A full-effect protective and acne-prone skin repairing composition and application thereof

CN119587422BActive Publication Date: 2026-06-26N O D TOPIA (GUANGZHOU) BIOTECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
N O D TOPIA (GUANGZHOU) BIOTECHNOLOGY CO LTD
Filing Date
2024-11-28
Publication Date
2026-06-26

AI Technical Summary

Technical Problem

Current technologies lack repair compositions that can protect against environmental pollution, resist UV radiation, improve negative emotions, and prevent acne breakouts, leading to recurring acne and affecting skin health.

Method used

A compound repairing composition of sulforaphane, lactoferrin, bromelain, mevalonate lactone and guaiac extract is used to prepare cosmetics to enhance skin's protective power and barrier function through eutectic solvent extraction of guaiac extract and bromelain enzymatic hydrolysis technology.

Benefits of technology

This composition works synergistically to enhance skin's protective barrier, improve photodamage, reduce oxidative stress levels, mitigate the effects of the stress hormone cortisol, boost mood, prevent acne, smooth skin, and enhance barrier function.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application provides a full-effect protection and prevention repair composition for acne skin and application thereof, and belongs to the technical field of cosmetics. The repair composition of the application is compounded with sulforaphane, lactoferrin, bromelain, madecassic acid lactone and guaiacum extract as active ingredients. The five substances can synergistically act together from multiple aspects, enhance the skin protection, improve the skin light damage, reduce the oxidative stress level, reduce the influence of stress hormone cortisol, and improve the emotional positivity, so as to achieve the effects of preventing acne, smoothing the skin and enhancing the barrier function.
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