation screen of the terminal held by the operator. Furthermore, the reason for the stop, such as an abnormality of the camera, may also be displayed on the terminal. In this case, if the operator can leave the device to ensure safety, the transport robot may start to move by inputting an instruction to release the temporary stop from the terminal. Furthermore, if the operator is moving in the device, the stop may be continued to ensure safety by not inputting an instruction to release the temporary stop from the terminal.

[0129] Furthermore, depending on the activity of the operator, the transport robot may be unable to avoid the operator and may be unable to continue the operation of the robot. A pattern of such an inability to continue the operation may be preset so that after the robot temporarily stops the operation, the robot will not start the operation unless the state corresponding to the preset pattern is eliminated.

[0130] Several embodiments of the present invention have been described above, but these embodiments are provided as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other embodiments, and various omissions, substitutions, and changes can be made without departing from the scope of the invention. These embodiments or their modifications are included in the scope or spirit of the invention, and are included in the invention described in the claims and their equivalents.

Claims

1. A substrate processing device, characterized in that: include: Moving indoors; A transport robot, disposed in the transport chamber, transporting substrates; a moving mechanism, disposed in the transfer chamber, for moving the transfer robot on a straight line parallel to an extending direction of the transfer chamber; a rotating platform supporting the transfer robot, formed to be able to rotate around a rotation axis located on the straight line as a center, and moving together with the transfer robot through the moving mechanism; A detection unit, detecting a position of a person in the transfer room; a setting unit that sets an area including the position of the person detected by the detection unit; a following unit that moves the area set by the setting unit in accordance with the movement of the person; as well as a control unit that controls the transport robot, the moving mechanism, and the rotating table so that the transport robot avoids the area moved by the following unit and transports the substrate; The transfer robot is placed on an end portion of the rotating table on the opposite side to the rotating axis.

2. The substrate processing device according to claim 1, characterized in that: The control unit identifies the movement range of the transport robot, changes the identified movement range of the transport robot in a manner that does not contact the area moved by the following unit, and controls the transport robot, the moving mechanism and the turntable in a manner that the transport robot transports the substrate within the changed movement range of the transport robot.

3. The substrate processing device according to claim 1 or 2, characterized in that: The setting unit sets a work area for a person in the transfer room to perform work. The control unit controls the transfer robot, the moving mechanism, and the rotating stage so that the transfer robot transfers the substrate while avoiding the work area set by the setting unit.

4. The substrate processing device according to claim 1 or 2, characterized in that: The detection unit detects the transfer robot in the transfer room. The control unit obtains a distance between the transfer robot detected by the detection unit and the person detected by the detection unit, and changes a moving speed of the transfer robot based on the obtained distance.

5. The substrate processing device according to claim 1 or 2, characterized in that: Also includes: a switching unit that switches the operation mode from the normal operation mode to the operation mode when the detection unit detects the person; The control unit controls the transfer robot, the moving mechanism, and the rotating stage so that the transfer robot avoids the area moved by the following unit and transfers the substrate only when the operation mode is the working mode.

6. A substrate processing device, characterized in that: include: First transfer room; A first transfer robot is disposed in the first transfer chamber and transfers the substrate; a first moving mechanism, disposed in the first transfer chamber, and moving the first transfer robot on a straight line parallel to an extending direction of the first transfer chamber; a first rotating platform supporting the first transfer robot, being formed to be able to rotate about a rotation axis located on a straight line parallel to the extending direction of the first transfer chamber, and moving together with the first transfer robot through the first moving mechanism; a buffer unit for receiving the substrate transported by the first transport robot; Second transfer room; A second transfer robot is disposed in the second transfer chamber and transfers the substrate between the buffer unit and a substrate processing unit for processing the substrate; a second moving mechanism, disposed in the second transfer chamber, for moving the second transfer robot on a straight line parallel to an extending direction of the second transfer chamber; a second rotating platform supporting the second transfer robot, formed to be able to rotate around a rotation axis located on a straight line parallel to the extension direction of the second transfer chamber, and to move together with the second transfer robot through the second moving mechanism; a detection unit, configured to detect a position of a person in the first transfer room or the second transfer room; a setting unit that sets an area including the position of the person detected by the detection unit; a following unit that moves the area set by the setting unit in accordance with the movement of the person; as well as a control unit that controls the first transfer robot, the first moving mechanism, and the first rotary table, and the second transfer robot, the second moving mechanism, and the second rotary table in such a manner that the first transfer robot and the second transfer robot transfer the substrate while avoiding the area set by the setting unit; The first transfer robot is mounted on the first rotating platform at an end portion opposite to the rotating axis of the first rotating platform. The second transfer robot is placed on an end portion of the second rotating table on the opposite side to the rotating axis of the second rotating table.

7. The substrate processing device according to claim 6, characterized in that: The control unit identifies the movement range of the first transfer robot and the second transfer robot, changes the identified movement range of the first transfer robot and the second transfer robot in a manner that does not contact the area moved by the following unit, and controls the first transfer robot, the first moving mechanism and the first turntable and the second transfer robot, the second moving mechanism and the second turntable in a manner that the first transfer robot and the second transfer robot transfer the substrate within the changed movement range of the first transfer robot and the second transfer robot.

8. A substrate processing method, characterized in that: The process includes the following steps: The detection unit is used to detect the position of a person in a transfer room, wherein the transfer room is provided with a transfer robot for transferring substrates in the transfer room, a moving mechanism for moving the transfer robot on a straight line parallel to an extending direction of the transfer room, and a rotating platform, wherein the rotating platform supports the transfer robot and is formed to be able to rotate around a rotation axis located on the straight line as a center, and moves together with the transfer robot through the moving mechanism; setting, by a setting unit, an area including the position of the person detected by the detection unit; moving the area set by the setting unit according to the movement of the person using a following unit; as well as The control unit controls the transfer robot, the moving mechanism, and the rotating stage so that the transfer robot transfers the substrate while avoiding the area moved by the following unit.

9. The substrate processing method according to claim 8, characterized in that: The control unit identifies the movement range of the transport robot, changes the identified movement range of the transport robot in a manner that does not contact the area moved by the following unit, and controls the transport robot, the moving mechanism and the turntable in a manner that the transport robot transports the substrate within the changed movement range of the transport robot.

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