Light beauty mask

Abstract

The invention provides a light beauty mask which comprises a mask body and a supporting part, and the supporting part is matched with the mask body to form a containing space. The mask body comprises a light-emitting part, and light emitted by the light-emitting part is distributed in the containing space. The supporting part is provided with a ventilation channel, and an outlet of the ventilation channel is located in the side, close to the containing space, of the supporting part and communicates with the containing space. An inlet of the ventilation channel is used for receiving external gas; in the target plane, the section size of the outlet of the ventilation channel is smaller than or equal to that of the inlet of the ventilation channel, the target plane intersects with the first direction, and the first direction comprises the direction from the inlet of the ventilation channel to the outlet. Therefore, while the air permeability of the light beauty mask is improved by utilizing the air-permeable channel, the temperature of the accommodating space can be reduced by utilizing the air-permeable channel, the cooling effect is realized, the comfort of the light beauty mask is improved, and the user experience is further improved.

Description

Technical Field

[0001] The present application relates to the technical field of photocosmetics, and in particular to a photocosmetics mask. Background Art

[0002] With the development of photocosmetic technology and the increasing demand for portable beauty devices, more and more wearable photocosmetic devices have entered people's lives. Among them, photocosmetic masks are popular as a wearable beauty device that is easy to carry and use. However, existing photocosmetic masks have the problem of poor air permeability. Summary of the invention

[0003] In view of this, the present application is dedicated to providing a photocosmetic mask that can solve the problem of poor air permeability.

[0004] In a first aspect, the present application provides a photocosmetic mask, comprising: a mask body and a support portion;

[0005] The support portion cooperates with the mask body to form a receiving space;

[0006] The mask body comprises a light emitting portion, and the light emitted by the light emitting portion is distributed in the accommodation space;

[0007] The support portion is provided with a ventilation channel; the outlet of the ventilation channel is located on a side of the support portion close to the accommodation space and communicates with the accommodation space; the inlet of the ventilation channel is used to receive external air;

[0008] In the target plane, the cross-sectional size of the outlet of the air permeable channel is smaller than or equal to the cross-sectional size of the inlet of the air permeable channel; the target plane intersects with a first direction, and the first direction includes a direction from the inlet of the air permeable channel to the outlet.

[0009] Optionally, the support portion includes a substrate, and a support structure surrounding the substrate;

[0010] The mask body is located on one side of the substrate; the support structure is arranged around the mask body.

[0011] Optionally, it also includes an air guide hole;

[0012] The air permeable channel is arranged around the mask body, the entrance of the air permeable channel is arranged inside the supporting part, and the entrance of the air permeable channel is connected to the air guide hole, and one end of the air guide hole away from the entrance of the air permeable channel is connected to the outside.

[0013] Optionally, the air permeable channel is located in the supporting structure, and the outlet of the air permeable channel is arranged around the mask body;

[0014] In the target plane, a cross-sectional size of at least a portion of the air permeable passage reaching the outlet gradually decreases along the first direction.

[0015] Optionally, the support structure includes a plurality of adjacently arranged first support units; the plurality of first support units are arranged around the accommodating space; and a first through hole is formed between adjacent first support units.

[0016] Optionally, the air permeable channel includes a plurality of second through holes penetrating the support structure;

[0017] The inlet of the second through hole is located on a side of the support structure away from the mask body; the outlet of the second through hole is located on a side of the support structure close to the mask body;

[0018] A plurality of the second through holes are arranged around the mask body.

[0019] Optionally, the air permeable channel includes a first opening;

[0020] The support structure includes a plurality of second support units arranged adjacent to each other; the plurality of second support units are arranged around the accommodation space; and the first opening is formed between adjacent second support units.

[0021] Optionally, a surface of the second supporting unit facing away from the substrate includes a spherical surface, a hemispherical surface or a plane.

[0022] Optionally, within the target plane, a cross-sectional dimension of the second through hole gradually decreases along the first direction.

[0023] Optionally, in the target plane, the cross-sectional shape of the second through hole includes at least one of a rectangle, a trapezoid, a circle, an ellipse, a triangle and a polygon;

[0024] Optionally, the shortest distance between the support structure and the corresponding surrounding mask body ranges from 1 mm to 5 mm;

[0025] Optionally, a distance difference between a surface of the support structure facing away from the substrate and a surface of the mask body facing away from the substrate in a thickness direction of the substrate ranges from 1 mm to 10 mm.

[0026] In the scheme of the present application, the photocosmetic mask includes a mask body and a support portion, the support portion cooperates with the mask body to form a storage space; the mask body includes a light-emitting portion, the light emitted by the light-emitting portion is distributed in the storage space; the support portion is provided with a breathable channel, the outlet of the breathable channel is located on the side of the support portion close to the storage space, and is connected to the storage space; the inlet of the breathable channel is used to receive external gas; in the target plane, the cross-sectional size of the outlet of the breathable channel is less than or equal to the cross-sectional size of the inlet of the breathable channel, the target plane intersects with the first direction, and the first direction includes the direction from the inlet of the breathable channel to the outlet. In this way, while the breathability of the photocosmetic mask is increased by using the breathable channel, the temperature of the storage space can also be reduced by using the breathable channel to achieve a cooling effect, thereby improving the comfort of the photocosmetic mask and thus improving the user experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] By describing the embodiments of the present application in more detail in conjunction with the accompanying drawings, the above and other purposes, features and advantages of the present application will become more apparent. The accompanying drawings are used to provide a further understanding of the embodiments of the present application and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the present application and do not constitute a limitation of the present application. In the accompanying drawings, the same reference numerals generally represent the same components or steps.

[0028] Figure 1 This is a schematic structural diagram of a photocosmetic mask provided by an embodiment of the present application;

[0029] Figure 2 yes Figure 1 The photocosmetic mask is a schematic diagram of a cross-sectional structure after being cut along the cutting line AA′;

[0030] Figure 3 is a structural schematic diagram of a display panel provided by another embodiment of the present application;

[0031] Figure 4 yes Figure 3 A schematic diagram of a cross-sectional structure of the photocosmetic mask after being cut along cutting line BB′;

[0032] Figure 5 is a schematic cross-sectional structure diagram of a photocosmetic mask provided by another embodiment of the present application;

[0033] Figure 6 This is a schematic structural diagram of a ventilation channel of a photocosmetic mask provided by an embodiment of the present application;

[0034] Figure 7 is a schematic structural diagram of a ventilation channel of a photocosmetic mask provided by another embodiment of the present application;

[0035] Figure 8It is a partial side structural schematic diagram of a photocosmetic mask provided by one embodiment of the present application;

[0036] Fig. 9 yes Figure 8 The photocosmetic mask is a schematic diagram of a cross-sectional structure after being cut along the cutting line CC′;

[0037] Fig.10 is a partial side structural schematic diagram of a photocosmetic mask provided by another embodiment of the present application;

[0038] Fig.11 yes Fig.10 The photocosmetic mask is a schematic diagram of a cross-sectional structure after being cut along the cutting line CC′;

[0039] Fig.12 is a schematic cross-sectional structure diagram of a photocosmetic mask provided by another embodiment of the present application;

[0040] Fig.13 is a schematic diagram of the cross-sectional shape of the second through hole of the photocosmetic mask provided by another embodiment of the present application on the target plane;

[0041] Fig.14 is a partial side structural schematic diagram of a photocosmetic mask provided by another embodiment of the present application;

[0042] Fig.15 yes Fig.14 The photocosmetic mask is a schematic diagram of a cross-sectional structure after being cut along the cutting line CC′;

[0043] Fig.16 is a schematic structural diagram of a photocosmetic mask provided by another embodiment of the present application;

[0044] Fig.17 It is a partial side structural schematic diagram of a photocosmetic mask provided in another embodiment of the present application.

[0045] Figure 1-Figure 17 :

[0046] 10. Mask body; 101. Light-emitting part; 102. Fixing part; 11. Support part; 111. Substrate; 112. Support structure; K. Air permeable channel; K1. First through hole; K2. First opening; K3. Second through hole; M1. First supporting unit; M2. Second supporting unit; s1. Outlet; s2. Inlet; T. Air guide hole; X. First direction; Y. Substrate thickness direction. DETAILED DESCRIPTION

[0047] Unless otherwise defined, the technical terms or scientific terms used in the embodiments of this specification shall have the common meanings understood by persons with ordinary skills in the field to which this specification belongs. The words "first", "second" and similar words used in the embodiments of this specification do not indicate any order, quantity or importance, but are only used to avoid confusion of constituent elements.

[0048] Unless the context requires otherwise, throughout the specification, "plurality" means "at least two", and "including" is interpreted as an open, inclusive meaning, that is, "including, but not limited to". In the description of the specification, the terms "one embodiment", "some embodiments", "exemplary embodiments", "examples", "specific examples" or "some examples" are intended to indicate that a particular feature, structure, material or characteristic associated with the embodiment or example is included in at least one embodiment or example of the specification. The schematic representation of the above terms does not necessarily refer to the same embodiment or example.

[0049] The following will be combined with the drawings in the embodiments of this specification to clearly and completely describe the technical solutions in the embodiments of this specification. Obviously, the described embodiments are only part of the embodiments of this specification, not all of the embodiments. Based on the embodiments in this specification, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this specification.

[0050] Photobeauty is a wide-spectrum intense pulsed light technology. The pulsed intense light energy of a specific wavelength can penetrate the skin epidermis and selectively act on subcutaneous pigments, open blood vessels, hair follicles, etc., causing them to shrink, decompose or be absorbed; at the same time, it can also thicken collagen tissue. Generally, the beauty purpose (such as whitening, wrinkle removal, etc.) can be achieved after 4-6 treatments.

[0051] In daily life, beauty devices are bulky and inconvenient to use and carry. Therefore, many wearable beauty devices have been developed to meet people's daily beauty needs. Among them, light beauty masks are widely loved by people as beauty devices that are easy to use in daily life and can achieve facial optimization.

[0052] At present, light beauty masks generally have the problem of poor air permeability. When users use light beauty masks, their faces need to fit the light beauty masks. The poor air permeability of light beauty masks will lead to a poor user experience. In severe cases, it will also cause users to suffer from hypoxia problems.

[0053] Therefore, how to improve the air permeability of light beauty mask needs to be solved urgently.

[0054] To this end, the present application provides a new photocosmetic mask. By setting a ventilation channel on the supporting part of the photocosmetic mask, the air permeability of the photocosmetic mask can be increased without affecting the mask body. In addition, the cross-sectional size of the outlet of the ventilation channel is set to be smaller than or equal to the cross-sectional size of the inlet of the ventilation channel, so that the outside air can enter the containing chamber of the photocosmetic mask through the ventilation channel, thereby improving the air permeability of the photocosmetic mask while achieving a cooling effect, thereby effectively improving the user experience.

[0055] Specifically, as an optional implementation of the disclosure of the present application, an embodiment of the present application provides a photocosmetic mask. Figure 1 is a schematic structural diagram of a photocosmetic mask provided by an embodiment of the present application, Figure 2 yes Figure 1 The schematic diagram of the cross-sectional structure of the photocosmetic mask after being cut along the cutting line AA′ is shown; Figure 1 and Figure 2 As shown, the photocosmetic mask may include: a mask body 10 and a supporting portion 11 .

[0056] The support portion 11 cooperates with the mask body 10 to form a receiving space.

[0057] The holding space is used to hold the face.

[0058] Specifically, the mask body 10 includes a light emitting portion 101. Therefore, the mask body 10 cooperates with the support portion 11 to form a receiving space, and the light emitted by the light emitting portion 101 is distributed in the receiving space. When in use, the user can wear the light beauty mask on the face so that the face is in the receiving space, thereby laying a structural foundation for achieving facial beauty, wherein the light emitting portion 101 is at least one of an OLED light source, an LED light source, a miniLED light source, a microLED light source, an optical fiber or a xenon lamp.

[0059] Furthermore, the mask body 10 may further include a fixing portion 102 disposed around the light emitting portion 101 , and the fixing portion 102 is used to fix the light emitting portion 101 and the supporting portion 11 , thereby improving the stability of the light beauty mask.

[0060] The support portion 11 is provided with a ventilation channel K. An outlet s1 of the ventilation channel K is located at a side of the support portion 11 close to the accommodation space and communicates with the accommodation space. An inlet s2 of the ventilation channel K is used to receive external air.

[0061] External gas can enter the containing space through the air permeable channel K, that is, the air permeable channel K realizes the connection between the outside and the containing space, thereby increasing the air permeability of the photocosmetic mask without affecting the mask body 10.

[0062] It should be understood that the outlet s1 of the air channel K is located on the side of the support portion 11 close to the accommodating space, which means that when the support portion 11 and the mask body 10 cooperate to form the accommodating space, the accommodating space can expose the outlet s1 of the air channel K located on the support portion 11, so that the mask body 10 does not block the outlet s1, thereby ensuring that the air can flow better between the outside world and the accommodating space.

[0063] In the target plane, the cross-sectional size of the outlet s1 of the air permeable channel K is smaller than or equal to the cross-sectional size of the inlet s2 of the air permeable channel K; the target plane intersects with the first direction X, and the first direction X includes the direction from the inlet s2 of the air permeable channel K to the outlet s1.

[0064] Specifically, the target plane may intersect the first direction X perpendicularly. The first direction X includes the direction from the inlet s2 of the air permeable channel K to the outlet s1 of the air permeable channel K, that is, the first direction X is the air flow direction when the outside air enters the accommodation space.

[0065] In the target plane, the cross-sectional size of the outlet s1 of the air permeable channel K is equal to the cross-sectional size of the inlet s2 of the air permeable channel K, so that the outside air can enter the accommodation space through the air permeable channel K, bringing new air to the accommodation space, and at the same time, it can also reduce the temperature in the accommodation space caused by the user's exhalation, thereby achieving a cooling effect.

[0066] Furthermore, the cross-sectional size of the outlet s1 of the air permeable channel K is smaller than the cross-sectional size of the inlet s2 of the air permeable channel K, indicating that when the outside air enters the containing space, the air entering the inlet s2 of the air permeable channel K will be compressed when passing through the outlet s1 of the air permeable channel K, resulting in an increase in air pressure and density, which increases the thermal conductivity of the inner wall at the outlet s1 of the air permeable channel K, thereby causing the temperature of the air to drop when passing through the outlet s1, thereby reducing the temperature of the outside air entering the containing space.

[0067] In this embodiment, the photocosmetic mask includes a mask body 10 and a support portion 11, wherein the support portion 11 cooperates with the mask body 10 to form a storage space; the support portion 11 is provided with a ventilation channel K, and an outlet s1 of the ventilation channel K is located on a side of the support portion 11 close to the storage space and communicates with the storage space; an inlet s2 of the ventilation channel K is used to receive external air; within a target plane, a cross-sectional dimension of the outlet s1 of the ventilation channel K is less than or equal to a cross-sectional dimension of the inlet s2 of the ventilation channel K, and the target plane intersects with a first direction X, and the first direction X includes a direction from the inlet s2 of the ventilation channel K to the outlet s1. In this way, while the ventilation channel K is used to increase the air permeability of the photocosmetic mask, the ventilation channel K can also be used to reduce the temperature of the storage space, thereby achieving a cooling effect, improving the comfort of the photocosmetic mask, and thus improving the user experience.

[0068] In some embodiments, Figure 3 and Figure 4 As shown, the support portion 11 may include a substrate 111 and a support structure 112 surrounding the substrate 111 .

[0069] The substrate 111 mainly plays the role of supporting and bearing, etc. Specifically, the substrate 111 may include a rigid substrate such as a metal substrate or hard plastic, or may include a flexible substrate such as silicone or rubber, TPU, etc.

[0070] Specifically, the material of the substrate 111 can be selected according to actual needs. In addition, the support structure 112 can be made of the same material as the substrate 111, or a different material from the substrate 111. When used, the substrate 111 and the support structure 112 can be formed in one piece, or they can be prepared separately. For example, the material of the substrate 111 and the support structure 112 can both be silicone, and the substrate 111 and the support structure 112 are formed in one piece. Silicone is flexible and has a certain supporting capacity. Using silicone as the material of the support structure 112 can make the support structure 112 that fits the face of the user when the user uses the photocosmetic mask, which can bring a more comfortable experience to the user.

[0071] The support structure 112 is arranged around the substrate 111, which may mean that the support structure 112 is located on the side of the substrate 111 facing the accommodation space, and is arranged along the boundary of the substrate 111 to form an enclosed space with the substrate 111. The mask body 10 is located on the side of the substrate 111 facing the enclosed space, and the mask body 10 is located in the enclosed space, and cooperates with the substrate 111 and the support structure 112 to form the accommodation space.

[0072] When implementing, Figure 4 As shown, the distance h1 between the surface of the support structure 112 facing away from the substrate 111 and the substrate 111 in the thickness direction Y of the substrate 111 is greater than the distance h2 between the surface of the mask body 10 facing away from the substrate 111 and the substrate 111 in the thickness direction Y of the substrate 111. In this way, sufficient accommodation space can be ensured to prevent the light-emitting portion 101 of the mask body 10 from directly contacting the face of the user when using the photocosmetic mask, thereby improving the safety and comfort of the photocosmetic mask.

[0073] In addition, since the support structure 112 is arranged around the mask body 10, the shortest distance h3 between the support structure 112 and the corresponding surrounded mask body 10 can be set within the range of 1mm-5mm. Specifically, the shortest distance h3 can be 1mm, 2mm, 3mm, 4mm or 5mm, etc. For example, the shortest distance h3 between the support structure 112 and the corresponding surrounding mask body 10 can be 1mm, thereby reducing the volume of the photocosmetic mask while ensuring the air permeability of the photocosmetic mask and improving the portability of the photocosmetic mask; or, the shortest distance h3 between the support structure 112 and the corresponding surrounding mask body 10 can be 3mm, thereby achieving a smaller volume of the photocosmetic mask while improving the air permeability of the photocosmetic mask; or, the shortest distance h3 between the support structure 112 and the corresponding surrounding mask body 10 can be 5mm, thereby ensuring the portability of the photocosmetic mask while further improving the air permeability of the photocosmetic mask and improving the user experience. On the other hand, setting the shortest distance h3 between the support structure 112 and the corresponding surrounding mask body 10 within the range of 1mm-5mm can ensure that the support structure 112 and the mask body 10 are prevented from colliding or squeezing during the use of the mask (the mask needs to be bent to fit the face of the person), thereby avoiding the failure of the mask body and increasing the stability of the photocosmetic mask. .

[0074] The distance difference h4 between the surface of the support structure 112 facing away from the substrate 111 and the surface of the mask body 10 facing away from the substrate 111 in the thickness direction Y of the substrate 111 can be set in the range of 1mm-10mm. Specifically, the distance difference h4 can be 1mm, 2mm, 3mm, 4mm, 5mm, 6mm, 7mm, 8mm, 9mm or 10mm, etc. For example, the distance difference h4 between the surface of the support structure 112 facing away from the substrate 111 and the surface of the mask body 10 facing away from the substrate 111 in the thickness direction Y of the substrate 111 can be 1 mm, thereby avoiding contact between the human face and the light-emitting part of the mask body 10; or, the distance difference h4 between the surface of the support structure 112 facing away from the substrate 111 and the surface of the mask body 10 facing away from the substrate 111 in the thickness direction Y of the substrate 111 can be 5 mm, while avoiding contact between the human face and the light-emitting part of the mask body 10, increasing the accommodation space and improving the air permeability of the light beauty mask; or, the distance difference h4 between the surface of the support structure 112 facing away from the substrate 111 and the surface of the mask body 10 facing away from the substrate 111 in the thickness direction Y of the substrate 111 can be 10 mm, thereby further increasing the accommodation space and further avoiding contact between the human face and the light-emitting part.

[0075] In this way, the safety and comfort of the light beauty mask can be further improved.

[0076] It should be noted that the implementation mode of the present application is only described by taking the example that the support structure 112 is located on the side of the substrate 111 close to the accommodating space, but the present application is not limited to this. In some other implementation modes, the support structure 112 may also be located on the side wall of the substrate 111 and arranged around the side wall of the substrate 111, thereby cooperating with the substrate 111 to form an enclosed space.

[0077] In some embodiments, Figure 5 As shown, the photocosmetic mask may further include air guide holes T. The air guide holes T are used to introduce external air into the air permeable channel K, thereby laying a foundation for improving the air permeability of the photocosmetic mask.

[0078] Specifically, the air permeable channel K is arranged around the mask body 10, the inlet s2 of the air permeable channel K is arranged inside the supporting part 11, and the inlet s2 of the air permeable channel K is connected to the air guide hole T, and the end of the air guide hole T away from the inlet s2 is connected to the outside.

[0079] It should be noted that the air permeable channel K is arranged in an annular chamber, which can increase the volume of the air permeable channel K. The mask body 10 is located in the area surrounded by the annular chamber, and the outlet s1 of the annular chamber is located on the side of the support portion 11 close to the accommodating space. The annular chamber is also provided with an inlet s2, which is connected to the air guide hole T, which can improve the convenience of ventilation. In this way, the air permeability of the light beauty mask can be further improved without increasing the volume of the light beauty mask. At the same time, the air permeable channel K is arranged around the mask body 10, which can make the air permeable channel K have a larger distribution range in the support portion 11, thereby avoiding the situation where the air permeable channel K is too concentrated and the support performance of the support portion 11 is insufficient.

[0080] In some implementations, still Figure 5 As shown, the air permeable channel K can be located within the support structure 112 .

[0081] Disposing the air permeable channel K in the support structure 112 can prevent the setting of the air permeable channel K from affecting the supporting performance of the substrate 111 . Furthermore, disposing the air permeable channel K in the support structure 112 can facilitate setting the outlet s1 and the inlet s2 of the air permeable channel K .

[0082] Specifically, the outlet s1 of the air permeable channel K can be arranged on the side of the support structure 112 close to the accommodation space, so as to improve the ease of preparation of the support structure 112. The inlet s2 of the air permeable channel K can be arranged on the side of the air permeable channel K away from the accommodation space, so as to facilitate connection with the air guide hole T and realize communication between the outside and the accommodation space.

[0083] During implementation, in order to further increase the ventilation volume and enhance the air permeability, the outlet s1 of the air channel K can be arranged around the mask body 10. In this way, when the human face is in contact with the supporting structure 112, external air can enter the containing space through the outlet s1 of the air channel K surrounding the mask body 10, thereby achieving all-round ventilation of the containing space and further enhancing the user experience.

[0084] In the target plane, the cross-sectional size of the air permeable channel K, at least part of which reaches the outlet s1, gradually decreases along the first direction X.

[0085] The cross-sectional size of at least a portion of the air permeable channel K reaching the outlet s1 gradually decreases along the first direction X. The cross-sectional size of the entire air permeable channel K gradually decreases along the first direction X (e.g. Figure 2 As shown), it can also be that the cross-sectional size of a section of the air permeable channel K that reaches the outlet s1 gradually decreases along the first direction X (as shown Figure 5 In the target plane, the cross-sectional size of the air permeable channel K that at least partially reaches the outlet s1 gradually decreases along the first direction X, so that the air can be cooled down during the process of flowing out of the air permeable channel K due to the gradual shrinkage of the outlet s1, so that the accommodation space is cooled down while the external air enters the accommodation space, thereby improving the comfort of the light beauty mask.

[0086] Of course, the embodiment of the present application is only described by taking the example that there is only one outlet s1 of the ventilation channel K and it is arranged around the mask body 10, but the present application is not limited to this. In some other embodiments, such as Figure 6 As shown, there may be multiple outlets s1 of the air permeable channel K, and the outlets s1 of the multiple air permeable channels K may be arranged around the mask body 10 to achieve all-round ventilation of the accommodating space.

[0087] Similarly, the embodiment of the present application is only described by taking the number of the ventilation channel K as one as an example, but the present application is not limited to this. In some other embodiments, such as Figure 7 As shown, the number of ventilation channels K may be multiple, and multiple ventilation channels K may be arranged around the mask body 10, thereby achieving all-round ventilation of the accommodating space.

[0088] In some embodiments, Figure 8 and Fig. 9 As shown, the support structure 112 may include a plurality of first support units M1 arranged adjacent to each other; the plurality of first support units M1 are arranged around the accommodation space; and a first through hole K1 is formed between adjacent first support units M1.

[0089] Specifically, to further improve user experience, the surface of the first support unit M1 facing away from the substrate 111 may be a non-planar surface.

[0090] For example, Figure 8 and Fig. 9 As shown, the surface of the first support unit M1 facing away from the substrate 111 may be a hemispherical surface, and a depression toward the substrate 111, namely, a first through hole K1, is formed between adjacent first support units M1. At this time, the first through hole K1 is in an open state; or, as shown in FIG. Fig.10 and Fig.11 As shown, a first through hole K1 is provided between adjacent first support units M1, and at this time, the first through hole K1 penetrates the adjacent first support units M1. When the user wears the photocosmetic mask, the surface of the first support unit M1 facing away from the substrate 111 fits the face of the user, and the hemispherical contact surface can not only bring a more comfortable tactile experience to the user, but also further form a channel by using the first through hole M1 to increase the air permeability of the photocosmetic mask, and, in the target plane, the cross-sectional size of the entrance of the channel can be larger than the cross-sectional size of the exit of the channel, thereby achieving a further cooling effect.

[0091] In some embodiments, the air permeable channel K may include a plurality of second through holes penetrating the support structure 112 .

[0092] like Fig.12 As shown, the inlet s2 of the second through hole K3 is located on the side of the support structure 112 away from the mask body 10 ; the outlet s1 of the second through hole K3 is located on the side of the support structure 112 close to the mask body 10 ; and a plurality of second through holes K3 are arranged around the mask body 10 .

[0093] Specifically, the outlet s1 of the second through hole K3 is located on the side of the support structure 112 close to the accommodation space, and the inlet s2 of the second through hole K3 is located on the side of the support structure 112 away from the accommodation space. Directly providing the second through hole K3 penetrating the support structure 112 can effectively improve the air permeability of the light beauty mask without affecting the structure of the mask body 10, and is easy to implement.

[0094] In order to prevent the setting of the second through hole K3 from affecting the supporting performance of the supporting structure 112, in the target plane, the cross-sectional size of the second through hole K3 (at this time, the first direction X intersects the target plane perpendicularly) can be set within the range of 1 mm2-100 mm2, while ensuring the air permeability of the photocosmetic mask, it can also ensure that the supporting structure 112 has sufficient supporting performance.

[0095] During implementation, within the target plane, the cross-sectional size of the second through hole K3 may be gradually reduced along the first direction X.

[0096] In this way, when external air enters the accommodating space through the second through hole K3, since the cross-sectional size of the second through hole K3 gradually decreases along the first direction X in the target plane, the temperature of the external air when leaving the second through hole K3 can be lower than the temperature when entering the second through hole K3, thereby increasing the air permeability of the light beauty mask while achieving the cooling effect of the light beauty mask, thereby increasing the facial comfort of the user when using the light beauty mask and improving the user experience.

[0097] In practical applications, in order to realize the ventilation function of the second through hole K3, the cross-sectional shape of the second through hole K3 in the target plane may include at least one of a rectangle, a trapezoid, a circle, an ellipse, a triangle and a polygon. Fig.13 As shown, in the target plane, the cross-sectional shape of the second through hole K3 is a triangle.

[0098] The target plane intersects the first direction X perpendicularly.

[0099] In some embodiments, Fig.14 and Fig.15 As shown, the second through hole may include a first opening K2.

[0100] The supporting structure 112 may include a plurality of second supporting units M2 arranged adjacent to each other; the plurality of second supporting units M2 are arranged around the accommodation space; and a first opening K2 is formed between adjacent second supporting units M2.

[0101] The surface of the second support unit M2 facing away from the substrate 111 may be a non-planar surface. When the user puts on the photocosmetic mask, the surface of the second support unit M2 facing away from the substrate 111 fits with the face, and the first opening K2 cooperates with the face to form a channel connecting the accommodation space with the outside, thereby improving the air permeability of the photocosmetic mask. In addition, the first opening K2 is arranged around the accommodation space. In the target plane, the cross-sectional size of the entrance of the channel formed by the first opening K2 and the face is larger than the cross-sectional size of the exit, which can make the channel have a cooling effect, that is, the photocosmetic mask has a cooling effect. In addition, multiple second support units M2 are arranged around the accommodation space, which can make multiple first openings K2 arranged around the accommodation space, so that when the face fits with the surface of the second support unit M2 facing away from the substrate 111, a full-range ventilation setting between the accommodation space and the outside is achieved, which greatly improves the air permeability of the photocosmetic mask.

[0102] Furthermore, in order to improve the comfort of the photocosmetic mask, the surface of the second supporting unit M2 facing away from the substrate 111 may include a spherical surface or a hemispherical surface.

[0103] like Fig.16 and Fig.17 As shown, the surface of the second support unit M2 facing away from the substrate 111 is a spherical surface.

[0104] That is to say, the second support unit M2 can be in a spherical state. In this way, not only can the first opening K2 be used to increase the air permeability of the light beauty mask, but the spherical surface of the second support unit M2 can also be used to fit the human face. The contact surface of the spherical surface can give the user a massage experience, thereby increasing the user's comfort in using the light beauty mask.

[0105] In addition, the spherical second support unit M2 can also prevent the first opening K2 from being blocked due to facial compression when a human face is attached to the surface of the second support unit M2 facing away from the substrate 111 .

[0106] In addition, the surface of the second support unit M2 facing away from the substrate 111 may also be a plane. For example, the second support unit may be a cube or a cuboid.

[0107] In actual applications, the distance between the bottom of the first opening K2 close to the substrate 111 and the substrate 111 in the thickness direction Y of the substrate 111 can be consistent with the distance between the surface of the mask body 10 close to the substrate 111 and the substrate 111 in the thickness direction Y of the substrate 111. In this way, the first opening K2 can be further avoided from being blocked when the surface of the second support unit M2 facing away from the substrate 111 is in contact with the human face.

[0108] It should be noted that the multiple second support units M2 that enclose the support structure 112 can be support units of the same size and shape, or support units of different sizes and shapes, and the spacing between adjacent second support units M2 can be the same or different, which is not specifically limited here.

[0109] In implementation, in order to further avoid the blockage of the first opening K2, the spacing h5 between adjacent second support units M2 can be set in the range of 0.5mm-3mm. For example, the spacing h5 between adjacent second support units M2 can be 0.5mm, 2mm, 3mm, etc., so as to ensure the air permeability of the first opening K2 while taking into account the supporting performance of the support structure 112.

[0110] Of course, in other embodiments, other functional modules of the light beauty mask can be provided as needed. For example, when there is a need to listen to music to relax, a music playing module of the light beauty mask can be added to realize the function of playing music of the light beauty mask, etc., which will not be elaborated here.

[0111] As an optional implementation of the content disclosed in the present application, the embodiment of the present application further provides a beauty device, which includes: a light beauty mask provided in any of the above embodiments.

[0112] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0113] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present application. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A photocosmetic mask, characterized in that: include: The mask body and the support part; The support portion cooperates with the mask body to form a receiving space; The mask body comprises a light emitting portion, and the light emitted by the light emitting portion is distributed in the accommodation space; The support portion is provided with a ventilation channel; the outlet of the ventilation channel is located on a side of the support portion close to the accommodation space and communicates with the accommodation space; the inlet of the ventilation channel is used to receive external air; In the target plane, the cross-sectional size of the outlet of the air permeable channel is smaller than or equal to the cross-sectional size of the inlet of the air permeable channel; The target plane intersects with a first direction, and the first direction includes a direction from the entrance of the air permeable channel to the outlet.

2. The photocosmetic mask according to claim 1, characterized in that: The support portion includes a substrate and a support structure surrounding the substrate; The mask body is located on one side of the substrate; the support structure is arranged around the mask body.

3. The photocosmetic mask according to claim 2, characterized in that: Also includes air guide holes; The air permeable channel is arranged around the mask body, the entrance of the air permeable channel is arranged inside the supporting part, and the entrance of the air permeable channel is connected to the air guide hole, and one end of the air guide hole away from the entrance of the air permeable channel is connected to the outside.

4. The photocosmetic mask according to claim 3, characterized in that: The air permeable channel is located in the supporting structure, and the outlet of the air permeable channel is arranged around the mask body; In the target plane, a cross-sectional size of at least a portion of the air permeable passage reaching the outlet gradually decreases along the first direction.

5. The photocosmetic mask according to claim 3, characterized in that: The support structure includes a plurality of first support units arranged adjacent to each other; the plurality of first support units are arranged around the accommodation space; and first through holes are formed between adjacent first support units.

6. The photocosmetic mask according to claim 2 or 3, characterized in that: The air permeable channel includes a plurality of second through holes penetrating the support structure; The inlet of the second through hole is located on a side of the support structure away from the mask body; the outlet of the second through hole is located on a side of the support structure close to the mask body; A plurality of the second through holes are arranged around the mask body.

7. The photocosmetic mask according to claim 6, characterized in that: The second through hole includes a first opening; The support structure includes a plurality of second support units arranged adjacent to each other; the plurality of second support units are arranged around the accommodation space; and the first opening is formed between adjacent second support units.

8. The photocosmetic mask according to claim 7, characterized in that: A surface of the second supporting unit facing away from the substrate includes a spherical surface, a hemispherical surface or a plane.

9. The photocosmetic mask according to claim 6, characterized in that: In the target plane, the cross-sectional size of the second through hole gradually decreases along the first direction.

10. The photocosmetic mask according to claim 6, characterized in that: In the target plane, the cross-sectional shape of the second through hole includes at least one of a rectangle, a trapezoid, a circle, an ellipse, a triangle and a polygon; Optionally, the shortest distance between the support structure and the corresponding surrounding mask body ranges from 1 mm to 5 mm; Optionally, a distance difference between a surface of the support structure facing away from the substrate and a surface of the mask body facing away from the substrate in a thickness direction of the substrate ranges from 1 mm to 10 mm.

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