Automatic liquid changing mode for cleaning machine table

Abstract

The invention discloses an automatic liquid changing mode of a cleaning machine table, and relates to the technical field of solar photovoltaic cell production, which comprises the following steps of: additionally arranging a tank cover hot spray backwashing device on a tank cover body in the cleaning machine table, and modifying an automatic liquid changing program of the cleaning machine table; when the service life of the cleaning liquid of the cleaning machine reaches a set number of times, a new automatic liquid changing program is automatically executed; according to the invention, the tank cover thermal spraying backwashing device is additionally arranged on the tank cover body, whether the silicon wafer basket exists in the working tank or not is judged according to the sensing data of the sensor in the working tank obtained by the host of the cleaning machine table, and the tank cover thermal spraying backwashing device starts to run to clean the tank cover body when no silicon wafer basket exists in the working tank; and then an automatic liquid discharging instruction and a new cleaning liquid filling instruction of the cleaning machine table are operated, so that when the cleaning machine table changes liquid, a safety door does not need to be opened, hot water is introduced for flushing the tank cover body, the hot water scalding danger is avoided, and the liquid changing operation does not need to be carried out after all working tanks finish working.

Description

Technical Field

[0001] The invention relates to the technical field of solar photovoltaic cell production, and in particular to an automatic liquid changing method for a cleaning machine. Background Art

[0002] Cleaning machines are divided into physical cleaning methods and chemical cleaning methods according to different cleaning technologies. Cleaning machines using chemical cleaning methods use acid or alkaline cleaning solutions to remove impurities on the surface of silicon wafers.

[0003] At present, in the prior art, the cleaning liquid in each working tank of the cleaning machine using the chemical cleaning method needs to be replaced after reaching the set number of cleaning times to ensure the operation quality of the cleaning machine. Some working tanks in the cleaning machine have tank covers on the top to prevent chemical volatilization and excessive temperature loss of the liquid, and alkali crystals and chemical residues are easy to form on the tank cover, so the tank cover needs to be cleaned before changing the liquid. The existing method for changing the liquid of the cleaning machine is: open the safety door, connect the external hot water pipe to the water inlet on the working tank to rinse the alkali crystals on the tank cover, and the hot water in the hot water pipe will cause the water pipe to soften and easily fall off from the water inlet, which will scald the operator and cause safety hazards. At the same time, in the method for changing the liquid of the cleaning machine in the prior art, the liquid change operation needs to be carried out when all the working tanks stop working, which makes the liquid change cycle long and is not conducive to production. Therefore, the present invention proposes an automatic liquid change method for the cleaning machine to solve the shortcomings of the prior art. Summary of the invention

[0004] In view of the above problems, the purpose of the present invention is to provide an automatic liquid changing method for a cleaning machine. When changing the liquid in the cleaning machine, there is no need to open the safety door to connect hot water to rinse the tank cover body, thereby avoiding the risk of scalding by hot water. The liquid changing operation does not need to be performed after all working tanks are finished, which can greatly shorten the liquid changing operation time and improve the working efficiency of the cleaning machine.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] A method for automatically changing liquid in a cleaning machine comprises the following steps:

[0007] Step 1: Install a tank cover hot spray backwashing device on the tank cover body inside the cleaning machine;

[0008] Step 2: Modify the automatic liquid replacement program of the cleaning machine. When the cleaning liquid life of the cleaning machine reaches the set number of times, the new automatic liquid replacement program is automatically executed. The new automatic liquid replacement program is:

[0009] T1: The host of the cleaning machine obtains the sensing data of the sensor inside the working tank and determines whether there is a silicon wafer basket in the working tank;

[0010] T2: When there is no silicon wafer basket in the working tank, the tank cover hot spray backwash device starts to operate;

[0011] T3: When the tank cover hot spray backwash device is started, the automatic drain command of the cleaning machine is run;

[0012] T4: After the automatic draining is completed, the command of adding new cleaning fluid is executed.

[0013] A further improvement is that ten working grooves are arranged inside the cleaning machine, namely the first working groove, the second working groove, the third working groove, the fourth working groove, the fifth working groove, the sixth working groove, the seventh working groove, the eighth working groove, the ninth working groove and the tenth working groove, and a first opening and a second opening are arranged at both ends of the cleaning machine, a feeding platform is arranged inside the first opening, and a discharging platform is arranged inside the second opening.

[0014] A further improvement is that the first working tank, the second working tank, the third working tank, the fourth working tank, the fifth working tank, the sixth working tank, the seventh working tank, the eighth working tank, the ninth working tank and the tenth working tank are respectively a front cleaning tank, a first pure water tank, a texturing tank, a second pure water tank, a post-cleaning tank, a third pure water tank, an acid tank, a fourth pure water tank, a slow pulling tank and a drying tank.

[0015] A further improvement is that an electromagnetic moving track is provided at the upper rear side of the interior of the cleaning machine, and a moving mechanical arm is provided on the electromagnetic moving track.

[0016] A further improvement is that the mobile mechanical arm includes a mounting seat, a lifting cylinder and an automatic hook, the mounting seat is slidably connected to the electromagnetic moving track, the mounting seat is provided with a lifting cylinder, and the output end of the lifting cylinder is provided with an automatic hook.

[0017] A further improvement is that openings are provided on the cleaning machines at the front sides of the ten working tanks, and safety doors are provided at the openings. The safety doors are movably connected to the upper front side of the cleaning machines to realize opening and closing.

[0018] A further improvement is that the tank cover hot spray backwashing device includes a bracket, a flushing nozzle and a hot water pipe, the bracket is symmetrically arranged, the hot water pipe is rotatably arranged between two groups of brackets, the flushing nozzles are arranged in multiple groups, and the multiple groups of flushing nozzles are all arranged at the bottom of the hot water pipe and connected to the hot water pipe.

[0019] A further improvement is that the hot water pipe is driven to rotate by a motor, and one end of the hot water pipe is connected to an external hot water supply pipe through a sealed bearing.

[0020] A further improvement is that in step T1 of step three, when the host of the cleaning machine obtains the sensing data of the sensor inside the working tank, the sensing data of the sensor is obtained starting from the first working tank of the cleaning machine.

[0021] The beneficial effects of the present invention are as follows: the present invention adds a tank cover hot spray backwashing device to the tank cover body, modifies the liquid changing program of the cleaning machine, obtains the sensing data of the sensor inside the working tank according to the host of the cleaning machine to determine whether there is a silicon wafer basket in the working tank, and starts to run the tank cover hot spray backwashing device to clean the tank cover body when there is no silicon wafer basket in the working tank, and then runs the automatic liquid discharge instruction and new cleaning liquid filling instruction of the cleaning machine, so that when the cleaning machine of the present invention changes the liquid, there is no need to open the safety door to connect hot water to flush the tank cover body, thereby avoiding the risk of scalding by hot water, and the liquid changing operation does not need to be performed after all the working tanks are finished, which can greatly shorten the liquid changing operation time and improve the working efficiency of the cleaning machine. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a schematic diagram of the process of the present invention;

[0023] Figure 2 It is a three-dimensional schematic diagram of the cleaning machine structure in the method of the present invention;

[0024] Figure 3 It is a three-dimensional schematic diagram of the installation structure of the feed station and the discharge station in the method of the present invention;

[0025] Figure 4 It is a three-dimensional schematic diagram of the installation structure of the mobile mechanical arm in the method of the present invention;

[0026] Figure 5 It is a three-dimensional schematic diagram of the installation structure of the tank cover hot spray backwashing device in the method of the present invention;

[0027] Figure 6 It is a three-dimensional schematic diagram of the structure of the tank cover hot spray backwashing device in the method of the present invention.

[0028] Among them: 1. cleaning machine; 2. first working tank; 3. second working tank; 4. third working tank; 5. fourth working tank; 6. fifth working tank; 7. sixth working tank; 8. seventh working tank; 9. eighth working tank; 10. ninth working tank; 11. tenth working tank; 12. first opening; 13. second opening; 14. feeding table; 15. discharging table; 16. electromagnetic moving track; 17. moving robot arm; 18. safety door; 19. bracket; 1901, frame; 1902, rotating shaft; 20. flushing nozzle; 21. hot water pipe; 22. sensor; 23. tank cover body. DETAILED DESCRIPTION

[0029] In order to deepen the understanding of the present invention, the present invention will be further described in detail below in conjunction with examples. The examples are only used to explain the present invention and do not constitute a limitation on the protection scope of the present invention.

[0030] according to Figure 1-6 As shown, the present embodiment proposes an automatic liquid changing method for a cleaning machine, wherein: ten working tanks are arranged inside the cleaning machine 1, namely the first working tank 2, the second working tank 3, the third working tank 4, the fourth working tank 5, the fifth working tank 6, the sixth working tank 7, the seventh working tank 8, the eighth working tank 9, the ninth working tank 10 and the tenth working tank 11, and first openings 12 and second openings 13 are arranged at both ends of the cleaning machine 1, a feeding platform 14 is arranged inside the first opening 12, and a discharging platform 15 is arranged inside the second opening 13.

[0031] The first working tank 2, the second working tank 3, the third working tank 4, the fourth working tank 5, the fifth working tank 6, the sixth working tank 7, the seventh working tank 8, the eighth working tank 9, the ninth working tank 10 and the tenth working tank 11 are respectively a front cleaning tank (H2O2, NaOH, pure water), a first pure water tank (pure water), a texturing tank (additives, NaOH, pure water), a second pure water tank (pure water), a post-cleaning tank (H2O2, NaOH, pure water), a third pure water tank (pure water), an acid tank (HF, HCL, pure water), a fourth pure water tank (pure water), a slow pulling tank (pure water) and a drying tank (to dry the water on the battery silicon wafer).

[0032] An electromagnetic moving track 16 is provided at the upper rear side of the interior of the cleaning machine 1, and a mobile mechanical arm 17 is provided on the electromagnetic moving track 16. The mobile mechanical arm 17 includes a mounting seat, a lifting cylinder and an automatic hook. The mounting seat is slidably connected to the electromagnetic moving track 16, and a lifting cylinder is provided on the mounting seat. An automatic hook is provided at the output end of the lifting cylinder. The mobile mechanical arm 17 of the present invention is composed of a mounting seat, a lifting cylinder and an automatic hook. The lifting cylinder extends to drive the automatic hook to descend. After the automatic hook moves, it hooks the silicon wafer basket, and then the cylinder resets, and the mounting seat moves on the electromagnetic moving track 16 to transport the silicon wafer basket to the next working tank.

[0033] The front sides of the ten working slots on the front of the cleaning machine 1 are all provided with openings, and the openings are provided with safety doors 18, and the safety doors 18 are movably connected to the upper front of the cleaning machine 1 to realize opening and closing.

[0034] The steps for automatic liquid replacement in the cleaning machine are as follows:

[0035] Step 1: Install a tank cover hot spray backwashing device on the tank cover body 23 inside the cleaning machine;

[0036] Step 2: Modify the automatic liquid replacement program of the cleaning machine. When the cleaning liquid life of the cleaning machine reaches the set number of times, the new automatic liquid replacement program is automatically executed. The new automatic liquid replacement program is:

[0037] T1: The host of the cleaning machine obtains the sensing data of the sensor 22 inside the working tank to determine whether there is a silicon wafer basket in the working tank;

[0038] T2: When there is no silicon wafer basket in the working tank, the tank cover hot spray backwash device starts to operate;

[0039] T3: When the tank cover hot spray backwash device is started, the automatic drain command of the cleaning machine is run;

[0040] T4: After the automatic draining is completed, the command of adding new cleaning fluid is executed.

[0041] The tank cover hot spray backwashing device includes a bracket 19, a flushing nozzle 20 and a hot water pipe 21. The bracket 19 is symmetrically arranged. The hot water pipe 21 is rotatably arranged between two groups of brackets 19. The flushing nozzle 20 is arranged in multiple groups. The multiple groups of flushing nozzles 20 are all arranged at the bottom of the hot water pipe 21 and connected to the hot water pipe 21. The hot water pipe 21 is driven to rotate by a motor, and one end of the hot water pipe 21 is connected to an external hot water supply pipe through a sealed bearing. The hot water pipe 21 of the present invention can be driven to rotate by a motor, and then the flushing nozzle 20 can be driven to swing back and forth to flush the surface of the tank cover body 23. When flushing the tank cover body 23, the tank cover body 23 is in a closed state.

[0042] When the cleaning machine of the present invention automatically changes the liquid, the life of the cleaning liquid of the cleaning machine 1 reaches the set number of times (according to the operation sequence, the cleaning liquid in the first working tank 2 expires first and needs to be changed), and when the current silicon wafer basket enters the second working tank 3, the sensor 22 in the first working tank 2 is first used to sense whether there is a silicon wafer basket in the first working tank 2. When the sensing result shows that there is no silicon wafer basket, the tank cover hot spray backwashing device can be started, and the tank cover body 23 on the first working tank 2 is washed by the tank cover hot spray backwashing device, and the cleaning machine 1 is also controlled to control the cleaning machine 1 to clean the tank cover body 23. The control software is used to control the cleaning machine 1 to execute the automatic liquid discharge instruction, and finally execute the instruction to add new cleaning liquid. After the liquid change of the first working tank 2 is completed, the liquid change operation of the second working tank 3 is carried out. As in the above steps, the silicon wafer basket enters the working tank at the next position at this time, and the steps are repeated to realize the liquid change of the first nine working tanks in sequence (in this process, the automatic liquid discharge instruction can be directly executed in the working tank of the tank cover body 23, and then the instruction to add new cleaning liquid is executed). Finally, when the silicon wafer basket enters the discharge table 15, the liquid of the last working tank (the tenth working tank 11) is changed. In this process, there is no need to wait for all ten working tanks to stop working before changing the liquid, which can save time.

[0043] The present invention installs a tank cover hot spray backwashing device on the tank cover body 23, modifies the liquid changing program of the cleaning machine, obtains the sensing data of the sensor 22 inside the working tank according to the host of the cleaning machine, judges whether there is a silicon wafer basket in the working tank, and starts to run the tank cover hot spray backwashing device to clean the tank cover body 23 when there is no silicon wafer basket in the working tank, and then runs the automatic liquid discharge instruction and new cleaning liquid filling instruction of the cleaning machine, so that when the cleaning machine of the present invention changes the liquid, there is no need to open the safety door to connect hot water to flush the tank cover body 23, thereby avoiding the risk of scalding by hot water, and the liquid changing operation does not need to be performed after all the working tanks are finished, which can greatly shorten the liquid changing operation time and improve the working efficiency of the cleaning machine.

[0044] The above shows and describes the basic principles, main features and advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for explaining the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. A method for automatically changing liquid in a cleaning machine, characterized in that: The following steps are involved: Step 1: Install a tank cover hot spray backwashing device on the tank cover body inside the cleaning machine; Step 2: Modify the automatic liquid replacement program of the cleaning machine. When the cleaning liquid life of the cleaning machine reaches the set number of times, the new automatic liquid replacement program is automatically executed. The new automatic liquid replacement program is: T1: The host of the cleaning machine obtains the sensing data of the sensor inside the working tank and determines whether there is a silicon wafer basket in the working tank; T2: When there is no silicon wafer basket in the working tank, the tank cover hot spray backwash device starts to operate; T3: When the tank cover hot spray backwash device is started, the automatic drain command of the cleaning machine is run; T4: After the automatic draining is completed, the command of adding new cleaning fluid is executed.

2. The automatic liquid replacement method for a cleaning machine according to claim 1, characterized in that: Ten working slots are arranged inside the cleaning machine, namely the first working slot, the second working slot, the third working slot, the fourth working slot, the fifth working slot, the sixth working slot, the seventh working slot, the eighth working slot, the ninth working slot and the tenth working slot. A first opening and a second opening are arranged at both ends of the cleaning machine, respectively. A feeding platform is arranged inside the first opening, and a discharging platform is arranged inside the second opening.

3. The automatic liquid replacement method for a cleaning machine according to claim 2, characterized in that: The first working tank, the second working tank, the third working tank, the fourth working tank, the fifth working tank, the sixth working tank, the seventh working tank, the eighth working tank, the ninth working tank and the tenth working tank are respectively a front cleaning tank, a first pure water tank, a texturing tank, a second pure water tank, a rear cleaning tank, a third pure water tank, an acid tank, a fourth pure water tank, a slow pulling tank and a drying tank.

4. The automatic liquid replacement method for a cleaning machine according to claim 1, characterized in that: An electromagnetic moving track is arranged at the upper rear side of the interior of the cleaning machine, and a moving mechanical arm is arranged on the electromagnetic moving track.

5. The automatic liquid replacement method for a cleaning machine according to claim 4, characterized in that: The mobile mechanical arm comprises a mounting seat, a lifting cylinder and an automatic hook. The mounting seat is slidably connected to an electromagnetic movable track. The mounting seat is provided with a lifting cylinder, and an automatic hook is provided at the output end of the lifting cylinder.

6. The automatic liquid replacement method for a cleaning machine according to claim 2, characterized in that: The cleaning machines at the front sides of the ten working tanks are all provided with openings, and the openings are provided with safety doors, which are movably connected to the upper front side of the cleaning machines to realize opening and closing.

7. The automatic liquid replacement method for a cleaning machine according to claim 1, characterized in that: The tank cover hot spray backwashing device includes a bracket, a flushing nozzle and a hot water pipe. The bracket is symmetrically arranged, the hot water pipe is rotatably arranged between two groups of brackets, and the flushing nozzles are arranged in multiple groups. The multiple groups of flushing nozzles are all arranged at the bottom of the hot water pipe and connected to the hot water pipe.

8. The automatic liquid replacement method for a cleaning machine according to claim 7, characterized in that: The hot water pipe is driven to rotate by a motor, and one end of the hot water pipe is connected to an external hot water supply pipe through a sealing bearing.

9. The automatic liquid replacement method for a cleaning machine according to claim 1, characterized in that: In step T1 of step three, when the host of the cleaning machine obtains the sensing data of the sensor inside the working tank, the sensing data of the sensor is obtained starting from the first working tank of the cleaning machine.

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