Control Method, Device, Storage Medium and Electronic Device of an EFEM Device

Abstract

The present application provides a control method, device, storage medium and electronic device for an EFEM device, which relates to the field of electronic technology. The control method for the EFEM device includes: obtaining a first instruction based on a first system response, where the execution process indicated by the first instruction involves a first control authority over the EFEM device; obtaining the controllable timing sequence of the EFEM device, where the controllable timing sequence characterizes the time window during which remote control can be executed in the process stage and spatial state in which the EFEM device is located; adjusting the first instruction to a second instruction based on the controllable timing sequence, and the second control authority of the second instruction is less than or equal to the first control authority; and responding to the second instruction based on a second system, where the control level of the first system is higher than that of the second system, and the control timing sequences of the first system and the second system are isolated from each other.

Description

Technical Field

[0001] The present application relates to the field of electronic technologies, and in particular, to a control method, device, storage medium, and electronic device for an EFEM device. Background Art

[0002] In the semiconductor manufacturing process, Equipment Front End Module (EFEM) devices are mainly responsible for key operations such as wafer transfer, alignment, and loading. To improve equipment maintenance efficiency, EFEM devices support remote engineers for remote operations. In actual applications, local engineers may be performing key process operations such as wafer loading and alignment, while remote engineers need to adjust equipment parameters or diagnose faults simultaneously. In the above scenarios, conflicts between local operations and remote operations are caused. Summary of the Invention

[0003] In view of this, the present application provides a control method, device, storage medium, and electronic device for an EFEM device.

[0004] The first aspect of the present application provides a control method for an EFEM device, which includes:

[0005] Obtaining a first instruction based on a first system response, where the execution process indicated by the first instruction involves a first control authority for the EFEM device;

[0006] Obtaining the controllable timing of the EFEM device, where the controllable timing characterizes the time window during which remote control can be executed in the process stage and spatial state of the EFEM device;

[0007] Adjusting the first instruction to a second instruction based on the controllable timing, where the second control authority of the second instruction is less than or equal to the first control authority;

[0008] Responding to the second instruction based on the second system response, where the control level of the first system is higher than that of the second system, and the control timings of the first system and the second system are isolated from each other.

[0009] According to the embodiments of the present application, the execution processes indicated by different first instructions are different, different execution processes involve at least one type of EFEM device, and the process stages and spatial states of different types of EFEM devices are different.

[0010] According to an embodiment of the present application, obtaining the controllable timing of the EFEM device includes: obtaining a process stage, where the process stage represents one of the stages during the wafer transfer process of the EFEM device; obtaining the position and relative coordinates of the EFEM device; based on the position and relative coordinates of the EFEM device, determining the relative area where the EFEM device is located during operation to obtain a spatial state; and determining the controllable timing based on the process stage and the spatial state.

[0011] According to an embodiment of the present application, the determining the controllable timing based on the process stage and the spatial state includes: determining a first timing and a second timing based on the process stage and the spatial state; eliminating the second timing with the first timing as a reference to determine the controllable timing; where the first timing is the maximum duration for which remote control can be executed, and the second timing is the risk duration for executing remote control, and the risk duration is determined by the relative positions of at least one of the EFEM devices and the wafer.

[0012] According to an embodiment of the present application, adjusting the first instruction to a second instruction based on the controllable timing includes: determining the original timing of the first instruction, where the original timing is determined by the start time and duration of the execution process indicated by the first instruction; and performing timing reconstruction on the original timing in the first instruction based on the controllable timing to obtain a second instruction.

[0013] According to an embodiment of the present application, the performing timing reconstruction on the original timing in the first instruction based on the controllable timing to obtain a second instruction includes: when the time window of the controllable timing is greater than or equal to the time window of the original timing, performing timing translation on the execution process indicated by the first instruction to obtain a second instruction; when the time window of the controllable timing is less than the time window of the original timing, splitting the execution process indicated by the first instruction into multiple sub-processes within the controllable timing to obtain a second instruction.

[0014] According to an embodiment of the present application, the control method of the EFEM device further includes: when the execution process indicated by the first instruction involves the first control authority over at least two EFEM devices, determining the execution priority of the first instruction for each of the EFEM devices according to the controllable timing of each EFEM device.

[0015] Another aspect of the present application provides a control device for an EFEM device, including:

[0016] A first instruction acquisition module, configured to obtain a first instruction based on a first system response, where the execution process indicated by the first instruction involves the first control authority over the EFEM device;

[0017] A controllable timing acquisition module for acquiring the controllable timing of the EFEM device, where the controllable timing represents the time window during which remote control can be executed in the process stage and spatial state of the EFEM device;

[0018] A second instruction acquisition module for adjusting the first instruction to a second instruction based on the controllable timing, where the second control authority of the second instruction is less than or equal to the first control authority;

[0019] A second instruction response module for responding to the second instruction based on the second system, where the control level of the first system is higher than that of the second system, and the control timings of the first system and the second system are isolated from each other.

[0020] Another aspect of the present application provides an electronic device, including:

[0021] One or more processors;

[0022] A memory for storing one or more programs,

[0023] wherein, when the one or more programs are executed by the one or more processors, the one or more processors implement the control method of the EFEM device as described above.

[0024] Another aspect of the present application provides a computer-readable storage medium storing computer-executable instructions, which are used to implement the control method of the EFEM device as described above when executed.

[0025] According to the embodiments of the present application, by acquiring the process stage and spatial state of the EFEM device to determine the controllable timing, and dynamically adjusting the remote instruction based on the controllable timing, the remote operation is only executed within a suitable time window. At the same time, the control timings of the first system and the second system are isolated from each other, further ensuring the priority of local operations and avoiding conflicts between remote instructions and local operations.

[0026] It should be understood that the content described in this part is not intended to identify the key or important features of the embodiments of the present application, nor is it used to limit the scope of the present application. Other features of the present application will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Through the following description of the embodiments of the present application with reference to the drawings, the above and other objects, features and advantages of the present application will become clearer.

[0028] Figure 1 Schematically shows a flowchart of a control method for an EFEM device provided by the present application;

[0029] Figure 2 Schematically shows a structural block diagram of a control device for an EFEM device provided by the present application;

[0030] Figure 3 Schematically shows a structural block diagram of an electronic device provided by the present application. Specific embodiments

[0031] Hereinafter, embodiments of the present application will be described with reference to the accompanying drawings. However, it should be understood that these descriptions are merely exemplary and are not intended to limit the scope of the present application. In the following detailed description, for the sake of explanation, many specific details are set forth to provide a comprehensive understanding of the embodiments of the present application. However, it is obvious that one or more embodiments can also be implemented without these specific details. In addition, in the following description, descriptions of well-known structures and technologies are omitted to avoid unnecessarily confusing the concepts of the present application.

[0032] The terms used herein are merely for describing specific embodiments and are not intended to limit the present application. The terms "including", "comprising", etc. used herein indicate the presence of the described features, steps, operations, and / or components, but do not exclude the presence or addition of one or more other features, steps, operations, or components.

[0033] All terms used herein (including technical and scientific terms) have the meanings commonly understood by those skilled in the art, unless otherwise defined. It should be noted that the terms used herein should be interpreted as having a meaning consistent with the context of this specification and should not be interpreted in an idealized or overly rigid manner.

[0034] In the case of using expressions such as "at least one of A, B, and C, etc.", generally, it should be interpreted according to the meaning commonly understood by those skilled in the art (for example, "a system having at least one of A, B, and C" should include, but not be limited to, a system having only A, only B, only C, having A and B, having A and C, having B and C, and / or having A, B, and C).

[0035] Figure 1 Schematically shows a flowchart of a method for detecting cracks in a pump casing of a single-casing slurry pump according to an embodiment of the present application.

[0036] As Figure 1 shown, the method includes step 101 to step 104.

[0037] Step 101, obtaining a first instruction based on a first system response, the execution process indicated by the first instruction involves a first control authority over the EFEM device, the control level of the first system is higher than that of the second system, and the control timings of the first system and the second system are isolated from each other.

[0038] Among them, the first system refers to the local operating system with the highest control priority, which can be understood as an industrial control terminal directly physically connected to the EFEM device in the embodiments of the present application, and is used to execute key operation controls during the wafer transfer process. The first system establishes a real-time communication connection with the EFEM device through industrial Ethernet or fieldbus, and is equipped with a touch screen or a dedicated control panel, allowing operators to perform direct operations beside the device.

[0039] Correspondingly, the second system refers to the remote operating system with secondary control priority, which can be understood as a remote maintenance terminal accessing the EFEM device through a network connection in the embodiments of the present application, and is used to execute non-critical operation tasks such as device status monitoring, parameter adjustment, and fault diagnosis. Specifically, the second system establishes a remote connection with the EFEM device through an encrypted VPN channel, providing remote access capabilities for technical support personnel or remote engineers of the device manufacturer.

[0040] There is a clear control hierarchy relationship and timing isolation mechanism between the first system and the second system. In terms of the control hierarchy, the first system, as the local operating system, has the highest control priority, and the control instructions issued by it have the highest execution authority. For example, when the first system executes the wafer loading operation, even if the second system has previously sent a parameter adjustment instruction, the system will give priority to responding to the control request of the first system to ensure the immediacy and continuity of local operations.

[0041] The first instruction refers to the set of original control instructions sent by the first system, which can be understood as an operation instruction sequence containing complete execution process information in the embodiments of the present application, and is used to implement specific wafer processing tasks. These instruction sequences contain key information such as execution time, operation parameters, and control authority, which directly determine the specific actions and operating states of the EFEM device.

[0042] Taking the wafer loading process as an example, a typical first instruction may include the following execution process: First, control the robotic arm to move to the FOUP wafer pickup position (duration = 2s, authority = L1). This combination of operation parameters indicates that this operation requires 2 seconds of execution time and must have L1-level control authority to execute this operation. Here, duration represents the duration, and authority represents the authorized control authority. Then start the vacuum adsorption system (duration = 0.5s, authority = L0), then perform wafer pre-alignment (duration = 3s, authority = L0), and finally transfer the wafer to the target position (duration = 3s, authority = L0). Each operation in the above execution process has its specific timing requirements and control authority, and the system needs to arrange a suitable execution time window accordingly.

[0043] Further, the first control authority refers to the operation authorization level required during the execution of the first instruction. In the embodiments of the present application, it can be understood as a multi-level authority system for precisely controlling the access and operation authorities of each functional module of the EFEM device. The above-mentioned authority system ensures the security and controllability of device operations through authorizations at different levels.

[0044] Based on the above embodiments, as an alternative embodiment, the execution processes indicated by different first instructions are different. Different execution processes involve at least one type of EFEM device, and the process stages and spatial states of different types of EFEM devices are different.

[0045] In actual application scenarios, the EFEM device usually needs to process various different types of remote control instructions, which may involve different operation objectives such as device status monitoring, parameter adjustment, and fault diagnosis. Different types of remote control instructions often correspond to different execution processes, and these execution processes may act on different types of EFEM devices, such as robotic arms, vacuum adsorption systems, or alignment platforms. Since different types of EFEM devices play different functional roles in the process, their process stages and spatial states also have significant differences.

[0046] Specifically, the system first needs to identify the type of execution process corresponding to the first instruction. By parsing the operation parameters and control objectives in the first instruction, the system can determine which type of EFEM device the instruction is directed at. For example, when the first instruction involves wafer position adjustment, the system will identify it as an execution process related to the alignment platform; when the instruction contains vacuum pressure parameter adjustment, it is classified as a control process of the vacuum adsorption system. This method of classifying processes based on instruction characteristics enables the system to accurately grasp the operation requirements of different remote control tasks.

[0047] After determining the type of execution process, the system needs to further evaluate the current process stage and spatial state of the relevant EFEM device. Since different types of EFEM devices participate in different stages during wafer processing, their process states will also exhibit different characteristics. For example, the robotic arm may be in a critical stage of wafer transfer, while the vacuum adsorption system may be in a standby state. At the same time, there are also differences in the spatial states of different devices, which are reflected in their relative position relationships with other devices or wafers. The system provides a basis for subsequent authority control and timing management by real-time monitoring of these state information.

[0048] By precisely identifying different execution processes and equipment states, the system can formulate optimal execution strategies for each remote control instruction. This differentiated control scheme not only improves the accuracy of remote operations but also ensures the safe operation of different types of EFEM devices at their respective process stages. For example, the system may allow parameter adjustments for devices in the standby state, while implementing stricter permission controls for devices executing critical processes. This dynamic management mechanism based on device type and state not only meets the diverse requirements of remote maintenance but also ensures the stability of the overall process flow.

[0049] Step 102, obtain the controllable timing of the EFEM device. The controllable timing represents the time window during which remote control can be executed in the process stage and spatial state of the EFEM device.

[0050] Among them, the controllable timing refers to the set of time constraints for the device to execute remote control in a specific process stage and spatial state. In the embodiments of the present application, it can be understood as the safe operation time window dynamically calculated based on the current operating state of the EFEM device, which is used to ensure the safe execution of remote control instructions without affecting local operations.

[0051] To accurately obtain the controllable timing, the system needs to consider both the process stage and spatial state of the EFEM device. Among them, the process stage of the EFEM device refers to a specific stage in the operation state sequence during wafer transfer. In the embodiments of the present application, it can be understood as a series of atomized operation units and their corresponding device state combinations, which are used to accurately describe the task progress and control requirements of the EFEM device during wafer handling.

[0052] Exemplarily, a complete wafer transfer process includes multiple consecutive operation stages. For example, during the process of loading a wafer into a lithography machine, the device sequentially performs operations such as FOUP lid opening, wafer pre-alignment, robotic arm grasping, path planning, and precise docking. The system determines the specific process stage it is currently in by real-time monitoring of device state parameters. Each process stage has its specific control characteristics and risk levels. For example, during the precise docking stage, since the robotic arm is performing sub-millimeter-level position adjustment, the control permission configuration at this time is: the local permission maintains full control, while the remote permission is restricted to only allowing sensor data reading. This dynamic permission management mechanism based on the process stage ensures that remote operations do not interfere with the execution of critical actions of the device.

[0053] Meanwhile, the spatial state of the EFEM device refers to the real-time position information of each moving part of the device and its relative spatial relationship with the surrounding devices. In the embodiments of the present application, it can be understood as a dynamic state description in a three-dimensional coordinate system established based on the EFEM device, which is used to evaluate the safety boundary and control authority range of the EFEM device operation in real time. By combining the process stage information with the spatial state information, the system can calculate the optimal controllable timing in real time, so as to achieve precise control of remote operations.

[0054] Based on the above embodiments, as an alternative embodiment, step 102 may specifically further include the following steps:

[0055] Step 201: Obtain the process stage, which characterizes one of the stages of the EFEM device during wafer transfer.

[0056] Specifically, it is necessary to obtain the process stage of the EFEM device, which characterizes the specific operation stage of the device during wafer transfer. By obtaining the process stage information, the system can accurately judge the current operation state of the device, thus providing a basic basis for subsequent remote control authority allocation.

[0057] Specifically, state recognition can be performed based on a predefined set of process stages. The set of process stages includes all key operation stages during wafer transfer, such as FOUP opening, wafer pre-alignment, robotic arm grasping, path planning, and precise docking. Each process stage has its specific operation characteristics and state parameters, and the system determines the specific stage it is in by collecting these characteristic parameters in real time.

[0058] Exemplarily, assume that the EFEM device includes multiple process stages S during wafer transfer, and each stage has different authority control requirements. Define: , where represents the i-th process stage.

[0059] The current process stage s(t) of the device: ;

[0060] In the formula, represents the probability that the device is in stage at time t.

[0061] Assume is the duration of stage , then the state change of the process stage satisfies:

[0062] ;

[0063] Step 202: Obtain the location and relative coordinates of the EFEM device.

[0064] Specifically, the system needs to obtain the location and relative coordinates of the EFEM device. By establishing a complete spatial state description, the system can monitor the device movement in real time, thus providing precise spatial constraints for remote control.

[0065] Specifically, when the EFEM device corresponds to a robotic arm, the system first needs to obtain the real-time position coordinates of the end of the robotic arm. This is achieved by the real-time acquisition of the coordinate information of the robotic arm in three-dimensional space by a high-precision position sensor. The robotic arm position information reflects the real-time spatial state of the actuator and is the core parameter for evaluating operation safety.

[0066] At the same time, the system also needs to obtain the real-time position coordinates of the wafer to be processed. The wafer position information is obtained through the combination of a vision system and a position sensor, and these data are used to calculate the relative position relationship between the robotic arm and the wafer.

[0067] In addition, the system also needs to obtain the fixed coordinates of the device reference point. The device reference point is usually selected at the reference position of the EFEM device and is used to establish a unified spatial coordinate system. This reference coordinate system provides a stable benchmark for all spatial position calculations.

[0068] Exemplarily, when the EFEM device corresponds to a robotic arm, define the spatial state of the device , including the robotic arm position and the device relative coordinates:

[0069] Robotic arm position: ;

[0070] Wafer position: ;

[0071] Device reference point: .

[0072] Step 203: Based on the location and relative coordinates of the EFEM device, determine the relative area where the EFEM device is located during operation to obtain the spatial state.

[0073] Specifically, the system first needs to calculate the spatial distance between them based on the obtained robotic arm position coordinates and wafer position coordinates. This distance is calculated by the Euclidean distance between two points in three-dimensional space, fully considering the position deviations in the horizontal and vertical directions. By calculating this spatial distance in real time, the system can dynamically monitor the proximity between the robotic arm and the wafer.

[0074] Exemplarily, the system pre - defines the radius of the safety area, and this radius value is determined based on the device operation characteristics and safety requirements. By comparing the spatially - calculated distance in real - time with the radius of the safety area, the system can determine whether the device has entered the critical operation area. When the spatial distance is less than the radius of the safety area, it indicates that the robotic arm has entered the critical area that requires special control. At this time, the system needs to adjust the control strategy accordingly.

[0075] Let the radius of the safety area be R, then whether the device is in the critical area can be determined by the following judgment:

[0076] 。

[0077] Step 204: Determine the controllable timing based on the process stage and spatial state.

[0078] Specifically, the system needs to comprehensively determine the controllable timing of the EFEM device based on the acquired process stage and spatial state information. By organically combining the information in two dimensions of the process progress and spatial position, an optimal execution time window can be determined for remote control operations, ensuring that remote maintenance activities can be carried out within a safe period without affecting local operations.

[0079] The system first needs to analyze the timing characteristics of the current process stage. Each process stage has its standard execution duration and critical time points. For example, in the wafer pre - alignment stage, the system divides this stage into a preparation period, a core operation period, and a finishing period. This timing division is based on process requirements and operation risk levels, providing a basic time - dimension constraint for remote control allocation.

[0080] At the same time, the system also needs to dynamically adjust the timing constraints in combination with the spatial state information. When the device is in the critical area, the system will correspondingly tighten the range of controllable timing. For example, when the robotic arm enters the safety area around the wafer, the remote operation permission within the current time window will be restricted, and only necessary monitoring functions will be retained. This timing adjustment based on the spatial state ensures that remote operations do not interfere with the precision positioning process.

[0081] Based on the above - mentioned embodiments, as an alternative embodiment, step 204 may further include the following steps:

[0082] Step 301: Determine the first timing and the second timing based on the process stage and spatial state, where the first timing is the maximum duration for which remote control can be executed, and the second timing is the risk duration of remote control execution, and the risk duration is determined by the relative positions of at least one EFEM device and the wafer.

[0083] Among them, the first time sequence refers to the maximum allowable execution duration of the remote control operation determined based on the characteristics of the current process stage. In the embodiments of the present application, it can be understood as the standard operation time interval divided according to the EFEM device process flow, which is used to limit the maximum duration of the remote control instruction in different process stages.

[0084] Correspondingly, the second time sequence refers to the potential risk duration evaluated based on the motion state of the device. In the embodiments of the present application, it can be understood as the safety protection time period obtained by calculating the relative position relationship between the EFEM device and the wafer in real time, which is used to deduct the time interval with possible operation risks from the maximum allowable execution duration to ensure that the remote control is executed within the safe time window.

[0085] Specifically, the system first calculates the safety control window based on the operating characteristics of the device in the process stage and spatial state. This window is obtained by subtracting the risk time from the maximum allowable execution time to ensure that the calculation result is always non - negative. Among them, the calculation of the risk time needs to comprehensively consider two key factors: one is the possible collision probability between the robotic arm and the wafer, and the other is the execution failure probability of the current process stage. These two probability values are weighted and combined through different weight coefficients to obtain the final risk time evaluation value.

[0086] When calculating the collision probability, the system adopts an exponential decay model based on spatial distance. The core of this mathematical model is that when the distance between the robotic arm and the wafer is closer, the collision probability increases exponentially. Through this calculation method, the risk degree of the device in different position states can be accurately reflected. At the same time, the execution failure probability is predicted by analyzing historical operation data using a machine learning model. This evaluation method based on empirical data can effectively capture the potential risks in different process stages.

[0087] After obtaining the safety control window, the system also needs to further determine the remotely controllable time sequence. The safety control window can be compared with the preset minimum safe execution time. When the safety control window is greater than the minimum safe execution time, the system allows remote control to be executed within this time window; otherwise, remote operation is temporarily prohibited to ensure the safety of the device.

[0088] Exemplarily, let be the safety control window of the device in the process stage S and spatial state X, and define:

[0089] ;

[0090] In the formula, is the maximum allowable execution time, is the risk time, calculated according to the current process stage and spatial state:

[0091] ;

[0092] In the formula, The probability of the robotic arm colliding with the wafer is calculated based on the position:

[0093] ;

[0094] In the formula, is the probability of failure in the current stage of execution, obtained by training a model based on historical data.

[0095] Set the remotely controllable timing :

[0096] , ;

[0097] Among them, is the minimum safe execution time for remote control. If is less than this threshold, remote control is not allowed.

[0098] Step 302: Eliminate the second timing based on the first timing to determine the controllable timing.

[0099] Specifically, the system first needs to construct an initial time interval framework based on the first timing. This framework represents the theoretical executable time range of remote control operations in the current process stage. Then, the system eliminates the risk time corresponding to the second timing from this initial framework. This elimination process needs to consider the continuity of time and the integrity of operations. For example, when there is an overlap between the risk time period and the originally scheduled execution time, the system will give priority to ensuring the continuity of local operations and avoid high-risk periods by adjusting the execution timing of remote control.

[0100] Step 103, adjust the first instruction to the second instruction based on the controllable timing, and the second control authority of the second instruction is less than or equal to the first control authority.

[0101] Among them, the second instruction refers to the set of remote control instructions after being constrained by the controllable timing and adjusted in authority. In the embodiments of the present application, it can be understood as an optimized instruction sequence reconstructed based on the first instruction and meeting the requirements of the current process stage and spatial state, used to ensure that remote operations are executed within a safe time window and avoid interfering with local critical operations of the EFEM device.

[0102] Specifically, after obtaining the controllable timing, the system needs to dynamically adjust the first instruction to generate the second instruction suitable for the current operating environment. Thus, it is ensured that the remote control instruction can be executed within a safe time window, and at the same time, the control authority does not exceed the range allowed by the system.

[0103] Specifically, the system first needs to analyze the execution characteristics of the first instruction, including its original execution timing and control authority requirements. For the adjustment of the execution timing, the system maps the execution time of the first instruction to the determined controllable timing range. When the original execution time of the instruction exceeds the controllable timing range, the system will adopt corresponding adjustment strategies, such as splitting the execution process into multiple subtasks or rearranging the execution timing to ensure that each operation can be completed within a safe time window.

[0104] Based on the above embodiments, as an alternative embodiment, step 103 may further include the following steps:

[0105] Step 401: Determine the original timing of the first instruction, which is determined by the start time and duration of the execution process indicated by the first instruction.

[0106] Among them, the original timing refers to the time execution plan included in the first instruction before being adjusted by the system. In the embodiments of the present application, it can be understood as the initial time interval composed of the start time point and the corresponding duration in the EFEM device remote control instruction, which is used to describe the expected execution timing of the remote operation task and provide a reference basis for subsequent dynamic adjustment.

[0107] Specifically, the system first needs to parse the timing parameter information from the first instruction. By identifying the start time mark in the instruction, the system determines the expected start moment of the remote control operation. At the same time, the system also needs to extract the duration information, which indicates the time span required to complete the entire execution process.

[0108] Exemplarily, parse the time parameters of the first instruction and extract the instruction start time and duration ;

[0109] Compare the time window corresponding to the original timing of the first instruction with the time window corresponding to the controllable timing corresponding to the current process stage and spatial state for comparison.

[0110] Step 402: Based on the controllable timing, perform timing reconstruction on the original timing in the first instruction to obtain a second instruction.

[0111] Specifically, the system first needs to analyze the matching relationship between the original timing and the controllable timing. By comparing the execution time requirements of the first instruction with the current controllable timing window, the system can determine whether there is a timing conflict. When the original timing completely falls within the controllable timing range, the system can keep the timing arrangement of the first instruction unchanged. However, in most cases, the system needs to adjust the original timing, which includes both overall time translation and splitting a continuous execution process into multiple independent operation units. For example, when remote control involves a wafer loading task, the system may need to decompose the original continuous operation sequence into several subtasks and reschedule these subtasks to be executed within different controllable timing windows.

[0112] Exemplarily, if the time window corresponding to the original timing is completely included in the time window corresponding to the controllable timing, the first instruction remains unchanged; if there is a time overlap conflict, calculate the overlapping interval to .

[0113] Based on the above embodiments, as an optional embodiment, step 402 may further include the following steps:

[0114] Step 501: When the time window of the controllable timing is greater than or equal to the time window of the original timing, perform timing translation on the execution process indicated by the first instruction to obtain a second instruction.

[0115] Specifically, when the safety time window provided by the controllable timing can completely accommodate the original timing, the system preferentially adopts the timing translation strategy to adjust the first instruction. Thus, on the premise of maintaining the integrity of the original execution process, the entire operation sequence is transferred to a safer time interval for execution. By means of overall translation rather than splitting and reconstruction, the system can maximize the execution continuity and operation efficiency of the remote control instruction.

[0116] Specifically, the system first needs to determine the target position of the timing translation. By analyzing the start time and end time of the controllable timing window, the system selects an optimal starting time so that the translated execution process can completely fall within the safe time range. When performing timing translation, the system keeps the relative time intervals between the individual operation links in the original timing unchanged and only adjusts the overall execution time. For example, when the first instruction includes continuous operations such as wafer pre-alignment and robot arm movement, the system takes the entire operation sequence as a whole and translates it into the safe time window defined by the current controllable timing, while ensuring that the timing relationship between the operations remains unchanged.

[0117] Exemplary, overall translation strategy: When the first instruction is delayed as a whole to the nearest available time window, and the adjusted time parameters are:

[0118] 。

[0119] Step 502: When the time window of the controllable timing is smaller than that of the original timing, split the execution process indicated by the first instruction into multiple sub-processes within the controllable timing to obtain a second instruction.

[0120] Specifically, when the safety time window provided by the controllable timing cannot fully accommodate the original timing, the system needs to reconstruct the first instruction using a process splitting strategy. Thus, remote control operations that exceed a single controllable timing window are reasonably allocated to multiple different safe time intervals for execution. By decomposing the continuous execution process into multiple relatively independent sub-tasks, the system can still complete all remote control requirements under the constraints of limited controllable timing.

[0121] Specifically, the system first needs to analyze the dependency relationships among the operation links in the first instruction. By evaluating the degree of association between different operation units in the execution process, the system determines the appropriate splitting boundary. When performing process splitting, the system will first ensure the logical integrity of the operations, and divide operations with a relatively high degree of correlation into the same sub-process. For example, when the first instruction includes operations such as wafer inspection and position adjustment, the system may arrange the inspection operation to be executed within the first available time window, and postpone the subsequent adjustment operation to the next safe time interval. At the same time, the system also needs to add necessary status checks and connection logics to these split sub-processes to ensure smooth transitions between the sub-processes.

[0122] Exemplarily, a segmented execution strategy: when the length of the controllable timing window is insufficient, split the first instruction into multiple sub-instructions ,satisfying:

[0123] ,and, 。

[0124] Step 104, based on the second system, respond to the second instruction.

[0125] Specifically, after generating the second instruction, the system needs to execute these optimized remote control instructions through the second system. Since the second system is the execution entity of the remote operation, it needs to accurately complete various control tasks while strictly following the controllable timing and permission constraints.

[0126] Specifically, the second system first needs to verify the legality of the received second instructions. By checking the timing characteristics and privilege levels of the instructions, it ensures that these instructions comply with the operation constraints of the current EFEM device. For example, the system will verify whether the execution time of the instructions falls within the predetermined controllable timing range, and whether the control privileges required by the instructions do not exceed the range allowed by the system. This pre-execution verification mechanism can detect potential security hazards before the instructions are actually executed.

[0127] After the verification passes, the second system will implement remote control according to the timing arrangement in the second instructions and in accordance with the predetermined execution process. For instructions with time series translation, the system will fully execute the relevant operations within the adjusted time window; for instructions split into multiple sub-processes, the system will execute each sub-task in different controllable time series intervals in turn. During the execution process, the second system will continuously monitor the operating status of the EFEM device to ensure that the remote operation does not interfere with the normal operation of the device. For example, when a local operation request is detected, the system will reasonably schedule the execution order of the remote control instructions according to the preset priority rules.

[0128] Through the response mechanism of the second system, the remote control instructions can be effectively executed on the premise of ensuring safety. This execution method based on the system response not only realizes the precise control of remote maintenance activities, but also establishes an effective isolation between local operations and remote control. For example, when a remote control task is split into multiple sub-processes, the second system can ensure that each sub-process is executed within an appropriate time window, avoiding timing conflicts with local operations. This refined execution control mechanism ultimately realizes the unity of remote maintenance efficiency and equipment operation safety.

[0129] Based on the above embodiments, as an optional embodiment, when the execution process indicated by the first instruction involves the first control privilege for at least two EFEM devices, the execution priority of the first instruction for each EFEM device is determined according to the controllable timing of each EFEM device.

[0130] Specifically, during the remote control process, when the first instruction needs to operate multiple EFEM devices simultaneously, the system needs to determine the execution priority based on the controllable timing characteristics of each device, so as to reasonably coordinate the remote control order among multiple devices and avoid control failure caused by timing conflicts between devices. By analyzing the controllable timing characteristics of each EFEM device, the system can formulate an optimal device control strategy to ensure the effective execution of remote operations in a multi-device environment.

[0131] Specifically, the system first needs to obtain the controllable timing information of all EFEM devices involved. By comparing the current working status and available time windows of each device, the system evaluates the urgency and feasibility of each device to execute remote control instructions. When determining the execution priority, the system comprehensively considers multiple factors, including the idle time distribution of the device, the urgency of the process task, and the operation dependency relationship between devices. For example, when the remote control task involves the transfer of wafers between multiple EFEM devices, the system will preferentially arrange the devices with shorter controllable timing windows to perform relevant operations to avoid missing key operation opportunities. At the same time, the system also needs to consider the spatial position relationship between devices and the material flow requirements to ensure that the allocation of priorities can support continuous process flows.

[0132] Through the reasonable allocation of device priorities, the system can better coordinate the remote control activities of multiple EFEM devices. This priority scheduling mechanism based on controllable timing not only ensures the execution effect of each device's control instructions but also maintains the continuity of the overall process flow. For example, the system may adjust the multi-device linkage operation that originally needed to be executed simultaneously to be executed sequentially according to the priority order based on the controllable timing characteristics of each device, thus avoiding mutual interference between devices.

[0133] Figure 2 The structural block diagram of a control device for an EFEM device provided by the present application is schematically shown, which may include:

[0134] A first instruction obtaining module, configured to obtain a first instruction based on a first system response, and an execution process indicated by the first instruction involves a first control right for an EFEM device;

[0135] A controllable timing obtaining module, configured to obtain the controllable timing of the EFEM device, where the controllable timing represents a time window in which remote control can be executed in a process stage and a spatial state of the EFEM device;

[0136] A second instruction obtaining module, configured to adjust the first instruction to a second instruction based on the controllable timing, and a second control right of the second instruction is less than or equal to the first control right;

[0137] A second instruction response module, configured to respond to the second instruction based on the second system response, a control level of the first system is higher than that of the second system, and control timings of the first system and the second system are isolated from each other.

[0138] Based on the above embodiments, as an optional embodiment, execution processes indicated by different first instructions are different, different execution processes involve at least one type of EFEM device, and process stages and spatial states of different types of EFEM devices are different.

[0139] Based on the above embodiments, as an alternative embodiment, the controllable timing obtaining module is further configured to obtain a process stage, where the process stage represents one of the stages during the wafer transfer process of the EFEM device; obtain the position and relative coordinates of the EFEM device; based on the position and relative coordinates of the EFEM device, determine the relative area where the EFEM device is located during operation to obtain a spatial state; and determine a controllable timing based on the process stage and the spatial state.

[0140] Based on the above embodiments, as an alternative embodiment, the controllable timing obtaining module is further configured to determine a first timing and a second timing based on the process stage and the spatial state; eliminate the second timing with the first timing as a reference to determine a controllable timing; where the first timing is the maximum duration for which remote control can be executed, and the second timing is the risk duration for executing remote control, and the risk duration is determined by the relative positions of at least one of the EFEM devices and the wafer.

[0141] Based on the above embodiments, as an alternative embodiment, the second instruction obtaining module is further configured to determine the original timing of the first instruction, where the original timing is determined by the start time and duration of the execution process indicated by the first instruction; perform timing reconstruction on the original timing in the first instruction based on the controllable timing to obtain a second instruction.

[0142] Based on the above embodiments, as an alternative embodiment, the second instruction obtaining module is further configured to perform timing translation on the execution process indicated by the first instruction to obtain a second instruction when the time window of the controllable timing is greater than or equal to the time window of the original timing; and split the execution process indicated by the first instruction into multiple sub-processes within the controllable timing to obtain a second instruction when the time window of the controllable timing is less than the time window of the original timing.

[0143] Based on the above embodiments, as an alternative embodiment, when the execution process indicated by the first instruction involves a first control right for at least two EFEM devices, the first instruction obtaining module is further configured to determine the execution priority of the first instruction for each of the EFEM devices according to the controllable timing of each of the EFEM devices.

[0144] It should be noted that the control device part of the EFEM device in the embodiments of the present application corresponds to the control method part of the EFEM device in the embodiments of the present application. For the description of the data processing system part, please refer to the data processing method part specifically, and details will not be elaborated here.

[0145] Figure 3A structural block diagram of an electronic device suitable for implementing the method described above according to an embodiment of the present application is schematically shown. Figure 3 The electronic device shown is merely an example and should not impose any limitations on the functions and usage scope of the embodiments of the present application.

[0146] As Figure 3 shown, the electronic device 300 according to an embodiment of the present application includes a processor 301, which can perform various appropriate actions and processes according to a program stored in a read-only memory (ROM) 302 or a program loaded from a storage section 308 into a random access memory (RAM) 303. The processor 301 can include, for example, a general microprocessor (such as a CPU), an instruction set processor, and / or a related chipset, and / or a dedicated microprocessor (such as an application-specific integrated circuit (ASIC)), and so on. The processor 301 can also include on-board memory for caching purposes. The processor 301 can include a single processing unit or multiple processing units for performing different actions of the method flow according to an embodiment of the present application.

[0147] In the RAM 303, various programs and data required for the operation of the electronic device 300 are stored. The processor 301, the ROM 302, and the RAM 303 are connected to each other via a bus 304. The processor 301 performs various operations of the method flow according to an embodiment of the present application by executing the programs in the ROM 302 and / or the RAM 303. It should be noted that the program can also be stored in one or more memories other than the ROM 302 and the RAM 303. The processor 301 can also perform various operations of the method flow according to an embodiment of the present application by executing the programs stored in the one or more memories.

[0148] According to an embodiment of the present application, the electronic device 300 can further include an input / output (I / O) interface 305, and the input / output (I / O) interface 305 is also connected to the bus 304. The system 300 can further include one or more of the following components connected to the input / output (I / O) interface 305: an input section 306 including a keyboard, a mouse, etc.; an output section 307 including, for example, a cathode ray tube (CRT), a liquid crystal display (LCD), etc., and a speaker, etc.; a storage section 308 including a hard disk, etc.; and a communication section 309 including a network interface card such as a LAN card, a modem, etc. The communication section 309 performs communication processing via a network such as the Internet. A drive 310 is also connected to the input / output (I / O) interface 305 as needed. A removable medium 311, such as a magnetic disk, an optical disk, a magneto-optical disk, a semiconductor memory, etc., is installed on the drive 310 as needed so that a computer program read from it can be installed into the storage section 308 as needed.

[0149] According to an embodiment of the present application, the method flow according to the embodiment of the present application can be implemented as a computer software program. For example, an embodiment of the present application includes a computer program product, which includes a computer program carried on a computer-readable storage medium, and the computer program includes program codes for executing the method shown in the flowchart. In such an embodiment, the computer program can be downloaded and installed from a network through the communication section 309, and / or installed from the removable medium 311. When the computer program is executed by the processor 301, the above functions defined in the system of the embodiment of the present application are executed. According to an embodiment of the present application, the above-described system, device, apparatus, module, unit, etc. can be implemented by computer program modules.

[0150] The present application also provides a computer-readable storage medium, which can be included in the device / device / system described in the above embodiment; or can exist alone without being assembled into the device / device / system. The above computer-readable storage medium carries one or more programs, and when the above one or more programs are executed, the method according to the embodiment of the present application is implemented.

[0151] According to an embodiment of the present application, the computer-readable storage medium can be a non-volatile computer-readable storage medium. For example, it can include but is not limited to: portable computer disks, hard disks, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), portable compact disk read-only memory (CD-ROM), optical storage devices, magnetic storage devices, or any suitable combination of the above. In the present application, the computer-readable storage medium can be any tangible medium that contains or stores a program, and the program can be used by or in combination with an instruction execution system, device, or device.

[0152] For example, according to an embodiment of the present application, the computer-readable storage medium can include the above-described ROM 302 and / or RAM 303 and / or one or more memories other than ROM 302 and RAM 303.

[0153] An embodiment of the present application also includes a computer program product, which includes a computer program, and the computer program includes program codes for executing the method provided by the embodiment of the present application. When the computer program product runs on an electronic device, the program codes are used to enable the electronic device to implement the method provided by the embodiment of the present application.

[0154] When the computer program is executed by the processor 301, the above functions defined in the system / apparatus of the embodiment of the present application are executed. According to an embodiment of the present application, the above-described system, apparatus, module, unit, etc. can be implemented by computer program modules.

[0155] In one embodiment, the computer program may rely on tangible storage media such as optical storage devices, magnetic storage devices, etc. In another embodiment, the computer program may also be transmitted and distributed in the form of signals on a network medium, and downloaded and installed through the communication part 309, and / or installed from the removable medium 311. The program code included in the computer program can be transmitted using any suitable network medium, including but not limited to: wireless, wired, etc., or any suitable combination of the above.

[0156] According to the embodiments of the present application, the program code for executing the computer program provided by the embodiments of the present application can be written in any combination of one or more programming languages. Specifically, these computing programs can be implemented using high-level procedures and / or object-oriented programming languages, and / or assembly / machine languages. Programming languages include but are not limited to, for example, Java, C++, Python, the "C" language, or similar programming languages. The program code can be executed entirely on the user's computing device, partially on the user's device, partially on a remote computing device, or entirely on a remote computing device or server. In the case of a remote computing device, the remote computing device can be connected to the user's computing device through any type of network, including a local area network (LAN) or a wide area network (WAN), or can be connected to an external computing device (for example, by using an Internet service provider to connect through the Internet).

[0157] The flowcharts and block diagrams in the accompanying drawings illustrate the possible architectures, functions, and operations of systems, methods, and computer program products according to various embodiments of the present application. In this regard, each block in the flowchart or block diagram may represent a module, a segment of a program, or a part of code that contains one or more executable instructions for implementing a specified logical function. It should also be noted that in some alternative implementations, the functions marked in the blocks may occur in an order different from that marked in the accompanying drawings. For example, two consecutive blocks shown may actually be executed substantially in parallel, and they may sometimes be executed in the reverse order, depending on the functions involved. It should also be noted that each block in the block diagram or flowchart, as well as combinations of blocks in the block diagram or flowchart, may be implemented by a dedicated hardware-based system that performs the specified functions or operations, or may be implemented by a combination of dedicated hardware and computer instructions. Those skilled in the art can understand that the features described in various embodiments and / or claims of the present application can be combined and / or combined in various ways, even if such combinations or combinations are not explicitly described in the present application. In particular, without departing from the spirit and teachings of the present application, the features described in various embodiments and / or claims of the present application can be combined and / or combined in various ways. All such combinations and / or combinations fall within the scope of the present application.

[0158] The embodiments of the present application have been described above. However, these embodiments are for illustrative purposes only and are not intended to limit the scope of the present application. Although the embodiments have been described separately above, this does not mean that the measures in each embodiment cannot be used advantageously in combination. The scope of the present application is defined by the appended claims and their equivalents. Without departing from the scope of the present application, those skilled in the art can make various substitutions and modifications, and all such substitutions and modifications should fall within the scope of the present application.

Claims

1. A control method for an EFEM device, characterized in that: include: obtaining a first instruction based on the first system response, wherein the execution process indicated by the first instruction involves a first control authority over the EFEM device; Acquire a controllable timing sequence of the EFEM device, wherein the controllable timing sequence represents a time window in which remote control can be performed under a process stage and a spatial state of the EFEM device; Adjusting the first instruction to a second instruction based on the controllable timing, wherein a second control authority of the second instruction is less than or equal to the first control authority; Based on the second system receiving the second instruction, the second system implements remote control according to the timing arrangement in the second instruction and a predetermined execution process, the control level of the first system is higher than the control level of the second system, and the control timings of the first system and the second system are isolated from each other.

2. The control method of the EFEM device according to claim 1, characterized in that: Different first instructions indicate different execution processes, and different execution processes involve at least one type of EFEM equipment. Different types of EFEM equipment are in different process stages and spatial states.

3. The control method of the EFEM device according to claim 2, characterized in that: The step of obtaining the controllable timing of the EFEM device comprises: Acquire a process stage, wherein the process stage represents one of the stages of the EFEM device during the wafer transfer process; Obtaining the position and relative coordinates of the EFEM device; Based on the position and relative coordinates of the EFEM device, determine the relative area where the EFEM device is running to obtain a spatial state; Based on the process stage and the spatial state, a controllable timing is determined.

4. The control method of the EFEM device according to claim 3, characterized in that: The determining of the controllable timing based on the process stage and the space state includes: determining a first timing and a second timing based on the process stage and the spatial state; Taking the first time sequence as a reference, eliminating the second time sequence to determine a controllable time sequence; The first timing is the maximum duration for which remote control can be performed, and the second timing is the risk duration for performing remote control, wherein the risk duration is determined by the relative position of at least one of the EFEM devices and the wafer.

5. The control method of the EFEM device according to claim 2, characterized in that: The adjusting the first instruction to a second instruction based on the controllable timing includes: Determine an original timing of the first instruction, wherein the original timing is determined by a start time and a duration of an execution process indicated by the first instruction; The original timing in the first instruction is reconstructed based on the controllable timing to obtain a second instruction.

6. The control method of the EFEM device according to claim 5, characterized in that: The step of reconstructing the original timing in the first instruction based on the controllable timing to obtain the second instruction includes: When the time window of the controllable timing is greater than or equal to the time window of the original timing, performing timing shift on the execution process indicated by the first instruction to obtain a second instruction; In the case where the time window of the controllable timing is smaller than the time window of the original timing, the execution process indicated by the first instruction is split into multiple sub-processes within the controllable timing to obtain a second instruction.

7. The control method of the EFEM device according to claim 2, characterized in that: Also includes: When the execution process indicated by the first instruction involves first control rights over at least two EFEM devices, the execution priority of the first instruction over each of the EFEM devices is determined according to the controllable timing of each of the EFEM devices.

8. A control device for EFEM equipment, characterized in that: include: A first instruction obtaining module, configured to obtain a first instruction based on a first system response, wherein the execution process indicated by the first instruction involves a first control authority over the EFEM device; A controllable timing acquisition module, used to obtain the controllable timing of the EFEM device, wherein the controllable timing represents a time window in which remote control can be performed under the process stage and spatial state of the EFEM device; A second instruction obtaining module, configured to adjust the first instruction to a second instruction based on the controllable timing, wherein a second control authority of the second instruction is less than or equal to the first control authority; A second instruction response module is used to receive the second instruction based on the second system, and the second system implements remote control according to the timing arrangement in the second instruction and a predetermined execution process. The control level of the first system is higher than the control level of the second system, and the control timings of the first system and the second system are isolated from each other.

9. An electronic device, characterized in that: include: one or more processors; a memory for storing one or more programs, When the one or more programs are executed by the one or more processors, the one or more processors implement the method according to any one of claims 1 to 7.

10. A computer-readable storage medium having executable instructions stored thereon, which, when executed by a processor, enables the processor to implement the control method of the EFEM device according to any one of claims 1 to 7.

Images