Laser beam splitting multi-galvanometer parallel scanning processing system

Abstract

The invention provides a laser beam splitting multi-galvanometer parallel scanning processing system, which comprises a laser, a beam splitter group, a plurality of groups of collimation beam expanders, a plurality of groups of attenuators and a plurality of focusing scanning galvanometer systems, and is characterized in that the beam splitter group comprises at least one total reflection mirror and at least one beam splitter, and the axial leads of all lenses in the beam splitter group are parallel to one another; the beam splitter group is used for equally dividing a laser beam output by the laser into a plurality of parallel light beams with the same power, a light path where each parallel light beam is located is sequentially connected with a group of collimation beam expanders, a group of attenuators and a focusing scanning galvanometer system, and each focusing scanning galvanometer system is used for focusing each parallel light beam to a to-be-processed plane. According to the invention, the effect of multi-beam and multi-galvanometer parallel scanning processing is realized through beam splitting of a single laser, the scanning breadth is effectively expanded, the manufacturing efficiency is improved, the input power of each light path is independently controllable, and the equipment cost is greatly reduced.

Description

Technical Field

[0001] The invention relates to the technical field of laser processing, and in particular to a laser beam splitting multi-galvanometer parallel scanning processing system. Background Art

[0002] In the field of laser processing technology, the laser galvanometer scanning processing system has the advantages of fast response speed, high processing precision and strong environmental adaptability. It is widely used in laser cutting, laser marking, laser welding, laser additive manufacturing, laser micro-nano processing and other fields. Its downstream application areas cover 3C electronics, medical equipment, 3D printing, energy and other industries.

[0003] At present, the laser galvanometer scanning processing system is mainly driven by two high-precision servo motors, which respectively control two mutually perpendicular high-reflectivity galvanometer components, thereby realizing precise motion control of the incident single laser beam in the X-axis and Y-axis directions. Driven by the motor, the galvanometer reflects the laser beam to the surface of the material to be processed, and the specific position of the focused light spot depends on the deflection angle of the galvanometer. However, due to the limitation of the scanning format of the galvanometer, the traditional single laser beam galvanometer scanning system is difficult to meet the growing manufacturing efficiency requirements and wider scanning format requirements when dealing with the processing needs of large-sized and complex parts. Summary of the invention

[0004] The invention provides a laser beam splitting multi-vibrator parallel scanning processing system to solve the defects in the prior art.

[0005] The present invention provides a laser beam splitting multi-galvanometer parallel scanning processing system, comprising: A laser, a beam splitter group, multiple groups of collimating beam expanders, multiple groups of attenuators, and multiple focusing and scanning galvanometer systems, wherein the beam splitter group includes at least one total reflection mirror and at least one beam splitter, and the axis lines of the lenses in the beam splitter group are parallel to each other; The beam splitter group is used to split the laser beam output by the laser into multiple parallel beams of equal power. The optical path of each parallel beam is connected in sequence to a group of collimating beam expanders, a group of attenuators and a focusing scanning galvanometer system. Each focusing scanning galvanometer system is used to focus each parallel beam onto the plane to be processed.

[0006] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the focusing scanning galvanometer system is a front focusing scanning galvanometer system or a rear focusing scanning galvanometer system.

[0007] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the front focusing scanning galvanometer system includes a movable lens, a focusing lens and a galvanometer, the movable lens is used to disperse the incident laser beam, the focusing lens is used to focus the dispersed laser beam, and the galvanometer is used to reflect the focused laser beam to the light outlet.

[0008] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the system also includes a multi-galvanometer coordinated motion control system, which is used to control the laser to emit a laser beam and adjust the distance between the moving lens and the focusing lens in each focusing scanning galvanometer system.

[0009] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the post-focusing scanning galvanometer system includes a galvanometer and a focusing lens, and the focusing lens is any one of a scanning field lens, a spherical focusing lens group and an aspherical lens group.

[0010] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the angle between the plane where each lens in the beam splitter mirror group is located and the optical axis is 45°, and the incident angle of the laser beam is 45°.

[0011] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the beam splitter is any one of a plane beam splitter, a cubic beam splitter and a thin film beam splitter.

[0012] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the laser is any one of a continuous laser, a Q-switched laser, a short pulse laser and an ultrashort pulse laser.

[0013] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the collimating beam expander is any one of a lens assembly, a zoom beam expander, an automatic tuning beam expander and a reflective beam expander.

[0014] According to a laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, the attenuator is any one of a laser attenuation prism pair, an adjustable polarization beam splitter, a liquid crystal adjustable attenuator, an electro-optical amplitude modulator, a dual polarizer attenuator and an adjustable attenuation filter.

[0015] The laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention splits the laser beam of a single laser, and obtains multiple parallel beams after the beam splitting. Each parallel beam enters the corresponding focusing scanning galvanometer system in parallel, which effectively expands the scanning format, improves the manufacturing efficiency, realizes that the input power of each optical path is individually controllable, and greatly reduces the equipment cost. The beam splitter group with transmission and reflection functions is arranged on the incident light path according to a certain rule, realizing the function of uniform light splitting. The high power output by the laser is evenly divided into multiple parallel beams of the same lower power through the beam splitter group. Each optical path includes an attenuator to realize the individually controllable output power. The light beam output by the focusing scanning galvanometer system can be individually adjusted according to the different laser energies required for the molding area of ​​the material to be processed. Therefore, compared with the traditional multi-laser multi-galvanometer system, the embodiment of the present invention not only maintains extremely high processing efficiency and high flexibility of adjustable light intensity, but also avoids the problem of difficulty in synchronization when multiple lasers work simultaneously, and greatly reduces the equipment cost and improves economic benefits. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the present invention or the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0017] Figure 1 This is one of the structural schematic diagrams of the laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention.

[0018] Figure 2 It is a structural schematic diagram of the front focusing scanning galvanometer system provided by the present invention.

[0019] Figure 3 It is a schematic diagram of the laser scanning area provided by the present invention.

[0020] Figure 4 It is a structural schematic diagram of the post-focusing scanning galvanometer system provided by the present invention.

[0021] Figure 5 This is the second structural schematic diagram of the laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention.

[0022] Reference numerals: 110: laser; 120: beam splitter group; 130: collimating beam expander; 140: attenuator; 150: focusing scanning galvanometer system; 160: multi-galvanometer coordinated motion control system; 121: first beam splitter; 122: second beam splitter; 123: third beam splitter; 124: total reflection mirror; 125: fourth beam splitter; 126: fifth beam splitter; 127: sixth beam splitter. DETAILED DESCRIPTION

[0023] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be clearly and completely described below in conjunction with the drawings of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0024] At present, the laser galvanometer scanning processing system is mainly driven by two high-precision servo motors, which respectively control two mutually perpendicular high-reflectivity galvanometer components, thereby realizing precise motion control of the incident single laser beam in the X-axis and Y-axis directions. Driven by the motor, the galvanometer reflects the laser beam to the surface of the material to be processed, and the specific position of the focused light spot depends on the deflection angle of the galvanometer. However, due to the limitation of the scanning format of the galvanometer, the traditional single laser beam galvanometer scanning system is difficult to meet the growing manufacturing efficiency requirements and wider scanning format requirements when dealing with the processing needs of large-sized and complex parts.

[0025] In addition, there are also multi-beam multi-galvanometer processing systems that use multiple lasers and are equipped with multiple independent galvanometer scanning systems for parallel splicing and processing, which solves the problems of low processing efficiency and limited scanning format of the above-mentioned single-beam galvanometer scanning system. However, the development of multi-beam multi-galvanometer parallel processing systems has problems such as greatly increased costs and difficulty in synchronous operation of multiple lasers, which greatly limits the further development of galvanometer scanning systems in the field of laser manufacturing.

[0026] In view of the problems of high cost and difficulty in synchronous operation of the above-mentioned multiple lasers and multiple beams, the present invention provides a laser beam splitting multi-galvanometer parallel scanning processing system, which realizes multi-beam and multi-galvanometer parallel scanning processing under the condition of a single laser.

[0027] Figure 1 FIG. 1 is one of the structural schematic diagrams of the laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention, such as Figure 1 As shown, the system includes: A laser 110, a beam splitter group 120, multiple groups of collimating beam expanders 130, multiple groups of attenuators 140, and multiple focusing and scanning galvanometer systems 150. The beam splitter group 120 includes at least one total reflection mirror and at least one beam splitter. The axis lines of the lenses in the beam splitter group 120 are parallel to each other. The beam splitter group 120 is used to split the laser beam output by the laser 110 into multiple parallel beams of equal power. The optical path of each parallel beam is connected in sequence to a group of collimating beam expanders 130, a group of attenuators 140 and a focusing scanning galvanometer system 150. Each focusing scanning galvanometer system 150 is used to focus each parallel beam onto a plane to be processed.

[0028] The beam splitter assembly 120 includes at least one total reflection mirror 122 and at least one beam splitter 121, and the axis lines of these mirrors are parallel to each other. When the laser beam enters the beam splitter assembly 120, it is equally split into multiple parallel beams of equal power by the beam splitter assembly.

[0029] Optionally, the beam splitter group 120 may be a group consisting of n-1 groups of 1:1 beam splitters and a total reflector, and the laser beam is evenly divided into n parallel beams of equal intensity and enter the collimating beam expander 130, where n is an integer not less than 2. For example, the beam splitter group is a group consisting of 1:(n-1), 1:(n-2), ..., 1:1 beam splitters and a reflector.

[0030] Afterwards, each parallel light beam will pass through the corresponding collimating beam expander 130, which is used to adjust the diameter and divergence angle of the parallel light beam to ensure that the parallel light beam has an appropriate size and collimation before entering the focusing scanning galvanometer system 150, such as meeting the light aperture requirements of the focusing scanning galvanometer system 150.

[0031] After the collimating beam expander 130 adjusts the diameter and divergence angle of the parallel light beam, the parallel light beam enters the attenuator 140 , which is used to fine-tune the power of each incoming parallel light beam to meet different processing requirements or prevent the focusing scanning galvanometer system 150 from being damaged by excessive beam power.

[0032] Finally, the light beams with adjusted power are sent to their respective focusing scanning galvanometer systems 150, which can dynamically change the direction and focal position of the parallel light beams, thereby achieving accurate scanning and processing of the processing plane. Each focusing scanning galvanometer system 150 has a certain scanning area, and multiple scanning areas form a partial or complete overlap area.

[0033] The embodiment of the present invention significantly improves the processing efficiency by splitting the laser beam generated by a single laser 110 to obtain multiple parallel beams, which are processed by multiple focusing scanning galvanometer systems 150 respectively. Compared with the traditional single-beam scanning processing method, this parallel processing method can greatly shorten the processing time. In addition, each focusing scanning galvanometer system 150 can be independently controlled, so different processing areas can be accurately scanned and processed, thereby being able to adapt to various complex processing requirements and maintain high processing accuracy.

[0034] Since the laser beam splitting multi-galvanometer parallel scanning processing system adopts a modular design, it is easy to increase the number of lenses in the beam splitter group and the number of focusing scanning galvanometer systems to further improve the processing efficiency.

[0035] Among them, the laser beam splitting multi-galvanometer parallel scanning processing system is suitable for laser selective melting, laser selective sintering, laser welding, laser cutting, laser drilling, and laser marking technologies.

[0036] In summary, in the laser beam splitting multi-galvanometer parallel scanning processing system provided by the embodiment of the present invention, the laser 110 is used to provide a high-power laser source, the beam splitter group 120 receives the light beam emitted by the laser 110 and splits it into multiple low-power parallel light beams, each of which is connected to the collimating beam expander 130, the attenuator 140 and the focusing scanning galvanometer system 150 in sequence; the collimating beam expander 130 receives the low-power light beam and expands the spot diameter and adjusts the beam divergence angle; the attenuator 140 receives the expanded light beam and is used to adjust the output laser power; the focusing scanning galvanometer system 150 receives the power-adjustable light beam and realizes rapid movement of the focused laser spot.

[0037] The laser beam splitting multi-galvanometer parallel scanning processing system provided in the embodiment of the present invention splits the laser beam of a single laser 110, and obtains multiple parallel beams after beam splitting. Each parallel beam enters the corresponding focusing scanning galvanometer system 150 in parallel, which effectively expands the scanning format, improves the manufacturing efficiency, realizes that the input power of each optical path is individually controllable, and greatly reduces the equipment cost. The beam splitter group 120 with transmission and reflection functions is arranged on the incident light path according to a certain rule, realizing the function of uniform light splitting. The high power output by the laser 110 is evenly divided into multiple parallel beams of the same lower power through the beam splitter group 120. Each optical path includes an attenuator 140 to realize the individually controllable output power. The beam output by the focusing scanning galvanometer system 150 can be individually adjusted according to the different laser energies required for the forming area of ​​the material to be processed. Therefore, compared with the traditional multi-laser multi-galvanometer system, the embodiment of the present invention not only maintains extremely high processing efficiency and high flexibility of adjustable light intensity, but also avoids the problem of difficulty in synchronization when multiple lasers work simultaneously, and greatly reduces equipment costs and improves economic benefits.

[0038] Based on the above embodiments, the focusing scanning galvanometer system 150 is a front focusing scanning galvanometer system or a rear focusing scanning galvanometer system.

[0039] Specifically, the focusing scanning galvanometer system 150 is a device that uses a rotatable galvanometer to deflect the laser beam. By controlling the rotation angle of the galvanometer, the scanning path of the laser beam on the target area can be accurately controlled.

[0040] In the front-focusing scanning galvanometer system, the laser beam is focused before passing through the two-axis galvanometer. That is, the laser beam is already convergent when it reaches the galvanometer, and the galvanometer is responsible for directing the focused laser beam to the target area. The front-focusing scanning galvanometer can obtain a small-sized spot within a large-sized processing range and achieve the purpose of changing the working range, distance and spot size.

[0041] The rear-focusing scanning galvanometer system is the opposite of the front-focusing scanning galvanometer system. In the rear-focusing scanning galvanometer system, the laser beam is focused after passing through the two-axis galvanometer. That is, the galvanometer processes an unfocused, relatively large laser beam. Focusing is usually achieved by an objective lens, field lens or other optical element located after the galvanometer.

[0042] The focusing scanning galvanometer system 150 is a front focusing scanning galvanometer system or a rear focusing scanning galvanometer system. When the focusing scanning galvanometer system 150 is a front focusing scanning galvanometer system, the laser beam is focused before passing through the two-axis galvanometer (front focusing). When the focusing scanning galvanometer system 150 is a rear focusing scanning galvanometer system, the laser beam is focused after passing through the two-axis galvanometer (rear focusing).

[0043] Based on any of the above embodiments, Figure 2 Schematic diagram of the structure of the front focusing scanning galvanometer system provided by the present invention. Figure 2 As shown, the front focusing scanning galvanometer system includes a moving lens, a focusing lens and a galvanometer. The moving lens is used to disperse the incident laser beam, the focusing lens is used to focus the dispersed laser beam, and the galvanometer is used to reflect the focused laser beam to the light outlet. In addition, the galvanometer light outlet is located at the bottom of the galvanometer, and is connected to the front focusing scanning galvanometer system. The light beam first enters the moving lens for dispersion, and then passes through the focusing lens for focusing. The focused light beam is reflected by the galvanometer and emitted through the light outlet, and forms a focused light spot on the molding plane.

[0044] Figure 3 Schematic diagram of the laser scanning area provided by the present invention, such as Figure 3 As shown, it includes 4 focusing scanning galvanometer systems, which form 4 groups of focusing light beams on the same molding plane, and the size of the overlapping area on the molding plane (i.e., the plane to be processed) is adjusted by adjusting the focal length of the F-θ focusing lens.

[0045] Based on any of the above embodiments, Figure 1 As shown, the system further includes a multi-galvanometer coordinated motion control system 160 , which is used to control the laser 110 to emit a laser beam and adjust the distance between the moving lens and the focusing lens in each focusing scanning galvanometer system 150 .

[0046] Specifically, the multi-galvanometer coordinated motion control system 160 is connected to the laser 110 , so as to be able to control the switching state of the laser 110 and the emission of the laser beam.

[0047] At the same time, the multi-galvanometer coordinated motion control system 160 can also control the deflection angle and deflection speed of the two-axis galvanometers in each focusing scanning galvanometer system 150 respectively, so as to realize the control of the spot processing position and processing speed.

[0048] In addition, the multi-galvanometer coordinated motion control system 160 can also adjust the distance between the moving lens and the focusing lens in each focusing scanning galvanometer system 150, thereby adjusting the size of the overlapping area on the molding plane.

[0049] Based on any of the above embodiments, Figure 4 Schematic diagram of the structure of the post-focusing scanning galvanometer system provided by the present invention. Figure 4 As shown, the rear focusing scanning galvanometer system includes a galvanometer and a focusing lens, wherein the focusing lens can be an F-θ focusing lens, and the galvanometer light outlet is located at the bottom of the galvanometer, and an F-θ focusing lens is externally connected. The light beam reflected by the galvanometer forms a focusing spot on the molding plane through the F-θ focusing lens. Each laser beam enters the galvanometer through the galvanometer light port, is reflected by the XY axis galvanometer group, and is focused on the processing plane through the light outlet to form multiple focusing spots, which are used to focus the light beam and control the direction and position of the focusing spot; the front focusing scanning galvanometer system is composed of a moving lens, a focusing lens, and an XY axis galvanometer, and the in-plane focusing compensation is achieved by adjusting the distance between the moving lens and the focusing lens; the rear focusing scanning galvanometer system is composed of an XY axis galvanometer group and an F-θ focusing lens.

[0050] In addition, the above-mentioned system is provided with a plurality of galvanometers whose axis lines of the mirror groups are parallel to each other, and an X-axis galvanometer and a Y-axis galvanometer are arranged inside the galvanometers. Each beam of expanded laser light enters the galvanometer system through a light port, and the light beam is driven by the deflection and reflection of the X-axis galvanometer and the Y-axis galvanometer, and forms a position-controllable focused light spot on the plane to be processed through the galvanometer light outlet. The scanning path and motion state of the multiple focused light beams are planned through the multi-galvanometer collaborative motion control system, which is used to control the high-speed switching of the spatial position and scanning speed of each focus of the focused light beam group.

[0051] like Figure 4As shown in the figure, the parallel beam after the laser beam splitting enters from the incident end of the collimating beam expander, and the spot size and beam divergence angle are adjusted by adjusting the relative position of the lens group inside the collimating beam expander. After the split beam passes through the collimating beam expander, it passes through the light opening of the galvanometer as a parallel beam. The spot size of the parallel beam needs to meet the requirements of the light aperture of the laser beam input end of the galvanometer.

[0052] Among them, the focusing lens is any one of a scanning field lens, a spherical focusing lens group and an aspherical lens group. Among them, the scanning field lens can adjust the path of the light so that it can scan in a two-dimensional or three-dimensional space according to a certain rule. The spherical focusing lens group is a lens system composed of a group of spherical lenses. A spherical lens refers to a lens whose front and rear surfaces are both spherical (or one of the sides is a plane). These lenses can be used in combination to achieve functions such as focusing, diverging or collimating light. The aspherical lens group is a lens system composed of a group of aspherical lenses. An aspherical lens refers to a lens whose surface shape is not a simple sphere, but a lens with a more complex curvature, so that aberrations can be corrected more effectively and the imaging quality of the optical system can be improved.

[0053] Based on any of the above embodiments, the angle between the plane where each lens in the beam splitter assembly 120 is located and the optical axis is 45°, and the incident angle of the laser beam is 45°.

[0054] like Figure 1 As shown, the lenses in the beam splitter group 120 are placed in parallel in sequence. From left to right, the beam splitter group includes a first beam splitter 121 with a ratio of 1:3, a second beam splitter 122 with a ratio of 1:2, a third beam splitter 123 with a ratio of 1:1, and a total reflection mirror 124. The plane where the lenses are located is at an angle of 45° with the optical axis. When the laser beam emitted by the laser 110 is incident on the first beam splitter 121 with a ratio of 1:3 at an incident angle of 45°, the laser beam is divided into a reflected beam and a transmitted beam with a power ratio of 1:3. When the reflected beam enters the collimating beam expander 130, and the transmitted beam is incident on the second beam splitter 122 with a ratio of 1:2 at an incident angle of 45°, the transmitted beam is divided into a reflected beam and a transmitted beam with a power ratio of 1:2. When the reflected beam enters the collimating beam expander 130, and the transmitted beam is incident on the third beam splitter 123 with a ratio of 1:1 at an incident angle of 45°, the transmitted beam is divided into a reflected beam and a transmitted beam with a power ratio of 1:1. The reflected light beam enters the collimating beam expander 130, and the transmitted light beam enters the total reflector 124 at an incident angle of 45°. The light beam reflected by the total reflector enters the collimating beam expander 130. At this time, the single laser beam is split and reflected by the beam splitter group to form 4 groups of parallel light beams with the same power.

[0055] Based on any of the above embodiments, the beam splitter is any one of a plane beam splitter, a cubic beam splitter and a film beam splitter.

[0056] Specifically, a plane beam splitter is usually a light and thin plate with a beam splitting film on its front surface, which is used to reflect a portion of the light beam and transmit the rest. When the incident light hits the plane beam splitter at an incident angle of 45°, part of the light will be reflected, and part of the light will be transmitted and deviated from the incident light by refraction.

[0057] Cube beam splitters are made of two right-angle prisms bonded or optically contacted at the bevel, and a beam splitter film is located on one of the bevels. Cube beam splitters are usually used with 0° AOI, where one of the outgoing beams is aligned with the optical axis and the other outgoing beam is deflected 90°.

[0058] A pellicle beamsplitter is a nitrocellulose film mounted under tension in a metal housing. This film is only a few microns thick and can effectively eliminate ghosting and minimize dispersion and aberrations. Pellicle beamsplitters achieve light distribution through the interference effect of multiple layers of thin films. These films are generally made of alternating high and low refractive index materials to form a special optical film layer that can control the reflection and transmission characteristics of light.

[0059] Based on any of the above embodiments, the laser is any one of a continuous laser, a Q-switched laser, a short pulse laser and an ultrashort pulse laser.

[0060] Specifically, a continuous laser is a device that can continuously output a laser beam, which is usually composed of three main parts: a pump source, a laser medium, and an optical cavity. The pump source provides energy to the laser medium to excite atoms or molecules in the laser medium; the electrons in the laser medium transition between their energy levels, amplifying the laser beam through the stimulated emission process; the optical cavity is composed of two mirrors to enhance the intensity of the laser beam.

[0061] Q-switched lasers are an effective means of achieving high-energy laser pulses. The Q value (quality factor) of the laser is adjusted by modulating the cavity loss in the laser cavity. The cavity is maintained in a high-loss state for most of each cycle. When the number of particles with upper and lower energy level inversions in the laser working material accumulates to a certain value, the cavity loss is suddenly reduced, so that laser oscillation is quickly established in the cavity and a high-energy pulse is output. Depending on the Q-switching method, Q-switched lasers can be divided into active Q-switching and passive Q-switching. Active Q-switching requires the use of an electro-optical switch or an acousto-optic switch in the cavity to control the Q value in the cavity; passive Q-switching requires the insertion of a saturable absorber in the cavity.

[0062] A short pulse laser is a laser with a short output laser pulse width. Lasers with a pulse width of nanoseconds or shorter are usually called short pulse lasers. Compared with continuous lasers, short pulse lasers have high peak power and small thermal effects. Due to the short pulse width, the laser energy is highly concentrated in a short time, so high-precision processing and micro-nano processing can be achieved.

[0063] Based on any of the above embodiments, the collimating beam expander is any one of a lens assembly, a zoom beam expander, an automatic tuning beam expander and a reflective beam expander.

[0064] Specifically, a lens assembly is an optical element composed of one or more lenses, which is used to change the propagation direction of light, focus or expand a light beam, etc. The lens assembly works based on the principle of light refraction. When light passes through a lens, due to the material and shape of the lens, the light will be refracted, thereby changing its propagation direction. By combining different lenses, complex optical functions can be achieved.

[0065] A zoom beam expander is a lens assembly that can change the diameter and divergence angle of a beam. It has a zoom function, that is, the focal length can be adjusted within a certain range, thereby changing the characteristics of the output beam. The zoom beam expander changes the focal length by adjusting the position or shape of the internal lens. When the focal length changes, the diameter and divergence angle of the output beam will also change accordingly. This zoom function enables the zoom beam expander to adapt to different application requirements.

[0066] An auto-tuning beam expander is a lens assembly that can automatically adjust the output beam characteristics according to the characteristics of the input beam. It usually has built-in sensors and control systems that can monitor changes in the input beam in real time and make corresponding adjustments. Auto-tuning beam expanders are based on optical feedback and control technology. When the characteristics of the input beam change, the sensor detects these changes and transmits the signal to the control system. The control system calculates the parameters that need to be adjusted based on a preset algorithm or model, and changes the characteristics of the output beam by adjusting the position, shape or material of the lens.

[0067] A reflective beam expander is an optical element that uses the principle of reflection to change the diameter and divergence angle of a beam. It is usually composed of a reflector and a lens. The reflector reflects the light to the lens, which then focuses or expands the light. The reflective beam expander is based on the principles of reflection and refraction of light. When light is incident on the reflector, it is reflected and changes its propagation direction. The reflected light is then focused or expanded by the lens to obtain the desired output beam.

[0068] Based on any of the above embodiments, the attenuator is any one of a laser attenuation prism pair, an adjustable polarization beam splitter, a liquid crystal adjustable attenuator, an electro-optic amplitude modulator, a dual polarizer attenuator and an adjustable attenuation filter.

[0069] Specifically, a laser attenuation prism pair generally refers to an attenuator composed of a pair of wedge-shaped prisms, which is used to attenuate the energy of a laser beam. According to the Fresnel theorem, the reflectivity and transmittance of light at the interface of a transparent medium are polarization-dependent. A wedge-shaped prism can attenuate the laser energy by adjusting the polarization state and incident angle of the incident light. For example, the incident light polarization is converted into P polarization, and then the reflection of the P light by the wedge-shaped prism is used to attenuate the laser energy.

[0070] An adjustable polarization beam splitter is an optical device that can separate or combine light of different polarization states, and its performance can be adjusted in some way. Adjustable polarization beam splitters work based on the polarization characteristics of light and the difference in the response of different media to light. By adjusting certain parameters inside the device (such as electric field, magnetic field or temperature, etc.), its ability to separate or combine light of different polarization states can be changed.

[0071] Liquid crystal variable attenuator is an attenuator that uses the optical properties of liquid crystal materials to change the intensity of light signals. Liquid crystal variable attenuator changes the birefringence properties of liquid crystal through electrical control and other means, thereby achieving the control of the polarization state of the light signal. Combined with front and rear polarizers or polarization beam splitters, the intensity of the light signal can be continuously adjusted.

[0072] An electro-optic amplitude modulator is a device used to modulate the amplitude of a laser beam. This is done by changing the properties of an electro-optic crystal. The electro-optic amplitude modulator works based on the Pockels effect, which means that when an electrical signal is applied, the refractive index of the electro-optic crystal changes, causing the polarization state of the laser beam to change. By using a polarizer to analyze the laser beam, the amplitude of the output laser beam can be modulated.

[0073] The dual polarizer attenuator is an attenuator composed of two polarizers, which is used to attenuate the energy of incident linearly polarized lasers. The dual polarizer attenuator achieves the attenuation of laser energy by adjusting the relative angle of the two polarizers. When the angle between the polarization direction of the incident light and the transmission axis of the second polarizer changes, the intensity of the output light will also change accordingly. According to Marius's law, there is a certain mathematical relationship between the attenuated light intensity and the angle.

[0074] An adjustable attenuation filter is a filter that can adjust the intensity of transmitted light as needed. Adjustable attenuation filters are usually made based on some tunable materials, such as liquid crystal, electrochromic materials, etc. By changing the properties of these materials (such as electric field, magnetic field or temperature, etc.), the transmittance of the filter can be changed, thereby adjusting the intensity of transmitted light.

[0075] Based on any of the above embodiments, Figure 5 FIG. 2 is a second structural diagram of the laser beam splitting multi-galvanometer parallel scanning processing system provided by the present invention. Figure 5 As shown, the system includes: A laser 110, a group of beam splitters (124-127), four groups of collimating beam expanders 130, four groups of power attenuators 140, and four focusing scanning galvanometer systems 150 (the focusing scanning galvanometer system here is a front focusing scanning galvanometer system). The beam splitter group includes three total reflection mirrors 124 and three 1:1 beam splitters (125-127). The laser 110, the galvanometer, and the focusing scanning galvanometer system 150 are controlled by a multi-galvanometer coordinated motion control system 160.

[0076] The beam splitter groups are placed in parallel in sequence, and the plane where the lens is located is at an angle of 45° with the optical axis. When the laser beam emitted by the laser 110 is reflected by the total reflection mirror 124 at an incident angle of 45° and incident on the fourth beam splitter 125 of 1:1, the single beam is equally divided into a reflected beam and a transmitted beam with the same power. The reflected and transmitted beams are respectively incident on the fifth beam splitter 126 of 1:1 and the sixth beam splitter 127 of 1:1 and are divided into four groups of beams with the same power. The two groups of reflected beams after beam splitting enter the corresponding collimating beam expander 130 respectively. The two groups of transmitted beams after beam splitting enter the corresponding total reflection mirror 124 at an incident angle of 45°, and enter the corresponding collimating beam expander 130 respectively after reflection. At this time, the single laser beam is split and reflected by the beam splitter group to form four groups of parallel beams with the same power. The optical path through which the above four groups of parallel beams pass includes a collimating beam expander, a power attenuator, a front focusing system and a galvanometer connected in sequence.

[0077] Among them, the above-mentioned laser beam splitting multi-galvanometer parallel scanning processing system forms 4 groups of focusing light beams on the same molding plane, and the size of the overlapping area on the molding plane can be adjusted by adjusting the spacing distance between the moving lens and the focusing lens in the front focusing system.

[0078] The device embodiments described above are merely illustrative, wherein the units described as separate components may or may not be physically separated, and the components displayed as units may or may not be physical units, that is, they may be located in one place, or they may be distributed on multiple network units. Some or all of the modules may be selected according to actual needs to achieve the purpose of the scheme of this embodiment. Ordinary technicians in this field can understand and implement it without paying creative labor.

[0079] Through the description of the above implementation methods, those skilled in the art can clearly understand that each implementation method can be implemented by means of software plus a necessary general hardware platform, and of course, can also be implemented by hardware. Based on this understanding, the above technical solution is essentially or the part that contributes to the prior art can be embodied in the form of a software product, and the computer software product can be stored in a computer-readable storage medium, such as ROM / RAM, a disk, an optical disk, etc., including a number of instructions for a computer device (which can be a personal computer, a server, or a network device, etc.) to execute the methods described in each embodiment or some parts of the embodiments.

[0080] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A laser beam splitting multi-galvanometer parallel scanning processing system, characterized in that: include: A laser, a beam splitter group, multiple groups of collimating beam expanders, multiple groups of attenuators, and multiple focusing and scanning galvanometer systems, wherein the beam splitter group includes at least one total reflection mirror and at least one beam splitter, and the axis lines of the lenses in the beam splitter group are parallel to each other; The beam splitter group is used to split the laser beam output by the laser into multiple parallel beams of equal power. The optical path of each parallel beam is connected in sequence to a group of collimating beam expanders, a group of attenuators and a focusing scanning galvanometer system. Each focusing scanning galvanometer system is used to focus each parallel beam onto the plane to be processed.

2. The laser beam splitting multi-galvanometer parallel scanning processing system according to claim 1 is characterized in that: The focusing scanning galvanometer system is a front focusing scanning galvanometer system or a rear focusing scanning galvanometer system.

3. The laser beam splitting multi-galvanometer parallel scanning processing system according to claim 2, characterized in that: The front focusing scanning galvanometer system comprises a moving lens, a focusing lens and a galvanometer, wherein the moving lens is used to disperse the incident laser beam, the focusing lens is used to focus the dispersed laser beam, and the galvanometer is used to reflect the focused laser beam to the light outlet.

4. The laser beam splitting multi-galvanometer parallel scanning processing system according to claim 3 is characterized in that: The system also includes a multi-galvanometer coordinated motion control system, which is used to control the laser to emit a laser beam and adjust the distance between the moving lens and the focusing lens in each focusing scanning galvanometer system.

5. The laser beam splitting multi-galvanometer parallel scanning processing system according to claim 2, characterized in that: The post-focusing scanning galvanometer system comprises a galvanometer and a focusing lens, and the focusing lens is any one of a scanning field lens, a spherical focusing lens group and an aspherical lens group.

6. The laser beam splitting multi-galvanometer parallel scanning processing system according to any one of claims 1 to 5, characterized in that: The angle between the plane where each lens in the beam splitter group is located and the optical axis is 45°, and the incident angle of the laser beam is 45°.

7. The laser beam splitting multi-galvanometer parallel scanning processing system according to any one of claims 1 to 5, characterized in that: The beam splitter is any one of a plane beam splitter, a cubic beam splitter and a film beam splitter.

8. The laser beam splitting multi-galvanometer parallel scanning processing system according to any one of claims 1 to 5, characterized in that: The laser is any one of a continuous laser, a Q-switched laser, a short pulse laser and an ultrashort pulse laser.

9. The laser beam splitting multi-galvanometer parallel scanning processing system according to any one of claims 1 to 5, characterized in that: The collimating beam expander is any one of a lens assembly, a zoom beam expander, an automatic tuning beam expander and a reflective beam expander.

10. The laser beam splitting multi-galvanometer parallel scanning processing system according to any one of claims 1 to 5, characterized in that: The attenuator is any one of a laser attenuation prism pair, an adjustable polarization beam splitter, a liquid crystal adjustable attenuator, an electro-optic amplitude modulator, a dual polarizer attenuator and an adjustable attenuation filter.

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