Dual-band laser imaging micro-nano manufacturing device and method based on spatial light modulation

Abstract

The invention discloses a dual-band laser imaging micro-nano manufacturing device and method based on spatial light modulation, and the manufacturing device comprises the steps: transmitting first laser through a first laser transmitting module, and transmitting second laser through a second laser transmitting module; processing the first laser by using a modulation module to form a graphical light spot corresponding to a preset image, and processing the second laser to form a non-graphical light spot corresponding to the graphical light spot; coupling the graphical light spot and the non-graphical light spot by using a coupling module to obtain a coupled light spot; and finally, projecting the coupling light spot to a to-be-processed area of the target workpiece by using a projection module so as to process the target workpiece. Therefore, it can be ensured that the coupling light spot can machine the target workpiece, so that the machining efficiency is ensured, the situation that the modulation module is damaged due to the fact that the heat effect of the first laser light spot is too large can be avoided, and therefore equipment is protected.

Description

Technical Field

[0001] The present invention relates to the field of micro-nano manufacturing technology, and in particular to a dual-band laser patterning micro-nano manufacturing device and method based on spatial light modulation. Background Art

[0002] Graphical micro-nano manufacturing refers to the technology of patterning materials at the micrometer and nanometer scales, and is mainly used to manufacture high-performance, miniaturized devices and systems. In the process of graphic micro-nano manufacturing, the spatial light modulator is an important device, which is a device that can load information on a one-dimensional or two-dimensional optical data field, modulate light through light interference, diffraction and other phenomena, and adjust the amplitude, phase, polarization state and other parameters of the light wave.

[0003] However, due to the heat resistance limitation of the spatial light modulator, when processing high-temperature rays such as lasers, it is necessary to limit its use time or temperature, which inevitably affects the efficiency of graphic micro-nano manufacturing.

[0004] The current solution to this problem focuses on improving the heat dissipation and materials of the device itself, but the extent of the improvement is difficult to meet the industry's high requirements for processing efficiency and device life, resulting in strict usage restrictions on the device's heat resistance. At the same time, thermal fatigue caused by high temperature shortens the device's service life. Summary of the invention

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art.

[0006] To this end, one purpose of the present invention is to propose a dual-band laser patterning micro-nano manufacturing device based on spatial light modulation, which can not only ensure that the coupled spot can process the target workpiece, thereby ensuring the processing efficiency, but also avoid the thermal effect of the first laser spot being too large and causing damage to the modulation module, thereby protecting the equipment.

[0007] To this end, the second object of the present invention is to propose a dual-band laser patterning micro-nano manufacturing method based on spatial light modulation.

[0008] To achieve the above-mentioned objectives, the first embodiment of the present invention discloses a dual-band laser patterning micro-nano manufacturing device based on spatial light modulation, comprising: a first laser emission module, used to emit a first laser; a second laser emission module, used to emit a second laser; a modulation module, used to process the first laser to form a patterned light spot corresponding to a preset image, and to process the second laser to form a non-patterned light spot corresponding to the patterned light spot; a coupling module, used to couple the patterned light spot and the non-patterned light spot to obtain a coupled light spot; and a projection module, used to project the coupled light spot to a to-be-processed area of ​​a target workpiece, thereby processing the target workpiece.

[0009] According to the dual-band laser patterning micro-nano manufacturing device based on spatial light modulation provided by an embodiment of the present invention, the first laser is first emitted by a first laser emission module, and the second laser is emitted by a second laser emission module; then the first laser is processed by a modulation module to form a patterned light spot corresponding to a preset image, and the second laser is processed to form a non-patterned light spot corresponding to the patterned light spot; then the non-patterned light spot, the patterned light spot and the non-patterned light spot are coupled by a coupling module to obtain a coupled light spot; finally, the coupled light spot is projected to the to-be-processed area of ​​the target workpiece by a projection module, so as to process the target workpiece; thus, the dual-band laser patterning micro-nano manufacturing device based on spatial light modulation provided by an embodiment of the present invention can not only ensure that the coupled light spot can process the target workpiece, thereby ensuring the processing efficiency, but also avoid the excessive thermal effect of the first laser light spot and damage to the modulation module, thereby protecting the equipment.

[0010] In addition, the dual-band laser patterning micro-nano manufacturing device based on spatial light modulation in the above embodiment of the present invention may also include the following additional technical features: In some examples, the first laser emission module is further used to adjust the power and time of the first laser; the second laser emission module is further used to adjust the power and time of the second laser.

[0011] In some examples, the dual-band laser patterning micro-nano manufacturing device based on spatial light modulation also includes: a monitoring module for monitoring the state of the target workpiece, wherein the state includes the spot projection position and temperature; a control module for controlling the first laser emission module to adjust the power and time of the first laser based on the state of the target workpiece, and controlling the second laser emission module to adjust the power and time of the second laser, so that the thermal effect generated by the second laser is less than the melting point of the target workpiece, and the sum of the thermal effect generated by the first laser and the thermal effect generated by the second laser is greater than the melting point of the target workpiece.

[0012] In some examples, the control module is further used to control the first laser emission module to adjust the power and time of the first laser so that the thermal effect generated by the first laser is less than the heat resistance limit of the modulation module.

[0013] In some examples, the modulation module includes: a first processing module, used to collimate and beam shape the first laser to form a first light spot; a first reflection module, used to reflect the first light spot to a first target angle; a modulation module, used to perform spatial light modulation on the first light spot after reflecting the first target angle to form the patterned light spot corresponding to the preset image; a second processing module, used to collimate and beam shape the second laser to form the non-patterned light spot corresponding to the patterned light spot.

[0014] In some examples, the coupling module includes: a first tube lens module, used to converge the patterned light spot; a second reflection module, used to reflect the non-patterned light spot to a second target angle; and a dichroic mirror module, used to transmit the patterned light spot and reflect the non-patterned light spot, so that the non-patterned light spot after reflecting the second target angle is reflected again by the dichroic mirror module and coupled with the patterned light spot transmitted through the dichroic mirror module, thereby obtaining the coupled light spot.

[0015] In some examples, the projection module includes: an objective lens module, which is used to parallelize the coupling light spot and then project it onto the target workpiece.

[0016] In some examples, the monitoring module includes: a monitoring module for monitoring the state of the target workpiece; and a second tube lens module disposed between the monitoring module and the target workpiece, for projecting light reflected by the target workpiece to the monitoring module.

[0017] In some examples, the monitoring module also includes: a beam splitter module, which is arranged between the second tube lens module and the objective lens module, wherein the light reflected by the target workpiece is projected to the beam splitter module through the objective lens module, and then reflected to the second tube lens module through the beam splitter module; wherein the beam splitter module is also arranged between the dichroic mirror module and the objective lens module, and the coupled light spot is projected to the objective lens module after passing through the beam splitter module.

[0018] To achieve the above-mentioned purpose, the second embodiment of the present invention discloses a dual-band laser patterning micro-nano manufacturing method based on spatial light modulation, comprising the following steps: emitting a first laser and a second laser, and controlling the thermal effect generated by the first laser to be less than the heat resistance limit of the spatial light modulator, the thermal effect generated by the second laser to be less than the melting point of the target workpiece, and the sum of the thermal effect generated by the first laser and the thermal effect generated by the second laser to be greater than the melting point of the target workpiece; collimating and beam shaping the first laser to form a first light spot; reflecting the first light spot at a first target angle, and performing spatial light modulation on the first light spot after reflecting the first target angle to form a patterned light spot corresponding to a preset image; collimating and beam shaping the second laser to form a non-patterned light spot corresponding to the patterned light spot; coupling the non-patterned light spot with the patterned light spot to obtain a coupled light spot; after parallelizing the coupled light spot, projecting it onto the to-be-processed area of ​​the target workpiece, thereby processing the target workpiece.

[0019] According to the dual-band laser patterning micro-nano manufacturing method based on spatial light modulation according to the embodiment of the present invention, it is used for the dual-band laser patterning micro-nano manufacturing device based on spatial light modulation provided by the above embodiment of the present invention. First, the first laser is emitted by the first laser emission module, and the second laser emission module is emitted by the second laser; then the first laser is processed by the modulation module to form a patterned light spot corresponding to the preset image, and the second laser is processed to form a non-patterned light spot corresponding to the patterned light spot; then the non-patterned light spot, the patterned light spot and the non-patterned light spot are coupled by the coupling module to obtain a coupled light spot; finally, the coupled light spot is projected to the to-be-processed area of ​​the target workpiece by the projection module, so as to process the target workpiece; in this way, the dual-band laser patterning micro-nano manufacturing method based on spatial light modulation provided by the embodiment of the present invention can not only ensure that the coupled light spot can process the target workpiece, thereby ensuring the processing efficiency, but also avoid the excessive thermal effect of the first laser light spot and damage to the modulation module, thereby protecting the equipment.

[0020] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which: Figure 1 is a structural block diagram of a dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to an embodiment of the present invention; Figure 2is a schematic structural diagram of a dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to another embodiment of the present invention; Figure 3 is a schematic structural diagram of a dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to a specific embodiment of the present invention; Figure 4 is a schematic diagram of the light spot coupling energy distribution on the processing surface according to a specific embodiment of the present invention; Figure 5 The present invention is a flowchart of a dual-band laser patterning micro-nano manufacturing method based on spatial light modulation according to an embodiment of the present invention.

[0022] Figure numerals: 12-rectangular light spot output by 915 nm infrared laser; 13-coupled light spot output by 980 nm infrared laser and 915 nm infrared laser; 100-dual-band laser patterning micro-nano manufacturing device based on spatial light modulation; 110-first laser emission module; 120-second laser emission module; 130-modulation module; 140-coupling module; 150-projection module; 160-monitoring module; 170-control module; 1301-first processing module; 1302-first reflection module; 1303-modulation module; 1304-second processing module; 1401-first tube lens module; 1402-second reflection module; 1403-dichroic mirror module; 1501-objective lens module; 1601-monitoring module; 1602-second tube lens module; 1603-beam splitter module. DETAILED DESCRIPTION

[0023] Embodiments of the present invention are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. Embodiments of the present invention are described in detail below.

[0024] Reference below Figure 1-Figure 5 A dual-band laser patterning micro-nano manufacturing device and method based on spatial light modulation according to an embodiment of the present invention is described.

[0025] Figure 1 FIG. 1 is a schematic diagram of a dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to an embodiment of the present invention. Figure 1As shown, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation includes: a first laser emitting module 110, used to emit a first laser; a second laser emitting module 120, used to emit a second laser; a modulation module 130, used to process the first laser to form a patterned light spot corresponding to a preset image, and to process the second laser to form a non-patterned light spot corresponding to the patterned light spot; a coupling module 140, used to couple the patterned light spot and the non-patterned light spot to obtain a coupled light spot; a projection module 150, used to project the coupled light spot to the to-be-processed area of ​​the target workpiece, thereby processing the target workpiece.

[0026] In a specific embodiment, the first laser emission module 110, for example, includes a 980 nm infrared emitter, and the emitted first laser includes, for example, a 980 nm infrared laser, etc., the second laser emission module 120, for example, includes a 915 nm infrared emitter, and the emitted second laser includes, for example, a 915 nm infrared laser, etc., the modulation module 130, for example, includes a spatial light modulator, etc., the coupling module 140, for example, includes a dichroic mirror, etc., and the projection module 150, for example, includes an infinity objective lens, etc.

[0027] Specifically, the patterned light spot corresponds to the processing position and pattern of the target workpiece, and the non-patterned light spot corresponds to the background of the target workpiece. By setting the thermal effect of the first laser to be smaller than the heat resistance limit of the modulation module 130, the thermal effect of the second laser to be smaller than the melting point of the target workpiece, and the sum of the thermal effects of the first laser and the second laser to be larger than the melting point of the target workpiece, it can not only ensure that the coupled light spot can process the target workpiece, but also avoid accidents such as damage to the modulation module 130 caused by excessive thermal effect of the first laser spot.

[0028] Specifically, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided in the embodiment of the present invention first uses the first laser emission module 110 to emit the first laser, and the second laser emission module 120 to emit the second laser; then the first laser is processed by the modulation module 130 to form a patterned light spot corresponding to the preset image, and the second laser is processed to form a non-patterned light spot corresponding to the patterned light spot; then the patterned light spot and the non-patterned light spot are coupled by the coupling module 140 to obtain a coupled light spot; finally, the projection module 150 is used to project the coupled light spot to the to-be-processed area of ​​the target workpiece, so as to process the target workpiece; in this way, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided in the embodiment of the present invention can not only ensure that the coupled light spot can process the target workpiece, thereby ensuring the processing efficiency, but also avoid the excessive thermal effect of the first laser light spot and damage to the modulation module 130, thereby protecting the equipment.

[0029] In one embodiment of the present invention, the first laser emission module 110 is also used to adjust the power and time of the first laser; the second laser emission module 120 is also used to adjust the power and time of the second laser.

[0030] In a specific embodiment, the first laser emission module 110 includes, for example, a 980 nm infrared emitter, etc., the emitted first laser includes, for example, a 980 nm infrared laser, etc., and the second laser emission module 120 includes, for example, a 915 nm infrared emitter, etc.

[0031] Specifically, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided in an embodiment of the present invention uses a first laser emission module 110 to adjust the power and time of the first laser, so as to adjust the thermal effect of the first laser on the target workpiece, and uses a second laser emission module 120 to adjust the power and time of the second laser, so as to adjust the thermal effect of the second laser on the target workpiece, thereby ensuring that the coupled light spot can process target workpieces of different specifications, thereby ensuring processing efficiency.

[0032] Figure 2 FIG. 1 is a schematic diagram of a dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to another embodiment of the present invention. Figure 2 As shown, in one embodiment of the present invention, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation also includes: a monitoring module 160, used to monitor the state of the target workpiece, wherein the state includes the spot projection position and temperature; a control module 170, used to control the first laser emission module 110 to adjust the power and time of the first laser based on the state of the target workpiece, and to control the second laser emission module 120 to adjust the power and time of the second laser, so that the thermal effect generated by the second laser is less than the melting point of the target workpiece, and the sum of the thermal effect generated by the first laser and the thermal effect generated by the second laser is greater than the melting point of the target workpiece.

[0033] In a specific embodiment, the monitoring module 160 includes, for example, a CCD (Charge-Coupled Device) / CMOS (Complementary Metal-Oxide Semiconductor) camera, etc. Specifically, the state of the target workpiece can be clearly and accurately monitored through the CCD / CMOS camera.

[0034] Specifically, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided in an embodiment of the present invention first uses the monitoring module 160 to monitor the state of the target workpiece; then uses the control module 170 to control the first laser emission module 110 to adjust the power and time of the first laser based on the state of the target workpiece, and controls the second laser emission module 120 to adjust the power and time of the second laser, so that the sum of the thermal effect generated by the first laser and the thermal effect generated by the second laser is greater than the melting point of the target workpiece, thereby ensuring that the coupled light spot can process the target workpiece, thereby ensuring the processing efficiency, and controlling the thermal effect generated by the second laser to be less than the melting point of the target workpiece, thereby avoiding damage to the target workpiece by the non-patterned light spot.

[0035] In one embodiment of the present invention, the control module 170 is further used to control the first laser emission module 110 to adjust the power and time of the first laser so that the thermal effect generated by the first laser is smaller than the heat resistance limit of the spatial light modulator.

[0036] In a specific embodiment, the first laser is used to generate an imaged light spot, and the second laser is used to generate a non-imaged light spot. Since the first laser needs to be modulated to generate the imaged light spot, and the second laser can generate the non-imaged light spot without modulation, if the thermal effect of the first laser is too large, it may cause damage to the modulation module 130. Therefore, the embodiment of the present invention uses the control module 170 to control the power of the first laser to be less than the heat resistance limit of the spatial light modulator, so as to protect the modulation module 130.

[0037] Specifically, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided in an embodiment of the present invention uses a control module 170 to control the power of the first laser to be less than the heat resistance limit of the spatial light modulator, thereby avoiding excessive thermal effect of the first laser and causing damage to the modulation module 130.

[0038] Figure 3 FIG. 1 is a schematic diagram of a dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to a specific embodiment of the present invention. Figure 3 As shown, in one embodiment of the present invention, the modulation module 130 includes: a first processing module 1301, used to collimate and shape the first laser to form a first light spot; a first reflection module 1302, used to reflect the first light spot to a first target angle; a modulation module 1303, used to perform spatial light modulation on the first light spot after reflecting the first target angle, so as to form a graphic light spot corresponding to a preset image; a second processing module 1304, used to collimate and shape the second laser to form a non-graphic light spot corresponding to the graphic light spot.

[0039] In a specific embodiment, the first laser emission module 110 is, for example, a 980 nm infrared transmitter, and the emitted first laser is, for example, a 980 nm infrared laser; the first processing module 1301 includes, for example, a light adapter, a collimating lens, a microlens array and a focusing lens, etc., to collimate and shape the first laser beam; the modulation module 1303 is, for example, a DMD (Digital Micromirror Device), and the first reflection module 1302 includes, for example, two reflectors, and the first target angle is, for example, 24°. After two reflections, the first laser enters the DMD at an oblique incidence of 24°, and the DMD forms a graphic light spot corresponding to a preset image through mirror flipping.

[0040] In a specific embodiment, the second laser emission module 120 is, for example, a 915 nm infrared emitter, and the emitted second laser is, for example, a 915 nm infrared laser; the second processing module 1302 includes, for example, a light adapter, a collimator, a microlens array and a focusing lens, which collimate and shape the second laser to form a non-patterned light spot corresponding to the patterned light spot.

[0041] Specifically, the embodiment of the present invention provides a dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation, wherein the modulation module 130 first uses the first processing module 1301 to collimate and shape the first laser to form a first light spot; then uses the first reflection module 1302 to reflect the first light spot to the first target angle; then the modulation module 1303 performs spatial light modulation on the first light spot after reflecting the first target angle, thereby forming a patterned light spot corresponding to the preset image; at the same time, the second processing module 1304 is used to collimate and shape the second laser to form a non-patterned light spot corresponding to the patterned light spot; thereby, the modulation module 130 is used to form a patterned light spot corresponding to the preset image and a non-patterned light spot corresponding to the patterned light spot, which is convenient for the subsequent coupling of the patterned light spot and the non-patterned light spot.

[0042] like Figure 3 As shown, in one embodiment of the present invention, the coupling module 140 includes: a first tube lens module 1401, used to converge a patterned light spot; a second reflection module 1402, used to reflect a non-patterned light spot to a second target angle; a dichroic mirror module 1403, used to transmit the patterned light spot and reflect the non-patterned light spot, so that the non-patterned light spot after reflecting the second target angle is reflected again by the dichroic mirror module 1403, and is coupled with the patterned light spot transmitted through the dichroic mirror module 1403, thereby obtaining a coupled light spot.

[0043] In a specific embodiment, the first laser emission module 110 is, for example, a 980 nm infrared emitter, and the emitted first laser is, for example, a 980 nm infrared laser; the second laser emission module 120 is, for example, a 915 nm infrared emitter, and the emitted second laser is, for example, a 915 nm infrared laser; the dichroic mirror module 1403 has high transmittance to 980 nm wavelength laser and high reflectivity to 915 nm wavelength laser.

[0044] Specifically, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided by the embodiment of the present invention, wherein the coupling module 140 first uses the first tube lens module 1401 to converge the patterned light spot; at the same time, the second reflection module 1402 is used to reflect the non-patterned light spot to the second target angle; then the dichroic mirror module 1403 is used to reflect the non-patterned light spot, so that the non-patterned light spot after reflecting the second target angle is reflected again by the dichroic mirror module 1403, and is coupled with the patterned light spot transmitted through the dichroic mirror module 1403, so as to obtain a coupled light spot; thus, the patterned light spot and the non-patterned light spot are coupled by the coupling module 140 to obtain a coupled light spot, which is convenient for subsequently projecting the coupled light spot onto the target workpiece to process the target workpiece.

[0045] like Figure 3 As shown, in one embodiment of the present invention, the projection module 150 includes: an objective lens module 1501, which is used to parallelize the coupled light spot and then project it onto the target workpiece.

[0046] In a specific embodiment, the objective lens module 1501 is, for example, an infinite objective lens, and the infinite imaging objective lens is used to make the light beam become parallel light after being emitted from the objective lens, so that when other optical devices (such as a dichroic mirror and a beam splitter) are added between the objective lens and the tube lens, no additional optical path difference is introduced.

[0047] Specifically, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided by an embodiment of the present invention, wherein the projection module 150 uses the objective lens module 1501 to parallelize the coupled light spot and then projects it to the target workpiece, thereby processing the target workpiece.

[0048] like Figure 3 As shown, in one embodiment of the present invention, the monitoring module 160 includes: a monitoring module 1601 for monitoring the state of a target workpiece; and a second tube lens module 1602, disposed between the monitoring module 1601 and the target workpiece, for projecting light reflected by the target workpiece onto the monitoring module 1601.

[0049] In a specific embodiment, the monitoring module 160 is, for example, a CCD / CMOS camera, through which the state of the target workpiece can be clearly and accurately monitored.

[0050] Specifically, the embodiment of the present invention provides a dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation, wherein the monitoring module 160 uses the second tube lens module 1602 to project the light reflected by the target workpiece to the monitoring module 1601, and uses the monitoring module 1601 to monitor the state of the target workpiece, thereby helping to guide the processing according to the state of the target workpiece.

[0051] like Figure 3 As shown, in one embodiment of the present invention, the monitoring module 160 also includes: a beam splitter module 1603, which is arranged between the second tube lens module 1602 and the objective lens module 1501, wherein the light reflected by the target workpiece is projected to the beam splitter module 1603 through the objective lens module 1501, and then reflected to the second tube lens module 1602 through the beam splitter module 1603; wherein the beam splitter module 1603 is also arranged between the dichroic mirror module 1403 and the objective lens module 1501, and the coupled light spot is projected to the objective lens module 1501 after transmitting through the beam splitter module 1603.

[0052] In a specific embodiment, the beam splitter module 1603 transmits the coupled light spot projected onto the objective lens module 1501 and reflects the light reflected by the target workpiece.

[0053] Specifically, the embodiment of the present invention provides a dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation, wherein the monitoring module 160 first uses the beam splitter module 1603 to reflect the light reflected by the target workpiece to the second tube lens module 1602, and then uses the second tube lens module 1602 to project the light reflected by the target workpiece to the monitoring module 1601, and uses the monitoring module 1601 to monitor the state of the target workpiece, thereby helping to guide processing according to the state of the target workpiece.

[0054] The advantages of the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided by the embodiment of the present invention are verified in combination with specific embodiments below.

[0055] Assume that the heat resistance parameter of DMD is: input power density p_DMD <500 w / cm 2 ; The heating environment required for material melting is p_material = 3000 w / cm 2 , action time>50 ms; if the processing rate is not taken into account and only DMD projection is used to realize the graphical manufacturing of the workpiece, the rectangular pattern needs to be reduced: Scale= ≈2.4 times At this point, the realization of material micro-nano processing requires the system to meet the 2.4-fold reduction of the rectangular spot. However, this reduction in the imaging spot will bring two problems: 1. The size of the patterned light spot is reduced, the overall area acting on the working surface is reduced, and the area of ​​material processed per unit time is reduced. The decline in production capacity is unacceptable in the industry.

[0056] 2. The reduction of the pattern spot requires a higher magnification objective lens, which requires the objective lens to have a larger object and image numerical aperture (NA). At the same time, the depth of focus (DOF): DOF=

[0057] Among them, lamda is the wavelength. It can be seen that the depth of focus will decrease with the increase of NA, which will increase the control cost in mass production in the industry, such as the intervention of active focusing modules.

[0058] The dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided by the embodiment of the present invention is used to introduce a 915 nm infrared laser, and the output light spot is coupled with the DMD projection pattern after optical shaping. Based on the above micro-nano manufacturing conditions, when the power density of the DMD projection light spot is p_DMD =500 w / cm 2 ,The output spot power density of 915 nm infrared laser p_laser =2500 w / cm 2 .

[0059] At this time, the energy distribution of the light spot projected onto the imaging surface after coupling is as follows: Figure 4 As shown, the superimposed power density in the coupling region 13 is 3000 w / cm2 (the actual quantification needs to be calibrated), and the power density in the non-coupling region 12 is p_laser =2500 w / cm 2 During the heating time of t = 50 ms, the coupled region 13 reaches the melting point of the material, and the micro-nano manufacturing of the material is realized. The heat accumulated in the non-coupled region 12 within 50 ms cannot reach the processing threshold, and micro-nano manufacturing cannot be realized. Compared with the above method, the advantages are as follows: 1. The required imaging magnification is only 1 times, and the processing area is increased by 2.4 times compared with the former; 2. The output power of the 915 nm infrared laser can be further improved, while the imaging magnification can be increased to make the imaging magnification > 1, thus achieving higher micro-nano manufacturing efficiency; 3. Remove the heat resistance limitation of DMD and realize the graphic manufacturing of materials with higher melting points; 4. The power ratio of the 980 nm infrared laser and the 915 nm infrared laser can be calibrated to appropriately reduce the input optical power of the DMD, reduce the thermal fatigue of the DMD, and extend the service life of the device.

[0060] In summary, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided in the embodiment of the present invention first uses the first laser emission module 110 to emit the first laser, and the second laser emission module 120 to emit the second laser; then the modulation module 130 is used to process the first laser to form a patterned light spot corresponding to the preset image, and the second laser is processed to form a non-patterned light spot corresponding to the patterned light spot; then the coupling module 140 is used to couple the non-patterned light spot with the patterned light spot and the non-patterned light spot to obtain a coupled light spot; finally, the projection module 150 is used to project the coupled light spot to the to-be-processed area of ​​the target workpiece, so as to process the target workpiece; in this way, the dual-band laser patterning micro-nano manufacturing device 100 based on spatial light modulation provided in the embodiment of the present invention can not only ensure that the coupled light spot can process the target workpiece, thereby ensuring the processing efficiency, but also avoid the excessive thermal effect of the first laser light spot and damage to the modulation module 130, thereby protecting the equipment.

[0061] A further embodiment of the present invention proposes a dual-band laser patterning micro-nano manufacturing method based on spatial light modulation.

[0062] Figure 5 FIG. 1 is a flow chart of a dual-band laser patterning micro-nano manufacturing method based on spatial light modulation according to an embodiment of the present invention. Figure 5 As shown, the dual-band laser patterning micro-nano manufacturing method based on spatial light modulation includes the following steps: Step S1: emit a first laser and a second laser, and control the thermal effect generated by the first laser to be smaller than the heat resistance limit of the spatial light modulator, the thermal effect generated by the second laser to be smaller than the melting point of the target workpiece, and the sum of the thermal effect generated by the first laser and the thermal effect generated by the second laser to be larger than the melting point of the target workpiece.

[0063] Step S2: collimating and beam shaping the first laser to form a first light spot.

[0064] Step S3: reflecting the first light spot at a first target angle, and performing spatial light modulation on the first light spot after reflecting the first target angle, so as to form a patterned light spot corresponding to a preset image.

[0065] Step S4: collimating and beam shaping the second laser to form a non-patterned light spot corresponding to the patterned light spot.

[0066] Step S5: coupling the non-patterned light spot with the patterned light spot to obtain a coupled light spot.

[0067] Step S6: After parallelizing the coupled light spot, the coupled light spot is projected onto the to-be-processed area of ​​the target workpiece, thereby processing the target workpiece.

[0068] Thus, according to the dual-band laser patterning micro-nano manufacturing method based on spatial light modulation according to the embodiment of the present invention, used in the dual-band laser patterning micro-nano manufacturing device based on spatial light modulation provided by the above embodiment of the present invention, firstly, the first laser emission module 110 is used to emit the first laser, and the second laser emission module 120 is used to emit the second laser; then, the first laser is processed by the modulation module 130 to form a patterned light spot corresponding to the preset image, and the second laser is processed to form a non-patterned light spot corresponding to the patterned light spot; then, the non-patterned light spot, the patterned light spot and the non-patterned light spot are coupled by the coupling module 140 to obtain a coupled light spot; finally, the projection module 150 is used to project the coupled light spot to the to-be-processed area of ​​the target workpiece, so as to process the target workpiece; thus, according to the dual-band laser patterning micro-nano manufacturing method based on spatial light modulation according to the embodiment of the present invention, not only can the coupled light spot be ensured to process the target workpiece, thereby ensuring the processing efficiency, but also the thermal effect of the first laser light spot is prevented from being too large to damage the modulation module 130, thereby protecting the equipment.

[0069] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0070] In the description of the present invention, "plurality" means two or more.

[0071] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example.

[0072] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A dual-band laser patterning micro-nano manufacturing device based on spatial light modulation, characterized in that: include: A first laser emission module, used for emitting a first laser; A second laser emission module, used for emitting a second laser; a modulation module, configured to process the first laser to form a patterned light spot corresponding to a preset image, and to process the second laser to form a non-patterned light spot corresponding to the patterned light spot; A coupling module, used for coupling the patterned light spot and the non-patterned light spot to obtain a coupled light spot; The projection module is used to project the coupling light spot to the to-be-processed area of ​​the target workpiece, so as to process the target workpiece.

2. The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to claim 1, characterized in that: The first laser emission module is also used to adjust the power and time of the first laser; The second laser emission module is also used to adjust the power and time of the second laser.

3. The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to claim 2, further comprising: A monitoring module, used to monitor the state of the target workpiece, wherein the state includes the light spot projection position and temperature; A control module is used to control the first laser emission module to adjust the power and time of the first laser, and to control the second laser emission module to adjust the power and time of the second laser based on the state of the target workpiece, so that the thermal effect generated by the second laser is less than the melting point of the target workpiece, and the sum of the thermal effect generated by the first laser and the thermal effect generated by the second laser is greater than the melting point of the target workpiece.

4. The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to claim 3 is characterized in that: The control module is also used to control the first laser emission module to adjust the power and time of the first laser so that the thermal effect generated by the first laser is smaller than the heat resistance limit of the modulation module.

5. The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to claim 3, characterized in that: The modulation module comprises: A first processing module, used for performing collimation and beam shaping processing on the first laser to form a first light spot; A first reflection module, used for reflecting the first light spot to a first target angle; A modulation module, used for performing spatial light modulation on the first light spot after reflecting the first target angle, so as to form the patterned light spot corresponding to the preset image; The second processing module is used for collimating and beam shaping the second laser to form the non-patterned light spot corresponding to the patterned light spot.

6. The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to claim 5, characterized in that: The coupling module comprises: A first tube lens module, used for converging the patterned light spot; A second reflection module, used for reflecting the non-patterned light spot to a second target angle; The dichroic mirror module is used to transmit the patterned light spot and reflect the non-patterned light spot, so that the non-patterned light spot after reflecting the second target angle is reflected again by the dichroic mirror module and coupled with the patterned light spot transmitted by the dichroic mirror module, thereby obtaining the coupled light spot.

7. The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to claim 6, characterized in that: The projection module comprises: The objective lens module is used to parallelize the coupling light spot and then project it onto the target workpiece.

8. The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to claim 7, characterized in that: The monitoring module comprises: A monitoring module, used for monitoring the status of the target workpiece; The second tube lens module is disposed between the monitoring module and the target workpiece, and is used for projecting the light reflected by the target workpiece to the monitoring module.

9. The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to claim 8, characterized in that: The monitoring module further includes: A beam splitter module is provided between the second tube lens module and the objective lens module, wherein the light reflected by the target workpiece is projected to the beam splitter module through the objective lens module, and then reflected to the second tube lens module through the beam splitter module; Wherein, the beam splitter module is also arranged between the dichroic mirror module and the objective lens module, and the coupling light spot is projected onto the objective lens module after being transmitted through the beam splitter module.

10. A dual-band laser patterning micro-nano manufacturing method based on spatial light modulation, characterized in that: The dual-band laser patterning micro-nano manufacturing device based on spatial light modulation according to any one of claims 1 to 9, wherein the dual-band laser patterning micro-nano manufacturing method based on spatial light modulation comprises the following steps: Emitting a first laser and a second laser, and controlling the thermal effect generated by the first laser to be smaller than the heat resistance limit of the modulation module, the thermal effect generated by the second laser to be smaller than the melting point of the target workpiece, and the sum of the thermal effect generated by the first laser and the thermal effect generated by the second laser to be larger than the melting point of the target workpiece; performing collimation and beam shaping processing on the first laser to form a first light spot; Reflecting the first light spot at a first target angle, and performing spatial light modulation on the first light spot after reflecting the first target angle, so as to form a patterned light spot corresponding to a preset image; collimating and beam shaping the second laser to form a non-patterned light spot corresponding to the patterned light spot; coupling the non-patterned light spot with the patterned light spot to obtain a coupled light spot; After the coupling light spot is parallelized, it is projected onto the to-be-processed area of ​​the target workpiece, thereby processing the target workpiece.

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