A full-effect protective and acne-prone skin repairing composition and application thereof
Patent Information
- Application Number
- CN202411726219.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-28
- Publication Date
- 2026-06-26
- Estimated Expiration
- 2044-11-28
AI Technical Summary
Current technologies lack repair compositions that can protect against environmental pollution, resist UV radiation, improve negative emotions, and prevent acne breakouts, leading to recurring acne and affecting skin health.
A compound repairing composition of sulforaphane, lactoferrin, bromelain, mevalonate lactone and guaiac extract is used to prepare cosmetics to enhance skin's protective power and barrier function through eutectic solvent extraction of guaiac extract and bromelain enzymatic hydrolysis technology.
This composition works synergistically to enhance skin's protective barrier, improve photodamage, reduce oxidative stress levels, mitigate the effects of the stress hormone cortisol, boost mood, prevent acne, smooth skin, and enhance barrier function.
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Abstract
Citation Information
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