Cleaning equipment

Abstract

The invention discloses cleaning equipment. The cleaning equipment comprises a cleaning tank, a protection part and a compressed air source; the protection part is arranged at the opening end of the cleaning tank, and the protection part is provided with a cavity and an air inlet communicated with the cavity; the compressed air source is connected with the air inlet; the protection part comprises an annular inner circumferential wall part, a plurality of air holes are formed in the inner circumferential wall part in the circumferential direction, the air holes are communicated with the cavity, and the protection part is configured in the mode that compressed air flowing into the cavity flows out through the air holes to form an air flow layer so as to cover the opening of the cleaning tank. Through structural optimization, the probability of secondary pollution during workpiece cleaning can be reduced, and the workpiece cleaning effect is improved.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor processing equipment, and in particular to a cleaning equipment. Background Art

[0002] In the semiconductor industry, cleaning is one of the important steps after cutting in the manufacturing process of workpieces (such as wafers, substrates, etc.). The purpose of cleaning is to prevent trace ions and waste or dust attached to the surface of the workpiece during cutting from contaminating the workpiece, so as to ensure the performance and qualified rate of the workpiece.

[0003] In the related art, the cleaning equipment is provided with a cleaning tank for accommodating workpieces. During cleaning, the workpieces are placed in the cleaning tank, and the opening of the cleaning tank is covered with a waterproof curtain to keep the workpieces in a relatively closed space, thereby preventing the cleaning mist from floating out of the cleaning tank and affecting other functional structures.

[0004] Among them, the waterproof curtain can be rolled up and can be unfolded or rolled up under the drive of the cylinder. During non-cleaning operations, the waterproof curtain can be in a rolled up state. At this time, the opening of the cleaning tank is not covered, which is convenient for loading or unloading workpieces. During cleaning operations, the waterproof curtain can be unfolded under the drive of the cylinder to cover the opening of the cleaning tank.

[0005] Although the above-mentioned cleaning equipment can prevent the cleaning water mist from floating out of the cleaning tank during the cleaning process, the scattered water mist will adhere to the inner surface of the waterproof curtain facing the cleaning tank during cleaning, and form a layer of water mist on the inner surface of the waterproof curtain. The water mist may be mixed with dust or waste splashed during the cleaning process. When the water mist attached to the inner surface of the waterproof curtain increases, water droplets will form. The water droplets may drip into the cleaning tank, or drip onto the cover body on which the waterproof curtain and the cylinder are installed and then drip into the cleaning tank along the inner wall of the cleaning tank. In this way, the cleaned workpiece may be secondarily contaminated by the dripping water droplets. Summary of the invention

[0006] The purpose of the present application is to provide a cleaning device which, through structural optimization, can reduce the probability of secondary contamination of a workpiece during cleaning and improve the cleaning effect of the workpiece.

[0007] In order to solve the above technical problems, the present application provides a cleaning device, including a cleaning tank, a protective member and a compressed gas source;

[0008] The protective member is arranged at the open end of the cleaning tank, and the protective member has a chamber and an air inlet communicated with the chamber; the compressed gas source is connected to the air inlet;

[0009] The protective member includes an annular inner wall portion, which is provided with a plurality of air holes along the circumferential direction. The air holes are connected to the chamber and are configured such that the compressed gas flowing into the chamber flows out through the plurality of air holes to form an air flow layer to cover the opening of the cleaning tank.

[0010] In one feasible solution, the chamber is a circular ring structure, the inner circumferential wall portion is an inner cavity wall forming the chamber, a plurality of pores are divided into at least one pore group, the plurality of pores in the pore group are evenly arranged along the circumference of the inner circumferential wall portion, and the plurality of pores in the pore group are at the same position in the axial direction of the chamber.

[0011] In a feasible solution, the pressure of the compressed gas flowing into the chamber is 0.4 MPa~0.7 MPa, and the aperture of the pores is 0.4 mm~0.6 mm.

[0012] In a feasible solution, in the pore group, the corresponding central angle between two adjacent pores is 1.5°~3°.

[0013] In a feasible solution, the central axis of the air hole passes through the center of the opening.

[0014] In a feasible solution, part of the circumferential wall of the cleaning tank forms the inner circumferential wall portion.

[0015] In one feasible solution, the cleaning device includes a cover body, which is connected to the cleaning tank and located on the side where the opening end is located. The cover body has a through hole connected to the opening, and the protective member is detachably fixed to the bottom surface of the cover body facing the cleaning tank.

[0016] In a feasible solution, the protective member includes a top wall portion and a bottom wall portion opposite to each other, the top wall portion is detachably connected to the cover body, and the air inlet is arranged on the bottom wall portion.

[0017] In a feasible solution, a pressure control element is provided on the connecting pipeline between the compressed gas source and the chamber, and the pressure control element is used to adjust the pressure value of the compressed gas.

[0018] In a feasible solution, a switch valve and / or a speed regulating valve is also provided on the connecting pipeline.

[0019] The cleaning device provided by the present application scheme can deliver compressed gas into the chamber of the protective member when cleaning the workpiece. The compressed gas entering the chamber can flow out through the air holes on the inner wall and form an air flow layer covering the opening of the cleaning tank. In this way, the air flow layer is used as a sealing layer to block the opening of the cleaning tank, so that the water mist sprayed by the nozzle during cleaning can be sealed in the cleaning chamber of the cleaning tank to prevent the water mist from overflowing outside the cleaning tank and causing damage to other related structures. At the same time, because the air flow layer serves as a sealing layer, it can prevent the water mist from accumulating to form water droplets, which can cause the water droplets to fall on the workpiece and cause secondary pollution. The structural setting of the cleaning device adopts an air-tight manner to seal the opening of the cleaning tank, which can reduce the probability of the workpiece being contaminated secondary during cleaning, which is beneficial to improving the cleaning effect of the workpiece. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 A schematic diagram of the structure of a cleaning device in one embodiment provided in the present application;

[0021] Figure 2 for Figure 1 A partial enlarged view of the middle I part;

[0022] Figure 3 for Figure 1 A schematic diagram of the structure of the middle protective part;

[0023] Figure 4 for Figure 3 a top view of the guard shown;

[0024] Figure 5 for Figure 4 Schematic diagram of the AA section;

[0025] Figure 6 for Figure 4 Schematic diagram of the cross section along the BB direction;

[0026] Figure 7 for Figure 3 a bottom view of the guard shown;

[0027] Figure 8 for Figure 7 Schematic diagram of the CC section;

[0028] Fig. 9 for Figure 4 Schematic diagram of the local structure;

[0029] Fig.10 It is a schematic diagram of the connection between the compressed gas source and the protective element in a specific embodiment.

[0030] Description of reference numerals:

[0031] Frame 11, cleaning tank 12, opening end 121, cover 13, through hole 131, cleaning table 14;

[0032] Protective element 20, chamber 201, inner peripheral wall portion 21, top wall portion 22, bottom wall portion 23, outer peripheral wall portion 24, air hole 25, air inlet 26, connecting seat 27, and extension wall portion 28;

[0033] Compressed gas source 31 , connecting pipeline 32 , pressure control element 33 , switch valve 34 , speed regulating valve 35 . DETAILED DESCRIPTION

[0034] In order to enable those skilled in the art to better understand the present application, the present application is further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0035] Please refer to Figure 1 , Figure 1 This is a schematic diagram of the structure of a cleaning device in an embodiment provided in the present application.

[0036] The cleaning equipment provided in this embodiment can be used in semiconductor processing equipment to clean the processed workpieces. For example, in wafer processing in the chip manufacturing process, the wafer after cutting is cleaned to prevent the semiconductor device from being contaminated by trace ions and waste or dust attached to the surface of the wafer after cutting, so as to ensure the performance and qualified rate of the semiconductor device.

[0037] The cleaning device includes a cleaning tank 12, and a cleaning table 14 is provided in the cleaning tank 12. The cleaning table 14 is used to fix the workpiece. In some embodiments, the cleaning table 14 has a suction cup member, and the workpiece is adsorbed by the suction cup member. The workpiece may include a workpiece body and a component that supports or fixes the workpiece body. For example, the workpiece body is a wafer, and the wafer can be fixed by an iron ring. In this case, the workpiece may include a wafer and an iron ring.

[0038] The cleaning equipment includes a lifting and rotating mechanism. The lifting and rotating mechanism can be used to drive the cleaning table 14 to rise or fall, so that it is convenient to raise the cleaning table 14 to the receiving position, that is, the position for receiving the workpiece, and it is also convenient to lower the cleaning table 14 to the cleaning position, that is, the position for cleaning the workpiece. The workpiece can be transferred between the cleaning position of the cleaning equipment and other positions of the semiconductor processing equipment through the transport arm. The lifting and rotating mechanism can also be used to drive the cleaning table 14 to rotate, so that during cleaning, the atomized cleaning medium can clean all areas of the workpiece, which is also convenient to ensure the cleaning effect of the workpiece.

[0039] The cleaning device includes a cleaning unit, which includes a supply pipeline and a nozzle disposed in the cleaning tank 12, and may also include a driving component and a transmission component. The driving component can drive the nozzle to reciprocate or swing back and forth in the cleaning tank 12 through the transmission component, so that the nozzle can spray atomized cleaning medium to a set area, and combined with the rotation of the cleaning table 14, all areas of the workpiece can be cleaned. Exemplarily, the cleaning unit can be a two-fluid unit, and the cleaning medium can include deionized water, etc.

[0040] The cleaning equipment may also include a liquid discharge pipe and an air extraction pipe, wherein the liquid discharge pipe can continuously discharge liquid to discharge the cleaned liquid through the liquid discharge pipe, and the air extraction pipe can continuously extract air to extract the water mist. The cleaning equipment may also include an air blowing pipe, which can be integrated with the nozzle of the cleaning unit, and the air blowing pipe can blow clean gas to the cleaned workpiece.

[0041] The aforementioned related structures of the cleaning equipment can be integrated on the frame 11. The arrangement of the aforementioned lifting and rotating mechanism, cleaning unit, drain pipe, exhaust pipe, and air blowing pipe and other structures can be implemented based on existing technologies. They are not the core of the invention of this application and are not described in detail here.

[0042] This article focuses on the improvement of the protective structure for sealing the cleaning tank 12 of the cleaning equipment, which is described in detail below with reference to the accompanying drawings.

[0043] Please refer to Figures 2 to 8 , Figure 2 for Figure 1 A partial enlarged view of the middle I part; Figure 3 for Figure 1 A schematic diagram of the structure of the middle protective part; Figure 4 for Figure 3 a top view of the guard shown; Figure 5 for Figure 4 Schematic diagram of the AA section; Figure 6 for Figure 4 Schematic diagram of the cross section along the BB direction; Figure 7 for Figure 3 a bottom view of the guard shown; Figure 8 for Figure 7 Schematic diagram of the CC section.

[0044] The cleaning tank 12 of the cleaning equipment has an open end 121, which is the end where the notch of the cleaning tank 12 is located. The cleaning tank 12 is open, which is convenient for transferring the workpiece to be cleaned to the cleaning table 14 and also convenient for taking the cleaned workpiece out of the cleaning table 14.

[0045] When cleaning the workpiece, the open end 121 of the cleaning tank 12 needs to be covered to prevent water mist from floating out of the cleaning tank 12 during cleaning and causing damage to other structures.

[0046] In this embodiment, the cleaning device includes a protective member 20 and a compressed air source 31 (indicated at Fig.10 middle).

[0047] The protective member 20 is arranged at the open end 121 of the cleaning tank 12. The protective member 20 has a chamber 201 and an air inlet 26 connected to the chamber 201. The air inlet 26 of the protective member 20 is connected to a compressed gas source 31, that is, the compressed gas source 31 can deliver compressed gas into the chamber 201 through the air inlet 26.

[0048] The protective member 20 includes an annular inner wall portion 21, and the inner wall portion 21 is circumferentially provided with a plurality of air holes 25, the air holes 25 are connected to the chamber 201, and are configured such that the compressed gas flowing into the chamber 201 flows out through the plurality of air holes 25 to form an air flow layer to cover the opening of the cleaning tank 12.

[0049] After the above arrangement, when the workpiece is placed on the cleaning table 14 of the cleaning tank 12 for cleaning, compressed gas can be sent into the chamber 201 of the protective member 20, and the compressed gas entering the chamber 201 can flow out through the air holes 25 of the inner wall portion 21 and form an air flow layer covering the opening of the cleaning tank 12. In this way, the air flow layer is used as a sealing layer to block the opening of the cleaning tank 12, so that the water mist sprayed by the nozzle during cleaning can be sealed in the cleaning cavity of the cleaning tank 12 to prevent the water mist from overflowing outside the cleaning tank 12 and causing damage to other related structures. At the same time, because the air flow layer serves as a sealing layer, it can prevent the water mist from accumulating to form water droplets, which causes the water droplets to fall on the workpiece and cause secondary pollution. The structural setting of the cleaning equipment adopts an air-tight manner to seal the opening of the cleaning tank 12, which can reduce the probability of the workpiece being contaminated for the second time during cleaning, which is beneficial to improving the cleaning effect of the workpiece.

[0050] In addition, the protective member 20 is installed at the open end 121 of the cleaning tank 12, and only the relevant pipeline connected to the compressed gas source 31 needs to be set. Compared with the existing protective structure composed of a cylinder and a waterproof curtain, it can reduce equipment cost and maintenance cost, and occupies less space.

[0051] The cross section of the cleaning tank 12 is usually circular. In some embodiments, the chamber 201 of the protective member 20 is a circular ring structure, and the inner peripheral wall portion 21 is a circular ring and serves as the inner wall of the chamber 201, so that the compressed air flowing into the chamber 201 can be ejected from the air hole 25 to form a circular airflow layer sealing surface with balanced force.

[0052] In a specific implementation, the multiple pores 25 of the inner peripheral wall portion 21 can be divided into at least one pore group, and the multiple pores 25 in one pore group are evenly arranged along the circumference of the inner peripheral wall portion 21, and the multiple pores 25 in one pore group are at the same position in the axial direction of the chamber 201. It can be understood that the multiple pores 25 in one pore group are at the same height. In this way, the gas ejected from the multiple pores 25 in one pore group can form a uniform airflow layer, and the airflow layer is in the same horizontal plane, which can have a better sealing effect on the cleaning tank 12.

[0053] In the illustrated example, all the air holes 25 of the inner peripheral wall portion 21 are divided into one air hole group to form one air flow layer.

[0054] In other embodiments, the inner wall portion 21 may also be provided with more than two air hole groups to form a multi-layer air flow layer, which is helpful to improve the sealing effect of the cleaning tank 12.

[0055] In other embodiments, the protective member 20 may also include more than two chambers 201 arranged along the axial direction of the cleaning tank 12, and the inner cavity wall corresponding to each chamber 201 has more than one pore group.

[0056] In practical applications, the number of chambers 201 and the number of pore groups of the protective member 20 can be set according to the sealing requirements of the cleaning tank 12, and are not limited here.

[0057] In some embodiments, the protective member 20 includes a top wall portion 22 and a bottom wall portion 23 opposite to each other, and also includes a peripheral wall portion 24, such as Figure 5 , Figure 6 and Figure 8 As shown, the top wall portion 22 , the bottom wall portion 23 , the inner peripheral wall portion 21 and the outer peripheral wall portion 24 together enclose a chamber 201 .

[0058] In a specific implementation, the cross-sectional shape of the chamber 201 may be a rectangle as shown in the figure.

[0059] For example, the rectangular cross-section of the chamber 201 may be 11 mm*9 mm in size. In this way, on the basis of conveniently charging and storing compressed gas, when the compressed gas is blown out from the air hole 25, the pressure is relatively balanced, which is conducive to forming an air flow layer for sealing. In addition, this size setting also facilitates the processing of the protective member 20.

[0060] Exemplarily, the protective member 20 may be made of stainless steel with a thickness of 1.5 mm, and the chamber 201 may be formed by bending and then welded at the joints, or by welding a plurality of plates.

[0061] The above-mentioned dimensions are only exemplary and can be adjusted according to actual needs in application.

[0062] In some embodiments, the inner peripheral wall portion 21 of the protective member 20 may be a portion of the peripheral wall of the cleaning tank 12, that is, a portion of the peripheral wall of the cleaning tank 12 serves as the inner peripheral wall portion 21 of the protective member 20. In this way, material costs can be saved and the space occupied by the protective member 20 can be reduced.

[0063] In a specific implementation, the top wall portion 22, the bottom wall portion 23 and the peripheral wall portion 24 of the protective member 20 can be processed to form an intermediate member with a substantially C-shaped cross section, and the intermediate member is then fixed to the peripheral wall of the cleaning tank 12 near the opening end 121 by welding or other means, so as to enclose and form the chamber 201. It can be understood that in this implementation, the air hole 25 of the protective member 20 is actually formed on the peripheral wall of the cleaning tank 12 near the opening end 121.

[0064] In some embodiments, the protective member 20 may also be a member independent of the cleaning tank 12, that is, the inner peripheral wall portion 21 of the protective member 20 is formed separately, and no part of the peripheral wall of the cleaning tank 12 is used. In this way, there is no need to process the cleaning tank 12 of the existing cleaning equipment, and the separately formed protective member 20 can be fixed to the open end 121 of the cleaning tank 12, which is convenient for improving the existing cleaning equipment.

[0065] In a specific implementation, the cleaning device includes a cover body 13, which is connected to the cleaning tank 12 and is located on the side where the opening end 121 is located. The cover body 13 has a through hole 131 connected to the opening of the cleaning tank 12, and the shape and size of the through hole 131 can be adapted to the opening of the cleaning tank 12.

[0066] The protection member 20 is detachably fixed to the bottom surface of the cover 13 facing the cleaning tank 12 .

[0067] Specifically, the top wall portion 22 of the protective member 20 is provided with a plurality of connecting seats 27 along the circumferential direction. The connecting seats 27 may be provided with threaded holes, and fasteners such as bolts or screws may be used to pass through the cover body 13 and threadedly connect with the threaded holes of the connecting seats 27 to achieve fixed connection between the protective member 20 and the cover body 13, thereby achieving indirect fixation of the protective member 20 and the cleaning tank 12.

[0068] In actual configuration, a plurality of connection seats 27 may be evenly arranged along the circumference of the protection member 20 to improve the connection reliability between the protection member 20 and the cover body 13 .

[0069] The connection seat 27 with threaded holes is arranged on the top wall portion 22 of the protective member 20. During installation, bolts or screws pass through the cover body 13 from above the cover body 13 and are threadedly connected with the connection seat 27, which is convenient for operation.

[0070] In the illustrated example, the top wall portion 22 of the protective member 20 is provided with four connection seats 27 along the circumferential direction, that is, there are four connection points between the protective member 20 and the cover body 13. In other embodiments, the number of connection seats 27 provided on the top wall portion 22 of the protective member 20 can be adjusted as needed.

[0071] The connection seat 27 can be provided separately and fixed to the top wall 22 by welding, so that the sealing is easily ensured and the air leakage of the chamber 201 of the protective member 20 is avoided. Of course, the connection seat 27 can also be provided as an integrally formed structure with the top wall 20.

[0072] The protective member 20 is connected to the cover body 13 in a detachable manner, which is conducive to the separate maintenance of the protective member 20. In other embodiments, the protective member 20 can also be connected to the cover body 13 in a non-detachable fixed manner.

[0073] refer to Figure 5 , Figure 5 The reference line L in the figure is a reference line at the same position in the axial direction of the protective member 20, and the plurality of air holes 25 of the protective member 20 are all located on the reference line L. When specifically set, a set distance d may be provided between the center of the air hole 25 and the top wall portion 22 of the protective member 20. Figure 2 Thus, there is a gap between the air hole 25 and the opening end surface of the cleaning tank 12 or the upper surface of the cover 13, and the compressed gas is ejected from the air hole 25 to form an air flow layer for sealing.

[0074] The set distance d can be set as needed, for example, it can be 6 mm.

[0075] In some embodiments, the protective member 20 may further include an extension wall portion 28 extending from the inner peripheral wall portion 21 toward the bottom of the cleaning tank 12. After the protective member 20 is installed, the extension wall portion 28 may extend into the cleaning tank 12, so that a gap between the protective member 20 and the cleaning tank 12 may be avoided, thereby preventing the sealing effect of the cleaning tank 12 from being affected.

[0076] In some embodiments, the air inlet 26 of the protective member 20 may be disposed on the bottom wall portion 23 .

[0077] In some embodiments, more than two air inlets 26 may be provided to allow the compressed gas to fill the chamber 201 of the protective element 20 more quickly.

[0078] In a specific implementation, after the protective member 20 is installed in the cleaning tank 12 , the center O of the protective member 20 coincides with the central axis of the cleaning tank 12 .

[0079] The central axis of the air hole 25 of the protective member 20 is arranged to pass through the center of the opening of the cleaning tank 12, so that the compressed air ejected from the air hole 25 is directed to the center of the opening of the cleaning tank 12, which is conducive to forming a uniform and sealable air flow layer.

[0080] Please refer to Fig. 9 and Fig.10 , Fig. 9 for Figure 4 Schematic diagram of the local structure; Fig.10 It is a schematic diagram of the connection between the compressed gas source and the protective element in a specific embodiment.

[0081] In some embodiments, the pressure of the compressed gas flowing into the chamber 201 of the protective member 20 is 0.4 MPa-0.7 MPa, and the diameter of the pores 25 is 0.4 mm-0.6 mm.

[0082] After the above arrangement, it has been verified that when the compressed gas is within the above pressure range and is ejected from the air holes 25 of the above aperture, the gas state is regular and the divergence is small, and a closed air flow plane is easily formed to ensure the sealing effect of the cleaning tank 12.

[0083] Specifically, in one pore group of the protective member 20 , the central angle β between two adjacent pores 25 may be set to be 1.5° to 3°.

[0084] Here, the central angle β between two adjacent air holes 25 can be referred to as Fig. 9 The chamber 201 of the protective member 20 is a circular ring structure, and the multiple pores 25 of a pore group are distributed on a circle with the center O of the protective member 20 as the center. The central angle β between two adjacent pores 25 refers to the central angle corresponding to the arc segment between the two adjacent pores 25.

[0085] With the above arrangement, the compressed gas ejected from each of the air holes 25 of the air hole group can more easily form an air flow layer for sealing.

[0086] For example, the central angle β between two adjacent air holes 25 may be 1.5°, 1.8°, 2°, 2.5°, 3°, etc., and may be set according to actual application requirements.

[0087] In some embodiments, a pressure control element 33 may be provided on the connecting pipe 32 between the compressed gas source 31 and the protective member 20. The pressure control element 33 is used to adjust the pressure value of the compressed gas flowing into the chamber 201 of the protective member 20. The operation is relatively convenient and can be applied to different application scenarios.

[0088] In a specific implementation, a switch valve 34 may be provided on the connecting pipeline 32 to open or close the connecting pipeline 32 so as to deliver compressed gas to the chamber 201 of the protective member 20 according to application requirements. For example, the switch valve 34 may be a solenoid valve or an electric control valve, which is conducive to automatic control.

[0089] In a specific implementation, a speed regulating valve 35 may be further provided on the connecting pipeline 32 , and the speed regulating valve 35 may be used to control the air flow speed of the compressed gas flowing into the chamber 201 .

[0090] Exemplarily, the compressed gas source 31 may be clean air or clean nitrogen, which has a low risk of contamination and can reduce secondary contamination of the workpiece.

[0091] Specific examples are used herein to illustrate the principles and implementation methods of the present application, and the description of the above embodiments is only used to help understand the method and core ideas of the present application. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of the present application, several improvements and modifications can be made to the present application, and these improvements and modifications also fall within the scope of protection of the claims of the present application.

Claims

1. Cleaning equipment, characterized in that, It comprises a cleaning tank (12), a protective element (20) and a compressed air source (31); The protective member (20) is disposed at the open end (121) of the cleaning tank (12), and the protective member (20) has a chamber (201) and an air inlet (26) communicating with the chamber (201); the compressed air source (31) is connected to the air inlet (26); The protective member (20) comprises an annular inner wall portion (21), wherein the inner wall portion (21) is provided with a plurality of air holes (25) along the circumferential direction, wherein the air holes (25) are connected to the chamber (201) and are configured such that the compressed gas flowing into the chamber (201) flows out through the plurality of air holes (25) to form an air flow layer to cover the opening of the cleaning tank (12).

2. The cleaning device according to claim 1, characterized in that: The chamber (201) is a circular ring structure, the inner circumferential wall portion (21) is an inner cavity wall forming the chamber (201), the plurality of pores (25) are divided into at least one pore group, the plurality of pores (25) in the pore group are evenly arranged along the circumference of the inner circumferential wall portion (21), and the plurality of pores (25) in the pore group are located at the same position in the axial direction of the chamber (201).

3. The cleaning device according to claim 2, characterized in that: The pressure of the compressed gas flowing into the chamber (201) is 0.4 MPa-0.7 MPa, and the diameter of the pores (25) is 0.4 mm-0.6 mm.

4. The cleaning device according to claim 3, characterized in that: In the pore group, the corresponding central angle between two adjacent pores (25) is 1.5° to 3°.

5. The cleaning device according to claim 2, characterized in that: The central axis of the air hole (25) passes through the center of the opening.

6. The cleaning device according to any one of claims 1 to 5, characterized in that: Part of the peripheral wall of the cleaning tank (12) forms the inner peripheral wall portion (21).

7. The cleaning device according to any one of claims 1 to 5, characterized in that: The cleaning device comprises a cover body (13), the cover body (13) is connected to the cleaning tank (12) and is located on the side where the opening end (121) is located, the cover body (13) has a through hole (131) connected to the opening, and the protective member (20) is detachably fixed to the bottom surface of the cover body (13) facing the cleaning tank (12).

8. The cleaning device according to claim 7, characterized in that: The protective member (20) comprises a top wall portion (22) and a bottom wall portion (23) which are opposite to each other; the top wall portion (22) is detachably connected to the cover body (13); and the air inlet (26) is arranged on the bottom wall portion (23).

9. The cleaning device according to any one of claims 1 to 5, characterized in that: A pressure control element (33) is provided on the connecting pipeline (32) between the compressed gas source (31) and the chamber (201), and the pressure control element (33) is used to adjust the pressure value of the compressed gas.

10. The cleaning device according to claim 9, characterized in that: The connecting pipeline (32) is also provided with a switch valve (34) and / or a speed regulating valve (35).

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