A short-process preparation method for aluminum-chromium alloy target

Through gradient heating and pressurization SPS sintering process, coated hot rolling and annealing treatment, the problems of long sintering time, high cost and uneven density in the existing aluminum-chromium alloy target preparation methods are solved, and the preparation of high-efficiency, low-cost and high-quality targets are achieved.

CN119407173BActive Publication Date: 2025-05-06XIAN RARE METAL MATERIALS RES INST CO LTD
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Patent Information

Application Number
CN202510012051.4
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-01-06
Publication Date
2025-05-06
Estimated Expiration
2045-01-06

AI Technical Summary

Technical Problem

The existing aluminum-chromium alloy target preparation methods have problems such as long sintering time, high cost, and uneven density, which are difficult to meet the needs of modern industry for high-efficiency, low-cost and high-quality target materials.

Method used

The SPS sintering process of gradient heating and pressurization is adopted, combined with coated hot rolling and annealing treatment, shorten the preparation cycle, improve the tissue density and alloying effect, and eliminate the problem of poor density uniformity.

Benefits of technology

Significantly shorten the preparation cycle, improve the density and tissue uniformity of aluminum-chromium alloy targets, reduce production costs, and obtain high-quality targets.

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Abstract

The present invention discloses a short-process preparation method of an aluminum-chromium alloy target material, which includes: 1. preparing powder raw materials; 2. mixing; 3. drying; 4. gradient heating, pressurized SPS sintering; 5. cladding hot rolling and annealing treatment; 6. machining, straightening, vacuum annealing and cleaning treatment. The present invention adopts a gradient heating and pressurized SPS sintering process, which not only obtains an aluminum-chromium alloy target material blank with complete alloying and uniform and dense organization, but also greatly shortens the preparation cycle, greatly improves production efficiency, effectively ensures a good alloying effect, and avoids the problem of grain growth and increased oxygen content caused by long-term sintering. Combined with the cladding hot rolling and annealing process, the grains are further refined and the organization uniformity is improved, eliminating the problem of poor density uniformity caused by SPS uniaxial pressure, while avoiding the use of expensive hot isostatic pressing equipment, greatly reducing production costs, and being suitable for large-scale promotion and application.
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Description

Technical Field

[0001] The invention relates to the technical field of target material preparation, and in particular to a short-process preparation method of an aluminum-chromium alloy target material. Background Art

[0002] Since the 1960s, applying a hard coating on the surface of high-strength and high-toughness cemented carbide has been the most effective way to obtain stable and durable cutting tools. With the continuous development of technology, hard coatings first experienced a development from binary TiN to ternary AlTiN, and gradually transformed into CrN and AlCrN. A large number of studies and industrial applications have found that the oxidation resistance of AlCrN coating is better than that of AlTiN coating, and its oxidation resistance temperature can reach 900°C, making AlCrN a widely used hard coating. In actual production applications, AlCrN coating is obtained by sputtering and depositing AlCr target in nitrogen. It can be used as a nitride coating for tools such as drills, milling cutters, gear cutters, etc. in mechanical processing, which makes the tools have excellent heat resistance and oxidation resistance, and improves the cutting performance and service life of the tools.

[0003] In order to further meet the high-precision, high-efficiency and low-cost machining requirements of modern industrial technology for ultra-high strength and ultra-high hardness parts, hard coatings are gradually developing in the direction of diversification and nano-ization. A large number of studies have found that doping AlCrN coatings with alloying elements such as B, Si, and W can balance the hardness, oxidation resistance temperature, and lubricity of the coatings, reduce the stress of the coatings, and reduce the generation of droplets during sputtering coating, thereby improving the coating efficiency and film quality. This makes AlCrX (X=Si, W, B) ternary alloy targets one of the main directions of development of targets for hard coatings.

[0004] Researching and preparing AlCrX (X=Si, W, B) targets with excellent performance is the premise for obtaining high-quality coatings. From a theoretical analysis: First, the melting point of aluminum is 660℃, the melting point of chromium is 1857℃, the melting point of boron is 2076℃, the melting point of silicon is 1410℃, and the melting point of tungsten is 3410℃. The melting points of the three (Al, Cr, X (X=Si, W, B)) are quite different; second, the solid solubility between the main elements aluminum and chromium is very low. At 600℃, the solid solubility of chromium in aluminum is only 0.8wt.%, and it is basically insoluble at room temperature. Its equilibrium structure is composed of aluminum matrix and a large amount of hard and brittle aluminum-chromium intermetallic compounds and other phases. It is impossible to reduce the melting point difference between the components by pre-alloying, thereby shortening the sintering time and improving the metallurgical quality; third, aluminum and chromium exothermically expand during the alloying reaction, which is very likely to cause defects such as pores, and cannot meet the use requirements of the target material, which increases the difficulty of preparing aluminum-chromium targets.

[0005] At present, there are three main methods for preparing aluminum-chromium alloy targets: the first is conventional sintering. The density of the target prepared by this method is very low, far from meeting the requirement of target density ≥99%, which is also the fatal disadvantage of this method; the second is vacuum hot pressing sintering. The sintering time for preparing aluminum-chromium alloy targets by this method can be as long as dozens of hours, which seriously affects production efficiency and quality stability, and the long-term sintering is prone to increase in oxygen content; at the same time, the relative density of the target prepared by this method is uneven, which is mainly reflected in the difference between the center and the edge position; the third is hot isostatic pressing, which is widely used at home and abroad, but its preparation cycle is long, the equipment is expensive, and the sintering cost is high. Summary of the invention

[0006] The technical problem to be solved by the present invention is to provide a short-process preparation method for aluminum-chromium alloy targets in view of the deficiencies of the above-mentioned prior art. The method adopts a gradient heating and pressurized SPS sintering process, which greatly shortens the preparation cycle, effectively ensures a good alloying effect, obtains an aluminum-chromium alloy target blank with complete alloying, uniform and dense organization, and avoids the problem of grain growth and increased oxygen content caused by long-term sintering. Combined with the coating hot rolling and annealing process, the problem of poor density uniformity caused by SPS uniaxial pressure is eliminated, the grains are further refined, the organization uniformity is improved, and high-quality aluminum-chromium alloy targets are obtained, which solves the problems of long sintering time, high cost, and uneven density in the prior art.

[0007] In order to solve the above technical problems, the technical solution adopted by the present invention is: a short-process preparation method of aluminum-chromium alloy target, characterized in that the method comprises the following steps:

[0008] Step 1, preparing powder raw materials of single-element aluminum, chromium and auxiliary alloying elements; the auxiliary alloying elements are boron, tungsten or silicon, and the atomic percentages of aluminum, chromium and auxiliary alloying elements in the powder raw materials are 50% to 70%, 20% to 40% and no more than 10% respectively;

[0009] Step 2: Mix the powder raw materials prepared in step 1 evenly under argon protection to obtain mixed powder;

[0010] Step 3: reducing and drying the mixed powder obtained in step 2 under a hydrogen-argon mixed atmosphere;

[0011] Step 4: evenly spread the mixed powder after reduction and drying in step 3 in a graphite mold, and then place it in an SPS sintering furnace to evacuate, and perform SPS sintering by gradient heating and pressurization to obtain a sintered blank;

[0012] Step 5: performing coating hot rolling and annealing treatment on the sintered blank to obtain an aluminum-chromium alloy target blank;

[0013] Step 6: machining, straightening, vacuum annealing and cleaning the aluminum-chromium alloy target blank obtained in step 5 to obtain an aluminum-chromium alloy target.

[0014] The above-mentioned short-process preparation method of an aluminum-chromium alloy target is characterized in that the particle size of the aluminum powder in step 1 is not greater than 180 meshes, and the mass purity is above 99.99%, and the particle size of the chromium powder and the auxiliary alloy element powder is not greater than 325 meshes, and the mass purity is greater than 99%. The present invention uses small-sized auxiliary alloy element powders, which is conducive to shortening the alloying time; at the same time, the combination of high-purity aluminum powder and slightly lower-purity auxiliary alloy element powders can not only meet the purity requirements of the aluminum-chromium alloy target, but also significantly reduce the cost of raw materials.

[0015] The above-mentioned short-process preparation method of an aluminum-chromium alloy target is characterized in that the uniform mixing process in step 2 is to use a V-type powder mixer to fill with argon to protect the mixing for 2h to 5h.

[0016] The above-mentioned short-process preparation method of an aluminum-chromium alloy target is characterized in that the temperature of the drying treatment in step 3 is 200°C to 300°C and the time is 2h to 4h. Drying at this temperature allows hydrogen, water, oxygen, etc. to be fully reacted and removed, avoiding the generation of pores or increased oxygen content in the target blank due to excessively high or low temperatures; at the same time, the present invention performs drying treatment on the mixed powder in a hydrogen-argon mixed atmosphere to achieve the effect of dehumidification and exhaust, which is beneficial to improving the density of the aluminum-chromium alloy target, reducing the oxygen content, and improving the yield rate.

[0017] The above-mentioned short-process preparation method of an aluminum-chromium alloy target is characterized in that the process of SPS sintering by gradient heating and pressurization in step 4 is: first gradient: pressureless heating to 100°C~200°C and keeping warm for 5min~10min; second gradient: pressurizing to 10MPa~15MPa, and continuing to heat to 400°C~450°C and keeping warm for 2min~5min while pressurizing; third gradient: pressurizing to 40MPa~50MPa again, then heating to 500°C~580°C, keeping warm for 5min~30min and completing sintering; fourth gradient: turning off the heating power supply, adjusting the pressure to 1 / 2~2 / 3 of the pressure after the third gradient pressurization, cooling to room temperature, and then unloading the pressure to zero to obtain a sintered blank. The present invention adopts a gradient heating and pressurized SPS sintering process, which is beneficial to improving the organizational density and alloying effect of the aluminum-chromium alloy target material, avoiding too high or too low temperature so that the aluminum-chromium alloying reaction is too fast and insufficient, resulting in a decrease in density; the pressure maintenance and cooling after the sintering is not only beneficial to improving the density, but also avoiding inconsistent shrinkage of the aluminum matrix and the aluminum-chromium compound, etc., and reducing the density of the product; at the same time, the direct contact between the pressure head and the mold during the pressurized cooling process is beneficial to increasing the cooling speed and improving the production efficiency.

[0018] The above-mentioned short-process preparation method of an aluminum-chromium alloy target is characterized in that the process of coated hot rolling in step five is: the sintered billet is rolled after being coated with iron sheet, the rolling temperature is 660℃~700℃, the total deformation is not more than 30%, and the pressing amount per pass does not exceed 1 / 4 of the total deformation, and the hot rolling is air-cooled to room temperature. At this rolling temperature, the aluminum-chromium alloy has good deformation ability, ensuring the smooth deformation, avoiding the phenomenon of liquid phase or cracking of the aluminum-chromium alloy target billet due to excessively high or low temperature; at the same time, the hot deformation process effectively balances the density difference between the center and edge of the billet, and the total rolling deformation within 30% can fully meet the requirements, so that the density of the center and edge of the billet remains consistent.

[0019] The above-mentioned short-process preparation method of an aluminum-chromium alloy target is characterized in that the annealing process described in step five is: the sintered billet after the coated hot rolling is put into the furnace at a temperature of 200°C~300°C, the insulation time is 1h~2h, and air-cooled to room temperature after annealing.

[0020] The short-process preparation method of the aluminum-chromium alloy target is characterized in that the metallographic structure of the aluminum-chromium alloy target in step 6 includes an aluminum matrix and a uniformly distributed aluminum-chromium phase, the average grain size does not exceed 50 μm, the mass purity of the aluminum-chromium alloy target is above 99.9%, the oxygen content is less than 100 ppm, the overall density is uniform, and there is no internal and external deviation. The high-quality aluminum-chromium alloy target is conducive to obtaining a high-quality hard coating film.

[0021] Compared with the prior art, the present invention has the following advantages:

[0022] 1. The present invention adopts a gradient SPS plasma discharge sintering process, which significantly shortens the sintering preparation time on the one hand, and at the same time, the hydrogen-argon mixed atmosphere reduction and the first gradient pressureless heating in the gradient sintering promote gas removal, significantly reducing the content of gases such as O and N in the aluminum-chromium alloy target, thereby effectively improving its strength.

[0023] 2. The present invention adopts a gradient SPS plasma discharge sintering process, which significantly shortens the sintering preparation time on the one hand, and at the same time, the hydrogen-argon mixed atmosphere reduction and the second gradient low-pressure and low-temperature sintering in the gradient sintering promote the heat discharge during the aluminum-chromium pre-alloying process, avoiding the large amount of heat generated by the violent alloying reaction that cannot be discharged, resulting in a decrease in the density of the billet and even the appearance of pores, thereby improving the density of the aluminum-chromium alloy target.

[0024] 3. The present invention adopts a gradient SPS plasma discharge sintering process, which significantly shortens the sintering preparation time on the one hand, and at the same time, the hydrogen-argon mixed atmosphere reduction and the fourth gradient pressure maintenance and cooling in the gradient sintering enable the aluminum-chromium alloy to maintain a high density, avoiding the inconsistent shrinkage of the aluminum matrix and the aluminum-chromium compound during the cooling process, resulting in a decrease in the density of the target blank and even the generation of pores, thereby further improving the density of the aluminum-chromium alloy target.

[0025] 4. The present invention balances the density difference between the center and edge of the sintered billet by coating hot rolling and annealing the sintered billet obtained by SPS plasma sintering, eliminates the disadvantages of SPS uniaxial pressure, and improves the density uniformity of the aluminum-chromium alloy target.

[0026] 5. The present invention adopts a combined process of SPS spark plasma sintering, thermoplastic deformation and annealing to replace the traditional hot isostatic pressing process, which greatly reduces the production cost such as the purchase of hot isostatic pressing equipment and realizes the preparation of efficient and low-cost aluminum-chromium targets.

[0027] The technical solution of the present invention is further described in detail below through the accompanying drawings and embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 This is a physical picture of the aluminum-chromium alloy target blank prepared in Example 1 of the present invention.

[0029] Figure 2 This is a physical picture of the aluminum-chromium alloy target prepared in Example 1 of the present invention.

[0030] Figure 3 This is the metallographic structure diagram of the aluminum-chromium alloy target prepared in Example 1 of the present invention. DETAILED DESCRIPTION

[0031] Example 1

[0032] This embodiment includes the following steps:

[0033] Step 1, prepare elemental aluminum, chromium and boron powder raw materials; the atomic percentages of aluminum, chromium and boron in the powder raw materials are 53%, 40% and 7% respectively; the particle size of the aluminum powder is 180 mesh, and the mass purity is 99.992%, the particle size of the chromium powder and the boron powder are both 325 mesh, and the mass purity is both 99.1%;

[0034] Step 2: Mix the powder raw materials prepared in step 1 in a V-type powder mixer for 3 hours under argon protection to obtain a mixed powder;

[0035] Step 3: In a hydrogen-argon mixed atmosphere, the mixed powder obtained in step 2 is kept at 230° C. for 3.2 h for reduction and drying;

[0036] Step 4: evenly spread the mixed powder after reduction and drying in step 3 in a graphite mold, and then place it in an SPS sintering furnace to evacuate, and perform SPS sintering by gradient heating and pressurization: the first gradient: heating to 200°C without pressure and keeping warm for 5 minutes; the second gradient: pressurizing to 15MPa, and continuing to heat to 450°C and keeping warm for 2 minutes while pressurizing; the third gradient: pressurizing to 50MPa again, and then heating to 580°C, keeping warm for 5 minutes to complete sintering; the fourth gradient: turning off the heating power supply, adjusting the pressure to 30MPa, cooling to room temperature, and then unloading the pressure to zero to obtain a sintered blank;

[0037] Step 5: The sintered blank is coated with iron sheet, kept at 700°C for 10 minutes, and then hot rolled, with a total deformation of 20%, completed in four passes, and the pressing amount of each pass is about 5%, air-cooled to room temperature, and then put into the furnace at room temperature, annealed at 200°C for 2 hours, and air-cooled to room temperature to obtain an aluminum-chromium alloy target blank;

[0038] Step 6: machining, straightening, vacuum annealing and cleaning the aluminum-chromium alloy target blank obtained in step 5 to obtain an aluminum-chromium alloy target.

[0039] Figure 1 This is a physical picture of the aluminum-chromium alloy target blank prepared in this embodiment. Figure 2 This is a physical picture of the aluminum-chromium alloy target prepared in this embodiment. Figure 3 The metallographic structure diagram of the aluminum-chromium alloy target prepared in this embodiment is shown in FIG. Figure 1~Figure 3 It can be seen that the aluminum-chromium alloy target prepared by the method of the present invention has no cracks and pores, and its internal structure includes an aluminum matrix and a uniformly distributed aluminum-chromium intermetallic compound phase. The average grain size is 48 μm, and the quality purity of the aluminum-chromium alloy target is above 99.93%, the oxygen content is 83 ppm, the density is greater than 99%, the overall density is uniform, and there is no internal or external deviation. It is suitable as a high-quality hard coating target.

[0040] Comparative Example 1

[0041] This comparative example comprises the following steps:

[0042] Step 1, prepare elemental aluminum, chromium and boron powder raw materials; the atomic percentages of aluminum, chromium and boron in the powder raw materials are 53%, 40% and 7% respectively; the particle size of the aluminum powder is 180 mesh, and the mass purity is 99.992%, the particle size of the chromium powder and the boron powder are both 325 mesh, and the mass purity is both 99.1%;

[0043] Step 2: Mix the powder raw materials prepared in step 1 in a V-type powder mixer for 3 hours under argon protection to obtain a mixed powder;

[0044] Step 3: In a hydrogen-argon mixed atmosphere, the mixed powder obtained in step 2 is kept at 230° C. for 3.2 h for reduction and drying;

[0045] Step 4: evenly spread the mixed powder after reduction and drying in step 3 in a graphite mold, and then place it in an SPS sintering furnace and evacuate it. SPS sintering is performed by a one-time heating and pressurizing method: first pressurize to 50 MPa, then heat to 580°C and keep it for 5 minutes to complete sintering, and obtain a sintered blank;

[0046] Step 5: The sintered blank is coated with iron sheet, kept at 700°C for 10 minutes, and then hot rolled, with a total deformation of 20%, completed in four passes, and the pressing amount of each pass is about 5%, air-cooled to room temperature, and then put into the furnace at room temperature, annealed at 200°C for 2 hours, and air-cooled to room temperature to obtain an aluminum-chromium alloy target blank;

[0047] Step 6: machining, straightening, vacuum annealing and cleaning the aluminum-chromium alloy target blank obtained in step 5 to obtain an aluminum-chromium alloy target.

[0048] Upon testing, it was found that the target material prepared in this comparative example had a large number of pores, and its density was only 97.2%, which was not suitable for use.

[0049] Example 2

[0050] This embodiment includes the following steps:

[0051] Step 1: Prepare single-element aluminum, chromium and tungsten powder raw materials; the atomic percentages of aluminum, chromium and tungsten in the powder raw materials are 63%, 27% and 10% respectively; the particle size of the aluminum powder is 150 mesh, and the mass purity is 99.995%, and the particle size of the chromium powder and the tungsten powder are both 350 mesh, and the mass purity is both 99.3%;

[0052] Step 2: The powder raw materials prepared in step 1 are mixed in a V-type powder mixer under argon protection for 5 hours to obtain a mixed powder;

[0053] Step 3: In a hydrogen-argon mixed atmosphere, the mixed powder obtained in step 2 is kept at 210° C. for 4 hours for reduction and drying;

[0054] Step 4: evenly spread the mixed powder after reduction and drying in step 3 in a graphite mold, and then place it in an SPS sintering furnace to evacuate, and perform SPS sintering by gradient heating and pressurization: the first gradient: heating to 100°C without pressure and keeping warm for 4 minutes; the second gradient: pressurizing to 12MPa, and continuing to heat to 400°C and keeping warm for 5 minutes while pressurizing; the third gradient: pressurizing to 48MPa again, and then heating to 500°C, and completing sintering after keeping warm for 30 minutes; the fourth gradient: turning off the heating power supply, adjusting the pressure to 32MPa, cooling to room temperature, and then unloading the pressure to zero to obtain a sintered blank;

[0055] Step 5: The sintered blank is coated with iron sheet, kept at 660°C for 25 minutes, and then hot rolled, with a total deformation of 30%, completed in six passes, and the pressing amount of each pass is about 5%, air-cooled to room temperature, and then put into the furnace at room temperature, annealed at 300°C for 1 hour, and air-cooled to room temperature to obtain an aluminum-chromium alloy target blank;

[0056] Step 6: machining, straightening, vacuum annealing and cleaning the aluminum-chromium alloy target blank obtained in step 5 to obtain an aluminum-chromium alloy target.

[0057] After testing, the aluminum-chromium alloy target prepared in this embodiment has no cracks and pores, and its internal structure includes an aluminum matrix and a uniformly distributed aluminum-chromium intermetallic compound phase. The average grain size is 46μm, and the quality purity of the aluminum-chromium alloy target is more than 99.96%, the oxygen content is 98ppm, the density is greater than 99%, the overall density is uniform, and there is no internal or external deviation. It is suitable as a high-quality hard coating target.

[0058] Example 3

[0059] This embodiment includes the following steps:

[0060] Step 1: Prepare single-element aluminum, chromium and silicon powder raw materials; the atomic percentages of aluminum, chromium and silicon in the powder raw materials are 70%, 22% and 8% respectively; the particle size of the aluminum powder is 120 mesh and the mass purity is 99.994%, the particle size of the chromium powder and the silicon powder are both 380 mesh and the mass purity is both 99.8%;

[0061] Step 2: Mix the powder raw materials prepared in step 1 in a V-type powder mixer under argon protection for 2 hours to obtain a mixed powder;

[0062] Step 3: In a hydrogen-argon mixed atmosphere, the mixed powder obtained in step 2 is kept at 300° C. for 2 h for reduction and drying;

[0063] Step 4: evenly spread the mixed powder after reduction and drying in step 3 in a graphite mold, and then place it in an SPS sintering furnace to evacuate, and perform SPS sintering by gradient heating and pressurization: the first gradient: heating to 140°C without pressure and keeping warm for 8 minutes; the second gradient: pressurizing to 10MPa, and continuing to heat to 420°C and keeping warm for 3 minutes while pressurizing; the third gradient: pressurizing to 40MPa again, and then heating to 550°C, keeping warm for 20 minutes to complete sintering; the fourth gradient: turning off the heating power supply, adjusting the pressure to 25MPa, cooling to room temperature, and then unloading the pressure to zero to obtain a sintered blank;

[0064] Step 5: The sintered blank is coated with iron sheet, kept at 670°C for 18 minutes, and then hot rolled, with a total deformation of 18%, completed in four passes, and the pressing amount of each pass is about 5%, air-cooled to room temperature, and then put into the furnace at room temperature, annealed at 240°C for 1.5 hours, and air-cooled to room temperature to obtain an aluminum-chromium alloy target blank;

[0065] Step 6: machining, straightening, vacuum annealing and cleaning the aluminum-chromium alloy target blank obtained in step 5 to obtain an aluminum-chromium alloy target.

[0066] After testing, the aluminum-chromium alloy target prepared in this embodiment has no cracks and pores, and its internal structure includes an aluminum matrix and a uniformly distributed aluminum-chromium intermetallic compound phase. The average grain size is 50μm, and the quality purity of the aluminum-chromium alloy target is more than 99.96%, the oxygen content is 98ppm, the density is greater than 99%, the overall density is uniform, and there is no internal or external deviation. It is suitable as a high-quality hard coating target.

[0067] The above is only a preferred embodiment of the present invention and does not limit the present invention in any way. Any simple modification, change and equivalent change made to the above embodiment according to the technical essence of the invention still falls within the protection scope of the technical solution of the present invention.

Claims

1. A short-process preparation method for an aluminum-chromium alloy target, characterized in that: The method comprises the following steps: Step 1, preparing powder raw materials of single-element aluminum, chromium and auxiliary alloying elements; the auxiliary alloying elements are boron, tungsten or silicon, and the atomic percentages of aluminum, chromium and auxiliary alloying elements in the powder raw materials are 50% to 70%, 20% to 40% and no more than 10% respectively; Step 2: Mix the powder raw materials prepared in step 1 evenly under argon protection to obtain mixed powder; Step 3: reducing and drying the mixed powder obtained in step 2 under a hydrogen-argon mixed atmosphere; Step 4, evenly spread the mixed powder after reduction and drying in step 3 in a graphite mold, then place it in an SPS sintering furnace and evacuate it, and perform SPS sintering by gradient heating and pressurization to obtain a sintered blank; the process of SPS sintering by gradient heating and pressurization is as follows: first gradient: pressureless heating to 100°C~200°C and keeping warm for 5min~10min; second gradient: pressurizing to 10MPa~15MPa, and continuing to heat to 400°C~450°C and keeping warm for 2min~5min while pressurizing; third gradient: pressurizing to 40MPa~50MPa again, then heating to a temperature of 500°C~580°C, and completing sintering after keeping warm for 5min~30min; fourth gradient: turn off the heating power supply, adjust the pressure to 1 / 2~2 / 3 of the pressure after the third gradient pressurization, wait for cooling to room temperature, and then release the pressure to zero to obtain a sintered blank; Step 5: performing coating hot rolling and annealing treatment on the sintered blank to obtain an aluminum-chromium alloy target blank; Step six, machining, straightening, vacuum annealing and cleaning the aluminum-chromium alloy target blank obtained in step five to obtain an aluminum-chromium alloy target; the metallographic structure of the aluminum-chromium alloy target includes an aluminum matrix and a uniformly distributed aluminum-chromium phase, the average grain size does not exceed 50μm, the mass purity of the aluminum-chromium alloy target is above 99.9%, the oxygen content is less than 100ppm, the overall density is uniform, and there is no internal or external deviation.

2. The short-process preparation method of an aluminum-chromium alloy target according to claim 1, characterized in that: The particle size of the aluminum powder in step 1 is not greater than 180 meshes, and the mass purity is greater than 99.99%. The particle sizes of the chromium powder and the auxiliary alloy element powder are both not greater than 325 meshes, and the mass purity is greater than 99%.

3. The short-process preparation method of an aluminum-chromium alloy target according to claim 1, characterized in that: The process for uniform mixing in step 2 is to use a V-type powder mixer to mix for 2h to 5h with argon protection.

4. The short-process preparation method of an aluminum-chromium alloy target according to claim 1, characterized in that: The temperature of the drying treatment in step 3 is 200°C~300°C, and the time is 2h~4h.

5. The short-process preparation method of an aluminum-chromium alloy target according to claim 1, characterized in that: The process of the coated hot rolling in step 5 is: the sintered billet is coated with iron sheet and then rolled, the rolling temperature is 660°C~700°C, the total deformation is not more than 30%, and the pressing amount per pass does not exceed 1 / 4 of the total deformation, and after hot rolling, it is air-cooled to room temperature.

6. The short-process preparation method of an aluminum-chromium alloy target according to claim 1, characterized in that: The annealing process in step five is: putting the sintered billet after hot rolling into the furnace at a temperature of 200°C to 300°C, holding time of 1h to 2h, and air cooling to room temperature after annealing.

Citation Information

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