Planar cathode device of binary gas distribution on-line adjustable magnetic field

Abstract

The invention provides a binary gas distribution on-line adjustable magnetic field planar cathode device which is characterized in that a cover plate is hermetically connected with a vacuum sputtering cavity, and a gas distribution system, a cathode body and a distance adjusting device are mounted on the cover plate; a magnet unit and a target material are arranged on the cathode body, the target material is arranged below the magnet unit, and the magnet unit is used for generating a distributed magnetic field; the distance adjusting device is further connected to the magnet unit and used for controlling the magnet unit to move up and down so as to adjust the distance between the magnet unit and the target material. And the gas distribution system comprises two paths of gas distribution channel devices, and the two paths of gas distribution channel devices correspond to the left side and the right side of the cathode body. Through the arrangement of the distance adjusting device, the magnetic field intensity is changed in a simple mode, the overall uniformity of the magnetic field is improved, simplicity and convenience are achieved, a binary gas distribution mode is adopted, the gas distribution uniformity is improved, and therefore the film layer uniformity is improved.

Description

Technical Field

[0001] The invention relates to the technical field of magnetron sputtering, and in particular to a planar cathode device with binary gas distribution and online adjustable magnetic field. Background Art

[0002] At present, large-area magnetron sputtering is increasingly being used in various fields. It can be used to prepare metals, semiconductors, insulators and other materials, and has the advantages of simple equipment, easy control, large coating area and strong adhesion. Magnetron sputtering introduces a magnetic field on the cathode surface and uses the magnetic field to constrain charged particles to increase the plasma density and the sputtering rate. Among them, the planar cathode is used as the core device.

[0003] The quality of the coated product depends on some characteristics of the film layer, among which the uniformity of the film layer is an important factor. The uniformity of the film layer is the result of the influence of multiple factors, including the uniformity of the magnetic field of the cathode body itself, the structural design of the gas distribution system and other factors. In the actual production process, the uniformity of the film layer is mainly adjusted by adjusting the uniformity of the magnetic field and the distribution of process gases to adjust the uniformity of the film layer. When the existing flat cathode structure adjusts the uniformity of the magnetic field, it needs to restore the atmosphere to adjust it, which is time-consuming and labor-intensive.

[0004] In actual production, the target utilization rate is also a concern of manufacturers. High target utilization rate can reduce maintenance time and save production costs. The high or low target utilization rate is mainly determined by the design of the magnetic field structure, and the direction of the magnetic lines of force has a decisive influence on it.

[0005] The existing planar cathode device has low utilization rate (between 20-30%) due to the arrangement of the magnetic field, the design of the cooling water circuit, the design of the process gas supply structure, etc.; the magnetic field uniformity is poor; the cooling water sealing structure is complex and prone to leaks. Each time the target material is replaced, leak detection and pressure maintenance treatment are required, which wastes production time; and the gas distribution is uneven, which ultimately leads to poor film uniformity, low target utilization, and poor film quality. Summary of the invention

[0006] Based on the above problems, the present invention provides a planar cathode device with binary gas distribution and online adjustable magnetic field, which aims to solve the technical problems of poor uniformity of planar cathode magnetic field and uneven gas distribution in the prior art.

[0007] A planar cathode device with binary gas distribution and online adjustable magnetic field, comprising:

[0008] A cover plate is sealed and connected to the vacuum sputtering chamber, and a gas distribution system, a cathode body and a distance adjustment device are installed on the cover plate;

[0009] The cathode body is mounted on the side of the cover plate facing the vacuum sputtering chamber through a connecting device;

[0010] A magnet unit and a target are provided on the cathode body, the target is below the magnet unit, and the magnet unit is used to generate a distributed magnetic field;

[0011] The distance adjustment device is also connected to the magnet unit and is used to control the magnet unit to move up and down to adjust the distance between the magnet unit and the target material;

[0012] The gas distribution system comprises two gas distribution channel devices, and the two gas distribution channel devices correspond to the left and right sides of the cathode body.

[0013] Furthermore, one of the two air distribution channel devices is a main air channel device;

[0014] A plurality of main gas outlets are evenly arranged along a first direction on the main gas channel device;

[0015] The middle region of the main air passage device is provided with at least one main air inlet;

[0016] The main gas outlet and the main gas inlet are connected through a multi-stage main gas branch channel;

[0017] In two adjacent levels of main gas branch channels, the upper level main gas branch channel is connected to the two lower level main gas branch channels.

[0018] Furthermore, one of the two air distribution channel devices is an auxiliary air channel device;

[0019] A plurality of auxiliary air outlets are evenly arranged along a first direction on the auxiliary air channel device;

[0020] At least one auxiliary air inlet is provided in the middle region of the auxiliary air passage device;

[0021] The auxiliary gas outlet and the auxiliary gas inlet are connected through a multi-stage auxiliary gas branch channel;

[0022] In two adjacent levels of auxiliary gas branch channels, the upper level auxiliary gas branch channel is connected to the two lower level auxiliary gas branch channels.

[0023] Furthermore, each air distribution channel device includes an air inlet and air outlets evenly arranged along the first direction;

[0024] The gas distribution system also includes a valve island device, which is connected to the gas inlet of the gas distribution channel device through a pipeline, and is used to transport gas to each gas inlet of the gas distribution channel device and adjust the flow of the transported gas.

[0025] Furthermore, the cathode body also includes a base, the base is provided with a downward base groove, and the magnet unit is located in the base groove;

[0026] A cooling copper bar is provided between the target and the magnet unit, and the cooling copper bar is connected to the base through a support column;

[0027] The cooling copper bar is used for cooling water to pass through;

[0028] The target material is closely attached to the outer surface of the cooling copper bar through the pressure strip at the bottom of the base.

[0029] Further, the magnet unit comprises:

[0030] A yoke is connected with the distance adjustment device;

[0031] A magnet is attached to the yoke;

[0032] The uniform magnetic strip is installed on the surface of the magnet.

[0033] Further, the distance adjustment device comprises:

[0034] A guide column, the lower end of which is connected to the magnet unit;

[0035] A guide sleeve is installed on the base and sleeved on the guide column to support the guide column;

[0036] An adjusting rod, the lower end of which is threadedly connected to the upper end of the guide column;

[0037] A support seat, which is fixed on the base and is used to support the adjustment rod;

[0038] The motor is mounted on the cover plate, and the output shaft of the motor is connected to the upper end of the adjusting rod through a coupling;

[0039] The rotation of the output shaft of the motor drives the coupling to rotate, the rotation of the coupling drives the adjustment rod to rotate, and the rotation of the adjustment rod drives the guide column to move up and down.

[0040] Further, the cover plate includes a cover plate bottom plate and a cover plate side plate, the upper end surface of the cover plate bottom plate and the inner wall of the cover plate side plate constitute a cover plate cavity, and the lower end surface of the cover plate bottom plate faces the vacuum sputtering cavity;

[0041] The cathode body is mounted to the lower end surface of the cover plate bottom plate through a connecting device;

[0042] The motor is installed in the cover cavity;

[0043] The cover plate bottom plate is provided with a through hole extending from the upper end surface of the cover plate bottom plate to the lower end surface of the cover plate bottom plate;

[0044] The output shaft of the motor passes through the through hole and is connected to the coupling;

[0045] The distance adjustment device also includes:

[0046] The rotary sealing device is used to seal the upper port of the through hole to isolate the cover plate cavity from the vacuum sputtering cavity.

[0047] Further, the cover plate includes a cover plate bottom plate, and the lower end surface of the cover plate bottom plate faces the vacuum sputtering chamber;

[0048] The connection device includes:

[0049] A connecting frame, the upper end of which is connected to the lower end surface of the cover plate bottom plate;

[0050] A mounting plate, mounted on the lower end of the connecting frame, the mounting plate being connected to the cathode body;

[0051] The gland and the insulating block are installed on the upper end of the mounting plate, and the insulating block is between the gland and the mounting plate.

[0052] Furthermore, the two air distribution channel devices each include an air inlet and air outlets evenly arranged along the first direction;

[0053] The two air distribution channel devices have different numbers of air inlets and the two air distribution channel devices have the same number of air outlets.

[0054] The beneficial technical effect of the present invention is: by setting a distance adjustment device, the vertical distance between the magnet unit and the target material is adjusted, thereby changing the magnetic field strength and improving the overall uniformity of the magnetic field; by evenly setting gas outlets on the left and right sides of the cathode body along the first direction and adopting a binary gas distribution method, the gas distribution uniformity is improved, thereby improving the uniformity of the film layer, the target material utilization rate, and the film layer quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0055] Figure 1 It is a front view of a planar cathode device with a binary gas distribution and online adjustable magnetic field according to the present invention;

[0056] Figure 2 It is a side cross-sectional view of a planar cathode device with a binary gas distribution and an online adjustable magnetic field according to the present invention;

[0057] Figure 3-4 It is a schematic diagram of a specific implementation of an internal branch channel of a gas distribution channel device of a planar cathode device with a binary gas distribution online adjustable magnetic field according to the present invention;

[0058] Figure 5 It is a schematic diagram of the arrangement of magnet units of a planar cathode device with a binary gas distribution and online adjustable magnetic field according to the present invention;

[0059] in,

[0060] 1- Cover plate;

[0061] 2-gas distribution system; 21-valve island device; 22-gas distribution channel device; 221-main gas inlet; 222-main gas outlet; 223-auxiliary gas inlet; 224-auxiliary gas outlet;

[0062] 3-connecting device; 31-connecting frame; 32-pressure cover; 33-insulating block; 34-mounting plate;

[0063] 4- cathode body; 41- base; 42- yoke; 43- magnet; 44- uniform magnetic strip; 45- cooling copper bar; 46- target; 47- pressure strip; 48- support column; 49- base shield;

[0064] 5-distance adjustment device; 51-guide column; 52-guide sleeve; 53-support seat; 54-adjusting rod; 55-coupling; 56-coupling shield; 57-rotating sealing device; 58-motor. DETAILED DESCRIPTION

[0065] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0066] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments may be combined with each other.

[0067] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but they are not intended to limit the present invention.

[0068] See also Figure 1 The present invention provides a planar cathode device with a binary gas distribution and an online adjustable magnetic field, comprising:

[0069] A cover plate (1) is sealed and connected to the vacuum sputtering chamber, and a gas distribution system (2), a cathode body (4) and a distance adjustment device (5) are installed on the cover plate;

[0070] The cathode body (4) is mounted on a side of the cover plate (1) facing the vacuum sputtering chamber through a connecting device (3);

[0071] A magnet unit and a target material (46) are provided on the cathode body (4), the target material (46) is below the magnet unit, and the magnet unit is used to generate a distributed magnetic field;

[0072] The distance adjustment device (5) is also connected to the magnet unit and is used to control the magnet unit to move up and down to adjust the distance between the magnet unit and the target material (46);

[0073] The gas distribution system (2) comprises two gas distribution channel devices (22), and the two gas distribution channel devices (22) correspond to the left and right sides of the cathode body (4).

[0074] The cover plate (1) is placed on the vacuum sputtering chamber and has a sealing ring thereon, so that the cover plate (1) and the vacuum sputtering chamber form a sealed environment. The gas distribution system (2), the connecting device (4), and the cathode body (4) are all installed on the vacuum side of the cover plate (1). Specifically, the cover plate (1) has a cover plate bottom plate and a cover plate side plate, and the cover plate cavity is formed by the upper end surface of the cover plate bottom plate and the cover plate side plate, and the lower end surface of the cover plate bottom plate serves as the vacuum side facing the vacuum sputtering chamber. Specifically, the present invention sets a first direction, and the first direction is Figure 1 The extension direction from left to right in .

[0075] Specifically, the present invention further sets a second direction, which is Figure 1 The middle front-to-back extension direction.

[0076] The left and right sides of the cathode body (4) are Figure 2 The left and right direction in .

[0077] By setting a distance adjustment device, the vertical distance between the magnet unit and the target material is adjusted, thereby changing the magnetic field strength and improving the overall uniformity of the magnetic field. By evenly setting gas outlets on the left and right sides of the cathode body along the first direction, a binary gas distribution method is adopted to improve the uniformity of gas distribution, thereby improving the uniformity of the film layer, improving the utilization rate of the cathode body and the target material, and improving the quality of the film layer. Specifically, one of the two gas distribution channel devices (22) is fed with a sputtering gas such as argon, and the other is fed with a reaction gas such as oxygen, nitrogen, etc.

[0078] Furthermore, one of the two air distribution channel devices (22) is a main air distribution channel device;

[0079] A plurality of main gas outlets (222) are evenly arranged along a first direction on the main gas channel device;

[0080] At least one main air inlet (221) is provided in the middle area of ​​the main air channel device;

[0081] The main gas outlet (222) and the main gas inlet (222) are connected via a multi-stage main gas branch channel;

[0082] In two adjacent levels of main gas branch channels, the upper level main gas branch channel is connected to the two lower level main gas branch channels.

[0083] See also Figure 3As an implementation mode, there are two main gas inlets, and in the middle area of ​​the main gas channel device, the main gas channel device is evenly arranged with a plurality of main gas outlets (222) along the first direction. Specifically, the number of main gas outlets (222) is 64. Each main gas inlet is connected to a first-level main gas branch channel, the first-level main gas branch channel is connected to two second-level main gas branch channels, each second-level main gas branch channel is connected to two third-level main gas branch channels, each third-level main gas branch channel is connected to two fourth-level main gas branch channels, each fourth-level main gas branch channel is connected to two fifth-level main gas branch channels, and each fifth-level main gas branch channel is connected to two sixth-level main gas branch channels. Each sixth-level main gas branch channel is connected to a main gas outlet (222), forming 64 main gas outlets (222). Specifically, in this way, uniform gas distribution is achieved, and the paths taken by the gas from each main gas inlet to each main gas outlet (222) are relatively close, thereby achieving ventilation uniformity, and the main gas outlets (222) are evenly arranged to achieve gas outlet uniformity.

[0084] Furthermore, one of the two air distribution channel devices (22) is an auxiliary air channel device;

[0085] A plurality of auxiliary gas outlets (224) are evenly arranged along a first direction on the auxiliary gas channel device;

[0086] At least one auxiliary air inlet (223) is provided in the middle area of ​​the auxiliary air channel device;

[0087] The auxiliary gas outlet (224) and the auxiliary gas inlet (223) are connected through a multi-stage auxiliary gas branch channel;

[0088] In two adjacent levels of auxiliary gas branch channels, the upper level auxiliary gas branch channel is connected to the two lower level auxiliary gas branch channels.

[0089] See also Figure 4 As an embodiment, 9 auxiliary air inlets (223) are arranged on the auxiliary air channel device, each auxiliary air inlet is responsible for the outlet of the auxiliary air outlet of the upper section of the auxiliary air channel device, and 64 auxiliary air outlets are arranged. Specifically, the auxiliary air inlets (223) are concentrated in the middle area of ​​the auxiliary air channel device, and the first auxiliary air inlet (223), the second auxiliary air inlet (223), the third auxiliary air inlet (223), the fourth auxiliary air inlet (223), the fifth auxiliary air inlet (223), the sixth auxiliary air inlet (223), the seventh auxiliary air inlet (223), the eighth auxiliary air inlet (223), and the ninth auxiliary air inlet (223) are arranged in sequence along the first direction.

[0090] Specifically, each auxiliary air inlet (223) is connected to a primary auxiliary air branch channel.

[0091] The first auxiliary gas inlet (223) has a primary auxiliary gas branch channel, the primary auxiliary gas branch channel is connected to two secondary auxiliary gas branch channels, each secondary auxiliary gas branch channel is respectively connected to two tertiary auxiliary gas branch channels, each tertiary auxiliary gas branch channel is connected to an auxiliary gas outlet (224), and is connected to the four auxiliary gas outlets (224).

[0092] The ninth auxiliary gas inlet (223) has a primary auxiliary gas branch channel, the primary auxiliary gas branch channel is connected to two secondary auxiliary gas branch channels, each secondary auxiliary gas branch channel is respectively connected to two tertiary auxiliary gas branch channels, each tertiary auxiliary gas branch channel is connected to an auxiliary gas outlet (224), thereby achieving communication with the four auxiliary gas outlets (224).

[0093] The fifth auxiliary gas inlet (223) has two primary auxiliary gas branch channels, each primary auxiliary gas branch channel is connected to two secondary auxiliary gas branch channels, each secondary auxiliary gas branch channel is respectively connected to two tertiary auxiliary gas branch channels, and each tertiary auxiliary gas branch channel is connected to an auxiliary gas outlet (224), thereby achieving communication with the eight auxiliary gas outlets (224).

[0094] The first-level auxiliary gas branch channel of the second auxiliary gas inlet (223) is connected to two second-level auxiliary gas branch channels, each second-level auxiliary gas branch channel is respectively connected to two third-level auxiliary gas branch channels, each third-level auxiliary gas branch channel is respectively connected to two fourth-level auxiliary gas branch channels. Each fourth-level auxiliary gas branch channel is connected to an auxiliary gas outlet (224), thereby achieving communication with the eight auxiliary gas outlets (224).

[0095] The first-level auxiliary gas branch channel of the third auxiliary gas inlet (223) is connected to two second-level auxiliary gas branch channels, each second-level auxiliary gas branch channel is respectively connected to two third-level auxiliary gas branch channels, each third-level auxiliary gas branch channel is respectively connected to two fourth-level auxiliary gas branch channels. Each fourth-level auxiliary gas branch channel is connected to an auxiliary gas outlet (224), thereby achieving communication with the eight auxiliary gas outlets (224).

[0096] The first-level auxiliary gas branch channel of the fourth auxiliary gas inlet (223) is connected to two second-level auxiliary gas branch channels, each second-level auxiliary gas branch channel is respectively connected to two third-level auxiliary gas branch channels, each third-level auxiliary gas branch channel is respectively connected to two fourth-level auxiliary gas branch channels. Each fourth-level auxiliary gas branch channel is connected to an auxiliary gas outlet (224), thereby achieving communication with the eight auxiliary gas outlets (224).

[0097] The first-level auxiliary gas branch channel of the sixth auxiliary gas inlet (223) is connected to two second-level auxiliary gas branch channels, each second-level auxiliary gas branch channel is respectively connected to two third-level auxiliary gas branch channels, each third-level auxiliary gas branch channel is respectively connected to two fourth-level auxiliary gas branch channels. Each fourth-level auxiliary gas branch channel is connected to an auxiliary gas outlet (224), thereby achieving communication with the eight auxiliary gas outlets (224).

[0098] The first-level auxiliary gas branch channel of the seventh auxiliary gas inlet (223) is connected to two second-level auxiliary gas branch channels, each second-level auxiliary gas branch channel is respectively connected to two third-level auxiliary gas branch channels, each third-level auxiliary gas branch channel is respectively connected to two fourth-level auxiliary gas branch channels. Each fourth-level auxiliary gas branch channel is connected to an auxiliary gas outlet (224), thereby achieving communication with the eight auxiliary gas outlets (224).

[0099] The first-level auxiliary gas branch channel of the eighth auxiliary gas inlet (223) is connected to two second-level auxiliary gas branch channels, each second-level auxiliary gas branch channel is respectively connected to two third-level auxiliary gas branch channels, each third-level auxiliary gas branch channel is respectively connected to two fourth-level auxiliary gas branch channels. Each fourth-level auxiliary gas branch channel is connected to an auxiliary gas outlet (224), thereby achieving communication with the eight auxiliary gas outlets (224).

[0100] The design of the auxiliary air inlet, auxiliary air inlet outlet and auxiliary air branch channel of the auxiliary air channel device is not limited to Figure 4 The design of the embodiment in the embodiment can be divided into 2-11 sections of auxiliary gas laying according to the width dimension of the cathode body (the dimension in the first direction of the present invention), Figure 4 Shown is a 9-section installation.

[0101] Specifically, uniform gas distribution is achieved through a binary layout method, and the paths taken by the gas from each auxiliary gas inlet to the auxiliary main gas outlet are relatively close, thereby achieving ventilation uniformity, and the auxiliary gas outlets are evenly arranged to achieve gas outlet uniformity.

[0102] The main gas and auxiliary gas of the present invention both adopt a binary gas distribution method, preferably using 64 gas outlets to ensure that the gas volume at each position on the entire cathode width is uniform when the process gas is introduced into the vacuum chamber. Furthermore, each gas distribution channel device (22) includes an air inlet and gas outlets evenly arranged along the first direction;

[0103] The gas distribution system (2) further comprises a valve island device (21), which is connected to the gas inlet of the gas distribution channel device (22) via a pipeline and is used to deliver gas to each gas inlet of the gas distribution channel device (22) and to adjust the flow rate of the delivered gas.

[0104] The valve island device (21) is mainly arranged on the atmosphere side, that is, in the bottom plate cavity. The valve island device 21 includes a valve island body, a flow meter, a pipeline, etc., receives gas input from the outside, and controls the flow of gas entering the vacuum sputtering cavity.

[0105] Furthermore, the two air distribution channel devices (22) each include an air inlet and air outlets evenly arranged along the first direction;

[0106] The two air distribution channel devices (22) have different numbers of air inlets, and the two air distribution channel devices (22) have the same number of air outlets.

[0107] See also Figure 2 Furthermore, the cathode body (4) further comprises a base (41), the base (41) is provided with a downwardly directed base groove, and the magnet unit is located in the base groove;

[0108] A cooling copper bar (45) is provided between the target material (46) and the magnet unit, and the cooling copper bar (45) is connected to the base (41) through a support column (48);

[0109] The interior of the cooling copper bar (45) is used for cooling liquid to pass through;

[0110] The target material (46) is closely attached to the outer surface of the cooling copper bar (45) through the pressure strip (47) at the bottom of the base (41).

[0111] Specifically, the cooling copper bar (45) is fixed to the base (41) through the support column (48), the cooling copper bar (45) is filled with cooling liquid, the target material (46) is closely attached to the cooling copper bar (45) through the pressure strip (47), and the heat generated during sputtering can be taken away by the internal cooling liquid. The cooling and heat dissipation structure is simple.

[0112] The existing cathode cooling water is isolated from the vacuum environment by a sealing ring, which is complicated to install and has unreliable sealing. The cooling copper bar (45) in the cathode body of the present invention is welded to the support column (48) by a welding method, and the support column is welded to the base (41), and there is no leakage point in the vacuum. Each time the target material is replaced, there is no need to perform leak detection and pressure maintenance treatment, which saves production time.

[0113] See also Figure 5 , further, the magnet unit comprises:

[0114] A magnetic yoke (42), the magnetic yoke (42) is connected to the distance adjustment device (5);

[0115] A magnet (43) adsorbed on the yoke (42);

[0116] The magnetic strip (44) is mounted on the surface of the magnet (43).

[0117] Specifically, a base shield (49) is also provided on the side of the base (41) to insulate the base (41).

[0118] Specifically, the width of the yoke (42) is about 200-300 mm. The width of the yoke (42) refers to Figure 2 The width dimension of the cross section.

[0119] The uniform magnetic strip (44) can play a role in uniform magnetic properties.

[0120] The uniformity of the magnetic field is also an important factor affecting the uniformity of the film layer. A plurality of sections of magnetic yokes (42) are installed inside the cathode body and arranged within the width of the cathode body. The uniformity of the magnetic field is achieved by adjusting the distance from the target material.

[0121] The magnetic field distribution is an important factor affecting the utilization rate of the target material. The arrangement position of the magnet affects the shape of the track etching on the target surface, thereby affecting the utilization rate of the target material. In the present invention, the magnet (43) is installed on the yoke (42), and the arrangement position and relative distance of the magnet are determined by simulating the magnetic field strength curve, thereby improving the utilization rate of the target material.

[0122] Furthermore, the distance adjustment device (5) comprises:

[0123] A guide post (51), the lower end of which is connected to a magnet unit;

[0124] A guide sleeve (52) is mounted on the base (41) and sleeved on the guide column (51) to support the guide column (51);

[0125] An adjusting rod (54), the lower end of the adjusting rod (54) being threadedly connected to the upper end of the guide column (51);

[0126] A support seat (53), the support seat (53) is fixed on the base (41) and is used to support the adjustment rod (54);

[0127] A motor (58) is mounted on the cover plate (1), and an output shaft of the motor (58) is connected to the upper end of the adjusting rod (54) via a coupling (55);

[0128] The rotation of the output shaft of the motor (58) drives the coupling (55) to rotate, the rotation of the coupling (55) drives the adjustment rod (54) to rotate, and the rotation of the adjustment rod (54) drives the guide column (51) to move up and down.

[0129] The adjusting rod (54) converts the rotational motion of the motor into the linear motion of the guide column (51), so that the guide column (51) moves upward to increase the distance between the magnet unit and the target material, and moves downward to reduce the distance between the magnet unit and the target material. The vertical distance between the magnet and the target material is changed, the magnetic field strength is changed, and finally the uniformity of the entire magnetic field is affected.

[0130] Specifically, the guide sleeve (52) is a linear bearing, and the linear bearing limits the guide column (51) to perform linear movement up and down. The guide column (51) passes through the base (41) and is installed on the upper end surface of the yoke (42). The adjustment rod (54) is rotatably fixed on the support seat (53). The adjustment rod (54) and the guide column (51) are threadedly connected. When the adjustment rod (54) rotates along a first rotation direction, the guide column (51) moves upward. When the adjustment rod (54) rotates along a second rotation direction opposite to the first rotation direction, the guide column (51) moves downward.

[0131] The conventional cathode body can only adjust the uniformity of the magnetic field when it breaks through the air and restores to the atmosphere (it is necessary to first destroy the vacuum state in the vacuum chamber, i.e., "break through the air", and then restore to the atmospheric pressure state, and then adjust the magnetic field), and the adjustment process is complicated, wasting a lot of production and maintenance time. The present invention can allow the motor (58) to rotate and drive the coupling (55) and the adjustment rod (54) to rotate when the local magnetic field is uneven during the production process without breaking through the air. The adjustment rod (54) and the guide column (51) are threadedly connected, thereby driving the guide column (51) to move up and down. The guide column (51) and the yoke (42) are connected by bolts, so that the yoke (42) and the magnet (43) mounted thereon can move up and down. Finally, the magnitude of the magnetic field strength on the surface of the target material (47) can be changed to adjust the uniformity of the magnetic field.

[0132] Furthermore, the cover plate (1) comprises a cover plate bottom plate and a cover plate side plate, the upper end surface of the cover plate bottom plate and the inner wall of the cover plate side plate form a cover plate cavity, and the lower end surface of the cover plate bottom plate faces the vacuum sputtering cavity;

[0133] The cathode body (4) is mounted on the lower end surface of the cover plate bottom plate through the connecting device (3);

[0134] The motor (58) is installed in the cover plate cavity;

[0135] The cover plate bottom plate is provided with a through hole extending from the upper end surface of the cover plate bottom plate to the lower end surface of the cover plate bottom plate;

[0136] The output shaft of the motor (58) passes through the through hole and is connected to the coupling (55);

[0137] The distance adjustment device (5) further comprises:

[0138] The rotary sealing device (57) is used to seal the upper end of the through hole to isolate the cover plate cavity from the vacuum sputtering cavity.

[0139] Specifically, the cover plate cavity on the cover plate bottom plate is the atmosphere side, and the rotary sealing device (57) seals the upper port of the through hole to isolate the cover plate cavity from the vacuum sputtering cavity. On the other hand, the rotary sealing device (57) also seals the output shaft part of the motor (58) to achieve isolation between the output shaft part and the cover plate cavity, thereby improving the reliability of the motor and reducing failures caused by leakage or contamination.

[0140] Specifically, the coupling (55) is covered with a coupling shield (56) to protect the coupling (55). Furthermore, the cover plate (1) includes a cover plate bottom plate, and the lower end surface of the cover plate bottom plate faces the vacuum sputtering chamber;

[0141] The connecting device (3) comprises:

[0142] A connecting frame (31), the upper end of the connecting frame (31) is connected to the lower end surface of the cover plate bottom plate;

[0143] A mounting plate (34) mounted on the lower end of the connecting frame (31), the mounting plate (34) being connected to the cathode body (4);

[0144] The pressure cover (32) and the insulating block (33) are installed on the upper end of the mounting plate (34), and the insulating block (33) is between the pressure cover (32) and the mounting plate (34).

[0145] By providing the insulating block (33), the cathode body (4) and the cover plate (1) are insulated.

[0146] The above are only preferred embodiments of the present invention, and are not intended to limit the implementation methods and protection scope of the present invention. Those skilled in the art should be aware that all solutions obtained by equivalent substitutions and obvious changes made using the description and illustrations of the present invention should be included in the protection scope of the present invention.

Claims

1. A planar cathode device with a binary gas distribution and online adjustable magnetic field, characterized in that: include: A cover plate (1) is sealed and connected to the vacuum sputtering chamber, and a gas distribution system (2), a cathode body (4) and a distance adjustment device (5) are installed on the cover plate; The cathode body (4) is mounted on a side of the cover plate (1) facing the vacuum sputtering chamber through a connecting device (3); The cathode body (4) is provided with a magnet unit and a target material (46), the target material (46) is below the magnet unit, and the magnet unit is used to generate a distributed magnetic field; The distance adjustment device (5) is also connected to the magnet unit and is used to control the magnet unit to move up and down to adjust the distance between the magnet unit and the target material (46); The gas distribution system (2) comprises two gas distribution channel devices (22), and the two gas distribution channel devices (22) correspond to the left and right sides of the cathode body (4).

2. A planar cathode device with a binary gas distribution and online adjustable magnetic field as claimed in claim 1, characterized in that: One of the two air distribution channel devices (22) is a main air channel device; A plurality of main gas outlets (222) are evenly arranged on the main gas channel device along a first direction; At least one main air inlet (221) is provided in the middle area of ​​the main air channel device; The main gas outlet (222) and the main gas inlet (221) are connected via a multi-stage main gas branch channel; In the two adjacent levels of main gas branch channels, the main gas branch channel of the upper level is communicated with the two main gas branch channels of the lower level.

3. A planar cathode device with a binary gas distribution and online adjustable magnetic field as claimed in claim 1, characterized in that: One of the two air distribution channel devices (22) is an auxiliary air channel device; A plurality of auxiliary gas outlets (224) are evenly arranged along a first direction on the auxiliary gas channel device; At least one auxiliary air inlet (223) is provided in the middle area of ​​the auxiliary air channel device; The auxiliary gas outlet (224) and the auxiliary gas inlet (224) are connected via a multi-stage auxiliary gas branch channel; In the auxiliary gas branch channels of two adjacent levels, the auxiliary gas branch channel of the upper level is communicated with the two auxiliary gas branch channels of the lower level.

4. A planar cathode device with a binary gas distribution and online adjustable magnetic field as claimed in claim 1, characterized in that: Each of the air distribution channel devices (22) comprises an air inlet and air outlets evenly arranged along a first direction; The gas distribution system (2) further comprises a valve island device (21), wherein the valve island device (21) is connected to the gas inlet of the gas distribution channel device (22) via a pipeline, and is used to deliver gas to each gas inlet of the gas distribution channel device (22) and to adjust the flow rate of the delivered gas.

5. A planar cathode device with a binary gas distribution and an online adjustable magnetic field as claimed in claim 1, characterized in that: The cathode body (4) further comprises a base (41), the base (41) being provided with a downwardly directed base groove, and the magnet unit being located in the base groove; A cooling copper bar (45) is provided between the target material (46) and the magnet unit, and the cooling copper bar (45) is connected to the base (41) via a support column (48); The cooling copper bar (45) has a cooling liquid passing therein; The target material (46) is closely attached to the outer surface of the cooling copper bar (45) through a pressure strip (47) at the bottom of the base (41).

6. A planar cathode device with binary gas distribution and online adjustable magnetic field as claimed in claim 1, characterized in that: The magnet unit comprises: A magnetic yoke (42), wherein the magnetic yoke (42) is connected to the distance adjustment device (5); A magnet (43) adsorbed on the yoke (42); A magnetic strip (44) is installed on the surface of the magnet (43).

7. A planar cathode device with a binary gas distribution and online adjustable magnetic field as claimed in claim 5, characterized in that: The distance adjustment device (5) comprises: A guide column (51), the lower end of which is connected to the magnet unit; A guide sleeve (52) is mounted on the base (41) and sleeved on the guide column (51) to support the guide column (51); An adjusting rod (54), the lower end of the adjusting rod (54) being threadedly connected to the upper end of the guide column (51); A support seat (53), the support seat (53) is fixed on the base (41) and is used to support the adjustment rod (54); A motor (58) is mounted on the cover plate (1), and an output shaft of the motor (58) is connected to the upper end of the adjusting rod (54) via a coupling (55); The rotation of the output shaft of the motor (58) drives the coupling (55) to rotate, the rotation of the coupling (55) drives the adjustment rod (54) to rotate, and the rotation of the adjustment rod (54) drives the guide column (51) to move up and down.

8. A planar cathode device with binary gas distribution and online adjustable magnetic field as claimed in claim 7, characterized in that: The cover plate (1) comprises a cover plate bottom plate and a cover plate side plate, the upper end surface of the cover plate bottom plate and the inner wall of the cover plate side plate form a cover plate cavity, and the lower end surface of the cover plate bottom plate faces the vacuum sputtering cavity; The cathode body (4) is mounted on the lower end surface of the cover plate bottom plate through a connecting device (3); The motor (58) is installed in the cover plate cavity; The cover plate bottom plate is provided with a through hole extending from the upper end surface of the cover plate bottom plate to the lower end surface of the cover plate bottom plate; The output shaft of the motor (58) passes through the through hole and is connected to the coupling (55); The distance adjustment device (5) further comprises: A rotary sealing device (57) is used to seal the upper end of the through hole to isolate the cover plate cavity from the vacuum sputtering cavity.

9. A planar cathode device with a binary gas distribution and online adjustable magnetic field as claimed in claim 5, characterized in that: The cover plate (1) comprises a cover plate bottom plate, the lower end surface of the cover plate bottom plate faces the vacuum sputtering chamber; The connecting device (3) comprises: A connecting frame (31), the upper end of the connecting frame (31) being connected to the lower end surface of the cover plate bottom plate; A mounting plate (34) mounted on the lower end of the connecting frame (31), wherein the mounting plate (34) is connected to the cathode body (4); A pressure cover (32) and an insulating block (33), wherein the pressure cover (32) and the insulating block (33) are mounted on the upper end of the mounting plate (34), and the insulating block (33) is between the pressure cover (32) and the mounting plate (34).

10. A planar cathode device with binary gas distribution and online adjustable magnetic field as claimed in claim 1, characterized in that: The two air distribution channel devices (22) each include an air inlet and air outlets evenly arranged along a first direction; The two air distribution channel devices (22) have different numbers of air inlets, and the two air distribution channel devices (22) have the same number of air outlets.

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