Optical absorbent

Abstract

Absorbents and their use are disclosed in the present specification. The absorbent is an organic absorbent. The resin composition exhibits excellent compatibility or solubility with various solvents and resin components, and has excellent heat resistance. Therefore, the optical performance thereof can be stably maintained even under high-temperature or high-temperature / high-humidity conditions. By applying the absorbent, it is possible to provide an absorbent film that achieves desired optical properties. The present specification also discloses the use of the absorbent or the absorbent film.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application is based on and claims the benefit of priority of Korean Patent Application No. 10-2023-0181831 filed in the Korean Intellectual Property Office on December 14, 2023, the disclosure of which is incorporated herein in its entirety by reference. Technical Field

[0003] This specification relates to optical absorbers and their uses. Background Art

[0004] Light absorbers, such as absorbers capable of absorbing light in the infrared region, can be applied to various applications. For example, since image capture devices or infrared sensors using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) image sensors include silicon photodiodes having sensitivity to the near infrared region, they can use light absorbers.

[0005] There are many ways to apply these absorbents, but a method using a coating solution is generally applied, which mixes the absorbent dissolved in a solvent with a resin component. Therefore, the absorbent must show excellent solubility or compatibility with both the solvent and the resin component.

[0006] If the solubility or compatibility of the absorbent with the solvent or resin component is poor, the desired spectral characteristics cannot be obtained for the absorbent film to which the absorbent is applied, or the optical characteristics deteriorate due to the phenomenon that the absorbent precipitates within the absorbent film. Therefore, it is a difficult task to obtain an absorbent that simultaneously exhibits excellent solubility or compatibility with various types of solvents and resin components.

[0007] Absorbers can be divided into inorganic absorbers and organic absorbers. Organic absorbers are easy to apply and can easily control the wavelength of light to be absorbed, so they can effectively reduce the transmittance of the desired light.

[0008] However, since organic absorbers have lower heat resistance than inorganic absorbers, the optical properties of the absorber or a film containing the absorber may deteriorate after being exposed to high temperature conditions or high temperature and high humidity conditions. Summary of the invention

[0009] This specification discloses absorbents and their uses.

[0010] An object of the present specification is to disclose an organic absorbent which exhibits excellent compatibility or solubility with various solvents and resin components.

[0011] Another object of the present specification is to disclose an organic absorbent having excellent heat resistance and capable of stably maintaining optical properties even when maintained under high temperature conditions or high temperature and high humidity conditions.

[0012] Another object of the present specification is to disclose an optical filter which can ensure desired optical properties by applying an absorbent.

[0013] According to one embodiment of the present invention, there is provided an absorbent comprising a cation represented by Formula 1:

[0014] [Formula 1]

[0015]

[0016] wherein A1 to A3 are each independently hydrogen, halogen, alkyl, alkenyl, alkynyl, alkoxy, aryl or aralkyl; L1 is -U1-T1-U2-T2-U3-, wherein T1 and T2 are each independently oxygen atoms or absent, and U1 to U3 are each independently alkylene group, alkylidene group, group), alkenylene or alkynylene or does not exist; R1 and R2 form an absorption edge; R3 to R6 or R5 to R8 among R3 to R8 form an absorption edge; and the substituents that do not form an absorption edge among R3 to R8 are each independently hydrogen, halogen, hydroxyl, cyano, nitro, carboxyl, alkyl, alkoxy, aryl, aralkyl, alkylcarbonylamino, aralkylcarbonylamino, halogenated alkylsulfonylamino, alkylsulfonylamino, aralkylsulfonylamino or amino; and the dotted line in Formula 1 is a single bond or a double bond, wherein R2 does not exist if the dotted line is a double bond; and if the dotted line is a double bond, a cationic site is formed on the nitrogen atom connected to the dotted line.

[0017] In one embodiment, for the absorbent, in Formula 1, A1 to A3 are each independently an alkyl group, an alkynyl group, an alkenyl group, or an alkoxy group.

[0018] In one embodiment, the absorbent satisfies one of conditions 1 to 3:

[0019] Condition 1: In Formula 1, T1, T2, U1 and U3 do not exist and U2 is an alkylene group, an alkylene group, an alkenylene group or an alkynylene group;

[0020] Condition 2: In Formula 1, U1 and U3 do not exist; one of T1 and T2 is oxygen and the other does not exist; and U2 is an alkylene group, an alkylene group, an alkenylene group or an alkynylene group; and

[0021] Condition 3: U3 and T2 do not exist; T1 is an oxygen atom, and U1 and U2 are each independently an alkylene group; an alkylene group, an alkenylene group or an alkynylene group.

[0022] In one embodiment, for the absorbent, the substituents in R3 to R8 that do not form an absorption edge are each independently hydrogen, halogen, hydroxy, cyano, nitro, carboxyl, alkyl, alkoxy, alkylsulfonylamino, or amino.

[0023] In one embodiment, the cation is represented by Formula 2 and Formula 3:

[0024] [Formula 2]

[0025]

[0026] [Formula 3]

[0027]

[0028] In Formula 2, R9 and R 10 Each independently is hydrogen, alkyl or a substituent of formula 3, wherein R9 and R 10 At least one of them is a substituent of formula 3; R 11 To R 13 R 11 and R 12 or R 12 and R 13 Together they form an absorbing edge; R 14 To R 16 R 14 and R 15 or R 15 and R 16 Together they form an absorbing edge; R 11 To R 16 The substituents not forming an absorption edge in the group are each independently hydrogen, halogen, hydroxyl, cyano, nitro, carboxyl, alkyl, alkoxy, aryl, aralkyl, alkylcarbonylamino, aralkylcarbonylamino, haloalkylsulfonylamino, alkylsulfonylamino, aralkylsulfonylamino or amino; R 17 and R 18 Each is independently hydrogen, halogen or alkyl, or connected to form a ring structure; R 19 To R 23 Each is independently hydrogen, halogen or alkyl; and n is a number greater than or equal to 1; and L1 is -U1-T1-U2-T2-U3-, wherein T1 and T2 are each independently an oxygen atom or do not exist, and U1 to U3 are each independently an alkylene group, an alkylene group, an alkenylene group, an alkynylene group or do not exist, and L1 is connected to the nitrogen atom in Formula 2; and in Formula 3, A1 to A3 are each independently hydrogen, halogen, alkyl, alkenyl, alkynyl, alkoxy, aryl or aralkyl.

[0029] In one embodiment, for the absorbent, R9 and R in Formula 2 10 is a substituent in Formula 3.

[0030] In one embodiment, the absorber exhibits maximum absorption in the wavelength range of 600 nm to 950 nm.

[0031] In one embodiment, the absorbent has a 5% pyrolysis temperature of 190°C or higher.

[0032] According to another embodiment of the present invention, there is provided a composition comprising a resin component and an absorbent.

[0033] In another embodiment, for the composition, the resin component includes at least one or more selected from the group consisting of cyclic olefin (COP) based resins, polyester resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, and polyarylene ether phosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins and silicone resins.

[0034] In another embodiment, the composition further comprises a solvent.

[0035] According to yet another embodiment, there is provided an absorbent film including a resin component and an absorbent.

[0036] In yet another embodiment, for the absorbent film, the resin component includes at least one or more selected from the group consisting of cycloolefin (COP) based resins, polyester resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, and polyarylether phosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins and silicone resins.

[0037] In yet another embodiment, the absorbing film exhibits maximum absorption in the wavelength range of 600 nm to 950 nm.

[0038] In yet another embodiment, the absolute value of ΔA in Equation 1 is 10% or less:

[0039] [Equation 1]

[0040] △A=100×(A f -A i ) / A i ,

[0041] Where A in equation 1 f is the transmittance at the maximum absorption wavelength of the absorbing film after the absorbing film is kept at 85°C and 85% relative humidity for 120 hours, and A iIt is the transmittance at the maximum absorption wavelength of the absorption film before the absorption film is kept at 85° C. and 85% relative humidity for 120 hours; and for the absorption film, the maximum absorption wavelength exists in the wavelength range of 600 nm to 950 nm.

[0042] In yet another embodiment, the absolute value of Δλ in Equation 2 is 10% or less:

[0043] [Equation 2]

[0044] △λ=100×(λ f -λ i ) / λ i ,

[0045] Where λ in Equation 2 f is the maximum absorption wavelength of the absorber film after the absorber film is kept at 85°C and 85% relative humidity for 120 hours, and λ i It is the maximum absorption wavelength of the absorption film before the absorption film is kept under the conditions of 85° C. and 85% relative humidity for 120 hours; and for the absorption film, the maximum absorption wavelength exists in the wavelength range of 600 nm to 950 nm.

[0046] According to yet another embodiment, there is provided an optical filter including: a substrate; and an absorption film formed on one side or both sides of the substrate.

[0047] According to yet another embodiment, an image capture device is provided that includes a filter.

[0048] According to yet another embodiment, there is provided an infrared sensor including an absorption film. BRIEF DESCRIPTION OF THE DRAWINGS

[0049] Figures 1 to 3 is a diagram showing an exemplary structure of an optical filter of the present invention.

[0050] Figures 4 to 6 : are spectra showing the light absorption characteristics of the absorption films containing the absorbents of Examples 1 to 3 before and after the high temperature / high humidity evaluation.

[0051] Figures 7 to 9 : are spectra showing the light absorption characteristics of the absorption films containing the absorbents of Comparative Examples 1 to 3 before and after the high temperature / high humidity evaluation. DETAILED DESCRIPTION

[0052] For those physical properties that may be affected by the measurement temperature results mentioned in the present invention, unless otherwise specified, it is measured at room temperature. The term "room temperature" used in the present invention refers to a natural temperature that is not heated or reduced, for example, it refers to any temperature in the range of 10°C to 30°C, a temperature of about 23°C or about 25°C. In addition, in this specification, unless otherwise specified, the temperature unit is Celsius (°C).

[0053] In the physical properties mentioned in this specification, in the case where the pressure of measurement affects the result, unless otherwise specified, the physical properties are physical properties measured under atmospheric pressure. The term "atmospheric pressure" refers to the natural pressure without pressurization or decompression. It usually means an atmosphere of about 1 atmosphere, and its value is about 740mmHg to 780mmHg.

[0054] In the physical properties mentioned in this specification, in the case where humidity affects the results, unless otherwise specified, the relevant physical properties are those measured under standard humidity. Humidity under standard conditions refers to any humidity within the range of 40% to 60% relative humidity, for example, about 40% or 60% relative humidity.

[0055] When an optical property (eg, a refractive index) mentioned in this specification is a property that changes according to wavelength, the optical property is a property of light having a wavelength of 520 nm unless otherwise specified.

[0056] In this specification, the term "transmittance", "reflectance" or "absorbance" refers to the actual transmittance (actual transmittance), actual reflectance (actual reflectance) or actual absorptivity (actual absorption ratio) confirmed at a specific wavelength or wavelength range in a predetermined area, unless otherwise explicitly specified. In this specification, unless otherwise explicitly specified, the term transmittance, reflectance or absorptivity refers to the transmittance, reflectance and absorptivity with respect to an incident angle of 0°.

[0057] In this specification, unless otherwise specifically defined, the term "average transmittance" is a result obtained by measuring the transmittance of each wavelength in a specific wavelength range while increasing the wavelength by 1 nm from the shortest wavelength, and then calculating the arithmetic mean of the measured transmittances. For example, the average transmittance in the wavelength range of 350 nm to 360 nm may be the arithmetic mean of the transmittances measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0058] In this specification, the term "maximum transmittance" refers to the maximum transmittance when the transmittance of each wavelength is measured while increasing the wavelength by 1 nm from the shortest wavelength in a specific wavelength range. For example, the maximum transmittance in the wavelength range of 350nm to 360nm may refer to the highest transmittance measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm and 360nm.

[0059] In this specification, unless otherwise specifically defined, the term "average reflectivity" is a result obtained by measuring the reflectivity of each wavelength while increasing the wavelength by 1 nm from the shortest wavelength in a predetermined wavelength range, and then calculating the arithmetic mean of the measured reflectivities. For example, the average reflectivity in the wavelength range of 350 nm to 360 nm may be the arithmetic mean of the reflectivities measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0060] In this specification, the term "maximum reflectivity" refers to the maximum reflectivity when the reflectivity of each wavelength is measured while increasing the wavelength by 1 nm from the shortest wavelength in a specific wavelength range. For example, the maximum reflectivity in the wavelength range of 350nm to 360nm may refer to the highest reflectivity measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm and 360nm.

[0061] In this specification, unless otherwise specifically defined, the term "average absorbance" is a result obtained by measuring the absorbance of each wavelength while increasing the wavelength by 1 nm from the shortest wavelength in a predetermined wavelength range, and then calculating the arithmetic mean of the measured absorbances. For example, the average absorbance in the wavelength range of 350 nm to 360 nm may be the arithmetic mean of absorbances measured at wavelengths of 350 nm, 351 nm, 352 nm, 353 nm, 354 nm, 355 nm, 356 nm, 357 nm, 358 nm, 359 nm, and 360 nm.

[0062] In this specification, the term "maximum absorbance" refers to the maximum absorbance when the absorbance of each wavelength is measured while increasing the wavelength by 1 nm from the shortest wavelength in a specific wavelength range. For example, the maximum absorbance in the wavelength range of 350nm to 360nm may refer to the highest absorbance measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm and 360nm.

[0063] In this specification, "incident angle" is an angle measured relative to the normal of the surface to be evaluated. For example, "transmittance at a filter incident angle of 0°" refers to the transmittance of light incident in a direction substantially parallel to the normal of the filter surface. In addition, for example, an incident angle of 40° is a value where the incident light forms an angle of approximately 40° with the normal in a clockwise or counterclockwise direction. This definition of the incident angle is also applicable to other characteristics such as transmittance.

[0064] In this specification, the term "alkyl" refers to an alkyl having 1 to 20 carbon numbers, 1 to 16 carbon numbers, 1 to 12 carbon numbers, 1 to 8 carbon numbers, or 1 to 4 carbon numbers. The alkyl group may be straight chain, branched chain, or cyclic. The alkyl group may be optionally substituted with one or more substituents. Unless otherwise indicated, these contents apply to all alkyl groups mentioned in the specification.

[0065] In this specification, the term "alkoxy" refers to an alkoxy group having 1 to 20 carbon numbers, 1 to 16 carbon numbers, 1 to 12 carbon numbers, 1 to 8 carbon numbers, or 1 to 4 carbon numbers. The alkoxy group can be straight chain, branched or cyclic. The alkoxy group can be optionally substituted with one or more substituents. Unless otherwise indicated, these contents apply to all alkoxy groups mentioned in the specification.

[0066] In this specification, the term "alkenyl" refers to an alkenyl having 2 to 20 carbon numbers, 2 to 16 carbon numbers, 2 to 12 carbon numbers, 2 to 8 carbon numbers or 2 to 4 carbon numbers. The alkenyl can be straight chain, branched or cyclic. The alkenyl can be optionally substituted with one or more substituents. Unless otherwise indicated, these contents apply to all alkenyls mentioned in the specification.

[0067] In this specification, the term "alkynyl" refers to an alkynyl having 2 to 20 carbon numbers, 2 to 16 carbon numbers, 2 to 12 carbon numbers, 2 to 8 carbon numbers, or 2 to 4 carbon numbers. The alkynyl can be straight chain, branched or cyclic. The alkynyl can be optionally substituted with one or more substituents. Unless otherwise indicated, these contents apply to all alkynyls mentioned in the specification.

[0068] In this specification, the term "aryl" refers to a monovalent portion derived from aromatic hydrocarbons, and the aryl can be an aryl with 6 to 36 carbon numbers, 6 to 30 carbon numbers, 6 to 24 carbon numbers, 6 to 18 carbon numbers or 6 to 12 carbon numbers. For example, it can be phenyl, tolyl, xylyl or naphthyl. The aryl can be optionally substituted with one or more substituents. Unless otherwise indicated, these contents apply to all aryl groups mentioned in the specification.

[0069] In the present specification, the term "aralkyl group" refers to an alkyl group substituted with at least one aryl group, in which case the specific type of aryl group is as described above. This applies to all aralkyl groups mentioned in the present specification unless otherwise specifically stated.

[0070] In this specification, the term "alkylene" refers to a divalent functional group that removes two hydrogens from an alkane, and also refers to a functional group that removes a hydrogen atom from one carbon of an alkane. This alkylene can be an alkylene with 1 to 20 carbon numbers, 1 to 16 carbon numbers, 1 to 12 carbon numbers, 1 to 8 carbon numbers, or 1 to 4 carbon numbers. The alkylene can be straight chain, branched or cyclic. The alkylene can be arbitrarily substituted with one or more substituents. Unless otherwise specified, this applies to all alkylenes mentioned in this specification.

[0071] In this specification, the term "alkylene group" refers to a divalent functional group that removes two hydrogen atoms from an alkane, and it also means that one hydrogen atom is removed from each of two different carbons of an alkane. Such an alkylene group can be an alkylene group with 2 to 20 carbon numbers, 2 to 16 carbon numbers, 2 to 12 carbon numbers, 2 to 8 carbon numbers, or 2 to 4 carbon numbers. The alkylene group can be straight chain, branched or cyclic. The alkylene group can be arbitrarily replaced by one or more substituents. Unless otherwise specifically stated, this applies to all alkylene groups mentioned in the specification.

[0072] In this specification, the term "alkenylene" can be an alkenylene having 2 to 20 carbon numbers, 2 to 16 carbon numbers, 2 to 12 carbon numbers, 2 to 8 carbon numbers, or 2 to 4 carbon numbers. The alkenylene can be straight chain, branched or cyclic. The alkenylene can be arbitrarily substituted by one or more substituents. Unless otherwise specifically stated, this applies to all alkenylenes mentioned in the specification.

[0073] In this specification, the term "alkynylene" can be an alkynylene having 2 to 20 carbon numbers, 2 to 16 carbon numbers, 2 to 12 carbon numbers, 2 to 8 carbon numbers, or 2 to 4 carbon numbers. The alkynylene can be straight chain, branched or cyclic. The alkynylene can be arbitrarily substituted by one or more substituents. Unless otherwise specifically stated, this applies to all alkynylenes mentioned in the specification.

[0074] The present specification discloses an absorbent. The term "absorbent" refers to a compound that can absorb light within a specific wavelength range.

[0075] The absorbent may be a compound containing a cation represented by the following Formula 1 or a cation containing a moiety represented by the following Formula 1. The absorbent may exhibit excellent heat resistance, desired optical properties, and excellent compatibility with a resin component and / or a solvent through a silyl group bonded to a nitrogen atom in the following Formula 1.

[0076] [Formula 1]

[0077]

[0078] In Formula 1, A1 to A3 can be hydrogen, halogen, alkyl, alkenyl, alkynyl, alkoxy, aryl or aralkyl, each independently of the other. In Formula 1, L1 can be a divalent functional group represented by "-U1-T1-U2-T2-U3-". In this divalent functional group, T1 and T2 can be oxygen atoms or do not exist, and U1 to U3 can be alkylene, alkylene, alkenylene or alkynylene, each independently of the other or do not exist. In the above, the absence of a symbol means that the atoms on both sides of the corresponding symbol are directly connected. For example, in the above, when an element other than T1 exists but T1 does not exist, the divalent functional group can be expressed as "-U1-U2-T2-U3-".

[0079] R1 and R2 in Formula 1 may form an absorption edge. R3 to R6 or R5 to R8 in R3 to R8 may also form an absorption edge. Forming an absorption edge in the above means that the absorbent has a structure that is capable of absorbing light of a desired wavelength as a whole due to a structure formed by a substituent or a structure formed at a position where a substituent exists. The absorption stage will be described later. In Formula 1, other substituents in R3 to R8 that do not form an absorption edge may each independently be hydrogen, halogen, hydroxyl, cyano, nitro, carboxyl, alkyl, alkoxy, aryl, aralkyl, alkylcarbonylamino, aralkylcarbonylamino, alkylsulfonylamino, halogenated alkylsulfonylamino, aralkylsulfonylamino or amino.

[0080] In Formula 1, the dotted line indicates that the dotted line is a single bond between nitrogen and carbon or a double bond between nitrogen and carbon. When the dotted line in Formula 1 is a double bond between nitrogen and carbon, R2 does not exist among R1 and R2, and R1 forms an absorption edge. In addition, when the dotted line is a double bond between nitrogen and carbon, the nitrogen atom in Formula 1 becomes a cationic site.

[0081] The absorption edge refers to the part of the absorber that has a structure that allows it as a whole to absorb light of the desired wavelength. For example, the absorption edge can be a framework or structure with a so-called resonant structure and / or conjugated bonds.

[0082] It is known that light absorption by absorbers, especially organic absorbers, is due to the energy difference (ΔE) between the ground state and the excited state. This difference is explained by the energy difference between the HOMO (highest occupied molecular orbital) and the LUMO (lowest unoccupied molecular orbital).

[0083] Generally, the organic absorber includes a resonance structure and / or a conjugated bond as an absorption edge, which can exhibit a light absorption effect. Therefore, R1 and R2 (or R1 when the dotted line in Formula 1 is a double bond) and R3 to R6 or R5 to R8 are connected to a framework that allows the absorber to exhibit the desired light absorption characteristics as a whole, including a resonance structure and / or a conjugated bond, or together form such a framework.

[0084] The absorption edge or framework may not be particularly limited to a specific type. It is well known that the resonance effect refers to the interaction between a lone electron pair in a molecule and an adjacent π-bonded electron pair. Substituents or frameworks that cause such resonance effects are well known. In addition, a conjugated bond is a system consisting of two or more double bonds with a single bond between them. It is well known that as the number of conjugated bonds increases, the energy difference decreases and the absorption band moves to the long-wave range.

[0085] For example, the absorption edge may be a framework or structure that allows the compound of the present invention to exhibit maximum absorption in the wavelength range of 600 nm to 950 nm. In other words, the compound may exhibit a maximum absorption wavelength in the range of 600 nm to 950 nm. The lower limit of the maximum absorption wavelength may be about 600nm, 610nm, 620nm, 630nm, 640nm, 650nm, 660nm, 670nm, 680nm, 690nm, 700nm, 710nm, 720nm, 730nm, 740nm, 750nm, 760nm, 770nm, 780nm, 790nm, 800nm ​​or 810nm, and the upper limit may be about 950nm, 940nm, 930nm, 920nm, 910nm, 900nm, 890nm, 880nm, 870nm, 860nm, 850nm, 840nm, 830nm, 820nm, 810nm, 800nm, 790nm, 780nm or 770nm. The maximum absorption wavelength may be in a range equal to or exceeding any one of the above lower limits; in a range equal to or lower than any one of the above upper limits; or in a range equal to or exceeding any one of the above lower limits and equal to or lower than any one of the above upper limits.

[0086] As described above, the resonance structure and the conjugated bond are determined by the energy difference (ΔE) between the ground state and the excited state of the compound or the energy difference between HOMO (highest occupied molecular orbital) and LUMO (lowest unoccupied molecular orbital). Since the energy difference is determined and the maximum absorption wavelength is determined by the energy difference, the structure of the absorption edge can be determined so that the compound can have a maximum absorption wavelength within the above range.

[0087] In Formula 1, alkyl, alkenyl, alkynyl, alkoxy, aryl, aralkyl, alkylene, alkylene, alkenyl, alkynyl, alkylcarbonylamino, aralkylcarbonylamino, halogenated alkylsulfonylamino, aralkylsulfonylamino, alkylsulfonylamino and amino may be arbitrarily substituted with one or more substituents. In this case, the substituted substituent may include halogen (such as fluorine or chlorine), alkyl, alkenyl, alkynyl and alkoxy, aryl, aralkyl, hydroxyl, cyano, nitro, carboxyl, alkylcarbonylamino, aralkylcarbonylamino, aralkylsulfonylamino, alkylsulfonylamino or amino, but are not limited thereto.

[0088] In Formula 1, A1 to A3 may each independently be an alkyl group, an alkynyl group, an alkenyl group, or an alkoxy group, or may be an alkyl group in appropriate examples, but they are not limited thereto.

[0089] In Formula 1, in appropriate examples, the divalent functional group represented by "-U1-T1-U2-T2-U3-" may satisfy any one of the following conditions 1 to 3. For example, the divalent functional group may be a functional group in which T1, T2, U1, and U3 are absent and U2 is an alkylene group, an alkylene group, an alkenylene group, or an alkynylene group (condition 1). In this case, the divalent functional group may be represented by "-U2-".

[0090] In another example, the divalent functional group may be a functional group in which U1 and U3 do not exist, either T1 or T2 is oxygen and the other does not exist, and U2 is an alkylene group, an alkylene group, an alkenylene group, or an alkynylene group (condition 2). In this case, the divalent functional group becomes a functional group represented by "-O-U2-" or "-U2-O-".

[0091] In another example, the divalent functional group may be a functional group in which U3 and T2 are absent, T1 is an oxygen atom, and U1 and U2 are each independently an alkylene group, an alkylene group, an alkenylene group, or an alkynylene group (condition 3). In this case, the divalent functional group becomes a functional group represented by "-U1-OU2-".

[0092] In a suitable example, in R3 to R8 of Formula 1, the substituents that do not form an absorption edge or are not connected to an absorption edge are each independently hydrogen, halogen, hydroxyl, cyano, nitro, carboxyl, alkyl, and alkoxy, alkylsulfonylamino, or amino, or hydrogen, alkyl, alkylsulfonylamino, or amino. However, they are not limited thereto.

[0093] Compound (absorbent) can have suitable molal mass level.For example, the lower limit of molal mass can be about 400g / mol, 450g / mol, 500g / mol, 550g / mol, 600g / mol, 650g / mol, 700g / mol or 750g / mol.The upper limit of molal mass can be about 2000g / mol, 1900g / mol, 1800g / mol, 1700g / mol, 1600g / mol, 1500g / mol, 1400g / mol, 1300g / mol, 1200g / mol, 1100g / mol, 1000g / mol, 950g / mol, 900g / mol, 850g / mol or 800g / mol. The molar mass may be in a range equal to or exceeding any of the above lower limits; in a range equal to or lower than any of the above upper limits; or in a range equal to or exceeding any of the above lower limits and equal to or lower than any of the above upper limits.

[0094] The absorbent may have excellent heat resistance. For example, the absorbent may have a 5% thermal decomposition temperature ("Td 5%") within a predetermined range. For example, the lower limit of Td 5% of the absorbent may be about 190°C, 200°C, 210°C, 220°C, or 230°C, and the upper limit may be 400°C, 380°C, 360°C, 340°C, 320°C, 300°C, 280°C, 275°C, 270°C, 265°C, 260°C, 255°C, 240°C, 235°C, 230°C, 225°C, 220°C, or 215°C. Td 5% may be in a range equal to or exceeding any of the above lower limits; in a range equal to or lower than any of the above upper limits; or in a range equal to or exceeding any of the above lower limits and equal to and lower than or lower than any of the above upper limits.

[0095] Td 5% is a value obtained by TGA (thermogravimetric analysis). It is a value obtained by TGA (thermogravimetric analysis) analysis at a temperature range of 25°C to 800°C, a heating rate of 10°C / min, and a temperature of 60 cm 3 The value when the weight loss is 5% (Td5%) confirmed under a nitrogen (N2) atmosphere at a rate of 1 / min.

[0096] In one example, the absorbent may be a compound represented by Formula 2 below.

[0097] [Formula 2]

[0098]

[0099] In the structure of Formula 2, the conjugated structure formed between nitrogen atoms may be a framework of the absorption edge formed by R1 and R2 of Formula 1 above.

[0100] In formula 2, R9 and R 10 Each of R9 and R1 can be independently hydrogen, alkyl or a substituent of the following formula 3. 10 At least one of them may be a substituent of the following formula 3, and R9 and R 10 All of them may be substituents of the following formula 3.

[0101] In formula 2, R 11 To R 13 In, R 11 and R 12 can together form an absorbing edge, or R 12 and R 13 can form an absorption edge together. In formula 2, R 14 To R 16 In, R 14 and R 15 can together form an absorbing edge, or R 15 and R 16 can form an absorption edge together. In formula 2, R 11 To R 16 Specific types of the substituents not forming an absorption edge in are the same as those of the substituents not forming an absorption edge in R3 to R8 in Formula 1.

[0102] In Formula 2, "n" is an arbitrary number. For example, the lower limit of "n" may be about 0 or 1, and the upper limit may be about 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. "n" is in a range equal to or greater than any of the above lower limits; in a range equal to or less than any of the above upper limits; or in a range equal to or greater than any of the above lower limits and equal to or less than any of the above upper limits.

[0103] [Formula 3]

[0104]

[0105] In Formula 3, L1 is connected to the nitrogen atom in Formula 2. The specific type of L1 in Formula 3 is the same as that of L1 in Formula 1. The specific types of A1 to A3 in Formula 3 are also the same as those of A1 to A3 in Formula 1, respectively.

[0106] The present specification also discloses an absorbent composition comprising the above absorbent. The term "absorbent composition" may refer to a mixture containing an absorbent and other components, or a mixture containing two or more absorbents.

[0107] This absorbent composition basically contains the absorbent of formula 1 or formula 2, and may additionally contain other necessary components. For example, the composition may also include a resin component used as an adhesive. In this case, there is no particular restriction on the type of the resin component used. Known resin components for forming an absorption film, such as a near-infrared absorption film, may be applied. In the present application, the absorbent component may exhibit appropriate compatibility or solubility with various known resin components.

[0108] The example of resin component can include one or more selected from the following: cycloolefin (COP) based resin, polyarylate resin, polyester resin, polysulfone resin, polyethersulfone resin, polyparaphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyetherimide resin, polyamide-imide resin, acrylic resin, polycarbonate resin, polyethylene naphthalate resin or silicone resin, or various other organic resins or organic-inorganic hybrid resins, but not limited thereto. Although not particularly limited, the compound of this specification can be mixed with the cycloolefin (COP) based resin in the resin component used as a known adhesive, to form a resin film showing excellent performance. Therefore, in an example, the resin component can be a cycloolefin (COP) based resin.

[0109] When applying resin component, there is no particular restriction on its ratio.For example, resin component can exist so that the weight ratio of compound and 100 weight parts of resin component is in the range of 0.001 weight part to 10 weight parts.In other examples, the lower limit of the weight ratio of compound and 100 weight parts of resin component can be about 0.001 weight part, 0.005 weight part, 0.01 weight part, 0.05 weight part, 0.1 weight part, 0.5 weight part, 1 weight part, 1.1 weight parts, 1.2 weight parts, 1.3 weight parts or 1.4 weight parts, and the upper limit can be about 10 weight parts, 9 weight parts, 8 weight parts, 7 weight parts, 6 weight parts, 5 weight parts, 4 weight parts, 3 weight parts, 2 weight parts or 1.5 weight parts.This ratio can be in the range of being equal to and greater than or greater than any one of the above-mentioned lower limit and being equal to and less than or less than any one of the above-mentioned upper limit.

[0110] For example, the absorbent composition may further include a solvent in which the absorbent and / or the resin component are dispersed. In this case, there is no particular limitation on the type of solvent used, and any known solvent for forming a resin film, such as a near-infrared resin film, may be used. In this specification, the absorbent component may exhibit appropriate compatibility or solubility in various known solvents.

[0111] Examples of solvents include dichloromethane, cyclohexanone, toluene, methyl ethyl ketone, methyl isobutyl ketone, propylene glycol methyl ether acetate, diethylene glycol monoethyl ether 3-methoxybutanol, ethylene glycol monobutyl ether acetate, 4-hydroxy-4-methyl-2-pentanone, γ-butyrolactone, pyridone, chloroform, 1,4-dioxane, o-dichlorobenzene, chlorobenzene, aliphatic alcohols (e.g., isobutyl alcohol, isopropyl alcohol, ethanol, isopropyl alcohol, butanol, etc.) having 2 or more carbon numbers, butyl acetate, tetrahydrofuran, or xylene, but are not limited thereto. When the solvent is applied, the ratio is not particularly limited, and the ratio can be adjusted within a range that allows the absorbent and / or the resin component to be properly dispersed.

[0112] In addition to the above components, the absorbent composition may further include other necessary components, for example, an absorbent different from the absorbent of Formula 1 or 2, and the like.

[0113] The present specification also discloses the use of the absorbent composition or absorbent. For example, it may be about an absorbent film to which the absorbent composition or absorbent is applied.

[0114] The absorbent film may contain at least a resin component and an absorbent. In this case, the specific type of the resin component and the ratio of the resin component to the absorbent are as described in the absorbent composition section.

[0115] The absorption film may be a film capable of absorbing light within a predetermined range of wavelengths. In one example, the absorption film may be an infrared absorption film or a near-infrared absorption film. For example, such an absorption film may exhibit absorption characteristics in at least a portion of a wavelength range within a range of about 600 nm to 950 nm.

[0116] For example, the absorption film can exhibit a maximum absorption wavelength in the range of 600nm to 950nm. In another example, the lower limit of the maximum absorption wavelength can be about 600nm, 610nm, 620nm, 630nm, 640nm, 650nm, 660nm, 670nm, 680nm, 690nm, 700nm, 710nm, 720nm, 730nm, 740nm, 750nm, 760nm, 770nm, 780nm, 790nm, 800nm ​​or 810nm. In addition, the upper limit of the maximum absorption wavelength can be about 950nm, 940nm, 930nm, 920nm, 910nm, 900nm, 890nm, 880nm, 870nm, 860nm, 850nm, 840nm, 830nm, 820nm, 810nm, 800nm, 790nm, 780nm, 770nm, 760nm, 750nm, 740nm, 730nm, 720nm, 710nm, 700nm, 690nm, 680nm, 670nm, 660nm, 650nm, 640nm, 630nm, 620nm or 610nm. The maximum absorption wavelength can be equal to or longer than any one of the above lower limits and equal to or lower than any one of the above upper limits. Due to these characteristics, the absorption film can be applied to various devices such as optical filters and infrared sensors because it can provide excellent optical characteristics such as preventing the deviation phenomenon depending on the incident angle, and provide physical properties such as excellent heat resistance.

[0117] For example, the absorption film may have an absolute value of ΔA in the following Equation 1 within a predetermined range.

[0118] [Equation 1]

[0119] △A=100×(A f -A i ) / A i .

[0120] In equation 1, A f is the transmittance at the maximum absorption wavelength of the resin film after the resin film is kept at 85° C. and 85% relative humidity for 120 hours, and A i It is the transmittance at the maximum absorption wavelength of the resin film before the resin film is kept at 85° C. and 85% relative humidity for 120 hours. The maximum absorption wavelength exists in the wavelength range of 690 nm to 950 nm.

[0121] The upper limit of the absolute value of ΔA in Equation 1 may be about 20%, 19%, 18%, 17%, 16%, 15%, 14%, 13%, 12%, 11%, 10%, 9%, 8%, 7%, 6%, 5%, or 4.5%, and the lower limit may be 0%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, or 7%. The absolute value of ΔA may be in a range equal to or lower than any of the above upper limits, or in a range equal to or higher than any of the above lower limits and equal to or lower than any of the upper limits.

[0122] In equation 1, A f and A i The upper limit of each of can be about 40%, 35%, 30%, 25%, 20%, 19%, 18%, 17%, 16%, 15%, 14%, 13%, 12%, 11%, 10%, 9%, 8% or 7%, and the lower limit can be about 0%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 5.5%, 6%, 6.5%, 7%, 7.5% or 8%. f and A i Each of may be in a range equal to or lower than any of the above upper limits, or in a range equal to or higher than any of the above lower limits and equal to or lower than any of the above upper limits.

[0123] In the following Equation 2, the absolute value of Δλ of the absorption film may be 10% or less.

[0124] [Equation 2]

[0125] △λ=100×(λ f -λ i ) / λ i .

[0126] In Equation 2, λ f is the maximum absorption wavelength of the resin film after being kept at 85°C and 85% relative humidity for 120 hours, and λ i It is the maximum absorption wavelength of the resin film before being kept at 85°C and 85% relative humidity for 120 hours. The maximum absorption wavelength exists in the wavelength range of 690nm to 950nm.

[0127] In other examples, the upper limit of the absolute value of Δλ in Equation 2 may be approximately 10%, 9%, 8%, 7%, 6%, 5%, 4%, 3%, 2%, 1%, or 0.5%, and the lower limit may be approximately 0%, 0.5%, or 1%. The absolute value of Δλ may be within a range equal to or greater than any of the above lower limits and equal to or less than any of the above upper limits.

[0128] In Equation 2, λ f and λ i and λ may be in the range of 600 nm to 950 nm, respectively. f and λ i The lower limit of each of λ may be about 600 nm, 610 nm, 620 nm, 630 nm, 640 nm, 650 nm, 660 nm, 670 nm, 680 nm, 690 nm, 700 nm, 710 nm, 720 nm, 730 nm, 740 nm, 750 nm, 760 nm, 770 nm, 780 nm, or 790 nm. f and λ i The upper limit of λ may be about 950nm, 940nm, 930nm, 920nm, 910nm, 900nm, 890nm, 880nm, 870nm, 860nm, 850nm, 840nm, 830nm, 820nm, 810nm, 800nm, 790nm, 780nm, 770nm, 760nm, 750nm, 740nm, 730nm, 720nm, 710nm, 700nm, 690nm, 680nm, 670nm, 660nm, 650nm, 640nm, 630nm, 620nm or 610nm. f and λ i Each of can be in a range equal to or greater than any one of the above lower limits and equal to or lower than any one of the above upper limits.

[0129] Through the absorption characteristics, the absorption film can be applied to various devices such as optical filters and infrared sensors to effectively realize the desired characteristics. The absorption film can be formed in a known manner as long as the absorbent composition or absorbent is applied. For example, the absorbent composition can be applied in an appropriate manner, and if necessary, a curing or drying process can be performed to form the absorption film.

[0130] There is no particular limitation on the thickness of the absorption film, and the thickness can be adjusted according to the desired characteristics. In one example, the absorption film may have a thickness ranging from about 0.5 μm to about 20 μm.

[0131] The specification also discloses an optical filter, which may include a substrate and an absorption film formed on one side or both sides of the substrate.

[0132] Figure 1 1 is an example of an optical filter in which the absorption film 200 is formed on one side of the substrate 100. By including the above resin film, the optical filter of the present specification can exhibit excellent performance. For example, the optical filter can efficiently and accurately block unnecessary infrared light and achieve a visible light transmission band with high transmittance.

[0133] There is no particular limitation on the type of transparent substrate applied to the optical filter, and a known transparent substrate for the optical filter can be used. In one example, the substrate can be a so-called infrared absorption substrate. An infrared absorption substrate is a substrate that exhibits absorption characteristics in at least a portion of the near-infrared region. The so-called blue glass is a representative example of an infrared absorption substrate, which exhibits the above-mentioned characteristics by containing copper. Such an infrared absorption substrate can be used to construct an optical filter that blocks light in the infrared region, but due to its absorption characteristics, it is disadvantageous in ensuring high transmittance in the visible light region and is also disadvantageous in durability. In the present specification, by appropriately selecting an infrared absorption substrate and combining it with a specific resin film, a filter that effectively blocks the desired light, exhibits high transmittance characteristics in the visible light region, and has excellent durability can be provided.

[0134] For infrared absorbing substrates, substrates exhibiting an average transmittance of 75% or more in the range of 425 nm to 560 nm can be used. In another example, the average transmittance can be in the range of about 77% or more, 79% or more, 81% or more, 83% or more, 85% or more, 87% or more, or 89% or more, and / or 98% or less, 96% or less, 94% or less, 92% or less, or 90% or less.

[0135] For infrared absorbing substrates, substrates showing a maximum transmittance of 80% or more in the range of 425nm to 560nm may be used. In another example, the maximum transmittance may be in the range of about 82% or more, 84% or more, 86% or more, 88% or more, or 90% or more and / or 100% or less, 98% or less, 96% or less, 94% or less, 92% or less, or 90% or less.

[0136] For infrared absorbing substrates, substrates showing an average transmittance of 75% or more in the range of 350 nm to 390 nm may be used. In another example, the average transmittance may be in the range of 77% or more, 79% or more, 81% or more, or 83% or more and / or 98% or less, 96% or less, 94% or less, 92% or less, 90% or less, 88% or less, 86% or less, or 84% or less.

[0137] For infrared absorbing substrates, substrates showing a maximum transmittance of 80% or more in the range of 350 nm to 390 nm may be used. In another example, the maximum transmittance may be in the range of 82% or more, 84% or more, 86% or more, or 87% or more and / or 100% or less, 98% or less, 96% or less, 94% or less, 92% or less, 90% or less, or 88% or less.

[0138] For infrared absorbing substrates, substrates with a transmittance in the range of 10% to 45% at a wavelength of 700 nm can be used. In another example, the transmittance can be about 43% or less, 41% or less, 39% or less, 37% or less, 35% or less, 33% or less, 31% or less, 29% or less, or 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more, or 28% or more.

[0139] For infrared absorption substrates, substrates exhibiting an average transmittance in the range of 5% to 30% in the wavelength range of 700 nm to 800 nm can be used. In another example, the average transmittance can be in the range of 7% or more, 9% or more, 11% or more, 13% or more, 15% or more, 15.5% or more, 16% or more, or 16.5% or more and / or 28% or less, 26% or less, 24% or less, 22% or less, 20% or less, 18% or less, or 17% or less.

[0140] For infrared absorption substrates, substrates exhibiting a maximum transmittance in the range of 10% to 45% in the wavelength range of 700 nm to 800 nm can be used. In another example, the maximum transmittance may be in the range of 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more, or 28% or more and / or 43% or less, 41% or less, 39% or less, 37% or less, 35% or less, 33% or less, 31% or less, or 29% or less.

[0141] For the infrared absorption substrate, a substrate showing an average transmittance in the range of 3% to 20% in the wavelength range of 800nm ​​to 1000nm can be used. In another example, the average transmittance can be further adjusted in the range of 5% or more, 7% or more, 9% or more, or 11% or more and / or 18% or less, 16% or less, 14% or less, or 12% or less.

[0142] For infrared absorption substrates, substrates exhibiting a maximum transmittance in the range of 5% to 30% in the wavelength range of 800 nm to 1000 nm may be used. In another example, the maximum transmittance may be in the range of 7% or more, 9% or more, 11% or more, 13% or more, or 15% or more and / or 28% or less, 26% or less, 24% or less, 22% or less, 20% or less, 18% or less, or 16% or less.

[0143] For infrared absorption substrates, substrates exhibiting an average transmittance in the range of 10% to 50% in the wavelength range of 1000 nm to 1200 nm can be used. In another example, the average transmittance can be further adjusted in the range of 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more or 25% or more and / or 48% or less, 46% or less, 44% or less, 42% or less, 40% or less, 38% or less, 36% or less, 34% or less, 32% or less, 30% or less, 28% or less or 26% or less.

[0144] For an infrared absorbing substrate, a maximum transmittance in the range of 10% to 70% in the wavelength range of 1000 nm to 1200 nm may have a transmission band. In another example, the maximum transmittance may be 12% or more, 14% or more, 16% or more, 18% or more, 20% or more, 22% or more, 24% or more, 26% or more, 28% or more, 30% or more, 32% or more, 34% or more, or 36% or more and / or 68% or less, 66% or less, 64% or less, 62% or less, 60% or less, 58% or less, 56% or less, 54% or less, 52% or less, 50% or less, 48% or less, 46% or less, 44% or less, 42% or less, 40% or less, 38% or less, or 37% or less.

[0145] The infrared absorption substrate can be combined with an absorption film to form the desired filter. As such a substrate, a substrate called so-called infrared absorption glass can be used. This glass is an absorption glass made by adding CuO or a similar composition to a fluorophosphate-based glass or a phosphate-based glass. Therefore, in one embodiment of the present specification, a CuO-containing fluorophosphate glass substrate or a CuO-containing phosphate glass substrate can be used as an infrared absorption substrate. Phosphate glass also includes K-phosphate glass, in which a part of the glass structure is composed of SiO2. Since such absorption glass is well known, for example, the glass disclosed in Korean Patent No. 10-2056613 or other commercially available absorption glass (for example, commercial products of Hoya, Schott, PTOT, etc.) can be used.

[0146] Such infrared absorbing substrates contain copper. In the present specification, substrates with a copper content in the range of 1 wt % to 7 wt % may be used. In other examples, the copper content may be about 1.5 wt % or more, 2 wt % or more, 2.5 wt % or more, 2.6 wt % or more, 2.7 wt % or more, or 2.8 wt % or more, or 6.5 wt % or less, 6 wt % or less, 5.5 wt % or less. It may be less than 5 wt %, less than 4.5 wt %, less than 4 wt %, less than 3.5 wt %, less than 3 wt %, or less than 2.9 wt %. Substrates with such copper content may exhibit the above-mentioned optical properties and may be combined with a resin film to form an optical filter with the desired properties.

[0147] The copper content can be confirmed by using an X-ray fluorescence analysis device (WD XRF, wavelength dispersive X-ray fluorescence spectrometry). When X-rays are irradiated from the device to the sample (substrate), each element of the sample will produce characteristic secondary X-rays, and the device can detect the secondary X-rays of each element wavelength. The intensity of the secondary X-rays is proportional to the element content, so quantitative analysis can be performed by the intensity of the secondary X-rays. The thickness of the infrared absorption substrate can be adjusted within a wavelength range of, for example, about 0.03 mm to 5 mm, but is not limited thereto.

[0148] In addition to the substrate and the absorption film, the optical filter may further include other known components as desired. For example, the dielectric layer may further include a so-called dielectric layer located on one side or both sides of the substrate.

[0149] Figure 2 and Figure 3 1 is an example of an optical filter to which the dielectric film 300 is added, and shows a case where the dielectric film 300 is formed on one side or both sides of a stacked structure including the substrate 100 and the resin film 200 .

[0150] This dielectric film is a film composed of a dielectric material having a low refractive index and a dielectric material having a high refractive index repeatedly stacked. It is also used to form a so-called IR reflective layer and an anti-reflection (AR) layer. In the present specification, such a known IR reflective layer or a dielectric film for forming an AR layer can be applied. Therefore, the dielectric film can have a multilayer structure including at least two types of sublayers, each sublayer having a different refractive index, and can include a multilayer structure in which two types of sublayers are repeatedly stacked.

[0151] The material forming the dielectric film, in other words, the material forming each sub-layer is not particularly limited, and known materials can be applied. Generally, SiO2 or fluorides such as Na5Al3F14, Na3AlF6 or MgF2 can be used to make the low refractive index sub-layer, and amorphous silicon, TiO2, Ta2O5, Nb2O5, ZnS or ZnSe, etc. can be used to make the high refractive index sub-layer, but the materials used in this specification are not limited thereto.

[0152] In one example, the dielectric film included in the filter may have a shortest wavelength of 710 nm or longer that exhibits 50% reflectivity in the wavelength range of 600 nm to 900 nm, or the wavelength may not exist. In addition, when the above wavelength does not exist, the maximum reflectivity of the dielectric film is less than 50% in the wavelength range of 600 nm to 900 nm. In another example, the shortest wavelength (if present) exhibiting 50% reflectivity may be 715 nm or longer, 720 nm or longer, 725 nm or longer, 730 nm or longer, 735 nm or longer, 740 nm or longer, 745 nm or longer, 750 nm or longer, or 754 nm or longer, or 900 nm or shorter, 850 nm or shorter, 800 nm or shorter, 790 nm or shorter, 780 nm or shorter, 770 nm or shorter, or 760 nm or shorter. The shortest wavelength indicating a reflectance of 50% may be within the range of the lower limit and the upper limit of the above lower limits, and in this case, the upper limit may be 900 nm.

[0153] By controlling the reflection characteristics of the dielectric film as described above, the so-called petal flare phenomenon can be prevented. The "petal flare phenomenon" refers to a phenomenon in which a red line that cannot be observed by the naked eye appears in a photo when shooting a luminous object, etc., so it is called the petal flare phenomenon because the red line usually has a petal shape depending on the luminous object. As the sensitivity of the sensor included in the image capture device increases and the transmittance of the filter increases to obtain a clearer image, the frequency of occurrence of petal flare is also increasing.

[0154] The repeated reflection of near-infrared light within an image capture device equipped with an optical filter can be considered as one of the causes of the petal flare phenomenon. In the dielectric film generally formed in the optical filter, because the so-called IR film is specially formed to block light in the near-infrared region by reflection, the shortest wavelength at which the dielectric film exhibits 50% reflectivity is formed near visible light, generally shorter than 710nm. However, the reflection of near-infrared light is accelerated by this dielectric film within the image capture device, so that the petal flare phenomenon occurs.

[0155] However, in the present invention, even when the shortest wavelength at which the dielectric film exhibits 50% reflectivity is adjusted to 710 nm or longer, infrared light can be effectively blocked, and thus the petal flare phenomenon can also be prevented. The design method for controlling the reflective characteristics of a dielectric film is known per se.

[0156] As an absorption film different from the absorption film, the filter may further include an absorption film exhibiting ultraviolet absorption characteristics (referred to as "ultraviolet absorption film"). However, the absorption film is not an essential component, for example, the ultraviolet absorber described later may be introduced into one absorption film together with the absorber of Formula 1 above.

[0157] In one example, the ultraviolet absorbing film may be designed to exhibit maximum absorption in a wavelength range of about 300 nm to 390 nm.The ultraviolet absorbing film may contain only an ultraviolet absorber, or may include two or more types of ultraviolet absorbers if necessary.

[0158] For example, as the ultraviolet absorber, a known absorber that exhibits maximum absorption in the wavelength range of about 300 nm to 390 nm can be used. Examples thereof may include ABS 407 of Exiton; UV381A, UV381B, UV382A, UV386A, VIS404A of QCR Solutions Corp; ADA1225, ADA3209, ADA3216, ADA3217, ADA3218, ADA3230, ADA5205, ADA3217, ADA2055, ADA6798, ADA3102, ADA3204, ADA3210, ADA2041, ADA3201, ADA3202, , ADA3219, ADA3225, ADA3232, ADA4160, ADA5278, ADA3279 of HW Sands. A5762, ADA6826, ADA7226, ADA4634, ADA3213, ADA3227, ADA5922, ADA5950, ADA6752, ADA7130, ADA8212, ADA2984, ADA2999, ADA3220, ADA3228, ADA3235, ADA3240, ADA3211, ADA3221, 5220, ADA7158; and CRYSTALYN's DLS 381B, DLS 381C, DLS 382A, DLS 386A, DLS 404A, DLS 405A, DLS 405C, DLS 403A, etc., but not limited to.

[0159] The materials and construction methods used to construct the ultraviolet absorbing film are not particularly limited, and known materials and configuration methods can be applied. Generally, the ultraviolet absorbing film is formed by using a material mixed with a transparent resin and an ultraviolet absorber capable of showing the desired maximum absorption. At this time, the transparent resin can be a resin component applied to the absorbent composition. In addition to the above-mentioned layers, a filter can be added so that various necessary layers do not impair the desired effect.

[0160] In the present specification, an image capture device including an optical filter is also disclosed. At this time, there is no particular limitation on the configuration of the image capture device or the application method of the optical filter, and known configurations and application methods can be applied. In addition, the use of the optical filter is not limited to the image capture device, and can be applied to various other applications (for example, display devices such as PDP) that require near-infrared cutoff.

[0161] The specification also discloses an infrared sensor including an absorption film. The configuration of the infrared sensor is not particularly limited as long as it includes an absorption film. For example, it can be configured by introducing the absorption film of the present invention into a known motion sensor, proximity sensor or gesture sensor.

[0162] The application of the absorbent composition or absorbent film is not limited to optical filters, infrared sensors and / or image capture devices. The absorbent composition or absorbent film can be applied to various other applications requiring infrared cutoff (for example, display devices such as PDP).

[0163] The absorbent will be described in detail through the following examples, but the scope of the absorbent is not limited to the following examples.

[0164] 1. Maximum absorption measurement method

[0165] The maximum absorption was evaluated by conventional methods. Specifically, the sample was -5 The concentration of M was dissolved in a chloroform solvent and then evaluated by using a measuring device (Agilent, Varian Cary 4000).

[0166] 2. Transmission spectrum evaluation

[0167] Use spectrophotometer (manufacturer: Perkelmer, product name: Lambda 750 spectrophotometer) to measure the transmission spectrum on the sample, and the sample is obtained by cutting the measurement object (such as absorption film) so that the width and height are 10mm and 10mm respectively. Measure the transmission spectrum of each wavelength according to the equipment manual. The sample is placed on a straight line between the measurement beam and the detector of the spectrophotometer, and the transmission spectrum is confirmed by setting the incident angle of the measurement beam to 0°. The incident angle of 0° is a direction substantially parallel to the normal direction of the sample surface. The average transmittance within a specific wavelength range in the transmission spectrum is the result of measuring the transmittance at each wavelength while increasing the wavelength by 1nm from the shortest wavelength in the wavelength range, and then calculating the arithmetic mean of the measured transmittance. The maximum transmittance is the maximum transmittance in the transmittance measured while increasing the wavelength by 1nm, and the minimum transmittance is the minimum transmittance in the transmittance measured while increasing the wavelength by 1nm. For example, the average transmittance in the wavelength range of 350nm to 360nm is the arithmetic mean of the transmittances measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm and 360nm. The maximum transmittance in the wavelength range of 350nm to 360nm is the highest transmittance among the transmittances measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm and 360nm, and the minimum transmittance in the wavelength range of 350nm to 360nm is the lowest transmittance among the transmittances measured at wavelengths of 350nm, 351nm, 352nm, 353nm, 354nm, 355nm, 356nm, 357nm, 358nm, 359nm and 360nm.

[0168] 3. Solubility measurement method

[0169] The solubility of the absorbent was evaluated. The solubility was determined according to the following criteria by evaluating the solubility of the absorbent in a solvent (MC, dichloromethane) at room temperature (about 25°C).

[0170] <Solubility Judgment Criteria>

[0171] A: When the solubility is 1 mass% or more

[0172] B: When the solubility is 0.5 mass% or more and less than 1 mass%

[0173] C: When the solubility is 0.2 mass % or more and less than 0.5 mass %

[0174] D: When the solubility is less than 0.2 mass%

[0175] 4. Pyrolysis temperature (Td 5%) analysis

[0176] Thermogravimetric analysis (TGA) of the compounds was performed using Scinco's TGA N-1000 equipment. About 3 mg of sample (compound) was used for the analysis, and the analysis was performed at a temperature range of 25°C to 800°C, a heating rate of 10°C / min, and a temperature of 60 cm 3 The decomposition temperature was 95% (Td 5%) and the decomposition temperature was 95% (Td 5%).

[0177] 5. Mass Analysis (LC-Mass)

[0178] The synthesized compound was subjected to mass spectrometry analysis using a liquid chromatograph / mass spectrometer (manufactured by Thermo Fisher Scientific).

[0179] Example 1

[0180] An ionic compound (A1) containing a cation of Formula A and an anion of Formula B is synthesized according to the following Chemical Reaction Formula 1.

[0181] [Formula A]

[0182]

[0183] [Formula B]

[0184]

[0185] [Chemical reaction formula 1]

[0186]

[0187] 1.1 g (1.62 mmol) of compound A in chemical reaction formula 1 and 0.56 g (1.94 mmol) of lithium bis(trifluoromethanesulfonyl)imide were dissolved in 30 mL of dichloromethane, and then 30 mL of water was added. The reaction was carried out at room temperature (about 25 ° C) for about 2 hours. After the reaction, the dichloromethane layer and the water layer were separated by an extractor and then concentrated. 100 mL of ethanol was added and filtered under reduced pressure to obtain the target chemical substance (ionic compound A1) (0.4 g, 29.7%) (LC-MS (+) m / z 553.8, LC-MS (-) m / z 279.9).

[0188] Example 2

[0189] An ionic compound (A2) containing a cation of Formula C and an anion of Formula B is synthesized according to the following chemical reaction formula 2.

[0190] [Formula C]

[0191]

[0192] [Formula B]

[0193]

[0194] [Chemical reaction formula 2]

[0195]

[0196] 1.0 g (1.28 mmol) of compound B of chemical reaction formula 2 and 0.56 g (1.94 mmol) of lithium bis(trifluoromethanesulfonyl)imide were dissolved in 30 mL of dichloromethane, and then 30 mL of water was added. The reaction was carried out at room temperature (about 25 ° C) for about 2 hours. After the reaction, the dichloromethane layer and the water layer were separated by an extractor and then concentrated. 100 mL of ethanol was added and filtered under reduced pressure to obtain the target chemical substance (ionic compound A2) (0.5 g, 41.8%) (LC-MS (+) m / z 653.8, LC-MS (-) m / z 280.1).

[0197] Example 3

[0198] An ionic compound (A3) containing a cation of Formula D and an anion of Formula B is synthesized according to the following Chemical Reaction Formula 3.

[0199] [Formula D]

[0200]

[0201] [Formula B]

[0202]

[0203] [Chemical reaction formula 3]

[0204]

[0205] 1.1 g (1.48 mmol) of compound C of chemical reaction formula 3 and 0.56 g (1.94 mmol) of lithium bis(trifluoromethanesulfonyl)imide were dissolved in 30 mL of dichloromethane, and then 30 mL of water was added. The reaction was carried out at room temperature (about 25 ° C) for about 2 hours. After the reaction, the dichloromethane layer and the water layer were separated by an extractor and then concentrated. 100 mL of ethanol was added and filtered under reduced pressure to obtain the target chemical substance (ionic compound A3) (0.3 g, 22.6%) (LC-MS (+) m / z 614.1, LC-MS (-) m / z 280.1).

[0206] Comparative Example 1

[0207] An ionic compound (A4) containing a cation of Formula E and an anion of Formula B is synthesized according to the following chemical reaction formula 4.

[0208] [Formula E]

[0209]

[0210] [Formula B]

[0211]

[0212] [Chemical reaction formula 4]

[0213]

[0214] 2.1 g (3.38 mmol) of compound D of chemical reaction formula 4 and 0.56 g (1.94 mmol) of lithium bis(trifluoromethanesulfonyl)imide were dissolved in 30 mL of dichloromethane, and then 30 mL of water was added. The reaction was carried out at room temperature (about 25 ° C) for about 2 hours. After the reaction, the dichloromethane layer and the water layer were separated by an extractor and then concentrated. 100 mL of ethanol was added and filtered under reduced pressure to obtain the target chemical substance (ionic compound A4) (1.1 g, 42.0%) (LC-MS (+) m / z 493.4, LC-MS (-) m / z 280.0).

[0215] Comparative Example 2

[0216] An ionic compound (A5) containing a cation of Formula F and an anion of Formula B is synthesized according to the following Chemical Reaction Formula 5.

[0217] [Formula F]

[0218]

[0219] [Formula B]

[0220]

[0221] [Chemical reaction formula 5]

[0222]

[0223] 2.5 g (3.47 mmol) of compound E of chemical reaction formula 5 and 0.56 g (1.94 mmol) of lithium bis(trifluoromethanesulfonyl)imide were dissolved in 30 mL of dichloromethane, and then 30 mL of water was added. The reaction was carried out at room temperature (about 25 ° C) for about 2 hours. After the reaction, the dichloromethane layer and the water layer were separated by an extractor and then concentrated. 100 mL of ethanol was added and filtered under reduced pressure to obtain the target chemical substance (ionic compound A5) (1.5 g, 49.5%) (LC-MS (+) m / z 593.5, LC-MS (-) m / z 280.0).

[0224] Comparative Example 3

[0225] An ionic compound (A6) containing a cation of Formula F and an anion of Formula B is synthesized according to the following Chemical Reaction Formula 6.

[0226] [Formula F]

[0227]

[0228] [Formula B]

[0229]

[0230] [Chemical reaction formula 6]

[0231]

[0232] 1.8 g (2.64 mmol) of compound F of chemical reaction formula 6 and 0.56 g (1.94 mmol) of lithium bis(trifluoromethanesulfonyl)imide were dissolved in 30 mL of dichloromethane, and then 30 mL of water was added. The reaction was carried out at room temperature (about 25 ° C) for about 2 hours. After the reaction, the dichloromethane layer and the water layer were separated by an extractor and then concentrated. 100 mL of ethanol was added and filtered under reduced pressure to obtain the target chemical substance (ionic compound A6) (0.9 g, 40.8%) (LC-MS (+) m / z 553.7, LC-MS (-) m / z 280.0).

[0233] Table 1 below summarizes the properties of the absorbents of Examples 1 to 3 and Comparative Examples 1 to 6. In Table 1, Td 5% indicates 5% pyrolysis temperature.

[0234] [Table 1]

[0235]

[0236] Test Example 1

[0237] The coating solution was prepared by mixing a silicone resin (Dow Chemical, RSN-0217), an absorbent and a solvent (cyclohexanone) as a resin component. The mixing ratio of the resin component, the absorbent and the solvent was set to 69.3:0.99:29.7 in terms of weight ratio (resin: absorbent: solvent).

[0238] The coating solution was coated on a transparent substrate (glass substrate manufactured by SCHOTT) and maintained at 140° C. for about 2 hours to form an absorption film with a thickness of about 6 μm. In the above, the absorbents in Examples 1, 2 and 3 and Comparative Examples 1, 2 or 3 were used as absorbents.

[0239] Tables 2 and 3 below summarize the transmittance of the absorber film in the ultraviolet and near-infrared regions before and after the reliability evaluation. The reliability evaluation is an evaluation in which the absorber film is kept at 85°C and 85% relative humidity for 120 hours. In Table 2, B refers to the result before the reliability evaluation, and A refers to the result after the reliability evaluation. In addition, in Table 2, λ max Represents the transmittance at the point of maximum absorption.

[0240] In Tables 2 and 3, Δ is the rate of change (%) of each feature before and after reliability evaluation, calculated as 100×(AB) / B, where A is the value indicated by A in Table 2, and B is the value indicated by B in Table 2. In Table 2, T max Indicates the maximum transmittance in the corresponding wavelength region, T ave represents the average transmittance in the corresponding wavelength region, T min Indicates the minimum transmittance in the corresponding wavelength region.

[0241] [Table 2]

[0242]

[0243] [Table 3]

[0244]

[0245] Test Example 2

[0246] Figures 4 to 6 They are the absorption spectra of the absorption films prepared in Test Example 1 using the absorbers of Examples 1 to 3, respectively. Figures 7 to 9 These are absorption spectra of the absorbent films prepared in the test examples using the absorbents of Comparative Examples 1 to 3, respectively. In the figure, the spectrum before indicating reliability is the result obtained immediately after the absorbent film is prepared, and the spectrum after indicating reliability is the result obtained after the absorbent film was subjected to high temperature / high humidity evaluation. The high temperature / high humidity evaluation refers to an evaluation in which the absorbent film is kept at a temperature of 85°C and a relative humidity of 85% for 120 hours.

[0247] As can be seen from the figure, the absorption film using the absorbents of Examples 1 to 3 maintained the same light absorption characteristics before and after reliability with almost no change. However, when the absorbents of Comparative Examples 1 to 3 were applied, it can be seen that the light absorption characteristics were almost lost after the high temperature / high humidity evaluation.

[0248] The following Tables 4 and 5 summarize the main parameters of each figure. In Tables 4 and 5, A f is the transmittance at the wavelength of maximum absorption of the absorbing film kept at 85°C under 85% relative humidity for 120 hours, λ f is the maximum absorption wavelength in the following situation. A i is the transmittance of the absorbing film at the wavelength of maximum absorption before being kept at 85°C under 85% relative humidity for 120 hours, λ i is the maximum absorption wavelength in the previous case.

[0249] In Tables 4 and 5, △A is calculated by 100×(A f -A i ) / A i The calculated value, △λ is calculated by 100×(λ f -λ i ) / λ i The calculated value.

[0250] [Table 4]

[0251] Example 1 Example 2 Example 3 <![CDATA[A i (%)]]> 11.5 33.5 11.5 <![CDATA[A f (%)]]> 12.3 34.9 12.3 △A(％) 6.6 4.2 6.7 <![CDATA[λ i (nm)]]> 758 790 82. <![CDATA[λ f (nm)]]> 758 790 823 △λ(%) 0 0 0

[0252] [Table 5]

[0253] Comparative Example 1 Comparative Example 2 Comparative Example 3 <![CDATA[A i (%)]]> 21.3 47.1 21.6 <![CDATA[A f (%)]]> 36.0 59.8 33.0 △A(％) 69.0 27.1 52.6 <![CDATA[λ i (nm)]]> 748 784 819 <![CDATA[λ f (nm)]]> 747 785 818 △λ(%) -13 13 -12

[0254] Comparing the results of the various figures and Tables 4 and 5, the absorbents of the examples and the absorbents of the comparative examples are similar in the spectral characteristics of the absorbents themselves, but it can be seen that when the absorbents are applied to an absorption film, there is a significant difference in the absorption characteristics before the high temperature / high humidity evaluation and the absorption characteristics after the high temperature / high humidity evaluation. From this point of view, it can be confirmed that the absorbent of the present invention has excellent compatibility with the resin component forming the absorption film due to its unique structure and has excellent heat resistance, so that it can effectively form an absorption film with excellent performance.

Claims

1. An absorbent comprising a cation represented by Formula 1: [Formula 1] in A1 to A3 are each independently hydrogen, halogen, alkyl, alkenyl, alkynyl, alkoxy, aryl or aralkyl; L1 is -U1-T1-U2-T2-U3-, wherein T1 and T2 are each independently an oxygen atom or absent, and U1 to U3 are each independently an alkylene group, an alkylene group, an alkenylene group or an alkynylene group or absent; R1 and R2 form an absorption edge; R3 to R6 or R5 to R8 among R3 to R8 form an absorption edge; and the substituents in R3 to R8 that do not have an absorption edge are each independently hydrogen, halogen, hydroxyl, cyano, nitro, carboxyl, alkyl, alkoxy, aryl, aralkyl, alkylcarbonylamino, aralkylcarbonylamino, haloalkylsulfonylamino, alkylsulfonylamino, aralkylsulfonylamino or amino; and The dashed line in Formula 1 is a single bond or a double bond, wherein R2 is absent when the dashed line is a double bond; and When the dashed line is a double bond, a cationic site is formed on the nitrogen atom connected to the dashed line. 2 . The absorbent according to claim 1 , wherein in Formula 1, A1 to A3 are each independently an alkyl group, an alkynyl group, an alkenyl group or an alkoxy group.

3. The absorbent according to claim 2, wherein the absorbent satisfies one of conditions 1 to 3: Condition 1: In Formula 1, T1, T2, U1 and U3 do not exist and U2 is an alkylene group, an alkylene group, an alkenylene group or an alkynylene group; Condition 2: In Formula 1, U1 and U3 do not exist; one of T1 and T2 is oxygen and the other does not exist; and U2 is an alkylene group, an alkylene group, an alkenylene group or an alkynylene group; and Condition 3: U3 and T2 do not exist; T1 is an oxygen atom, and U1 and U2 are each independently an alkylene group; an alkylene group, an alkenylene group or an alkynylene group.

4. The absorbent according to claim 1, wherein the substituents without absorption edge in R3 to R8 are each independently hydrogen, halogen, hydroxyl, cyano, nitro, carboxyl, alkyl, alkoxy, alkylsulfonylamino, or amino.

5. The absorbent according to claim 1, wherein the cation is represented by Formula 2 and Formula 3: [Formula 2] and [Formula 3] in In formula 2, R9 and R 10 Each independently is hydrogen, alkyl or a substituent of formula 3, wherein R9 and R 10 At least one of them is a substituent of formula 3; R 11 To R 13 R 11 and R 12 or R 12 and R 13 Together they form an absorbing edge; R 14 To R 16 R 14 and R 15 or R 15 and R 16 Together they form an absorbing edge; R 11 To R 16 The substituents in which no absorption edge exists are each independently hydrogen, halogen, hydroxyl, cyano, nitro, carboxyl, alkyl, alkoxy, aryl, aralkyl, alkylcarbonylamino, aralkylcarbonylamino, haloalkylsulfonylamino, alkylsulfonylamino, aralkylsulfonylamino or amino; R 17 and R 18 Each is independently hydrogen, halogen or alkyl, or connected to form a ring structure; R 19 To R 23 are each independently hydrogen, halogen or alkyl; and n is a number greater than or equal to 1; and L1 is -U1-T1-U2-T2-U3-, wherein T1 and T2 are each independently an oxygen atom or do not exist, and U1 to U3 are each independently an alkylene group, an alkylene group, an alkenylene group, an alkynylene group or do not exist, and L1 is connected to the nitrogen atom in Formula 2; and in Formula 3, A1 to A3 are each independently hydrogen, halogen, alkyl, alkenyl, alkynyl, alkoxy, aryl or aralkyl.

6. The absorbent according to claim 5, wherein R9 and R in Formula 2 10 is a substituent in Formula 3. The absorbent according to claim 1 , wherein the absorbent exhibits maximum absorption in a wavelength range of 600 nm to 950 nm.

8. The absorbent according to claim 1, wherein the 5% pyrolysis temperature of the absorbent is 190°C or higher.

9. A composition comprising a resin component and the absorbent according to claim 1.

10. The composition according to claim 9, wherein the resin component comprises at least one or more selected from the group consisting of cycloolefin (COP)-based resins, polyester resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins, and silicone resins.

11. The composition of claim 9, further comprising a solvent. 12 . An absorbent film comprising a resin component and the absorbent according to claim 1 .

13. The absorption film according to claim 12, wherein the resin component includes at least one or more selected from the group consisting of: cycloolefin (COP)-based resins, polyester resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyparaphenylene resins, and polyarylene ether phosphine oxide resins, polyimide resins, polyetherimide resins, polyamideimide resins, acrylic resins, polycarbonate resins, polyethylene naphthalate resins and silicone resins. The absorption film according to claim 12 , wherein the absorption film exhibits maximum absorption in a wavelength range of 600 nm to 950 nm.

15. The absorption film according to claim 12, wherein the absolute value of ΔA in Equation 1 is 10% or less: [Equation 1] △A=100×(A f -A i ) / A i , in In equation 1, A f is the transmittance at the maximum absorption wavelength of the absorption film after the absorption film is kept at 85° C. and 85% relative humidity for 120 hours, and A i is the transmittance at the maximum absorption wavelength of the absorption film before the absorption film is kept at 85° C. and 85% relative humidity for 120 hours; and The maximum absorption wavelength exists in the wavelength range of 600 nm to 950 nm.

16. The absorption film according to claim 12, wherein the absolute value of Δλ in Equation 2 is 10% or less: [Equation 2] △λ=100×(λ f -l i ) / min i , in In equation 2, λ f is the maximum absorption wavelength of the absorption film after the absorption film is kept at 85° C. and 85% relative humidity for 120 hours, and λ i is the maximum absorption wavelength of the absorption film before the absorption film is kept at 85° C. and 85% relative humidity for 120 hours; and The maximum absorption wavelength exists in the wavelength range of 600 nm to 950 nm. 17 . An optical filter comprising: a substrate; and the absorption film according to claim 12 formed on one side or both sides of the substrate.

18. An image capturing device comprising the filter according to claim 17.

19. An infrared sensor comprising the absorption film according to claim 12.

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