Light-emitting panel, preparation method thereof and display equipment

Abstract

The embodiment of the invention belongs to the technical field of display equipment, and relates to a preparation method of a light-emitting panel, the light-emitting panel and display equipment. The preparation method of the light-emitting panel comprises the following steps: providing a substrate; forming a plurality of heightening layers on the substrate; forming a bottom electrode on the heightening layer and / or the substrate; a pixel defining layer is formed on the substrate, the pixel defining layer is arranged around the bottom electrode and covers at least part of the bottom electrode to form a pixel opening, and at least part of the bottom electrode is exposed out of the pixel opening; forming a functional layer with a preset thickness in the pixel opening; and forming a top electrode on the functional layer. By arranging the heightening layer, when the functional ink forms the liquid film, the distance between the bottom electrode provided with the heightening layer and the surface of the liquid film can be changed, namely the volume of the functional ink on the bottom electrode is changed, so that the thickness of each functional layer in the pixel unit formed by each bottom electrode is adjusted by controlling the height of the heightening layer; the optical cavity length of each pixel unit is changed, and the optical display effect is improved.

Description

Technical Field

[0001] The present application relates to the technical field of display devices, and more specifically, to a light-emitting panel and a method for preparing the same, and a display device. Background Art

[0002] The display device has a light-emitting panel, and the light-emitting panel has pixel units that emit light of different colors. Each pixel unit needs to be matched with a corresponding optical cavity length, otherwise the optical display effect of the pixel unit will be reduced. The light-emitting panel preparation method in the prior art is difficult to achieve a single process to form a matching optical cavity length for multiple different pixel units while improving the aperture ratio of the pixel unit. Summary of the invention

[0003] Based on this, an embodiment of the present application provides a method for preparing a light-emitting panel, and the method for preparing a light-emitting panel adopts the following technical solution:

[0004] providing a substrate;

[0005] forming a plurality of raised layers on the substrate;

[0006] forming a bottom electrode on the raised layer and / or the substrate;

[0007] forming a pixel defining layer on the substrate, wherein the pixel defining layer is disposed around the bottom electrode and covers at least a portion of the bottom electrode to form a pixel opening, wherein the pixel opening exposes at least a portion of the bottom electrode;

[0008] forming a functional layer of a preset thickness in the pixel opening;

[0009] A top electrode is formed on the functional layer.

[0010] Furthermore, the step of forming each functional layer in the pixel opening includes:

[0011] Depositing functional ink on the bottom electrode to form a functional ink liquid film, wherein the functional ink liquid film covers the pixel defining layer and the bottom electrode;

[0012] Performing a first treatment on the functional ink liquid film to change the viscosity of the functional ink in the functional ink liquid film so that the height of each location on the upper surface of the functional ink liquid film is the same;

[0013] The functional ink liquid film is subjected to a second treatment to form a functional layer with a preset thickness on the bottom electrode.

[0014] Furthermore, the second process includes:

[0015] The functional ink liquid film is dried, the air pressure of the drying process is 1 Pa to 30000 Pa, and / or the time of the drying process is 1 min to 30 min.

[0016] Furthermore, the components of the functional ink include a photosensitive material, a functional material and a third solvent;

[0017] The first process comprises:

[0018] The functional ink liquid film is subjected to light treatment to change the viscosity of the functional ink in the functional ink liquid film.

[0019] Further, the photosensitive material includes a photo-crosslinking group, wherein the photo-crosslinking group includes at least one of an alkenyl group, an azido group, a diazo group, a cinnamoyl group, and a benzyl acetophenone group; and / or

[0020] The photosensitive material includes at least one of 1,6-ethylene glycol diacrylate, ethoxylated 1,6-ethylene glycol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, tricyclopentyl glycol dimethylol diacrylate, polyethylene glycol 200 diacrylate, polyethylene glycol 400 diacrylate, propoxylated neopentyl glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, ethoxylated bisphenol A diacrylate, 2-alkylethyl methacrylate phosphate, epoxy resin, epoxy acrylic resin, polyvinyl acetate, polyethylene, and polyvinyl alcohol; and / or,

[0021] The third solvent includes at least one of propylene glycol methyl ether acetate, ethylene glycol monomethyl ether acetate, dioxydimethyl ether acetate, and methyl trimethoxyacrylate; and / or,

[0022] The wavelength of the light used in the illumination treatment is 200nm to 400nm; and / or,

[0023] The light treatment time is 5 minutes to 30 minutes.

[0024] Furthermore, the mass ratio of the functional layer material to the photosensitive material is (1-10):100;

[0025] The mass ratio of the sum of the masses of the functional layer material and the photosensitive material to the third solvent is (1-20):100.

[0026] Furthermore, the functional ink includes a first solvent, a second solvent and a functional material, the boiling point and viscosity of the first solvent are both lower than those of the second solvent, and the mass ratio of the first solvent, the second solvent and the functional material is (20-60):(20-50):(0.5-20).

[0027] Furthermore, the first solvent has a boiling point of 80°C to 150°C and a viscosity of 0.1 cp to 5 cp; and / or

[0028] The second solvent has a boiling point greater than 200° C. and a viscosity greater than 20 cp;

[0029] The first process comprises:

[0030] Heating the functional ink liquid film to change the viscosity of the functional ink in the functional ink liquid film;

[0031] The heating temperature of the heating treatment is 60° C. to 150° C.; and / or the heating time of the heating treatment is 1 min to 10 min.

[0032] Furthermore, the first solvent includes at least one of a short-chain alcohol solvent, a short-chain ether solvent, a short-chain ester solvent, and a short-chain ketone solvent, wherein the carbon number of the short-chain alcohol solvent, the short-chain ether solvent, the short-chain ester solvent, and the short-chain ketone solvent is independently 1 to 4; and / or,

[0033] The short-chain alcohol solvent includes at least one of methanol, ethanol, propanol and butanol; and / or,

[0034] The short-chain ether solvent includes at least one of methyl ether, ethyl ether, propyl ether and butyl ether; and / or,

[0035] The short-chain ester solvent includes at least one of methyl formate, ethyl acetate, propyl propionate and butyl butyrate; and / or,

[0036] The short-chain ketone solvent includes at least one of acetone, ethyl ketone, methyl ketone and butanone: and / or,

[0037] The second solvent includes at least one of a long-chain alkane solvent, a long-chain olefin solvent, and a long-chain ester solvent, wherein the long-chain alkane solvent, the long-chain olefin solvent, and the long-chain ester solvent have more than 10 carbon atoms; and / or,

[0038] The long-chain alkane solvent includes at least one of decane and dodecane; and / or,

[0039] The long-chain olefin solvent includes at least one of decene and dodecene; and / or,

[0040] The long-chain ester solvent includes at least one of hexadecyl laurate and hexadecyl palmitate.

[0041] Furthermore, the components of the functional ink also include functional layer materials, and the functional layer materials include at least one of electron injection materials, electron transport materials, luminescent materials, hole injection materials, and hole transport materials;

[0042] The electron injection material and the electron transport material include inorganic materials and / or organic materials; the inorganic material is selected from one or more of doped or undoped zinc oxide, barium oxide, aluminum oxide, nickel oxide, titanium oxide, tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, zinc aluminum oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, cadmium sulfide, zinc sulfide, molybdenum sulfide, tungsten sulfide, copper sulfide, zinc tin, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate, and the doped elements include one or more of aluminum, magnesium, lithium, manganese, yttrium, lanthanum, copper, nickel, zirconium, cerium, and gadolinium; the organic material is selected from one or more of quinoxaline compounds, imidazole compounds, triazine compounds, fluorene compounds, and hydroxyquinoline compounds; and / or

[0043] The luminescent material comprises at least one of a single structure quantum dot and a core-shell structure quantum dot, and the material of the single structure quantum dot, the core material of the core-shell structure quantum dot and the shell material of the core-shell structure quantum dot are respectively selected from at least one of a II-VI group compound, a IV-VI group compound, a III-V group compound and a I-III-VI group compound; and / or

[0044] The hole injection material and the hole transport material include at least one of TFB, CuPc, PVK, Poly-TPD, PFB, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT:PSS, T·APC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-N-phenylamino)triphenylamine, polyaniline, transition metal oxides, transition metal sulfides, transition metal tin compounds, doped graphene, undoped graphene and C60 and / or;

[0045] The material of the enhancement layer includes any one of silicon nitride, silicon oxide, styrene-methyl methacrylate copolymer, polystyrene, polydimethylsiloxane, phenolic resin, polyimide, styrene-acrylate copolymer or a combination thereof; and / or;

[0046] The materials of the bottom electrode and the top electrode include one or more of metals, carbon materials and metal oxides, the metal includes one or more of Al, Ag, Cu, Mo, Au, Ba, Ca, Yb and Mg; the carbon material includes one or more of graphite, carbon nanotubes, graphene and carbon fiber; the metal oxide includes doped or undoped metal oxides, including one or more of ITO, FTO, ATO, AZO, GZO, IZO, MZO and AMO, or includes a composite bottom electrode in which a metal is arranged between doped or undoped transparent metal oxides, and the composite bottom electrode includes one or more of AZO / Ag / AZO, AZO / Al / AZO, ITO / Ag / ITO, ITO / Al / ITO, ZnO / Ag / ZnO, ZnO / Al / ZnO, ZnS / Ag / ZnS, ZnS / Al / ZnS, TiO2 / Ag / TiO2 and TiO2 / Al / TiO2.

[0047] Accordingly, the present application also provides a light-emitting panel, which includes a substrate, a plurality of enhanced layers, a plurality of bottom electrodes, a pixel defining layer, at least one functional layer and a top electrode;

[0048] The enhancement layer is disposed on the substrate, and the bottom electrode is disposed on the enhancement layer;

[0049] The pixel definition layer surrounds the bottom electrode and covers at least a portion of the bottom electrode to form a pixel opening, wherein the pixel opening exposes at least a portion of the bottom electrode;

[0050] The functional layer is arranged in the pixel opening.

[0051] Furthermore, the pixel opening gradually increases in a direction away from the bottom electrode.

[0052] Further, the boosted layer includes a first boosted layer and a second boosted layer, the bottom electrode includes a first bottom electrode, a second bottom electrode and a third bottom electrode, and the thickness of the first boosted layer is greater than that of the second boosted layer; and / or,

[0053] The first bottom electrode, the second bottom electrode, and the third bottom electrode have the same thickness; and / or,

[0054] The first bottom electrode is disposed on the first boosted layer, the second bottom electrode is disposed on the second boosted layer, and the third bottom electrode is disposed on the substrate; and / or,

[0055] The thickness ratio of the first raised layer to the second raised layer is 0.1 to 1; and / or

[0056] The functional layer includes a first functional layer disposed on the first bottom electrode, a second functional layer disposed on the second bottom electrode, and a third functional layer disposed on the third bottom electrode, and the thicknesses of the first functional layer, the second functional layer, and the third functional layer increase in sequence.

[0057] Furthermore, the boosted layer further comprises a third boosted layer, the third bottom electrode is arranged on the third boosted layer, and the thickness of the second boosted layer is greater than that of the third boosted layer;

[0058] The thickness of the third increased layer is 0um to 1um; and / or,

[0059] The thickness ratio of the first increased layer to the third increased layer is 0-1.

[0060] Accordingly, the present application also provides a display device, the display device comprising the light-emitting panel as described in the article Spreading Flowers. The present application also provides a display device in an embodiment, the display device using the light-emitting panel as described above.

[0061] Compared with the prior art, the embodiments of the present application have the following beneficial effects:

[0062] By setting a boosted layer, when the functional ink forms a liquid film, the distance between the bottom electrode provided with the boosted layer and the surface of the liquid film can be changed, that is, the volume of the functional ink on the bottom electrode is changed. Thus, by controlling the height of the boosted layer, the thickness of each functional layer in the pixel unit formed by each bottom electrode is adjusted, the optical cavity length of each pixel unit is changed, and the optical display effect is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0063] In order to more clearly illustrate the solutions in the present application or the prior art, a brief introduction is given below to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0064] Figure 1 is a flow chart of a method for preparing a light-emitting panel according to an embodiment of the present application;

[0065] Figure 2 yes Figure 2 A flowchart of a specific implementation of step S500;

[0066] Figure 3 is a schematic structural diagram of a light-emitting panel according to an embodiment of the present application;

[0067] Figure 4 yes Figure 3 A schematic diagram of the structure when a functional ink liquid film is formed on the light-emitting panel;

[0068] Figure 5 yes Figure 4 Schematic diagram of the structure of the functional ink film of the light-emitting panel when forming a functional layer;

[0069] Figure 6 It is a structural schematic diagram of a light-emitting panel in the prior art.

[0070] Reference numerals:

[0071] Gap 10; substrate 100, pixel defining layer 200, elevated layer 300, first elevated layer 310, second elevated layer 320, bottom electrode 400, first bottom electrode 410, second bottom electrode 420, third bottom electrode 430, functional ink liquid film 500, liquid film surface 510. DETAILED DESCRIPTION

[0072] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by technicians in the technical field of this application; the terms used in the specification of the application herein are only for the purpose of describing specific embodiments and are not intended to limit this application; the terms "including" and "having" and any variations thereof in the specification and claims of this application and the above-mentioned drawings are intended to cover non-exclusive inclusions. The terms "first", "second", etc. in the specification and claims of this application or the above-mentioned drawings are used to distinguish different objects, not to describe a specific order.

[0073] Reference to "embodiment" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiment may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments. The numbering before the method steps herein is only for ease of description and should not be understood as numbering in a specific order.

[0074] Optical cavity length refers to the distance that light travels or the length of the optical path in an optical device or optical system, including but not limited to various functional layers such as hole transport / injection layer, light-emitting layer, electron transport / injection layer, etc. For display devices, the optical cavity length can affect its performance indicators such as brightness, contrast, response time, viewing angle stability, luminous efficiency and color purity, thereby changing the optical display effect of the display device. Therefore, when designing and manufacturing optoelectronic devices, it is necessary to reasonably select the optical cavity length to meet specific application requirements, especially in display devices that use mixed light of red, green and blue light, the red, green and blue pixel units should have optical cavity lengths that meet the requirements of red light, green light and blue light, respectively.

[0075] Please refer to Figure 1 , the preparation method of the light-emitting panel in this application is as follows:

[0076] S100, providing a substrate;

[0077] S200, forming a plurality of build-up layers on the substrate;

[0078] S300, forming a bottom electrode on the raised layer and / or the substrate;

[0079] S400, forming a pixel defining layer on the substrate, wherein the pixel defining layer is disposed around the bottom electrode and covers at least a portion of the bottom electrode, and has a pixel opening, wherein the pixel opening exposes at least a portion of the bottom electrode;

[0080] S500, forming a functional layer with a preset thickness in the pixel opening;

[0081] S600 , forming a top electrode on the functional layer.

[0082] The preset thickness refers to the thickness of the functional layer in the light-emitting device in actual production so that the light-emitting panel can achieve the expected optical display effect. The thickness value changes with the light-emitting requirements and actual structure of the light-emitting panel (for example, the preset thickness of the OLED device is different from that of the QLED device). For example, if a light-emitting panel with three pixel units of red, green and blue needs to be produced, the present embodiment can first provide a substrate 100, and then form a first boosted layer 310 and a second boosted layer 320 on the substrate 100, and then form a first bottom electrode 410 on the first boosted layer 310, and then form a second bottom electrode 420 on the second boosted layer 320 and a third bottom electrode 430 on the substrate 100, and the thickness of the first boosted layer 310 is greater than that of the second boosted layer 320. In one embodiment, the first bottom electrode 410 corresponds to the blue pixel unit, the second bottom electrode 420 corresponds to the green pixel unit, and the third unit 430 corresponds to the red pixel unit.

[0083] At this time, in the process of forming each functional layer in step S500, because the first raised layer 310 and the second raised layer 320 respectively increase the height of the first bottom electrode 410 and the second bottom electrode 420, after the functional ink forms the functional ink liquid film 500, the distance between the first bottom electrode 410 and the liquid film surface 510 is the shortest, the distance between the third bottom electrode 430 and the liquid film surface 510 is the longest, and the distance between the second bottom electrode 420 and the liquid film surface 510 is in the middle, that is, Figure 5As shown in , A<B<C. The volumes of the functional inks above the third bottom electrode 430, the second bottom electrode 420, and the first bottom electrode 410 are different. When the functional layer is finally formed, the thickness of the functional layer on the first bottom electrode 410 is the thinnest, the thickness of the functional layer on the second bottom electrode 420 is the second, and the thickness of the functional layer on the third bottom electrode 430 is the thickest. Because the optical cavity length of the green light pixel unit and the blue light pixel unit is usually smaller than that of the red light, the increased layer 300 can reduce the thickness of the functional layer formed on the green light pixel unit and the blue light pixel unit, so that the thickness of the functional layer meets the preset thickness, ensuring that the red light pixel unit, the green light pixel unit, and the blue light pixel unit form matching optical cavity lengths, thereby improving the display effect of the light-emitting panel.

[0084] In summary, the method for preparing the light-emitting panel of the embodiment of the present application can form functional layers of different preset thicknesses for different pixel units in a single process, so that each pixel unit can have a matching optical cavity length and at the same time can improve the aperture ratio of the light-emitting panel.

[0085] It can be understood that in this embodiment, each bottom electrode 400 can also be placed on the boosted layer 300 without contacting the substrate 100, so as to avoid affecting the overall light-emitting effect due to the different materials contacted by each bottom electrode 400. For example, the third bottom electrode 430 is arranged on the third boosted layer (not shown in the figure), and the thickness of the third boosted layer is less than the second boosted layer 320. The boosted layer 300 can have multiple groups to match a variety of pixel units. The material of the boosted layer 300 includes but is not limited to inorganic insulating materials such as silicon nitride and silicon oxide and at least one of photoresist materials such as styrene-methyl methacrylate copolymer (SMA), polystyrene (PS), polydimethylsiloxane (PDMS), phenolic resin, polyimide (PI), styrene-acrylate copolymer; the manufacturing method of the boosted layer 300 includes but is not limited to halftone process, photolithography, deposition, evaporation, etc. The material of the pixel defining layer 200 includes but is not limited to insulating materials such as styrene-acrylate copolymer (PVA), polystyrene (PS), photoresist, fluorinated polyimide (FPI), epoxy resin, etc., and its manufacturing process includes but is not limited to processes such as photolithography and electron beam exposure; the material of the pixel defining layer 200 is preferably at least one of hydrophilic materials such as polyamide (Polyimide), polyimide (Polyamide), polymethyl methacrylate (PMMA), polyethyleneimine (PEI), silicone gel (Silicone Gel), so that the functional ink can be better attached to the bottom electrode 400 and prevent the functional ink from flowing. Preferably, the pixel defining layer 200 is prepared by PVD or CVD process, and the material of the pixel defining layer 200 includes any one of silicon oxide, silicon nitride, and silicon oxynitride.

[0086] Furthermore, the material of the increased layer includes at least one of silicon nitride, silicon oxide, styrene-methyl methacrylate copolymer (SMA), polystyrene (PS), polydimethylsiloxane (PDMS), phenolic resin, polyimide (PI), and styrene-acrylate. The above materials have good plasticity, processability, electrical insulation performance and chemical stability, are easy to prepare thin films and thin layers, and can improve the production efficiency of the light-emitting panel and the stability of the light-emitting panel.

[0087] The material of the bottom electrode 400 includes an anode or a cathode, and its material includes one or more of a metal, a carbon material and a metal oxide, the metal includes at least one of Al, Ag, Cu, Mo, Au, Ba, Ca, Yb and Mg; the carbon material includes at least one of graphite, carbon nanotubes, graphene and carbon fiber; the metal oxide includes a doped or undoped metal oxide, including at least one of ITO, FTO, ATO, AZO, GZO, IZO, MZO and AMO, or includes a composite bottom electrode 400 in which a metal is arranged between doped or undoped transparent metal oxides, and the composite bottom electrode 400 includes at least one of AZO / Ag / AZO, AZO / Al / AZO, ITO / Ag / ITO, ITO / Al / ITO, ZnO / Ag / ZnO, ZnO / Al / ZnO, ZnS / Ag / ZnS, ZnS / Al / ZnS, TiO2 / Ag / TiO2 and TiO2 / Al / TiO2. The manufacturing process includes but is not limited to thin film deposition, photolithography, printing, and plasma etching. It is preferred to use a top-emitting reflective bottom electrode 400, such as a laminated structure of conductive metals and conductive metal oxides such as ITO / Ag / ITO, IZO / Ag / IZO. It is understandable that the method for processing the functional ink film 500 in step S530 includes but is not limited to heat treatment and vacuum treatment. The heat treatment process includes placing the substrate 100 on which the functional ink film 500 is set in a high-temperature oven, using heat to volatilize the solvent in the functional ink, and depositing to form a functional layer. The vacuum treatment process includes placing the substrate 100 on which the functional ink film 500 is set in a vacuum environment, and using the gas diffusion effect under low pressure to cause the solvent in the functional ink to volatilize to form a functional layer.

[0088] For further information, please refer to Figure 2 , S500, the step of forming each functional layer in the pixel opening includes:

[0089] S510, depositing functional ink on the electrode to form a functional ink liquid film, wherein the functional ink liquid film covers the pixel defining layer and the electrode;

[0090] S520, performing a first treatment on the functional ink liquid film to change the viscosity of the functional ink in the functional ink liquid film so that the height of each location on the upper surface of the functional ink liquid film is the same;

[0091] S530, performing a second treatment on the functional ink liquid film to form a functional layer with a preset thickness on the bottom electrode.

[0092] Please refer to Figure 3 When the pixel defining layer 200 covers part of the bottom electrode 400, due to the formation process limitation of the pixel defining layer 200, the thickness of the pixel defining layer 200 at each location should be consistent, that is, the thickness is D. However, the height of the upper surface of each pixel defining layer 200 will be different, resulting in that after the functional ink is coated or sprayed to form the functional ink liquid film 500, the functional ink will flow along the area defined by the pixel defining layer 200 with a higher upper surface to the area defined by the pixel defining layer 200 with a lower upper surface, and finally it is impossible to form the functional ink film 500. Figure 4 The surface of the liquid film is flat (the height of each part of the surface is the same), so that the functional layer of the preset thickness cannot be formed on the first bottom electrode 410, the second bottom electrode 420, and the third bottom electrode 430. Therefore, this embodiment changes the viscosity of the functional ink to prevent the functional ink from flowing during the process of forming the liquid film, thereby forming a functional ink liquid film 500 with a flat surface, ensuring the formation of a functional layer of the preset thickness. Repeat the above steps to complete the production of each functional layer.

[0093] Further, the first treatment step includes: drying the functional ink liquid film, the air pressure of the drying treatment is 1Pa to 30000Pa, and / or the drying treatment time is 1min to 30min. Under this drying air pressure, thermal oxidation or chemical decomposition of certain sensitive materials can be avoided, thereby protecting the stability of the functional layer and improving the uniformity of the surface of the functional layer. Within this treatment time range, physical and chemical damage to the functional layer caused by long-term drying can be avoided, which helps to maintain the integrity of the functional layer. It is understandable that the air pressure of the drying treatment can be any value of 1Pa, 3000Pa, 6000Pa, 9000Pa, 12000Pa, 15000Pa, 18000Pa, 21000Pa, 24000Pa, 27000Pa, 30000Pa, or a range formed by any two values. The drying time can be 1 min, 2 min, 3 min, 4 min, 5 min, 6 min, 7 min, 8 min, 9 min, 10 min, 11 min, 12 min, 13 min, 14 min, 15 min, 16 min, 17 min, 18 min, 19 min, 20 min, 21 min, 22 min, 23 min, 24 min, 25 min, 26 min, 27 min, 28 min, 29 min, or 30 min, any one of the values ​​or a range formed by any two of the values.

[0094] It is understood that the material of the functional ink includes but is not limited to at least one of the hole injection / transport layer materials, light-emitting layer materials, and electron injection / transport layer materials commonly used in the art. Step S530 includes but is not limited to drying and curing. The electron injection / transport layer material includes inorganic materials and / or organic materials; the inorganic material is selected from at least one of doped or undoped zinc oxide, barium oxide, aluminum oxide, nickel oxide, titanium oxide, tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, zinc aluminum oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, cadmium sulfide, zinc sulfide, molybdenum sulfide, tungsten sulfide, copper sulfide, zinc tin, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate, and the doped element includes at least one of aluminum, magnesium, lithium, manganese, yttrium, lanthanum, copper, nickel, zirconium, cerium, and gadolinium; the organic material is selected from at least one of quinoxaline compounds, imidazole compounds, triazine compounds, fluorene compounds, and hydroxyquinoline compounds.

[0095] The light-emitting layer material includes at least one of a single structure quantum dot and a core-shell structure quantum dot, and the material of the single structure quantum dot, the core material of the core-shell structure quantum dot and the shell material of the core-shell structure quantum dot are respectively selected from at least one of II-VI group compounds, IV-VI group compounds, III-V group compounds and I-III-VI group compounds, wherein the II-VI group compounds include but are not limited to CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSe One or more of Te, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe and HgZnSTe, and Group IV-VI compounds include but are not limited to SnS, SnSe, SnTe, PbS, PbSe, P At least one of SnPbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe, and the III-V compounds include but are not limited to GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, A At least one of lPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs and InAlPSb; and the I-III-VI group compounds include but are not limited to at least one of CuInS2, CuInSe2 and AgInS2.

[0096] The hole injection / transport layer material includes at least one of TFB, CuPc, PVK, Poly-TPD, PFB, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT:PSS, T·APC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-Nphenylamino)triphenylamine, polyaniline, transition metal oxides, transition metal sulfides, transition metal tinides, doped graphene, undoped graphene and C60.

[0097] The material of the heightened layer includes at least one of silicon nitride, silicon oxide, styrene-methyl methacrylate copolymer (SMA), polystyrene (PS), polydimethylsiloxane (PDMS), phenolic resin, polyimide (PI), and styrene-acrylate copolymer; and / or;

[0098] The materials of the bottom electrode and the top electrode include one or more of metals, carbon materials and metal oxides, the metal includes at least one of Al, Ag, Cu, Mo, Au, Ba, Ca, Yb and Mg; the carbon material includes at least one of graphite, carbon nanotubes, graphene and carbon fiber; the metal oxide includes doped or undoped metal oxides, including at least one of ITO, FTO, ATO, AZO, GZO, IZO, MZO and AMO, or includes a composite bottom electrode 400 in which a metal is arranged between doped or undoped transparent metal oxides, and the composite bottom electrode 400 includes at least one of AZO / Ag / AZO, AZO / Al / AZO, ITO / Ag / ITO, ITO / Al / ITO, ZnO / Ag / ZnO, ZnO / Al / ZnO, ZnS / Ag / ZnS, ZnS / Al / ZnS, TiO2 / Ag / TiO2 and TiO2 / Al / TiO2.

[0099] For further information, please refer to Figure 2 , the components of the functional ink include a photosensitive material, a functional layer material and a third solvent;

[0100] The first process comprises:

[0101] The functional ink liquid film is subjected to light treatment to change the viscosity of the functional ink in the functional ink liquid film.

[0102] Photosensitive materials have a significant response to light in a specific wavelength range, generating photogenerated electrons or stimulating electronic transitions, and their response viscosity, intensity and other characteristics can be adjusted by controlling parameters such as light intensity and wavelength. Therefore, when the components of the functional ink include photosensitive materials, that is, in the process of making the functional layer, the functional ink film 500 is subjected to light treatment, the viscosity of the functional ink can be changed, thereby avoiding the flow of the functional ink, so that it finally forms a functional ink film 500 with a smooth surface, and ensures that the thickness of the functional layer finally formed meets the preset thickness. The functional ink in this embodiment can polymerize the photocrosslinking groups under light, so that the organic polymers in the solution form crosslinks with each other, thereby avoiding the flow of the functional ink, so that it finally forms a functional ink film 500 with a smooth surface, and ensures that the thickness of the functional layer finally formed meets the preset thickness.

[0103] Further, the photosensitive material includes at least one of 1,6-ethylene glycol diacrylate, ethoxylated 1,6-ethylene glycol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, tricyclopentyl glycol dimethacrylate, polyethylene glycol 200 diacrylate, polyethylene glycol 400 diacrylate, propoxylated neopentyl glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, ethoxylated bisphenol A diacrylate, 2-alkylethyl methacrylate phosphate, epoxy resin, epoxy acrylic resin, polyvinyl acetate, polyethylene and polyvinyl alcohol.

[0104] The third solvent includes at least one of propylene glycol methyl ether acetate, ethylene glycol monomethyl ether acetate, dioxydimethyl ether acetate, and trimethoxy methyl acrylate, and / or, during light treatment, the wavelength of the light treated by light treatment is 200nm to 400nm, and the illumination time is 5min to 30min. In the above-mentioned light wavelength range, the energy of ultraviolet light is suitable, which can avoid excessive cross-linking of the material and affect the performance of the material, while ensuring that the photocrosslinking group is fully excited and the cross-linking reaction rate is increased. It is understandable that the light wavelength can be 200nm, 210nm, 220nm, 230nm, 240nm, 250nm, 260nm, 270nm, 280nm, 290nm, 300nm, 310nm, 320nm, 330nm, 340nm, 350nm, 360nm, 370nm, 380nm, 390nm, and 400nm, and any value or the range formed by any two values. The illumination time can be any one of 5 min, 6 min, 7 min, 8 min, 9 min, 10 min, 11 min, 12 min, 13 min, 14 min, 15 min, 16 min, 17 min, 18 min, 19 min, 20 min, 21 min, 22 min, 23 min, 24 min, 25 min, 26 min, 27 min, 28 min, 29 min, and 30 min, or a range formed by any two of the values.

[0105] Further, the mass ratio of the functional layer material and the photosensitive material is (1-10):100, and the mass ratio of the sum of the masses of the functional layer material and the photosensitive material to the third solvent is (1-20):100. It is understood that the mass ratio can be any value of 1:100, 2:100, 3:100, 4:100, 5:100, 6:100, 7:100, 8:100, 9:100, 10:100, or a range formed by any two values. The mass ratio of the sum of the masses of the functional layer material and the photosensitive material to the third solvent can be any value of 1:100, 1:100, 5:100, 10:100, 15:100, or 20:100, or a range formed by any two values. At this time, the photosensitive material can be prevented from affecting the performance of the light-emitting layer, ensuring that the photosensitive material can affect the properties of the light-emitting layer such as viscosity, so as to improve the stability and surface uniformity of the light-emitting layer, and can avoid the third solvent residue from being difficult to remove.

[0106] For further information, please refer to Figure 2. In addition to the method of light treatment, the composition of the functional ink can also be changed to make it present different viscosities at different times to ensure that the liquid film surface 510 finally formed by the functional ink is flat. The components of the functional ink in this embodiment include a first solvent and a second solvent. The boiling point of the first solvent is 80°C to 150°C, the viscosity is 0.1cp to 5cp, and the mass ratio of the first solvent is 20% to 60% of the functional ink; the boiling point of the second solvent is greater than 200°C, the viscosity is greater than 20cp, and the mass ratio of the second solvent is 20% to 50%. The first treatment includes: heating the functional ink liquid film to change the viscosity of the functional ink in the functional ink liquid film; the heating temperature of the heating treatment is 60°C to 150°C; and / or the heating time of the heating treatment is 1min to 10min. After the functional ink is just coated or sprayed on the pixel definition layer 200 and the bottom electrode 400, before the functional ink liquid film 500 is heated, the first solvent in the functional ink has a low boiling point and low viscosity, so the functional ink can flow to fill the area enclosed by the pixel definition layer 200, that is, fill the area above the bottom electrode 400. When the temperature of heating and drying the functional ink is between 60°C and 150°C, the first solvent in the functional ink evaporates, and under the action of the second solvent, the fluidity of the functional ink decreases, and it will not flow from the pixel definition layer 200 with a higher upper surface to the pixel definition layer 200 with a lower upper surface, that is, the liquid film surface 510 is flat. When the temperature of heating and drying the functional ink 500 exceeds 200°C, the second solvent also evaporates, and at this time the functional ink liquid film 500 forms a functional layer of a preset thickness. In summary, this embodiment avoids the unevenness of the liquid film surface 510 caused by the flow of the functional ink by adding the first solvent and the second solvent with a specific boiling point and viscosity to the functional ink, thereby ensuring that a functional layer of a preset thickness can be formed.

[0107] Further, the boiling point of the first solvent is 80℃~150℃, the viscosity is 0.1cp~5cp, and the proportion of the functional ink is 20%~60%, and the boiling point of the second solvent is greater than 200℃, the viscosity is greater than 20cp, and the proportion of the functional ink is 20%~50%. The first treatment includes: heating the functional ink film to change the viscosity of the functional ink in the functional ink film; the heating temperature of the heating treatment is 60℃~150℃; and / or the heating time of the heating treatment is 1min~10min. At this time, in the drying process of the functional ink, the functional ink can be prevented from volatilizing in advance or delaying volatilization, thereby improving the flatness of the functional ink film 500 formed by the functional ink, so that the thickness of the functional layer finally formed is closest to the preset thickness. It can be understood that the boiling point of the first solvent can be 80℃, 90℃, 100℃, 110℃, 120℃, 130℃, 140℃, 150℃. The viscosity may be any one of 0.1 cp, 0.5 cp, 1.0 cp, 1.5 cp, 2.0 cp, 2.5 cp, 3.0 cp, 3.5 cp, 4.0 cp, 4.5 cp, and 5.0 cp, or a range formed by any two of the values. The boiling point of the second solvent may be any one of 200° C., 210° C., 220° C., 230° C., 240° C., 250° C., 260° C., 270° C., 280° C., 290° C., 300° C., 310° C., 320° C., 330° C., 340° C., 350° C., 360° C., 370° C., 380° C., 390° C., and 400° C., or a range formed by any two of the values. The viscosity can be any value among 20cp, 20.5cp, 21cp, 21.5cp, 22cp, 22.5cp, 23cp, 23.5cp, 24cp, 24.5cp, and 25cp, or a range formed by any two values. The mass ratio of the first solvent, the second solvent, and the functional material is (20-60): (20-50): (0.5-20), including any value among 30:50:20, 60:20:20, and 45:45:10, or a range formed by any two values. The heating temperature of the heat treatment is 60°C to 150°C, including any value among 60°C, 70°C, 80°C, 90°C, 100°C, 110°C, 120°C, 130°C, 140°C, and 150°C, or a range formed by any two values. The heating time of the heat treatment is 1 min to 10 min, including any value of 1 min, 2 min, 3 min, 4 min, 5 min, 6 min, 7 min, 8 min, 9 min, and 10 min, or a range formed by any two values.

[0108] It is understood that the first solvent includes at least one of a short-chain alcohol solvent, a short-chain ether solvent, a short-chain ester solvent, and a short-chain ketone solvent, wherein the carbon number of the short-chain alcohol solvent, the short-chain ether solvent, the short-chain ester solvent, and the short-chain ketone solvent are independently 1 to 4; and / or,

[0109] The short-chain alcohol solvent includes at least one of methanol, ethanol, propanol and butanol; and / or,

[0110] The short-chain ether solvent includes at least one of methyl ether, ethyl ether, propyl ether and butyl ether; and / or,

[0111] The short-chain ester solvent includes at least one of methyl formate, ethyl acetate, propyl propionate and butyl butyrate; and / or,

[0112] The short-chain ketone solvent includes at least one of acetone, ethyl ketone, methyl ketone and butanone: and / or,

[0113] The second solvent includes any one of a long-chain alkane solvent, a long-chain olefin solvent, and a long-chain ester solvent or a combination thereof, wherein the carbon atoms of the long-chain alkane solvent, the long-chain olefin solvent, and the long-chain ester solvent are all greater than 10; the long-chain alkane solvent includes at least one of decane and dodecane; and / or,

[0114] The long-chain olefin solvent includes at least one of decene and dodecene; and / or,

[0115] The long-chain ester solvent includes at least one of hexadecyl laurate and hexadecyl palmitate.

[0116] The above materials can make the functional ink have good wettability and stability, can form a uniform functional layer, thereby achieving uniformity and consistency of photo-crosslinking, can remain stable in a complex chemical environment, and is not easily affected by external factors.

[0117] See also Figures 3 to 5 The embodiment of the present application also provides a light-emitting panel, which includes a substrate 100, a plurality of boosted layers 300, a plurality of electrodes 400, a pixel defining layer 200 and at least one functional layer; the boosted layer 300 is disposed on the substrate 100, and the bottom electrode 400 is disposed on the boosted layer 300; the pixel defining layer surrounds the bottom electrode 400 and covers at least a portion of the bottom electrode 400, and has a pixel opening, the pixel opening exposes at least a portion of the bottom electrode 400, and the functional layer is disposed in the pixel opening. The embodiment of the present application is provided with the boosted layer 300, so when the functional ink forms a liquid film, it is possible to change the distance between the bottom electrode 400 provided with the boosted layer 300 and the surface of the liquid film, that is, to change the volume of the functional ink on the bottom electrode 400, so as to adjust the thickness of each functional layer in the pixel unit formed by each bottom electrode 400 by controlling the height of the boosted layer 300, change the optical cavity length of each pixel unit, and improve the optical display effect of the light-emitting panel.

[0118] Further, the boosted layer 300 includes a first boosted layer 310 and a second boosted layer 320, and the bottom electrode 400 includes a first bottom electrode 410, a second bottom electrode 420, and a third bottom electrode 430. The thickness of the first boosted layer 310 is greater than that of the second boosted layer 320; the thickness of the first bottom electrode 410, the second bottom electrode 420, and the third bottom electrode 430 are equal and are all located on the same side of the substrate 100; the first bottom electrode 410 is disposed on the first boosted layer 310, the second bottom electrode 420 is disposed on the second boosted layer 3202, and the third bottom electrode 430 is disposed on the substrate 100. At this time, the first bottom electrode 410 corresponds to the blue pixel unit, the second bottom electrode 420 corresponds to the green pixel unit, and the third unit 430 corresponds to the red pixel unit.

[0119] Furthermore, the pixel opening gradually increases in a direction away from the bottom electrode 400. Figure 6 , the pixel defining layer 200 is completely disposed on the substrate 100, and has an opening that gradually increases in a direction away from the substrate 100. Due to process limitations, there will be a gap between the pixel defining layer 200 and the bottom electrode 400, and the gap will cause the bottom electrode 400 to leak electricity. Therefore, the pixel defining layer 200 of the present application needs to cover at least part of the bottom electrode 400. In addition, the pixel defining layer 200 of the present application has an opening that gradually increases in a direction away from the substrate 100, so the angle of light emission becomes larger, and the aperture ratio of each pixel unit can also be improved.

[0120] It is understandable that if the thickness of the boosted layer 300 is too thick, the light-emitting panel will be larger and not conducive to assembly, while if the thickness of the boosted layer 300 is too thin, the processing difficulty will increase. The thickness of the first boosted layer 310 is 1um to 5um, including but not limited to any value of 1um, 1.5um, 2um, 2.5um, 3um, 3.5um, 4um, 4.5um, and 5um, or a range formed by any two values. Therefore, the thickness of the second boosted layer 320 is 0.5um to 3um, including but not limited to any value of 0.5um, 1um, 1.5um, 2um, 2.5um, and 3um, or a range formed by any two values. Some embodiments also include a third boosted layer, in which case the third bottom electrode 430 is also raised by the boosted layer 300, and the boosted layer 300 includes a third boosted layer (not shown in the figure). The third bottom electrode 430 is arranged on the third boosted layer, and the thickness of the third boosted layer is 0um to 1um, including but not limited to 0.5um, 1um, or a range formed by the two. When the thickness of the third increased layer is 0 um, it means that the third bottom electrode 430 is located on the substrate. Since the thicknesses of the first unit layer, the second unit layer, and the third unit layer are different, the optical cavity length of the pixel unit finally formed can be adapted to the optical cavity lengths required for the red light, green light, and blue light emitted by the three pixel units R, G, and B, respectively, thereby improving the optical display effect of the light-emitting panel.

[0121] Further, the thickness ratio of the first increased layer 410 and the second increased layer 420 is 0.1 to 1, including but not limited to any one of 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, and 1.0 or the range formed by any two values. The thickness of the third increased layer is 0um to 1um. The thickness ratio of the first increased layer 410 and the third increased layer is 0 to 1, including but not limited to any one of 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, and 1.0 or the range formed by any two values. The thickness of the third increased layer can be 0um, 0.1um, 0.2um, 0.3um, 0.4um, 0.5um, 0.6um, 0.7um, 0.8um, 0.9um, and 1.0um or the range formed by any two values.

[0122] The functional layer includes a first functional layer disposed on the first bottom electrode, a second functional layer disposed on the second bottom electrode and a third functional layer disposed on the third bottom electrode, and the thicknesses of the first functional layer, the second functional layer and the third functional layer increase in sequence.

[0123] The pixel defining layer 200 is arranged around the bottom electrode 400, has an opening that gradually increases in a direction away from the substrate 100, and covers at least part of the bottom electrode 400. Because the light-emitting panel has an increased layer 300, when the functional ink is coated on the bottom electrode 400 and the functional ink forms a functional ink liquid film 500, the distance between the bottom electrode 400 provided with the increased layer 300 and the surface of the liquid film can be changed, that is, the volume of the functional ink on the bottom electrode 400 is changed, so that by controlling the height of the increased layer 300, the thickness of each functional layer in the pixel unit formed by each bottom electrode 400 is adjusted, the optical cavity length of each pixel unit is changed, and the optical display effect is improved. At the same time, the pixel defining layer 200 has an opening that gradually increases in a direction away from the substrate 100, and the angle of light emission becomes larger, so the aperture ratio is also improved.

[0124] It is understood that the bottom electrode 400 may also be Figures 3 to 5 , disposed on the substrate 100 and the raised layer 300, as long as the raised layer 300 can make a height difference between each bottom electrode 400. Each raised layer 300 can be etched once on the photoresist through an etching process.

[0125] The embodiment of the present application also provides a display device, which uses the above light-emitting panel. It is understandable that the display device may include products such as mobile phones, tablet computers, computer monitors, vehicle control display screens, solar cells, solar generators, etc.

[0126] Obviously, the embodiments described above are only some embodiments of the present application, rather than all embodiments. The preferred embodiments of the present application are given in the accompanying drawings, but they do not limit the patent scope of the present application. The present application can be implemented in many different forms. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the present application more thorough and comprehensive. Although the present application is described in detail with reference to the aforementioned embodiments, for those skilled in the art, it is still possible to modify the technical solutions recorded in the aforementioned specific implementation methods, or to perform equivalent replacement of some of the technical features therein. Any equivalent structure made using the contents of the specification and drawings of this application, directly or indirectly used in other related technical fields, is similarly within the scope of patent protection of this application.

[0127] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, combinations, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present application, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A method for preparing a light-emitting panel, characterized in that: The method comprises: providing a substrate; forming a plurality of raised layers on the substrate; forming a bottom electrode on the raised layer and / or the substrate; forming a pixel defining layer on the substrate, wherein the pixel defining layer is disposed around the bottom electrode and covers at least a portion of the bottom electrode to form a pixel opening, wherein the pixel opening exposes at least a portion of the bottom electrode; forming a functional layer of a preset thickness in the pixel opening; A top electrode is formed on the functional layer.

2. The method for preparing a light emitting panel according to claim 1, characterized in that: The step of forming each functional layer in the pixel opening comprises: Depositing functional ink on the bottom electrode to form a functional ink liquid film, wherein the functional ink liquid film covers the pixel defining layer and the bottom electrode; Performing a first treatment on the functional ink liquid film to change the viscosity of the functional ink in the functional ink liquid film so that the height of each location on the upper surface of the functional ink liquid film is the same; The functional ink liquid film is subjected to a second treatment to form a functional layer with a preset thickness on the bottom electrode.

3. The method for preparing a light emitting panel according to claim 2, characterized in that: The second process comprises: The functional ink liquid film is dried, the air pressure of the drying process is 1Pa to 30000Pa, and / or the time of the drying process is 1min to 30min.

4. The method for preparing a light emitting panel according to claim 2, characterized in that: The components of the functional ink include a photosensitive material, a functional material and a third solvent; The first process comprises: The functional ink liquid film is subjected to light treatment to change the viscosity of the functional ink in the functional ink liquid film.

5. The method for preparing a light emitting panel according to claim 4, characterized in that: The photosensitive material includes a photo-crosslinking group, wherein the photo-crosslinking group includes at least one of an alkenyl group, an azido group, a diazo group, a cinnamoyl group, and a benzyl acetophenone group; and / or The photosensitive material includes at least one of 1,6-ethylene glycol diacrylate, ethoxylated 1,6-ethylene glycol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, tricyclopentyl glycol dimethylol diacrylate, polyethylene glycol 200 diacrylate, polyethylene glycol 400 diacrylate, propoxylated neopentyl glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, ethoxylated bisphenol A diacrylate, 2-alkylethyl methacrylate phosphate, epoxy resin, epoxy acrylic resin, polyvinyl acetate, polyethylene, and polyvinyl alcohol; and / or, The third solvent includes at least one of propylene glycol methyl ether acetate, ethylene glycol monomethyl ether acetate, dioxydimethyl ether acetate, and methyl trimethoxyacrylate; and / or, The wavelength of the light used in the illumination treatment is 200nm to 400nm; and / or, The light treatment time is 5 minutes to 30 minutes.

6. The method for preparing a light emitting panel according to claim 5, characterized in that: The mass ratio of the functional layer material to the photosensitive material is (1-10):100; The mass ratio of the sum of the masses of the functional layer material and the photosensitive material to the third solvent is (1-20):

100.

7. The method for preparing a light emitting panel according to claim 2, characterized in that: The functional ink includes a first solvent, a second solvent and a functional material, the boiling point and viscosity of the first solvent are both lower than those of the second solvent, and the mass ratio of the first solvent, the second solvent and the functional material is (20-60):(20-50):(0.5-20).

8. The method for preparing a light emitting panel according to claim 7, characterized in that: The first solvent has a boiling point of 80°C to 150°C and a viscosity of 0.1 cp to 5 cp; and / or The second solvent has a boiling point greater than 200° C. and a viscosity greater than 20 cp; The first process comprises: Heating the functional ink liquid film to change the viscosity of the functional ink in the functional ink liquid film; The heating temperature of the heating treatment is 60°C to 150°C; and / or, The heating time of the heating treatment is 1 min to 10 min.

9. The method for preparing a light emitting panel according to claim 8, characterized in that: The first solvent includes at least one of a short-chain alcohol solvent, a short-chain ether solvent, a short-chain ester solvent, and a short-chain ketone solvent, wherein the carbon number of the short-chain alcohol solvent, the short-chain ether solvent, the short-chain ester solvent, and the short-chain ketone solvent is independently 1 to 4; and / or, The short-chain alcohol solvent includes at least one of methanol, ethanol, propanol and butanol; and / or, The short-chain ether solvent includes at least one of methyl ether, ethyl ether, propyl ether and butyl ether; and / or, The short-chain ester solvent includes at least one of methyl formate, ethyl acetate, propyl propionate and butyl butyrate; and / or, The short-chain ketone solvent includes at least one of acetone, ethyl ketone, methyl ketone and butanone: and / or, The second solvent includes at least one of a long-chain alkane solvent, a long-chain olefin solvent, and a long-chain ester solvent, wherein the long-chain alkane solvent, the long-chain olefin solvent, and the long-chain ester solvent have more than 10 carbon atoms; and / or, The long-chain alkane solvent includes at least one of decane and dodecane; and / or, The long-chain olefin solvent includes at least one of decene and dodecene; and / or, The long-chain ester solvent includes at least one of hexadecyl laurate and hexadecyl palmitate.

10. The method for preparing a light emitting panel according to claim 2, characterized in that: The components of the functional ink also include a functional layer material, and the functional layer material includes at least one of an electron injection material, an electron transport material, a luminescent material, a hole injection material, and a hole transport material; The electron injection material and the electron transport material include inorganic materials and / or organic materials; the inorganic material is selected from one or more of doped or undoped zinc oxide, barium oxide, aluminum oxide, nickel oxide, titanium oxide, tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, zinc aluminum oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, cadmium sulfide, zinc sulfide, molybdenum sulfide, tungsten sulfide, copper sulfide, zinc tin, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate, and the doped elements include one or more of aluminum, magnesium, lithium, manganese, yttrium, lanthanum, copper, nickel, zirconium, cerium, and gadolinium; the organic material is selected from one or more of quinoxaline compounds, imidazole compounds, triazine compounds, fluorene compounds, and hydroxyquinoline compounds; and / or The luminescent material comprises at least one of a single structure quantum dot and a core-shell structure quantum dot, and the material of the single structure quantum dot, the core material of the core-shell structure quantum dot and the shell material of the core-shell structure quantum dot are respectively selected from at least one of a II-VI group compound, a IV-VI group compound, a III-V group compound and a I-III-VI group compound; and / or The hole injection material and the hole transport material include at least one of TFB, CuPc, PVK, Poly-TPD, PFB, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT:PSS, T·APC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-N-phenylamino)triphenylamine, polyaniline, transition metal oxides, transition metal sulfides, transition metal tin compounds, doped graphene, undoped graphene and C60 and / or; The material of the enhancement layer includes any one of silicon nitride, silicon oxide, styrene-methyl methacrylate copolymer, polystyrene, polydimethylsiloxane, phenolic resin, polyimide, styrene-acrylate copolymer or a combination thereof; and / or; The materials of the bottom electrode and the top electrode include one or more of metals, carbon materials and metal oxides, the metal includes one or more of Al, Ag, Cu, Mo, Au, Ba, Ca, Yb and Mg; the carbon material includes one or more of graphite, carbon nanotubes, graphene and carbon fiber; the metal oxide includes doped or undoped metal oxides, including one or more of ITO, FTO, ATO, AZO, GZO, IZO, MZO and AMO, or includes a composite bottom electrode in which a metal is arranged between doped or undoped transparent metal oxides, and the composite bottom electrode includes one or more of AZO / Ag / AZO, AZO / Al / AZO, ITO / Ag / ITO, ITO / Al / ITO, ZnO / Ag / ZnO, ZnO / Al / ZnO, ZnS / Ag / ZnS, ZnS / Al / ZnS, TiO2 / Ag / TiO2 and TiO2 / Al / TiO2.

11. A light-emitting panel, characterized in that: The light emitting panel comprises a substrate, a plurality of raised layers, a plurality of bottom electrodes, a pixel defining layer, at least one functional layer and a top electrode; The enhancement layer is disposed on the substrate, and the bottom electrode is disposed on the enhancement layer; The pixel definition layer surrounds the bottom electrode and covers at least a portion of the bottom electrode to form a pixel opening, wherein the pixel opening exposes at least a portion of the bottom electrode; The functional layer is arranged in the pixel opening.

12. The light emitting panel according to claim 11, characterized in that: The pixel opening gradually increases in a direction away from the bottom electrode.

13. The light emitting panel according to claim 11, characterized in that: The raised layer includes a first raised layer and a second raised layer, the bottom electrode includes a first bottom electrode, a second bottom electrode and a third bottom electrode, and the thickness of the first raised layer is greater than that of the second raised layer; and / or, The first bottom electrode, the second bottom electrode, and the third bottom electrode have the same thickness; and / or, The first bottom electrode is disposed on the first boosted layer, the second bottom electrode is disposed on the second boosted layer, and the third bottom electrode is disposed on the substrate; and / or, The thickness ratio of the first raised layer to the second raised layer is 0.1 to 1; and / or The functional layer includes a first functional layer disposed on the first bottom electrode, a second functional layer disposed on the second bottom electrode, and a third functional layer disposed on the third bottom electrode, and the thicknesses of the first functional layer, the second functional layer, and the third functional layer increase in sequence.

14. The light emitting panel according to claim 13, characterized in that: The raised layer further includes a third raised layer, the third bottom electrode is arranged on the third raised layer, and the thickness of the second raised layer is greater than that of the third raised layer; The thickness of the third increased layer is 0um to 1um; and / or, The thickness ratio of the first increased layer to the third increased layer is 0-1.

15. A display device, characterized in that: The display device comprises a light emitting panel as claimed in claims 11 to 14.

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