Anti-dazzle anti-reflection structure capable of suppressing display flash point and manufacturing method of anti-dazzle anti-reflection structure

Abstract

The invention belongs to the technical field of display equipment, and particularly relates to an anti-dazzle anti-reflection structure capable of suppressing display flash points and a manufacturing method thereof, and the manufacturing method comprises the following steps: designing and processing a micro-nano structure pattern mask plate; manufacturing an AG micro-nano structure on the surface of the glass substrate; and plating a top layer on the surface of the AG micro-nano structure by using an electron beam evaporation coating process. The manufacturing process provided by the invention is simple in route, and the method is suitable for various types of glass substrates such as 2D, 2.5 D and 3D. The designed grain structure distribution has the random characteristic, the average distribution period of the structure is in the micron dimension, the anti-dazzle characteristic is achieved, the flash point problem of the display panel can be effectively restrained, the anti-reflection effect of the structure cannot be reduced through the AF film plated on the top layer, the surface of the glass base material does not have obvious moire patterns and rainbow patterns after the structure is processed, and the anti-dazzle performance of the display panel is improved. Meanwhile, the anti-reflection effect is improved by correspondingly increasing the transmission light, so that the visual experience of a user is improved.

Description

Technical Field

[0001] The present invention belongs to the technical field of display equipment, and in particular to an anti-reflection structure capable of suppressing display flash points and preventing glare, and a manufacturing method thereof. Background Art

[0002] At present, the display screens of mobile phones, tablets, TVs, and car-mounted display devices usually use traditional AG glass made by chemical etching or physical grinding. The purpose of using this traditional AG glass is to prevent glare and adjust the strong reflected light on the glass surface to diffuse reflection to improve the user's visual effect. However, the traditional AG glass has a poor ability to suppress display flash points, and combining it with AR film will reduce the overall anti-reflection effect.

[0003] For example, Chinese patent publication number CN113461342A discloses an anti-glare glass product and a method for manufacturing the anti-glare glass product. The prepared anti-glare glass product comprises at least one surface, wherein the surface has at least one region with a roughness RMS of 10 nm to 1000 nm, a DOI of 30 to 70, a gloss value of less than 40 at a viewing angle of 60°, and a haze value of less than 3% determined by transmittance in a region where the region of at least one surface is arranged; at least one region of at least one surface has a transmissivity greater than 0.1 mm. 2 And less than 3mm 2 The ratio of Spk to Svk determined within the measurement area is equal to 1±0.1. The anti-glare glass product disclosed in this patent has a surface structure size of AG glass of several tens of microns, which cannot achieve the characteristic of suppressing the flash point.

[0004] For example, the Chinese patent with publication number CN115677231A discloses a high-fog spray AG process and a high-fog AG glass cover plate made therefrom, and the process steps include: conventional spraying: spraying the anti-glare liquid onto the glass surface at a first spraying pressure and a first flow rate, baking and curing to form an ordinary AG coating; special spraying: spraying the anti-glare liquid onto the formed ordinary AG coating at a second spraying pressure and a second flow rate, baking and curing to form a high-fog AG coating; the second spraying pressure is lower than the first spraying pressure, and the second flow rate is lower than the first flow rate. Through a high-fog spray AG process disclosed in this patent, a sprayed AG glass with a degree of atomization equivalent to that of etched AG glass can be obtained, but the flash point and transmittance loss problems caused by higher haze cannot be solved. Summary of the invention

[0005] The object of the present invention is to provide an anti-reflection structure capable of suppressing display flash points and preventing glare, and a method for making the same.

[0006] By processing ice cracks or maze patterns on the surface of the glass cover plate, and loading a hard film or AF film on the top layer, the AG glass cover plate produced has moderate haze, high transmittance, and has obvious flash point suppression and anti-fingerprint properties.

[0007] To achieve the above object, the present invention provides the following technical solutions:

[0008] The present invention provides a method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare, comprising the following steps:

[0009] Step S1: design and processing of micro-nano structure texture mask plate;

[0010] Step S2: Fabrication of AG micro-nanostructure on the surface of glass substrate;

[0011] Step S3: using an electron beam evaporation coating process to coat a top layer on the surface of the AG micro-nano structure.

[0012] As a preferred implementation, the specific implementation process of step S1 is:

[0013] S1.1: Writing a light-transmitting pattern generation algorithm in a programming language environment and setting parameters of the light-transmitting pattern generation algorithm; generating a light-transmitting pattern through the light-transmitting pattern generation algorithm; the light-transmitting pattern is an ice crack or a maze pattern;

[0014] S1.2: Substitute the light-transmitting texture pattern into the mask drawing software to generate the micro-nanostructure texture mask design drawing;

[0015] S1.3: Import the design drawing of the micro-nano structure texture mask plate into the laser direct writer to process the micro-nano structure texture mask plate.

[0016] As a preferred implementation, the light-transmitting texture generation algorithm parameters include: texture width, texture space occupation, texture length and texture average period.

[0017] As a preferred implementation, the specific implementation process of step S2 is:

[0018] S2.1: Clean the surface of the glass substrate to improve the surface cleanliness;

[0019] S2.2: Spin-coat the photoresist uniformly on the surface of the glass substrate using a special jig for batch spin-coating photoresist;

[0020] S2.3: Expose the photoresist layer on the surface of the glass substrate to produce the light-transmitting texture shape on the micro-nano structure texture mask plate by contact exposure;

[0021] S2.4: removing the photoresist at the light-transmitting pattern position by immersing in a developer solution;

[0022] S2.5: Etch the glass substrate using reactive ion beam, and obtain the AG micro-nano structure after cleaning.

[0023] As a preferred embodiment, the processing method of the batch spin coating photoresist special jig is:

[0024] A large-sized square quartz glass substrate is used to process a groove area on the surface that is completely consistent with the size of the glass substrate. After the glass substrate is placed in the groove, the surface height of the glass substrate is consistent with the surface of the square quartz glass substrate.

[0025] As a preferred implementation, the photoresist is AZ1500 positive photoresist; the thickness of the photoresist is 400nm-3000nm.

[0026] As a preferred implementation, the material of the AG micro-nano structure is silicon dioxide, and the refractive index is 1.48-1.54; the thickness of the AG micro-nano structure is 60nm-1000nm.

[0027] As a preferred embodiment, the material of the top layer is PFPE material with a refractive index of 1.32-1.36.

[0028] As a preferred implementation, a hard carbon film or nitride is disposed between the AG micro-nano structure and the top layer.

[0029] The present invention provides an anti-reflection structure capable of suppressing display flash points and preventing glare, comprising: a glass substrate, an AG micro-nano structure and a top layer arranged in sequence; the AG micro-nano structure is in the form of ice cracks or maze patterns; the thickness of the AG micro-nano structure is 60nm-1000nm; the material of the AG micro-nano structure is silicon dioxide, and the refractive index is 1.48-1.54; the material of the top layer is PFPE material, and the refractive index is 1.32-1.36.

[0030] The beneficial effects of the present invention are as follows:

[0031] The present invention discloses an anti-reflection structure capable of suppressing display flash points and preventing glare, and a method for making the same. The anti-reflection micro-nano structure is processed on the surface of a glass substrate, and the distribution form of the anti-reflection micro-nano structure can be specifically divided into two types: a maze pattern and an ice crack. A refractive index gradient structure from the glass substrate to the air is constructed to achieve high-efficiency wide-band and wide-angle anti-reflection characteristics. The AF film is coated on the top layer to effectively increase the anti-fingerprint function of the glass cover.

[0032] The manufacturing process of the present invention is simple, and the method is applicable to various types of glass substrates such as 2D, 2.5D and 3D. The designed texture structure distribution has random characteristics, and the average distribution period of the structure is in the micron level. It not only has anti-glare characteristics, but also can effectively suppress the flash point problem of the display panel. The top layer of AF film will not reduce the anti-reflection effect of the structure. After the structure is processed, there is no obvious moiré and rainbow pattern on the surface of the glass substrate. At the same time, the corresponding increase in transmitted light improves the anti-reflection effect, thereby improving the user's visual experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 The present invention is a schematic diagram of the structural composition of an anti-reflection structure capable of suppressing display flash points and preventing glare.

[0034] Figure 2 It is a schematic diagram of ice crack patterns in the present invention.

[0035] Figure 3 It is a schematic diagram of the maze pattern in the present invention.

[0036] Figure 4 A schematic diagram of the structure of a special jig for batch spin coating of photoresist designed for the present invention.

[0037] In the figure: 1. Glass substrate; 2. AG micro-nano structure; 3. Top layer. DETAILED DESCRIPTION

[0038] The present invention is further described in detail below in conjunction with the accompanying drawings.

[0039] The present invention provides a method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare, and the specific implementation process thereof is as follows:

[0040] Step S1: design and processing of micro-nano structure texture mask plate;

[0041] S1.1: Write a light-transmitting texture generation algorithm in Pathon or other programming language environment, and set the light-transmitting texture generation algorithm parameters; wherein the light-transmitting texture generation algorithm parameters mainly include: texture width, texture space occupation, texture length and texture average period, etc.; a light-transmitting texture pattern can be generated through the light-transmitting texture generation algorithm.

[0042] Exemplarily, the light-transmitting pattern is preferably an ice crack or a maze pattern. The ice crack pattern in the present invention is as follows: Figure 2 As shown; the maze pattern is as Figure 3 shown.

[0043] Exemplarily, in the light-transmitting texture pattern, the average periodic size of the texture is preferably 200nm-5000nm, more preferably 300nm-4000nm, which can be adjusted according to appearance requirements.

[0044] S1.2: Convert the mask processing file, that is, substitute the light-transmitting texture pattern generated by the light-transmitting texture generation algorithm into Klayout, AutoCAD or other mask drawing software to generate a micro-nano structure texture mask design drawing.

[0045] S1.3: Import the generated micro-nano structure texture mask plate design drawing into a laser direct writer to process the micro-nano structure texture mask plate.

[0046] The size of the obtained micro-nanostructure texture mask plate can be adapted to the display screen specifications of any mobile phone, tablet, TV, car-mounted display device, etc., and the size also needs to be determined by referring to the size of the special jig for batch spin coating of photoresist.

[0047] Step S2: fabrication of AG micro-nano structure 2 on the surface of glass substrate 1;

[0048] Taking into account the actual production efficiency and production cost, photoresist spin coating is a link that takes up a relatively large amount of time in the production process. Therefore, a special jig for batch spin coating of photoresist is designed and processed to realize batch coating and etching.

[0049] Exemplarily, the special jig for batch spin coating of photoresist designed in the present invention may be square or circular, and the rotation speed is preferably above 500 rpm.

[0050] Exemplarily, the specific processing method of the batch spin coating photoresist special jig of the present invention is as follows:

[0051] like Figure 4 As shown, a large-sized square quartz glass substrate is used to process a groove area on the surface that is completely consistent with the size of the glass substrate 1. After the glass substrate 1 is placed in the groove, the surface height of the glass substrate 1 should be consistent with the surface of the square quartz glass substrate. The size of the special jig for batch spin coating of photoresist and the number of grooves can be set according to the processing efficiency.

[0052] Specifically, the AG micro-nano structure 2 is processed on the surface of the glass substrate 1, and the specific implementation steps are as follows:

[0053] S2.1: Cleaning the surface of the glass substrate 1 to improve the surface cleanliness;

[0054] S2.2: The special jig for batch spin coating of photoresist designed by the present invention can be used to uniformly spin coat the surface of the glass substrate 1 in batches, thereby forming a photoresist layer.

[0055] Exemplarily, the photoresist used in the photoresist spin coating process may be AZ1500 positive photoresist.

[0056] Exemplarily, the thickness of the photoresist used in the photoresist spin coating process is preferably 400 nm-3000 nm, more preferably 600 nm.

[0057] S2.3: using contact exposure to expose the photoresist layer on the surface of the glass substrate 1 to obtain the light-transmitting texture shape on the micro-nano structure texture mask plate;

[0058] S2.4: removing the photoresist at the light-transmitting pattern position by immersing in a developer solution;

[0059] For example, the developer used in the development process may be a FSM-6000 developer.

[0060] S2.5: The glass substrate 1 is etched by reactive ion beam, and the AG micro-nano structure 2 is obtained after cleaning. Thus, the AG micro-nano structure 2 can be processed on the surface of the glass substrate 1. The processed AG micro-nano structure 2 is an anti-reflection structure that can suppress display flash points and prevent glare.

[0061] For example, when the glass substrate 1 is etched by reactive ion beam, CF4 and O2 are introduced in a volume ratio of 10:1, and etching is performed for 3 minutes at a radiation frequency power of 250 W with a gas flow rate of 60 sccm.

[0062] Exemplarily, during the cleaning process, O2 is introduced at a ventilation volume of 20 ccm, and etching is performed for 30 seconds at a radiation frequency power of 100 W.

[0063] Exemplarily, the material of the AG micro-nano structure 2 is silicon dioxide, and the refractive index is preferably between 1.48 and 1.54.

[0064] Exemplarily, the thickness of the AG micro-nano structure 2 is preferably 60 nm-1000 nm.

[0065] Step S3: coating a top layer 3 on the surface of the AG micro-nano structure 2;

[0066] Specifically, the top layer 3 may be plated on the surface of the AG micro-nano structure 2 by using an electron beam evaporation coating process.

[0067] Exemplarily, in order to achieve the anti-fingerprint effect, the material of the top layer 3 is preferably an AF film, and the film material is a prepared AF material pill.

[0068] Exemplarily, the AF film material is preferably PFPE material, and the refractive index is preferably between 1.32 and 1.36.

[0069] In the present invention, according to actual use requirements, in order to achieve the actual requirements of wear resistance and impact resistance, a hard carbon film or nitride can be set between the AG micro-nano structure 2 and the top layer 3 to improve the wear resistance and impact resistance of the glass cover.

[0070] On the other hand, the present invention further provides an anti-reflection structure capable of suppressing display flash points and preventing glare. The glass cover is prepared by using the above-mentioned method for preparing an anti-reflection structure capable of suppressing display flash points and preventing glare.

[0071] Specifically, the anti-reflection structure of the present invention can suppress display flash point and prevent glare, which mainly includes: a glass substrate 1, an AG micro-nano structure 2 and a top layer 3. Among them, the glass substrate 1, the AG micro-nano structure 2 and the top layer 3 are arranged in sequence, that is, the AG micro-nano structure 2 is arranged between the glass substrate 1 and the top layer 3, such as Figure 1 shown.

[0072] Among them, a light-transmitting texture pattern is provided on the glass substrate 1; preferably, the light-transmitting texture is an ice crack or a maze pattern; preferably, the average periodic size of the texture is 200nm-5000nm, and more preferably, the average periodic size of the texture is 300nm-4000nm.

[0073] Among them, the AG micro-nano structure 2 is an anti-reflection structure that can suppress display flash points and prevent glare; preferably, the AG micro-nano structure 2 is in the form of ice cracks or maze patterns; preferably, the thickness of the AG micro-nano structure 2 is 60nm-1000nm; preferably, the material of the AG micro-nano structure 2 is silicon dioxide, and the refractive index of the AG micro-nano structure 2 is 1.48-1.54.

[0074] Preferably, the material of the top layer 3 is PFPE material with a refractive index of 1.32-1.36.

[0075] Preferably, a hard carbon film or nitride may be provided between the AG micro-nano structure 2 and the top layer 3 to improve the wear resistance and impact resistance of the glass cover plate.

[0076] The present invention prepares an anti-reflection structure capable of suppressing display flash points and preventing glare. The texture structure distribution has a random characteristic, and the average distribution period of the structure is in the micron level. It not only has anti-glare characteristics, but also can effectively suppress the display flash point problem due to the characteristic size. The plated AF film will not reduce the anti-reflection effect of the structure. After the structure is processed, there are no obvious moiré and rainbow patterns on the surface of the glass substrate 1. At the same time, the corresponding increase in transmitted light achieves an anti-reflection effect, thereby improving the user's visual experience.

[0077] On the other hand, the present invention further provides a display screen, which is prepared by using the above-mentioned anti-reflection structure capable of suppressing display flash points and preventing glare.

[0078] On the other hand, the present invention further provides an electronic device, which includes a display screen made of the above-mentioned anti-reflection structure capable of suppressing display flash points and preventing glare.

[0079] The present invention discloses an anti-reflection structure capable of suppressing display flash point anti-glare and a method for making the same. A person skilled in the art can refer to the contents of this article and appropriately improve the process parameters to achieve the same. It should be particularly noted that all similar substitutions and modifications are obvious to a person skilled in the art and are considered to be included in the present invention. The product of the present invention has been described through a preferred embodiment, and relevant personnel can obviously modify or appropriately change and combine the product described herein without departing from the content, spirit and scope of the present invention to implement and apply the technology of the present invention.

Claims

1. A method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare, characterized in that: The following steps are involved: Step S1: design and processing of micro-nano structure texture mask plate; Step S2: Fabrication of AG micro-nanostructure on the surface of glass substrate; Step S3: using an electron beam evaporation coating process to coat a top layer on the surface of the AG micro-nano structure.

2. The method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare according to claim 1, characterized in that: The specific implementation process of step S1 is: S1.1: Writing a light-transmitting pattern generation algorithm in a programming language environment and setting parameters of the light-transmitting pattern generation algorithm; generating a light-transmitting pattern through the light-transmitting pattern generation algorithm; the light-transmitting pattern is an ice crack or a maze pattern; S1.2: Substitute the light-transmitting texture pattern into the mask drawing software to generate the micro-nanostructure texture mask design drawing; S1.3: Import the design drawing of the micro-nano structure texture mask plate into the laser direct writer to process the micro-nano structure texture mask plate.

3. The method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare according to claim 2, characterized in that: The parameters of the light-transmitting texture generation algorithm include: texture width, texture space occupation, texture length and texture average period.

4. The method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare according to claim 1, characterized in that: The specific implementation process of step S2 is: S2.1: Clean the surface of the glass substrate to improve the surface cleanliness; S2.2: Spin-coat the photoresist uniformly on the surface of the glass substrate using a special jig for batch spin-coating photoresist; S2.3: Expose the photoresist layer on the surface of the glass substrate to produce the light-transmitting texture shape on the micro-nano structure texture mask plate by contact exposure; S2.4: removing the photoresist at the light-transmitting pattern position by immersing in a developer solution; S2.5: Etching the glass substrate using reactive ion beam, and obtaining the AG micro-nano structure after cleaning.

5. The method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare according to claim 4, characterized in that: The processing method of the special jig for batch spin coating photoresist is as follows: A large-sized square quartz glass substrate is used to process a groove area on the surface that is completely consistent with the size of the glass substrate. After the glass substrate is placed in the groove, the surface height of the glass substrate is consistent with the surface of the square quartz glass substrate.

6. The method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare according to claim 4, characterized in that: The photoresist is AZ1500 positive photoresist; the thickness of the photoresist is 400nm-3000nm.

7. The method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare according to claim 1, characterized in that: The material of the AG micro-nano structure is silicon dioxide, and the refractive index is 1.48-1.54; the thickness of the AG micro-nano structure is 60nm-1000nm.

8. The method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare according to claim 1, characterized in that: The material of the top layer is PFPE material, and the refractive index is 1.32-1.

36.

9. The method for manufacturing an anti-reflection structure capable of suppressing display flash point and anti-glare according to claim 1, characterized in that: A hard carbon film or nitride is arranged between the AG micro-nano structure and the top layer.

10. An anti-reflection structure capable of suppressing display flash point and preventing glare prepared by the method according to any one of claims 1 to 9, characterized in that: include: A glass substrate, an AG micro-nano structure and a top layer are sequentially arranged; The AG micro-nano structure is in the form of ice cracks or maze patterns; the thickness of the AG micro-nano structure is 60nm-1000nm; the material of the AG micro-nano structure is silicon dioxide, and the refractive index is 1.48-1.54; the material of the top layer is PFPE material, and the refractive index is 1.32-1.36.

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