A dpp type extreme ultraviolet light source debris comprehensive filtering device and method thereof

Abstract

The application belongs to the technical field of semiconductor manufacturing equipment, and discloses a DPP type extreme ultraviolet light source debris comprehensive filtering device and a method thereof.The DPP type extreme ultraviolet light source debris comprehensive filtering device comprises a debris introduction part, a vacuum differential part, a gas purging part, a foil trap filtering part, an atomic hydrogen part, a delayed field ion energy analyzer part, a quartz crystal microbalance part and a control and monitoring system.The device combines multiple removal mechanisms (vacuum differential, gas purging, foil trap filtering and atomic hydrogen reaction) and introduces a high-precision monitoring system (ion energy analyzer and quartz crystal microbalance), so that different types and different particle sizes of debris pollution can be effectively filtered and relieved.Meanwhile, the real-time online monitoring system can timely adjust the working state of each removal mechanism according to the monitoring result, so that efficient and accurate debris removal is realized, the service life of a photolithography system component is prolonged, and the photolithography efficiency is improved.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of semiconductor manufacturing equipment, and particularly relates to a DPP type extreme ultraviolet light source debris comprehensive filtering device and a method thereof. BACKGROUND

[0002] A device for filtering and mitigating debris generated by a DPP (Discharge Produced Plasma) type extreme ultraviolet light source is provided. In extreme ultraviolet lithography technology, the DPP type extreme ultraviolet light source is a key component for generating extreme ultraviolet light. However, during the process of generating extreme ultraviolet light, this light source often generates a large amount of debris, which can damage the optical collection system of the lithography machine, thereby affecting the precision and efficiency of lithography. The DPP type extreme ultraviolet light source generates a large amount of debris during operation, which can damage the optical components of the lithography system and reduce the efficiency and precision of the lithography system. In the prior art, the debris removal mechanism is often targeted at a certain type of debris, and the efficiency is low. The traditional debris removal system lacks effective monitoring means and cannot evaluate the removal effect in real time. Device damage caused by debris accumulation is the main reason for frequent maintenance of the lithography system.

[0003] Through the above analysis, the problems and defects of the prior art are as follows:

[0004] (1) DPP type extreme ultraviolet light source debris pollution problem: the DPP type extreme ultraviolet light source generates a large amount of debris during operation, which can damage the optical components of the lithography system and reduce the efficiency and precision of the lithography system.

[0005] (2) Low efficiency of debris removal: in the prior art, the debris removal mechanism is often targeted at a certain type of debris, and the efficiency is low.

[0006] (3) Insufficient monitoring of debris removal effect: the traditional debris removal system lacks effective monitoring means and cannot evaluate the removal effect in real time.

[0007] (4) Frequent system maintenance: device damage caused by debris accumulation is the main reason for frequent maintenance of the lithography system. SUMMARY

[0008] In view of the problems in the prior art, the application provides a DPP type extreme ultraviolet light source debris comprehensive filtering device and a method thereof.

[0009] The application is implemented as follows: a DPP type extreme ultraviolet light source debris comprehensive filtering device comprises:

[0010] Debris introduction section, vacuum differential section, gas purge section, foil trap filtration section, atomic hydrogen section, retarding field ion energy analyzer section, quartz crystal microbalance section, control and monitoring system;

[0011] Debris introduction section, connected with the control and monitoring system, is the front-end module of the device, responsible for introducing the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system; this part can guide the pollutants into the system through flange interface or leak valve components;

[0012] Vacuum differential section, connected with the control and monitoring system, forms a multi-stage vacuum chamber by cooperating with dry pumps and molecular pumps, and separates small molecular particles by using vacuum gradient;

[0013] Gas purge section, connected with the control and monitoring system, uses high-speed airflow to impact debris particles, changes the motion trajectory of the debris, and drives them away from the surface of the light source assembly;

[0014] Foil trap filtration section, connected with the control and monitoring system, is composed of foil traps of specific shape, captures debris through physical adsorption and inertial collision, and effectively removes larger particle pollutants;

[0015] Atomic hydrogen section, connected with the control and monitoring system, generates highly active hydrogen atoms through an atomic hydrogen generator, which chemically reacts with reactive pollutants in the debris and converts them into easily removable gas;

[0016] Retarding field ion energy analyzer section, connected with the control and monitoring system, analyzes the energy of ion-type debris in the debris before and after removal to evaluate the debris removal effect;

[0017] Quartz crystal microbalance section, connected with the control and monitoring system, monitors the deposition amount of debris in real time by monitoring the change of the resonance frequency of the quartz crystal, and evaluates the effect of debris removal;

[0018] Control and monitoring system, connected with the debris introduction section, vacuum differential section, gas purge section, foil trap filtration section, atomic hydrogen section, retarding field ion energy analyzer section, and quartz crystal microbalance section, monitors and adjusts the running state of each module through the central control system, and realizes closed-loop control through sensor data acquisition.

[0019] Further, the debris introduction section comprises:

[0020] Flange interface: high sealing material is used to ensure that pollutants do not leak into other environments; high-temperature-resistant and corrosion-resistant flanges are designed;

[0021] Leak valve components: the introduction valve can control the amount and speed of debris introduction to prevent system overload.

[0022] Further, the vacuum differential part includes:

[0023] Coordinated control of dry pump and molecular pump: Adjust the working frequency and pressure of both with intelligent control system;

[0024] Multi-stage vacuum chamber structure: Designed as a multi-stage vacuum differential structure, gradually reducing the vacuum degree of the chamber from high vacuum to ultra-high vacuum.

[0025] Further, the gas purging part includes:

[0026] Gas selection: Select inert gas to avoid reaction with debris or light source components;

[0027] Gas flow rate control: Through multi-point purging design, combined with gas flow rate control module, to ensure that debris at different positions can be effectively impacted by airflow; optimize the purging airflow path through numerical simulation;

[0028] Gas distributor design: Use a multi-hole designed distributor to ensure uniform airflow coverage of the target area.

[0029] Further, the foil trap filtering part includes:

[0030] Foil trap shape design: Designed as a multi-layer structure to increase the area of debris capture, and optimize the geometry of the foil trap by simulating airflow and debris motion trajectory;

[0031] Material selection: Use metal materials with high heat resistance and low reactivity to manufacture the foil trap;

[0032] Automatic cleaning mechanism: Design automatic cleaning function for the foil trap, remove the adsorbed debris through periodic gas backflushing or vibration.

[0033] Further, the atomic hydrogen part includes:

[0034] Atomic hydrogen generator: Select high-efficiency plasma generator to produce high-density hydrogen atoms;

[0035] Reaction chamber design: Design the area where atomic hydrogen and debris are in full contact as a multi-reaction chamber structure;

[0036] Safety protection: Add monitoring module to detect the concentration of atomic hydrogen and reaction products in real time;

[0037] Delay field ion energy analyzer part includes:

[0038] High-precision energy analyzer: Use high-sensitivity ion energy analyzer to ensure accurate detection of small energy changes;

[0039] Data feedback system: Link with the control system, adjust the working state of the cleaning components in real time according to the energy analysis results;

[0040] The quartz crystal microbalance part includes:

[0041] High-precision sensor: high-sensitivity quartz crystal microbalance sensor is used to detect extremely small amounts of debris deposition;

[0042] Automatic calibration system: automatic calibration mechanism is added in the sensor;

[0043] Multi-point monitoring layout: multiple microbalance sensors are arranged at different positions inside the device;

[0044] The control and monitoring system includes:

[0045] Intelligent control algorithm: adaptive control algorithm is designed to automatically adjust the working mode of the debris removal device according to debris monitoring data, airflow conditions and vacuum differential conditions;

[0046] Real-time data display: real-time data visualization interface is provided, and the operator can view the debris removal effect, device running status and monitoring results through the display screen.

[0047] Another object of the present application is to provide a DPP type extreme ultraviolet light source debris comprehensive filtering method, which includes:

[0048] Step 1: introducing the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system through the debris introduction part; this part can guide the pollutants into through the flange interface or the leak valve component; by using the cooperation of the dry pump and the molecular pump in the vacuum differential part, a multi-stage vacuum chamber is formed, and the small molecular particulate matter is separated by using the vacuum gradient;

[0049] Step 2: use high-speed airflow to impact debris particles through the gas purging part to change the motion trajectory of the debris and drive it away from the surface of the light source assembly; the foil trap filtering part is composed of a specific shape of foil trap, which captures debris by physical adsorption and inertial collision, and effectively removes larger particulate pollutants;

[0050] Step 3: use the atomic hydrogen generator to generate highly active hydrogen atoms in the atomic hydrogen part, which chemically react with reactive pollutants in the debris to convert them into easily removable gas;

[0051] Step 4: analyze the energy of ion-type debris before and after removal by the delayed field ion energy analyzer part to evaluate the debris removal effect;

[0052] Step 5: use the quartz crystal microbalance part to monitor the deposition amount of debris in real time by monitoring the change of the resonance frequency of the quartz crystal, which is used to evaluate the effect of debris removal;

[0053] Step 6: The central control system monitors and adjusts the operating status of each module through the control and monitoring system, and realizes closed-loop control by collecting data through sensors to optimize the debris removal effect.

[0054] Another object of the present invention is to provide a computer device, the computer device including a memory and a processor, the memory storing a computer program, which, when executed by the processor, causes the processor to perform the steps of the DPP type extreme ultraviolet light source debris integrated filtration method.

[0055] Another object of the present invention is to provide a computer-readable storage medium storing a computer program, which, when executed by a processor, causes the processor to perform the steps of the DPP-type extreme ultraviolet light source debris integrated filtration method.

[0056] Another objective of this invention is to provide an information data processing terminal for implementing the DPP-type extreme ultraviolet light source debris integrated filtration device.

[0057] Based on the above technical solutions and the technical problems solved, the advantages and positive effects of the technical solution to be protected by this invention are as follows:

[0058] First, this invention provides a device for filtering and mitigating debris generated by a DPP-type extreme ultraviolet (EUV) light source, aiming to reduce the damage to lithography system components and the impact on lithography efficiency caused by debris contamination from the DPP-type EUV light source. It includes: a debris introduction section, which introduces debris contaminants, including EUV light source debris and gas debris, through a flange interface or a leaking valve component; a vacuum differential section, which utilizes a vacuum chamber structure and the synergistic action of a dry pump and a molecular pump to achieve vacuum differential for separating small molecule particles; a gas purging section, which removes debris by using gas molecules to collide with and change the trajectory of the debris; and a foil trap filtration section, which uses a foil trap of a specific shape to adsorb debris for debris removal. The invention comprises several sections: an atomic hydrogen section, which utilizes highly reactive hydrogen atoms generated by an atomic hydrogen generator to chemically react with reactive contaminants and then remove them via a vacuum pump for debris removal; a delayed-field ion energy analyzer section, used to characterize ionic debris before and after debris removal, thereby evaluating the removal effect; and a quartz crystal microbalance section, which monitors the amount of debris deposition by monitoring changes in the resonant frequency of the quartz crystal, used to evaluate the debris removal effect. This invention employs multiple removal and monitoring mechanisms, enabling effective filtration and mitigation of different types and levels of debris contamination while simultaneously providing real-time online monitoring of the debris removal effect.

[0059] The device of the present application combines multiple cleaning mechanisms (vacuum differential, gas purging, foil trap filtering, atomic hydrogen reaction) and introduces high-precision monitoring systems (ion energy analyzer, quartz crystal microbalance), which can effectively filter and alleviate different types and sizes of debris pollution. At the same time, the real-time online monitoring system can adjust the working state of each cleaning mechanism in time according to the monitoring results, realize efficient and accurate debris removal, prolong the service life of the lithography system components, and improve the lithography efficiency.

[0060] 1. Efficient debris removal: The present application adopts multiple cleaning mechanisms, including vacuum differential, gas purging, foil trap filtering and atomic hydrogen chemical reaction, effectively solving the problem of debris pollution of different types and sizes. Through the cooperative work of multiple mechanisms, the accumulation of debris in the optical system is greatly reduced, and the overall efficiency of the lithography system is improved.

[0061] 2. Real-time monitoring and feedback: The removal process of debris is monitored in real time by the delayed field ion energy analyzer and the quartz crystal microbalance, ensuring that the removal effect of debris is always in the best state, and automatically optimizing the removal process through feedback mechanism to improve the intelligent level of the system.

[0062] 3. Prolong the service life of the equipment: By reducing the damage of debris to the components of the lithography system (such as mirrors, lenses, etc.), the present application effectively prolongs the service life of the optical equipment and reduces the maintenance frequency and cost.

[0063] 4. Maintain a clean environment: Using the combination of gas purging and vacuum differential, the device can maintain a high level of cleanliness in the optical system, ensuring that the beam quality will not decrease due to debris pollution during the lithography process, and ensuring the stable output of the extreme ultraviolet light source.

[0064] 5. Improve the precision and efficiency of lithography: After removing the debris pollution of the extreme ultraviolet light source, the lithography system can work more stably and efficiently, improving the precision and output rate of lithography, meeting the strict requirements in high-end chip manufacturing.

[0065] Technical problems solved:

[0066] Debris pollution problem of DPP type extreme ultraviolet light source: DPP type extreme ultraviolet light source will produce a large amount of debris during operation, which will cause damage to the optical components of the lithography system and reduce the working efficiency and precision of the lithography system. The present application solves the problem of debris pollution through multiple levels of debris removal mechanism.

[0067] Low efficiency of debris removal: In the prior art, debris removal mechanisms often target a certain type of debris and have low efficiency. The present invention combines vacuum differential, gas purging, foil trap filtering and other physical removal methods, as well as atomic hydrogen chemical reaction, to efficiently remove various types and sizes of debris, significantly improving the removal efficiency.

[0068] Insufficient monitoring of debris removal effect: Traditional debris removal systems lack effective monitoring means and cannot evaluate the removal effect in real time. The present invention introduces a delayed field ion energy analyzer and a quartz crystal microbalance to monitor the state before and after debris removal in real time, realizing online evaluation and feedback control of the removal effect.

[0069] Frequent system maintenance: Equipment damage caused by debris accumulation is the main reason for frequent maintenance of lithography systems. The present invention significantly reduces debris accumulation through efficient debris removal, thereby reducing the maintenance frequency of lithography systems and prolonging the service life of the equipment.

[0070] In summary, the present invention provides a device that can effectively solve the problem of DPP-type extreme ultraviolet light source debris contamination by combining multiple removal and monitoring mechanisms, improving the performance and stability of the lithography system, reducing equipment wear and tear, and enhancing the intelligence and automation level of the system.

[0071] Second, the technical solution of the present invention fills the technical gap in the industry at home and abroad:

[0072] The Advanced Microelectronic and Sensing Materials Project Group of Shanghai University is building the first and most advanced practical extreme ultraviolet photoresist material and process detection platform in China. The experimental device mainly consists of three parts: a DPP-type extreme ultraviolet light source, a debris contamination removal system, and a large-size multilayer film collection mirror optical system. The debris comprehensive filtering device involved in the present invention is part of the device. BRIEF DESCRIPTION OF DRAWINGS

[0073] Figure 1 is a structural block diagram of the DPP-type extreme ultraviolet light source debris comprehensive filtering device provided by the embodiments of the present invention.

[0074] Figure 2 is a flowchart of the DPP-type extreme ultraviolet light source debris comprehensive filtering method provided by the embodiments of the present invention.

[0075] Figure 3 is a diagram of the DPP-type extreme ultraviolet light source debris comprehensive filtering device provided by the embodiments of the present invention.

[0076] Figure 4 is a schematic diagram of the DPP-type extreme ultraviolet light source debris comprehensive filtering device provided by the embodiments of the present invention.

[0077] Figure 5 is a structural diagram of a DPP type extreme ultraviolet light source debris comprehensive filtering device provided by an embodiment of the present application.

[0078] Figure 6 is a perspective view of a DPP type extreme ultraviolet light source debris comprehensive filtering device provided by an embodiment of the present application.

[0079] Figure 1 In the figure: 1, debris introduction part; 2, vacuum differential part; 3, gas purging part; 4, foil trap filtering part; 5, atomic hydrogen part; 6, delayed field ion energy analyzer part; 7, quartz crystal microbalance part; 8, control and monitoring system; 9, light source cavity; 10, test cavity connecting flange; 11, molecular pump inlet cavity; 12, molecular pump; 13, electromagnetic angle valve; 14, backing pump; 15, molecular pump controller; 16, vacuum gauge; 17, MFC; 18, fixed flange; 19, diffusion cavity; 20, collection hole; 21, power supply. DETAILED DESCRIPTION

[0080] In order to make the purpose, technical scheme and advantages of the present application more clear, the present application will be further described in detail below with examples. It should be understood that the specific examples described herein are only used to explain the present application, and are not used to limit the present application.

[0081] As shown in the figure, the DPP type extreme ultraviolet light source debris comprehensive filtering device provided by an embodiment of the present application comprises: Figure 1 The debris introduction part 1, the vacuum differential part 2, the gas purging part 3, the foil trap filtering part 4, the atomic hydrogen part 5, the delayed field ion energy analyzer part 6, the quartz crystal microbalance part 7, and the control and monitoring system 8 are connected.

[0082] The debris introduction part 1 is connected with the control and monitoring system 8, and is used as a front-end module of the device for introducing debris and accompanying gas debris generated by the extreme ultraviolet light source into the system; this part can guide the pollutants into the system through a flange interface or a leak valve component;

[0083] The vacuum differential part 2 is connected with the control and monitoring system 8, and is used to form a multi-stage vacuum chamber by cooperating the dry pump with the molecular pump 12, and separate small molecular particulate matters by using vacuum gradient;

[0084] The gas purging part 3 is connected with the control and monitoring system 8, and is used to change the motion trajectory of the debris particles by using high-speed airflow to impact the debris particles, and drive them away from the surface of the light source assembly;

[0085] The foil trap filtering part 4 is connected with the control and monitoring system 8, and is used to be composed of a foil trap with a specific shape, capture debris by physical adsorption and inertial collision, and effectively remove larger particulate pollutants;

[0086] ​

[0087] Atomic hydrogen part 5, connected with control and monitoring system 8, is used to generate high-activity hydrogen atoms by atomic hydrogen generator, and the hydrogen atoms chemically react with reactive contaminants in debris to convert them into easily removable gas;

[0088] Delay field ion energy analyzer part 6, connected with control and monitoring system 8, is used to perform energy analysis on ion-type debris in debris before and after removal, so as to evaluate the effect of debris removal;

[0089] Quartz crystal microbalance part 7, connected with control and monitoring system 8, is used to monitor the deposition amount of debris in real time by monitoring the change of resonance frequency of quartz crystal, so as to evaluate the effect of debris removal;

[0090] Control and monitoring system 8, connected with debris introduction part 1, vacuum differential part 2, gas purge part 3, foil trap filter part 4, atomic hydrogen part 5, delay field ion energy analyzer part 6, quartz crystal microbalance part 7, is used to monitor and adjust the running state of each module through the central control system, and realize closed-loop control through sensor data acquisition.

[0091] The debris introduction part provided by the embodiment of the application comprises:

[0092] Flange interface: high sealing material is adopted to ensure that the contaminants do not leak to other environments; the flange is designed to be high-temperature-resistant and corrosion-resistant;

[0093] Leak valve component: the introduction valve can control the introduction amount and speed of debris to prevent system overload.

[0094] The vacuum differential part provided by the embodiment of the application comprises:

[0095] Coordinated control of dry pump and molecular pump 12: the working frequency and pressure of the two are adjusted by an intelligent control system;

[0096] Multi-stage vacuum cavity structure: designed as a multi-stage vacuum differential structure, gradually reducing the vacuum degree of the cavity from high vacuum to ultra-high vacuum.

[0097] The gas purge part provided by the embodiment of the application comprises:

[0098] Gas selection: inert gas is selected to avoid reaction between the gas and the debris or light source assembly;

[0099] Gas flow rate control: through multi-point purge design, combined with a gas flow rate control module, it is ensured that the debris at different positions can be effectively impacted by the gas flow; the path of the purge gas flow is optimized through numerical simulation;

[0100] Gas distributor design: a multi-hole designed distributor is adopted to ensure that the gas flow uniformly covers the target area.

[0101] The foil trap filtering part provided by the embodiment of the present application comprises:

[0102] Foil trap shape design: designed as a multi-layer structure, increasing the area of debris capture, and optimizing the geometry of the foil trap by simulating the motion trajectory of the gas flow and debris;

[0103] Material selection: using metal materials with high heat resistance and low reactivity to manufacture the foil trap;

[0104] Automatic cleaning mechanism: design the automatic cleaning function of the foil trap, and remove the adsorbed debris by periodic gas backflushing or vibration.

[0105] The atomic hydrogen part provided by the embodiment of the present application comprises:

[0106] Atomic hydrogen generator: selecting a high-efficiency plasma generator to generate high-density hydrogen atoms;

[0107] Reaction chamber design: the area where the atomic hydrogen and debris are in full contact is designed as a multi-reaction chamber structure;

[0108] Safety protection: adding a monitoring module to detect the concentration of atomic hydrogen and reaction products in real time;

[0109] The delayed field ion energy analyzer part comprises:

[0110] High-precision energy analyzer: using a high-sensitivity ion energy analyzer to ensure that small energy changes can be accurately detected;

[0111] Data feedback system: linked with the control system, and adjusts the working state of the cleaning component in real time according to the energy analysis results;

[0112] The quartz crystal microbalance part comprises:

[0113] High-precision sensor: using a high-sensitivity quartz crystal microbalance sensor that can detect extremely small amounts of debris deposition;

[0114] Automatic calibration system: adding an automatic calibration mechanism in the sensor;

[0115] Multi-point monitoring layout: arranging multiple microbalance sensors at different positions inside the device;

[0116] The control and monitoring system comprises:

[0117] Intelligent control algorithm: designing an adaptive control algorithm to automatically adjust the working mode of the debris removal device according to the debris monitoring data, air flow conditions and vacuum differential conditions;

[0118] Real-time data display: providing a real-time data visualization interface, and the operator can view the debris removal effect, device running state and monitoring results through the display screen.

[0119] As Figure 2 shown, the DPP type extreme ultraviolet light source debris comprehensive filtering method provided by the embodiment of the application comprises:

[0120] S101, introducing the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system through a debris introduction part; this part can introduce the pollutants through a flange interface or a leak valve component; a multi-stage vacuum chamber is formed by cooperating a dry pump with a molecular pump 12 through a vacuum differential part, and small molecular particulate matters are separated by using a vacuum gradient;

[0121] S102, changing the motion trajectory of the debris particles by using high-speed airflow to impact the debris particles through a gas purging part, and driving the debris particles away from the surface of the light source assembly; the foil trap filtering part is composed of a foil trap with a specific shape, and the debris is captured by physical adsorption and inertial collision, and the larger particulate pollutants are effectively removed;

[0122] S103, generating highly active hydrogen atoms by using an atomic hydrogen generator through an atomic hydrogen part, and the hydrogen atoms chemically react with reactive pollutants in the debris to convert them into easily removable gas;

[0123] S104, performing energy analysis on the ion type debris in the debris before and after removal through a delayed field ion energy analyzer part, so as to evaluate the debris removal effect;

[0124] S105, monitoring the deposition amount of the debris in real time by using the change of the resonance frequency of the quartz crystal through a quartz crystal microbalance part, so as to evaluate the effect of debris removal;

[0125] S106, monitoring and adjusting the running state of each module by using a central control system through a control and monitoring system, and realizing closed-loop control by collecting data through a sensor, so as to optimize the debris removal effect.

[0126] Another object of the application is to provide a computer device comprising a memory and a processor, wherein the memory stores a computer program, and the computer program is executed by the processor to make the processor execute the steps of the DPP type extreme ultraviolet light source debris comprehensive filtering method.

[0127] Another object of the application is to provide a computer readable storage medium storing a computer program, and the computer program is executed by a processor to make the processor execute the steps of the DPP type extreme ultraviolet light source debris comprehensive filtering method.

[0128] Another object of the application is to provide an information data processing terminal for realizing the DPP type extreme ultraviolet light source debris comprehensive filtering device.

[0129] The present application specifically implements:

[0130] As Figure 3 shown, the present application provides a device capable of filtering and mitigating the debris generated by the DPP type extreme ultraviolet light source, aiming to reduce the damage of the debris pollution accompanying the DPP type extreme ultraviolet light source to the components of the lithography system and the impact on the lithography efficiency. It includes: a debris introduction part, which introduces debris pollutants including extreme ultraviolet light source debris and gas debris through a flange interface or a leak valve component; a vacuum differential part, which realizes vacuum differential by the synergistic effect of a vacuum cavity structure and a dry pump and a molecular pump 12, for separating small molecular particulate matter; a gas purging part, which uses gas molecules to impact debris and change its trajectory for debris removal; a foil trap filtering part, which uses a foil trap of a specific shape to adsorb debris for debris removal; an atomic hydrogen part, which uses highly active hydrogen atoms generated by an atomic hydrogen generator to chemically react with reactive pollutants and be pumped away by a vacuum pump for debris removal; a delayed field ion energy analyzer part for characterizing ion-type debris before and after debris removal, and then evaluating the removal effect of ion-type debris; and a quartz crystal microbalance part for monitoring the amount of debris deposition by monitoring the change in the resonance frequency of the quartz crystal, for evaluating the debris removal effect. The present application adopts multiple removal mechanisms and multiple monitoring mechanisms, which can effectively filter and mitigate different types and degrees of debris pollution while monitoring the debris removal effect in real time.

[0131] In order to further refine the technical solutions of the present application, the functions of each module are described in detail and optimized, so as to ensure that the device can efficiently filter and mitigate the debris pollution generated by the DPP type extreme ultraviolet light source. The scheme is as follows:

[0132] 1. Debris introduction part

[0133] Function description: The debris introduction part is the front-end module of the device, responsible for introducing the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system. This part can guide the pollutants into the system through a flange interface or a leak valve component.

[0134] Optimization design:

[0135] Flange interface: high sealing material is used to ensure that the pollutants do not leak into other environments. The flange is designed to be resistant to high temperature and corrosion, ensuring durability during long-term operation.

[0136] Leak valve component: the introduction valve can control the amount and speed of debris introduction to prevent system overload. The valve material should be selected to avoid reaction with the debris.

[0137] 2. Vacuum differential part

[0138] Function Description: By coordinating with the dry pump and molecular pump 12, a multi-stage vacuum chamber is formed, utilizing the vacuum gradient to separate small molecular particulate matter. The vacuum differential function is to separate most of the tiny debris from the system, reducing the spread of contaminants in the lithography system.

[0139] Optimized Design:

[0140] Coordinated Control of Dry Pump and Molecular Pump 12: Utilize intelligent control system to adjust the working frequency and pressure of both, ensuring that debris of different particle sizes can be effectively separated.

[0141] Multi-stage Vacuum Chamber Structure: Designed as a multi-stage vacuum differential structure, gradually reducing the vacuum degree of the chamber from high vacuum to ultra-high vacuum, ensuring efficient removal of debris particles of different sizes.

[0142] 3. Gas Purging Section

[0143] Function Description: This module uses high-speed gas flow to impact debris particles, changing their motion trajectory and driving them away from the surface of the light source assembly.

[0144] Optimized Design:

[0145] Gas Selection: Select inert gases (such as nitrogen or argon) to avoid reactions between the gas and debris or light source assembly.

[0146] Gas Flow Rate Control: Through multi-point purging design, combined with gas flow rate control module, ensure that debris at different positions can be effectively impacted by gas flow. Numerical simulation can be used to optimize the path of purging gas flow.

[0147] Gas Distributor Design: Use a multi-hole designed distributor to ensure uniform gas flow coverage of the target area, avoiding local pressure increase or removal efficiency decrease caused by concentrated gas flow.

[0148] 4. Foil Trap Filtering Section

[0149] Function Description: This component is composed of foil traps with specific shapes, capable of capturing debris through physical adsorption and inertial collision, effectively removing larger particle contaminants.

[0150] Optimized Design:

[0151] Foil Trap Shape Design: Designed as a multi-layer structure to increase the area of debris capture, and the geometry of the foil trap is optimized by simulating gas flow and debris motion trajectory.

[0152] Material Selection: Use metal materials with high heat resistance and low reactivity (such as titanium, nickel alloy) to manufacture the foil trap, ensuring stability and adsorption effect in the extreme ultraviolet light source high temperature environment.

[0153] Automatic Cleaning Mechanism: Design an automatic cleaning function for the foil trap, which periodically blows back gas or vibrates to remove adsorbed debris, extending the service life of the foil trap.

[0154] 5. Atomic Hydrogen Section

[0155] Function Description: The atomic hydrogen section generates highly active hydrogen atoms through an atomic hydrogen generator. These hydrogen atoms chemically react with reactive contaminants in the debris (such as organic matter, hydrocarbons), converting them into easily removable gas.

[0156] Optimization Design:

[0157] Atomic Hydrogen Generator: Choose a high-efficiency plasma generator to generate high-density hydrogen atoms to improve the reaction rate of removing contaminants.

[0158] Reaction Chamber Design: Design the area where atomic hydrogen and debris are in full contact as a multi-reaction chamber structure, extending the reaction time of hydrogen atoms and contaminants, and improving the efficiency of chemical reactions.

[0159] Safety Protection: Add a monitoring module to detect the concentration of atomic hydrogen and reaction products in real time, ensuring the safety of the device.

[0160] 6. Delayed Field Ion Energy Analyzer Section

[0161] Function Description: Energy analysis of ion-type debris in the debris before and after removal to evaluate the effectiveness of debris removal. This part can monitor the removal efficiency in real time and provide feedback for adjusting the removal mechanism.

[0162] Optimization Design:

[0163] High-precision energy analyzer: Use a high-sensitivity ion energy analyzer to ensure accurate detection of small energy changes and provide accurate ion-type debris information.

[0164] Data Feedback System: Link with the control system to adjust the working state of the removal component in real time according to the energy analysis results, improving the removal efficiency.

[0165] 7. Quartz Crystal Microbalance Section

[0166] Function Description: Monitor the deposition amount of debris in real time by monitoring the change in resonance frequency of the quartz crystal, which is used to evaluate the effectiveness of debris removal.

[0167] Optimization Design:

[0168] High-precision sensor: Use a high-sensitivity quartz crystal microbalance sensor to detect very small amounts of debris deposition, ensuring the accuracy of the monitoring data.

[0169] Automatic calibration system: Add an automatic calibration mechanism in the sensor to ensure that the measurement accuracy is not affected by the external environment during long-term operation.

[0170] Multi-point monitoring layout: Arrange multiple micro-balance sensors at different positions inside the device to achieve all-around debris deposition monitoring.

[0171] 8. Control and monitoring system

[0172] Function description: Monitor and adjust the running state of each module through the central control system, and realize closed-loop control through sensor data collection to optimize debris removal effect.

[0173] Optimization design:

[0174] Intelligent control algorithm: Design an adaptive control algorithm to automatically adjust the working mode of the debris removal device according to debris monitoring data, airflow conditions, and vacuum differential conditions, to improve the removal efficiency.

[0175] Real-time data display: Provide real-time data visualization interface, so that operators can view debris removal effect, equipment running state and monitoring results through the display screen, and adjust in time.

[0176] Comprehensive optimization:

[0177] The device of the present application combines multiple removal mechanisms (vacuum differential, gas purging, foil trap filtering, atomic hydrogen reaction) and introduces high-precision monitoring systems (ion energy analyzer, quartz crystal microbalance), which can effectively filter and alleviate debris pollution of different types and particle sizes. At the same time, the real-time online monitoring system can adjust the working state of each removal mechanism in time according to the monitoring results, realize efficient and accurate debris removal, prolong the service life of the lithography system components, and improve the lithography efficiency.

[0178] Detailed working principle

[0179] The device provided by the present application integrates multiple modules, adopts multiple removal mechanisms and monitoring technologies, and effectively filters and alleviates the debris generated by DPP (discharge produced plasma) type extreme ultraviolet light source (EUV). The detailed working principle is as follows:

[0180] 1. Debris introduction part

[0181] Working principle: The debris (including solid debris and gas debris) generated by the DPP type extreme ultraviolet light source is introduced into the system through the flange interface or the leak valve part. The flange interface ensures that the pollutants do not leak through the sealing device, and the leak valve part is responsible for controlling the amount of debris entering.

[0182] Technical effect: Through efficient introduction method, ensure that the pollutants can be introduced into the subsequent cleaning and processing unit, prevent debris from entering the key area of the lithography equipment.

[0183] 2. Vacuum differential section

[0184] Working principle: This part forms a multi-stage vacuum environment through dry pumps and molecular pumps 12, so that debris is gradually separated in different vacuum chambers. Small molecular debris and gas particles are filtered or excluded by pressure difference.

[0185] Technical effect: Through accurate vacuum grading, it can effectively separate and remove extremely small particles, reduce the impact of debris pollution on the system, and improve the precision of the lithography system.

[0186] 3. Gas purge section

[0187] Working principle: Use gas (such as nitrogen or argon) to blow the debris generated by the extreme ultraviolet light source from multiple directions at high pressure. The gas flow impacts the debris particles, changing their motion trajectory and carrying the debris away from the surface of the key components of the lithography system.

[0188] Technical effect: Through directional gas blowing, effectively reduce the accumulation of debris, and avoid the shielding of debris to the optical components, thereby improving the efficiency and quality of lithography.

[0189] 4. Foil trap filtering section

[0190] Working principle: Use a foil trap with a specific shape to capture and remove larger debris particles through inertial collision, physical adsorption and other mechanisms. Through the multi-layer structure and shape optimization of the foil trap, debris is adsorbed on the foil trap to prevent it from entering the optical system.

[0191] Technical effect: It has good filtering effect on large particle debris, significantly reduces the pollution of the optical system, prolongs the service life of the optical equipment, and maintains the cleanliness of the optical components.

[0192] 5. Atomic hydrogen section

[0193] Working principle: The atomic hydrogen generator generates highly active hydrogen atoms, which react with reactive substances (such as hydrocarbons) in the debris to decompose them into volatile gases, which are then pumped out of the system by the vacuum pump.

[0194] Technical effect: Efficiently remove organic pollutants and chemical debris that are difficult to remove physically, reduce the accumulation of debris inside the system, and ensure the stability and efficiency of the lithography system during long-term operation.

[0195] 6. Delayed field ion energy analyzer section

[0196] Working principle: The ion energy analyzer is used to characterize the ion contaminants in the debris before and after cleaning, and analyze their energy distribution. According to the detected energy change of the debris, the cleaning effect is evaluated, and the cleaning process is optimized through feedback data.

[0197] Technical effect: Real-time feedback of debris cleaning effect ensures that ion contaminants can be effectively removed, ensuring system cleanliness and operational reliability.

[0198] 7. Quartz crystal microbalance unit

[0199] Working principle: The deposition amount of debris is monitored by the change of the resonance frequency of the quartz crystal. The frequency change of the quartz crystal reflects the quality of the debris deposition, so as to evaluate the cleaning effect of the debris in real time.

[0200] Technical effect: It can accurately monitor the deposition of debris and dynamically adjust the cleaning process to improve the controllability of the cleaning effect.

[0201] 8. Control and monitoring system

[0202] Working principle: The central control system integrates multiple cleaning components and monitoring sensors to automatically adjust the working state of each component, realizing closed-loop control of the cleaning process. According to the real-time monitoring data, the control system dynamically optimizes the operation parameters such as vacuum differential and gas purge.

[0203] Technical effect: Through intelligent control, it can flexibly deal with different types and quantities of debris pollution, ensuring that the system always maintains the best cleaning effect.

[0204] Specific application fields or related products of the present application:

[0205] Discharge plasma type (DPP) extreme ultraviolet photoresist detection device / DPP type extreme ultraviolet lithography system

[0206] It should be noted that embodiments of the present application can be realized by hardware, software, or a combination of software and hardware. The hardware portion can be realized by a special logic; the software portion can be stored in a memory and executed by a proper instruction execution system, such as a microprocessor or a specially designed hardware. A person of ordinary skill in the art can understand that the above-mentioned apparatus and method can be realized by computer executable instructions and / or included in processor control codes, such as a carrier medium, such as a magnetic disk, CD or DVD-ROM, a programmable memory, such as a read-only memory (firmware), or a data carrier, such as an optical or electronic signal carrier. The apparatus of the present application and its modules can be realized by a hardware circuit, such as a very large scale integrated circuit or a gate array, a semiconductor, such as a logic chip, a transistor, or a programmable hardware device, such as a field programmable gate array, a programmable logic device, or the like, by software executed by various types of processors, or by a combination of the above-mentioned hardware circuit and software, such as firmware.

[0207] The above description is merely a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any modification, equivalent replacement, and improvement within the technical range disclosed by the present application, and within the spirit and principle of the present application, should be included in the protection scope of the present application.

Claims

1. A DPP-type extreme ultraviolet light source debris filtration device, characterized in that, The DPP type extreme ultraviolet light source debris integrated filtration device includes: Debris introduction section, vacuum differential section, gas purging section, foil trap filtration section, atomic hydrogen section, delayed field ion energy analyzer section, quartz crystal microbalance section, control and monitoring system; The debris introduction section, connected to the control and monitoring system, is the front-end module of the device. It is responsible for introducing debris and accompanying gaseous debris generated by the extreme ultraviolet light source into the system. This part can introduce contaminants through a flange interface or a leak valve component. The vacuum differential section, connected to the control and monitoring system, is used to form a multi-stage vacuum chamber through the cooperation of a dry pump and a molecular pump, and to separate small molecule particles using the vacuum gradient. The gas purging unit, connected to the control and monitoring system, is used to use high-speed airflow to impact debris particles, change the trajectory of the debris, and drive them away from the surface of the light source assembly. The foil trap filter section, connected to the control and monitoring system, is used to capture debris through physical adsorption and inertial impaction, and effectively remove larger particulate contaminants. The atomic hydrogen section, connected to the control and monitoring system, is used to generate highly reactive hydrogen atoms via an atomic hydrogen generator. These hydrogen atoms chemically react with reactive contaminants in the debris, converting them into easily removable gases. The delayed field ion energy analyzer unit, connected to the control and monitoring system, is used to perform energy analysis on ionic debris before and after debris removal in order to evaluate the debris removal effect; The quartz crystal microbalance unit, connected to the control and monitoring system, is used to monitor the amount of debris deposited in real time by monitoring the change in the resonant frequency of the quartz crystal, and to evaluate the effectiveness of debris removal. The control and monitoring system is connected to the debris introduction unit, vacuum differential unit, gas purging unit, foil trap filtration unit, atomic hydrogen unit, delayed field ion energy analyzer unit, and quartz crystal microbalance unit. It is used to monitor and adjust the operating status of each module through the central control system and to realize closed-loop control by collecting data through sensors.

2. The DPP type extreme ultraviolet light source debris integrated filtration device as described in claim 1, characterized in that, The debris introduction section includes: Flange interface: Made of high-sealing material to ensure that contaminants do not leak into other environments; designed with high temperature and corrosion resistance; Leakage valve component: The inlet valve can control the amount and speed of debris introduction to prevent system overload.

3. The DPP type extreme ultraviolet light source debris integrated filtration device as described in claim 1, characterized in that, The vacuum differential section includes: Synergistic control of dry pumps and molecular pumps: Utilizing an intelligent control system to adjust the operating frequency and pressure of both. Multi-stage vacuum chamber structure: Designed as a multi-stage vacuum differential structure, the vacuum level of the chamber is gradually reduced from high vacuum to ultra-high vacuum.

4. The DPP type extreme ultraviolet light source debris integrated filtration device as described in claim 1, characterized in that, The gas purging unit includes: Inert gas is selected to avoid reaction between the gas and debris or light source components; By employing a multi-point purging design and combining it with a gas flow rate control module, we ensure that debris at different locations is effectively impacted by airflow; and we optimize the purging airflow path through numerical simulation. The distributor, with its multi-hole design, ensures that airflow evenly covers the target area.

5. The DPP type extreme ultraviolet light source debris integrated filtration device as described in claim 1, characterized in that, The foil trap filter section includes: The foil trap has a multi-layered structure, which increases the area for debris capture; An automatic cleaning mechanism removes adsorbed debris through periodic gas backflushing or vibration.

6. The DPP type extreme ultraviolet light source debris integrated filtration device as described in claim 1, characterized in that, The atomic hydrogen portion includes: Atomic hydrogen generator: A highly efficient plasma generator is selected to produce a high density of hydrogen atoms; Reaction chamber design: The area where atomic hydrogen and debris are in full contact is designed as a multi-reaction chamber structure; Safety protection: A monitoring module has been added to detect the concentration of atomic hydrogen and reaction products in real time; The delayed field ion energy analyzer section includes: High-precision energy analyzer: Employs a highly sensitive ion energy analyzer to ensure accurate detection of minute energy changes; Data feedback system: In conjunction with the control system, it adjusts the working status of the cleaning components in real time based on energy analysis results; The quartz crystal microbalance section includes: High-precision sensor: Employs a high-sensitivity quartz crystal microbalance sensor, capable of detecting extremely small amounts of debris deposits; Automatic calibration system: Incorporating an automatic calibration mechanism into the sensor; Multi-point monitoring layout: Multiple microbalance sensors are arranged in different locations inside the device; The control and monitoring system includes: Intelligent control algorithm: Design an adaptive control algorithm to automatically adjust the working mode of the debris removal device based on debris monitoring data, airflow conditions and vacuum differential conditions; Real-time data display: Provides a real-time data visualization interface, allowing operators to view the debris removal effect, equipment operating status, and monitoring results on the display screen.

7. A method for filtering debris from a DPP-type extreme ultraviolet light source using a DPP-type extreme ultraviolet light source integrated filtration device as described in any one of claims 1-6, characterized in that, The DPP-type extreme ultraviolet light source debris comprehensive filtration method includes: Step 1: The debris generated by the extreme ultraviolet light source and the accompanying gaseous debris are introduced into the system through the debris introduction section; this part can introduce contaminants through the flange interface or the leak valve component; through the vacuum differential section, a multi-stage vacuum chamber is formed by the cooperation of the dry pump and the molecular pump, and the small molecule particles are separated by the vacuum gradient. Step 2: The gas purging section uses high-speed airflow to impact the debris particles, changing their trajectory and driving them away from the surface of the light source component; the foil trap filter section, composed of foil traps of a specific shape, captures debris through physical adsorption and inertial collision, and effectively removes larger particles of contaminants. Step 3: Highly reactive hydrogen atoms are generated by using an atomic hydrogen generator in the atomic hydrogen section. These hydrogen atoms react chemically with reactive pollutants in the debris, converting them into easily removable gases. Step 4: The energy of ionic debris in the debris before and after removal is analyzed by a delayed field ion energy analyzer to evaluate the debris removal effect. Step 5: By using the quartz crystal microbalance section to monitor the change in the resonant frequency of the quartz crystal, the amount of debris deposited is monitored in real time to evaluate the effect of debris removal. Step 6: The central control system monitors and adjusts the operating status of each module through the control and monitoring system, and realizes closed-loop control by collecting data through sensors to optimize the debris removal effect.

8. A computer device, characterized in that, The computer device includes a memory and a processor. The memory stores a computer program, which, when executed by the processor, causes the processor to perform the steps of the DPP-type extreme ultraviolet light source debris filtration method as described in claim 7.

9. A computer-readable storage medium storing a computer program, which, when executed by a processor, causes the processor to perform the steps of the DPP-type extreme ultraviolet light source debris integrated filtration method as described in claim 7.

10. An information data processing terminal, characterized in that, The information data processing terminal is used to implement the DPP type extreme ultraviolet light source debris integrated filtration device as described in any one of claims 1-6.

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