Dual-energy electron irradiation accelerator structure

Abstract

The embodiment of the present application provides a dual-energy electron irradiation accelerator structure, which comprises an accelerating tube, a klystron, an accelerating tube electron gun, a klystron electron gun, a first output assembly and a second output assembly. The accelerating tube is communicated with the klystron. The accelerating tube electron gun is arranged at one end of the accelerating tube. The klystron electron gun is arranged at one end of the klystron. The first output assembly is arranged at the other end of the accelerating tube and is used for outputting a first electron beam from the accelerating tube. The second output assembly is arranged at the other end of the klystron and is used for outputting a second electron beam from the klystron. The dual-energy electron irradiation accelerator structure of the embodiment of the present application has high utilization efficiency of the electron beam.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of irradiation, in particular to a dual-energy electron irradiation accelerator structure. BACKGROUND

[0002] In the related art, a high-energy electron irradiation accelerator uses a klystron to provide power for an accelerating tube to establish a microwave electric field to accelerate an electron beam. During the acceleration process, the speed of the electron beam and the phase velocity of the microwave need to be kept consistent to achieve synchronous acceleration, so the energy of the beam at the outlet of the accelerating tube can only be adjusted within a small range. The klystron uses the sparse and dense modulation of the electron beam to amplify the microwave signal of the excitation source. The power efficiency of the klystron cannot reach 100%, so there is still residual power at the outlet of the interaction section of the klystron. In the related art, a collector cooling structure is usually used to absorb the residual power of the electron beam, and the utilization efficiency of the electron beam is low. SUMMARY

[0003] Therefore, the main purpose of the embodiments of the present application is to provide a dual-energy electron irradiation accelerator structure with high utilization efficiency of the electron beam.

[0004] To achieve the above-mentioned purpose, the technical scheme of the embodiments of the present application is as follows:

[0005] The embodiments of the present application provide a dual-energy electron irradiation accelerator structure, which comprises:

[0006] an accelerating tube;

[0007] a klystron, the accelerating tube being in communication with the klystron;

[0008] an accelerating tube electron gun, the accelerating tube electron gun being arranged at one end of the accelerating tube;

[0009] a klystron electron gun, the klystron electron gun being arranged at one end of the klystron;

[0010] a first output assembly, the first output assembly being arranged at the other end of the accelerating tube for outputting a first electron beam from the accelerating tube;

[0011] a second output assembly, the second output assembly being arranged at the other end of the klystron for outputting a second electron beam from the klystron.

[0012] In an embodiment, the second output assembly comprises a deflector, at least part of the deflector being arranged at the end of the klystron away from the klystron electron gun, so as to deflect the emission direction of the second electron beam relative to the incidence direction of the second electron beam.

[0013] In one embodiment, the second electron beam is emitted from the deflection member in a direction consistent with the first electron beam.

[0014] In one embodiment, the klystron extends along a first direction, the klystron electron gun is disposed at a side of the klystron facing away from the first direction, the second output assembly includes two deflection members, the two deflection members are disposed symmetrically and spaced apart along a second direction, one of the two deflection members is disposed at an end of the klystron facing away from the klystron electron gun, so that the second electron beam is emitted in a direction opposite to the direction of incidence of the second electron beam; wherein the first direction is perpendicular to the second direction.

[0015] In one embodiment, the accelerator tube is parallel to the klystron, the accelerator tube electron gun is disposed at a side of the accelerator tube along the first direction, so that the second electron beam is emitted in a direction consistent with the first electron beam.

[0016] In one embodiment, the deflection member has a slit, and the second electron beam is emitted from the deflection member through the slit.

[0017] In one embodiment, the deflection member deflects the second electron beam by an angle of 270°; and / or,

[0018] The deflection member is an alpha magnet.

[0019] In one embodiment, the deflection member includes a magnet yoke and an excitation coil, the magnet yoke encloses a receiving cavity, and the excitation coil is disposed in the receiving cavity.

[0020] In one embodiment, the dual-energy electron irradiation accelerator structure further includes two scanning magnets, the two scanning magnets are respectively disposed at the exit of the first output assembly and the exit of the second output assembly.

[0021] In one embodiment, the dual-energy electron irradiation accelerator structure further includes a waveguide, the waveguide is in communication with the accelerator tube and the klystron, respectively; and / or,

[0022] The first electron beam is a high-energy electron beam; and / or,

[0023] The second electron beam is a low-energy electron beam.

[0024] The embodiment of the present application provides a dual-energy electron irradiation accelerator structure, which comprises an accelerating tube, a klystron, an accelerating tube electron gun, a klystron electron gun, a first output assembly and a second output assembly. The accelerating tube is communicated with the klystron. The accelerating tube electron gun is arranged at one end of the accelerating tube. The klystron electron gun is arranged at one end of the klystron. The first output assembly is arranged at the other end of the accelerating tube and is used for outputting a first electron beam from the accelerating tube. The second output assembly is arranged at the other end of the klystron and is used for outputting a second electron beam from the klystron. Thus, on the one hand, the dual-energy electron irradiation accelerator structure can realize high-energy and low-energy electron beam irradiation applications simultaneously, expands the application range of a single accelerator, reduces the introduction of multiple devices and reduces the construction cost. On the other hand, by arranging the second output assembly at the end of the klystron away from the klystron electron gun, the second output assembly utilizes the low-energy electron beam introduced by the klystron to perform low-energy irradiation, effectively improves the utilization efficiency of the low-energy electron beam and reduces the total power loss of the klystron. BRIEF DESCRIPTION OF DRAWINGS

[0025] Figure 1 FIG. 1 is a structural schematic diagram of a dual-energy electron irradiation accelerator structure according to an embodiment of the present application;

[0026] Figure 2 FIG. 2 is a structural schematic diagram of a deflector according to an embodiment of the present application;

[0027] Figure 3 FIG. 3 is a structural schematic diagram of an alpha magnet according to an embodiment of the present application;

[0028] Figure 4 FIG. 4 is a schematic diagram of a deflection magnetic induction intensity distribution of the alpha magnet according to an embodiment of the present application.

[0029] BRIEF DESCRIPTION OF DRAWINGS

[0030] 10, accelerating tube; 20, klystron; 30, accelerating tube electron gun; 40, klystron electron gun; 50, first output assembly; 60, second output assembly; 61, deflector; 61a, slit; 62, magnet yoke; 63, excitation coil; 70, scanning magnet; 80, waveguide. DETAILED DESCRIPTION

[0031] In the present application, the orientation or positional relationship of the "first direction" and the "second direction" is based on the orientation or positional relationship shown in the drawings. Figure 1 It should be understood that these orientation terms are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application.

[0032] The embodiment of the present application provides a dual-energy electron irradiation accelerator structure, please refer toFigure 1 The dual-energy electron irradiation accelerator structure includes an acceleration tube 10, a klystron 20, an acceleration tube electron gun 30, a klystron electron gun 40, a first output assembly 50, and a second output assembly 60.

[0033] The acceleration tube 10 is in communication with the klystron 20.

[0034] The acceleration tube electron gun 30 is disposed at one end of the acceleration tube 10.

[0035] The klystron electron gun 40 is disposed at one end of the klystron 20.

[0036] The first output assembly 50 is disposed at the other end of the acceleration tube 10 for outputting a first electron beam from the acceleration tube 10.

[0037] The second output assembly 60 is disposed at the other end of the klystron 20 for outputting a second electron beam from the klystron 20.

[0038] Specifically, the acceleration tube 10 refers to a component capable of accelerating an electron beam using an electric field to accelerate electrons from a lower energy to a higher energy.

[0039] The klystron 20 refers to a microwave electron tube capable of generating high-frequency power.

[0040] The klystron 20 provides microwave energy to the acceleration tube 10, and generates microwaves of a specific frequency and power by interaction of an internal electron beam with a high-frequency electromagnetic field, driving the acceleration process of the acceleration tube 10 on electrons.

[0041] The klystron 20 is in communication with the acceleration tube 10 so that the microwave energy generated by the klystron 20 is transferred into the acceleration tube 10.

[0042] The communication of the klystron 20 with the acceleration tube 10 is not limited.

[0043] Illustratively, the dual-energy electron irradiation accelerator structure further includes a waveguide 80 in communication with the acceleration tube 10 and the klystron 20, respectively. Thereby, it is possible to reduce the loss of the high-frequency microwave energy in the klystron 20 during the transfer to the acceleration tube 10.

[0044] The acceleration tube electron gun 30 and the klystron electron gun 40 refer to components capable of generating an electron beam.

[0045] The klystron 20 performs density modulation on the electron beam generated by the klystron electron gun 40, and the modulated electron beam is output through the second output assembly 60 for low-energy irradiation.

[0046] The first output assembly 50 refers to a component for guiding and outputting a first electron beam from the acceleration tube 10.

[0047] The second output assembly 60 refers to components for guiding and outputting the second electron beam from the klystron 20.

[0048] The kind of the first electron beam is not limited.

[0049] For example, the first electron beam is a high-energy electron beam.

[0050] The kind of the second electron beam is not limited.

[0051] For example, the second electron beam is a low-energy electron beam.

[0052] The accelerator tube electron gun 30 generates electrons accelerated to a megavolt energy in the accelerator tube 10, and outputs a high-energy electron beam through the first output assembly 50. The klystron electron gun 40 generates electrons, part of which is converted into microwave power through the modulation of the interaction section of the klystron 20, fed into the accelerator tube 10 through the waveguide 80 to establish a microwave electric field in the accelerator tube 10 to accelerate the high-energy electron beam, and the other part of the remaining power is output as a low-energy electron beam through the second output assembly 60, thereby realizing an accelerator structure that simultaneously realizes high-energy and low-energy electron beam irradiation applications.

[0053] An embodiment of the present application provides a dual-energy electron irradiation accelerator structure, which comprises an accelerator tube 10, a klystron 20, an accelerator tube electron gun 30, a klystron electron gun 40, a first output assembly 50, and a second output assembly 60. The accelerator tube 10 is in communication with the klystron 20. The accelerator tube electron gun 30 is arranged at one end of the accelerator tube 10. The klystron electron gun 40 is arranged at one end of the klystron 20. The first output assembly 50 is arranged at the other end of the accelerator tube 10 for outputting a first electron beam from the accelerator tube 10. The second output assembly 60 is arranged at the other end of the klystron 20 for outputting a second electron beam from the klystron 20. In this way, on the one hand, the dual-energy electron irradiation accelerator structure can simultaneously realize high-energy and low-energy electron beam irradiation applications, expand the application range of a single accelerator, reduce the introduction of multiple devices, and reduce the construction cost. On the other hand, by arranging the second output assembly 60 at the end of the klystron 20 away from the klystron electron gun 40, the second output assembly 60 uses the low-energy electron beam led out by the klystron 20 for low-energy irradiation, effectively improves the utilization efficiency of the low-energy electron beam, and reduces the overall power loss of the klystron 20.

[0054] In an embodiment, refer to Figure 1 and Figure 2The second output assembly includes a deflection member 61, at least a partial region of the deflection member 61 is arranged at an end of the klystron 20 away from the klystron electron gun 40, so as to deflect the emission direction of the second electron beam relative to the incidence direction of the second electron beam. Thus, by changing the emission direction of the second electron beam through the deflection member 61, the irradiation direction of the second electron beam can be controlled, so that the target object can be accurately irradiated.

[0055] Specifically, when the second electron beam passes through the deflection member 61, the emission direction of the second electron beam will change relative to the incidence direction.

[0056] The deflection member 61 refers to a component capable of changing the movement direction of the second electron beam.

[0057] The angle at which the deflection member 61 deflects the second electron beam is determined according to actual conditions.

[0058] For example, the angle at which the deflection member 61 deflects the second electron beam is 270°.

[0059] The number of deflection members 61 is not limited.

[0060] For example, the number of deflection members 61 is one or more. Thus, by adjusting the deflection angle of the deflection member 61, the emission direction of the second electron beam can be flexibly adjusted according to different irradiation targets and working conditions.

[0061] The structure type of the deflection member 61 is not limited. As long as it can change the emission direction of the second electron beam.

[0062] For example, the deflection member 61 is an alpha magnet.

[0063] For example, after the electron beam generated by the klystron electron gun 40 passes through the interaction section of the klystron 20 and is modulated, the beam current divergence of the second electron beam becomes large. When the second electron beam passes through the deflection member 61, the beam current divergence will cause the beam to diverge. Thus, the deflection member 61 further includes a dispersion elimination structure, which realizes dispersion elimination deflection of the second electron beam through pole face function optimization, so that the maximum value of the dispersion curve is at the center position of the deflection member 61, and thus the dispersion elimination deflection is realized from the overall perspective.

[0064] In an embodiment, please refer to Figure 1 and Figure 2 The deflection member 61 cooperates with the accelerating tube 10, so that the emission direction of the second electron beam is consistent with the emission direction of the first electron beam. Thus, when performing irradiation operation, only one direction needs to be aimed and controlled, and different irradiation directions of different energy electron beams do not need to be considered separately, thereby simplifying the operation process during irradiation.

[0065] Specifically, the matching of the deflection member 61 and the acceleration tube 10 refers to that, according to the direction of the first electron beam output by the acceleration tube 10, the deflection member 61 is adjusted so that the deflection of the second electron beam output by the klystron 20 through the deflection member 61 is consistent with the direction of the first electron beam.

[0066] In an embodiment, referring to Figure 1 , Figure 2 and Figure 4 , the klystron 20 extends along a first direction, the klystron electron gun 40 is arranged at a side of the klystron 20 away from the first direction, and the second output assembly 60 includes two deflection members 61, the two deflection members 61 are arranged symmetrically and spaced apart along a second direction, one of the two deflection members 61 is arranged at an end of the klystron 20 away from the klystron electron gun 40, so that the direction of the second electron beam is opposite to the direction of the second electron beam; wherein the first direction is perpendicular to the second direction. Thus, the second electron beam modulated by the klystron 20 is deflected out through the deflection member 61 arranged at the end of the klystron 20 away from the klystron electron gun 40, and the deflected second electron beam is deflected through the other deflection member 61, so that the direction of the second electron beam is opposite to the direction of the second electron beam, thereby enabling the second electron beam to accurately irradiate the target object.

[0067] Specifically, the klystron electron gun 40 is arranged at a side of the klystron 20 away from the first direction refers to that the klystron 20 extends along the first direction, and the klystron electron gun 40 is arranged at the bottom of the klystron 20.

[0068] One of the two deflection members 61 is arranged at an end of the klystron 20 away from the klystron electron gun 40 refers to that the klystron 20 extends along the first direction, and one of the two deflection members 61 is arranged at the top of the klystron 20.

[0069] It can be understood that the klystron electron gun 40 and one of the two deflection members 61 are arranged at opposite ends of the klystron 20, respectively.

[0070] The second electron beam modulated by the klystron 20 is emitted along the first direction, deflected out through one of the two deflection members 61, so that the second electron beam moves along the second direction, and the deflected second electron beam is deflected through the other deflection member 61, so that the second electron beam moves along a direction opposite to the first direction, thereby making the direction of the second electron beam opposite to the direction of the second electron beam.

[0071] The two deflection members 61 are spaced apart and symmetrically arranged along the second direction means that the two deflection members 61 are symmetrically arranged along the center line of the distance between the two deflection members 61 in the second direction. That is, after the second electron beam is deflected by a certain angle by the first deflection member 61, the second deflection member 61 can perform a reverse and complementary deflection on the electron beam due to the symmetric position relationship of the second deflection member 61.

[0072] Exemplarily, the deflection angle of the two deflection members 61 on the electron beam is 270°, the second electron beam modulated by the klystron 20 is emitted along the first direction to the first deflection member 61, the first deflection member 61 deflects the second electron beam by 270° to be emitted, and the emitted second electron beam is emitted along the second direction to the second deflection member 61. The second deflection member 61 again deflects the second electron beam by 270°, so that the second electron beam is emitted away from the first direction. Thus, the emission direction of the second electron beam is opposite to the emission direction of the second electron beam.

[0073] In an embodiment, referring to Figure 1 and Figure 2 The acceleration tube 10 is parallel to the klystron 20, and the acceleration tube electron gun 30 is arranged at one side of the acceleration tube 10 along the first direction, so that the emission direction of the second electron beam is consistent with the emission direction of the first electron beam. Thus, during the irradiation operation, only one direction needs to be aimed and controlled, and different irradiation directions of different energy electron beams do not need to be considered respectively, thereby simplifying the operation process during irradiation.

[0074] Specifically, the acceleration tube electron gun 30 is arranged at one side of the acceleration tube 10 along the first direction means that the acceleration tube 10 extends along the first direction, and the acceleration tube electron gun 30 is arranged at the top of the acceleration tube 10. The emission direction of the first electron beam is opposite to the first direction.

[0075] The emission direction of the second electron beam in the klystron 20 is the same as the first direction, and after being deflected by the deflection member 61, the emission direction of the second electron beam through the second output assembly 60 is opposite to the first direction. That is, the emission direction of the first electron beam output through the first output assembly 50 is the same as the emission direction of the second electron beam output through the second output assembly 60.

[0076] In an embodiment, referring to Figure 2 The deflection member 61 has a slit 61a, and the second electron beam is emitted from the deflection member 61 through the slit 61a. Thus, the energy of the beam current of the second electron beam is selected by the selection function of the slit 61a, so as to adjust the energy spread distribution of the second electron beam, and control the irradiation process and penetration depth of the second electron beam.

[0077] Specifically, the slit 61a means a narrow and long aperture in the deflection member 61, and the width of the aperture is adjustable.

[0078] The size and shape of the slit 61a are not limited. As long as the second electron beam can pass through and be screened, it is acceptable.

[0079] The position where the slit 61a is arranged is not limited.

[0080] For example, the slit 61a is arranged at the position of the maximum beam current spread of the second electron beam. In this way, the mutual collision and interference between the particles in the beam current of the second electron beam can be reduced, thereby reducing the probability of energy loss and scattering and improving the quality and stability of the beam current of the second electron beam.

[0081] In an embodiment, referring to Figure 2 and Figure 3 the deflection member 61 includes a magnet yoke 62 and an excitation coil 63, the magnet yoke 62 is enclosed to form a receiving cavity, and the excitation coil 63 is arranged in the receiving cavity. In this way, the strength and direction of the generated magnetic field are adjusted by adjusting the current intensity of the excitation coil 63, so as to adjust the beam current track of the second electron beam to achieve the transmission and matching of the beam current of the second electron beam.

[0082] Specifically, the position of the excitation coil 63 is not limited. For example, the excitation coil 63 is arranged on the side of the receiving cavity close to the magnet yoke 62.

[0083] The number of excitation coils 63 is not limited, which can be one or two or more.

[0084] For example, two excitation coils 63 are arranged on opposite sides of the receiving cavity close to the magnet yoke 62. In this way, the beam current track of the second electron beam entering the magnetic field is adjusted by adjusting the current intensity of the two excitation coils 63 respectively to adjust the magnetic field strength between the excitation coils 63.

[0085] In an embodiment, referring to Figure 1 the dual-energy electron irradiation accelerator structure further includes two scanning magnets 70, and the two scanning magnets 70 are arranged at the exit of the first output assembly 50 and the exit of the second output assembly 60, respectively. In this way, the beam current of the first electron beam and the beam current of the second electron beam are periodically scanned by the scanning magnets 70, thereby achieving uniform irradiation of the goods.

[0086] In the description of the application, the description of the terms "in an embodiment", "in some embodiments", "in a specific embodiment", or "exemplary" and the like means that the particular feature, structure, material or characteristic being described is included in at least one embodiment or example of the application. The illustrative appearances of the above-mentioned terms in various places in the specification are not necessarily referring to the same embodiment or example. Furthermore, the particular features, structures, materials or characteristics can be combined in any suitable manner in one or more embodiments or examples. Moreover, the terminology used has been chosen for the purpose of clarity based on the understanding that the technology is liable to be subject to change and modification.

[0087] The preferred embodiments of the application are described above in detail. The application is not limited to the embodiments described above, but can be modified and changed by those skilled in the art without departing from the spirit and principle of the application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the application shall be included in the scope of the protection of the application.

Claims

1. A dual-energy electron irradiation accelerator structure, characterized by, The double-energy electron irradiation accelerator structure comprises: an accelerating tube; a klystron in communication with the accelerating tube; an accelerating tube electron gun arranged at one end of the accelerating tube; a klystron electron gun arranged at one end of the klystron; a first output assembly arranged at the other end of the accelerating tube for outputting a first electron beam from the accelerating tube; a second output assembly arranged at the other end of the klystron for outputting a second electron beam from the klystron.

2. The dual-energy electron irradiation accelerator structure of claim 1, wherein, The second output assembly comprises a deflector, at least a part of the deflector being arranged at the end of the klystron away from the klystron electron gun to deflect the exit direction of the second electron beam relative to the entrance direction of the second electron beam.

3. The dual-energy electron irradiation accelerator structure of claim 2, wherein, The deflector cooperates with the accelerating tube to make the exit direction of the second electron beam consistent with the exit direction of the first electron beam.

4. Dual-energy electron irradiation accelerator structure according to claim 2 or 3, characterized in that The klystron extends in a first direction, the klystron electron gun is arranged at the side of the klystron away from the first direction, the second output assembly comprises two deflectors, the two deflectors are arranged symmetrically and spaced apart in a second direction, one of the two deflectors is arranged at the end of the klystron away from the klystron electron gun to make the exit direction of the second electron beam opposite to the entrance direction of the second electron beam; wherein the first direction is perpendicular to the second direction.

5. The dual-energy electron irradiation accelerator structure of claim 4, wherein, The accelerating tube is parallel to the klystron, the accelerating tube electron gun is arranged at the side of the accelerating tube along the first direction to make the exit direction of the second electron beam consistent with the exit direction of the first electron beam.

6. The dual-energy electron irradiation accelerator structure of claim 2, wherein, The deflector has a slit, the second electron beam passes through the slit and exits from the deflector.

7. Dual-energy electron irradiation accelerator structure according to claim 2 or 3, characterized in that The deflector deflects the second electron beam by an angle of 270°; and / or The deflector is an alpha magnet.

8. The dual-energy electron irradiation accelerator structure of claim 2 or 3, wherein, The deflector comprises a magnet yoke and an excitation coil, the magnet yoke encloses a receiving cavity, and the excitation coil is arranged in the receiving cavity.

9. The dual-energy electron irradiation accelerator structure of any of claims 1-3, wherein, The double-energy electron irradiation accelerator structure further comprises two scanning magnets, the two scanning magnets are respectively arranged at the exit of the first output assembly and the exit of the second output assembly.

10. The dual-energy electron irradiation accelerator structure of any of claims 1-3, wherein, The double-energy electron irradiation accelerator structure further comprises a waveguide in communication with the accelerating tube and the klystron; and / or The first electron beam is a high-energy electron beam; and / or The second electron beam is a low-energy electron beam.

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