A medical cyclotron accelerating voltage cold chamber testing method and system

Abstract

The present invention relates to the field of data processing technology, and in particular to a method and system for testing a cold cavity of an accelerating voltage of a medical cyclotron, comprising: obtaining the interference attenuation rate of each measuring hole according to the voltage difference value of each measuring hole affecting the measuring hole combination and the distance between the measuring holes in the measuring hole combination; obtaining the influence voltage of each measuring hole affecting the measuring hole combination according to the interference attenuation rate of each measuring hole and the distance between the measuring holes in the measuring hole combination; obtaining the actual voltage value of each measuring hole according to the voltage of each measuring hole when there is no probe, the voltage offset of itself and the influence voltage of each measuring hole combination; obtaining the performance index of the resonant cold cavity according to the fluctuation of the actual voltage values ​​of all the measuring holes on the tooling bar; and evaluating the performance of the cold cavity based on the performance index of the resonant cold cavity. The present invention improves the accuracy of the evaluation result of the cold cavity performance.

Description

Technical Field

[0001] The invention relates to the technical field of data processing, and in particular to a medical cyclotron acceleration voltage cold chamber testing method and system. Background Art

[0002] The resonant cavity of a medical small cyclotron is a device used to generate and maintain the high-frequency electric field required for accelerating charged particles. It is a key component used to accurately control the electric field strength and distribution in the cyclotron. It is a type of simple resonant cavity and an indispensable part of the particle acceleration process. It can efficiently convert electrical energy into the kinetic energy required for accelerating particles. The acceleration voltage cold cavity test is mainly to test and convert the acceleration voltage at the gap under the condition that no radio frequency power is fed into the simple resonant cavity. The purpose is to verify the acceleration voltage error value of the simple resonant cavity physical analysis, and then evaluate the cold cavity performance.

[0003] The prior art uses a vector network analyzer to perform measurements, but the measurement method of the vector network analyzer introduces a parallel resistance at the probe measurement point, and the structure of the probe itself affects the accelerating electric field of the cyclotron gap, thereby causing a deviation in the measurement result, resulting in an error in the final measured voltage; thereby making the evaluation result of the cold chamber performance inaccurate. Summary of the invention

[0004] In order to solve the above problems, the present invention provides a medical cyclotron accelerating voltage cold chamber testing method and system.

[0005] An embodiment of the present invention provides a cold chamber testing method for a medical cyclotron accelerating voltage, the method comprising the following steps:

[0006] Obtaining the voltage of several measuring holes on the tooling bar when there is no probe and the voltage when there is a probe;

[0007] Obtain the stable voltage distance value between the probes and all the influencing hole combinations of each measuring hole; obtain the voltage difference value of each influencing hole combination of each measuring hole according to the difference between the voltage of the measuring hole without the probe and the voltage of the measuring hole with the probe in the influencing hole combination; obtain the interference attenuation rate of each measuring hole according to the voltage difference values ​​of the different influencing hole combinations of each measuring hole and the distance between the measuring holes in the influencing hole combination; obtain the self-voltage offset of each measuring hole according to the interference attenuation rate of each measuring hole and the stable voltage distance value between the probes; obtain the influencing voltage amount of each influencing hole combination of each measuring hole according to the interference attenuation rate of each measuring hole and the distance between the measuring holes in the influencing hole combination; obtain the actual voltage value of each measuring hole according to the voltage of each measuring hole without the probe, the self-voltage offset and the influencing voltage amount of each influencing hole combination;

[0008] According to the fluctuation of the actual voltage values ​​of all the measuring holes on the tooling bar, the performance index of the resonant cold cavity is obtained; and the performance of the cold cavity is evaluated based on the performance index of the resonant cold cavity.

[0009] Preferably, the method of obtaining the stable voltage distance value between the probes and all combinations of each measuring hole affecting the measuring hole includes:

[0010] Preset a step size parameter and a fluctuation parameter , place the tooling strip in the capacitor, apply voltage to the capacitor, and place two probes on the tooling strip; fix one probe and step each time The other probe is moved, and every second is a sampling moment, and the input voltage of the capacitor is collected by a voltmeter each time; for any sampling moment, the absolute value of the difference between the input voltage of the capacitor at the sampling moment and the input voltage of the capacitor at the previous sampling moment is recorded as the voltage fluctuation amplitude value at the sampling moment; among all sampling moments, the first time the voltage fluctuation amplitude value is less than or equal to the preset fluctuation parameter The sampling time at , is recorded as the target sampling time; the distance value between the two probes at the target sampling time is taken as the stable voltage distance value between the probes;

[0011] Any measuring hole is recorded as the target measuring hole, and all other measuring holes on the tooling bar are combined with the target measuring hole in pairs to obtain all combinations of measuring holes that affect the target measuring hole.

[0012] Preferably, the voltage difference value of each measuring hole combination affecting the measurement hole is obtained according to the difference between the voltage of the measuring hole without the probe and the voltage of the measuring hole with the probe in the measuring hole combination affecting the measurement hole, including the specific method of:

[0013] For Any one of the measuring holes affects the measuring hole combination. When another measuring hole in the measuring hole combination has a probe, the When there is a probe in the first measuring hole, the voltage is The absolute value of the difference between the voltages of the first and second measuring holes when there is no probe is taken as the The voltage difference value of the measuring hole combination that affects the measuring holes.

[0014] Preferably, the interference attenuation rate of each measuring hole is obtained according to the voltage difference value of the measuring hole combination affected by each measuring hole and the distance between the measuring holes in the measuring hole combination, including the specific method of:

[0015] The first The measuring hole The combination of the first and second holes that affect the measurement The measuring hole The absolute value of the difference between the voltage difference values ​​between the measurement hole combinations is the first absolute value of the difference; Another measuring hole in the measuring hole combination affects the The distance between the first difference and the other measuring hole in the measuring hole combination is recorded as the first influencing distance; the ratio of the absolute value of the first difference to the first influencing distance is recorded as the first The measuring hole The interference attenuation factor that affects the measurement hole combination; The average value of the interference attenuation factors of all the measuring hole combinations that affect the measuring hole is taken as the The interference attenuation rate of each measuring hole.

[0016] Preferably, the method of obtaining the voltage offset of each measuring hole according to the interference attenuation rate of each measuring hole and the stable voltage distance value between the probes includes:

[0017] The first The product of the interference attenuation rate of the first measuring hole and the stable voltage distance value between the probes is taken as the The voltage offset of each measuring hole.

[0018] Preferably, the method of obtaining the influence voltage of each influencing measurement hole combination of each measurement hole according to the interference attenuation rate of each measurement hole and the distance between the measurement holes in the influencing measurement hole combination includes the following specific methods:

[0019] Preset an influence parameter , for the Any one of the measuring holes affects the measuring hole combination. If the distance between the measuring holes in the measuring hole combination is greater than or equal to the stable voltage distance value between the probes, the voltage affected by the measuring hole combination is recorded as If the distance between the measuring holes in the measuring hole combination is less than the stable voltage distance value between the probes, the first The product of the interference attenuation rate of each measuring hole and the distance between the measuring holes in the influencing measuring hole combination is taken as the influencing voltage amount of the influencing measuring hole combination.

[0020] Preferably, the actual voltage value of each measuring hole is obtained according to the voltage of each measuring hole without a probe, its own voltage offset and the voltage amount of each affecting the measuring hole combination, including the specific method of:

[0021] The first The cumulative sum of the voltages affecting the combination of all measuring holes affecting the measuring holes is recorded as the first cumulative sum; The voltage of the measuring hole without a probe, its own voltage offset and the first cumulative sum are summed as the first The actual voltage value of each measuring hole.

[0022] Preferably, the method of obtaining the performance index of the resonant cold cavity according to the fluctuation of the actual voltage values ​​of all the measuring holes on the tooling bar includes the following specific methods:

[0023] The inverse of the variance of the actual voltage values ​​of all the measuring holes on the tooling bar is taken as the performance index of the resonant cold cavity.

[0024] Preferably, the performance evaluation of the cold cavity based on the performance index of the resonant cold cavity includes the following specific methods:

[0025] Preset a threshold parameter , if the performance index of the resonant cold cavity is greater than or equal to the threshold parameter , the performance of the cold cavity is recorded as qualified; if the performance index of the resonant cold cavity is less than the threshold parameter , the performance of the cold chamber was recorded as unqualified.

[0026] The present invention also proposes a medical cyclotron acceleration voltage cold chamber testing system, comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor implements any one of the steps of the medical cyclotron acceleration voltage cold chamber testing method when executing the computer program.

[0027] The beneficial effects of the technical solution of the present invention are as follows: the present invention obtains the influence voltage of each measuring hole and each affecting measurement hole combination of each measuring hole according to the interference attenuation rate of each measuring hole and the distance between the measuring holes in the affecting measurement hole combination; obtains the actual voltage value of each measuring hole according to the voltage of each measuring hole without a probe, its own voltage offset and the influence voltage of each affecting measurement hole combination; thereby correcting the deviation of the measurement result to obtain a more accurate voltage distribution; obtains the performance index of the resonant cold cavity according to the fluctuation of the actual voltage values ​​of all the measuring holes on the tooling bar; and evaluates the performance of the cold cavity based on the performance index of the resonant cold cavity, thereby improving the accuracy of the evaluation result of the cold cavity performance. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0029] Figure 1A flow chart of the steps of a cold chamber test method for accelerating voltage of a medical cyclotron according to the present invention;

[0030] Figure 2 The present invention is a characteristic relationship flow chart of a medical cyclotron acceleration voltage cold chamber testing method. DETAILED DESCRIPTION

[0031] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined invention purpose, the following is a detailed description of a medical cyclotron acceleration voltage cold chamber test method and system proposed by the present invention, its specific implementation, structure, features and effects, in conjunction with the accompanying drawings and preferred embodiments. In the following description, different "one embodiment" or "another embodiment" does not necessarily refer to the same embodiment. In addition, specific features, structures or characteristics in one or more embodiments may be combined in any suitable form.

[0032] Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.

[0033] The specific scheme of a medical cyclotron acceleration voltage cold chamber testing method and system provided by the present invention is described in detail below with reference to the accompanying drawings.

[0034] See also Figure 1 , which shows a flow chart of the steps of a medical cyclotron acceleration voltage cold chamber testing method provided by an embodiment of the present invention, the method comprising the following steps:

[0035] Step S001: obtaining the voltages of several measuring holes on the tooling bar when there are no probes and when there are probes.

[0036] It should be noted that when measuring the acceleration voltage distribution, it is necessary to obtain the voltage values ​​of multiple measurement holes. When there are probes in multiple measurement holes, the measured voltage value is the result of the superposition of the micro-electric field influences generated by the probe itself and multiple other probes. Since the detection head uses capacitors to measure parallel impedance and then calculate the acceleration voltage value of the measurement hole, the capacitor will generate a local tiny electric field, which will affect the electric field in the acceleration gap, resulting in a low measured voltage value.

[0037] Specifically, it is necessary to first collect the voltage of several measuring holes on the tooling bar when there is no probe and the voltage when there is a probe. The specific process is as follows:

[0038] When using the vector network analyzer method for measurement, after the tooling bar is placed in the acceleration gap of the cyclotron, a measuring probe is used to collect the probe-free voltage of each measuring hole on the tooling bar in turn; for any measuring hole, a measuring probe is placed on each measuring hole except the measuring hole in turn, and another measuring probe is used each time to collect the probe-supported voltage of the measuring hole.

[0039] So far, the voltages of several measuring holes on the tooling bar when there are no probes and the voltages when there are probes are obtained through the above method.

[0040] Step S002: Obtain the stable voltage distance value between the probes and all the influencing hole combinations of each measuring hole; obtain the voltage difference value of each influencing hole combination of each measuring hole according to the difference between the voltage of the measuring holes in the influencing hole combination when there is no probe and the voltage when there is a probe; obtain the interference attenuation rate of each measuring hole according to the voltage difference values ​​of different influencing hole combinations of each measuring hole and the distance between the measuring holes in the influencing hole combination; obtain the self-voltage offset of each measuring hole according to the interference attenuation rate of each measuring hole and the stable voltage distance value between the probes; obtain the influencing voltage amount of each influencing hole combination of each measuring hole according to the interference attenuation rate of each measuring hole and the distance between the measuring holes in the influencing hole combination; obtain the actual voltage value of each measuring hole according to the voltage of each measuring hole when there is no probe, the self-voltage offset and the influencing voltage amount of each influencing hole combination.

[0041] It should be noted that since the local influence of the probe gradually decreases with the extension of the distance, if there are two probes measuring voltage, the voltage obtained by each measuring hole is the value after the superposition of itself and the other probe, and the farther the distance between the two probes is, the lower the degree of mutual influence; therefore, it is necessary to obtain the maximum distance of mutual influence when the probes are working, that is, the stable voltage distance value between the probes; multiple tests are performed at different distances between the probes, the corresponding voltage difference values ​​are calculated, and the voltage values ​​of the probes after interference, that is, the affected voltage amount, are obtained; the corresponding interference attenuation rate is calculated again, and finally, based on the stable voltage distance value between the probes and the voltage interference amount of other probes on the current probe when measuring the voltage distribution, the actual voltage value of each measuring hole is obtained comprehensively.

[0042] Preferably, in some implementations of the embodiments of the present invention, due to the structure of the capacitor inside the probe, the electric field between the accelerating gaps will generate parallel impedance, and then the acceleration voltage of the measuring hole can be calculated; however, the tiny capacitance of the probe itself will divide a part of the energy of the accelerating electric field to form a micro-electric field, and the formed micro-electric field will interfere with the distribution of the local accelerating electric field, thereby causing the voltage value measured by the surrounding probes to be low. Therefore, it is necessary to first obtain the stable voltage distance value between the probes, and the specific acquisition method is:

[0043] Preset a step size parameter and a fluctuation parameter , wherein this embodiment is based on This example is described as an example, and this embodiment is not specifically limited. Depends on the specific implementation situation;

[0044] Place the tooling strip in the capacitor, apply voltage to the capacitor, and place two probes on the tooling strip; fix one probe and step each time. The other probe is moved, and every second is a sampling moment, and the input voltage of the capacitor is collected by a voltmeter each time; for any sampling moment, the absolute value of the difference between the input voltage of the capacitor at the sampling moment and the input voltage of the capacitor at the previous sampling moment is recorded as the voltage fluctuation amplitude value at the sampling moment; among all sampling moments, the first time the voltage fluctuation amplitude value is less than or equal to the preset fluctuation parameter The sampling time at , is recorded as the target sampling time; the distance value between the two probes at the target sampling time is taken as the stable voltage distance value between the probes.

[0045] It should be noted that since the acceleration voltage is inconsistent at different positions in the acceleration gap of the cyclotron, and it is difficult to move the position of the measuring hole during the operation of the accelerator, when the probe enters a uniform electric field, the internal electric field distribution will change, and the input voltage will also change. If the two probes have a greater impact on the capacitor plates, the corresponding input voltage may need to be increased in order to maintain the same amount of charge; so when the two probes influence each other, the impact they cause is constantly changing with the distance, and the input voltage is constantly changing; if the distance increases to a certain extent, the voltage gradually tends to stabilize, which means that the degree of mutual influence between the two probes is very small.

[0046] Preferably, in some implementations of the embodiments of the present invention, any measuring hole is recorded as a target measuring hole, and all other measuring holes on the tooling bar are combined with the target measuring hole in pairs to obtain all combinations of measuring holes affecting the target measuring hole.

[0047] Preferably, in some implementations of the embodiments of the present invention, according to the difference between the voltage of the measuring holes in the measuring hole combination without the probe and the voltage of the measuring holes with the probe, the specific method for obtaining the voltage difference value of each measuring hole influencing the measuring hole combination is:

[0048] For Any one of the measuring holes affects the measuring hole combination. When another measuring hole in the measuring hole combination has a probe, the When there is a probe in the first measuring hole, the voltage is The absolute value of the difference between the voltages of the first and second measuring holes when there is no probe is taken as the The voltage difference value of the measuring holes affecting the combination of measuring holes;

[0049] The specific formula is:

[0050]

[0051] In the formula, Indicates The measuring hole The voltage difference value that affects the measurement hole combination; Indicates The voltage of each measuring hole without a probe; Indicates The measuring hole When there is a probe in another measuring hole in the combination of the first and second measuring holes, The voltage of each measuring hole when there is a probe; Indicates taking the absolute value.

[0052] Preferably, in some implementations of the embodiments of the present invention, since the probes used in measuring the voltage distribution are usually of the same specifications, the degree of mutual influence is also the same, and it is believed that the electric field influence generated by itself within a certain range is stable in the attenuation degree with the distance; therefore, according to the voltage difference value of the different measuring holes affecting the measuring hole combination, and the distance between the measuring holes in the measuring hole combination, the specific method for obtaining the interference attenuation rate of each measuring hole is:

[0053] The first The measuring hole The combination of the first and second holes that affect the measurement The measuring hole The absolute value of the difference between the voltage difference values ​​between the measurement hole combinations is the first absolute value of the difference; Another measuring hole in the measuring hole combination affects the The distance between the first difference and the other measuring hole in the measuring hole combination is recorded as the first influencing distance; the ratio of the absolute value of the first difference to the first influencing distance is recorded as the first The measuring hole The interference attenuation factor that affects the measurement hole combination; The average value of the interference attenuation factors of all the measuring hole combinations that affect the measuring hole is taken as the Interference attenuation rate of each measuring hole;

[0054] The specific formula is:

[0055]

[0056] In the formula, Indicates Interference attenuation rate of each measuring hole; Indicates All combinations of measuring holes that affect the measurement of a measuring hole; Indicates The measuring hole The voltage difference value that affects the measurement hole combination; Indicates The measuring hole The voltage difference value that affects the measurement hole combination; Indicates The measuring hole Another measuring hole in the measuring hole combination affects the The measuring hole The distance between another measuring hole in the measuring hole combination; Indicates taking the absolute value.

[0057] Preferably, since the attenuation rate of the interference within the influence range of the probe interference is stable, and the attenuation rate of the probe itself is consistent with the attenuation rate of the interference; therefore, according to the interference attenuation rate of each measuring hole and the stable voltage distance value between the probes, the specific method for obtaining the voltage offset of each measuring hole is as follows:

[0058] The first The product of the interference attenuation rate of the first measuring hole and the stable voltage distance value between the probes is taken as the The voltage offset of each measuring hole;

[0059] The specific formula is:

[0060]

[0061] In the formula, Indicates The voltage offset of each measuring hole; Indicates Interference attenuation rate of each measuring hole; Indicates the stable voltage distance value between the probes.

[0062] Preferably, in some implementations of the embodiments of the present invention, since the distance between the measuring holes in the influencing measuring hole combination exceeds the stable voltage distance value between the probes, the influence on them can be ignored. Therefore, according to the interference attenuation rate of each measuring hole and the distance between the measuring holes in the influencing measuring hole combination, the specific method for obtaining the influencing voltage amount of each influencing measuring hole combination of each measuring hole is:

[0063] Preset an influence parameter , wherein this embodiment is based on This example is described as an example, and this embodiment is not specifically limited. Depends on the specific implementation situation;

[0064] For Any one of the measuring holes affects the measuring hole combination. If the distance between the measuring holes in the measuring hole combination is greater than or equal to the stable voltage distance value between the probes, the voltage affected by the measuring hole combination is recorded as If the distance between the measuring holes in the measuring hole combination is less than the stable voltage distance value between the probes, the first The product of the interference attenuation rate of each measuring hole and the distance between the measuring holes in the influencing measuring hole combination is taken as the influencing voltage amount of the influencing measuring hole combination.

[0065] Preferably, in some implementations of the embodiments of the present invention, since the specifications and models of the probes are the same, for each probe, the voltage affected by the electric field generated by itself is the same, and the distance that has no effect on other probes is the same. Therefore, according to the voltage of each measuring hole without a probe, its own voltage offset, and the voltage affected by each combination of measuring holes, the specific method for obtaining the actual voltage value of each measuring hole is:

[0066] The first The cumulative sum of the voltages affecting the combination of all measuring holes affecting the measuring holes is recorded as the first cumulative sum; The voltage of the measuring hole without a probe, its own voltage offset and the first cumulative sum are summed as the first The actual voltage value of each measuring hole;

[0067] The specific formula is:

[0068]

[0069] In the formula, Indicates The actual voltage value of each measuring hole; Indicates The voltage of each measuring hole without a probe; Indicates The voltage offset of each measuring hole; Indicates All combinations of measuring holes that affect the measurement of a measuring hole; Indicates The measuring hole The amount of voltage that is affected by the combination of measuring holes.

[0070] So far, the above method has been used to obtain The actual voltage value of each measuring hole.

[0071] Step S003: obtaining a performance index of the resonant cold cavity according to fluctuations in actual voltage values ​​of all measuring holes on the tooling bar; and evaluating the performance of the cold cavity based on the performance index of the resonant cold cavity.

[0072] Preferably, in some implementations of the embodiments of the present invention, since the smaller the fluctuation of the actual voltage value of the measuring hole, the better the performance of the resonant cold cavity, the specific method for obtaining the performance index of the resonant cold cavity according to the fluctuation of the actual voltage values ​​of all the measuring holes on the tooling bar is:

[0073] The inverse of the variance of the actual voltage values ​​of all the measuring holes on the tooling bar is taken as the performance index of the resonant cold cavity.

[0074] Preferably, in some implementations of the embodiments of the present invention, the specific method for evaluating the performance of the cold cavity based on the performance index of the resonant cold cavity is:

[0075] Preset a threshold parameter , wherein this embodiment is based on This example is described as an example, and this embodiment is not specifically limited. Depends on the specific implementation situation;

[0076] If the performance index of the resonant cold cavity is greater than or equal to the threshold parameter , the performance of the cold cavity is recorded as qualified; if the performance index of the resonant cold cavity is less than the threshold parameter , the performance of the cold chamber was recorded as unqualified.

[0077] So far, the cold chamber performance evaluation has been obtained through the above method.

[0078] See also Figure 2 , which shows a characteristic relationship flow chart of a medical cyclotron accelerating voltage cold chamber test method;

[0079] Through the above steps, a medical cyclotron acceleration voltage cold chamber testing method is completed.

[0080] The present invention also proposes a medical cyclotron acceleration voltage cold chamber testing system, comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein when the processor executes the computer program, the steps of a medical cyclotron acceleration voltage cold chamber testing method in steps S001 to S003 are implemented.

[0081] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A medical cyclotron accelerating voltage cold chamber test method, characterized in that: The method comprises the following steps: Obtaining the voltage of several measuring holes on the tooling bar when there is no probe and the voltage when there is a probe; Obtain the stable voltage distance value between the probes and all the influencing hole combinations of each measuring hole; obtain the voltage difference value of each influencing hole combination of each measuring hole according to the difference between the voltage of the measuring hole without the probe and the voltage of the measuring hole with the probe in the influencing hole combination; obtain the interference attenuation rate of each measuring hole according to the voltage difference values ​​of the different influencing hole combinations of each measuring hole and the distance between the measuring holes in the influencing hole combination; obtain the self-voltage offset of each measuring hole according to the interference attenuation rate of each measuring hole and the stable voltage distance value between the probes; obtain the influencing voltage amount of each influencing hole combination of each measuring hole according to the interference attenuation rate of each measuring hole and the distance between the measuring holes in the influencing hole combination; obtain the actual voltage value of each measuring hole according to the voltage of each measuring hole without the probe, the self-voltage offset and the influencing voltage amount of each influencing hole combination; According to the fluctuation of the actual voltage values ​​of all the measuring holes on the tooling bar, the performance index of the resonant cold cavity is obtained; based on the performance index of the resonant cold cavity, the performance of the cold cavity is evaluated; The specific method of obtaining the stable voltage distance value between the probes and all combinations of holes affecting each measuring hole is as follows: Preset a step size parameter and a fluctuation parameter , place the tooling strip in the capacitor, apply voltage to the capacitor, and place two probes on the tooling strip; fix one probe and step each time The other probe is moved, and every second is a sampling moment, and the input voltage of the capacitor is collected by a voltmeter each time; for any sampling moment, the absolute value of the difference between the input voltage of the capacitor at the sampling moment and the input voltage of the capacitor at the previous sampling moment is recorded as the voltage fluctuation amplitude value at the sampling moment; among all sampling moments, the first time the voltage fluctuation amplitude value is less than or equal to the preset fluctuation parameter The sampling time at , is recorded as the target sampling time; the distance value between the two probes at the target sampling time is taken as the stable voltage distance value between the probes; Any measuring hole is recorded as the target measuring hole, and all other measuring holes on the tooling bar are combined with the target measuring hole in pairs to obtain all the measuring hole combinations that affect the target measuring hole; The method of obtaining the interference attenuation rate of each measuring hole according to the voltage difference value of the measuring hole combination affected by each measuring hole and the distance between the measuring holes in the measuring hole combination affected by each measuring hole includes: The first The measuring hole The combination of the first and second holes that affect the measurement The measuring hole The absolute value of the difference between the voltage difference values ​​between the measurement hole combinations is the first absolute value of the difference; Another measuring hole in the measuring hole combination affects the The distance between the first difference and the other measuring hole in the measuring hole combination is recorded as the first influencing distance; the ratio of the absolute value of the first difference to the first influencing distance is recorded as the first The measuring hole The interference attenuation factor that affects the measurement hole combination; The average value of the interference attenuation factors of all the measuring hole combinations that affect the measuring hole is taken as the Interference attenuation rate of each measuring hole; The specific method of obtaining the influence voltage amount of each influencing measurement hole combination of each measuring hole according to the interference attenuation rate of each measuring hole and the distance between the measuring holes in the influencing measurement hole combination includes: Preset an influence parameter , for the Any one of the measuring holes affects the measuring hole combination. If the distance between the measuring holes in the measuring hole combination is greater than or equal to the stable voltage distance value between the probes, the voltage affected by the measuring hole combination is recorded as If the distance between the measuring holes in the measuring hole combination is less than the stable voltage distance value between the probes, the first The product of the interference attenuation rate of each measuring hole and the distance between the measuring holes in the influencing measuring hole combination is used as the influencing voltage amount of the influencing measuring hole combination; The actual voltage value of each measuring hole is obtained according to the voltage of each measuring hole without a probe, its own voltage offset, and the voltage amount of each affecting the measuring hole combination, including the specific method of: The first The cumulative sum of the voltages affecting the combination of all measuring holes affecting the measuring holes is recorded as the first cumulative sum; The voltage of the measuring hole without a probe, its own voltage offset and the first cumulative sum are summed as the first The actual voltage value of each measuring hole.

2. A medical cyclotron acceleration voltage cold chamber testing method according to claim 1, characterized in that: The method of obtaining the voltage difference value of each measuring hole combination affecting the measurement hole according to the difference between the voltage of the measuring hole without the probe and the voltage of the measuring hole with the probe in the measuring hole combination affecting the measurement hole includes the following specific methods: For Any one of the measuring holes affects the measuring hole combination. When another measuring hole in the measuring hole combination has a probe, the When there is a probe in the first measuring hole, the voltage is The absolute value of the difference between the voltages of the first and second measuring holes when there is no probe is taken as the The voltage difference value of the measuring hole combination that affects the measuring holes.

3. A medical cyclotron acceleration voltage cold chamber testing method according to claim 1, characterized in that: The specific method of obtaining the voltage offset of each measuring hole according to the interference attenuation rate of each measuring hole and the stable voltage distance value between the probes is as follows: The first The product of the interference attenuation rate of the first measuring hole and the stable voltage distance value between the probes is taken as the The voltage offset of each measuring hole.

4. A medical cyclotron acceleration voltage cold chamber testing method according to claim 1, characterized in that: The specific method of obtaining the performance index of the resonant cold cavity according to the fluctuation of the actual voltage values ​​of all the measuring holes on the tooling bar includes: The inverse of the variance of the actual voltage values ​​of all the measuring holes on the tooling bar is taken as the performance index of the resonant cold cavity.

5. A medical cyclotron acceleration voltage cold chamber testing method according to claim 1, characterized in that: The specific method of evaluating the performance of the cold cavity based on the performance index of the resonant cold cavity is as follows: Preset a threshold parameter , if the performance index of the resonant cold cavity is greater than or equal to the threshold parameter , the performance of the cold cavity is recorded as qualified; if the performance index of the resonant cold cavity is less than the threshold parameter , the performance of the cold chamber was recorded as unqualified.

6. A medical cyclotron acceleration voltage cold chamber test system, comprising a memory, a processor, and a computer program stored in the memory and running on the processor, characterized in that: When the processor executes the computer program, the steps of a medical cyclotron acceleration voltage cold chamber testing method as described in any one of claims 1 to 5 are implemented.

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