A dust-free photomask laser processing device

Abstract

The present invention relates to the field of laser processing technology, and in particular to a dust-free photomask laser processing device, comprising a mounting base, annular slide rails are fixedly connected to both sides of the top of the mounting base, a plurality of strip frames are arranged between the two annular slide rails, the strip frames are fixedly connected to clamping blocks, the two ends of the strip frames are fixedly connected to slide seats, and the slide seats are slidably connected to the corresponding annular slide rails; the present invention inverts and separates dust generated at the etching position by flipping the photomask, which is beneficial to fully cleaning the dust generated by the surface processing of the photomask, ensuring the use effect of the photomask after processing, and synchronously moving and pausing along the trajectory of the annular slide rail by the plurality of clamping blocks, reducing the influence of preparation work on the photomask processing, and effectively improving the continuous processing efficiency of the photomask.

Description

Technical Field

[0001] This invention relates to the field of laser processing technology, and in particular to a dust-free photomask laser processing device. Background Technology

[0002] A photomask is a pattern master used in photolithography, a common process in micro-nano fabrication technology. It consists of an opaque light-blocking film forming a mask pattern structure on a transparent substrate, and then the pattern information is transferred to the product substrate through an exposure process.

[0003] Patent document CN114178718A discloses a dust-free laser processing device and method for photomasks, including a processing platform on which a workpiece is placed. A laser processing head is also provided on the processing platform to process the workpiece. The processing platform is equipped with a dual-channel fixture that separates the laser cutting path channel and the photomask core area channel. The dual-channel fixture includes a fixture plate with a set of adsorption channels on the fixture plate. The adsorption channels are the laser cutting path channel and the photomask core area channel, and the laser cutting path channel and the photomask core area channel are connected to a dust collection system.

[0004] In existing technologies for manufacturing photomasks, a photolithography machine is typically used to etch a light-shielding film on the surface of the photomask to form a mask pattern structure. During the continuous processing of photomasks, operators need to remove the photomask from the fixture and clamp a new photomask to be processed only after the current photomask has been processed. This affects the efficiency of continuous processing. Furthermore, during the etching process, it is difficult to fully clean the dust generated at the etching location by simply adsorption and collection, which can easily reduce the subsequent use effect of the photomask. Summary of the Invention

[0005] The purpose of this invention is to address the shortcomings of existing technologies by proposing a dust-free photomask laser processing device.

[0006] To achieve the above objectives, the technical solution adopted by the present invention is as follows: a dust-free photomask laser processing device, comprising a mounting base, annular slide rails fixedly connected to both sides of the top of the mounting base, a plurality of strip frames arranged between two annular slide rails, clamping blocks fixedly connected to each strip frame, slide seats fixedly connected to both ends of each strip frame, each slide seat slidably connected to the corresponding annular slide rail, and a limit clamping mechanism connected to each clamping block;

[0007] A lithography head is provided above the two annular slide rails. A horizontal moving mechanism and a processing dust removal mechanism are connected to the lithography head. A liquid storage tank is fixedly connected to the top of the mounting base. The liquid storage tank is located below the two annular slide rails. A circulation flow mechanism is connected to the liquid storage tank.

[0008] Preferably, the limiting clamping mechanism includes two slide grooves, both of which are formed on the clamping block. Sliding blocks are slidably connected inside each slide groove. A U-shaped clamping strip is fixedly connected to the end of each sliding block away from the annular slide rail. Two corner baffles are fixedly connected to the side of each U-shaped clamping strip away from the clamping block. A movable mechanism is connected to the sliding block.

[0009] Preferably, the movable mechanism includes two annular grooves, both of which are fixedly connected to the top of the mounting base and located between the two annular slide rails. Each annular groove includes a clamping section and a separating section. A circular pin is fixedly connected to one end of each sliding block near the annular slide rail, and one end of each circular pin is located inside the corresponding annular groove.

[0010] Preferably, the horizontal moving mechanism includes a mounting frame, which is fixedly connected to the top of the mounting base. The lithography head is located inside the mounting frame. Two transverse slide rails are fixedly connected to the mounting frame, and transverse sliding sleeves are slidably connected to each of the transverse slide rails. A longitudinal slide rail is fixedly connected between the two transverse sliding sleeves, and a longitudinal sliding sleeve is slidably connected to the longitudinal slide rail. The longitudinal sliding sleeve is fixedly connected to the top of the lithography head.

[0011] Preferably, the processing dust removal mechanism includes a fan and a vacuum cleaner. The fan is fixedly mounted on the lithography head, and the air outlet of the fan is fixedly connected to an inclined air duct. The bottom end of the inclined air duct is inclined towards the lithography head. The vacuum cleaner is fixedly connected to the mounting frame, and the suction end of the vacuum cleaner is fixedly connected to an L-shaped pipe. One end of the L-shaped pipe is fixedly connected to a collection housing. The lithography head is located between the vacuum cleaner and the fan.

[0012] Preferably, the circulating flow mechanism includes a liquid pump, which is fixedly installed on the liquid storage tank. The inlet end of the liquid pump is fixedly connected to an inlet pipe, one end of which is fixedly connected to one end of the liquid storage tank. The outlet end of the liquid pump is fixedly connected to an outlet pipe, one end of which is fixedly connected to the other end of the liquid storage tank.

[0013] Preferably, two L-shaped baffles are fixedly connected to one end of the liquid storage tank, and a filter plate is provided between the two L-shaped baffles. The filter plate is located at the connection between the liquid storage tank and the liquid inlet pipe.

[0014] Preferably, an arc-shaped housing is fixedly connected to the top of the mounting base. The arc-shaped housing is located between one end of the two annular slide rails and above the connection between the liquid storage tank and the drain pipe. A dryer is fixedly installed on the arc-shaped housing.

[0015] Compared with the prior art, the present invention has the following beneficial effects:

[0016] 1. By flipping the photomask, the dust generated at the etching location is separated by inversion, which facilitates the thorough cleaning of dust generated during the processing of the photomask surface, ensuring the usability of the photomask after processing. Multiple clamping blocks move and pause synchronously along the trajectory of the annular slide rail, so that the etching, immersion cleaning and processing replacement of multiple photomasks can be carried out simultaneously, reducing the impact of preparation work on photomask processing and effectively improving the continuous processing efficiency of photomasks.

[0017] 2. The corner baffles limit and block the photomask from falling out between the two U-shaped clamping strips after it is flipped and inverted. After the photomask continues to move along the track of the annular slide rail to the initial position, the two U-shaped clamping strips move away from each other through the action of the movable mechanism, thereby releasing the clamping and positioning of the photomask and making it easier for the staff to replace the photomask.

[0018] 3. The circular pin moves from the separation section to the clamping section, thereby guiding and limiting the U-shaped clamping strips on both sides of the photomask to move closer to each other and clamp and fix the photomask. After the clamping block moves one revolution along the track of the annular slide rail and returns to the initial position, the circular pin returns to the separation section, causing the two U-shaped clamping strips to move away from each other and releasing the clamping and fixing of the photomask.

[0019] 4. By tilting the air duct towards the photolithography head, the bottom of the tilted air duct continuously and centrally blows air onto the etching area of ​​the photomask surface. This quickly blows away the dust generated on the etching area, reducing the impact of dust accumulation on etching accuracy. During the dust removal process by the tilted air duct, the suction end of the vacuum cleaner generates negative pressure, causing the collection housing to absorb the dust blown from the tilted air duct and collect it inside the vacuum cleaner along the L-shaped pipe. This reduces the scattering of etching dust, and the concentrated airflow from the tilted air duct further reduces dust accumulation at the etching area, improving the processing effect of the photolithography head on the photomask.

[0020] 5. The cleaning solution inside the storage tank is propelled by a liquid pump to flow from one end of the storage tank into the inlet pipe, and then into the pump before being transported to the outlet pipe. Finally, it moves along the outlet pipe to the other end of the storage tank and re-enters the tank. This unidirectional flow of the cleaning solution inside the storage tank, with the flow direction opposite to that of the photomask after it enters the tank, ensures that the cleaning solution makes full contact with the photomask surface during the flow process and improves the cleaning effect on the photomask surface. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the first structure of the present invention;

[0022] Figure 2 For the present invention Figure 1 Enlarged schematic diagram of the structure at point A in the diagram;

[0023] Figure 3 For the present invention Figure 1 Enlarged schematic diagram of the structure at point B in the diagram;

[0024] Figure 4 This is a schematic diagram of the second structure of the present invention;

[0025] Figure 5 For the present invention Figure 4 Enlarged schematic diagram of the structure at point C;

[0026] Figure 6 This is a schematic diagram of the assembly structure of the liquid storage tank, liquid pump and filter plate of the present invention;

[0027] Figure 7 For the present invention Figure 6 A magnified schematic diagram of the structure at point D in the diagram.

[0028] In the diagram: 1. Mounting base; 2. Annular slide rail; 3. Strip frame; 4. Clamping block; 5. Slide seat; 6. Lithography head; 7. Liquid storage tank; 8. Slide groove; 9. Sliding block; 10. U-shaped clamping strip; 11. Corner baffle; 12. Annular groove rail; 1201. Clamping section; 1202. Separation section; 13. Circular pin; 14. Mounting bracket; 15. Transverse slide rail; 16. Transverse sliding sleeve; 17. Longitudinal slide rail; 18. Longitudinal sliding sleeve; 19. Fan; 20. Vacuum cleaner; 21. Inclined air duct; 22. L-shaped pipe; 23. Collection shell; 24. Liquid pump; 25. Liquid inlet pipe; 26. Liquid outlet pipe; 27. L-shaped baffle; 28. Filter plate; 29. ​​Arc-shaped shell; 30. Dryer. Detailed Implementation

[0029] The following description is intended to disclose the invention and enable those skilled in the art to implement it. The preferred embodiments described below are merely examples, and other obvious variations will occur to those skilled in the art.

[0030] like Figures 1 to 7 The dust-free photomask laser processing device shown includes a mounting base 1. Both sides of the top of the mounting base 1 are fixedly connected to annular slide rails 2. Multiple strip frames 3 are arranged between the two annular slide rails 2. Clamping blocks 4 are fixedly connected to each strip frame 3. Slide seats 5 are fixedly connected to both ends of each strip frame 3. The slide seats 5 are slidably connected to the corresponding annular slide rails 2. Limit clamping mechanisms are connected to each clamping block 4.

[0031] A lithography head 6 is mounted above two annular slide rails 2. A horizontal moving mechanism and a dust removal mechanism are connected to the lithography head 6. A liquid storage tank 7 is fixedly connected to the top of the mounting base 1, located below the two annular slide rails 2. A circulation flow mechanism is connected to the liquid storage tank 7. During operation, in existing technologies, when manufacturing photomasks, a lithography machine is typically used to etch the light-shielding film on the surface of the photomask to form a mask pattern structure. During continuous processing of the photomask, the operator must wait until the photomask is finished before removing it from the fixture and preparing a new photomask for processing. Clamping the photomask affects the continuous processing efficiency of the photomask. Furthermore, during the etching process, simply using adsorption to collect dust from the etching location is insufficient to adequately clean it, potentially reducing the photomask's subsequent usability. This technical solution addresses these issues. The specific operation is as follows: The photomask to be processed is placed on the surface of the clamping block 4 and clamped by a limiting clamping mechanism. Then, two corresponding slide blocks 5 slide on the annular slide rail 2, causing the corresponding strip frame 3 to move, thereby synchronizing the clamping block 4 with the photomask to be processed. After the photomask is moved below the photolithography head 6, the corresponding slide 5 pauses its movement. The photolithography head 6 then moves horizontally via a horizontal moving mechanism to etch the light-shielding film on the photomask surface, forming a mask pattern structure. During the etching process, a dust removal mechanism initially cleans and collects the etching dust generated on the photomask surface, reducing the impact of etching dust on the photolithography process. After etching, the slide 5 continues to slide the etched photomask downwards between the two annular slide rails 2, allowing the photomask to be etched further. After the surface of the photomask is flipped, it is immersed in the cleaning solution inside the storage tank 7. The cleaning solution is used to immerse and clean the surface of the etched photomask. The flipping of the photomask also causes the dust generated at the etching location to be separated by inversion, which is beneficial to the thorough cleaning of the dust generated during the processing of the photomask surface. This ensures the usability of the photomask after processing. Multiple clamping blocks 4 move and pause synchronously along the trajectory of the annular slide rail 2, so that the etching, immersion cleaning and processing replacement of multiple photomasks can be carried out simultaneously. This reduces the impact of preparation work on the photomask processing and effectively improves the continuous processing efficiency of the photomask.

[0032] As a further embodiment of the present invention, the limiting clamping mechanism includes two sliding grooves 8, both of which are formed on the clamping block 4. Sliding blocks 9 are slidably connected inside each of the sliding grooves 8. A U-shaped clamping strip 10 is fixedly connected to the end of each sliding block 9 away from the annular slide rail 2. Two corner baffles 11 are fixedly connected to the side of the U-shaped clamping strip 10 away from the clamping block 4. A movable mechanism is connected to the sliding block 9. During operation, the photomask is placed between the two U-shaped clamping strips 10 and positioned on top of the corresponding clamping block 4. The clamping block 4 moves along the trajectory of the annular slide rail 2 towards the photolithography head 6 by sliding the sliding base 5 on the annular slide rail 2. During this movement, the movable mechanism... The two sliding blocks 9 slide in the corresponding grooves 8, thereby bringing the two U-shaped clamping bars 10 closer together and clamping the photomask. This clamps and fixes the photomask below the lithography head 6 before etching. After etching, the photomask continues to flip and move along the track of the annular slide rail 2 into the liquid storage tank 7. The corner baffles 11 limit and prevent the photomask from falling off between the two U-shaped clamping bars 10 after flipping and inverting. After the photomask continues to move along the track of the annular slide rail 2 to the initial position, the two U-shaped clamping bars 10 move away from each other through the action of the movable mechanism, thereby releasing the clamping and positioning of the photomask and facilitating the replacement of the photomask by the operator.

[0033] As a further embodiment of the present invention, the movable mechanism includes two annular grooves 12, both of which are fixedly connected to the top of the mounting base 1 and located between the two annular slide rails 2. Each annular groove 12 includes a clamping section 1201 and a separating section 1202. A circular pin 13 is fixedly connected to one end of each sliding block 9 near the annular slide rail 2, with one end of each circular pin 13 located inside the corresponding annular groove 12. During operation, when both circular pins 13 are located in the separating section 1202 of the corresponding annular groove 12, the two sliding blocks 9 move away from each other, thereby causing the two U-shaped clamping strips 10 to move away from each other. This allows the operator to pick up and place the photomask. As the clamping block 4 moves along the track of the annular slide rail 2 toward the lithography head 6, the circular pin 13 moves from the separation section 1202 to the clamping section 1201. Under the guiding and limiting action of the clamping section 1201, the U-shaped clamping strips 10 on both sides of the photomask move closer to each other and clamp and fix the photomask. After the clamping block 4 moves one revolution along the track of the annular slide rail 2 and returns to the initial position, the circular pin 13 returns to the separation section 1202, causing the two U-shaped clamping strips 10 to move away from each other and releasing the clamping and fixing of the photomask.

[0034] As a further embodiment of the present invention, the horizontal moving mechanism includes a mounting frame 14, which is fixedly connected to the top of the mounting base 1. The lithography head 6 is located inside the mounting frame 14. Two transverse slide rails 15 are fixedly connected to the mounting frame 14. A transverse sliding sleeve 16 is slidably connected to each transverse slide rail 15. A longitudinal slide rail 17 is fixedly connected between the two transverse sliding sleeves 16. A longitudinal sliding sleeve 18 is slidably connected to the longitudinal slide rail 17. The longitudinal sliding sleeve 18 is fixedly connected to the top of the lithography head 6. During operation, the longitudinal sliding sleeve 18 slides along the longitudinal slide rail 17, thereby driving the lithography head 6 to move longitudinally. The two transverse sliding sleeves 16 slide synchronously along the corresponding transverse slide rails 15, thereby driving the longitudinal slide rails 17 to move laterally, causing the lithography head 6 to move laterally. Through the cooperation of the transverse and longitudinal movements, the lithography head 6 moves along a corresponding horizontal trajectory in the horizontal direction.

[0035] As a further embodiment of the present invention, the processing dust removal mechanism includes a fan 19 and a vacuum cleaner 20. The fan 19 is fixedly mounted on the lithography head 6, and the air outlet of the fan 19 is fixedly connected to an inclined air duct 21. The bottom end of the inclined air duct 21 is inclined towards the lithography head 6. The vacuum cleaner 20 is fixedly connected to the mounting bracket 14, and the suction end of the vacuum cleaner 20 is fixedly connected to an L-shaped pipe 22. One end of the L-shaped pipe 22 is fixedly connected to a collection housing 23. The lithography head 6 is located between the vacuum cleaner 20 and the fan 19. During operation, when the clamping block 4 moves below the lithography head 6 and positions the photomask between the corresponding clamping block 4 and the lithography head 6, with the collection housing 23 located on one side of the photomask, the lithography head 6 etches the light-shielding film on the surface of the photomask. During the etching process, the dust is removed by... The function of the fan 19 is to continuously exhaust air outward from the bottom end of the inclined air duct 21, and to tilt the inclined air duct 21 towards the photolithography head 6, so that the bottom end of the inclined air duct 21 continuously and centrally blows air onto the etching position on the photomask surface, so that the dust generated on the surface of the etching position is quickly blown away, reducing the impact of dust accumulation on the etching accuracy. During the process of the inclined air duct 21 blowing away the dust at the etching position, the suction end of the vacuum cleaner 20 generates negative pressure, so that the collection housing 23 adsorbs the dust blown from the direction of the inclined air duct 21 and collects it inside the vacuum cleaner 20 along the L-shaped pipe 22, reducing the scattering of etching dust. The concentrated air force of the inclined air duct 21 reduces the dust accumulation at the etching position and improves the processing effect of the photolithography head 6 on the photomask.

[0036] As a further embodiment of the present invention, the circulating flow mechanism includes a liquid pump 24, which is fixedly installed on the liquid storage tank 7. The inlet end of the liquid pump 24 is fixedly connected to an inlet pipe 25, one end of which is fixedly connected to one end of the liquid storage tank 7. The outlet end of the liquid pump 24 is fixedly connected to a outlet pipe 26, one end of which is fixedly connected to the other end of the liquid storage tank 7. During operation, the liquid pump 24 causes the cleaning liquid inside the liquid storage tank 7 to flow along one end of the liquid storage tank 7 towards the inlet end. The cleaning fluid flows in the liquid pipe 25 and, after entering the liquid pump 24, is delivered to the drain pipe 26. Finally, it moves along the drain pipe 26 to the other end of the storage tank 7 and re-enters the storage tank 7, thereby enabling the cleaning fluid inside the storage tank 7 to flow in one direction. The flow direction of the cleaning fluid inside the storage tank 7 is opposite to the movement direction of the photomask after it enters the storage tank 7, so that the cleaning fluid can fully contact the surface of the photomask during the flow process and improve the cleaning effect on the surface of the photomask during the flow process.

[0037] As a further embodiment of the present invention, two L-shaped baffles 27 are fixedly connected to one end of the interior of the liquid storage tank 7 (e.g., ...). Figure 7 As shown, a filter plate 28 is provided between the two L-shaped baffles 27. The filter plate 28 is located at the connection between the liquid storage tank 7 and the liquid inlet pipe 25. During operation, by setting the filter plate 28 at the connection between the liquid storage tank 7 and the liquid inlet pipe 25, the dust in the cleaning fluid is reduced from entering the liquid pump 24 along the flow direction, thus reducing the impact on the operation of the liquid pump 24. The flow of the cleaning fluid also filters and blocks the dust on one side of the filter plate 28, which is beneficial for the staff to clean the dust in a concentrated manner. The L-shaped baffles 27 limit and lock the filter plate 28, making it easy to remove and maintain or replace the filter plate 28.

[0038] As a further embodiment of the present invention, an arc-shaped housing 29 is fixedly connected to the top of the mounting base 1 (e.g., Figure 1 As shown, the arc-shaped housing 29 is located between one end of the two annular slide rails 2. The arc-shaped housing 29 is located above the connection between the liquid storage tank 7 and the drain pipe 26. A dryer 30 is fixedly installed on the arc-shaped housing 29. During operation, when the photomask is cleaned inside the liquid storage tank 7 and returns to its initial position with the corresponding clamping block 4, the photomask and the corresponding clamping block 4 pass through the arc-shaped opening of the arc-shaped housing 29. The dryer 30 dries the surface of the photomask and the corresponding clamping block 4, reducing the impact of residual droplets on the surface of the clamping block 4 on subsequent photomask processing.

[0039] Working principle of this invention:

[0040] The photomask to be processed is placed on the surface of the clamping block 4 and clamped by the limiting clamping mechanism. Then, the corresponding two slide blocks 5 slide on the annular slide rail 2, causing the corresponding strip frame 3 to move. This moves the corresponding clamping block 4 synchronously with the photomask. After the photomask moves below the lithography head 6, the corresponding slide blocks 5 stop moving, and the lithography head 6 moves horizontally through the horizontal moving mechanism to etch the light-shielding film on the surface of the photomask, thus forming the mask pattern structure. While the lithography head 6 is etching the photomask, a processing dust removal mechanism initially cleans and collects the dust generated during etching, thereby reducing the impact of etching dust on the photolithography process. After completion, the etched photomask continues to move downwards between the two annular slide rails 2 by sliding the slide block 5. The etched surface of the photomask is flipped over and immersed in the cleaning solution inside the storage tank 7. The cleaning solution is used to immerse and clean the surface of the etched photomask. The flipping of the photomask also separates the dust generated at the etching location, which is beneficial for thoroughly cleaning the dust generated during the processing of the photomask surface and ensuring the usability of the photomask after processing. Multiple clamping blocks 4 move and pause synchronously along the trajectory of the annular slide rails 2, so that the etching, immersion cleaning and processing replacement of multiple photomasks can be carried out simultaneously, reducing the impact of preparation work on photomask processing and effectively improving the continuous processing efficiency of photomasks.

[0041] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely principles of the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claims. The scope of protection claimed by the appended claims and their equivalents is defined.

Claims

1. A dust-free photomask laser processing device, comprising a mounting base (1), characterized in that, Both sides of the top of the mounting base (1) are fixedly connected to annular slide rails (2), and multiple strip frames (3) are provided between the two annular slide rails (2). Each strip frame (3) is fixedly connected to a clamping block (4), and each end of the strip frame (3) is fixedly connected to a slide seat (5). Each slide seat (5) is slidably connected to the corresponding annular slide rail (2), and each clamping block (4) is connected to a limit clamping mechanism. A lithography head (6) is provided above the two annular slide rails (2). A horizontal moving mechanism and a processing dust removal mechanism are connected to the lithography head (6). A liquid storage tank (7) is fixedly connected to the top of the mounting base (1). The liquid storage tank (7) is located below the two annular slide rails (2). A circulation flow mechanism is connected to the liquid storage tank (7). The photomask etched by the photolithography head (6) is moved downward between the two annular slide rails (2), and the etched surface of the photomask is flipped over and immersed in the liquid storage tank (7) for cleaning. The limiting clamping mechanism includes two slide grooves (8), both of which are opened on the clamping block (4). Sliding blocks (9) are slidably connected inside each slide groove (8). A U-shaped clamping strip (10) is fixedly connected to one end of each sliding block (9) away from the annular slide rail (2). Two corner baffles (11) are fixedly connected to one side of each U-shaped clamping strip (10) away from the clamping block (4). An active mechanism is connected to the sliding block (9). The movable mechanism includes two annular grooves (12), both of which are fixedly connected to the top of the mounting base (1) and located between the two annular slide rails (2). The annular groove (12) includes a clamping section (1201) and a separating section (1202). The sliding block (9) is fixedly connected to a circular pin (13) at one end near the annular slide rail (2), and one end of the circular pin (13) is located inside the corresponding annular groove (12). The circular pin (13) moves from the separation section (1202) to the clamping section (1201), and the U-shaped clamping strips (10) on both sides move away from each other to move closer to each other to clamp and fix the photomask.

2. The dust-free photomask laser processing device according to claim 1, characterized in that, The horizontal moving mechanism includes a mounting frame (14), which is fixedly connected to the top of the mounting base (1). The lithography head (6) is located inside the mounting frame (14). Two transverse slide rails (15) are fixedly connected to the mounting frame (14). A transverse sliding sleeve (16) is slidably connected to each of the transverse slide rails (15). A longitudinal slide rail (17) is fixedly connected between the two transverse sliding sleeves (16). A longitudinal sliding sleeve (18) is slidably connected to the longitudinal slide rail (17). The longitudinal sliding sleeve (18) is fixedly connected to the top of the lithography head (6).

3. The dust-free photomask laser processing device according to claim 2, characterized in that, The dust removal mechanism includes a fan (19) and a vacuum cleaner (20). The fan (19) is fixedly installed on the lithography head (6). The air outlet of the fan (19) is fixedly connected to an inclined air duct (21). The bottom end of the inclined air duct (21) is inclined towards the lithography head (6). The vacuum cleaner (20) is fixedly connected to the mounting bracket (14). The suction end of the vacuum cleaner (20) is fixedly connected to an L-shaped pipe (22). One end of the L-shaped pipe (22) is fixedly connected to a collection housing (23). The lithography head (6) is located between the vacuum cleaner (20) and the fan (19).

4. The dust-free photomask laser processing device according to claim 1, characterized in that, The circulating flow mechanism includes a liquid pump (24), which is fixedly installed on the liquid storage tank (7). The inlet end of the liquid pump (24) is fixedly connected to an inlet pipe (25), one end of the inlet pipe (25) is fixedly connected to one end of the liquid storage tank (7), and the outlet end of the liquid pump (24) is fixedly connected to an outlet pipe (26), one end of the outlet pipe (26) is fixedly connected to the other end of the liquid storage tank (7).

5. The dust-free photomask laser processing device according to claim 4, characterized in that, Two L-shaped baffles (27) are fixedly connected to one end of the liquid storage tank (7), and a filter plate (28) is provided between the two L-shaped baffles (27). The filter plate (28) is located at the connection between the liquid storage tank (7) and the liquid inlet pipe (25).

6. The dust-free photomask laser processing apparatus according to claim 4, characterized in that, The top of the mounting base (1) is fixedly connected to an arc-shaped housing (29), which is located between one end of the two annular slide rails (2). The arc-shaped housing (29) is located above the connection between the liquid storage tank (7) and the drain pipe (26). A dryer (30) is fixedly installed on the arc-shaped housing (29).

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