A system and method for regulating plasma radiation from a fusion device

Abstract

The application discloses a kind of fusion device plasma radiation adjusting system and method, it is related to the technical field of controlled nuclear fusion device heat load protection and radiation control, by measuring the plasma radiation distribution signal, according to different control needs, utilize the flow and distribution control of particle to ultrasonic molecular beam system, to control plasma radiation, realize the radiation control of different range and degree.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of the heat load protection and radiation control of the controlled nuclear fusion device, and particularly relates to a fusion device plasma radiation adjusting system and method. BACKGROUND

[0002] In the controlled nuclear fusion research, the plasma radiation is an important energy loss channel. Especially in the high parameter discharge case, various instabilities of the plasma may discharge a large amount of particles and heat outside, such as the edge localized mode in the high confinement mode, the transient high heat discharge caused by various magnetic fluid instabilities and the conventional high heat flow of the divertor in the high parameter steady-state discharge. In order to reduce the influence of these high heat loads on the plasma-facing materials of the device, the active dissipation of energy through radiation is a common way. Therefore, the control of the plasma radiation is an important control technology.

[0003] Therefore, the present application measures the plasma radiation distribution signal, controls the flow and distribution of particles by using the supersonic molecular beam system according to different control requirements, so as to control the plasma radiation. SUMMARY

[0004] The purpose of the present application is to provide a fusion device plasma radiation adjusting system and method, which can identify the radiation level and the radiation intensity control requirement, so as to adjust the supersonic molecular beam injection valve structure, realize the injection of particles with different amounts and distributions, and realize the radiation control in different ranges and degrees.

[0005] The present application is realized by the following technical scheme:

[0006] In a first aspect, the present application provides a fusion device plasma radiation adjusting system, which comprises a radiation array measurement unit, a storage unit, a central processing unit and an execution mechanism.

[0007] The radiation array measurement unit is used for measuring the radiation signal image corresponding to the plasma of the fusion device, and transmitting the measured radiation signal image to the storage unit.

[0008] The storage unit is used for receiving the radiation signal image transmitted by the radiation array measurement unit, storing the radiation signal image, and providing data support for the central processing unit after storage.

[0009] The central processing unit is used for acquiring the radiation signal image in the storage unit, determining the feedback control parameter according to the preset target radiation distribution and the radiation signal image, and finally transmitting the feedback control parameter to the execution mechanism.

[0010] The execution mechanism is configured to receive the feedback control parameter and adjust the fusion device according to the feedback control parameter to adjust the radiation distribution corresponding to the plasma.

[0011] In a possible implementation, the central processing unit comprises a signal processing subunit, an execution mechanism parameter calculation subunit, and an execution mechanism control signal output subunit.

[0012] The signal processing subunit is configured to acquire the radiation signal image in the storage unit, acquire a difference between the preset target radiation distribution and the radiation signal image, trigger a feedback control task when the difference is greater than zero, and schedule the execution mechanism parameter calculation subunit and the execution mechanism control signal output subunit to execute the feedback control task.

[0013] The execution mechanism parameter calculation subunit is configured to acquire a distribution parameter of gas injected by the execution mechanism according to the difference between the preset target radiation distribution and the radiation signal image, and determine the feedback control parameter according to the distribution parameter of the gas injected by the execution mechanism.

[0014] The execution mechanism control signal output subunit is configured to output the feedback control parameter output by the execution mechanism parameter calculation subunit to the execution mechanism.

[0015] In a possible implementation, acquiring the difference between the preset target radiation distribution and the radiation signal image comprises: acquiring a strong-field side radiation difference and / or a weak-field side radiation difference between the preset target radiation distribution and the radiation signal image.

[0016] The feedback control parameter comprises a strong-field feedback control parameter acquired according to the strong-field side radiation difference and / or a weak-field feedback control parameter acquired according to the weak-field side radiation difference.

[0017] In a possible implementation, the execution mechanism comprises a controller, a strong-field radiation adjustment assembly, and a weak-field radiation adjustment assembly.

[0018] The controller is configured to control the strong-field radiation adjustment assembly and / or the weak-field radiation adjustment assembly to act according to the strong-field feedback control parameter and / or the weak-field feedback control parameter.

[0019] The strong-field radiation adjustment assembly is configured to adjust the strong-field radiation in response to the control of the controller.

[0020] The weak-field radiation adjustment assembly is configured to adjust the weak-field radiation in response to the control of the controller.

[0021] In a possible implementation, the strong-field radiation adjustment assembly and the weak-field radiation adjustment assembly have the same structure and both adjust the radiation through a pressure control valve, a plurality of air pumps, a sliding rail, and a rotating shutter.

[0022] In a second aspect, the present application provides a method for adjusting the radiation of a fusion device plasma, comprising:

[0023] measuring a radiation signal image corresponding to the plasma of the fusion device, and storing the radiation signal image;

[0024] determining a feedback control parameter according to a preset target radiation distribution and the stored radiation signal image;

[0025] adjusting the fusion device according to the feedback control parameter to adjust the radiation distribution corresponding to the plasma.

[0026] In a possible implementation, the determining of the feedback control parameter according to the preset target radiation distribution and the stored radiation signal image comprises:

[0027] obtaining a strong-field-side radiation difference value and / or a weak-field-side radiation difference value between the preset target radiation distribution and the radiation signal image;

[0028] determining a first distribution parameter of the gas injection of the actuator according to the strong-field-side radiation difference value and / or a second distribution parameter of the gas injection of the actuator according to the weak-field-side radiation difference value; wherein the first distribution parameter comprises a first beam divergence angle and a first effective distance; and the second distribution parameter comprises a second beam divergence angle and a second effective distance;

[0029] obtaining a strong-field feedback control parameter according to the first distribution parameter and / or a weak-field feedback control parameter according to the second distribution parameter.

[0030] In a possible implementation, the obtaining of the strong-field-side radiation difference value and / or the weak-field-side radiation difference value between the preset target radiation distribution and the radiation signal image comprises:

[0031] subtracting a strong-field-side radiation value of the radiation signal image from a strong-field-side radiation value of the preset target radiation distribution to obtain the strong-field-side radiation difference value;

[0032] and / or subtracting a weak-field-side radiation value of the radiation signal image from a weak-field-side radiation value of the preset target radiation distribution to obtain the weak-field-side radiation difference value.

[0033] In a possible implementation, the obtaining of the strong-field feedback control parameter according to the first distribution parameter comprises:

[0034] A1, constructing a first multi-element indefinite equation according to the first distribution parameter as:

[0035]

[0036] α = 0.013 × d 0.14 L -0.82 p00.2 p b -0.08

[0037] wherein, a represents the first beam divergence angle, X M represents the first effective distance, p0 represents the first gas source end pressure on the strong field side, p b represents the first background pressure on the strong field side, d represents the first injector aperture on the strong field side, and L represents the first expansion section length on the strong field side;

[0038] A2, the first current injector aperture corresponding to the strong field side and the first current expansion section length are obtained, the first current injector aperture is taken as the first to be adjusted injector aperture d1, the first current expansion section length is taken as the first to be adjusted expansion section length L1, the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 are input into the first multi-unknown equation, the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 are obtained;

[0039] A3, whether the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 exist the over-limit situation is judged, if yes, the over-limit is avoided as the target, the existing first to be adjusted injector aperture d1 is taken as the basis, the preset data interval is adjusted once, the first to be adjusted injector aperture d1 is reacquired, the existing first to be adjusted expansion section length L1 is kept unchanged, the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 are input into the first multi-unknown equation, the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 are reacquired, and step A4 is entered; otherwise, the first to be adjusted injector aperture d1, the first to be adjusted expansion section length L1, the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 are taken as the strong field feedback control parameters together;

[0040] A4, whether the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 exist the over-limit situation is judged, if yes, the over-limit is avoided as the target, the existing first to be adjusted expansion section length L1 is taken as the basis, the preset data interval is adjusted once, the first to be adjusted expansion section length L1 is reacquired, the existing first to be adjusted injector aperture d1 is kept unchanged, the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 are input into the first multi-unknown equation, the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure pb1 , return to step A3; otherwise, the first to be adjusted injector aperture d1, the first to be adjusted expansion section length L1, the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 are collectively taken as the strong field feedback control parameters.

[0041] In a possible implementation, the weak field feedback control parameters are acquired according to the second distribution parameters, including:

[0042] B1, according to the second distribution parameters, a second multi-unknown equation is constructed as:

[0043]

[0044] α' = 0.013 * (d') 0.14 (L') -0.82 (p0') 0.2 (p b ') -0.08

[0045] wherein α' represents the second beam current divergence angle, X M ' represents the first effective distance, p0' represents the second gas source end pressure on the weak field side, p b ' represents the second background pressure on the weak field side, d' represents the second injector aperture on the weak field side, and L' represents the second expansion section length on the weak field side.

[0046] B2, the second current injector aperture and the second current expansion section length corresponding to the weak field side are acquired, the second current injector aperture is taken as the second to be adjusted injector aperture d1', the second current expansion section length is taken as the second to be adjusted expansion section length L1', and the second to be adjusted injector aperture d1' and the second to be adjusted expansion section length L1' are input into the second multi-unknown equation, to acquire the second to be adjusted gas source end pressure p 01 ' and the second to be adjusted background pressure p b1 ';

[0047] B3, whether the second to be adjusted gas source end pressure p 01 ' and the second to be adjusted background pressure p b1 ' exist the over-limit condition is judged, if yes, the existing second to be adjusted injector aperture d1' is taken as the basis, and the second to be adjusted injector aperture d1' is re-acquired according to the preset data interval adjustment, the second to be adjusted expansion section length L1' is kept unchanged, the second to be adjusted injector aperture d1' and the second to be adjusted expansion section length L1' are input into the second multi-unknown equation, to re-acquire the second to be adjusted gas source end pressure p 01 ' and the second to be adjusted background pressure p b1Enter step B4; otherwise, adjust the second to be adjusted injector aperture d1', the second to be adjusted expansion section length L1', the second to be adjusted gas source end pressure p 01 ' and the second to be adjusted background pressure p b1 ' as the weak field feedback control parameters;

[0048] B4, judge whether the second to be adjusted gas source end pressure p 01 ' and the second to be adjusted background pressure p b1 ' are out of limits, if yes, avoid out of limits, based on the existing second to be adjusted expansion section length L1', adjust once according to the preset data interval, reacquire the second to be adjusted expansion section length L1', keep the existing second to be adjusted injector aperture d1' unchanged, input the second to be adjusted injector aperture d1' and the second to be adjusted expansion section length L1' into the second multi-variable indeterminate equation, reacquire the second to be adjusted gas source end pressure p 01 ' and the second to be adjusted background pressure p b1 ', return to step B3; otherwise, adjust the second to be adjusted injector aperture d1, the second to be adjusted expansion section length L1, the second to be adjusted gas source end pressure p 01 ' and the second to be adjusted background pressure p b1 ' as the weak field feedback control parameters.

[0049] The application provides a fusion device plasma radiation adjusting system and method, which measures the plasma radiation distribution signal, controls the particle flow and distribution by using the supersonic molecular beam system according to different control requirements, thereby controlling the plasma radiation and realizing radiation control in different ranges and degrees. BRIEF DESCRIPTION OF DRAWINGS

[0050] In order to more clearly illustrate the technical solutions of the example embodiments of the application, the following will briefly introduce the drawings needed to be used in the embodiments. It should be understood that the following drawings only show some embodiments of the application, and therefore should not be regarded as a limitation on the scope, and for those skilled in the art, other related drawings can also be obtained without creative labor. In the drawings:

[0051] Figure 1 The structure diagram of the fusion device plasma radiation adjusting system provided by the embodiment of the application.

[0052] Figure 2 The side view of the actuator provided by the embodiment of the application.

[0053] Figure 3 The front view of the actuator provided by the embodiment of the application.

[0054] Figure 4 A flow chart of a method for adjusting plasma radiation of a fusion device is provided in embodiments of the present application.

[0055] Markings in the drawings and corresponding component names:

[0056] 100-plasma, 200-radiation array measurement unit, 300-storage unit, 400-central processing unit, 410-signal processing subunit, 420-actuator parameter calculation subunit, 430-actuator control signal output subunit, 500-actuator, 510-controller, 520-pressure control valve, 530-pump, 540-slideway, 550-rotary shutter. DETAILED DESCRIPTION

[0057] In order to make the objectives, technical solutions and advantages of the present application clearer, further detailed description will be given below in combination with embodiments and drawings, the illustrative embodiments of the present application and the description thereof are only used to explain the present application, and do not limit the present application.

[0058] As shown in Figure 1 Embodiments of the present application provide a system for adjusting plasma radiation of a fusion device, which comprises a radiation array measurement unit 200, a storage unit 300, a central processing unit 400 and an actuator 500.

[0059] The radiation array measurement unit 200 is configured to measure a radiation signal image corresponding to the plasma 100 of the fusion device, and transmit the measured radiation signal image to the storage unit 300.

[0060] The storage unit 300 is configured to receive the radiation signal image transmitted by the radiation array measurement unit 200, store the radiation signal image, and provide data support for the central processing unit 400.

[0061] The central processing unit 400 is configured to acquire the radiation signal image in the storage unit 300, determine a feedback control parameter according to a preset target radiation distribution and the radiation signal image, and finally transmit the feedback control parameter to the actuator 500.

[0062] The actuator 500 is configured to receive the feedback control parameter, and adjust the fusion device according to the feedback control parameter, so as to adjust the radiation distribution corresponding to the plasma 100.

[0063] In a possible implementation, the central processing unit 400 comprises a signal processing subunit 410, an actuator parameter calculation subunit 420 and an actuator control signal output subunit 430.

[0064] The signal processing subunit 410 is configured to acquire the radiation signal image in the storage unit 300, acquire the difference between the preset target radiation distribution and the radiation signal image, trigger the feedback control task when the difference is greater than zero, and schedule the actuator parameter calculation subunit 420 and the actuator control signal output subunit 430 to execute the feedback control task.

[0065] The actuator parameter calculation subunit 420 is configured to acquire the distribution parameter of the actuator injected gas according to the difference between the preset target radiation distribution and the radiation signal image, and determine the feedback control parameter according to the distribution parameter of the actuator injected gas.

[0066] The actuator control signal output subunit 430 is configured to output the feedback control parameter output by the actuator parameter calculation subunit 420 to the actuator 500.

[0067] Optionally, the embodiment of the present application specifically illustrates the control process in detail as follows.

[0068] I. The plasma background radiation is higher than the target radiation value, i.e., the difference is less than zero.

[0069] The plasma 100 releases radiation, the radiation array measurement unit 200 measures the radiation signal image, and transmits the information to the storage unit 300, and then the signal is transmitted to the central processing unit 400. The signal processing subunit 410 in the central processing unit performs signal processing, and calculates the target radiation distribution through the actuator parameter calculation unit 420 and the input. If the target radiation distribution is lower than the measured and processed radiation distribution, i.e., there is no need for radiation enhancement, the actuator control parameter output unit 430 does not output the signal, and the system is terminated and does not work.

[0070] II. Plasma weak field side radiation distribution control.

[0071] The plasma 100 releases radiation, the radiation array measurement unit 200 measures the radiation signal image, and transmits the information to the storage unit 300, and then the signal is transmitted to the central processing unit 400. The signal processing subunit 410 in the central processing unit performs signal processing, and calculates the target radiation distribution through the actuator parameter calculation unit 420 and the input.

[0072] If the target radiation distribution weak field side is higher than the processed radiation distribution, i.e., the control system needs to be started to enhance the weak field side radiation, the actuator parameter calculation unit 420 calculates the distribution of the actuator injected gas according to the radiation distribution difference, mainly including the beam divergence angle α and the effective distance X MTwo parameters (wherein the minimum effective distance should be the minimum distance from the injector port to the plasma boundary, and the divergence angle refers to twice the angle between the tangent of the beam barrel shock wave surface of the injector port and the central axis of the injector), and the control parameters are solved by multivariate indefinite equations. The control parameters mainly include the gas source pressure P0 (0.5-30 bar), the background pressure P b (10 -2 -100 Pa), the injector aperture d (0.1-3 mm), and the expansion section length L (0-30 mm). In this system, the injector cone angle is fixed at 180 degrees. If it is of other angles, a one-dimensional solution can be added.

[0073]

[0074] α = 0.013 × d 0.14 L -0.82 p0 0.2 p b -0.08

[0075] When solving, the current aperture d and expansion section length L are fixed as fixed values, and the gas source pressure and background pressure are directly solved. When the solving value exceeds the range, the aperture and expansion section length L are changed in turn, and then the control parameters [P 01 , P b1 , d1, L1] are solved until the first set of control parameters that meet the requirements is solved. The actuator control parameter group is output to the actuator 500 through the actuator control parameter output unit 430.

[0076] At this time, the weak field side radiation needs to be enhanced, and the weak field side actuator starts to act. The weak field side controller 510 outputs a signal to adjust each part of the actuator. The pressure control valve 520 adjusts the gas source end pressure to P 01 according to the pressure control signal transmitted by the weak field side controller 510; the vacuum pump 530 adjusts the background pressure to P b1 according to the vacuum control signal transmitted by the controller 510; the slide rail 540 adjusts the slide rail position to L1 according to the slide rail position signal transmitted by the controller 510; the rotating shutter 550 adjusts the rotating shutter size to d1 according to the aperture signal transmitted by the controller 510; in particular, if the original state of each part is consistent with the target state given by the control signal, that is, the actuator part does not act.

[0077] Three, plasma strong field side radiation distribution control.

[0078] The plasma 100 releases radiation, the radiation array measurement unit 200 measures the radiation signal image, and transmits the information to the storage unit 300, and then the signal is transmitted to the central processing unit 400, and the signal processing subunit 410 in the central processing unit performs signal processing, and calculates the target radiation distribution by executing the actuator parameter calculation unit 420 and the input.

[0079] If the target radiation distribution is higher on the strong field side than the processed radiation distribution, the control system needs to be started to enhance the radiation on the strong field side, and the actuator parameter calculation unit 420 calculates the distribution of the actuator injected gas according to the radiation distribution difference, mainly including the beam divergence angle α and the effective distance X M Two parameters, and the control parameters are solved by multiple indefinite equations. The control parameters mainly include the gas source pressure P0 (0.5bar-30bar), the background pressure P b (10 -2 -100Pa), the injector aperture d (0.1mm-3mm), and the expansion section length L (0-30mm). This system, the injector cone angle is fixed at 180 degrees. If it is other angles, a unit solution can be added.

[0080]

[0081] α=0.013×d 0.14 L -0.82 p0 0.2 p b -0.08

[0082] When solving, the current aperture d and expansion section length L are fixed as fixed values, and the gas source pressure and background pressure are directly solved. When the solution value exceeds the range, the aperture and expansion section length L are changed in turn, and then the solution is solved until the first set of control parameters [P 01 ,P b1 ,d1,L1] that meet the requirements are solved. The actuator control parameter group is output to the actuator 500 through the actuator control parameter output unit 430.

[0083] At this time, the radiation on the strong field side needs to be enhanced, and the strong field side actuator starts to act. The strong field side controller 510 outputs a signal to adjust each part of the actuator. The pressure control valve 520 adjusts the gas source end pressure to P 01 according to the pressure control signal transmitted by the controller 510; and the vacuum pump 530 adjusts the background pressure to P b1The slide rail 540 adjusts the slide rail position to L1 according to the slide rail position signal transmitted by the controller 510; the rotating shutter 550 adjusts the rotating shutter size to d1 according to the aperture signal transmitted by the controller 510; in particular, if the original state of each component is consistent with the target state given by the control signal, i.e. the actuator component does not act.

[0084] Optionally, the strong field side controller and the weak field side controller can be the same controller or different controllers, and both implementation modes can realize the functions described in the embodiments of the present application.

[0085] IV. Control of the strong and weak field sides of the plasma radiation distribution

[0086] The plasma 100 releases radiation, the radiation array measurement unit 200 measures the radiation signal image and transmits the information to the storage unit 300, and then the signal is transmitted to the central processing unit 400, the signal processing subunit 410 in the central processing unit performs signal processing, and the target radiation distribution is calculated through the actuator parameter calculation unit 420 and the input.

[0087] If the target radiation distribution is higher than the radiation distribution obtained by processing on the weak / strong field side, i.e. the control system needs to be started, and the radiation on the weak / strong field side needs to be enhanced, the actuator parameter calculation unit 420 calculates the distribution of the gas injected by the actuator according to the difference in radiation distribution, mainly including the beam divergence angle α and the effective distance X M Two parameters, and the control parameters are solved by a multivariate indefinite equation. The control parameters mainly include the gas source pressure P0 (0.5 bar-30 bar), the background pressure P b (10 -2 -100 Pa), the injector aperture d (0.1 mm-3 mm), and the expansion section length L (0-30 mm). In this system, the injector cone angle is fixed at 180 degrees. If it is other angles, a unit solution can be added.

[0088]

[0089] α = 0.013 x d 0.14 L -0.82 p0 0.2 p b -0.08

[0090] When solving, the current aperture d and the expansion section length L are fixed as fixed values, and the gas source pressure and the background pressure are directly solved. When the solution value exceeds the range, the aperture and the expansion section length L are changed in turn, and then the solution is solved until the first set of control parameters [P 01 , P b1The actuator control parameter group is output to the actuator 500 through an actuator control parameter output unit 430.

[0091] At this time, the weak / strong field side radiation needs to be enhanced, and the weak / strong field side actuators start to act. The strong field side controller 510 outputs a signal to adjust each component of the actuator. The pressure control valve 520 adjusts the pressure of the gas source to P 01 according to the pressure control signal transmitted by the controller 510; the vacuum pump 530 adjusts the background pressure to P b1 according to the vacuum control signal transmitted by the controller 510; the slide rail 540 adjusts the slide rail position to L1 according to the slide rail position signal transmitted by the controller 510; and the rotating shutter 550 adjusts the rotating shutter size to d1 according to the aperture signal transmitted by the controller 510. In particular, if the original state of each component is consistent with the target state given by the control signal, i.e., the actuator component does not act.

[0092] Five, fine control of plasma radiation distribution.

[0093] Fine control of plasma radiation distribution, i.e., adding actuators for more plasma positions in addition to the weak / strong field side. The more actuators, the finer the distribution control can be achieved in theory.

[0094] In a possible implementation, the difference between the preset target radiation distribution and the radiation signal image includes: a strong field side radiation difference and / or a weak field side radiation difference between the preset target radiation distribution and the radiation signal image.

[0095] The feedback control parameters include strong field feedback control parameters obtained according to the strong field side radiation difference and / or weak field feedback control parameters obtained according to the weak field side radiation difference.

[0096] In a possible implementation, the actuator 500 includes a controller 510, a strong field radiation adjustment assembly, and a weak field radiation adjustment assembly.

[0097] The controller 510 is configured to control the strong field radiation adjustment assembly and / or the weak field radiation adjustment assembly to act according to the strong field feedback control parameters and / or the weak field feedback control parameters.

[0098] The strong field radiation adjustment assembly is configured to adjust the strong field radiation in response to the control of the controller 510.

[0099] The weak field radiation adjustment assembly is configured to adjust the weak field radiation in response to the control of the controller 510.

[0100] The controller 510 can include a strong field controller and a weak field controller, the strong field controller controls the strong field radiation adjustment assembly (i.e., the strong field actuator), and the weak field controller controls the weak field radiation adjustment assembly (i.e., the weak field actuator).

[0101] In a possible implementation, the strong field radiation adjustment assembly and the weak field radiation adjustment assembly have the same structure, and both are adjusted by the pressure control valve 520, the plurality of exhaust pumps 530, the slide rail 540, and the rotary shutter 550.

[0102] As shown in FIG. 5, the controller 510 can include a strong field controller and a weak field controller, the strong field controller controls the strong field radiation adjustment assembly (i.e., the strong field actuator), and the weak field controller controls the weak field radiation adjustment assembly (i.e., the weak field actuator). Figure 2 And Figure 3 As shown in FIG. 5, in order for those skilled in the art to further understand the technical concept of the present application, the embodiment of the present application provides a structural example of the strong field radiation adjustment assembly and the weak field radiation adjustment assembly (i.e., the actuator). The actuator of the distribution control system in the schematic diagram is represented by two positions of strong and weak, respectively, representing two injection positions of the plasma strong field side and the weak field side. The actual system has more positions according to the demand, so as to realize more fine radiation distribution control in different positions. The number of exhaust pumps 530 can be reduced or increased according to actual demand, and each exhaust position can be independently controlled by a pump, or different exhaust positions can be connected to the same pump, but the opening and closing of different exhaust ports are independently controlled. Figure 2 The front end of the position of the slide rail 540 where the rotary shutter 550 is located is the gas supply port, the exhaust pump in the corresponding interval is in the closed state, so as to ensure that the gas source pressure is controlled by the pressure control valve 520. The rear end is the injector port, which is connected to the plasma, and the vacuum degree is controlled by the exhaust pump 530 in this interval. If the rotary shutter is located at position A, the exhaust pumps 1-6 can be opened; if the rotary shutter is located at position B, the exhaust pumps 1-3 are closed, and the exhaust pumps 4-6 can be opened; if the rotary shutter is located at position C, the exhaust pumps 1-5 are closed, and the exhaust pump 6 can be opened. It is worth noting that the movement interval of the slide rail 540 is between position A and C, and at least one exhaust pump is located at the gas injection port end for controlling the background gas pressure Pb.

[0103] As shown in FIG. 5, the embodiment of the present application provides a method for adjusting the plasma radiation of a fusion device, which comprises the following steps. Figure 4 As shown in FIG. 5, the embodiment of the present application provides a method for adjusting the plasma radiation of a fusion device, which comprises the following steps.

[0104] S1, measuring the radiation signal image corresponding to the plasma of the fusion device, and storing the radiation signal image;

[0105] S2, determining the feedback control parameter according to the preset target radiation distribution and the stored radiation signal image;

[0106] S3, adjusting the fusion device according to the feedback control parameter to adjust the radiation distribution corresponding to the plasma.

[0107] In a possible implementation, the feedback control parameters are determined according to the preset target radiation distribution and the stored radiation signal image, including:

[0108] obtaining a strong field side radiation difference and / or a weak field side radiation difference between the preset target radiation distribution and the radiation signal image;

[0109] determining a first distribution parameter of the actuator injected gas according to the strong field side radiation difference and / or a second distribution parameter of the actuator injected gas according to the weak field side radiation difference; wherein the first distribution parameter includes a first beam divergence angle and a first effective distance; and the second distribution parameter includes a second beam divergence angle and a second effective distance;

[0110] obtaining a strong field feedback control parameter according to the first distribution parameter and / or a weak field feedback control parameter according to the second distribution parameter.

[0111] In a possible implementation, the strong field side radiation difference and / or the weak field side radiation difference between the preset target radiation distribution and the radiation signal image is obtained, including:

[0112] subtracting a strong field side radiation value of the radiation signal image from a strong field side radiation value of the preset target radiation distribution to obtain the strong field side radiation difference;

[0113] and / or subtracting a weak field side radiation value of the radiation signal image from a weak field side radiation value of the preset target radiation distribution to obtain the weak field side radiation difference.

[0114] In a possible implementation, the strong field feedback control parameter is obtained according to the first distribution parameter, including:

[0115] A1, according to the first distribution parameter, a first multi-element indefinite equation is constructed as:

[0116]

[0117] α=0.013×d 0.14 L -0.82 p0 0.2 p b -0.08

[0118] wherein α represents the first beam divergence angle, X M represents the first effective distance, p0 represents the first gas source end pressure on the strong field side, p b represents the first background pressure on the strong field side, d represents the first injector aperture on the strong field side, and L represents the first expansion section length on the strong field side;

[0119] A2, obtain the first current injector aperture corresponding to the strong field side and the first current expansion section length, take the first current injector aperture as the first to be adjusted injector aperture d1 and the first current expansion section length as the first to be adjusted expansion section length L1, and input the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 into the first multi-variable indefinite equation to obtain the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 ;

[0120] A3, determine whether the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 are in an over-limit condition, if yes, avoid over-limit as the target, adjust once based on the existing first to be adjusted injector aperture d1 according to a preset data interval, re-obtain the first to be adjusted injector aperture d1, keep the existing first to be adjusted expansion section length L1 unchanged, input the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 into the first multi-variable indefinite equation to re-obtain the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 , and enter step A4; otherwise, take the first to be adjusted injector aperture d1, the first to be adjusted expansion section length L1, the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 as the strong field feedback control parameters together;

[0121] Optionally, adjusting once according to a preset data interval can include: if the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 are in an over-limit condition, increase by a preset interval; if under-limit, decrease once according to a preset interval.

[0122] A4, determine whether the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 are in an over-limit condition, if yes, avoid over-limit as the target, adjust once based on the existing first to be adjusted expansion section length L1 according to a preset data interval, re-obtain the first to be adjusted expansion section length L1, keep the existing first to be adjusted injector aperture d1 unchanged, input the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 into the first multi-variable indefinite equation to re-obtain the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 , and return to step A3; otherwise, take the first to be adjusted injector aperture d1, the first to be adjusted expansion section length L1, the first to be adjusted gas source end pressure p 01and a first to-be-adjusted background pressure p b1 are collectively taken as the strong-field feedback control parameters.

[0123] In a possible implementation, the weak-field feedback control parameter is acquired according to the second distribution parameter, and the acquiring comprises:

[0124] B1, constructing a second multi-unknown equation according to the second distribution parameter, wherein the second multi-unknown equation comprises:

[0125]

[0126] α' = 0.013 * (d') 0.14 (L') -0.82 (p0') 0.2 (p b ') -0.08

[0127] wherein α' represents a second beam divergence angle, X M ' represents a first effective distance, p0' represents a second source end pressure on the weak-field side, p b ' represents a second background pressure on the weak-field side, and d' represents a second injector aperture on the weak-field side.

[0128] B2, acquiring a second current injector aperture on the weak-field side and a second current expansion section length, taking the second current injector aperture as a second to-be-adjusted injector aperture d1' and taking the second current expansion section length as a second to-be-adjusted expansion section length L1', and inputting the second to-be-adjusted injector aperture d1' and the second to-be-adjusted expansion section length L1' into the second multi-unknown equation to acquire a second to-be-adjusted source end pressure weak p 01 ' and a second to-be-adjusted background pressure weak p b1 ';

[0129] B3, judging whether the second to-be-adjusted source end pressure weak p 01 ' and the second to-be-adjusted background pressure weak p b1 ' exist an out-of-limit condition, if yes, adjusting once according to a preset data interval based on the existing second to-be-adjusted injector aperture d1' to reacquire the second to-be-adjusted injector aperture d1' while keeping the existing second to-be-adjusted expansion section length L1' unchanged, inputting the second to-be-adjusted injector aperture d1' and the second to-be-adjusted expansion section length L1' into the second multi-unknown equation to reacquire the second to-be-adjusted source end pressure weak p 01 ' and the second to-be-adjusted background pressure weak p b1 ', and entering step B4; or otherwise, taking the second to-be-adjusted injector aperture d1', the second to-be-adjusted expansion section length L1', the second to-be-adjusted source end pressure weak p 01And the second to be adjusted background pressure p b1 Commonly used as weak field feedback control parameters

[0130] B4, judge the second to be adjusted gas source end pressure p 01 And the second to be adjusted background pressure p b1 If yes, avoid overrunning as the target, based on the existing second to be adjusted expansion section length L1', adjust once according to the preset data interval, reacquire the second to be adjusted expansion section length L1', keep the existing second to be adjusted injector aperture d1' unchanged, input the second to be adjusted injector aperture d1' and the second to be adjusted expansion section length L1' into the second multi-variable indeterminate equation, reacquire the second to be adjusted gas source end pressure p 01 And the second to be adjusted background pressure p b1 Return to step B3; otherwise, the second to be adjusted injector aperture d1, the second to be adjusted expansion section length L1, the second to be adjusted gas source end pressure p 01 And the second to be adjusted background pressure p b1 Commonly used as weak field feedback control parameters

[0131] The application provides a fusion device plasma radiation adjusting system and method, which measures a plasma radiation distribution signal, controls the flow and distribution of particles by using an ultrasonic molecular beam system according to different control requirements, thereby controlling the plasma radiation and realizing radiation control in different ranges and degrees.

[0132] The above detailed description further describes the purpose, technical scheme and beneficial effects of the application, and it should be understood that the above description is only a specific embodiment of the application and is not used to limit the protection scope of the application, and any modification, equivalent replacement, improvement, etc. within the spirit and principle of the application should be included in the protection scope of the application.

Claims

1. A system for regulating the radiation of a plasma in a fusion device, characterized in that, The fusion device comprises a radiation array measurement unit (200), a storage unit (300), a central processing unit (400) and an execution mechanism (500); The radiation array measurement unit (200) is configured to measure a radiation signal image corresponding to a plasma (100) of a fusion device and transmit the measured radiation signal image to the storage unit (300); The storage unit (300) is configured to receive the radiation signal image transmitted by the radiation array measurement unit (200), store the radiation signal image, and provide data support for the central processing unit (400); The central processing unit (400) is configured to acquire the radiation signal image in the storage unit (300), determine a feedback control parameter according to a preset target radiation distribution and the radiation signal image, and finally transmit the feedback control parameter to the execution mechanism (500); The execution mechanism (500) is configured to receive the feedback control parameter and adjust the fusion device according to the feedback control parameter to adjust the radiation distribution corresponding to the plasma (100); The central processing unit (400) comprises a signal processing subunit (410), an execution mechanism parameter calculation subunit (420) and an execution mechanism control signal output subunit (430); The signal processing subunit (410) is configured to acquire the radiation signal image in the storage unit (300) and acquire a difference between the preset target radiation distribution and the radiation signal image, trigger a feedback control task when the difference is greater than zero, and dispatch the execution mechanism parameter calculation subunit (420) and the execution mechanism control signal output subunit (430) to execute the feedback control task; The execution mechanism parameter calculation subunit (420) is configured to acquire a distribution parameter of gas injected by the execution mechanism according to the difference between the preset target radiation distribution and the radiation signal image, and determine the feedback control parameter according to the distribution parameter of the gas injected by the execution mechanism; The execution mechanism control signal output subunit (430) is configured to output the feedback control parameter output by the execution mechanism parameter calculation subunit (420) to the execution mechanism (500); The difference between the preset target radiation distribution and the radiation signal image comprises a strong field side radiation difference and / or a weak field side radiation difference between the preset target radiation distribution and the radiation signal image; The feedback control parameter comprises a strong field feedback control parameter acquired according to the strong field side radiation difference and / or a weak field feedback control parameter acquired according to the weak field side radiation difference.

2. The system for regulating the plasma radiation of a fusion device according to claim 1, characterized in that, The execution mechanism (500) comprises a controller (510), a strong field radiation adjustment assembly and a weak field radiation adjustment assembly; The controller (510) is configured to control the strong field radiation adjustment assembly and / or the weak field radiation adjustment assembly to act according to the strong field feedback control parameter and / or the weak field feedback control parameter; The strong field radiation adjustment assembly is configured to adjust the strong field radiation in response to the control of the controller (510); The weak field radiation adjustment assembly is configured to adjust the weak field radiation in response to the control of the controller (510).

3. The system for regulating the plasma radiation of a fusion device according to claim 2, characterized in that, The strong field radiation adjusting assembly and the weak field radiation adjusting assembly have the same structure, and both adjust the radiation through a pressure control valve (520), a plurality of exhaust pumps (530), a sliding rail (540), and a rotating shutter (550).

4. A method of regulating fusion device plasma radiation, based on the regulating system of fusion device plasma radiation according to any one of claims 1-3, characterized in that, The method comprises: measuring a radiation signal image corresponding to a plasma of a fusion device and storing the radiation signal image; determining a feedback control parameter according to a preset target radiation distribution and the stored radiation signal image; adjusting the fusion device according to the feedback control parameter to adjust a radiation distribution corresponding to the plasma.

5. The method of claim 4, wherein the method further comprises: The method comprises: obtaining a strong field side radiation difference value and / or a weak field side radiation difference value between the preset target radiation distribution and the radiation signal image; determining a first distribution parameter of an injection gas of an actuator according to the strong field side radiation difference value and / or a second distribution parameter of the injection gas of the actuator according to the weak field side radiation difference value; wherein the first distribution parameter comprises a first beam current divergence angle and a first effective distance, and the second distribution parameter comprises a second beam current divergence angle and a second effective distance; obtaining a strong field feedback control parameter according to the first distribution parameter and / or a weak field feedback control parameter according to the second distribution parameter.

6. The method of claim 5, wherein the method further comprises: The method comprises: subtracting a strong field side radiation value of the radiation signal image from a strong field side radiation value of the preset target radiation distribution to obtain the strong field side radiation difference value; and / or subtracting a weak field side radiation value of the radiation signal image from a weak field side radiation value of the preset target radiation distribution to obtain the weak field side radiation difference value. The method comprises:

7. The method of claim 5, wherein the method further comprises: A1, constructing a first multi-variable indeterminate equation according to the first distribution parameter; and B1, constructing a second multi-variable indeterminate equation according to the second distribution parameter. a = 0.013 x d 0.14 L -0.82 p0 0.2 p b -0.08 wherein a represents the first beam divergence angle, X M represents the first effective distance, p0represents the first gas source end pressure on the strong field side, p b represents the first background pressure on the strong field side, d represents the first injector aperture on the strong field side, and L represents the first expansion section length on the strong field side; A2, obtain the first current injector aperture corresponding to the strong field side and the first current expansion section length, take the first current injector aperture as the first to be adjusted injector aperture d1 and the first current expansion section length as the first to be adjusted expansion section length L1, and input the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 into the first multi-variable indefinite equation to obtain the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 ; A3, judging the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 whether there is an over-limit case, if yes, taking the goal of avoiding over-limit, adjusting once according to the preset data interval based on the existing first to be adjusted injector aperture d1, reacquiring the first to be adjusted injector aperture d1, keeping the existing first to be adjusted expansion section length L1 unchanged, inputting the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 into the first multi-variable indeterminate equation, and reacquiring the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 , entering step A4; otherwise, taking the first to be adjusted injector aperture d1, the first to be adjusted expansion section length L1, the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 as the strong field feedback control parameters together; A4, judging the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 whether there is an over-limit case, if yes, taking the avoidance of over-limit as the target, adjusting once according to the preset data interval based on the existing first to be adjusted expansion section length L1, reacquiring the first to be adjusted expansion section length L1, keeping the existing first to be adjusted injector aperture d1 unchanged, inputting the first to be adjusted injector aperture d1 and the first to be adjusted expansion section length L1 into the first multi-variable indeterminate equation, and reacquiring the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 , returning to step A3; otherwise, taking the first to be adjusted injector aperture d1, the first to be adjusted expansion section length L1, the first to be adjusted gas source end pressure p 01 and the first to be adjusted background pressure p b1 as the strong field feedback control parameters together.

8. The method of claim 5, wherein the method further comprises: ​ ​ a' = 0.013 x (d') 0.14 (L') -0.82 (p0') 0.2 (p b ') -0.08 wherein a' represents the second beam divergence, X M represents the first effective distance, p0' represents the second gas source end pressure on the weak field side, p b represents the second background pressure on the weak field side, d' represents the second injector aperture on the weak field side, and L' represents the second expansion section length on the weak field side. B2, obtain the second current injector aperture corresponding to the weak field side and the second current expansion section length, take the second current injector aperture as the second to be adjusted injector aperture d1' and the second current expansion section length as the second to be adjusted expansion section length L1', and input the second to be adjusted injector aperture d1' and the second to be adjusted expansion section length L1' into the second multi-variable indefinite equation to obtain the second to be adjusted gas source end pressure weak p 01 and the second to be adjusted background pressure weak p b1 '; B3, judging whether the second to be adjusted gas source end pressure p 01 ' is weak or not, if yes, entering step B4; otherwise, taking the second to be adjusted injector aperture d1' as the weak field feedback control parameter; b1 01 b1 01 b1 ' as the weak field feedback control parameter;​​​​ B4, judge whether the second to be adjusted gas source end pressure weak p 01 ' and the second to be adjusted background pressure weak p b1 ' is out of limit, if yes, avoid out of limit as the goal, based on the existing second to be adjusted expansion section length L1', adjust once according to the preset data interval, reacquire the second to be adjusted expansion section length L1', and keep the existing second to be adjusted injector aperture d1' unchanged, input the second to be adjusted injector aperture d1' and the second to be adjusted expansion section length L1' into the second multi-variable indeterminate equation, reacquire the second to be adjusted gas source end pressure weak p 01 ' and the second to be adjusted background pressure weak p b1 ', return to step B3; otherwise, the second to be adjusted injector aperture d1, the second to be adjusted expansion section length L1, the second to be adjusted gas source end pressure weak p 01 ' and the second to be adjusted background pressure weak p b1 ' are taken as the weak field feedback control parameters together.

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