Array substrate and display panel
通过在内嵌式触控显示装置的阵列基板上设置信号屏蔽线和转接结构,解决了扫描线漏光的问题,提高了显示效果和像素开口率。
Patent Information
- Application Number
- CN202411030565.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-30
- Publication Date
- 2025-03-11
- Estimated Expiration
- 2044-07-30
AI Technical Summary
In embedded touch display devices, there is often a problem of light leakage in scanning lines, which affects the display effect and pixel opening rate.
设计了一种阵列基板,通过在衬底基板上设置像素电极块、公共电极块、扫描线和触控信号线,并利用信号屏蔽线和转接结构,将触控信号传输至信号屏蔽线,减弱或屏蔽扫描线产生的高电平信号。
Effectively reduce or eliminate light leakage problems of scanning lines, improve the display effect of the display panel, and ensure the pixel opening rate.
Smart Images

Figure CN119596605A_ABST
Abstract
Description
Technical Field
[0001] The present application belongs to the field of display technology, and specifically relates to an array substrate and a display panel. Background Art
[0002] With the development of the times and the advancement of technology, people not only have functional requirements for electronic products, but also increasingly demanding requirements for product appearance. This has promoted the continuous development of electronic products in the direction of light, thin, narrow and power-saving.
[0003] Born out of the times, in-cell touch display devices place touch electrode blocks that provide touch functions in the pixel structure. The touch electrode blocks are connected to a circuit through wires. This circuit can detect changes in capacitance on the touch electrode blocks to determine whether the corresponding position on the touch display device is touched. In in-cell designs, there is often a problem of light leakage on the scan line. Summary of the invention
[0004] The purpose of the present application is to provide an array substrate and a display panel, which can reduce or eliminate the light leakage problem of the scanning line and ensure the pixel aperture ratio.
[0005] In a first aspect, the present application provides an array substrate, comprising a substrate, and pixel electrode blocks, common electrode blocks, scan lines and touch signal lines arranged on the substrate, wherein the touch signal lines, the pixel electrode blocks and the common electrode blocks are all formed on a side of the scan lines away from the substrate, a plurality of the pixel electrode blocks and the common electrode blocks are provided, and are arranged in an array at intervals along a row direction and a column direction, the pixel electrode blocks and the common electrode blocks are arranged at intervals in a thickness direction of the substrate, and an orthographic projection of each common electrode block on the substrate covers at least an orthographic projection of one pixel electrode block on the substrate;
[0006] The scanning line extends in the row direction and is located between two adjacent rows of pixel electrode blocks;
[0007] The touch signal lines are provided in plurality and arranged at intervals from each other, and each of the touch signal lines is connected to a common electrode block, and the touch signal lines transmit common signals to the common electrode blocks when no touch is performed;
[0008] The array substrate further includes a transfer structure and a signal shielding line, wherein the signal shielding line and the touch signal line are arranged at intervals in the thickness direction of the base substrate, the transfer structure includes a connecting block, a first via structure and a second via structure, one end of the connecting block is connected to the touch signal line through the first via structure, and the other end of the connecting block is connected to the signal shielding line through the second via structure;
[0009] Among them, the interruption formed between two adjacent common electrode blocks in the row direction is defined as a row interruption, the orthographic projection of the row interruption on the substrate overlaps with the orthographic projection of the scanning line on the substrate, and the orthographic projection of the row interruption on the substrate is covered by the orthographic projection of the signal shielding line on the substrate.
[0010] In an exemplary embodiment of the present application, the connection block and the pixel electrode block are arranged in the same layer and are spaced apart from each other.
[0011] In an exemplary embodiment of the present application, the pixel electrode block is disposed on a side of the common electrode block away from the base substrate, the pixel electrode block is a slit electrode including a plurality of electrode strips arranged at intervals, and the common electrode block is a planar electrode.
[0012] In an exemplary embodiment of the present application, the signal shielding line is disposed on a side of the common electrode block away from the base substrate, and forms an insulating layer with the common electrode block.
[0013] In an exemplary embodiment of the present application, the array substrate also includes a first insulating layer, the first insulating layer covers the signal shielding line, the second via structure is provided on the first insulating layer, and the pixel electrode block is provided on a side of the first insulating layer away from the base substrate.
[0014] In an exemplary embodiment of the present application, a covering area is provided on a side of the signal shielding line away from the second via structure, and an orthographic projection of the covering area on the base substrate covers an orthographic projection of the active layer on the base substrate.
[0015] In an exemplary embodiment of the present application, the orthographic projection of the common electrode block on the base substrate covers the orthographic projections of at least two of the pixel electrode blocks on the base substrate.
[0016] In an exemplary embodiment of the present application, the array substrate further includes a plurality of data lines, the data lines extending in the column direction, and the plurality of data lines arranged in a spaced relationship with each other in the row direction.
[0017] The touch signal line and the data line are in the same layer and are spaced apart from each other. The touch signal line and the common electrode block are insulated from each other. The touch signal line is connected to the common electrode block through a third via structure.
[0018] In an exemplary embodiment of the present application, the array substrate includes a plurality of pixel units arranged in an array along row and column directions, each of the pixel units includes a plurality of pixel electrode blocks arranged at intervals in the column direction, the color resistance colors corresponding to any adjacent pixel electrode blocks in the column direction are different, and each of the pixel electrode blocks in the same pixel unit is connected to the data line in the same column and is respectively connected to the scan line of the corresponding row.
[0019] A second aspect of the present application provides a display panel, comprising:
[0020] an opposing substrate;
[0021] a liquid crystal layer; and
[0022] In any of the above array substrates, the counter substrate and the array substrate are arranged in a box, and the liquid crystal layer is arranged between the counter substrate and the array substrate.
[0023] The array substrate and display panel of the present application have at least the following beneficial effects:
[0024] The array substrate includes a substrate substrate and a scanning line, a pixel electrode block, a common electrode block, a touch signal line, a switching structure and a signal shielding line arranged on the substrate substrate. The orthographic projection of the common electrode block on the substrate substrate at least covers the orthographic projection of a pixel electrode block on the substrate substrate. There is a row discontinuity between two adjacent common electrode blocks in the row direction. The orthographic projection of the row discontinuity on the substrate substrate overlaps with the orthographic projection of the scanning line on the substrate substrate. The orthographic projection of the signal shielding line on the substrate substrate covers the orthographic projection of the row discontinuity on the substrate substrate. The switching structure includes a connecting block and a first via structure and a second via structure. One end of the connecting block is connected to the touch signal line through the first via structure, and the other end is connected to the signal shielding line through the second via structure. The signal in the touch signal line is transmitted to the signal shielding line through the connecting block. The signal in the signal shielding line can weaken or shield the high-level signal generated by the scanning line, thereby eliminating the signal generated by the scanning line that interferes with the deflection of the liquid crystal, ensuring the normal deflection of the liquid crystal, reducing or eliminating the light leakage problem generated by the scanning line, and improving the display effect of the display panel. In addition, by using the signal shielding line to shield the light leakage problem generated by the scanning line, it is not necessary to widen the size of the black matrix to shield the light leakage generated by the scanning line, thereby ensuring the pixel opening ratio.
[0025] Other features and advantages of the present application will become apparent from the following detailed description, or may be learned in part by the practice of the present application.
[0026] It should be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present application. BRIEF DESCRIPTION OF THE DRAWINGS
[0027] The drawings herein are incorporated into the specification and constitute a part of the specification, illustrate embodiments consistent with the present application, and together with the specification are used to explain the principles of the present application. Obviously, the drawings described below are only some embodiments of the present application, and for ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
[0028] Figure 1 It shows a schematic diagram of the structure in which the signal shielding lines provided in the first to fifth embodiments of the present application are arranged at row discontinuities;
[0029] Figure 2 It shows a schematic diagram of the structure in which a common electrode block provided in Embodiments 1 to 5 of the present application corresponds to two or more pixel electrode blocks;
[0030] Figure 3 It shows a schematic diagram of the structure of the connection between the touch signal line and the common electrode block provided in the first to fifth embodiments of the present application;
[0031] Figure 4 The schematic diagram of the arrangement structure of the red sub-pixel, the green sub-pixel and the blue sub-pixel provided in Embodiments 1 to 5 of the present application is shown;
[0032] Figure 5 It shows a schematic diagram of a structure in which the row discontinuities between adjacent common electrode blocks provided in Embodiments 1 to 5 of the present application are located on a scan line;
[0033] Figure 6 It shows a schematic structural diagram of a common electrode block provided in Embodiments 1 to 5 of the present application that adopts a full-surface design;
[0034] Figure 7 Shows Figure 6 Schematic diagram of the cross-sectional structure along the C-C' line;
[0035] Figure 8 Shows Figure 1 Schematic diagram of the cross-sectional structure along the middle line B-B';
[0036] Fig. 9 Shows Figure 1 Schematic diagram of the cross-sectional structure along the middle line A-A';
[0037] Fig.10 It shows a structural schematic diagram in which a first extension line is provided at one end of the main shielding line provided in the second embodiment or the fifth embodiment of the present application;
[0038] Fig.11 It shows a schematic structural diagram of a common electrode block provided in the second or fifth embodiment of the present application corresponding to two or more pixel electrode blocks;
[0039] Fig.12 Shows Fig.10 Schematic diagram of the cross-sectional structure along the middle line D-D';
[0040] Fig.13 It shows a schematic structural diagram of the support column and the array substrate provided in the first or fifth embodiment of the present application being arranged opposite to each other at a first extension line;
[0041] Fig.14 It shows a structural schematic diagram in which a second extension line is provided at one end of the main shielding line provided in the third embodiment or the fifth embodiment of the present application;
[0042] Fig.15 It shows a schematic structural diagram of a common electrode block corresponding to two or more pixel electrode blocks provided in the third or fifth embodiment of the present application;
[0043] Fig.16 Shows Fig.14 Schematic diagram of the cross-sectional structure along the middle line E-E';
[0044] Fig.17 It shows a schematic structural diagram of the support column and the array substrate provided in the third or fifth embodiment of the present application being arranged opposite to each other at the location where the shielding area is provided;
[0045] Fig.18 A schematic diagram showing a structure in which a signal shielding line provided in the fourth or fifth embodiment of the present application is connected to a common electrode block through a conductive via;
[0046] Fig.19 It shows a schematic structural diagram of a common electrode block corresponding to two or more pixel electrode blocks provided in the fourth or fifth embodiment of the present application;
[0047] Fig. 20 A schematic diagram of the structure of a display panel provided in Embodiment 3 of the present application is shown.
[0048] Description of reference numerals:
[0049] 10. Display panel; 100. Array substrate; 110. Base substrate; 120. Scan line; 130. Data line; 140. Touch signal line; 150. Sub-pixel; 150a. Red sub-pixel; 150b. Green sub-pixel; 150c. Blue sub-pixel; 151. Transistor; 1510. Gate; 1511. Active layer; 1512. First electrode; 1513. Second electrode; 152. Pixel electrode block; 1520. First electrode strip; 1521. First edge electrode strip; 1522. Second edge electrode strip; 1523. Connecting portion; 160. Common electrode block; 170 , signal shielding line; 171, first extension line; 172, second extension line; 1720, covering area; 180, gate insulation layer; 190, row interruption; 1100, transfer structure; 1101, connecting block; 1102, first via structure; 1103, second via structure; 1110, first insulating layer; 1120, flat layer; 1130, second insulating layer; 1140, third insulating layer; 200, opposing substrate; 210, base; 220, supporting column; 300, liquid crystal layer; M, third via structure; N1, first overlapping area; N2, second overlapping area; P, conductive via. DETAILED DESCRIPTION
[0050] Example embodiments will now be described more fully with reference to the accompanying drawings. However, example embodiments can be implemented in a variety of forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this application will be more comprehensive and complete and fully convey the concept of the example embodiments to those skilled in the art.
[0051] In this application, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.
[0052] In this application, unless otherwise clearly specified and limited, the terms "assembly", "connection" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.
[0053] In addition, described feature, structure or characteristic can be combined in one or more embodiments in any suitable manner. In the following description, many specific details are provided to provide a full understanding of the embodiments of the present application. However, those skilled in the art will appreciate that the technical scheme of the present application can be put into practice without one or more of the specific details, or other methods, components, devices, steps, etc. can be adopted. In other cases, known methods, devices, realizations or operations are not shown or described in detail to avoid blurring the various aspects of the application.
[0054] Embodiment 1
[0055] The first embodiment of the present application provides an array substrate 100, which is applied to an embedded touch display panel 10. The display panel 10 may adopt a Fringe Field Switching (FFS) technology, which has the characteristics of fast response time, high light transmittance, and wide viewing angle.
[0056] See also Figures 1 to 3 As shown, the array substrate 100 may include a base substrate 110 and scan lines 120, data lines 130, touch signal lines 140, sub-pixels 150, common electrode blocks 160 and signal shielding lines 170 arranged on the base substrate 110. The data lines 130, touch signal lines 140, common electrode blocks 160 and signal shielding lines 170 are all formed on the side of the scan lines 120 away from the base substrate 110.
[0057] The base substrate 110 may be a glass substrate, but is not limited thereto, and may also be a substrate made of other materials, such as PI material, etc.
[0058] A plurality of pixel units are disposed on the base substrate 110 . The plurality of pixel units may be arranged in an array along a row direction X and a column direction Y on the base substrate 110 .
[0059] Among them, see Figure 4 As shown, each pixel unit includes a plurality of sub-pixels 150 arranged at intervals in the column direction Y, and the color resistance colors corresponding to any two adjacent sub-pixels 150 in the column direction Y are different, that is, the colors corresponding to adjacent sub-pixels 150 in the same pixel unit are different. In addition, the sub-pixels 150 in the same pixel unit are all connected to the same column data line 130, and the sub-pixels 150 in the same pixel unit are respectively connected to the corresponding row scan lines 120.
[0060] For example, see Figure 4As shown, the pixel unit may include a red sub-pixel 150a, a green sub-pixel 150b, and a blue sub-pixel 150c, which are arranged in sequence in the column direction Y, and the color resistances corresponding to the red sub-pixel 150a, the green sub-pixel 150b, and the blue sub-pixel 150c are different in color, that is, they correspond to red color resistance, green color resistance, and blue color resistance respectively. The red sub-pixel 150a, the green sub-pixel 150b, and the blue sub-pixel 150c in the same pixel unit share the same data line 130, and the red sub-pixel 150a, the green sub-pixel 150b, and the blue sub-pixel 150c in the same pixel unit are connected to three different scan lines 120 respectively. That is, by using a three-gate 1510 transistor 151, the number of scan lines 120 becomes three times compared to the solution in which three sub-pixels 150 in the pixel unit are arranged at intervals in the row direction X. The number of scan lines 120 increases, and the source driver chip is reduced by 2 / 3, which can achieve the purpose of cost saving.
[0061] It should be noted that each pixel unit may include not only the three sub-pixels 150 mentioned above, but also four or more sub-pixels 150 , which may be specifically designed according to different embodiments and is not specifically limited here.
[0062] See also Figure 1 As shown, each sub-pixel 150 may include a transistor 151, and the transistor 151 may include a gate 1510, an active layer 1511, and a first electrode 1512 and a second electrode 1513 arranged in the same layer. A gate insulating layer 180 may be arranged between the gate 1510 and the active layer 1511 to insulate the gate 1510 and the active layer 1511 from each other; and the first electrode 1512 and the second electrode 1513 may be overlapped with the source and drain doping regions of the active layer 1511, respectively. Specifically, the corresponding connection relationship between the first electrode 1512 and the second electrode 1513 and the source and drain doping regions of the active layer 1511 may be determined according to whether the transistor 151 is N-type or P-type, that is, one of the first electrode 1512 and the second electrode 1513 is the source, and the other is the drain.
[0063] For example, the transistor 151 of the embodiment of the present application may be a bottom gate type, that is, the gate 1510 may be first formed on the base substrate 110; then, a gate insulating layer 180 is formed on the base substrate 110, and the gate insulating layer 180 covers the gate 1510; then, an active layer 1511 is formed on the side of the gate insulating layer 180 away from the base substrate 110, that is, the active layer 1511 is located on the side of the gate 1510 away from the base substrate 110, and the active layer 1511 and the gate 1510 are on the base substrate. There is overlap in the orthographic projection on the plate 110. For example, the orthographic projection of the active layer 1511 on the substrate 110 may be located within the orthographic projection of the gate 1510 on the substrate 110; the first pole 1512 and the second pole 1513 may be formed after the active layer 1511 is formed, and at least a portion of the first pole 1512 may overlap on a doped region of the source and drain doped regions of the active layer 1511; at least a portion of the second pole 1513 may overlap on another doped region of the source and drain doped regions of the active layer 1511.
[0064] It should be noted that the transistor 151 in the embodiment of the present application is not limited to the bottom gate type mentioned above, but can also be a top gate type.
[0065] The scan line 120 may extend in the row direction X, wherein the scan line 120 may be connected to the gate 1510 of the transistor 151 to control the on or off of the transistor 151. Optionally, the scan line 120 may be disposed in the same layer as the gate 1510 of the transistor 151 and connected as one piece.
[0066] In this application, "same-layer arrangement" refers to using the same film-forming process to form a film layer for forming a specific pattern, and then using the same mask to form a layer structure through a single patterning process. That is, one patterning process corresponds to a mask (also called a photomask). Depending on the specific pattern, a single patterning process may include multiple exposure, development or etching processes, and the specific pattern in the formed layer structure may be continuous or discontinuous, and these specific patterns may also be at different heights or have different thicknesses. This simplifies the manufacturing process, saves manufacturing costs, and improves production efficiency.
[0067] For example, the scanning line 120 may be made of metal or alloy materials, such as molybdenum, aluminum, and titanium, to ensure good electrical conductivity, but is not limited thereto, and may also be made of other materials with good electrical conductivity.
[0068] See also Figure 1 and Figure 2As shown, the data line 130 may extend in the column direction Y, wherein the data line 130 may be connected to the second electrode 1513 of the transistor 151 to write a data signal to the second end of the transistor 151. Optionally, the data line 130 may be disposed in the same layer as the second electrode 1513 of the transistor 151 and connected as one.
[0069] The data line 130 may be made of metal or alloy materials, such as molybdenum, aluminum, and titanium, to ensure good conductivity, but is not limited thereto, and may also be made of other materials with good conductivity.
[0070] See also Figure 1 and Figure 4 As shown, each sub-pixel 150 further includes a pixel electrode block 152, and in the same pixel unit, the color resistance corresponding to any two adjacent pixel electrode blocks 152 is different. The pixel electrode block 152 can be connected to the first electrode 1512 of the transistor 151. When the transistor 151 is turned on in response to the scanning signal provided by the scanning line 120, the data signal provided by the data line 130 can flow into the first electrode 1512 of the transistor 151 through the second electrode 1513, thereby being written to the pixel electrode block 152 to form a voltage difference with the common voltage on the opposite substrate 200 side of the display panel 10, thereby causing the liquid crystal molecules between the opposite substrate 200 and the array substrate 100 to deflect, thereby realizing the display function.
[0071] The pixel electrode block 152 of the embodiment of the present application may be a transparent electrode. For example, it may be made of ITO (indium tin oxide) material to improve light transmittance, but is not limited thereto and may also be made of other transparent conductive materials.
[0072] For example, the pixel electrode block 152 can be formed after the first electrode 1512 and the second electrode 1513 of the transistor 151 are formed, and an insulating layer can be arranged between the pixel electrode block 152 and the metal layer where the first electrode 1512 and the second electrode 1513 of the transistor 151 are located, and the pixel electrode block 152 can be connected to the first electrode 1512 of the transistor 151 through a via hole penetrating this insulating layer.
[0073] In the column direction Y, see Figure 5 As shown, the above-mentioned scan line 120 is disposed between two adjacent rows of pixel electrode blocks 152 , that is, the scan line 120 is located between two adjacent pixel electrode blocks 152 in the column direction Y.
[0074] See also Figure 3 and Figure 5As shown, the common electrode block 160 is multiplexed as a touch electrode block, and multiple common electrode blocks 160 are arranged in an array in the row direction X and the column direction Y. The common electrode blocks 160 and the pixel electrode blocks 152 are arranged alternately in the vertical direction. The common electrode block 160 can be arranged above the pixel electrode block 152, or the pixel electrode block 152 can be arranged above the common electrode block 160.
[0075] In the examples of this application, see Figure 7 As shown, the common electrode block 160 is disposed below the pixel electrode block 152, and the common electrode block 160 is insulated from the pixel electrode block 152 by an insulating layer. The pixel electrode block 152 of this embodiment is a slit electrode including a plurality of electrode strips arranged at intervals, that is, a slit is provided at the position corresponding to the opening area.
[0076] For example, see Figure 1 As shown, this pixel electrode block 152 includes a first electrode strip 1520, a first edge electrode strip 1521, a second edge electrode strip 1522 and a connecting portion 1523. The plurality of first electrode strips 1520 are arranged at intervals in the column direction Y, and slits are formed between adjacent first electrode strips 1520; the first edge electrode strip 1521 is disposed at one end of the plurality of first electrode strips 1520 and is connected to the ends of the plurality of first electrode strips 1520; the second edge electrode strip 1522 is disposed at the other end of the plurality of first electrode strips 1520 and is connected to the ends of the plurality of first electrode strips 1520; the connecting portion 1523 is connected to a side of the second edge electrode strip 1522 away from the first electrode strip 1520, and the connecting portion 1523 is connected to the first electrode 1512 through a via.
[0077] It is worth mentioning that see Figure 6 and Figure 7 As shown, the common electrode block 160 may be a planar electrode. The orthographic projection of the common electrode block 160 on the base substrate 110 at least covers the orthographic projection of one pixel electrode block 152 on the base substrate 110 , that is, the common electrode block 160 corresponds to at least one pixel electrode block 152 .
[0078] An optional embodiment, see Figure 1 As shown, the orthographic projection of a common electrode block 160 on the base substrate 110 covers the orthographic projection of a pixel electrode block 152 on the base substrate 110 , that is, the common electrode block 160 corresponds to the pixel electrode block 152 one by one.
[0079] Another optional embodiment, see Figure 2 , Figure 6 and Figure 7As shown, the orthographic projection of a common electrode block 160 on the base substrate 110 covers the orthographic projections of two or more pixel electrode blocks 152 on the base substrate 110 , that is, one common electrode block 160 corresponds to two or more pixel electrode blocks 152 .
[0080] See also Figure 3 As shown, in order to achieve touch control, a plurality of touch signal lines 140 are provided on the array substrate 100 . The plurality of touch signal lines 140 are arranged in sequence and spaced apart in the row direction X. The touch signal lines 140 are connected to the common electrode blocks 160 in a one-to-one correspondence to transmit touch signals to the common electrode blocks 160 .
[0081] It is worth mentioning that the touch signal line 140 and the common electrode block 160 are arranged in the thickness direction of the base substrate 110, that is, the touch signal line 140 and the common electrode block 160 are arranged in the vertical direction, and an insulating layer is provided between the common electrode block 160 and the touch signal line 140. The touch signal line 140 is connected to the common electrode block 160 through the second via structure 1103 penetrating the insulating layer, so as to transmit the touch signal. Figure 3 shown.
[0082] The touch signal line 140 and the first electrode 1512 may be disposed in the same layer, and the two may be disposed at an interval to avoid interference between the touch signal line 140 and the first electrode 1512 , thereby ensuring touch and display effects.
[0083] The touch signal line 140 can be made of the same material as the data line 130, and can be made of metal or alloy materials, such as molybdenum, aluminum and titanium, to ensure good conductivity, but is not limited thereto, and can also be made of other materials with good conductivity.
[0084] It is understandable that by arranging the touch signal line 140 and the first electrode 1512 in the same layer, the film layer designed for the touch signal line 140 can be reduced, the thickness of the array substrate 100 can be reduced, and the thickness of the display panel 10 can be further reduced.
[0085] See also Figure 5 As shown, in order to avoid short circuit between adjacent common electrode blocks 160, adjacent common electrode blocks 160 are discontinuous 190, and the discontinuity formed between two adjacent common electrode blocks 160 in the row direction X is defined as a row discontinuity 190. That is, there is a row discontinuity 190 between two adjacent common electrode blocks 160 in the column direction Y.
[0086] See also Figure 5As shown, in order to increase the aperture ratio, the line break 190 is disposed on the scan line 120, that is, the orthographic projection of the line break 190 on the base substrate 110 overlaps with the orthographic projection of the scan line 120 on the base substrate 110. That is, part of the scan line 120 is exposed at the line break 190.
[0087] The signal input by the scan line 120 is a high-level signal, which will interfere with the voltage signal of the pixel electrode block 152, thereby affecting the deflection angle of the liquid crystal, thereby causing light leakage.
[0088] See also Figure 1 and Figure 8 As shown, in order to eliminate or reduce the light leakage problem caused by the scan line 120 , the present application utilizes the signal shielding line 170 to shield the high level signal of the scan line 120 .
[0089] In addition, see Fig. 9 As shown, the array substrate 100 also includes a transfer structure 1100, which includes a connecting block 1101, a first via structure 1102 and a second via structure 1103. One end of the connecting block 1101 is electrically connected to the touch signal line 140 through the first via structure 1102, and the other end of the connecting block 1101 is connected to the signal shielding line 170 through the second via structure 1103.
[0090] See also Figure 8 As shown, the orthographic projection of the signal shielding line 170 on the base substrate 110 covers the orthographic projection of the line discontinuity 190 on the base substrate 110, and the signal shielding line 170 is connected to the adjacent touch signal line 140 through the connecting block 1101, and the touch signal line 140 is usually a common signal. Therefore, the signal shielding line 170 will receive the common signal transmitted by the touch signal line 140, and the signal shielding line 170 that inputs the common signal is used to shield the scanning signal of the scanning line 120. That is, the signal shielding line 170 is used to cover the line discontinuity 190, and the common signal transmitted by the touch signal line 140 is input to the signal shielding line 170, so as to weaken or shield the high-level signal of the scanning line 120, reduce or eliminate the influence of the high-level signal in the scanning line 120 on the liquid crystal molecules, avoid the deflection of the liquid crystal molecules caused by the high-level signal, and thus reduce or eliminate the problem of light leakage of the scanning line 120.
[0091] It is worth mentioning that the orthographic projection of the signal shielding line 170 on the base substrate 110 may or may not overlap with the orthographic projections of the two adjacent common electrode blocks 160 on the base substrate 110. The signal shielding line 170 can completely cover the line break 190 so as to shield the scanning line 120 exposed by the line break 190.
[0092] In addition, the touch signal line 140 can transmit a common signal to the common electrode block 160 when no touch is performed, so as to transmit the common signal to the signal shielding line 170 .
[0093] In some embodiments of the present application, the orthographic projection of the signal shielding line 170 on the base substrate 110 overlaps with the orthographic projections of two adjacent common electrode blocks 160 on the base substrate 110, and the width of the overlapping area in the column direction may be the same or different. By having an overlapping area between the signal shielding line 170 and the two adjacent common electrode blocks 160, it can better shield the high-level signal of the scanning line 120, avoid the scanning line 120 directly affecting the pixel electrode block 152, and reduce or eliminate the light leakage problem of the scanning line 120.
[0094] In the embodiment of the present application, the connection block 1101 and the pixel electrode block 152 are in the same layer and spaced apart, that is, the connection block 1101 and the pixel electrode block 152 are spaced apart from each other on the base substrate 110 using the same film forming process. The connection block 1101 and the pixel electrode block 152 are made of the same material.
[0095] It is understandable that the connection block 1101 may also be formed of other materials and not disposed on the same layer as the pixel electrode block 152. Alternatively, the connection block 1101 may be made of other materials and disposed on the same layer as the pixel electrode block 152.
[0096] It is worth mentioning that see Figure 1 and Figure 2 As shown, in the row direction X: the edge of the signal shielding line 170 close to the transistor 151 exceeds the edge of the second edge electrode strip 1522 to reduce the light leakage problem of the scan line 120 at the edge of the adjacent common electrode block 160 and ensure the shielding effect of the scan line 120.
[0097] In the examples of this application, see Figure 8 and Fig. 9 As shown, the array substrate 100 also includes a first insulating layer 1110, a flat layer 1120, a second insulating layer 1130 and a third insulating layer 1140. The first insulating layer 1110 is formed between the signal shielding line 170 and the pixel electrode block 152, the second insulating layer 1130 is formed between the signal shielding line 170 and the common electrode block 160, and the flat layer 1120 and the third insulating layer 1140 are formed between the common electrode block 160 and the touch signal line 140. The third insulating layer 1140 is arranged on a side of the flat layer 1120 close to the base substrate 110, that is, the flat layer 1120 is arranged above the third insulating layer 1140.
[0098] In the embodiment of the present application, the first insulating layer 1110 adopts a composite, single-layer or stacked-layer structure of silicon nitride (SiOx) and silicon oxide (SiNx), and can reduce the capacitance between the gate 1510 and the pixel electrode block 152, thereby improving the quality of the display panel 10; the flat layer 1120 adopts an organic acrylic material, which can play a flat and insulating role, so that the common electrode block 160 has a whole-surface flat design.
[0099] Understandably, see Figure 8 As shown, this flat layer 1120 is arranged between the third insulating layer 1140 and the common electrode block 160, which can enhance the shielding effect of the signal shielding line 170 on the scanning line 120, and further weaken the deflection of the liquid crystal molecules by the high-level signal of the scanning line 120, so as to reduce the light leakage problem caused by the scanning line 120 and improve the display effect of the display panel 10.
[0100] The third insulating layer 1140 covers the touch signal line 140 and the data line 130 . To ensure that the touch signal line 140 is connected to the common electrode, a third via structure M is opened on the flat layer 1120 and the third insulating layer 1140 to ensure that the common electrode block 160 is connected to the touch signal line 140 .
[0101] The second insulating layer 1130 covers the common electrode block 160 , and the signal shielding line 170 is disposed on a side of the second insulating layer 1130 away from the base substrate 110 .
[0102] The second insulating layer 1130 and the third insulating layer 1140 may both be made of silicon nitride (SiOx) or silicon oxide (SiNx).
[0103] The signal shielding line 170 in the present application solution connects the signal shielding line 170 and the touch signal line 140 through the connecting block 1101, and transmits the common signal in the touch signal line 140 to the signal shielding line 170. The signal shielding line 170 is used to shield the scan line 120 exposed by the upper row discontinuity 190 of the adjacent common electrode block 160, thereby reducing or eliminating the influence of the high-level signal of the scan line 120 on the pixel electrode block 152, thereby reducing or eliminating the light leakage problem caused by the scan line 120; moreover, by using the signal shielding line 170 to shield the scan line 120, it is not necessary to widen the size of the black matrix (BM), and the size of the pixel electrode block 152 can be designed to be larger, thereby improving the pixel aperture ratio.
[0104] Embodiment 2
[0105] See also Figures 10 to 13As shown, the difference between the second embodiment of the present application and the first embodiment is that the signal shielding line 170 extends a first extension line 171 at one end close to the touch signal line 140 connected thereto, and the first extension line 171 extends in the row direction X and is the same as the extension direction of the scan line 120.
[0106] The counter substrate 200 disposed opposite to the array substrate 100 includes a base 210 and support columns 220 disposed on the base 210 . The support columns 220 extend vertically toward the base substrate 110 to support the cell gap between the array substrate 100 and the counter substrate 200 .
[0107] Among them, see Fig.12 and Fig.13 As shown, the height of the array substrate 100 at the location where the first extension line 171 is provided is greater than the height of the array substrate 100 at the location where the first extension line 171 is not provided, and the support column 220 abuts at the area corresponding to the first extension line 171 of the array substrate 100, that is, the support column 220 and the area corresponding to the first extension line 171 are opposite to each other, so as to avoid the support column 220 directly contacting the alignment film at the opening area, and ensure the normal alignment of the liquid crystal molecules at the opening area. And because the height of the array substrate 100 at the location where the first extension line 171 is provided is greater than the height of the array substrate 100 at the location where the first extension line 171 is not provided, even when the support column 220 slides off from the area corresponding to the first extension line 171, there is still liquid crystal support, and the alignment film of the array substrate 100 will not be scratched, thus avoiding the problem of starry sky, and improving the taste of the display panel 10.
[0108] It can be understood that the height of the overlapping area between the touch signal line 140 and the first extension line 171 is higher than the height of the first extension line 171 which is not located in the overlapping area of the touch signal line 140 .
[0109] In the embodiment of the present application, the support column 220 is in contact with the overlapping area of the first extension line 171 and the touch signal line 140, and the array substrate 100 is aligned with the support column 220 at the overlapping area of the first extension line 171 and the touch signal line 140. The support column 220 does not directly contact the alignment film in the opening area, and will not scratch the alignment film in the opening area, thereby avoiding the problem of starry sky. In this way, the signal shielding line 170 and the first extension line 171 can avoid light leakage from the scan line 120, and can also avoid scratches on the alignment film on the array substrate 100, thereby improving the taste of the display panel 10.
[0110] Embodiment 3
[0111] See also Fig.14 and Fig.17As shown, the difference between the third embodiment of the present application and the second embodiment is that a second extension line 172 is further provided at one end of the signal shielding line 170 away from the touch signal line 140 connected thereto, the extension direction of the second extension line 172 is the same as the extension direction of the scanning line 120, and a covering area 1720 is provided on the second extension line 172, the orthographic projection of the covering area 1720 on the base substrate 110 covers the orthographic projection of the active layer 1511 on the base substrate 110.
[0112] The covering area 1720 can completely cover and protect the channel area of the transistor 151, thereby preventing the etching solution from penetrating into the active layer 1511 due to cracks or loose films in the planar layer 1120, the second insulating layer 1130 and the third insulating layer 1140 when preparing the common electrode block 160 and the pixel electrode block 152, thereby affecting the characteristics of the transistor 151.
[0113] In addition, the height of the area with the covering area 1720 is greater than the height of the area without the covering area 1720. The covering area 1720 can correspond to the support column 220 on the opposing substrate 200, and the support column 220 can be aligned with the covering area 1720 of the array substrate 100. Therefore, even if the support column 220 slides down from the area corresponding to the covering area 1720, there is still liquid crystal support, and the alignment film of the array substrate 100 will not be scratched, thereby avoiding the problem of starry sky, and improving the taste of the display panel 10.
[0114] The present application scheme can shield the scanning signal of the scanning line 120 through the signal shielding line 170 and the covering area 1720, and can also align the support column 220 to prevent the support column 220 from scratching the alignment film in the opening area, thereby ensuring the alignment stability of the liquid crystal molecules. It can also prevent the etching solution from damaging the active layer 1511 when preparing the common electrode block 160 and the pixel electrode block 152, thereby improving the characteristics of the transistor 151.
[0115] Embodiment 4
[0116] See also Figure 18 to Figure 19 As shown, the difference between the fourth embodiment of the present application and the first embodiment is that the signal shielding line 170 is connected to the common electrode block 160 instead of the touch signal line 140. This can reduce the size of the touch signal line 140 as much as possible and increase the area of the pixel opening region.
[0117] In the embodiment of the present application, part of the common electrode block 160 is connected to the signal shielding line 170 through the conductive via P. Since the orthographic projection of the signal shielding line 170 on the base substrate 110 is located within the orthographic projection of the scanning line 120 on the base substrate 110, the conductive via P can be set within the orthographic projection of the scanning line 120 on the base substrate 110. In this way, it is possible to avoid opening the conductive via P on the touch signal line 140. The size of the main touch line can be designed to be smaller, thereby reducing the excessive space occupied by the touch signal line 140 and ensuring the pixel opening rate.
[0118] For example, the signal shielding line 170 is disposed on a side of the common electrode block 160 away from the base substrate 110, a second insulating layer 1130 is disposed between the signal shielding line 170 and the common electrode block 160, a conductive via P is provided on the second insulating layer 1130, the conductive via P exposes a portion of the common electrode block 160, and the signal shielding line 170 is connected to the common electrode block 160 through the conductive via P. In the column direction Y, the first of the two adjacent common electrode blocks 160 and the orthographic projection of the signal shielding line 170 on the base substrate 110 have a first overlapping region N1, and are connected at the first overlapping region N1 through the conductive via P penetrating the second insulating layer 1130, and the second of the two adjacent common electrode blocks 160 in the column direction Y and the signal shielding line 170 have a second overlapping region N2, and the width of the second overlapping region N2 in the column direction is smaller than the width of the first overlapping region N1 in the column direction. That is, the orthographic projection of the signal shielding line 170 on the base substrate 110 and the orthographic projection of the common electrode block 160 connected thereto on the base substrate 110 have a first overlapping area N1, and the conductive via P is located in the first overlapping area N1. The signal shielding line 170 can use the first overlapping area N1 to shield the scanning line 120 and also connect to the common electrode block 160.
[0119] It is understandable that disposing the conductive via P at the overlapping area between the signal shielding line 170 and the common electrode block 160 can reduce the size of the main touch line, thereby reducing the space occupied by the touch signal line 140 on the base substrate 110 and ensuring the pixel aperture ratio.
[0120] In the embodiment of the present application, the touch signal line 140 is electrically connected to the driving chip to receive the touch signal transmitted by the driving chip, etc. The common electrode block 160 close to the driving chip is defined as the end common electrode block 160, and the touch signal line 140 correspondingly connected to the end common electrode block 160 is defined as the end touch signal line 140, and the end touch signal line 140 is connected to the end common electrode block 160. That is, in the column direction Y, the common electrode block 160 close to the driving chip is connected to the touch signal line 140, and the signal shielding line 170 is not used to connect to the common electrode block 160, so as to ensure the connection with the common electrode block 160, reduce the use of the signal shielding line 170, ensure the touch effect, and reduce the production cost.
[0121] Embodiment 5
[0122] See also Fig. 20 As shown, the fifth embodiment of the present application provides a display panel 10, and the display panel 10 may be a liquid crystal display panel 10. The display panel 10 may include the array substrate 100 described in the first embodiment, which will not be repeated here. Fig. 20 As shown, in addition, the display panel 10 further includes an opposing substrate 200 arranged in a box with the array substrate 100 and a liquid crystal layer 300 located between the array substrate 100 and the opposing substrate 200 .
[0123] The counter substrate 200 may include a glass substrate and a color resist layer, a BM layer, a common electrode plate, an alignment film, a support column 220, etc. formed on the glass substrate, which will not be described in detail here. The support column 220 corresponds to the signal shielding line 170, which can prevent the support column 220 from directly contacting the alignment film in the opening area of the array substrate 100, avoid scratching the alignment film in the pixel opening area, ensure the alignment of the liquid crystal molecules, and avoid the problem of starry sky, such as Fig.13 or Fig.17 shown.
[0124] Among them, this support column 220 can be aligned with one of the first extension line 171 in Example 2 or the second extension line 172 in Example 3 to avoid scratching the alignment film on the side of the array substrate 100, ensure the alignment effect on the liquid crystal molecules, and improve the display quality of the display panel 10.
[0125] In some embodiments, the first extension line 171 and the second extension line 172 on the array substrate 100 side correspond to different support pillars 220 , and the first extension line 171 and the second extension line 172 correspond to different support pillars 220 and abut against them.
[0126] It is worth mentioning that the color resist layer on the opposite substrate 200 side may also be disposed on the array substrate 100 , depending on the specific situation.
[0127] The BM layer shields the scan line 120 , the data line 130 , the touch signal line 140 and the signal shielding line 170 to avoid affecting the picture display.
[0128] In the description of this specification, the description with reference to the terms "some embodiments", "exemplarily", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.
[0129] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the present application. Therefore, any changes or modifications made in accordance with the claims and description of the present application should fall within the scope of the patent of this application.
Claims
1. An array substrate, comprising a base substrate and pixel electrode blocks, common electrode blocks, scan lines and touch signal lines arranged on the base substrate, wherein the touch signal lines, the pixel electrode blocks and the common electrode blocks are all formed on a side of the scan line away from the base substrate, characterized in that: The pixel electrode blocks and the common electrode blocks are provided in plurality and are arranged in an array in a row direction and a column direction at intervals. The pixel electrode blocks and the common electrode blocks are arranged in a thickness direction of the base substrate at intervals, and the orthographic projection of each common electrode block on the base substrate at least covers the orthographic projection of one pixel electrode block on the base substrate; The scanning line extends in the row direction and is located between two adjacent rows of pixel electrode blocks; The touch signal lines are provided in plurality and arranged at intervals from each other, and each of the touch signal lines is connected to a common electrode block, and the touch signal lines transmit common signals to the common electrode blocks when no touch is performed; The array substrate further includes a transfer structure and a signal shielding line, wherein the signal shielding line and the touch signal line are arranged at intervals in the thickness direction of the base substrate, the transfer structure includes a connecting block, a first via structure and a second via structure, one end of the connecting block is connected to the touch signal line through the first via structure, and the other end of the connecting block is connected to the signal shielding line through the second via structure; Among them, the interruption formed between two adjacent common electrode blocks in the row direction is defined as a row interruption, the orthographic projection of the row interruption on the substrate overlaps with the orthographic projection of the scanning line on the substrate, and the orthographic projection of the row interruption on the substrate is covered by the orthographic projection of the signal shielding line on the substrate.
2. The array substrate according to claim 1, characterized in that: The connection block and the pixel electrode block are arranged in the same layer and are spaced apart from each other.
3. The array substrate according to claim 1 or 2, characterized in that: The pixel electrode block is arranged on a side of the common electrode block away from the base substrate. The pixel electrode block is a slit electrode including a plurality of electrode strips arranged at intervals, and the common electrode block is a planar electrode.
4. The array substrate according to claim 3, characterized in that: The signal shielding line is arranged on a side of the common electrode block away from the base substrate and forms an insulating layer with the common electrode block.
5. The array substrate according to claim 4, characterized in that: The array substrate further comprises a first insulating layer, the first insulating layer covers the signal shielding line, the second via structure is arranged on the first insulating layer, and the pixel electrode block is arranged on a side of the first insulating layer away from the base substrate.
6. The array substrate according to claim 1, characterized in that: The signal shielding line is provided with a second extension line at one end away from the touch signal line connected thereto, and the second extension line is provided with a covering area, and the orthographic projection of the covering area on the base substrate covers the orthographic projection of the active layer on the base substrate.
7. The array substrate according to claim 1, characterized in that: The orthographic projection of the common electrode block on the base substrate covers the orthographic projections of at least two of the pixel electrode blocks on the base substrate.
8. The array substrate according to claim 1, characterized in that: The array substrate further comprises a plurality of data lines, the data lines extending in the column direction, and the plurality of data lines being arranged at intervals from each other in the row direction; The touch signal line and the data line are in the same layer and are spaced apart from each other. The touch signal line and the common electrode block are insulated from each other. The touch signal line is connected to the common electrode block through a third via structure.
9. The array substrate according to claim 8, characterized in that: The array substrate includes a plurality of pixel units arranged in an array along row and column directions, each of the pixel units includes a plurality of pixel electrode blocks arranged at intervals in the column direction, the color resistance colors corresponding to any adjacent pixel electrode blocks in the column direction are different, and each of the pixel electrode blocks in the same pixel unit is connected to the data line in the same column and is respectively connected to the scan line in the corresponding row.
10. A display panel, characterized in that: include: an opposing substrate; Liquid crystal layer; as well as According to any one of claims 1 to 9, the counter substrate is arranged in a box with the array substrate, and the liquid crystal layer is arranged between the counter substrate and the array substrate.
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