Reticle gripper

Abstract

The embodiment of the present specification provides a photomask sucking tool, comprising a sucking assembly and a control assembly, wherein: the control assembly is coupled with the sucking assembly and is adapted to suck gas in the sucking assembly to form a negative pressure environment in response to a sucking control signal; and the sucking assembly is adapted to suck a photomask under the negative pressure environment. The photomask sucking tool can improve the taking-out efficiency of the photomask and avoid damaging the photomask or other components.

Description

Technical Field

[0001] This specification relates to the field of semiconductor manufacturing technology, and in particular to a photomask holder. Background Technology

[0002] In the semiconductor manufacturing process, photomasks are placed inside photolithography equipment to perform processes such as exposure and photolithography.

[0003] When a lithography device malfunctions or fails to function properly, the photomask left inside the device is usually removed manually.

[0004] However, due to the limited internal space of lithography equipment, it is difficult to accommodate manual operation. Manual operation is inefficient and may damage the photomask or other components. Summary of the Invention

[0005] In view of this, the embodiments of this specification provide a photomask suction device that can improve the efficiency of photomask removal and avoid damage to the photomask or other components.

[0006] This specification provides a photomask suction device, comprising: an adsorption component and a control component, wherein:

[0007] The control component is coupled to the adsorption component and is adapted to draw gas from the adsorption component in response to an adsorption control signal to form a negative pressure environment.

[0008] The adsorption component is suitable for adsorbing photomasks under negative pressure.

[0009] Optionally, the control component is also adapted to release the gas drawn from the adsorption component in response to a release control signal, thereby creating an atmospheric pressure environment.

[0010] Optionally, the light cover suction device further includes an extension rod disposed between the control component and the suction component, wherein a cavity is formed inside the extension rod.

[0011] Optionally, the control component includes:

[0012] Base;

[0013] A suction element, housed within the base, is adapted to be electrically connected to a power source and, in response to the adsorption control signal, draws in gas; and, in response to the venting control signal, vents gas.

[0014] The handheld part is connected to the base and has a control switch. The control switch is connected to the suction component and has a first state and a second state. When it is in the first state, it outputs the adsorption control signal to put the suction component into working state; when it is in the second state, it outputs the discharge control signal to put the suction component into closed state.

[0015] A vacuum tube is inserted into the cavity of the extension rod, with its first end connected to the suction component and its second end connected to the adsorption assembly.

[0016] Optionally, the suction component is a vacuum pump.

[0017] Optionally, the extension rod is provided with a connecting hole, which is located near the first end of the extension rod;

[0018] The adsorption assembly includes a first support and an adsorption section, wherein:

[0019] The first bracket has a first surface and a second surface opposite to each other, the first surface being connected to a first end of the extension rod, and the second surface being connected to the adsorption part;

[0020] The adsorption section is connected to the vacuum pipeline of the control component through the connection hole to form a suction channel.

[0021] Optionally, the adsorption unit includes: a second support, an adsorption element, and a connector, wherein:

[0022] The second bracket has opposing third and fourth surfaces, the third surface being connected to the second surface of the first bracket;

[0023] The adsorption element is fixedly connected to the second bracket and includes an adsorption surface with adsorption holes provided on the adsorption surface.

[0024] The connector is disposed on the adsorption element and has a hollow structure to connect the adsorption hole and the vacuum pipeline.

[0025] Optionally, the adsorption section further includes: a plurality of connecting pipes and a plurality of adsorption elements, wherein the plurality of adsorption elements are disposed opposite to each other on both sides of the second support, wherein at least two adsorption elements are disposed on the same side, and the adsorption elements located on different sides of the second support are connected by corresponding connecting pipes.

[0026] Optionally, the adsorption element disposed on the same side of the second support is disposed along the extension direction;

[0027] The adsorption components, which are positioned diagonally on both sides of the second support, are connected by corresponding connecting pipes.

[0028] Optionally, the photomask holder further includes an elastic element coupled between the first bracket and the second bracket.

[0029] Optionally, the photomask suction device further includes: multiple sealing elements disposed on the adsorption surface of each adsorption element.

[0030] Optionally, the photomask suction device further includes: a posture adjustment component, which is disposed in the cavity of the extension rod and rotatably connected to the control component and the suction component, and is adapted to adjust the relative posture of the suction component and the extension rod.

[0031] Optionally, the pose adjustment assembly includes: a transmission rod, a connecting member, and a rotating member, wherein:

[0032] The connecting member has a first end connected to the first end of the transmission rod and a second end connected to the first end of the rotating member.

[0033] The transmission rod has its first end fixedly connected to the base and its second end fixedly connected to the connector.

[0034] The rotating component has its second end connected to the suction assembly.

[0035] Using the photomask suction device provided in the embodiments of this specification, in response to the adsorption control signal, the control component can draw gas from the adsorption component to form a negative pressure environment, thereby generating an adsorption force between the adsorption component and the photomask, enabling the adsorption component to adsorb the photomask. This can be used to remove the photomask from the photolithography equipment. Compared to manual methods, the photomask suction device in the embodiments of this specification, through the adsorption component, can more easily enter the internal space of the photolithography equipment, and is simple to operate, thereby improving the photomask removal efficiency. Furthermore, during the photomask removal process, the human hand does not need to touch the photomask or other components, thus avoiding damage to the photomask or other components.

[0036] Furthermore, since the control component is also adapted to release the gas drawn from the adsorption component in response to the release control signal, forming an atmospheric pressure environment; and the adsorption component is also adapted to release the photomask under atmospheric pressure, the photomask can be placed in a suitable position through the coordinated operation of the two, thus avoiding damage to the photomask.

[0037] Furthermore, since the photomask holder may also include an extension rod disposed between the control component and the adsorption component, and the extension rod has a cavity formed inside, the length of the photomask holder can be adjusted by the extension rod to increase the distance between the control component and the adsorption component, so that the photomask holder can be used for different types of photolithography equipment and has strong versatility.

[0038] Furthermore, the extension rod is provided with a connection hole, which is located near the first end of the extension rod; the adsorption assembly includes a first support and an adsorption part, wherein the adsorption part can be connected to the vacuum pipeline of the control assembly through the connection hole to form a suction channel. By adopting the above-described structure of the adsorption assembly, the adsorption part and the extension rod are connected by the first support, which can reduce the shaking force transmitted to the adsorption part, so that the adsorption part is always in a stable state, preventing the photomask from detaching from the adsorption part, improving the stability during the photomask removal process, and the adsorption part can be located in the cavity to form a suction channel with the vacuum pipeline through the connection hole, which can ensure the continuity of the gas suction process.

[0039] Furthermore, since the adsorption unit may also include multiple connecting pipes and multiple adsorption elements, the multiple adsorption elements are arranged opposite to each other on both sides of the second support, and at least two adsorption elements are arranged on the same side. The adsorption elements located on different sides of the second support are connected through corresponding connecting pipes, which can realize independent operation between different suction channels. Even if the working state of one suction channel is abnormal, the at least two adsorption elements in the diagonal position can still generate a relatively uniform adsorption force on the adsorption surface and still adsorb the photomask, thus improving the reliability of the photomask suction device.

[0040] Furthermore, the photomask suction device may also include an elastic element coupled between the first support and the second support. Since the elastic element plays a buffering role, it can reduce the vibration during the photomask adsorption process, so that the adsorption surface of the adsorption element can fit more tightly against the photomask surface, thereby further improving the reliability of the photomask suction device.

[0041] Furthermore, the photomask suction device may also include: multiple sealing elements disposed on the adsorption surface of each adsorption element. Through multiple sealing elements, the vacuum sealing of each adsorption surface can be improved, the adsorption force between each adsorption surface and the photomask can be increased, and the photomask suction device can have stronger adsorption.

[0042] Furthermore, since the photomask suction device also includes a posture adjustment component, which is inserted into the cavity of the extension rod and rotatably connected to the control component and the suction component, the relative posture of the suction component and the extension rod can be adjusted through the posture adjustment component. Therefore, the photomask suction device can adapt to different usage environments or lithography equipment with complex structures, and has greater flexibility and versatility. Attached Figure Description

[0043] To more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments of the present invention or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0044] Figure 1 A schematic diagram of the structure of a photomask suction device according to an embodiment of this specification is shown;

[0045] Figure 2 A partial structural schematic diagram of the photomask holder in a specific application scenario of an embodiment of this specification is shown;

[0046] Figure 3 An exploded view of a photomask suction device according to an embodiment of this specification is shown.

[0047] Figure 4 An enlarged structural view of a connector and a rotating component in an embodiment of this specification is shown. Detailed Implementation

[0048] As described in the background section, current methods for manually removing photomasks are inefficient and may damage the photomask or other components.

[0049] To address the aforementioned technical problems, this specification provides a photomask suction device, which may include an adsorption component and a control component. In response to an adsorption control signal, the control component can draw gas from the adsorption component to create a negative pressure environment, thereby generating an adsorption force between the adsorption component and the photomask. This allows the adsorption component to adsorb the photomask, enabling it to be removed from the photolithography equipment. Compared to manual methods, the photomask suction device in this embodiment, through its adsorption component, more easily enters the internal space of the photolithography equipment and is simple to operate, thus improving the photomask removal efficiency. Furthermore, during the photomask removal process, the human hand does not need to touch the photomask or other components, avoiding damage to the photomask or other components.

[0050] To enable those skilled in the art to better understand and implement the photomask holders in the embodiments of this specification, a detailed description is provided below with reference to the accompanying drawings and specific application examples.

[0051] Reference Figure 1 The schematic diagram shown in this specification illustrates the structure of a photomask holder in one of the embodiments of this specification. In some embodiments of this specification, such as... Figure 1 As shown, the light cover suction device M may include an adsorption component M2 and a control component M1, wherein:

[0052] The control component M1 is coupled to the adsorption component M2 and is adapted to draw gas from the adsorption component M2 in response to an adsorption control signal to form a negative pressure environment.

[0053] The adsorption component M2 is suitable for adsorbing the photomask under negative pressure.

[0054] The following combination Figure 1 Briefly describe the working principle of the photomask holder M in the embodiments of this specification:

[0055] In response to the adsorption control signal, the control component M1 can draw gas from the adsorption component M2 to form a negative pressure environment. Due to the pressure difference, an adsorption force can be formed between the adsorption component M2 and the photomask, so that the adsorption component M2 can adsorb the photomask and remove the photomask from the photolithography equipment.

[0056] Compared to manual methods, the photomask suction device in this embodiment can more easily enter the internal space of the photolithography equipment through the adsorption component, and the operation is simple, thereby improving the efficiency of photomask removal. Furthermore, during the photomask removal process, the human hand does not need to touch the photomask or other components, which can avoid damage to the photomask or other components.

[0057] To enable those skilled in the art to have a clearer understanding of the technical concepts, principles, advantages, etc. contained in the embodiments of this specification, a detailed description is provided below with reference to the accompanying drawings, through specific embodiments, and in conjunction with specific application scenarios.

[0058] In some embodiments of this specification, after the photomask is removed, it is usually necessary to place it in a specific device to prevent damage. Therefore, the control component in the embodiments of this specification is also adapted to release the gas drawn from the adsorption component in response to a release control signal, creating an atmospheric pressure environment; correspondingly, the adsorption component is also adapted to release the photomask under atmospheric pressure.

[0059] In practice, lithography equipment at different process nodes varies, and the photomask may be located in different positions within the equipment. Therefore, the length of the photomask holder needs to be adjusted during photomask removal. Based on this, continue to refer to... Figure 1 The light cover suction device M may also include an extension rod M3 disposed between the control component M1 and the suction component M2, and the extension rod M3 has a cavity formed inside.

[0060] Therefore, by using an extension rod positioned between the control component and the adsorption component, the length of the photomask holder can be adjusted, increasing the distance between the control component and the adsorption component, making the photomask holder suitable for different types of lithography equipment and highly versatile.

[0061] The following is a schematic description of the specific structure of the control components and extension rods involved in the embodiments of this specification, with reference to the accompanying drawings.

[0062] Combination Figure 1 , refer to Figure 2 The diagram shown here is a partial structural schematic of the photomask holder in a specific application scenario of an embodiment of this specification. Figure 2 The diagram shows a schematic representation of the control component M1 and the extension rod M3 in an embodiment of this specification.

[0063] Among them, such as Figure 2 As shown, the extension rod M3 has a rod-shaped structure and an internal cavity M31, through which the control component M1 can be inserted.

[0064] It is understood that the extension rod M3 can also be other rod-shaped structures with cavities M31. For example, the extension rod M3 can be a cylindrical rod-shaped structure. The embodiments in this specification do not limit the specific shape and construction of the extension rod M3, as long as it has cavities M31 inside for the control component M1 to pass through.

[0065] Continue to refer to Figure 2 The control component M1 in the embodiments of this specification may include:

[0066] Base M11;

[0067] The suction element M12 is housed within the base M11 and is adapted to connect with a power source ( Figure 2 (Unidentified) Electrically connected, and in response to the adsorption control signal, draws in gas; and in response to the release control signal, releases gas;

[0068] The handheld part M13 is connected to the base M11 and is equipped with a control switch M131. The control switch M131 is connected to the suction component M12 and has a first state and a second state. When it is in the first state, it outputs the adsorption control signal to put the suction component M12 into the working state; when it is in the second state, it outputs the discharge control signal to put the suction component M12 into the closed state.

[0069] Vacuum lines M14 and M15 pass through the cavity M31 in the extension rod M3, with their first end connected to the suction member M12 and their second end connected to the adsorption assembly.

[0070] The following combination Figure 2 Briefly describe the working principle of control component M1.

[0071] When the control switch M131 is pressed, the control switch M131 is in the first state and can output an adsorption control signal to the suction component M12, so that the suction component M12 is in the working state. The suction component M12 can draw gas from the adsorption assembly through the vacuum tubes M14 and M15 that pass through the cavity M31. The adsorption assembly can adsorb the photomask.

[0072] During the adsorption process of the photomask, the control switch M131 is always in the first state, and the adsorption component can continuously adsorb the photomask.

[0073] When the photomask is removed from the photolithography equipment, the control switch M131 can be released. The control switch M131 is in the second state and can output a discharge control signal to the suction component M12, so that the suction component M12 is in the closed state and the gas drawn from the adsorption component is discharged to the outside. The gas is discharged to the outside, so that the adsorption component is in an atmospheric pressure environment. There is no adsorption force between the adsorption component and the photomask, and the adsorption component can release the photomask.

[0074] In some embodiments of this specification, reference continues to be made to... Figure 2 The control component M1 may also include a control line M16, and the control switch M131 may be connected to the suction part M12 through the control line M16 to control the on / off state of the suction part M12.

[0075] In other embodiments, the control switch M131 may also be directly connected to the suction unit M12. This specification does not limit this embodiment, as long as the control switch M131 can control the on / off state of the suction unit M12.

[0076] In some embodiments of this specification, the suction unit M12 is a vacuum pump. In other embodiments, the suction unit M12 is a micro pump or other device or apparatus capable of suctioning gas.

[0077] In practical implementation, different types of power supplies can be used to power the control components, depending on the specific application scenario. For example, a power supply (such as a battery) can be built into the control component; or the control component can be equipped with a power supply port, allowing it to be powered by an external power source. This specification does not limit the embodiments in this regard, as long as it can provide power to the control components.

[0078] It is understood that the above description of the control components is merely illustrative. In practical applications, those skilled in the art can adaptively select and / or modify the structure and connection relationships of the control components in the above examples according to actual needs and application scenarios. This can lead to more implementation schemes, and the embodiments in this specification do not limit these extended schemes.

[0079] For example, Figure 2 The control switch M131 is implemented via a button. In other examples, the control switch M131 can also be other devices with switching states, such as push-button switches, toggle switches, etc. Furthermore, the projections of the base M11 and the handheld part M13 are both rectangular structures. In other examples, the projections of the base M11 and the handheld part M13 can also be other structures. For yet another example... Figure 2 The diagram shows two vacuum lines M14 and M15 in the control component M1. In other examples, there may be 3, 4, or more vacuum lines.

[0080] In some embodiments of this specification, as previously described, the vacuum tubing of the control component passes through the cavity in the extension rod and connects to the suction component. Therefore, in specific implementations, the extension rod may be provided with a connection hole near the first end of the extension rod, through which the vacuum tubing can be connected to the adsorption component.

[0081] Reference Figure 3 The diagram shown here is an exploded view of a photomask suction device according to an embodiment of this specification. Figure 3 The diagram shown is a schematic diagram of the exploded structure of the adsorption component M2 in an embodiment of this specification.

[0082] In the embodiments described in this specification, such as Figure 3 As shown, the adsorption component M2 may include: a first support M21 and an adsorption part M22, wherein:

[0083] The first bracket M21 has a first surface and a second surface opposite to each other. The first surface is connected to the first end of the extension rod M3, and the second surface is connected to the adsorption part M22.

[0084] The adsorption section M22, through the connecting hole ( Figure 3 (Not shown) is connected to the vacuum line of the control component to form a suction channel.

[0085] Connecting the adsorption unit and the extension rod via the first bracket reduces the vibration force transmitted to the adsorption unit, ensuring its stability and preventing the photomask from detaching, thus improving stability during photomask removal. Furthermore, the adsorption unit, through the connecting hole, forms a suction channel with the vacuum pipeline, allowing it to be located within the cavity and ensuring the continuity of the gas suction process.

[0086] In some embodiments of this specification, such as Figure 3 As shown, the first bracket M21 is in the shape of a cross or an X, with four corners.

[0087] In other embodiments, the first support M21 may also be disc-shaped. The shape of the first support M21 is not limited in this specification, as long as it can be connected to the adsorption part.

[0088] In a specific implementation, the adsorption section may include: a second support, an adsorption element, and a connector, wherein:

[0089] The second support has a third surface and a fourth surface opposite to each other, the third surface being connected to the second surface of the first support; the adsorption member is fixedly connected to the second support and includes an adsorption surface with adsorption holes provided on the adsorption surface; the connector is disposed on the adsorption member and has a hollow structure to pass through the adsorption holes and the vacuum pipeline.

[0090] Specifically, since the second support is fixedly connected to the adsorption element, the extension rod and the adsorption part can be connected by connecting the third surface of the second support to the second surface of the first support. Furthermore, a hollow connector on the adsorption element allows passage between the adsorption surface and the vacuum pipeline, forming a corresponding suction channel. Gas in the adsorption part is drawn out by the suction element through this suction channel, and the adsorption surface of the adsorption part can adsorb the photomask.

[0091] As a specific example, such as Figure 3 As shown, the second support M221 has the same shape as the first support M21, both being "cross" or "X" shaped, and having four corners. Correspondingly, the adsorption element (e.g., Figure 3 The adsorption elements M222 to M225 shown can be fixedly connected to the four corners of the second support M221, and the adsorption elements have adsorption surfaces (for example, all adsorption elements M222 to M225 have adsorption surfaces, and the adsorption surfaces are located on the side of adsorption elements 222 to 225 that is inward along the paper surface), and the adsorption surfaces can be in direct contact with the photomask.

[0092] In other embodiments, when both the second support M221 and the first support M21 are disc-shaped, the adsorption member can also be fixedly connected to any area of ​​the second support M221.

[0093] It is understandable that in the adsorption section with the above structure, each adsorption element is provided with a connecting element, and the suction element can draw gas from each adsorption section through the suction channel formed by each connecting element and the vacuum pipeline.

[0094] In actual use, the inventors discovered that if any adsorption element in the adsorption section is in an abnormal working state (for example, the adsorption element is damaged or the adsorption surface is blocked and cannot generate adsorption force), the adsorption force distribution on the adsorption surface is uneven. During the removal process, the photomask may fall off, or the generated adsorption force may not be able to adsorb the photomask.

[0095] For example, such as Figure 3 As shown, if the adsorption element M222 is damaged, there will be no adsorption force between the adsorption surface of the adsorption element M222 and the photomask when the photomask is removed, and the photomask may fall off.

[0096] Therefore, in some embodiments of this specification, reference will continue to be made to... Figure 3 The adsorption section M22 may also include multiple connecting pipes and multiple adsorption elements, wherein at least two adsorption elements are provided on the same side, and the adsorption elements located on different sides of the second support are connected by corresponding connecting pipes.

[0097] In practice, each connecting pipeline can operate independently.

[0098] As a specific example, continue to refer to Figure 3 The adsorption unit M22 may include two connecting pipes M228 and M229 (since the connecting pipes 228 and 229 are located on the fourth surface of the second support M221, therefore...) Figure 3 In the diagram, the connecting pipe is indicated by dashed lines. There are four adsorption elements M222 to M225. Two adsorption elements M222 and M223 are provided on the same side of the second support M221, and two adsorption elements M224 and M225 are provided on the other side of the second support M221. The adsorption elements M222 and M224 located on different sides of the second support can be connected by the connecting pipe M229.

[0099] Continue to refer to Figure 3 The adsorption elements M222 and M223, and M224 and M225, which are located on the same side of the second bracket M221, can be arranged along the extension direction. The adsorption elements that are located opposite each other on both sides of the second bracket M221 and at diagonal positions are connected by corresponding connecting pipes. For example, the adsorption elements M222 and M224 that are located opposite each other on both sides of the second bracket M221 and at diagonal positions can be connected by connecting pipe M229, and the adsorption elements M223 and M225 that are located opposite each other on both sides of the second bracket M221 and at diagonal positions can be connected by connecting pipe M228.

[0100] By adopting the above connection method, since the adsorption components that are arranged opposite each other on both sides of the second support and are in diagonal positions are connected by a connecting pipe, that is, at least two adsorption components in diagonal positions share a suction channel and different suction channels operate independently. Even if the working state of one suction channel is abnormal, at least two adsorption components in diagonal positions can still generate a relatively uniform adsorption force on the adsorption surface and can still adsorb the photomask, thus improving the reliability of the photomask suction device.

[0101] In the embodiments described in this specification, reference continues to be made to... Figure 3 , Figure 3 The dashed arrow L in the diagram illustrates the correspondence between the corners of the first bracket M21 and the second bracket M221. In practice, the first bracket M21 and the second bracket M221 can be connected as shown by arrow L.

[0102] It should be noted that the above description of the adsorption component is merely illustrative. In practical applications, those skilled in the art can adaptively select and / or modify the structure and connection relationships of the control components in the above examples according to actual needs and application scenarios. This can lead to more implementation schemes, and the embodiments in this specification do not limit these extended schemes.

[0103] For example, Figure 3In the examples, the projections of adsorption elements M222 to M225 are all rectangular; in other examples, the projections of adsorption elements M222 to M225 can be annular structures. For example... Figure 3 The illustration shows connector M227 located on adsorption element M225 and connector M226 located on adsorption element M224. In other examples, connector M227 may be located on adsorption element M222 and connector M226 may be located on adsorption element M223; for example... Figure 3 Only two connectors are shown in the illustration. In other examples, there may be four connectors, each located on a corresponding adsorption component.

[0104] In specific implementation, we will continue to refer to Figure 3 The photomask suction device M may also include an elastic element M4, which is coupled between the first bracket M21 and the second bracket M224.

[0105] More specifically, the elastic element M4 can be coupled between the second surface of the first bracket M21 and the third surface of the second bracket M224.

[0106] By setting an elastic element M4 between the first support M21 and the second support M224, the elastic element M4 plays a buffering role, which can reduce the vibration during the photomask adsorption process, so that the adsorption surface of the adsorption element can fit more tightly against the photomask surface, further improving the reliability of the photomask adsorption device.

[0107] As a specific example, such as Figure 3 As shown, the elastic element M4 may include springs M41 to M44, and springs M41 to M44 may be coupled between the four corresponding corners of the first bracket M21 and the second bracket M221.

[0108] It is understood that the types and quantities of the aforementioned elastic elements, as well as their positions between the first and second supports, are illustrated by examples. Figure 3 The first bracket M21 and the second bracket M221 are both "cross" or "X" shaped. Therefore, by coupling the four springs M41 to M44 to the opposite diagonals of the first bracket M21 and the second bracket M221, the first bracket M21 and the second bracket M221 can be connected.

[0109] In other examples, when both the first and second supports are disc-shaped, the spring can be located between the opposite edges of the first and second supports; or the elastic component can be other elastic objects such as rubber bands.

[0110] In the embodiments described in this specification, by drawing gas from the adsorption section, a corresponding adsorption force can be generated to remove the photomask from the photolithography equipment. In actual implementation, the adsorption force may be insufficient; please refer to the following... Figure 3The light cover suction device M2 may also include: multiple sealing elements M61 to M64, which are disposed on the adsorption surface of each adsorption element.

[0111] For example, sealing element M61 can be disposed on the adsorption surface of adsorption element M222, sealing element M62 can be disposed on the adsorption surface of adsorption element M225, sealing element M63 can be disposed on the adsorption surface of adsorption element M223, and sealing element M64 can be disposed on the adsorption surface of adsorption element M224.

[0112] By setting sealing elements on the adsorption surfaces of each adsorption element, the vacuum sealing of each adsorption surface can be improved, the adsorption force between each adsorption surface and the photomask can be increased, and the photomask suction device can have stronger adsorption.

[0113] It should be noted that the number of seals and their positions on the adsorption surface described above are merely illustrative. In actual implementation, the number and position of the seals can be flexibly set according to requirements. The embodiments in this specification do not limit the number of seals.

[0114] During the removal of the photomask, due to the large number of internal components and the complex gripping path of the lithography equipment, it is necessary to adjust the position of the photomask fixture within the lithography equipment to adapt to different types of lithography equipment.

[0115] In some embodiments of this specification, the photomask suction device may further include: a posture adjustment component, which is disposed in the cavity of the extension rod and rotatably connected to the control component and the suction component, and is adapted to adjust the relative posture of the suction component and the extension rod.

[0116] As a specific example, in conjunction with the reference Figure 2 and Figure 3 The pose adjustment assembly may include: a transmission rod M52, a connecting member M51, and a rotating member M53, wherein:

[0117] The first end of the connector M51 is connected to the first end of the transmission rod M52, and the second end is connected to the first end of the rotating member M53.

[0118] The second end of the transmission rod M52 is fixedly connected to the base M11;

[0119] The second end of the rotating component M53 is connected to the suction assembly.

[0120] Specifically, since the extension rod M3 and the handheld part M13 in the embodiments of this specification are rotatably connected, a driving force can be generated when the handheld part M13 is rotated. The driving force can be transmitted to the connecting part M51 through the transmission rod M52. Since the first end of the rotating part M53 is connected to the connecting part M51 and the second end is connected to the suction assembly (specifically, to the first bracket M21), the rotating part M53 can rotate under the drive of the driving force, thereby realizing the adjustment of the relative position of the suction assembly and the extension rod. Thus, the photomask suction device can adapt to different usage environments or lithography equipment with complex structures, and has greater flexibility and versatility.

[0121] In some embodiments of this specification, such as Figure 4 The connecting member M51 and the rotating member M53 can adjust the relative position of the suction assembly and the extension rod through the meshing of the transmission gear.

[0122] The following combination Figures 1 to 4 This specification details the process by which the photomask holder adsorbs the photomask in the embodiments of this specification.

[0123] When the control switch M131 is pressed, the control switch M131 is in the first state and can output an adsorption control signal to the suction component M12, so that the suction component M12 is in the working state. The suction component M12 can draw gas from the adsorption components M222 to M225 through the vacuum pipes M14 and M15, connectors M226 and M227, and connecting pipes M228 and M229 that are installed in the cavity M31. The adsorption surfaces of the adsorption components M222 to M225 can generate adsorption force to adsorb the photomask.

[0124] When the grasping path is complex, for example, when there is an angle between the extension directions of the adsorption component M2 and the extension rod M3, since the extension rod M3 and the handheld part M13 in this embodiment are rotatably connected, a corresponding driving force can be generated by rotating the handheld part M13. The driving force can be transmitted to the connecting part M51 through the transmission rod M52. Since the first end of the rotating part M53 is connected to the connecting part M51 and the second end is connected to the first bracket M21, the rotating part M53 can rotate under the drive of the driving force, thereby realizing the adjustment of the relative position of the suction component and the extension rod.

[0125] During the removal of the photomask, the control switch M131 is always in the first state, and the adsorption components M222 to M225 can continuously adsorb the photomask.

[0126] When the photomask is removed from the photolithography equipment, the control switch M131 can be released. The control switch M131 is in the second state and can output a discharge control signal to the suction component M12, so that the suction component M12 is in the closed state. The gas drawn from the adsorption components M222 to M225 is discharged through the suction channel formed by the vacuum pipes M14 and M15, the connectors M226 and M227, and the connecting pipes M228 and M229. The adsorption component M2 can release the photomask.

[0127] It is understood that terms such as "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with terms such as "first" and "second" may explicitly or implicitly include one or more of that feature.

[0128] Furthermore, terms such as "first" and "second" are used to distinguish similar objects and are not necessarily used to describe a specific order or indicate importance. It is understood that such terms can be used interchangeably where appropriate so that the embodiments described herein can be implemented in orders other than those illustrated or described herein.

[0129] While the embodiments disclosed in this specification are as described above, the present invention is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A photomask suction cup, characterized in that, include: An adsorption component and a control component are provided, and an extension rod is disposed between the control component and the adsorption component. The extension rod has a cavity formed inside and a connection hole is provided on the extension rod, the connection hole being near a first end of the extension rod; wherein: The control component is coupled to the adsorption component and is adapted to draw gas from the adsorption component in response to an adsorption control signal to form a negative pressure environment; the control component includes: a vacuum tube, a cavity passing through the extension rod, and its second end being connected to the adsorption component; The adsorption assembly is suitable for adsorbing a photomask under negative pressure; wherein, the adsorption assembly includes a first support and an adsorption part, the first support has a first surface and a second surface opposite to each other, the first surface is connected to a first end of the extension rod, and the second surface is connected to the adsorption part; the adsorption part is connected to the vacuum pipeline of the control assembly through the connection hole to form a suction channel; The adsorption unit includes a second support, an adsorption element, and a connector. The second support has a third surface and a fourth surface, the third surface of which is connected to the second surface of the first support. The adsorption element is fixedly connected to the second support and includes an adsorption surface with adsorption holes. The connector is disposed on the adsorption element and has a hollow structure to pass through the adsorption holes and the vacuum pipeline.

2. The photomask suction cup according to claim 1, characterized in that, The control component is also adapted to release the gas drawn from the adsorption component in response to a release control signal, thereby creating an atmospheric pressure environment. The adsorption component is also adapted to release the photomask under normal pressure.

3. The photomask suction cup according to claim 2, characterized in that, The control component also includes: Base; A suction element, housed within the base, is adapted to be electrically connected to a power source and, in response to the adsorption control signal, to suction gas; and, in response to the venting control signal, to vent gas; and is connected to the first end of the vacuum line. The handheld part is connected to the base and has a control switch. The control switch is connected to the suction component and has a first state and a second state. When it is in the first state, it outputs the adsorption control signal to put the suction component into working state; when it is in the second state, it outputs the discharge control signal to put the suction component into closed state.

4. The photomask suction cup according to claim 3, characterized in that, The suction component is a vacuum pump.

5. The photomask suction cup according to claim 1, characterized in that, The adsorption section further includes: multiple connecting pipes and multiple adsorption elements, the multiple adsorption elements being disposed opposite to each other on both sides of the second support, wherein at least two adsorption elements are disposed on the same side, and the adsorption elements located on different sides of the second support are connected by corresponding connecting pipes.

6. The photomask suction cup according to claim 5, characterized in that, The adsorption element located on the same side of the second bracket is arranged along the extension direction; The adsorption components, which are positioned diagonally on both sides of the second support, are connected by corresponding connecting pipes.

7. The photomask suction cup according to claim 5 or 6, characterized in that, Also includes: An elastic element is coupled between the first bracket and the second bracket.

8. The photomask holder according to any one of claims 5 or 6, characterized in that, Also includes: Multiple sealing elements are provided on the adsorption surface of each adsorption element.

9. The photomask suction cup according to claim 3, characterized in that, Also includes: The position adjustment component is inserted into the cavity of the extension rod and is rotatably connected to the control component and the suction component, and is suitable for adjusting the relative position of the suction component and the extension rod.

10. The photomask suction cup according to claim 9, characterized in that, The pose adjustment assembly includes: a transmission rod, a connecting member, and a rotating member, wherein: The connecting member has a first end connected to the first end of the transmission rod and a second end connected to the first end of the rotating member. The transmission rod has its first end fixedly connected to the base and its second end fixedly connected to the connector. The rotating component has its second end connected to the suction assembly.

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