Mask frame assembly for depositing thin film

Abstract

The invention relates to a mask frame assembly. The mask frame assembly for depositing a thin film includes: a mask frame; at least one mask sheet on the mask frame, the at least one mask sheet including a pattern hole including a first pattern hole in a deposition region of the mask sheet and a second pattern hole in a dummy region of the mask sheet between the deposition regions and a non-porous pattern portion, the first pattern holes and the second pattern holes alternate in a first direction, and the non-porous pattern portions are located in a boundary region between the first pattern holes and the second pattern holes; and first support rods spaced apart in the first direction and covering the second pattern hole. The non-porous pattern portion does not include pattern holes and is in the form of a band shape located on at least one edge of one of the deposition regions.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] Korean Patent Application No. 10-2018-0119301, filed on October 5, 2018 with the Korean Intellectual Property Office and entitled “Mask Frame Assembly for Deposition of Thin Film” is incorporated herein by reference in its entirety. Technical Field

[0003] One or more embodiments relate to a mask frame assembly for depositing a thin film. Background Art

[0004] Typically, display devices may be used in mobile devices such as smart phones, laptop computers, digital cameras, camcorders, personal digital assistants, notebook computers, and tablet personal computers, or may be used in electronic devices such as desktop computers, televisions, outdoor billboards, exhibition display devices, vehicle instrument panels, and head-up displays (HUDs). Summary of the invention

[0005] An embodiment relates to a mask frame assembly for depositing a thin film, the mask frame assembly comprising: a mask frame; at least one mask sheet located on the mask frame, the at least one mask sheet comprising pattern holes and a non-porous pattern portion, the pattern holes comprising a first pattern hole located in a deposition area of ​​the mask sheet and a second pattern hole located in a dummy area of ​​the mask sheet between the deposition areas, the first pattern holes and the second pattern holes alternate in a first direction, the non-porous pattern portion being located in a boundary area between the first pattern holes and the second pattern holes; and a first support rod spaced apart in the first direction, the first support rod shielding the second pattern hole, wherein the non-porous pattern portion does not include the pattern holes and is in the form of a band shape on at least one edge of one of the deposition areas.

[0006] Each of the first supporting bars may extend in a second direction intersecting the first direction. At least a portion of the first supporting bar may overlap at least one of the non-porous pattern portions arranged in the second direction.

[0007] A width of each of the non-porous pattern portions may define a space between a first edge facing one of the deposition areas and a second edge facing one of the dummy areas adjacent to the one of the deposition areas.

[0008] Each of the first supporting rods may include a first rod body extending in the second direction and a first protrusion protruding from the first rod body in the first direction. A portion connecting adjacent first protrusions may overlap at least one of the non-porous pattern portions.

[0009] The second supporting bar extending in the first direction may be located on at least one mask sheet. At least a portion of the second supporting bar may overlap with at least one of the non-porous pattern portions arranged in the first direction.

[0010] The second supporting rod may include a second rod body extending in the first direction and a second protrusion protruding from the second rod body in the second direction and overlapping at least one of the non-porous pattern portions.

[0011] The first supporting rod may overlap at least one of the non-porous pattern portions located in an edge of the deposition area in the first direction. The second supporting rod may overlap at least one of the non-porous pattern portions located in an edge of the deposition area in the second direction.

[0012] One of the deposition regions corresponds to a region where a material forming a unit display panel is deposited, and includes an emission region and a non-emission region extending outside the emission region.

[0013] At least one of the non-porous pattern portions may continuously extend from one side of one edge of the deposition area to the other side of the one edge.

[0014] At least one of the non-porous pattern portions may be spaced apart between one side of one edge and the other side of one edge of the deposition area. The patterned holes may be located in the spaced apart intervals. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Features will become apparent to those skilled in the art by describing in detail exemplary embodiments with reference to the accompanying drawings, in which:

[0016] Figure 1 An exploded perspective view showing a portion of a mask frame assembly for depositing a thin film according to an embodiment;

[0017] Figure 2 Show Figure 1 A plan view of a mask sheet and a first support rod;

[0018] Figure 3 Show Figure 2 An enlarged plan view of a mask sheet and a first support rod;

[0019] Figure 4 Show Figure 3 An enlarged plan view of area A;

[0020] Figure 5 A plan view showing a mask sheet and a first support bar according to an embodiment;

[0021] Figure 6A plan view showing a mask sheet and a first support bar according to an embodiment;

[0022] Figure 7 A plan view showing a mask sheet, a first support bar, and a second support bar according to an embodiment;

[0023] Figure 8 A view showing a configuration for performing deposition using a mask frame assembly for depositing a thin film according to an embodiment;

[0024] Fig. 9 A cross-sectional view showing one sub-pixel of an organic light emitting display device deposited by using a mask frame assembly for depositing a thin film according to an embodiment; and

[0025] Fig.10 An enlarged view illustrating a deposition pattern deposited on a substrate by using a mask frame assembly for depositing a thin film according to an embodiment. DETAILED DESCRIPTION

[0026] Exemplary embodiments will now be described more fully below with reference to the accompanying drawings; however, they may be implemented in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey exemplary implementations to those skilled in the art.

[0027] In the accompanying drawings, the dimensions of layers and regions may be exaggerated for clarity of illustration. It will also be understood that when a layer or element is referred to as being on another layer or substrate, it may be directly on the other layer or substrate, or there may also be an intermediate layer. In addition, it will be understood that when a layer is referred to as being below another layer, it may be directly below the other layer, or there may also be one or more intermediate layers. In addition, it will also be understood that when a layer is referred to as being between two layers, it may be the only layer between the two layers, or there may also be one or more intermediate layers. The same reference numerals represent the same elements throughout.

[0028] In the following description, the X-axis, Y-axis, and Z-axis are not limited to the three axes of the rectangular coordinate system and can be interpreted in a broader sense. For example, the X-axis, Y-axis, and Z-axis may be perpendicular to each other, or may represent different directions that are not perpendicular to each other.

[0029] Figure 1 An exploded perspective view showing a portion of a mask frame assembly 100 for depositing a thin film according to an embodiment, Figure 2 Show Figure 1 A plan view of the mask sheet 130 and the first support rod 210, Figure 3 Show Figure 2 An enlarged plan view of a mask sheet 130 and a first support rod 210, Figure 4Show Figure 3 An enlarged plan view of area A, Figure 5 A plan view showing a mask sheet 530 and a first support bar 510 according to an embodiment, and Figure 6 A plan view of one mask sheet 630 and a first support bar 610 according to an embodiment is shown.

[0030] refer to Figures 1 to 4 , the mask frame assembly 100 includes a mask frame 110 and a mask sheet 120 mounted on the mask frame 110 .

[0031] The mask frame 110 may include an opening 115. The opening 115 may be surrounded by a plurality of frame members 111, 112, 113, and 114. The plurality of frame members 111, 112, 113, and 114 may be connected to each other.

[0032] The plurality of frame members 111, 112, 113, and 114 may include a first frame member 111 and a second frame member 112 extending in a first direction (X direction) and facing each other in a second direction (Y direction), and a third frame member 113 and a fourth frame member 114 extending in the second direction (Y direction) and facing each other in the first direction (X direction). The first frame member 111, the second frame member 112, the third frame member 113, and the fourth frame member 114 may form a quadrilateral frame in which the first frame member 111, the second frame member 112, the third frame member 113, and the fourth frame member 114 are connected to each other. The mask frame 110 may include a material that is less likely to deform when the mask sheet 120 is soldered, such as a metal having high strength.

[0033] The mask sheet 120 may be coupled to the mask frame 110. The mask sheet 120 may include a thin plate. The mask sheet 120 may include stainless steel, Invar, Ni, Co, a nickel alloy, or a nickel-cobalt alloy.

[0034] The mask sheet 120 may include a plurality of separate mask sheets 130. For example, Figure 2 As shown in , the plurality of mask sheets 130 may include a first mask sheet 130a, a second mask sheet 130b, and a third mask sheet 130c separated in a second direction (Y direction), wherein the second direction (Y direction) is a width direction of the plurality of mask sheets 130. Figure 1 As shown in , a larger number of mask sheets 130 may be provided. Hereinafter, the term "mask sheet" may refer to a separate mask sheet 130.

[0035] In order to facilitate the manufacturing process, a deposition pattern portion EP corresponding to a deposition pattern of a plurality of unit display panels may be patterned on the mask sheet 130. The mask sheet 130 may deposit deposition patterns of a plurality of unit display panels at the same time.

[0036] The deposition pattern portion EP may be arranged on the mask sheet 130. The deposition pattern portion EP may be arranged in a first direction (X direction), wherein the first direction (X direction) is a longitudinal direction of the mask sheet 130. The deposition pattern portion EP may include a single deposition pattern continuous in the first direction (X direction). The deposition pattern portion EP may extend continuously in the longitudinal direction (X direction) of the mask sheet 130.

[0037] A plurality of deposition areas E and a plurality of dummy areas D may be arranged on the deposition pattern portion EP. The plurality of deposition areas E and the plurality of dummy areas D may be alternately arranged in the first direction (X direction). Each of the deposition areas E may correspond to a deposition area of ​​each unit display panel to be formed. Each of the deposition areas E may include an emission area EA and a non-emission area NEA extending outside the emission area EA. The dummy area D may correspond to a non-deposition area that divides a plurality of adjacent deposition areas E.

[0038] The deposition pattern portion EP may have a plurality of pattern holes 131 arranged therein. The plurality of pattern holes 131 include a plurality of first pattern holes 132 arranged in each of the deposition regions E and a plurality of second pattern holes 136 arranged in each of the dummy regions D.

[0039] The first pattern hole 132 may include a plurality of emission pattern holes 134 and a plurality of non-emission pattern holes 135. The plurality of emission pattern holes 134 may be arranged in the emission area EA. The emission pattern hole 134 may include a hole for depositing an emission layer, wherein the emission layer participates in the light emission of the unit display panel to be formed. A plurality of non-emission pattern holes 135 may be arranged in the non-emission area NEA. The non-emission pattern hole 135 may have a shape corresponding to the pattern of the emission pattern hole 134. The non-emission pattern hole 135 may include a dummy pattern hole formed when the emission pattern hole 134 is patterned. The deposition material passing through the emission pattern hole 134 may be patterned in the display area on the substrate of the unit display panel. The formed unit display panel may emit light in the display area. The deposition material passing through the non-emission pattern hole 135 may be patterned outside the display area and may not directly participate in the emission of light.

[0040] The second pattern holes 136 may be patterned in the dummy region D. The second pattern holes 136 included in the mask sheet 130 may help prevent the mask sheet 130 from being deformed or changed during a deposition process.

[0041] The plurality of first pattern holes 132 arranged in the deposition area E and the plurality of second pattern holes 136 arranged in the dummy area D may be alternately patterned in a first direction (X direction), wherein the first direction (X direction) is a longitudinal direction of the mask sheet 130. The plurality of first pattern holes 132 and the plurality of second pattern holes 136 may be patterned sequentially from one end of the mask sheet 130 to the other end of the mask sheet 130.

[0042] The pattern holes 131 including the first pattern holes 132 and the second pattern holes 136 may include a dot-shaped slit pattern or a stripe-shaped slit pattern. In some implementations, the first pattern holes 132 and the second pattern holes 136 may have the same shape and the same size. The ribs 133 may be arranged at two opposite edges of the mask sheet 130 in the second direction (Y direction), wherein the second direction (Y direction) is the width direction of the mask sheet 130. The pattern holes may be omitted in the ribs 133. The ribs 133 may extend in the first direction (X direction) which is the longitudinal direction of the mask sheet 130.

[0043] The two opposite ends of the mask sheet 130 may be fixed to the third frame member 113 and the fourth frame member 114 by spot welding. Each of the mask sheets 130 may extend in the first direction (X direction) across the opening 115. The plurality of mask sheets 130 may be separated in the second direction (Y direction) and arranged in sequence. The plurality of mask sheets 130 may cover the opening 115.

[0044] A plurality of first support bars 210 may be disposed between the mask frame 110 and the mask sheet 130. The first support bars 210 may prevent the mask sheet 130 from sagging due to its weight. The first support bars 210 may include a thin shielding plate that prevents deposition material from being deposited in an undesired area of ​​the substrate.

[0045] The first support rods 210 may be disposed in a second direction (Y direction) intersecting the mask sheet 130. Each of the first support rods 210 may extend in the second direction (Y direction) across the opening 115. Two opposite ends of the first support rods 210 may be spot welded on the first frame member 111 and the second frame member 112, respectively. The first support rods 210 may be welded on the first frame member 111 and the second frame member 112 in a state where tension is applied. A plurality of first support rods 210 may be spaced apart from each other in the first direction (X direction).

[0046] Each of the first support bars 210 may shield a plurality of second pattern holes 136 arranged in each of the dummy regions D. The first support bar 210 may include a first bar body 211 extending in the second direction (Y direction). The first protrusion 212 may protrude from the first bar body 211. The first protrusion 212 may protrude from two opposite edges of the first bar body 211 in the first direction (X direction). The first protrusion 212 may enhance the strength of the first bar body 211. The first protrusion 212 may protrude from at least one edge of the first bar body 211. In an embodiment, the first support bar 210 may include only the first bar body 211 without the first protrusion 212.

[0047] Each of the first supporting bars 210 may block the plurality of second pattern holes 136. However, during the manufacturing process, if the first supporting bars 210 become twisted, the first supporting bars 210 may undesirably block a portion of the plurality of first pattern holes 132 patterned in the deposition area E, and deposition defects may occur.

[0048] In order to minimize the influence of the first supporting bar 210, a non-porous pattern portion 137 in which the pattern holes 131 are not patterned may be arranged in a portion of the region in which the pattern holes 131 are arranged. The plurality of pattern holes 131 may pass through the mask sheet 130. In contrast, the non-porous pattern portion 137 may not pass through the mask sheet 130. The non-porous pattern portion 137 may overlap at least a portion of the first supporting bar 210.

[0049] For example, the non-porous pattern portion 137 may be arranged in the boundary area BA between the plurality of first pattern holes 132 arranged in the deposition area E and the plurality of second pattern holes 136 arranged in the dummy area D. The non-porous pattern portion 137 may extend in one direction of the mask sheet 130 in the boundary area BA. In an embodiment, the non-porous pattern portion 137 may extend in a width direction (Y direction) of the mask sheet 130 by a predetermined length.

[0050] The non-porous pattern portion 137 may be arranged as a plurality of non-porous pattern portions 137 on at least one edge of one deposition region E. The non-porous pattern portion 137 may be arranged at an upper edge UE and a lower edge LE of one deposition region E in the longitudinal direction (X direction) of the mask sheet 130, respectively.

[0051] In an embodiment, the non-porous pattern portion 137 may be disposed only at the upper edge UE of one deposition area E. In an embodiment, the non-porous pattern portion 137 may be disposed only at the lower edge LE of one deposition area E.

[0052] In an embodiment, the non-porous pattern portion 137 may be disposed only at the left edge of one deposition area E. In an embodiment, the non-porous pattern portion 137 may be disposed only at the right edge of one deposition area E. In an embodiment, the non-porous pattern portion 137 may be disposed at both the left and right edges of one deposition area E.

[0053] In an embodiment, the non-porous pattern portion 137 may be disposed at all of the upper edge, the lower edge, the left edge, and the right edge of one deposition area E. In an embodiment, the non-porous pattern portion 137 may be disposed over an edge adjacent to one deposition area E.

[0054] Basically, the non-hole pattern portion 137 may be selectively disposed at a pre-designated area for managing tolerance of the first supporting bar 210 .

[0055] The non-porous pattern portion 137 may be arranged in a band shape on at least one edge (eg, upper edge UE or lower edge LE) of one deposition area E. The non-porous pattern portion 137 may extend continuously along at least one edge (eg, upper edge UE or lower edge LE) of one deposition area E.

[0056] For example, Figure 2 As shown in , the non-porous pattern portion 137 may extend from the left side of the deposition area E (which corresponds to one side UE1 of the upper edge UE of the deposition area E) to the right side of the deposition area E (which corresponds to the other side UE2 of the upper edge UE of the deposition area E, opposite to the one side UE1) in the second direction (Y direction) as the width direction of the mask sheet 130 without breaking. Two opposite ends of the non-porous pattern portion 137 may be connected to the ribs 133 arranged at two opposite edges of the mask sheet 130 in the width direction (Y direction) of the mask sheet 130, respectively.

[0057] At least a portion of the non-porous pattern portion 137 may have a streamlined or rounded shape according to the shape of one deposition area E. The display device may be a full-view display having various shapes. Therefore, the display panel may have a deposition area E having an irregular pattern other than a quadrilateral shape or a circular shape. Therefore, the non-porous pattern portion 137 may have a streamlined or rounded pattern other than a linear pattern.

[0058] The width W of the non-porous pattern portion 137 may be the same everywhere. In some implementations, the width W of the non-porous pattern portion 137 may be greater than the interval d between the plurality of first pattern holes 132 .

[0059] like Figure 4 As shown in FIG. 1 , the width W of the non-porous pattern portion 137 may be a space between a first edge 138 facing one deposition region E and a second edge 139 facing a dummy region D adjacent to the one deposition region E. The first edge 138 may face an upper edge UE or a lower edge LE of one deposition region E.

[0060] In an embodiment, the width W of the non-porous pattern portion 137 may be 500 μm or less. When the width W of the non-porous pattern portion 137 is less than 500 μm, as shown in FIG. Figure 8 As shown in , contact defects between the deposition substrate 840 and the mask sheet 830 that may be generated due to corrugations of the mask sheet 830 when tension is applied can be avoided, or repulsive force from the magnet 850 for clamping the mask sheet 830 and the deposition substrate 840 for deposition can be avoided.

[0061] In order to limit the range of the first support rod 210 deviating from the normal position, the first support rod 210 may overlap with the non-porous pattern portion 137. For example, the connection portion 213 connecting the plurality of adjacent first protrusions 212 may overlap with the non-porous pattern portion 137. The connection portion 213 may include one edge of the first rod body 211. In an embodiment, in the case of a structure in which a portion of the first support rod 210 overlaps with the non-porous pattern portion 137, a support rod not including the first protrusion 212 may be applied.

[0062] Even when the first support bar 210 is twisted, when the connection portion 213 of the first support bar 210 overlaps the non-porous pattern portion 137, the deposition material can be prevented from being deposited in an undesired area of ​​the substrate. The interval between the first edge 138 and the second edge 139 of the non-porous pattern portion 137 can be determined as the width W of the non-porous pattern portion 137.

[0063] For example, the interval between the emission area EA in which the plurality of emission pattern holes 134 are arranged and the first edge 138 of the non-porous pattern portion 137 may be the same as the shielding width that may occur due to the first supporting rod 210. When the first supporting rod 210 overlaps with the non-porous pattern portion 137, shielding that may occur due to the first supporting rod 210 may not enter the emission area EA.

[0064] Even when the first supporting bar 210 is deviated from the normal position, the second edge 139 of the non-porous pattern portion 137 and the connection portion 213 of the first supporting bar 210 may overlap each other, and deposition defects may be minimized or prevented.

[0065] In an implementation, the deposition area E of the display panel may have various shapes, and the non-porous pattern portion 137 may have various patterns.

[0066] refer to Figure 5 , a deposition area E in which a plurality of first pattern holes 532 are arranged and a dummy area D in which a plurality of second pattern holes 536 are arranged may be arranged in a first direction (X direction) which is a longitudinal direction of the mask sheet 530. One deposition area E among the plurality of deposition areas E may correspond to a deposition area of ​​a unit display panel.

[0067] The non-porous pattern portion 537 may be arranged in a boundary area BA between the plurality of first pattern holes 532 and the plurality of second pattern holes 536. The non-porous pattern portion 537 may be an area of ​​the mask sheet 530 in which the pattern holes 531 are not formed. The non-porous pattern portion 537 may include at least one first non-porous pattern portion 537a and at least one second non-porous pattern portion 537b arranged at an upper edge UE of one deposition area E in the longitudinal direction (X direction) of the mask sheet 530, and at least one third non-porous pattern portion 537c arranged at a lower edge LE of one deposition area E in the longitudinal direction (X direction) of the mask sheet 530.

[0068] The first non-porous pattern portion 537a and the second non-porous pattern portion 537b can be detachably arranged in a second direction (Y direction) as a width direction of the mask sheet 530 from the left side of the deposition area E (which corresponds to one side UE1 of the upper edge UE of the deposition area E) to the right side of the deposition area E (which corresponds to the other side UE2 of the upper edge UE of the deposition area E, opposite to the one side UE1).

[0069] For example, the first non-porous pattern portion 537a may be arranged at one side UE1 and the other side UE2 of the upper edge UE of the deposition area E, respectively. The second non-porous pattern portion 537b may be arranged at the center of the upper edge UE of the deposition area E. The plurality of pattern holes 531 may be arranged in the interval between the first non-porous pattern portion 537a and the second non-porous pattern portion 537b. The third non-porous pattern portion 537c may be arranged at one side LE1 and the other side LE2 of the lower edge LE of the deposition area E, respectively.

[0070] The first support bar 510 may block the plurality of second pattern holes 536 arranged in the dummy area D. The first support bar 510 may include a first bar body 511 extending in the second direction (Y direction) and a first protrusion 512 protruding from the first bar body 511 in the first direction (X direction). A connection portion 513 connecting a plurality of adjacent first protrusions 512 may overlap with the non-porous pattern portion 537. In an embodiment, in the case of a structure in which a portion of the first support bar 510 overlaps with the non-porous pattern portion 537, support bars having different shapes may be applied.

[0071] refer to Figure 6 , the deposition area E in which the plurality of first pattern holes 632 are arranged and the dummy area D in which the plurality of second pattern holes 636 are arranged may be arranged in the first direction (X direction) which is the longitudinal direction of the mask sheet 630 .

[0072] The non-porous pattern portion 637 may extend along the edge of the deposition area E in the boundary area BA between the plurality of first pattern holes 632 and the plurality of second pattern holes 636. The non-porous pattern portion 637 may be an area of ​​the mask sheet 630 that does not include the plurality of pattern holes. The non-porous pattern portion 637 may include at least one first non-porous pattern portion 637a disposed at an upper edge UE of one deposition area E and at least one second non-porous pattern portion 637b disposed at a lower edge LE of one deposition area E in the longitudinal direction (X direction) of the mask sheet 630.

[0073] The first non-porous pattern portion 637a and the second non-porous pattern portion 637b may extend in a continuous band shape from the left side of the deposition area E (which corresponds to one of the sides UE1 and LE1 of the deposition area E, respectively) to the right side of the deposition area E (which corresponds to one of the other sides UE2 and LE2 of the deposition area E opposite to one of the sides UE1 and LE1, respectively).

[0074] The first support bar 610 may block the plurality of second pattern holes 636 arranged in the dummy area D. The first support bar 610 may include a first bar body 611 extending in the second direction (Y direction) and a first protrusion 612 protruding from the first bar body 611 in the first direction (X direction). A connection portion 613 connecting a plurality of adjacent first protrusions 612 may overlap with the non-porous pattern portion 637. In an embodiment, in the case of a structure in which a portion of the first support bar 610 overlaps with the non-porous pattern portion 637, the first support bar 610 may have more than one shape.

[0075] Second support bars may also be arranged on a plurality of mask sheets.

[0076] Figure 7 A plan view of a mask sheet 730 , a first support bar 710 , and a second support bar 740 according to an embodiment is shown.

[0077] exist Figure 2 In the mask sheet 130 shown in FIG, three mask sheets 130a, 130b, and 130c are shown to be arranged in the second direction (Y direction) of the mask sheet 130. In the mask sheet 730 according to the present embodiment, two mask sheets 730a and 730b are shown to be arranged in the second direction (Y direction) of the mask sheet 730.

[0078] refer to Figure 7 In the first mask sheet 730a and the second mask sheet 730b, a plurality of deposition regions E and a plurality of dummy regions D (see Figure 2 ) may be alternately arranged in a first direction (X direction) which is a longitudinal direction of the mask sheet 730.

[0079] Different from the deposition area E of the previous embodiment, the length of the deposition area E in the second direction (Y direction) of the present embodiment may be greater than the length of the deposition area E in the first direction (X direction). Figure 2 Corresponding to the deposition area E.

[0080] The first support rod 710 may be arranged on the mask sheet 730. The first support rod 710 may include a first rod body 711 extending in the second direction (Y direction) and a first protrusion 712 protruding from the first rod body 711 in the first direction (X direction). In some implementations, the first support rod 710 may include only the first rod body 711 without the first protrusion 712. The first support rod 710 may extend above the first mask sheet 730a and the second mask sheet 730b adjacent to each other. The first support rod 710 may shield a plurality of second pattern holes 732 patterned in the dummy regions D respectively arranged in the first mask sheet 730a and the second mask sheet 730b.

[0081] A second support rod 740 may also be arranged on the mask sheet 730. The second support rod 740 may include a second rod body 741 extending in the first direction (X direction). In an embodiment, the second protrusion 742 may protrude from the second rod body 741 in the second direction (Y direction). The second support rod 740 may be arranged in a boundary area between the first mask sheet 730a and the second mask sheet 730b adjacent to each other. The second support rod 740 may block the interval between the first mask sheet 730a and the second mask sheet 730b.

[0082] The first supporting rod 710 and the second supporting rod 740 may cross each other. A plurality of first pattern holes 731 may be arranged in one deposition area E. A plurality of non-hole pattern portions 737 may be arranged in at least one edge of one deposition area E.

[0083] The non-porous pattern portion 737 may include at least one first non-porous pattern portion 737a and at least one second non-porous pattern portion 737b disposed at the upper edge UE of one deposition area E and at least one third non-porous pattern portion 737c disposed at the lower edge LE of one deposition area E.

[0084] The first non-porous pattern portion 737a can be arranged at two opposite ends of the upper edge UE of the deposition area E, the second non-porous pattern portion 737b can be arranged at the center of the upper edge UE of the deposition area E, and the third non-porous pattern portion 737c can be arranged at two opposite ends of the lower edge LE of the deposition area E.

[0085] The plurality of first non-porous pattern portions 737a and the plurality of third non-porous pattern portions 737c may overlap with the connection portion 713 of the first supporting bar 710 connecting the plurality of adjacent first protrusions 712. In an embodiment, in the case of a structure in which a portion of the first supporting bar 710 overlaps with the first non-porous pattern portion 737a and the third non-porous pattern portion 737c, the first supporting bar 710 having a different shape may be used.

[0086] The second non-porous pattern portion 737b may be arranged at the center of the upper edge UE of the deposition area E and may extend in the longitudinal direction (X direction) of the mask sheet 730. The second non-porous pattern portion 737b may overlap with a portion of the second supporting rod 740. A second protrusion 742 protruding from the second rod body 741 in the second direction (Y direction) may be arranged at the second supporting rod 740. The second protrusion 742 may overlap with the second non-porous pattern portion 737b. In the case of a structure in which a portion of the second supporting rod 740 overlaps with the second non-porous pattern portion 737b extending in the longitudinal direction (X direction) of the mask sheet 730, the second supporting rod 740 may have a suitable shape.

[0087] The plurality of first non-porous pattern portions 737a and the plurality of third non-porous pattern portions 737c may not overlap with a portion of the first supporting bar 710. Instead, at least one of the plurality of first non-porous pattern portions 737a and the plurality of third non-porous pattern portions 737c may overlap with a portion of the second supporting bar 740. For example, the plurality of non-porous pattern portions 737 arranged in the edge of one deposition area E may selectively overlap with the first supporting bar 710 or the second supporting bar 740.

[0088] Figure 8 A view illustrating a configuration in which deposition is performed by using a mask frame assembly 800 for depositing a thin film according to an embodiment.

[0089] refer to Figure 8 , a mask frame assembly 800 for depositing a thin film includes a vacuum chamber 801 for depositing a thin film, such as an organic emission layer of an organic light emitting display device.

[0090] The deposition source 870 may be located in a lower portion within the vacuum chamber 801. The mask frame assembly 810 may be installed above the deposition source 870. The mask sheet 830 may be installed above the mask frame 880. The deposition substrate 840 may be located above the mask sheet 830. A magnet 850 that generates a magnetic force such that the mask sheet 830 is held on the deposition substrate 840 for deposition may be installed above the deposition substrate 840.

[0091] The first supporting rod 820 and the second supporting rod 860 may be installed under the mask sheet 830 to prevent the mask sheet 830 from sagging. The first supporting rod 820 and the second supporting rod 860 may be arranged in directions crossing each other.

[0092] When the deposition material is ejected from the deposition source 870 toward the mask sheet 830, the deposition material passing through the opening 881 of the mask frame 880 may pass through the plurality of pattern holes 831 formed in the mask sheet 830 and may be deposited to have a desired pattern on one side of the deposition substrate 840. Even if the first support rod 820 and the second support rod 860 become deformed or changed during the deposition process, due to the non-porous pattern portion 737 (see FIG. 1 ) disposed on the mask sheet 830, the deposition material may be deposited on the side of the deposition substrate 840. Figure 7 ) may also be present, deposition may be performed in desired areas of the deposition substrate 840.

[0093] Fig. 9 A cross-sectional view illustrating one sub-pixel of an organic light emitting display device 900 deposited by using a mask frame assembly for depositing a thin film according to an embodiment.

[0094] Each of the sub-pixels may include at least one thin film transistor TFT and an organic light emitting diode OLED. The number and structure of the thin film transistor TFT may be variously modified.

[0095] refer to Fig. 9 , the organic light emitting display device 900 may include a substrate 911. The substrate 911 may be a glass substrate, a plastic substrate, or a flexible film substrate. The substrate 911 may be transparent, semi-transparent, or opaque.

[0096] The barrier layer 912 may be disposed on the substrate 911. The barrier layer 912 may cover the top surface of the substrate 911. The barrier layer 912 may include an inorganic layer or an organic layer. The barrier layer 912 may be in the form of a single layer or a multilayer.

[0097] The thin film transistor TFT may be formed on the barrier layer 912. The thin film transistor TFT according to the present embodiment may be, for example, a top gate thin film transistor. In some implementations, the thin film transistor TFT may be a thin film transistor having a different structure, such as a bottom gate thin film transistor.

[0098] The semiconductor layer 913 may be disposed on the barrier layer 912. The source region 914 and the drain region 915 may be formed in the semiconductor layer 913 by doping N-type or P-type impurity ions. The region between the source region 914 and the drain region 915 may include a channel region 916 not doped with impurities.

[0099] The semiconductor layer 913 may include an organic semiconductor, an inorganic semiconductor, or amorphous silicon. In an implementation, the semiconductor layer 913 may include an oxide semiconductor.

[0100] The gate insulating layer 917 may be deposited on the semiconductor layer 913. The gate insulating layer 917 may include an inorganic layer. The gate insulating layer 917 may be in the form of a single layer or a multi-layer.

[0101] The gate electrode 918 may be disposed on the gate insulating layer 917. The gate electrode 918 may be in the form of a single layer or a multilayer. The gate insulating layer 917 may include Au, Ag, Cu, Ni, Pt, Pd, Al, Mo, or Cr, or may include an alloy such as Al:Nd and Mo:W.

[0102] An interlayer insulating layer 919 may be disposed on the gate electrode 918. The interlayer insulating layer 919 may include an inorganic layer including silicon oxide or silicon nitride.

[0103] The source electrode 920 and the drain electrode 921 may be disposed on the interlayer insulating layer 919. A contact hole may be formed by removing a portion of the gate insulating layer 917 and a portion of the interlayer insulating layer 919. The source electrode 920 may be electrically connected to the source region 914 through the contact hole. The drain electrode 921 may be electrically connected to the drain region 915 through the contact hole.

[0104] A passivation layer 922 may be formed on the source electrode 920 and the drain electrode 921. The passivation layer 922 may include an inorganic layer or an organic layer.

[0105] The planarization layer 923 may be formed on the passivation layer 922. The planarization layer 923 includes an organic layer including one of acryl, polyimide, and benzocyclobutene (BCB).

[0106] The organic light emitting diode OLED may be disposed above the thin film transistor TFT. The organic light emitting diode OLED may include a first electrode 925 , a second electrode 927 , and an intermediate layer 926 between the first electrode 925 and the second electrode 927 .

[0107] The first electrode 925 may be electrically connected to one of the source electrode 920 and the drain electrode 921 through the contact hole. The first electrode 925 may correspond to a pixel electrode.

[0108] The first electrode 925 serves as an anode and may include various conductive materials. The first electrode 925 may be a transparent electrode or a reflective electrode.

[0109] A pixel defining layer (PDL) 924 covering an edge of a first electrode 925 of the organic light emitting diode OLED may be disposed on the planarization layer 923. The PDL 924 may define an emission region of each sub-pixel by surrounding the edge of the first electrode 925.

[0110] The PDL 924 may include an organic layer.

[0111] The intermediate layer 926 may be disposed in a region on the first electrode 925, the region being exposed by etching a portion of the PDL 924. The intermediate layer 926 may be formed by a deposition process. The intermediate layer 926 may include a low molecular organic material or a polymer organic material.

[0112] The intermediate layer 926 may include an organic emission layer (EML). In some implementations, the intermediate layer 926 may include an organic EML and may further include at least one of a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). In some implementations, the intermediate layer 926 may include an organic EML and may further include various functional layers. The organic EML may be formed by using a mask frame assembly for depositing a thin film according to an embodiment.

[0113] The second electrode 927 may be disposed on the intermediate layer 926. The second electrode 927 may correspond to a common electrode. Similar to the first electrode 925, the second electrode 927 may be a transparent electrode or a reflective electrode.

[0114] The first electrode 925 may be insulated from the second electrode 927 by the intermediate layer 926. When a voltage is applied to the first electrode 925 and the second electrode 927, the intermediate layer 926 may emit visible light, and an image that can be recognized by a user may be implemented.

[0115] The encapsulation portion 940 may be disposed on the organic light emitting diode OLED.

[0116] A plurality of organic layers 941 and 942 and a plurality of inorganic layers 943, 944, and 945 may be alternately stacked in the encapsulation portion 940. In the encapsulation portion 940 according to an embodiment, the organic layers 941 and 942 may have a structure including at least one layer, and the inorganic layers 943, 944, and 945 may have a structure including at least two layers. The uppermost layer 945 of the encapsulation portion 940 exposed to the outside, which is exposed to the outside, may include an inorganic layer in order to prevent moisture from being transferred to the organic light emitting diode OLED.

[0117] Fig.10 An enlarged view illustrating a deposition pattern deposited on a substrate by using a mask frame assembly for depositing a thin film according to an embodiment.

[0118] Referring to the drawings, a deposition source 870 (see Figure 8 ) The evaporated deposition material passes through the pattern holes 831 of the mask sheet 830 and is deposited on the substrate 911 (see Fig. 9 ) in the emission area EA on the substrate. Therefore, a pattern 1034 of the organic emission layer may be formed in the emission area EA. The pattern 1034 deposited in the emission area EA may emit light when driven.

[0119] The dummy patterns 1035 are deposited in the non-emission area NEA extending to the outside of the emission area EA. Some of the dummy patterns 1035 include patterns 1036 that are split into pieces due to a shadow phenomenon, etc. The dummy patterns 1035 do not substantially participate in emitting light.

[0120] By way of summary and review, a variety of methods may be used to form a thin film, such as an emission layer in a display device. Among these methods, a deposition method includes depositing a deposition material on a substrate by using a deposition mask having the same pattern as that of the thin film.

[0121] When the support member supporting the deposition mask deviates from the normal position on the deposition mask, there is a possibility that the deposition material may be deposited in an undesired area on the substrate or deposition may not be performed in a desired area. In this case, an accurate deposition pattern may not be formed on the substrate.

[0122] One or more embodiments include a mask frame assembly for depositing a thin film, wherein the mask frame assembly can form a precise deposition pattern on a substrate.

[0123] The mask frame assembly for depositing a thin film according to the embodiment can accurately control the deposition pattern of panels having various shapes. Since a high-precision mask sheet is used, a dead zone can be easily reduced.

[0124] Exemplary embodiments have been disclosed herein, and although specific terms are used, they are used and interpreted in a general and descriptive sense only, and not for purposes of limitation. In some cases, as will be apparent to one of ordinary skill in the art upon filing this application, unless otherwise specifically noted, features, characteristics, and / or elements described in conjunction with a particular embodiment may be used alone or in combination with features, characteristics, and / or elements described in conjunction with other embodiments. Therefore, it should be understood by those skilled in the art that various changes may be made in form and detail without departing from the spirit and scope thereof as set forth in the appended claims.

Claims

1. A mask frame assembly for depositing a thin film, the mask frame assembly comprising: mask frame; at least one mask sheet, located on the mask frame, the at least one mask sheet comprising a plurality of pattern holes, the plurality of pattern holes comprising a plurality of first pattern holes located in a plurality of deposition areas of the mask sheet and a plurality of second pattern holes located in a dummy area of ​​the mask sheet between the plurality of deposition areas, the plurality of first pattern holes and the second pattern holes being alternated in a first direction, A plurality of first support rods are spaced apart in the first direction and extend in a second direction intersecting the first direction to respectively cover the plurality of second pattern holes. a plurality of non-porous pattern portions, in a band shape and located in a plurality of edge regions between the plurality of first pattern holes and the plurality of second pattern holes, excluding the plurality of first pattern holes and the plurality of second pattern holes, at least one of the non-porous pattern portions continuously extending along one side of one edge of the plurality of deposition regions to the other side of the one edge in the second direction, At least a portion of each of the first supporting bars overlaps at least a portion of each of the non-porous pattern portions in the second direction.

2. The mask frame assembly according to claim 1, wherein: The width of each of the non-porous pattern portions is defined as the interval between a first edge and a second edge, wherein the first edge faces one of the deposition areas, and the second edge faces a virtual area in the dummy area adjacent to the one of the deposition areas, and the width of the non-porous pattern portion is the same everywhere.

3. The mask frame assembly according to claim 1, wherein: Each of the first support bars comprises: a first rod body extending across the adjacent mask sheets in the second direction; and a plurality of first protrusions protruding from at least one edge of the first rod body in the first direction, wherein: A connection portion connecting a plurality of adjacent first protrusions overlaps at least a portion of each of the non-porous pattern portions.

4. The mask frame assembly according to claim 1, wherein: At least one of the Wukong patterns extends from one side of one edge in the deposition area to the other side of the one edge in a curved shape.

5. The mask frame assembly according to claim 1, wherein: The deposition area corresponds to an area where a material forming a unit display panel is deposited, and includes an emission area and a non-emission area extending outside the emission area.

6. The mask frame assembly of claim 5, wherein: The plurality of first pattern holes include a plurality of emission pattern holes and a plurality of non-emission pattern holes, the plurality of emission pattern holes are arranged in the emission area, the plurality of non-emission pattern holes are arranged in the non-emission area, and the non-emission area corresponds to an area between the emission area and the non-hole pattern portion.

7. The mask frame assembly according to claim 5, wherein: The interval between the emission area and the first edge of the non-porous pattern portion is the same as a shielding width occurring due to the first supporting rod. 8 . The mask frame assembly of claim 1 , further comprising a plurality of second support bars, which are arranged in edge regions of a plurality of mask sheets adjacent to each other in the second direction and each extend in the first direction.

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