Preparation method of solar cell and solar cell
By using the atomic layer deposition method to form a plurality of spaced passivation layers and a dense first carrier transport layer in the solar cell, the problem of poor conductivity caused by dense passivation layers is solved, and faster charge transport and better conductivity are achieved.
Patent Information
- Application Number
- CN202510010565.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-03
- Publication Date
- 2025-04-11
AI Technical Summary
In the prior art, the passivation layer in the solar cell is usually a dense layer, resulting in poor conductivity of the solar cell.
A plurality of passivation layers disposed at intervals are formed on a portion of the exposed surface of the perovskite layer away from the substrate by atomic layer, and a first carrier transport layer is formed on the exposed surface of the plurality of passivation layers away from the substrate and on the remaining portion of the exposed surface of the perovskite layer away from the substrate.
By forming a porous passivation layer and a dense first carrier transport layer, the fast charge transfer is ensured and the conductivity of the solar cell is improved.
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Figure CN119816166A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of semiconductor technology, and in particular to a method for preparing a solar cell and a solar cell. Background Art
[0002] Perovskite cells can be combined with crystalline silicon cells to form stacked cells. The current mainstream perovskite / silicon stacked cells are pin-type perovskite cells prepared on crystalline silicon cells. The upper part of the perovskite is often an organic amine salt / C60 / tin oxide / transparent conductive metal oxide / silver structure. Among them, the organic amine salt plays a role in passivating the perovskite / C60 interface, C60 and tin oxide play a role in transmitting electrons, and the transparent conductive metal oxide / silver plays a role in collecting and exporting electrons. However, the light and thermal stability of organic amine salts is insufficient, and C60 will have obvious parasitic absorption.
[0003] In the prior art, the passivation layer in the solar cell is usually a dense passivation layer, which results in poor conductivity of the solar cell.
[0004] The above information disclosed in the background technology section is only used to enhance the understanding of the background technology of the technology described in this article. Therefore, the background technology may contain certain information that does not form the prior art known in this country for those skilled in the art. Summary of the invention
[0005] The main purpose of the present application is to provide a method for preparing a solar cell and a solar cell, so as to solve the problem in the prior art that the passivation layer in the solar cell is usually a dense passivation layer, resulting in poor conductivity of the solar cell.
[0006] In order to achieve the above-mentioned purpose, according to one aspect of the present application, a method for preparing a solar cell is provided, comprising: providing a substrate; forming a perovskite layer on one side of the substrate; forming a plurality of spaced-apart passivation layers on a partially exposed surface of the perovskite layer away from the substrate by atomic layer deposition; forming a first carrier transport layer on the exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surface of the perovskite layer away from the substrate by atomic layer deposition.
[0007] Optionally, forming a plurality of spaced-apart passivation layers on a partially exposed surface of the perovskite layer away from the substrate comprises: forming a plurality of spaced-apart passivation layers on a partially exposed surface of the perovskite layer away from the substrate within a temperature range of 20°C-100°C.
[0008] Optionally, after providing the substrate and before forming the perovskite layer on one side of the substrate, the method further includes: forming a first transparent conductive layer on the surface of the substrate; forming a second carrier transport layer on an exposed surface of the first transparent conductive layer away from the substrate, and forming the perovskite layer on one side of the substrate, including: forming the perovskite layer on the exposed surface of the second carrier transport layer.
[0009] Optionally, after forming a first carrier transport layer on the exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surface of the perovskite layer away from the substrate, the method further includes: forming a second transparent conductive layer on the exposed surface of the first carrier transport layer away from the substrate; and forming a plurality of spaced-apart metal electrode layers on the partially exposed surface of the second transparent conductive layer away from the substrate.
[0010] Optionally, forming a first carrier transport layer on the exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surface of the perovskite layer away from the substrate comprises: forming an electron transport layer on the exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surface of the perovskite layer away from the substrate, wherein the material of the electron transport layer and the material of the passivation layer independently comprise inorganic materials.
[0011] Optionally, forming a second carrier transport layer on an exposed surface of the first transparent conductive layer away from the substrate comprises: forming a hole transport layer on an exposed surface of the first transparent conductive layer away from the substrate, wherein the material of the passivation layer comprises Al 2 O 3 and / or SiO x The material of the electron transport layer includes SnO 2 、TiO 2 and Nb 2 O 5 At least one of.
[0012] According to another aspect of the present application, a solar cell is provided, which is prepared by any one of the methods for preparing a solar cell, and comprises: a substrate; a perovskite layer, located on one side of the substrate; a plurality of passivation layers arranged at intervals, located on a portion of the surface of the perovskite layer away from the substrate; and a first carrier transport layer, located on the surfaces of the plurality of passivation layers away from the substrate and on the remaining portion of the surface of the perovskite layer away from the substrate.
[0013] Optionally, the solar cell further includes: a first transparent conductive layer located between the substrate and the perovskite layer; and a second carrier transport layer located between the first transparent conductive layer and the perovskite layer.
[0014] Optionally, the solar cell further comprises: a second transparent conductive layer located on a surface of the first carrier transport layer away from the substrate; and a plurality of spaced-apart metal electrode layers located on a portion of the surface of the second transparent conductive layer away from the substrate.
[0015] Optionally, the first carrier transport layer is an electron transport layer, the second carrier transport layer is a hole transport layer, and the material of the electron transport layer and the material of the passivation layer independently include inorganic materials.
[0016] Using the technical solution of the present application, first a substrate is provided, then a perovskite layer is formed on one side of the substrate, and then a plurality of passivation layers are formed on the partially exposed surface of the perovskite layer away from the substrate by atomic layer deposition. Finally, a first carrier transport layer is formed on the exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surfaces of the perovskite layer away from the substrate by atomic layer deposition. Compared with the problem that the passivation layer in the solar cell in the prior art is usually a dense passivation layer, which leads to poor conductivity of the solar cell, the present application adopts an atomic layer deposition method to prepare a plurality of passivation layers (i.e., a porous passivation layer) and a dense first carrier transport layer, so that the first carrier transport layer is located on a portion of the perovskite layer, which ensures faster charge transfer and better conductivity of the solar cell. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] The drawings constituting part of the present application are used to provide a further understanding of the present application. The exemplary embodiments and descriptions of the present application are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings:
[0018] Figure 1 A schematic diagram of a process for preparing a solar cell provided in accordance with an embodiment of the present application is shown;
[0019] Figure 2 A schematic cross-sectional structure diagram of a solar cell provided according to an embodiment of the present application is shown.
[0020] The above drawings include the following reference numerals:
[0021] 10. Substrate; 11. Perovskite layer; 12. Passivation layer; 13. First carrier transport layer; 14. First transparent conductive layer; 15. Second carrier transport layer; 16. Second transparent conductive layer; 17. Metal electrode layer; 18. Electron transport layer; 19. Hole transport layer. DETAILED DESCRIPTION
[0022] It should be noted that the following detailed descriptions are illustrative and are intended to provide further explanation of the present application. Unless otherwise specified, all technical and scientific terms used herein have the same meanings as those commonly understood by those skilled in the art to which the present application belongs.
[0023] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.
[0024] It should be understood that when an element (such as a layer, film, region, or substrate) is described as being "on" another element, the element may be directly on the other element, or there may be intermediate elements. Moreover, in the specification and claims, when an element is described as being "connected" to another element, the element may be "directly connected" to the other element, or "connected" to the other element through a third element.
[0025] As introduced in the background technology, the passivation layer in the solar cell in the prior art is usually a dense passivation layer, which leads to poor conductivity of the solar cell. To solve the above problem, the embodiments of the present application provide a method for preparing a solar cell and a solar cell.
[0026] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the accompanying drawings in the embodiments of the present invention.
[0027] Figure 1 FIG. 1 is a flow chart of a method for preparing a solar cell according to an embodiment of the present application. Figure 1 As shown, the method comprises the following steps:
[0028] Step S101, as Figure 2 As shown, a substrate 10 is provided;
[0029] Step S102, as Figure 2 As shown, a perovskite layer 11 is formed on one side of the substrate 10;
[0030] Step S103, as Figure 2 As shown, a plurality of passivation layers 12 arranged at intervals are formed on the partially exposed surface of the perovskite layer 11 away from the substrate by using an atomic layer deposition method;
[0031] Step S104, as Figure 2As shown, the first carrier transport layer 13 is formed on the exposed surfaces of the plurality of passivation layers 12 away from the substrate 10 and the remaining exposed surface of the perovskite layer 11 away from the substrate 10 by using the atomic layer deposition method.
[0032] Through this embodiment, a substrate is first provided, and then a perovskite layer is formed on one side of the substrate, and then a plurality of passivation layers are formed on the partially exposed surface of the perovskite layer away from the substrate by atomic layer deposition, and finally a first carrier transport layer is formed on the exposed surface of the plurality of passivation layers away from the substrate and the remaining exposed surface of the perovskite layer away from the substrate by atomic layer deposition. Compared with the problem that the passivation layer in the solar cell in the prior art is usually a dense passivation layer, which leads to poor conductivity of the solar cell, the present application adopts an atomic layer deposition method to prepare and form a plurality of passivation layers (i.e., a porous passivation layer) and a dense first carrier transport layer, so that the first carrier transport layer is located on a portion of the perovskite layer, which ensures faster charge transfer and better conductivity of the solar cell.
[0033] Specifically, Figure 2 As shown, the plurality of passivation layers 12 are arranged at intervals along a predetermined direction, and the predetermined direction is a direction perpendicular to the thickness of the substrate 10 .
[0034] Specifically, the substrate is a crystalline silicon bottom cell; in the perovskite layer, the cations include but are not limited to Cs, FA and MA, and the anions include but are not limited to Cl, Br and I.
[0035] In an optional solution, a plurality of passivation layers are formed at intervals on the partially exposed surface of the perovskite layer away from the substrate, including: forming a plurality of the passivation layers at intervals on the partially exposed surface of the perovskite layer away from the substrate within a temperature range of 20°C-100°C. In this embodiment, a plurality of passivation layers (i.e., porous passivation layers) are prepared at low temperature (i.e., a temperature range of 20°C-100°C), which ensures that the passivation layer has a good porous effect, further ensures that the conductivity of the solar cell is good, and also reduces the damage caused by high temperature to the perovskite material.
[0036] In other embodiments, Figure 2As shown, after providing the substrate 10, before forming the perovskite layer 11 on one side of the substrate 10, the method further includes: forming a first transparent conductive layer 14 on the surface of the substrate 10; forming a second carrier transport layer 15 on the exposed surface of the first transparent conductive layer 14 away from the substrate 10, and forming the perovskite layer 11 on one side of the substrate 10, including: forming the perovskite layer 11 on the exposed surface of the second carrier transport layer 15. In this embodiment, the addition of the first transparent conductive layer can improve the conductivity of the substrate, facilitate the collection and transmission of charges, and thus further improve the overall performance of the solar cell. The formation of the second carrier transport layer helps to optimize the charge transmission path, so that electrons and holes can be more effectively transmitted to the corresponding electrodes, reducing charge loss.
[0037] Specifically, the material of the first transparent conductive layer includes but is not limited to ITO, IZO, AZO and n / p polySi.
[0038] Some other options, such as Figure 2 As shown, after forming the first carrier transport layer 13 on the exposed surfaces of the plurality of passivation layers 12 away from the substrate 10 and the remaining exposed surfaces of the perovskite layer 11 away from the substrate 10, the method further includes: forming a second transparent conductive layer 16 on the exposed surface of the first carrier transport layer 13 away from the substrate 10; and forming a plurality of spaced metal electrode layers 17 on the partially exposed surface of the second transparent conductive layer 16 away from the substrate 10. In this embodiment, by forming the second transparent conductive layer on the first carrier transport layer, the photoelectric conversion efficiency of the battery can be further optimized, and by forming a plurality of spaced metal electrode layers on the second transparent conductive layer, the carriers can be effectively collected and transported, and the resistance loss can be reduced, thereby further improving the conductivity and overall performance of the battery.
[0039] Specifically, Figure 2 As shown, the plurality of metal electrode layers 17 are spaced apart along the predetermined direction. In the embodiment of the present application, there are two metal electrode layers 17 .
[0040] Specifically, the material of the second transparent conductive layer includes but is not limited to ITO and IZO, and the material of the metal electrode layer includes but is not limited to Au, Ag, Cu and Al.
[0041] In some exemplary embodiments, Figure 2As shown, a first carrier transport layer 13 is formed on the exposed surfaces of the plurality of passivation layers 12 away from the substrate 10 and the remaining exposed surfaces of the perovskite layer 11 away from the substrate 10, including: forming an electron transport layer 18 on the exposed surfaces of the plurality of passivation layers 12 away from the substrate 10 and the remaining exposed surfaces of the perovskite layer 11 away from the substrate 10, wherein the material of the electron transport layer 18 and the material of the passivation layer 12 independently include inorganic materials. In this embodiment, the material of the passivation layer includes inorganic materials and no longer contains carbon sixty, which ensures that the stability of the passivation layer is good, and the material of the electron transport layer includes inorganic materials and no longer contains organic amine salts, which ensures that the parasitic absorption of the electron transport layer is less, which helps to further improve the stability and short-circuit current density of the battery.
[0042] Specifically, the material of the passivation layer has poor conductivity, which will affect charge transfer. The passivation layers of the present application are arranged at intervals, and they will not completely cover the surface of the perovskite layer, so that good conductivity can be maintained. Compared with the traditional dense passivation layer, the conductive performance of the solar cell can be improved.
[0043] In some other exemplary embodiments, Figure 2 As shown, forming a second carrier transport layer 15 on the exposed surface of the first transparent conductive layer 14 away from the substrate 10 includes: forming a hole transport layer 19 on the exposed surface of the first transparent conductive layer 14 away from the substrate 10, wherein the material of the passivation layer 12 includes Al 2 O 3 and / or SiO x The material of the electron transport layer 18 includes SnO 2 、TiO 2 and Nb 2 O 5 In this embodiment, the passivation layer material is selected from Al 2 O 3 and / or SiO x These materials have good chemical stability and thermal stability, which can protect the perovskite layer, reduce the impact of environmental factors (such as humidity, temperature changes, etc.) on the performance of solar cells, and extend the service life of the battery. The material of the electron transport layer is SnO 2 、TiO 2 and Nb 2 O 5 At least one of these materials has good electron transport properties, can effectively transport electrons, reduce the recombination of electron-hole pairs, and further improve the efficiency of solar cells.
[0044] Specifically, the materials of the hole transport layer include but are not limited to Spiro-OMeTAD, PTAA, NiO x and Me-4PACZ.
[0045] In order to enable those skilled in the art to more clearly understand the technical solution of the present application, the implementation process of the method for preparing a solar cell of the present application will be described in detail below in conjunction with specific embodiments.
[0046] This embodiment relates to a specific method for preparing a solar cell, comprising the following steps:
[0047] Step S1: providing a substrate;
[0048] Step S2: forming a first transparent conductive layer on the surface of the substrate, and forming a hole transport layer on an exposed surface of the first transparent conductive layer away from the substrate;
[0049] Step S3: forming a perovskite layer on the exposed surface of the hole transport layer;
[0050] Step S4: using an atomic layer deposition method, in a temperature range of 20° C. to 100° C., forming a plurality of passivation layers disposed at intervals on a partially exposed surface of the perovskite layer away from the substrate, wherein the material of the passivation layers comprises an inorganic material;
[0051] Step S5: forming an electron transport layer on the exposed surfaces of the plurality of passivation layers away from the substrate and the remaining exposed surface of the perovskite layer away from the substrate by atomic layer deposition, wherein the material of the electron transport layer comprises an inorganic material;
[0052] Step S6: forming a second transparent conductive layer on the exposed surface of the electron transport layer away from the substrate, and forming a plurality of spaced metal electrode layers on the partially exposed surface of the second transparent conductive layer away from the substrate.
[0053] The present application also provides a solar cell, which is prepared by any of the above-mentioned methods for preparing a solar cell. Figure 2 As shown, the solar cell comprises:
[0054] Base 10;
[0055] The perovskite layer 11 is located on one side of the substrate 10;
[0056] A plurality of passivation layers 12 are disposed at intervals and are located on a portion of the surface of the perovskite layer 11 away from the substrate 10 .
[0057] The first carrier transport layer 13 is located on the surfaces of the plurality of passivation layers 12 away from the substrate 10 and on the remaining surface of the perovskite layer 11 away from the substrate 10 .
[0058] In the above embodiment, the solar cell includes a substrate, a perovskite layer, a plurality of passivation layers disposed at intervals, and a first carrier transport layer stacked in sequence, wherein the first carrier transport layer is located on the surface of the plurality of passivation layers away from the substrate and on the remaining surface of the perovskite layer away from the substrate. Compared with the problem that the passivation layer in the solar cell in the prior art is usually a dense passivation layer, which leads to poor conductivity of the solar cell, the plurality of passivation layers disposed at intervals (i.e., porous passivation layers) of the present application do not completely cover the surface of the perovskite layer, so that the first carrier transport layer is located on part of the perovskite layer, which ensures faster charge transfer and better conductivity of the solar cell.
[0059] Specifically, Figure 2 As shown, the plurality of passivation layers 12 are arranged at intervals along a predetermined direction, and the predetermined direction is a direction perpendicular to the thickness of the substrate 10 .
[0060] Specifically, the substrate is a crystalline silicon bottom cell; in the perovskite layer, the cations include but are not limited to Cs, FA and MA, and the anions include but are not limited to Cl, Br and I.
[0061] According to some exemplary embodiments of the present application, Figure 2 As shown, the solar cell further includes: a first transparent conductive layer 14, located between the substrate 10 and the perovskite layer 11; and a second carrier transport layer 15, located between the first transparent conductive layer 14 and the perovskite layer 11. In this embodiment, the addition of the first transparent conductive layer can improve the conductivity of the substrate, which is helpful for the collection and transmission of charges, thereby further improving the overall performance of the solar cell. The formation of the second carrier transport layer helps to optimize the transmission path of the charges, so that electrons and holes can be more effectively transmitted to the corresponding electrodes, reducing the charge loss.
[0062] Specifically, the material of the first transparent conductive layer includes but is not limited to ITO, IZO, AZO and n / p polySi.
[0063] According to other exemplary embodiments of the present application, Figure 2As shown, the solar cell further includes: a second transparent conductive layer 16, located on the surface of the first carrier transport layer 13 away from the substrate 10; and a plurality of spaced metal electrode layers 17, located on a portion of the surface of the second transparent conductive layer 16 away from the substrate 10. In this embodiment, by forming the second transparent conductive layer on the first carrier transport layer, the photoelectric conversion efficiency of the cell can be further optimized, and by forming a plurality of spaced metal electrode layers on the second transparent conductive layer, the carriers can be effectively collected and transported, and the resistance loss can be reduced, thereby further improving the conductivity and overall performance of the cell.
[0064] Specifically, Figure 2 As shown, the plurality of metal electrode layers 17 are spaced apart along the predetermined direction. In the embodiment of the present application, there are two metal electrode layers 17 .
[0065] Specifically, the material of the second transparent conductive layer includes but is not limited to ITO and IZO, and the material of the metal electrode layer includes but is not limited to Au, Ag, Cu and Al.
[0066] According to some further exemplary embodiments of the present application, Figure 2 As shown, the first carrier transport layer 13 is an electron transport layer 18, the second carrier transport layer 15 is a hole transport layer 19, and the material of the electron transport layer 18 and the material of the passivation layer 12 independently include inorganic materials. In this embodiment, the material of the passivation layer includes inorganic materials and no longer contains carbon sixty, which ensures that the stability of the passivation layer is good, and the material of the electron transport layer includes inorganic materials and no longer contains organic amine salts, which ensures that the parasitic absorption of the electron transport layer is less, which helps to further improve the stability and short-circuit current density of the battery.
[0067] Specifically, the material of the passivation layer has poor conductivity, which will affect charge transfer. The passivation layers of the present application are arranged at intervals, and they will not completely cover the surface of the perovskite layer, so that good conductivity can be maintained. Compared with the traditional dense passivation layer, the conductive performance of the solar cell can be improved.
[0068] In other embodiments, the material of the passivation layer includes Al 2 O 3 and / or SiO x The material of the electron transport layer includes SnO 2 、TiO 2 and Nb 2 O 5 In this embodiment, the passivation layer material is selected from Al 2 O 3 and / or SiO xThese materials have good chemical stability and thermal stability, which can protect the perovskite layer, reduce the impact of environmental factors (such as humidity, temperature changes, etc.) on the performance of solar cells, and extend the service life of the battery. The material of the electron transport layer is SnO 2 、TiO 2 and Nb 2 O 5 At least one of these materials has good electron transport properties, can effectively transport electrons, reduce the recombination of electron-hole pairs, and further improve the efficiency of solar cells.
[0069] Specifically, the materials of the hole transport layer include but are not limited to Spiro-OMeTAD, PTAA, NiO x and Me-4PACZ.
[0070] From the above description, it can be seen that the above embodiments of the present application achieve the following technical effects:
[0071] 1) In the method for preparing the solar cell of the present application, a substrate is first provided, and then a perovskite layer is formed on one side of the substrate, and then a plurality of passivation layers are formed on the partially exposed surface of the perovskite layer away from the substrate by atomic layer deposition, and finally a first carrier transport layer is formed on the exposed surface of the plurality of passivation layers away from the substrate and the remaining exposed surface of the perovskite layer away from the substrate by atomic layer deposition. Compared with the problem that the passivation layer in the solar cell in the prior art is usually a dense passivation layer, which leads to poor conductivity of the solar cell, the present application adopts the atomic layer deposition method to prepare and form a plurality of passivation layers (i.e., a porous passivation layer) and a dense first carrier transport layer, so that the first carrier transport layer is located on a portion of the perovskite layer, which ensures faster charge transfer and better conductivity of the solar cell.
[0072] 2) In the solar cell of the present application, the solar cell includes a substrate, a perovskite layer, a plurality of passivation layers arranged at intervals, and a first carrier transport layer stacked in sequence, wherein the first carrier transport layer is located on the surface of the plurality of passivation layers away from the substrate and on the remaining surface of the perovskite layer away from the substrate. Compared with the problem that the passivation layer in the solar cell in the prior art is usually a dense passivation layer, which leads to the poor conductivity of the solar cell, the plurality of passivation layers (i.e., porous passivation layers) arranged at intervals in the present application do not completely cover the surface of the perovskite layer, so that the first carrier transport layer is located on part of the perovskite layer, which ensures faster charge transfer and better conductivity of the solar cell.
[0073] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims
1. A method for preparing a solar cell, characterized in that: include: providing a substrate; forming a perovskite layer on one side of the substrate; Using an atomic layer deposition method, forming a plurality of passivation layers spaced apart on a partially exposed surface of the perovskite layer away from the substrate; By using the atomic layer deposition method, a first carrier transport layer is formed on the exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surface of the perovskite layer away from the substrate.
2. The method for preparing a solar cell according to claim 1, characterized in that: A plurality of passivation layers are formed on a partially exposed surface of the perovskite layer away from the substrate, comprising: A plurality of the passivation layers are formed at intervals on a partially exposed surface of the perovskite layer away from the substrate within a temperature range of 20° C. to 100° C.
3. The method for preparing a solar cell according to claim 1, characterized in that: After providing a substrate and before forming a perovskite layer on one side of the substrate, the method further includes: forming a first transparent conductive layer on a surface of the substrate; forming a second carrier transport layer on an exposed surface of the first transparent conductive layer away from the substrate; Forming a perovskite layer on one side of the substrate includes: forming the perovskite layer on an exposed surface of the second carrier transport layer.
4. The method for preparing a solar cell according to claim 1, characterized in that: After forming a first carrier transport layer on the exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surface of the perovskite layer away from the substrate, the method further comprises: forming a second transparent conductive layer on an exposed surface of the first carrier transport layer away from the substrate; A plurality of metal electrode layers arranged at intervals are formed on a partially exposed surface of the second transparent conductive layer away from the substrate.
5. The method for preparing a solar cell according to claim 3, characterized in that: Forming a first carrier transport layer on exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surface of the perovskite layer away from the substrate, comprising: An electron transport layer is formed on exposed surfaces of the plurality of passivation layers away from the substrate and on the remaining exposed surface of the perovskite layer away from the substrate, wherein the material of the electron transport layer and the material of the passivation layer independently include inorganic materials.
6. The method for preparing a solar cell according to claim 5, characterized in that: Forming a second carrier transport layer on an exposed surface of the first transparent conductive layer away from the substrate comprises: A hole transport layer is formed on the exposed surface of the first transparent conductive layer away from the substrate, wherein the material of the passivation layer includes Al2O3 and / or SiO x , the material of the electron transport layer includes at least one of SnO2, TiO2 and Nb2O5.
7. A solar cell, characterized in that: The solar cell is prepared by the method for preparing a solar cell according to any one of claims 1 to 6, and the solar cell comprises: substrate; a perovskite layer, located on one side of the substrate; A plurality of spaced-apart passivation layers are located on a portion of the surface of the perovskite layer away from the substrate; The first carrier transport layer is located on the surfaces of the plurality of passivation layers away from the substrate and on the remaining surface of the perovskite layer away from the substrate.
8. The solar cell according to claim 7, characterized in that: The solar cell further comprises: A first transparent conductive layer, located between the substrate and the perovskite layer; The second carrier transport layer is located between the first transparent conductive layer and the perovskite layer.
9. The solar cell according to claim 7, characterized in that: The solar cell further comprises: A second transparent conductive layer is located on a surface of the first carrier transport layer away from the substrate; A plurality of metal electrode layers are arranged at intervals and are located on a portion of the surface of the second transparent conductive layer away from the substrate.
10. The solar cell according to claim 8, characterized in that The first carrier transport layer is an electron transport layer, the second carrier transport layer is a hole transport layer, and the material of the electron transport layer and the material of the passivation layer independently include inorganic materials.