A polishing machine

Abstract

The present invention discloses a polishing machine, comprising: a polishing barrel, the polishing barrel is used to contain polishing liquid; a polishing assembly, the polishing assembly is arranged in the polishing barrel, a gap area is arranged between the side and / or bottom surface of the polishing assembly and the inner wall of the polishing barrel, the polishing assembly comprises a polishing head located in the gap area; a carrier assembly, the carrier assembly comprises a carrier plate arranged in the gap area, a fixing structure for fixing a workpiece to be polished is arranged on a side of the carrier plate close to the polishing head, and the polishing head is used to abut against the workpiece to be polished. The polishing machine of the present invention can effectively reduce the occupied space of the polishing machine and improve the space utilization rate by arranging the polishing head and the carrier plate in the gap area between the polishing assembly and the polishing barrel.

Description

Technical Field

[0001] The invention relates to the technical field of polishing, in particular to a polishing machine. Background Art

[0002] Polishing machine is a tool used for surface treatment. It is mainly used to polish, grind and brighten the surface of metal, wood, plastic, stone and other materials. Through this treatment, surface defects can be removed, surface smoothness can be improved, and a bright appearance can be obtained. Polishing machines are commonly used in production, maintenance, automobiles, home appliances, jewelry, metal processing and other fields.

[0003] The multiple polishing heads of the existing polishing machine are usually arranged on the same plane, so that the polishing machine occupies a large space on the plane and the space utilization rate is low. Summary of the invention

[0004] The main purpose of the present invention is to provide a polishing machine, aiming to solve the problem that multiple polishing heads of existing polishing machines are usually arranged on the same plane, so that the polishing machine occupies a large space on the plane and has a low space utilization rate.

[0005] To achieve the above object, the present invention provides a polishing machine, comprising:

[0006] A polishing barrel, wherein the polishing barrel is used to contain polishing liquid;

[0007] A polishing assembly, wherein the polishing assembly is disposed in the polishing barrel, a gap area is provided between the side surface and / or the bottom surface of the polishing assembly and the inner wall of the polishing barrel, and the polishing assembly includes a polishing head located in the gap area;

[0008] A carrier assembly comprises a carrier plate arranged in the gap area, a fixing structure for fixing the workpiece to be polished is arranged on one side of the carrier plate close to the polishing head, and the polishing head is used to abut against the workpiece to be polished.

[0009] Optionally, the fixed structure includes a suction table and a pressure plate, the pressure plate and the carrier plate are detachably arranged, the suction table has a suction surface for fitting with the workpiece to be polished, the suction surface is embedded with a plurality of suction cups, the pressure plate includes a limiting portion arranged around the suction table and a pressing portion arranged on the suction surface, the limiting portion is used to abut against two ends of the workpiece to be polished, and the pressing portion is used to press the workpiece to be polished onto the suction surface.

[0010] Optionally, an elastic seesaw is provided on the carrier plate, and a groove for abutting against the elastic seesaw is provided on the pressure plate.

[0011] Optionally, a positioning column is provided on the carrier plate, and a positioning hole plugged into the positioning column is provided on the pressure plate.

[0012] Optionally, the carrier assembly further comprises a cylinder disposed on a side of the polishing barrel, the cylinder being drivingly connected to the carrier plate, and the cylinder being used to drive the workpiece to be polished to move closer to and away from the polishing head.

[0013] Optionally, the carrier assembly also includes a jig plate, the jig plate is provided with a accommodating cavity for accommodating the carrier plate, a side of the accommodating cavity close to the polishing head is provided with an avoidance opening, an upper end of the accommodating cavity is provided with an opening for the carrier plate to enter, and rollers for sliding along the side walls of the accommodating cavity are provided on opposite sides of the carrier plate.

[0014] Optionally, the polishing assembly further comprises a gear box and a motor driving an input end of the gear box, and an output end of the gear box is eccentrically connected to the polishing head.

[0015] Optionally, the gearbox includes an input shaft, a rotating shaft, and an output shaft, the input shaft and one end of the rotating shaft are both provided with sprockets, the two sprockets are connected by a chain, the other end of the rotating shaft and one end of the output shaft are both provided with bevel gears, the two bevel gears are meshed, and the other end of the output shaft is eccentrically connected to the polishing head.

[0016] Optionally, the polishing machine further comprises a driving assembly drivingly connected to the polishing assembly, wherein the driving assembly is used to drive the polishing assembly to descend into the polishing barrel or to ascend to the outside of the polishing barrel.

[0017] Optionally, the polishing machine also includes a residue filtering system, which includes a filter water tank, a liquid extraction pipeline, and a liquid infusion pipeline. Both the liquid extraction pipeline and the liquid infusion pipeline are provided with water pumps. The polishing barrel, the liquid extraction pipeline, the filter water tank, and the liquid infusion pipeline are used to form a filtering circuit.

[0018] Beneficial effects are as follows: the present invention proposes a polishing machine, comprising: a polishing barrel, the polishing barrel is used to contain polishing liquid; a polishing assembly, the polishing assembly is arranged in the polishing barrel, a gap area is arranged between the side and / or bottom surface of the polishing assembly and the inner wall of the polishing barrel, the polishing assembly comprises a polishing head located in the gap area; a carrier assembly, the carrier assembly comprises a carrier plate arranged in the gap area, a fixing structure for fixing the workpiece to be polished is arranged on one side of the carrier plate close to the polishing head, and the polishing head is used to abut against the workpiece to be polished. The polishing machine of the present invention can effectively reduce the occupied space of the polishing machine and improve the space utilization rate by arranging the polishing head and the carrier plate in the gap area between the polishing assembly and the polishing barrel. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0020] Figure 1 It is a three-dimensional schematic diagram of the polishing machine of the present invention;

[0021] Figure 2 It is a schematic diagram of the interior of the polishing barrel of the present invention;

[0022] Figure 3 It is one of the partial schematic diagrams of the carrier board of the present invention;

[0023] Figure 4 The second partial schematic diagram of the carrier board of the present invention;

[0024] Figure 5 is a three-dimensional schematic diagram of a jig plate of the present invention;

[0025] Figure 6 It is a schematic diagram of the interior of the polishing assembly of the present invention.

[0026] Description of Figure Numbers:

[0027] 1. Polishing barrel; 4. Driving assembly; 5. Workpiece to be polished; 21. Polishing head; 22. Gear box; 23. Motor; 31. Carrier plate; 32. Suction table; 33. Press plate; 34. Jig plate; 35. Cylinder; 311. Elastic seesaw; 312. Positioning column; 313. Roller; 321. Suction surface; 322. Suction cup; 323. Groove; 331. Limiting part; 332. Pressing part; 333. Positioning hole; 341. Accommodating cavity; 342. Avoidance; 343. Opening.

[0028] The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0030] It should be noted that if the embodiments of the present invention involve directional indications (such as up, down, left, right, front, back...), the directional indications are only used to explain the relative position relationship, movement status, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly.

[0031] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present invention, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In addition, if the meaning of "and / or" appearing in the full text is to include three parallel schemes, taking "A and / or B" as an example, it includes scheme A, or scheme B, or a scheme that satisfies both A and B. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of ordinary technicians in this field to implement. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0032] The present invention provides a polishing machine. Figures 1 to 6 A specific embodiment of the polishing machine provided by the present invention.

[0033] Reference Figures 1 to 6 , the polishing machine comprises:

[0034] A polishing barrel 1, wherein the polishing barrel 1 is used to contain polishing liquid;

[0035] A polishing assembly, the polishing assembly is arranged in the polishing barrel 1, a gap area is arranged between the side surface and / or the bottom surface of the polishing assembly and the inner wall of the polishing barrel 1, and the polishing assembly includes a polishing head 21 located in the gap area;

[0036] The carrier assembly includes a carrier plate 31 disposed in the gap area. A fixing structure for fixing the workpiece 5 to be polished is provided on one side of the carrier plate 31 close to the polishing head 21 . The polishing head 21 is used to abut against the workpiece 5 to be polished.

[0037] In the present invention, the gap area includes one or more of the five gaps formed between the four side surfaces and the bottom surface of the polishing assembly and the inner wall of the polishing barrel 1 .

[0038] In this embodiment, by arranging the polishing head 21 in the gap area between the polishing assembly and the polishing barrel 1, the polishing head 21 is arranged on the side and / or bottom of the polishing assembly and is arranged around the polishing assembly. This arrangement occupies less space and has high space utilization.

[0039] Furthermore, the fixing structure includes a suction table 32 and a pressing plate 33, the pressing plate 33 and the carrier plate 31 are detachably arranged, the suction table 32 has a suction surface 321 for fitting with the workpiece 5 to be polished, the suction surface 321 is embedded with a plurality of suction cups 322, the pressing plate 33 includes a limiting portion 331 arranged around the suction table 32 and a pressing portion 332 arranged on the suction surface 321, the limiting portion 331 is used to abut against both ends of the workpiece 5 to be polished, and the pressing portion 332 is used to press the workpiece 5 to be polished onto the suction surface 321. In this embodiment, the workpiece 5 to be polished is sucked onto the suction table 32 by the suction cups 322, so that the workpiece 5 to be polished fits tightly with the suction surface 321, which can ensure that the polished workpiece is firmly fixed on the suction table 32, and prevent the workpiece 5 to be polished from displacement or sliding during the polishing process, thereby improving the consistency and accuracy of polishing. The limiting part 331 abuts against both ends of the workpiece 5 to be polished, so that the workpiece 5 to be polished can be further limited, ensuring that the workpiece 5 to be polished remains stable during the polishing process, and the pressing effect of the pressing part 332 on the workpiece 5 to be polished further enhances the contact strength between the workpiece 5 to be polished and the suction table 32, ensuring that the workpiece will not loosen or fall off due to vibration, friction or external force. The combined action of the suction table 32 and the pressing plate 33 can ensure that the workpiece 5 to be polished is fixed safely and reliably.

[0040] Furthermore, the carrier plate 31 is provided with an elastic seesaw 311, and the pressing plate 33 is provided with a groove 323 for abutting against the elastic seesaw 311. In this embodiment, the matching design of the elastic seesaw 311 and the groove 323 enables the pressing plate 33 to be quickly and conveniently installed or removed from the carrier plate 31. Through the adaptive characteristics of the elastic seesaw 311, the pressing plate 33 can be easily fixed to the carrier plate 31 without additional tools or complicated operation steps. When in use, the operator only needs to push and press to achieve the fixing of the elastic seesaw 311 to the pressing plate 33, which greatly saves assembly time and labor.

[0041] Furthermore, the carrier plate 31 is provided with a positioning column 312, and the pressure plate 33 is provided with a positioning hole 333 plugged into the positioning column 312. In this embodiment, the matching design of the positioning column 312 and the positioning hole 333 can ensure the precise docking between the carrier plate 31 and the pressure plate 33. During the assembly process, the positioning column 312 automatically guides the pressure plate 33 to align with the carrier plate 31, avoiding positioning deviations caused by improper manual operation or errors, thereby improving the assembly accuracy and consistency of the overall system. The plugging of the positioning column 312 and the positioning hole 333 also makes the connection between the carrier plate 31 and the pressure plate 33 more firm and stable, which can avoid the loosening of the pressure plate 33 after assembly and ensure the stability of the connection.

[0042] Furthermore, the carrier assembly also includes a cylinder 35 disposed on the side of the polishing barrel 1, the cylinder 35 is drivingly connected to the carrier plate 31, and the cylinder 35 is used to drive the workpiece 5 to be polished to approach and move away from the polishing head 21. In this embodiment, the workpiece 5 to be polished has a contact state with the polishing head 21 and a separation state with the polishing head 21, and the workpiece 5 to be polished can be driven by the cylinder 35 to switch between the contact state and the separation state. When the workpiece 5 to be polished needs to be installed or removed, the cylinder 35 can drive the workpiece 5 to be polished to the separation state, which is convenient for operation. After the installation of the workpiece 5 to be polished is completed, the cylinder 35 can drive the workpiece 5 to be polished to the contact state again, so that the polishing head 21 can polish the workpiece 5 to be polished.

[0043] Furthermore, the carrier assembly further includes a fixture plate 34, the fixture plate 34 is provided with a receiving cavity 341 for receiving the carrier 31, a side of the receiving cavity 341 close to the polishing head 21 is provided with an avoidance opening 342, the upper end of the receiving cavity 341 is provided with an opening 343 for the carrier 31 to enter, and opposite sides of the carrier 31 are provided with rollers 313 for sliding along the side walls of the receiving cavity 341. In this embodiment, the avoidance opening 342 is used to expose the workpiece 5 to be polished, so as to facilitate the polishing by the polishing head 21, and the opening 343 is used for loading and removing the carrier 31. The operator can easily put the carrier 31 into or take it out of the receiving cavity 341 through the upper opening 343, and the rollers 313 are provided on opposite sides of the carrier 31, so that the carrier 31 can slide smoothly along the side walls of the receiving cavity 341, reduce the friction between the carrier 31 and the side walls of the receiving cavity 341, and avoid the difficulty of putting in and taking out the carrier 31 due to excessive friction.

[0044] Furthermore, the polishing assembly further includes a gear box 22 and a motor 23 drivingly connected to the input end of the gear box 22, and the output end of the gear box 22 is eccentrically connected to the polishing head 21. In this embodiment, the gear box 22 is used to transmit the power of the motor 23 to the polishing head 21, and the motor 23 can simultaneously drive multiple polishing heads 21 for polishing through the gear box 22. Through the eccentric connection between the output end of the gear box 22 and the polishing head 21, the polishing head 21 can achieve asymmetric eccentric rotation, so that the polishing head 21 has a larger polishing range.

[0045] Further, the gearbox 22 includes an input shaft, a transfer shaft, and an output shaft. The input shaft and one end of the transfer shaft are both sleeved with a sprocket, and the two sprockets are connected by a chain. The other end of the transfer shaft and one end of the output shaft are both sleeved with a bevel gear, and the two bevel gears are meshed. The other end of the output shaft is eccentrically connected to the polishing head 21. In this embodiment, through the configuration of the input shaft, the transfer shaft and the output shaft, combined with the transmission mode of the sprocket and the chain, the power of the motor 23 can be transmitted to multiple polishing heads 21, and the power transmission efficiency is high. Among them, the chain transmission can achieve relatively stable and low-noise power transmission, and is relatively stable and not easily affected by vibration or impact. The design of the bevel gear allows the power transmission direction between the transfer shaft and the output shaft to change. Combined with the chain transmission, it can effectively save the overall space of the equipment and make the entire gearbox 22 structure more compact.

[0046] Furthermore, the polishing machine also includes a driving assembly 4 connected to the polishing assembly, and the driving assembly 4 is used to drive the polishing assembly to descend into the polishing barrel 1 or rise to the outside of the polishing barrel 1. In this embodiment, the polishing assembly can be driven out of the polishing barrel 1 by the driving assembly 4, so as to facilitate the operator to maintain or replace the polishing head 21. At the same time, when the polishing assembly is moved out of the polishing barrel 1, the residue filtering system can filter the polishing liquid more efficiently. There are many specific driving structures of the driving assembly 4 in the prior art, such as the driving assembly 4 including a motor 23 and a transmission gear set, or including a motor 23 and a belt, or including a motor 23 and a transmission rod, etc. The above-mentioned driving method can effectively and stably drive the polishing assembly to rise and fall, and since the application of the above-mentioned driving method in the prior art is very mature, the structure of the driving method is not specifically limited here, and it is not repeated.

[0047] Furthermore, the polishing machine also includes a residue filtering system, which includes a filter water tank, a liquid extraction pipeline, and a liquid infusion pipeline. The liquid extraction pipeline and the liquid infusion pipeline are both provided with water pumps, and the polishing barrel 1, the liquid extraction pipeline, the filter water tank, and the liquid infusion pipeline are used to form a filtering circuit. In this embodiment, during the polishing process, the polishing liquid will react with the surface of the workpiece to produce a large amount of waste and residue. By introducing the filtering system, the residue can be effectively removed from the polishing liquid, keeping the polishing liquid clean, and preventing the residue from being deposited on the surface of the workpiece again or affecting the polishing effect, which can ensure the high quality and uniformity of the polishing operation and improve the surface finish and precision of the product. By timely filtering and removing waste and residue, the filtering system can also effectively extend the service life of the polishing liquid and reduce the wear of impurities on the polishing head 21.

[0048] The above descriptions are only optional embodiments of the present invention, and are not intended to limit the patent scope of the present invention. All equivalent structural changes made using the contents of the present invention's specification and drawings, or directly / indirectly applied in other related technical fields, are included in the patent protection scope of the present invention.

Claims

1. A polishing machine, characterized in that: include: A polishing barrel, wherein the polishing barrel is used to contain polishing liquid; A polishing assembly, wherein the polishing assembly is disposed in the polishing barrel, a gap area is provided between the side surface and / or the bottom surface of the polishing assembly and the inner wall of the polishing barrel, and the polishing assembly includes a polishing head located in the gap area; A carrier assembly, the carrier assembly comprising a carrier plate disposed in the gap area, a fixing structure for fixing the workpiece to be polished is provided on a side of the carrier plate close to the polishing head, and the polishing head is used to abut against the workpiece to be polished; The fixing structure includes a suction table and a pressing plate, the pressing plate and the carrier plate are detachably arranged, the suction table has a suction surface for abutting against the workpiece to be polished, the suction surface is embedded with a plurality of suction cups, the pressing plate includes a limiting portion arranged around the suction table and a pressing portion arranged on the suction surface, the limiting portion is used to abut against two ends of the workpiece to be polished, and the pressing portion is used to press the workpiece to be polished onto the suction surface; The carrier plate is provided with an elastic seesaw, and the pressure plate is provided with a groove for contacting with the elastic seesaw; the carrier plate is provided with a positioning column, and the pressure plate is provided with a positioning hole plugged with the positioning column; The carrier assembly further includes a jig plate, the jig plate is provided with a receiving cavity for receiving the carrier plate, a side of the receiving cavity close to the polishing head is provided with an avoidance opening, an upper end of the receiving cavity is provided with an opening for the carrier plate to enter, and rollers for sliding along the side walls of the receiving cavity are provided on opposite sides of the carrier plate; the carrier assembly further includes a cylinder provided on the side of the polishing barrel, the cylinder is drivingly connected to the jig plate, and the cylinder is used to drive the workpiece to be polished to approach and move away from the polishing head; The polishing assembly also includes a gear box and a motor driving an input end connected to the gear box, and an output end of the gear box is eccentrically connected to the polishing head.

2. The polishing machine according to claim 1, characterized in that The gear box includes an input shaft, a rotating shaft, and an output shaft. The input shaft and one end of the rotating shaft are both provided with sprockets, and the two sprockets are connected by a chain. The other end of the rotating shaft and one end of the output shaft are both provided with bevel gears, and the two bevel gears are meshed. The other end of the output shaft is eccentrically connected to the polishing head.

3. The polishing machine according to claim 1, characterized in that: The polishing machine also includes a driving assembly drivingly connected to the polishing assembly, and the driving assembly is used to drive the polishing assembly to descend into the polishing barrel or to rise out of the polishing barrel.

4. The polishing machine according to claim 1, characterized in that: The polishing machine also includes a residue filtering system, which includes a filter water tank, a liquid extraction pipeline, and a liquid infusion pipeline. Both the liquid extraction pipeline and the liquid infusion pipeline are provided with water pumps. The polishing barrel, the liquid extraction pipeline, the filter water tank, and the liquid infusion pipeline are used to form a filtering circuit.

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