Vacuum exhaust equipment with efficient filtering function for semiconductor coating

Abstract

The invention relates to the field of exhaust and filtration of semiconductor coating equipment, and discloses vacuum exhaust equipment with efficient filtration for semiconductor coating, the vacuum exhaust equipment comprises exhaust equipment and a main pipe, the bottom of the main pipe is provided with an auxiliary pipe, the auxiliary pipe is U-shaped, the auxiliary pipe is internally provided with a heating structure and a cooling structure, and the heating structure and the cooling structure are arranged in the main pipe. The vacuum exhaust equipment with the efficient filtering function for the semiconductor film coating is provided with the auxiliary pipe, and the heating structure and the refrigerating structure are arranged in the auxiliary pipe; after heating and refrigerating are combined together, when exhausted foreign gas enters the auxiliary pipe, the foreign gas is firstly heated and then cooled, gas impurities are guided to be deposited and filtered in a cooling area, meanwhile, a great temperature contrast can occur due to first heating and then cooling, and the impurity deposition and filtering efficiency is improved; when impurities are deposited on the surface of the auxiliary pipe, the cleaning ring can clean the attached impurities.

Description

Technical Field

[0001] The present invention relates to the technical field of exhaust filtration of semiconductor coating equipment, and in particular to vacuum exhaust equipment for semiconductor coating with high-efficiency filtration. Background Art

[0002] In the patent application with application announcement number CN218608592U, it includes an exhaust duct body, one end of the exhaust duct body is connected to an exhaust head, the inner side of the other end of the exhaust duct body is threaded, and an installation ring is welded on the outer side of the exhaust duct body near the threaded end, an exhaust fan is installed on the inner side of the threaded end, and the other end of the exhaust fan is placed inside the exhaust duct body and a filter device is installed, the filter device passes through a limiting groove opened at the upper end of the exhaust duct body and is connected to a connecting plate, and a pulling handle is installed in the middle of the connecting plate. The advantages are: the filtering and cleaning exhaust duct makes the exhaust duct easier to install through the threaded setting and the installation ring on the inner side of one end, and the pulling handle is installed on the upper end of the connecting plate connected to the upper end of the filter device, so that when the filter device is used for too long, it is easy to disassemble and replace it, and the dustproof net installed at one end of the exhaust head can prevent external dust from entering the exhaust duct through the exhaust head.

[0003] In the prior art including the above-mentioned patents, simple filtration in the vacuum exhaust pipe is due to the large amount of impurities in the air. Simply using filtration to remove impurities will result in a short service life of the filter cartridge and the need for frequent replacement. The replacement time is long and takes a certain amount of time. In addition, the pipes in the machine are complex and numerous, making replacement very troublesome, affecting the machine's operating efficiency. Summary of the invention

[0004] The problem to be solved by the present invention is that there are many impurities inside the vacuum exhaust pipe, and a single filter type impurities accumulate a lot and quickly, and needs to be replaced frequently.

[0005] In order to solve the above technical problems, the technical solution of the present invention is: a vacuum exhaust device for semiconductor coating with high-efficiency filtration, comprising an exhaust device and a main pipe, a sub-pipe is provided at the bottom of the main pipe, the sub-pipe is in a U-shape, a heating structure and a cooling structure are provided inside the sub-pipe, the heating structure and the cooling structure are linked to each other, the heating structure heats the airflow, and the cooling structure cools the gas to form a temperature difference to precipitate impurities; The cooling structure includes a refrigeration plate, a control end is provided on the top of the refrigeration plate, a fixed disk is provided on one side of the inner wall of the auxiliary tube, a main gear is rotatably provided on one side of the fixed disk, auxiliary gears are rotatably provided on the top and bottom of the main gear, the auxiliary gear is meshed with the main gear, a reciprocating screw is rotatably provided on one side of the auxiliary gear, and a cleaning ring is slidably provided on the reciprocating screw.

[0006] Preferably, the cleaning ring is hollow, the outer edge of the cleaning ring is in close contact with the inner wall of the auxiliary tube, the cleaning ring can move back and forth laterally along the reciprocating screw, and a connecting disk is provided on the other side of the inner wall of the auxiliary tube.

[0007] Preferably, the top and bottom of one side of the connecting disk are rotatably connected to one side of the reciprocating screw rod, a telescopic rod is fixedly provided on one side of the top of the reciprocating screw rod, a spring is provided inside the telescopic rod, and an impact ball is provided on the top of the telescopic rod, and the impact ball can impact the inside of the auxiliary tube to generate vibration.

[0008] Preferably, grooves are provided on both sides of the bottom of the auxiliary pipe, and collecting boxes are fixedly provided on both sides of the bottom of the auxiliary pipe. A slide plate is slidably provided on the front of the collecting box, and a handle is fixedly connected to the front of the slide plate.

[0009] Preferably, an inclined plate is provided on one side of the collection box, a sensing plate is provided at the bottom of the collection box, an alarm is provided at the top of the collection box, a sensor is provided at the bottom of the sensing plate, and the sensor is electrically connected to the alarm.

[0010] Preferably, the heating structure comprises a support plate, a guide wheel is rotatably provided on the top of the support plate, a universal shaft is provided on the bottom of the guide wheel, and the bottom of the universal shaft passes through the support plate and extends to the outside of the support plate.

[0011] Preferably, there are two universal joints, a control rod is fixedly provided between opposite sides of the two universal joints, one side of the other universal joint is fixedly connected to one side of the main gear, a heating plate is provided on the outside of one side of the auxiliary pipe, and a conical ring is provided on the top of one side of the inner wall of the auxiliary pipe.

[0012] Preferably, a flange is provided on the top of the secondary pipe, a control plate is rotatably provided inside the flange, brackets are fixedly provided on both sides of the bottom of the main pipe, a connecting rod is rotatably provided inside the bracket, and one side of the connecting rod passes through the flange and extends to the inside of the flange.

[0013] Preferably, one side of the connecting rod is fixedly connected to one side of the control panel, the other side of the connecting rod is provided with a driven wheel, the top of the main pipe is provided with a control valve, the bottom of the control valve is provided with a power wheel, the control valve switch can control the rotation of the power wheel, and the power wheel is meshed with the driven wheel.

[0014] Compared with the prior art, the technical solution of the present invention has the following advantages: (1) A U-shaped auxiliary pipe is provided at the bottom of the main pipe. A heating structure and a cooling structure are provided inside the auxiliary pipe. When the heating and cooling are combined, the discharged impurity gas enters the auxiliary pipe and is first heated and then cooled at the bottom. This can guide the gas impurities to be deposited and filtered in the cooling area. At the same time, heating first and then cooling can produce a great temperature contrast, which improves the impurity deposition and filtration efficiency. The hot and cold structures can be used in conjunction with each other. A cleaning ring is provided in the cooling structure. When impurities are deposited on the surface of the auxiliary pipe, the cleaning ring can be controlled by the main gear to move left and right along the reciprocating screw rod to scrape off the impurities deposited on the inner wall of the pipe and keep the impurities. The inner wall of the pipeline is clean, and the impurities are concentrated in the collection box, which is convenient for users to clean the impurities later. The gas after the impurities are deposited will further optimize the filtering effect when it passes through the pipeline's own filter layer. There is also an alarm device in the collection box. When the impurities inside accumulate to a certain weight after long-term use, the sensor plate will be pressed to make the alarm sound, reminding the user to clean the impurities. There is also an impact ball at the tail of the reciprocating screw. When the reciprocating screw rotates, the impact ball will rotate with it to knock on the wall of the auxiliary pipe to produce vibration, making the impurities attached to the wall looser and easier to clean; (2) The heating structure mainly provides kinetic energy and heats evenly. When the gas passes through the heating device, in addition to being heated by the heating plate, the airflow passing through the guide wheel will drive it to rotate. The rotation of the guide wheel can first make the gas heated more evenly. Secondly, its own rotation will generate a power source without the need for additional electronic machines to control it. The rotational force will drive the universal shaft to control the main gear to rotate to complete the movement of the cleaning ring at the refrigeration structure. The heating structure is equipped with a conical ring at the top of the auxiliary pipe where the gas enters. The conical ring can gather the gas and guide the airflow to pass through the top of the guide wheel, making the guide wheel rotate more smoothly and faster. (3) A power wheel and two driven wheels are provided at the valve of the main pipe. When the user no longer needs to filter the gas, the valve can be rotated to open the main pipe while closing both ends of the auxiliary pipe, allowing the gas to be discharged directly from the main pipe without being filtered. The control can be freely performed according to the actual use environment and the exhaust gas, thereby increasing the overall adjustability of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a schematic diagram of the structure of the exhaust equipment of the present invention; Figure 3 It is a schematic diagram of the main structure of the present invention; Figure 4 This is a schematic diagram of the auxiliary pipe structure of the present invention; Figure 5 This is a schematic diagram of the internal structure of the auxiliary pipe of the present invention; Figure 6It is a front view schematic diagram of the internal structure of the auxiliary pipe of the present invention; Figure 7 This is a schematic diagram of the control rod structure of the present invention; Figure 8 This is a schematic diagram of the guide wheel structure of the present invention; Fig. 9 This is a schematic diagram of the structure of the universal shaft of the present invention; Fig.10 This is a schematic diagram of the cleaning ring structure of the present invention; Fig.11 This is a schematic diagram of the impact ball structure of the present invention; Fig.12 This is a schematic diagram of the control panel structure of the present invention; Fig.13 This is a schematic diagram of the power wheel structure of the present invention; Fig.14 It is a schematic diagram of the internal structure of the collecting box of the present invention.

[0016] In the figure: 1. exhaust equipment; 2. main pipe; 3. auxiliary pipe; 4. refrigeration structure; 401. refrigeration plate; 402. collection box; 403. handle; 404. connecting plate; 405. reciprocating screw; 406. induction plate; 407. cleaning ring; 408. control end; 409. fixed plate; 410. auxiliary gear; 411. main gear; 412. impact ball; 413. telescopic rod; 414. alarm; 5. control valve; 6. driven wheel; 7. heating structure; 701. heating plate; 702. conical ring; 703. guide wheel; 704. support plate; 705. control rod; 706. universal shaft; 8. flange; 9. connecting rod; 10. power wheel; 11. bracket; 12. control board. DETAILED DESCRIPTION

[0017] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0018] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. "Include" or "comprise" and other similar words used in the present disclosure mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and other similar words are not limited to physical or mechanical connections, but may also include electrical connections, whether direct or indirect. "Up", "down", "left", "right", etc. are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0019] like Figures 1 to 14 As shown, the present invention provides a vacuum exhaust device for semiconductor coating with high efficiency filtration, comprising an exhaust device 1 and a main pipe 2, a sub-pipe 3 is provided at the bottom of the main pipe 2, the sub-pipe 3 is in a U-shape, a heating structure 7 and a cooling structure 4 are provided inside the sub-pipe 3, the heating structure 7 and the cooling structure 4 are linked to each other, the heating structure 7 heats the airflow, and the cooling structure 4 cools the gas to form a temperature difference to precipitate impurities; The cooling structure 4 includes a refrigeration plate 401, a control end 408 is provided on the top of the refrigeration plate 401, a fixed disk 409 is provided on one side of the inner wall of the auxiliary pipe 3, a main gear 411 is rotatably provided on one side of the fixed disk 409, and auxiliary gears 410 are rotatably provided on the top and bottom of the main gear 411. The auxiliary gear 410 is meshed with the main gear 411, and a reciprocating screw rod 405 is rotatably provided on one side of the auxiliary gear 410, and a cleaning ring 407 is slidably provided on the reciprocating screw rod 405.

[0020] The cleaning ring 407 is hollow, and the outer edge of the cleaning ring 407 is in close contact with the inner wall of the auxiliary tube 3. The cleaning ring 407 can move back and forth laterally along the reciprocating screw rod 405. A connecting plate 404 is provided on the other side of the inner wall of the auxiliary tube 3.

[0021] The top and bottom of one side of the connecting disk 404 are rotatably connected to one side of the reciprocating screw rod 405. A telescopic rod 413 is fixedly provided on one side of the top of the reciprocating screw rod 405. A spring is provided inside the telescopic rod 413. An impact ball 412 is provided on the top of the telescopic rod 413. The impact ball 412 can impact the inside of the auxiliary pipe 3 to generate vibration.

[0022] Slots are provided on both sides of the bottom of the auxiliary tube 3 , and collecting boxes 402 are fixedly provided on both sides of the bottom of the auxiliary tube 3 . A slide plate is slidably provided on the front of the collecting box 402 , and a handle 403 is fixedly connected to the front of the slide plate.

[0023] An inclined plate is provided on one side of the collection box 402 , a sensing plate 406 is provided at the bottom of the collection box 402 , an alarm 414 is provided at the top of the collection box 402 , a sensor is provided at the bottom of the sensing plate 406 , and the sensor and the alarm 414 are electrically connected.

[0024] The heating structure 7 includes a support plate 704 , a guide wheel 703 is rotatably provided on the top of the support plate 704 , a universal shaft 706 is provided at the bottom of the guide wheel 703 , and the bottom of the universal shaft 706 penetrates the support plate 704 and extends to the outside of the support plate 704 .

[0025] There are two universal joints 406, and a control rod 705 is fixed between the opposite sides of the two universal joints 406. One side of the other universal joint 406 is fixedly connected to one side of the main gear 411. A heating plate 701 is provided on the outside of one side of the auxiliary pipe 3, and a conical ring 702 is provided on the top of one side of the inner wall of the auxiliary pipe 3.

[0026] A flange 8 is provided at the top of the auxiliary pipe 3, and a control panel 12 is rotatably provided inside the flange 8. Brackets 11 are fixedly provided on both sides of the bottom of the main pipe 2, and a connecting rod 9 is rotatably provided inside the bracket 11. One side of the connecting rod 9 passes through the flange 8 and extends to the inside of the flange 8.

[0027] One side of the connecting rod 9 is fixedly connected to one side of the control panel 12, and the other side of the connecting rod 9 is provided with a driven wheel 6. The top of the main pipe 2 is provided with a control valve 5, and the bottom of the control valve 5 is provided with a power wheel 10. The switch of the control valve 5 can control the rotation of the power wheel 10, and the power wheel 10 is meshed with the driven wheel 6.

[0028] The working principle and use process of the present invention are as follows: when using, the user first selects whether to use the hot and cold alternating method according to the type of exhaust gas, and then rotates the valve 5 when filtering is not needed. The valve 5 rotates to open and drives the power wheel 10 at the bottom to rotate. The power wheel 10 drives the driven wheels 6 on both sides to rotate through meshing. The driven wheel 6 rotates and drives the two control plates 12 to rotate and close through the connecting rod 9. After closing, the gas can only pass through the main rod 2 and will not pass through the auxiliary pipe 3. When filtering is needed, the heating plate 701 and the cooling plate 401 are controlled to open in advance, and then closed after opening. The main pipe 1 and both sides of the auxiliary pipe 3 are opened, and the gas enters from one side of the auxiliary pipe 3 and passes through the conical ring 702. The conical ring 702 allows the gas to be concentrated and pass through the top of the guide wheel 703. The guide wheel 703 starts to rotate when the airflow passes through it. The rotating guide wheel 703 allows the gas to be heated more evenly. After the gas is heated, it will come to the refrigeration area. After the gas is heated and cooled, the impurities in the gas will be deposited in the refrigeration area in the auxiliary pipe 3. The guide wheel 703 is still rotating at this time. The guide wheel 703 will drive the universal shaft 706 to rotate, and the universal shaft 706 will drive another universal shaft through the control rod 705. 706 rotates, the other universal shaft 706 will drive the main gear 411 to rotate, the main gear 411 will drive the two sub-gears 410 to rotate synchronously through meshing, the sub-gear 410 will drive the reciprocating screw 405 to rotate, the rotation of the reciprocating screw 405 will drive the cleaning ring 407 to move, the cleaning ring 407 will move along the inner wall of the sub-tube 3 to clean the impurities on the inner wall, the reciprocating screw 405 will also drive the impact ball 412 to rotate while rotating, the impact ball 412 will hit the inner wall of the sub-tube 3 to form vibration, the vibration will make the impurities attached to the tube wall looser and easier to clean, cleaning The impurities will move along the two sides of the auxiliary pipe 3 with the movement of the cleaning ring 407, and will fall into the collecting box 402 when it moves to the empty slot. When a certain amount of impurities are collected in the collecting box 402 for a long time, the induction plate 406 will move downward to make the alarm 414 sound an alarm. The user can then hold the handle 403 to slide the slide open, and after opening it, the impurities can be centrally processed. The gas that has been filtered and cleaned by alternating hot and cold impurities will be filtered again by the internal filter cartridge when passing through the second half of the auxiliary pipe 3, which greatly increases the efficient filtration of the gas.

[0029] The above embodiments are only exemplary embodiments of the present invention and are not intended to limit the present invention. The protection scope of the present invention is defined by the claims. Those skilled in the art may make various modifications or equivalent substitutions to the present invention within the essence and protection scope of the present invention, and such modifications or equivalent substitutions shall also be deemed to fall within the protection scope of the present invention.

Claims

1. A vacuum exhaust device for semiconductor coating with high efficiency filtration, comprising an exhaust device (1) and a main pipe (2), characterized in that: A secondary pipe (3) is provided at the bottom of the main pipe (2); the secondary pipe (3) is U-shaped; a heating structure (7) and a cooling structure (4) are provided inside the secondary pipe (3); the heating structure (7) and the cooling structure (4) are linked to each other; the heating structure (7) heats the airflow, and the cooling structure (4) cools the gas to form a temperature difference so that impurities are precipitated; The cooling structure (4) comprises a refrigeration plate (401), a control end (408) is provided at the top of the refrigeration plate (401), a fixed disk (409) is provided at one side of the inner wall of the auxiliary tube (3), a main gear (411) is rotatably provided at one side of the fixed disk (409), a secondary gear (410) is rotatably provided at the top and bottom of the main gear (411), the secondary gear (410) is meshed with the main gear (411), a reciprocating screw rod (405) is rotatably provided at one side of the secondary gear (410), and a cleaning ring (407) is slidably provided on the reciprocating screw rod (405).

2. The vacuum exhaust equipment for semiconductor coating with high efficiency filtration according to claim 1, characterized in that: The cleaning ring (407) is hollow, and the outer edge of the cleaning ring (407) is closely attached to the inner wall of the auxiliary tube (3). The cleaning ring (407) can move back and forth laterally along the reciprocating screw rod (405). A connecting plate (404) is provided on the other side of the inner wall of the auxiliary tube (3).

3. A vacuum exhaust device for semiconductor coating with high efficiency filtration according to claim 2, characterized in that: The top and bottom of one side of the connection disk (404) are both rotatably connected to one side of the reciprocating screw rod (405); a telescopic rod (413) is fixedly provided on one side of the top of the reciprocating screw rod (405); a spring is provided inside the telescopic rod (413); and an impact ball (412) is provided on the top of the telescopic rod (413); the impact ball (412) can impact the inside of the auxiliary tube (3) to generate vibration.

4. The vacuum exhaust equipment for semiconductor coating with high efficiency filtration according to claim 1, characterized in that: Slots are provided on both sides of the bottom of the auxiliary tube (3), and collection boxes (402) are fixedly provided on both sides of the bottom of the auxiliary tube (3). A slide plate is slidably provided on the front of the collection box (402), and a handle (403) is fixedly connected to the front of the slide plate.

5. The vacuum exhaust equipment for semiconductor coating with high efficiency filtration according to claim 4, characterized in that: An inclined plate is provided on one side of the collection box (402), a sensing plate (406) is provided at the bottom of the collection box (402), an alarm (414) is provided at the top of the collection box (402), and a sensor is provided at the bottom of the sensing plate (406), and the sensor is electrically connected to the alarm (414).

6. The vacuum exhaust equipment for semiconductor coating with high efficiency filtration according to claim 1, characterized in that: The heating structure (7) comprises a support plate (704), the top of which is rotatably provided with a guide wheel (703), the bottom of which is provided with a universal shaft (706), and the bottom of which passes through the support plate (704) and extends to the outside of the support plate (704).

7. A vacuum exhaust device for semiconductor coating with high efficiency filtration according to claim 6, characterized in that: There are two universal shafts (406), a control rod (705) is fixedly provided between opposite sides of the two universal shafts (406), one side of the other universal shaft (406) is fixedly connected to one side of the main gear (411), a heating plate (701) is provided on the outside of one side of the auxiliary pipe (3), and a conical ring (702) is provided on the top of one side of the inner wall of the auxiliary pipe (3).

8. The vacuum exhaust equipment for semiconductor coating with high efficiency filtration according to claim 1, characterized in that: A flange (8) is provided at the top of the secondary pipe (3), a control panel (12) is rotatably provided inside the flange (8), brackets (11) are fixedly provided on both sides of the bottom of the primary pipe (2), a connecting rod (9) is rotatably provided inside the bracket (11), and one side of the connecting rod (9) passes through the flange (8) and extends to the inside of the flange (8).

9. The vacuum exhaust equipment for semiconductor coating with high efficiency filtration according to claim 8, characterized in that: One side of the connecting rod (9) is fixedly connected to one side of the control panel (12), and the other side of the connecting rod (9) is provided with a driven wheel (6). A control valve (5) is provided at the top of the main pipe (2), and a power wheel (10) is provided at the bottom of the control valve (5). The switch of the control valve (5) can control the rotation of the power wheel (10), and the power wheel (10) is meshed with the driven wheel (6).

Images