Moth-eye-like bionic form anti-reflection structure and manufacturing method thereof

Abstract

The invention discloses a moth-eye-like bionic form anti-reflection structure and a manufacturing method thereof, and relates to the technical field of display and imaging optical thin films, and the manufacturing method comprises the following steps: determining a bottom layer processing scheme according to different base materials; processing a moth-eye-like bionic micro-nano structure layer on the base material or the bottom layer; a top layer is processed on the moth-eye-like bionic micro-nano structure layer, and the moth-eye-like bionic anti-reflection structure is formed through stacking. The moth-eye-like bionic form anti-reflection structure prepared by the invention not only has the optical characteristics of wide angle, wide wave band, high transmittance and low reflectivity, but also can select the top layer material as required, so that the anti-reflection structure has the mechanical characteristics of superhardness, friction resistance, fingerprint resistance and the like, and the transmittance of the anti-reflection structure is improved and the anti-reflection effect is realized while the reflected light is reduced. The moth-eye-like bionic anti-reflection structure prepared by the invention can be applied to curved surfaces of glass cover plate products, resin lenses, lenses and the like, the arc edges have no obvious chromatic aberration, the visual experience of a user is improved, and the imaging effect of a system can be improved when the moth-eye-like bionic anti-reflection structure is used for the imaging system.

Description

Technical Field

[0001] The invention relates to the technical field of display and imaging optical films, and in particular to a moth-eye bionic anti-reflection structure and a manufacturing method thereof. Background Art

[0002] At present, the display screens used in mobile phones are usually glass cover plates, the material of which is mainly silica. Due to the inconsistency between the refractive index of glass and the refractive index of air, when visible light shines on the surface of the mobile phone display, it will cause obvious glare, thus affecting the reading experience.

[0003] The purpose of improving transmittance and anti-glare properties can be achieved by coating anti-glare AG film and anti-reflection AR film. This conventional method has two disadvantages. First, it cannot solve the display flash point problem. Second, the anti-reflection properties of the anti-reflection AR film on the surface of the anti-glare AG film will be seriously degraded. Therefore, the display flash point can only be reduced by adding a light homogenizer and accepting the low transmittance effect. Summary of the invention

[0004] In order to solve the display flash point problem existing in the existing method of improving transmittance and anti-glare properties by coating anti-glare AG film and anti-reflection AR film, and the serious degradation of the anti-reflection properties of the anti-reflection AR film on the surface of the anti-glare AG film, the present invention provides a moth-eye-like bionic anti-reflection structure and a manufacturing method thereof. The present invention uses a moth-eye-like bionic micro-nano structure layer to form an anti-reflection coating together with a top layer and a bottom layer, which has anti-fingerprint and scratch resistance effects, and solves the display flash point problem while also achieving the purpose of high transmittance and low reflectivity effects of a glass cover plate or other display lens products.

[0005] The technical solution adopted by the present invention to solve the technical problem is as follows:

[0006] The present invention provides a method for manufacturing a moth-eye bionic anti-reflection structure, which mainly comprises the following steps:

[0007] (1) Determine the bottom processing plan according to different substrates;

[0008] (2) processing a moth-eye-like bionic micro-nano structure layer on a substrate or a bottom layer;

[0009] (3) Processing a top layer on the moth-eye bionic micro-nano structure layer to form a moth-eye bionic anti-reflection structure by stacking.

[0010] As a preferred embodiment, in step (1), the plating scheme of the bottom layer is:

[0011] 1) When the substrate is a glass substrate, the bottom layer is not processed;

[0012] 2) When the substrate is a high refractive index substrate or an organic material substrate, the bottom layer is processed.

[0013] As a more preferred embodiment, when the substrate is a high refractive index sapphire substrate, 4-10 layers of overlapping multilayer films of high and low refractive index materials are plated on the surface of the high refractive index sapphire substrate in a vacuum environment as a bottom layer; when the substrate is a resin substrate, a hardened connection layer is plated on the surface of the resin substrate in a vacuum environment as a bottom layer.

[0014] As a preferred embodiment, in step (2), the moth-eye bionic micro-nano structure layer is processed by a self-assembly mask process and a dry etching method, comprising the following steps:

[0015] 1) performing nanosphere self-assembly on the surface of a substrate or a bottom layer by a gas-liquid interface method to form a single-layer nanosphere self-assembly mask plate on the surface of the substrate or the bottom layer;

[0016] 2) dry etching the substrate or bottom layer with the single-layer nanosphere self-assembly mask plate;

[0017] 3) Cleaning the etched substrate or bottom layer to obtain a moth-eye-like bionic micro-nano structure layer.

[0018] As a more preferred embodiment, the material of the nanospheres is polystyrene or polyethylene; the diameter of the nanospheres is 100nm-4000nm.

[0019] As a more preferred embodiment, before step 2) dry etching, the substrate or bottom layer with the single-layer nanosphere self-assembly mask is pretreated and reduced in size by oxygen ions at a reduction ratio of 1% to 80%.

[0020] As a preferred implementation, in step (3), a top layer is plated on the surface of the moth-eye bionic micro-nano structure layer by using a physical vapor deposition coating method in a vacuum environment.

[0021] As a preferred embodiment, the material of the top layer is a hard film or an anti-fingerprint film.

[0022] As a preferred implementation, the thicknesses of the bottom layer and the top layer are both smaller than the moth-eye bionic micro-nano structure layer; and the material refractive index of the top layer is smaller than the material refractive index of the moth-eye bionic micro-nano structure layer.

[0023] A moth-eye bionic anti-reflection structure prepared by the method for preparing a moth-eye bionic anti-reflection structure provided by the present invention has a single-sided reflectivity of less than 0.1% in the visible light range; after the substrate is double-sided treated, its transmittance in the visible light range is higher than 99.8%; the thickness of the moth-eye bionic anti-reflection structure is 200nm-2000nm.

[0024] Compared with the prior art, the present invention has the following beneficial effects:

[0025] 1. The present invention adopts a four-layer structure of a substrate, a bottom layer, a moth-eye bionic micro-nano structure layer and a top layer, which are stacked to form a moth-eye bionic anti-reflection structure with ultra-low surface reflection. The moth-eye bionic anti-reflection structure not only has the optical properties of wide angle, wide band, high transmittance and low reflectivity, but also can select the top layer material according to the needs to make it have super-hard, friction-resistant, anti-fingerprint and other mechanical properties, while reducing the reflected light, improving its transmittance, thereby achieving the anti-reflection effect.

[0026] 2. The moth-eye bionic anti-reflection structure prepared by the present invention can be applied to curved surfaces such as glass cover products, resin lenses, and lenses. There is no obvious chromatic aberration on the arc edge, which improves the user's visual experience. When used in an imaging system, it can improve the imaging effect of the system.

[0027] 3. The moth-eye bionic anti-reflection structure prepared by the present invention is not only not limited to the substrate material, but also can realize the processing of the moth-eye bionic micro-nano structure layer by adjusting the underlying connection form according to the different refractive index and mechanical properties of the substrate.

[0028] 4. The moth-eye bionic micro-nano structure layer processed by the present invention can change the periodic size according to the size of the nanoballs used in the self-assembly mask plate. The anti-reflection and anti-reflection characteristic bands are not limited by the size of the nanoballs. The moth-eye bionic micro-nano structure layer formed by using the nanoscale mask plate has the advantage of efficient display flash point suppression. While reducing the reflected light, it will not cause the variable angle chromatic aberration problem caused by the traditional multi-layer AR film. The arc edge of the glass cover product can also achieve a non-obvious chromatic aberration effect. The anti-reflection effect is far superior to that of ordinary AR films in an ultra-wide incident angle range, thereby improving the user's visual experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 A schematic diagram of the composition of a moth-eye bionic anti-reflection structure provided by the present invention.

[0030] Figure 2 A flow chart of a method for manufacturing a moth-eye bionic anti-reflection structure provided by the present invention.

[0031] Figure 3 The present invention is a flowchart of processing a moth-eye bionic micro-nano structure layer on a substrate or bottom layer in step 2.

[0032] In the figure: 1. substrate; 2. bottom layer; 3. moth-eye-like bionic micro-nanostructure layer; 4. top layer. DETAILED DESCRIPTION

[0033] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0034] In a first aspect, the present invention provides a moth-eye-like bionic anti-reflection structure.

[0035] See also Figure 1 To illustrate, the present invention provides a moth-eye bionic anti-reflection structure, which specifically includes the following parts:

[0036] A substrate 1, a bottom layer 2, a moth-eye bionic micro-nano structure layer 3 and a top layer 4 are arranged in sequence.

[0037] In the present invention, the material of the substrate 1 includes but is not limited to a high refractive index substrate and an organic material substrate.

[0038] In the present invention, the size of the substrate 1 is preferably adapted to the specifications of any mobile phone display screen, flat panel display screen, television display screen, or vehicle-mounted display screen.

[0039] In the present invention, the material of the bottom layer 2 can be left blank, that is, the bottom layer 2 is not provided, provided that: when the base material 1 is a glass substrate, the bottom layer 2 is not processed.

[0040] In the present invention, when the substrate 1 is a high refractive index substrate such as sapphire, the material of the bottom layer 2 can be a multilayer film formed by alternately plating a high refractive index material and a low refractive index material. Among them, the high refractive index material can be titanium oxide, tantalum oxide, niobium oxide, hafnium oxide or silicon nitride, and the low refractive index material can be silicon dioxide or magnesium fluoride, but are not limited thereto.

[0041] In the present invention, when the substrate 1 is an organic material substrate such as resin, the material of the bottom layer 2 can be a hard connection layer to improve the adhesion of the substrate 1. The material of the hard connection layer can be silicone resin, but is not limited thereto.

[0042] In the present invention, the thickness of the bottom layer 2 is smaller than that of the moth-eye bionic micro-nano structure layer 3 .

[0043] In the present invention, the moth-eye bionic micro-nano structure layer 3 is preferably processed and prepared by a self-assembly mask process and a dry etching method, and the prepared moth-eye bionic micro-nano structure layer 3 can be applied to the surface of optical materials such as glass cover plates and resin material substrates in the display field. By processing the moth-eye bionic micro-nano structure layer 3 on the substrate 1 or the bottom layer 2, the anti-reflection properties of the moth-eye bionic anti-reflection structure can be improved.

[0044] In the present invention, the material of the moth-eye bionic micro-nano structure layer 3 is mainly silicon dioxide, and the refractive index is preferably 1.45-1.46.

[0045] In the present invention, the moth-eye bionic micro-nano structure layer 3 has good periodicity, and the period is adjustable within the range of 300nm-4μm.

[0046] In the present invention, the top layer 4 is preferably prepared by a physical vapor deposition coating method.

[0047] In the present invention, the material of the top layer 4 is preferably a hard film or an anti-fingerprint film. Specifically, the material of the top layer 4 can be selected from silicon dioxide, DLC hard film, hardened carbon film, hardened silicon oxynitride film or AF anti-fingerprint film, but is not limited thereto.

[0048] In the present invention, the thickness of the top layer 4 is preferably 10 nm to 50 nm, but is not limited thereto.

[0049] In the present invention, the thickness of the top layer 4 is smaller than that of the moth-eye bionic micro-nano structure layer 3 .

[0050] In the present invention, the refractive index of the material of the top layer 4 is smaller than the refractive index of the material of the moth-eye bionic micro-nano structure layer 3 .

[0051] The present invention provides a moth-eye bionic anti-reflection structure, the thickness of which is preferably 200nm-2000nm; the single-sided reflectivity of the moth-eye bionic anti-reflection structure in the visible light range is less than 0.1%; after double-sided treatment of the substrate 1, the transmittance of the moth-eye bionic anti-reflection structure in the visible light range is higher than 99.8%.

[0052] In a second aspect, the present invention provides a method for manufacturing a moth-eye bionic anti-reflection structure.

[0053] See also Figure 2 To illustrate, the present invention provides a method for manufacturing a moth-eye bionic anti-reflection structure, and the specific implementation process is as follows:

[0054] Step 1: Determine the processing plan of the bottom layer 2 according to different substrates 1;

[0055] The specific plating scheme of the bottom layer 2 is as follows:

[0056] 1) When the substrate 1 is a glass substrate, the bottom layer 2 is not processed;

[0057] 2) When the substrate 1 is a high refractive index substrate or an organic material substrate, the bottom layer 2 is processed.

[0058] In the specific plating scheme 2) of the bottom layer 2,

[0059] When the substrate 1 is a high refractive index sapphire substrate, 4 to 10 layers of overlapping multilayer films of high and low refractive index materials are plated on the surface of the high refractive index sapphire substrate in a vacuum environment as the bottom layer 2.

[0060] When the base material 1 is a resin substrate, a hardened connection layer is plated on the surface of the resin substrate as the bottom layer 2 in a vacuum environment.

[0061] Step 2: processing a moth-eye bionic micro-nano structure layer 3 on the substrate 1 or the bottom layer 2;

[0062] The moth-eye bionic micro-nano structure layer 3 is processed on the substrate 1 or the bottom layer 2 by a self-assembly mask process and a dry etching method, which specifically includes the following steps:

[0063] 1) performing nanosphere self-assembly on the surface of the substrate 1 or the bottom layer 2 by a gas-liquid interface method to form a single-layer nanosphere self-assembly mask plate on the surface of the substrate 1 or the bottom layer 2;

[0064] The material of the nanospheres is preferably polystyrene or polyethylene.

[0065] The diameter of the nanospheres is preferably 100nm-4000nm.

[0066] The area of ​​the single-layer nanosphere self-assembly mask is preferably 10 mm 2 -1m 2 .

[0067] 2) dry etching the substrate 1 or the bottom layer 2 with the single-layer nanosphere self-assembly mask plate;

[0068] Before performing the dry etching in step 2), the substrate 1 or the bottom layer 2 with the single-layer nanosphere self-assembly mask plate needs to be pre-treated by using oxygen ions to reduce the size by 1%-80%.

[0069] 3) Cleaning the etched substrate 1 or bottom layer 2 to obtain a moth-eye-like bionic micro-nano structure layer 3.

[0070] In the present invention, the preparation method of the moth-eye bionic micro-nano structure layer 3 is preferably a self-assembly mask process and a dry etching method, and can also be prepared by electron beam exposure, nanoimprinting and other technologies. In the present invention, by preparing a single-layer nanosphere self-assembly mask, and then using the single-layer nanosphere self-assembly mask to prepare the moth-eye bionic micro-nano structure layer 3, a nanostructure with a two-dimensional regular hole array or nanostructure array and a highly specialized surface area and regularly arranged holes, a single-layer nanosphere self-assembly mask prepared by polystyrene or polyethylene nanosphere material, has low technical cost, can achieve large-area preparation, and can achieve precise control of periodic structure parameters.

[0071] The specific process route of the self-assembly mask plate process and dry etching method used in the present invention to prepare the moth-eye bionic micro-nano structure layer 3 is as follows: Figure 3 As shown, it mainly includes four steps: mask forming, size reduction control, reactive ion beam etching and cleaning. Among them, the last three steps, namely size reduction control, reactive ion beam etching and cleaning, are completed in the reactive ion beam etching process.

[0072] In the present invention, in the self-assembly mask plate process, a gas-liquid interface method is specifically used to self-assemble nanospheres, and then a single-layer nanosphere self-assembly mask plate is processed. The substrate 1 is specifically selected as a glass substrate, and the nanospheres are specifically selected as polystyrene nanospheres with a diameter of 100nm-4000nm. The specific implementation process is as follows:

[0073] The glass substrate was cleaned in acetone, ethanol, and distilled water for 30 min respectively, and then in 98% H 2 SO 4 / H 2 O 2 (volume ratio 3:1) solution for 2 min, and then 2 O / NH 3 H 2 O / H 2 O 2 The glass substrate was ultrasonically cleaned in a solution (volume ratio 5:1:1) for 2 minutes to increase the hydrophilicity of the glass substrate; the hydrophilic treated glass substrate was blown dry with high-purity nitrogen; polystyrene nanospheres with a diameter of 100nm-4000nm were first dispersed in deionized water, and the concentration of the obtained polystyrene nanosphere aqueous solution was preferably 5.0wt%; the polystyrene nanosphere aqueous solution was then dispersed on the water surface in the container, and due to the surface tension of the water and the strong mutual attraction between the polystyrene nanospheres, the polystyrene nanospheres were arranged in a single layer, and the finally prepared polystyrene nanosphere monolayer template was arranged compactly. , there are almost no obvious defects in large-scale preparation, which can ensure that the etched moth-eye bionic micro-nano structure layer 3 has good periodicity (the structural period is adjustable in the range of 300nm-4μm); then the polystyrene nanosphere monolayer ordered template is transferred to the glass substrate by the pulling method or the natural sedimentation method; wherein, a spreading agent and an aqueous solution organic surfactant need to be added to the polystyrene nanosphere aqueous solution, wherein the aqueous solution organic surfactant refers to a substance with fixed hydrophilic and lipophilic groups, which can be arranged in a directional manner on the surface of the solution and can significantly reduce the surface tension of water. Commonly used surfactants on the market can be used.

[0074] Preferably, the spreading agent is anhydrous ethanol, but is not limited thereto. The volume ratio of the polystyrene nanosphere aqueous solution to anhydrous ethanol is preferably (1:1)-(1:5).

[0075] Preferably, the aqueous solution organic surfactant is sodium dodecyl sulfosulfate (SDS), but is not limited thereto. SDS is one of the most commonly used surfactants, and its chemical formula is CH 3 (CH 2 )10CH 2 OSO 3 Na, also known as sodium lauryl sulfate, is an anionic surfactant. The aqueous solution organic surfactant is prepared by adding 1g-6g of SDS powder to every 100ml of water.

[0076] In the present invention, in the dry etching method, reactive ion beam etching is specifically used. Before the reactive ion beam etching is performed, the substrate 1 or the bottom layer 2 with the single-layer nanosphere self-assembly mask plate needs to be pre-treated, and oxygen ions are used to reduce the size, and the reduction ratio is 1%-80%. The specific implementation process of the size reduction process is: using oxygen (O 2 ) with a ventilation volume of 50 ccm and a radiation frequency power of 250 W for 1s-60s, and a reduction ratio of 1%-80% is controlled; the specific implementation process of the anisotropic reactive ion beam etching process is: using etching gas and oxygen (O 2 ) in a mixed atmosphere with 250W radiation frequency power for 5 min; wherein the etching gas and oxygen (O 2 ) is 10:1 by volume; the etching gas is specifically a fluorine-based gas selected from CF 4 , SF 6 , CH 3 F 3 One or more of .

[0077] In the present invention, the cleaning process uses oxygen (O 2 ) was etched for 30 seconds at a radiation frequency power of 100 W in an atmosphere with a ventilation volume of 20 ccm.

[0078] Step 3: Processing a top layer 4 on the moth-eye bionic micro-nano structure layer 3 to form a moth-eye bionic anti-reflection structure by stacking;

[0079] Specifically, in a vacuum environment, a physical vapor deposition coating method can be used to coat the top layer 4 on the surface of the moth-eye bionic micro-nano structure layer 3 .

[0080] In the present invention, the material and composition of the top layer 4 can be selected according to actual needs.

[0081] Taking into account that during actual use of a mobile phone or display device, the glass cover on the surface of the mobile phone may collide or rub against accessories, desktops, etc., resulting in obvious scratches on the glass cover. In order to prevent the scratches from affecting the display of the glass cover, the material of the top layer 4 may be DLC hard film or silicon oxynitride plus hard film, but is not limited thereto.

[0082] In addition, considering that the mobile phone or display device is repeatedly touched by fingers during actual use, the material of the top layer 4 can be selected from AF anti-fingerprint film, and the thickness is preferably 10nm-50nm, but not limited thereto.

[0083] In a third aspect, the present invention provides a glass cover.

[0084] The present invention provides a glass cover plate, the surface of which is processed with the moth-eye bionic anti-reflection structure described in the first aspect of the present invention.

[0085] In a fourth aspect, the present invention provides a screen.

[0086] The present invention provides a screen which specifically adopts the glass cover plate described in the third aspect of the present invention.

[0087] In a fifth aspect, the present invention provides an electronic device.

[0088] The present invention provides an electronic device, which specifically adopts the screen described in the fourth aspect of the present invention.

[0089] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

[0090] What is described above is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A method for manufacturing a moth-eye bionic anti-reflection structure, characterized in that: The following steps are involved: (1) Determine the bottom layer (2) processing scheme according to different substrates (1); (2) processing a moth-eye-like bionic micro-nanostructure layer (3) on the substrate (1) or the bottom layer (2); (3) A top layer (4) is processed on the moth-eye bionic micro-nano structure layer (3), and a moth-eye bionic anti-reflection structure is formed by stacking.

2. The method for manufacturing a moth-eye bionic anti-reflection structure according to claim 1, characterized in that: In step (1), the plating scheme of the bottom layer (2) is: 1) When the substrate (1) is a glass substrate, the bottom layer (2) is not processed; 2) When the substrate (1) is a high refractive index substrate or an organic material substrate, the bottom layer (2) is processed.

3. The method for manufacturing a moth-eye bionic anti-reflection structure according to claim 2, characterized in that: When the substrate (1) is a high-refractive-index sapphire substrate, 4 to 10 layers of overlapping multilayer films of high and low refractive-index materials are plated on the surface of the high-refractive-index sapphire substrate in a vacuum environment as the bottom layer (2); when the substrate (1) is a resin substrate, a hardened connection layer is plated on the surface of the resin substrate in a vacuum environment as the bottom layer (2).

4. The method for manufacturing a moth-eye bionic anti-reflection structure according to claim 1, characterized in that: In step (2), the moth-eye bionic micro-nano structure layer (3) is processed by a self-assembly mask process and a dry etching method, comprising the following steps: 1) performing nanosphere self-assembly on the surface of a substrate (1) or a bottom layer (2) by a gas-liquid interface method to form a single-layer nanosphere self-assembly mask plate on the surface of the substrate (1) or the bottom layer (2); 2) dry etching the substrate (1) or the bottom layer (2) with the single-layer nanosphere self-assembly mask plate; 3) Cleaning the etched substrate (1) or bottom layer (2) to obtain a moth-eye-like bionic micro-nano structure layer (3).

5. The method for manufacturing a moth-eye bionic anti-reflection structure according to claim 4, characterized in that: The material of the nanosphere is polystyrene or polyethylene; the diameter of the nanosphere is 100nm-4000nm.

6. The method for manufacturing a moth-eye bionic anti-reflection structure according to claim 4, characterized in that: Before performing dry etching in step 2), the substrate (1) or the bottom layer (2) with the single-layer nanosphere self-assembly mask plate is pretreated and the size is reduced by oxygen ions, with the reduction ratio being 1%-80%.

7. The method for manufacturing a moth-eye bionic anti-reflection structure according to claim 1, characterized in that: In step (3), a top layer (4) is plated on the surface of the moth-eye bionic micro-nano structure layer (3) by using a physical vapor deposition coating method in a vacuum environment.

8. The method for manufacturing a moth-eye bionic anti-reflection structure according to claim 1, characterized in that: The material of the top layer (4) is a hard film or an anti-fingerprint film.

9. The method for manufacturing a moth-eye bionic anti-reflection structure according to claim 1, characterized in that: The thicknesses of the bottom layer (2) and the top layer (4) are both smaller than the moth-eye bionic micro-nano structure layer (3); and the material refractive index of the top layer (4) is smaller than the material refractive index of the moth-eye bionic micro-nano structure layer (3).

10. A moth-eye-like bionic antireflection structure prepared by the method according to any one of claims 1 to 9, characterized in that: The moth-eye bionic anti-reflection structure has a single-sided reflectivity of less than 0.1% in the visible light range; the substrate (1) has a transmittance of more than 99.8% in the visible light range after double-sided treatment; the moth-eye bionic anti-reflection structure has a thickness of 200nm-2000nm.

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