Display substrate, manufacturing method thereof and display device

Abstract

The invention discloses a display substrate and a manufacturing method thereof and a display device.The display substrate comprises a light shielding layer arranged on a substrate and at least one spacer arranged on the side, away from the substrate, of the light shielding layer, the orthographic projection of the spacer on the substrate falls into the orthographic projection of the light shielding layer on the substrate, and the orthographic projection of the spacer on the substrate falls into the orthographic projection of the light shielding layer on the substrate. And a part of the boundary of the orthographic projection of the spacer on the substrate falls on the boundary of the orthographic projection of the shading layer on the substrate. According to the scheme provided by the embodiment of the invention, the partial boundary of the spacer is aligned with the shading layer, so that the self-alignment process is simplified.

Description

Technical Field

[0001] The embodiments of the present disclosure relate to but are not limited to display technology, and in particular to a display substrate and a manufacturing method thereof, and a display device. Background Art

[0002] With the rapid development of display technology, the resolution of display devices has gradually increased from the previous 200 PPI (Pixels Per Inch) to 500, 1000, and 1500 PPI. Especially in the field of Augmented Reality (AR) / Virtual Reality (VR), the resolution requirement of devices has reached 2000+ PPI, which undoubtedly poses new challenges to the design and manufacturing process; from the perspective of pixel design, as the resolution increases, the size of each part decreases. Taking 2000 PPI as an example, the size of each pixel is only 12.7 microns (um), and the size of each sub-pixel is 4.2um, which requires the complete pixel layout to be completed within the pixel size of 4.2um.

[0003] In liquid crystal display (LCD) products, in addition to conventional drive backplane and pixel design, it is also necessary to design a spacer (PS) to support the thickness of the box. PS mainly supports the array substrate and color filter (CF) substrate in LCD devices. High PPI LCD pixels generally use self-alignment technology to achieve fine PS design. Summary of the invention

[0004] The following is a summary of the subject matter described in detail herein. This summary is not intended to limit the scope of the claims.

[0005] The embodiments of the present disclosure provide a display substrate and a manufacturing method thereof, and a display device, which simplify the self-alignment process.

[0006] An embodiment of the present disclosure provides a display substrate, comprising: a light-shielding layer arranged on a substrate, and at least one spacer arranged on a side of the light-shielding layer away from the substrate, the orthographic projection of the spacer on the substrate falling within the orthographic projection of the light-shielding layer on the substrate, and a portion of the boundary of the orthographic projection of the spacer on the substrate falling on the boundary of the orthographic projection of the light-shielding layer on the substrate.

[0007] In some embodiments, the spacer is disposed on the surface of the light shielding layer.

[0008] In some embodiments, a non-light-shielding insulating film layer is disposed between the spacer and the light-shielding layer.

[0009] In some embodiments, the material of the insulating film layer includes at least one of the following: silicon oxide and silicon nitride.

[0010] In some embodiments, the light shielding layer includes a plurality of first strip-shaped portions extending along a first direction and a plurality of second strip-shaped portions extending along a second direction, and the plurality of first strip-shaped portions and the plurality of second strip-shaped portions cross to form a mesh structure;

[0011] The orthographic projection of a portion of the boundary of the spacer extending along the first direction on the substrate falls within the orthographic projection of the second strip-shaped portion on the substrate, the orthographic projection of the remaining boundary extending along the first direction on the substrate falls on the boundary of the orthographic projection of the first strip-shaped portion on the substrate, and the orthographic projection of the boundary of the spacer extending along the second direction on the substrate is located within the orthographic projection of the first strip-shaped portion on the substrate; or, the orthographic projection of a portion of the boundary of the spacer extending along the second direction on the substrate falls within the orthographic projection of the first strip-shaped portion on the substrate, the orthographic projection of the remaining boundary extending along the second direction on the substrate falls on the boundary of the orthographic projection of the second strip-shaped portion on the substrate, and the orthographic projection of the boundary of the spacer extending along the first direction on the substrate is located within the orthographic projection of the second strip-shaped portion on the substrate.

[0012] In some embodiments, the display substrate is a color film substrate, and the light shielding layer is a black matrix.

[0013] In some embodiments, the display substrate is an array substrate.

[0014] The present disclosure provides a method for manufacturing a display substrate, comprising:

[0015] forming a light shielding layer on the substrate;

[0016] A spacer layer covering the light shielding layer and the substrate is formed on the side of the light shielding layer away from the substrate, and the spacer layer is a positive photoresist;

[0017] Using a preset mask to shield a preset target area, exposing the spacer layer outside the preset target area from a first exposure direction, wherein the orthographic projection of the preset target area on the substrate overlaps with the orthographic projection of the light-shielding layer on the substrate; and using the light-shielding layer to shield light, exposing the spacer layer that is not shielded by the light-shielding layer from a second exposure direction; the first exposure direction and the second exposure direction are opposite, and the first exposure direction is from the spacer layer to the substrate;

[0018] The spacer layer is developed to form at least one spacer.

[0019] In some embodiments, shielding a preset target area with a preset mask, exposing the spacer layer outside the preset target area from a first exposure direction, and shielding the spacer layer with the light shielding layer, exposing the spacer layer not shielded by the light shielding layer from a second exposure direction include:

[0020] The preset target area is shielded by using a preset mask, the spacer layer outside the preset target area is exposed from the first exposure direction, the shading layer is used for shading, and the spacer layer in the preset target area that is not shielded by the shading layer is exposed from the second exposure direction.

[0021] In some embodiments, shielding a preset target area with a preset mask, exposing the spacer layer outside the preset target area from a first exposure direction, and shielding the spacer layer with the light shielding layer, exposing the spacer layer not shielded by the light shielding layer from a second exposure direction include:

[0022] The shading layer is used for shading, and after the spacer layer not blocked by the shading layer is exposed from the second exposure direction, the preset target area is shielded by the preset mask, and the spacer layer not blocked by the shading layer and located outside the preset target area is exposed from the first exposure direction.

[0023] An embodiment of the present disclosure provides a display device, comprising the display substrate described in any of the above embodiments.

[0024] An embodiment of the present disclosure provides a display device, characterized in that it comprises: an array substrate and a color filter substrate, wherein the array substrate is any of the display substrates described above, and the color filter substrate is any of the display substrates described in the above embodiments.

[0025] The disclosed embodiment includes a display substrate, including: a light shielding layer disposed on a substrate, at least one spacer disposed on a side of the light shielding layer away from the substrate, the orthographic projection of the spacer on the substrate falling within the orthographic projection of the light shielding layer on the substrate, and a portion of the boundary of the orthographic projection of the spacer on the substrate falling on the boundary of the orthographic projection of the light shielding layer on the substrate. The disclosed embodiment provides a solution in which a portion of the boundary of the spacer falls within the light shielding layer, and a portion of the boundary falls on the boundary of the light shielding layer, which facilitates self-alignment with the light shielding layer and simplifies the self-alignment process.

[0026] Other features and advantages of the present invention will be described in the following description, and partly become apparent from the description, or understood by practicing the present invention. The objects and advantages of the present invention can be realized and obtained by the structures particularly pointed out in the description and the drawings.

[0027] Other aspects will be apparent upon reading and understanding the drawings and detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] The accompanying drawings are used to provide a further understanding of the technical solution of the present disclosure and constitute a part of the specification. Together with the embodiments of the present disclosure, they are used to explain the technical solution of the present disclosure and do not constitute a limitation on the technical solution.

[0029] Figure 1A A cross-sectional view after a black matrix, a color filter layer and a light-blocking layer are formed, provided in a technical solution;

[0030] Figure 1B A cross-sectional view after forming a hard mask layer provided by a technical solution;

[0031] Figure 1C A cross-sectional view after forming a hard mask layer pattern provided by a technical solution;

[0032] Figure 1D A cross-sectional view after forming a spacer layer pattern provided by a technical solution;

[0033] Figure 1E A cross-sectional view after shrinking the hard mask layer provided by a technical solution;

[0034] Figure 1F A cross-sectional view after reducing the spacer layer provided by a technical solution;

[0035] Figure 1G A cross-sectional view after etching and removing the hard mask layer provided by a technical solution;

[0036] Figure 2A A cross-sectional view after forming a hard mask layer provided by a technical solution;

[0037] Figure 2B A cross-sectional view after forming a hard mask layer pattern provided by a technical solution;

[0038] Figure 2C A cross-sectional view after forming a spacer layer pattern provided by a technical solution;

[0039] Figure 2D A cross-sectional view after reducing the spacer layer provided by a technical solution;

[0040] Figure 2E A cross-sectional view after etching and removing the hard mask layer provided by a technical solution;

[0041] Figure 3 A flow chart of a method for manufacturing a display substrate provided in an embodiment of the present disclosure;

[0042] Figure 4A A top view after forming a black matrix is ​​provided for an exemplary embodiment. Figure 4B For along Figure 4A Cross-sectional view along the AA' direction;

[0043] Figure 5A A top view after forming a first spacer film is provided for an exemplary embodiment. Figure 5B For along Figure 5A Cross-sectional view along the AA' direction;

[0044] Fig. 6A is a schematic diagram of an exposure direction provided by an exemplary embodiment, Figure 6B is a top view after exposure from the first exposure direction Z1, Figure 6C For along Figure 6B Cross-sectional view along the AA' direction;

[0045] Fig. 7A is a schematic diagram of an exposure direction provided by an exemplary embodiment, Figure 7B is a top view after exposure from the second exposure direction Z2, Figure 7C For along Figure 7B Cross-sectional view along the AA' direction;

[0046] Fig. 8A A top view after development is provided for an exemplary embodiment, Figure 8B For along Fig. 8A Cross-sectional view along the AA' direction;

[0047] Fig. 9A is a schematic diagram of an exposure direction provided by an exemplary embodiment, Fig. 9B is a top view after exposure from the second exposure direction Z2, Fig. 9C For along Figure 7B Cross-sectional view along the AA' direction;

[0048] Fig. 10A is a schematic diagram of an exposure direction provided by an exemplary embodiment, Fig. 10B is a top view after exposure from the first exposure direction Z1, Fig. 10C For along Fig. 10B Cross-sectional view along the AA' direction;

[0049] Fig.11A A top view after forming a light shielding layer is provided for an exemplary embodiment. Fig. 11B For along Fig.11A Cross-sectional view along the BB' direction;

[0050] Fig. 12A A top view after forming a second spacer film is provided for an exemplary embodiment. Fig. 12B For along Fig. 12A Cross-sectional view along the BB' direction;

[0051] Fig.13Ais a schematic diagram of an exposure direction provided by an exemplary embodiment, Fig. 13B is a top view after exposure from the first exposure direction Z1, Fig. 13C For along Fig. 13B Cross-sectional view along the BB' direction;

[0052] Fig.14A is a schematic diagram of an exposure direction provided by an exemplary embodiment, Fig. 14B is a top view after exposure from the second exposure direction Z2, Fig. 14C For along Fig. 14B Cross-sectional view along the BB' direction.

[0053] Fig.15A A top view after development is provided for an exemplary embodiment, Fig. 15B For along Fig.15A Cross-sectional view along the BB' direction;

[0054] Fig.16A is a schematic diagram of an exposure direction provided by an exemplary embodiment, Fig. 16B is a top view after exposure from the second exposure direction Z2, Fig. 16C For along Fig. 14B Cross-sectional view along the BB' direction;

[0055] Fig.17A is a schematic diagram of an exposure direction provided by an exemplary embodiment, Fig. 17B is a top view after exposure from the first exposure direction Z1, Fig. 17C For along Fig. 17B Cross-sectional view along the BB' direction;

[0056] Fig.18A A cross-sectional view of an array substrate provided for an exemplary embodiment;

[0057] Fig.18B A cross-sectional view of an array substrate provided for another exemplary embodiment;

[0058] Fig.19 A cross-sectional view of a display device is provided as an exemplary embodiment. DETAILED DESCRIPTION

[0059] The embodiments of the present disclosure will be described in detail below in conjunction with the accompanying drawings. In the absence of conflict, the embodiments of the present disclosure and the features in the embodiments can be combined with each other arbitrarily.

[0060] The steps shown in the flowchart of the accompanying drawings can be executed in a computer system such as a set of computer executable instructions. Also, although a logical sequence is shown in the flowchart, in some cases, the steps shown or described can be performed in a sequence different from that shown here.

[0061] Unless otherwise defined, technical or scientific terms used in the present disclosure should have the common meanings understood by one of ordinary skill in the art to which the present invention belongs.

[0062] In the drawings, the size of each component, the thickness of a layer, or the area is sometimes exaggerated for the sake of clarity. Therefore, the embodiments of the present disclosure are not necessarily limited to such dimensions, and the shapes and sizes of the components in the drawings do not reflect the true proportions. In addition, the drawings schematically show ideal examples, and the embodiments of the present disclosure are not limited to the shapes or values ​​shown in the drawings.

[0063] The ordinal numbers such as “first”, “second” and “third” in the present disclosure are provided to avoid confusion among constituent elements and do not indicate any order, quantity or importance.

[0064] In the present disclosure, for the sake of convenience, the words and phrases indicating the orientation or positional relationship, such as "middle", "upper", "lower", "front", "back", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., are used to illustrate the positional relationship of the constituent elements with reference to the drawings. This is only for the convenience of describing the present specification and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation of the present disclosure. The positional relationship of the constituent elements is appropriately changed according to the direction in which each constituent element is described. Therefore, it is not limited to the words and phrases described in the disclosure and can be appropriately replaced according to the circumstances.

[0065] In the present disclosure, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate, or the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present disclosure can be understood according to specific circumstances.

[0066] In the present disclosure, “perpendicular” means a state where the angle formed by two straight lines is greater than or equal to 80° and less than or equal to 100°, and therefore includes a state where the angle is greater than or equal to 85° and less than or equal to 95°.

[0067] In the present disclosure, "film" and "layer" may be interchanged. For example, "conductive layer" may be replaced with "conductive film" in some cases. Similarly, "insulating film" may be replaced with "insulating layer" in some cases.

[0068] The phrase “the orthographic projection of B is within the range of the orthographic projection of A” in the present disclosure means that the boundary of the orthographic projection of B falls within the boundary of the orthographic projection of A, or that the boundary of the orthographic projection of A overlaps with the boundary of the orthographic projection of B.

[0069] Figures 1A to 1G A schematic diagram of a manufacturing process of a spacer for a color filter substrate provided by a technical solution. In the technical solution, the manufacturing process of the spacer includes:

[0070] A black matrix (BM) 2, a color filter layer 3 and a light blocking layer 4 are sequentially formed on a substrate 1. Figure 1A As shown;

[0071] A buffer layer 5, a spacer layer 6 and a hard mask layer 7 are sequentially formed on the side of the light blocking layer 4 away from the substrate 1. Figure 1B As shown; in some embodiments, the buffer layer 5 may not be formed;

[0072] A photoresist is coated to form a photoresist film 8, and the hard mask layer 7 is patterned to form a hard mask layer pattern, such as Figure 1C As shown;

[0073] Using the hard mask layer 7 as a shield, the spacer layer 6, the buffer layer 5 and the light blocking layer 4 are etched to form patterns of the spacer layer 6, the buffer layer 5 and the light blocking layer 4, such as Figure 1D As shown;

[0074] The hard mask layer 7 is etched to reduce the size of the hard mask layer 7. Figure 1E As shown;

[0075] Using the reduced hard mask layer 7 as a shield, the spacer layer 6 is etched to reduce the size of the spacer layer 6. Figure 1F As shown;

[0076] The hard mask layer 7 is removed by etching, such as Figure 1G shown.

[0077] In the above scheme, self-alignment between the spacer layer 5 and the light blocking layer 4 is achieved through a mask and a hard mask layer, and the light blocking layer 4 and the hard mask layer 7 are additionally added. The film formation and etching processes of the light blocking layer 4 and the hard mask layer 7 are added, including plasma etching, etc. The scheme is relatively complicated, and the light blocking layer 4 causes a loss in aperture ratio.

[0078] FIG. 2A to FIG. 2E A schematic diagram of a manufacturing process of a spacer of an array substrate provided by a technical solution. In the technical solution, the manufacturing process of the spacer includes:

[0079] After forming a driving structure layer including transistors on the substrate, a protective layer 9 and a barrier layer 10 are formed, and a light shielding layer 15, a spacer layer 16 and a hard mask layer 17 are sequentially formed on the side of the barrier layer 10 away from the substrate. Figure 2A As shown;

[0080] Coat the photoresist 18, and pattern the hard mask layer 17 to form a hard mask layer 17 pattern, such as Figure 2B As shown;

[0081] The light shielding layer 15 and the spacer layer 16 are etched by an inductively coupled plasma (ICP) process to form patterns of the light shielding layer 15 and the spacer layer 16, such as Figure 2C As shown;

[0082] The spacer layer 16 is etched by an ashing process to reduce the size of the spacer layer 16. Figure 2D As shown;

[0083] The hard mask layer 17 is removed by etching. Figure 2E shown.

[0084] In the above solution, a hard mask layer 17 needs to be added, thereby increasing the film forming and etching processes of the hard mask layer, and the process is relatively complicated.

[0085] In the disclosed embodiment, a mask and a light-shielding layer (the light-shielding layer for the color film substrate is a black matrix) are used as shields respectively, and the spacer layer is manufactured by double exposure on the front and back sides, without adding additional film layers, and the process is simple.

[0086] Figure 3 The following is a flow chart of a method for manufacturing a display substrate provided by an embodiment of the present disclosure. Figure 3 As shown, the present disclosure provides a method for manufacturing a display substrate, comprising:

[0087] Step 301, forming a light shielding layer on a substrate;

[0088] Step 302, forming a spacer layer covering the light shielding layer and the substrate on a side of the light shielding layer away from the substrate, wherein the spacer layer is a positive photoresist;

[0089] Step 303, using a preset mask to shield a preset target area, exposing the spacer layer outside the preset target area from a first exposure direction, wherein the orthographic projection of the preset target area on the substrate overlaps with the orthographic projection of the light-shielding layer on the substrate; and using the light-shielding layer to shield light, exposing the spacer layer that is not shielded by the light-shielding layer from a second exposure direction; the first exposure direction and the second exposure direction are opposite, and the first exposure direction is from the spacer layer to the substrate;

[0090] Step 304: Develop the spacer layer to form at least one spacer.

[0091] The solution provided in this embodiment uses a mask plate and a light-shielding layer for shielding, and then exposes the front and back sides and then develops them to complete the manufacture of the spacer layer. There is no need to add additional film layers and no need to perform etching. The process is simple, the cost is reduced, and there is no loss in aperture ratio.

[0092] In some embodiments, the display substrate may be a color filter substrate. When the display substrate is a color filter substrate, the light shielding layer may be a black matrix.

[0093] In some embodiments, the display substrate may be an array substrate. When the display substrate is an array substrate, the light shielding layer may be formed after a driving structure layer including a thin film transistor is formed on the substrate.

[0094] In some embodiments, the area of ​​the orthographic projection of the spacer formed in the preset target area on the substrate is smaller than the area of ​​the preset target area, that is, the area blocked by the preset mask can be larger than the area of ​​the orthographic projection of the spacer finally formed on the substrate.

[0095] In some embodiments, shielding a preset target area with a preset mask, exposing the spacer layer outside the preset target area from a first exposure direction, and shielding the spacer layer with the light shielding layer, exposing the spacer layer not shielded by the light shielding layer from a second exposure direction include:

[0096] The preset target area is shielded by using a preset mask, the spacer layer outside the preset target area is exposed from the first exposure direction, the shading layer is used for shading, and the spacer layer in the preset target area that is not shielded by the shading layer is exposed from the second exposure direction.

[0097] The solution provided in this embodiment is to first expose from a first exposure direction (front side) and then expose from a second exposure direction (back side).

[0098] In some embodiments, shielding a preset target area with a preset mask, exposing the spacer layer outside the preset target area from a first exposure direction, and shielding the spacer layer with the light shielding layer, exposing the spacer layer not shielded by the light shielding layer from a second exposure direction include:

[0099] The shading layer is used for shading, and after the spacer layer not blocked by the shading layer is exposed from the second exposure direction, the preset target area is shielded by the preset mask, and the spacer layer not blocked by the shading layer and located outside the preset target area is exposed from the first exposure direction.

[0100] The solution provided in this embodiment is to first expose from the second exposure direction (back side) and then expose from the first exposure direction (front side).

[0101] An embodiment of the present disclosure provides a color film substrate, comprising: a black matrix arranged on a first substrate, and at least one first spacer arranged on a side of the black matrix away from the first substrate, the orthographic projection of the first spacer on the first substrate falling within the orthographic projection of the black matrix on the first substrate, and a part of the boundary of the orthographic projection of the first spacer on the first substrate falling on the boundary of the orthographic projection of the black matrix on the first substrate.

[0102] In the solution provided by the embodiment of the present disclosure, part of the boundary of the spacer falls within the light shielding layer, and part of the boundary falls on the boundary of the light shielding layer, so as to facilitate self-alignment with the light shielding layer and simplify the self-alignment process during the manufacture of the color filter substrate.

[0103] In some embodiments, the first spacer may be disposed on the surface of the black matrix. That is, the first spacer is disposed on the surface of the black matrix away from the first substrate, and the first spacer is in direct contact with the black matrix. The solution provided in this embodiment does not require an additional light-shielding film layer to be provided for self-alignment, thereby simplifying the structure. However, the disclosed embodiments are not limited thereto, and a non-light-shielding insulating film layer may be provided between the first spacer and the black matrix.

[0104] An embodiment of the present disclosure provides an array substrate, comprising: a light-shielding layer arranged on a second substrate, and at least one second spacer arranged on a side of the light-shielding layer away from the second substrate, the orthographic projection of the second spacer on the second substrate falling within the orthographic projection of the light-shielding layer on the second substrate, and a partial boundary of the orthographic projection of the second spacer on the second substrate falling on the boundary of the orthographic projection of the light-shielding layer on the second substrate.

[0105] In the solution provided by the embodiment of the present disclosure, part of the boundary of the spacer falls within the light shielding layer, and part of the boundary falls on the boundary of the light shielding layer, so as to facilitate self-alignment with the light shielding layer and simplify the self-alignment process during the manufacture of the array substrate.

[0106] In some embodiments, the second spacer may be disposed on the surface of the light shielding layer, that is, the second spacer is disposed on the surface of the light shielding layer away from the second substrate, and the second spacer is in direct contact with the light shielding layer.

[0107] In some embodiments, a non-light-shielding insulating film layer may be provided between the second spacer and the light-shielding layer. The solution provided in this embodiment can enhance the contact force between the second spacer and the light-shielding layer by providing the insulating film layer, thereby preventing the second spacer from falling off.

[0108] In some embodiments, the material of the insulating film layer may include at least one of the following: silicon oxide, silicon nitride.

[0109] The technical solution of this embodiment is further explained below through the preparation process of the color filter substrate and the array substrate. The "patterning process" mentioned in this embodiment includes deposition of film layers, coating of photoresist, mask exposure, development, etching, stripping of photoresist and other processes, which are mature preparation processes in the relevant technology. The "photolithography process" mentioned in this embodiment includes coating of film layers, mask exposure and development, which are mature preparation processes in the relevant technology. Deposition can adopt known processes such as sputtering, evaporation, chemical vapor deposition, coating can adopt known coating processes, and etching can adopt known methods, which are not specifically limited here. In the description of this embodiment, it should be understood that "thin film" refers to a thin film made of a certain material on a substrate using a deposition or coating process. If the "thin film" does not require a patterning process or a photolithography process during the entire production process, the "thin film" can also be called a "layer". If the "thin film" also requires a patterning process or a photolithography process during the entire production process, it is called a "thin film" before the patterning process and a "layer" after the patterning process. The "layer" after the patterning process or the photolithography process contains at least one "pattern".

[0110] In an exemplary embodiment, the manufacturing process of the color film substrate may include:

[0111] 101) Depositing a black matrix film on the first substrate 11 and patterning to form a black matrix 21, such as Figure 4A and Figure 4B As shown; among them, Figure 4A This is a top view after the black matrix 21 is formed. Figure 4B For along Figure 4A Cross-sectional view along the AA' direction.

[0112] In some embodiments, the black matrix 21 may include a plurality of first strip portions 211 extending along a first direction X and a plurality of second strip portions 212 extending along a second direction Y, wherein the plurality of first strip portions 211 are spaced apart along the second direction Y, and the plurality of second strip portions 212 are spaced apart along a direction X, wherein the plurality of first strip portions 211 and the plurality of second strip portions 212 are intersected to form a mesh structure, and the pixel units are distributed in a grid of the mesh structure.

[0113] In some embodiments, the first substrate 11 may be a rigid substrate, such as a glass substrate, or may be a flexible substrate, such as a polyimide (PI) substrate.

[0114] In some embodiments, the black matrix film may be an organic material, such as black organic glue.

[0115] 102) depositing a first spacer film 310 on the first substrate 11 on which the black matrix 21 is formed, such as Figure 5A and Figure 5B As shown, Figure 5A FIG. 3 is a top view after the first spacer film 310 is formed. Figure 5B For along Figure 5A The first spacer film 310 completely covers the black matrix 21 and covers the first substrate 11.

[0116] In some embodiments, the first spacer film 310 may be a positive photoresist material, that is, after exposure, the photoresist in the exposed area will be removed during development, while the photoresist in the blocked area will remain.

[0117] 103) The first preset target area 601 is shielded by using the first preset mask 51, and the first spacer film 310 is exposed from the first exposure direction Z1, so that the first spacer film 310 in the first preset target area 601 is shielded and not exposed, and the first spacer film 310 outside the first preset target area 601 is exposed, such as Fig. 6A , Figure 6B and Figure 6C As shown, Fig. 6A Schematic diagram of exposure direction; Figure 6B is a top view after exposure from the first exposure direction Z1, Figure 6C For along Figure 6B The first exposure direction Z1 is from the first spacer film 310 to the first substrate 11, that is, the exposure is performed by incident light from the front side of the first substrate 11. The first exposure direction Z1 may be perpendicular to the first substrate 11.

[0118] The first preset target area 601 is an area including the area where the first spacer 31 to be formed is located. The first preset target area 601 may be slightly larger than the area occupied by the first spacer 31 to be formed, that is, the orthographic projection of the first spacer 31 on the first substrate 11 falls within the orthographic projection of the first preset target area 601 on the first substrate 11.

[0119] Figure 6B Only one first preset target area 601 is shown in the figure, but the embodiment of the present disclosure is not limited thereto, and corresponding first preset target areas 601 can be set according to the number of first spacers 31. A first spacer 31 can be set at the intersection of each first strip portion 211 and the second strip portion 212, or a first spacer 31 can be set at each of the intersections, and so on.

[0120] 104) exposing the first spacer film 310 from the second exposure direction Z2, at this time, the first spacer film 310 in the area blocked by the black matrix 21 is not exposed, and the first spacer film 310 in the area not blocked by the black matrix 21 is exposed, and previously only the first spacer film 310 in the first preset target area 601 was not exposed, then, in this step, the first spacer film 310 in the first preset target area 601 that is not blocked by the black matrix 21 is exposed, and the first spacer film 310 outside the first preset target area 601 is exposed, as shown in FIG. Fig. 7A , Figure 7B and Figure 7C As shown, Fig. 7A Schematic diagram of exposure direction; Figure 7B is a top view after exposure from the second exposure direction Z2, Figure 7C For along Figure 7B The second exposure direction Z2 is opposite to the first exposure direction Z1, that is, the exposure is performed by incident light from the back side of the first substrate 11. At this time, the unexposed first spacer film 310 forms the first spacer 31.

[0121] It can be seen that since the black matrix 21 is used as a shielding layer, the boundary of the first spacer 31 is divided into two parts, one part of the boundary is projected within the orthographic projection of the black matrix 21 on the first substrate 11, and the other part of the boundary is projected on the first substrate 11 and falls on the boundary of the orthographic projection of the black matrix 21 on the first substrate 11.

[0122] 105) is developed to remove the exposed first spacer film 310, and the remaining unexposed first spacer film 310 forms the first spacer 31. Fig. 8A and Figure 8B As shown, Fig. 8A This is the top view after development. Figure 8B For along Fig. 8A Cross-sectional view along the AA' direction.

[0123] It can be seen that the orthographic projection of part of the boundary of the first spacer 31 extending along the first direction X on the first substrate 11 falls within the orthographic projection of the second strip-shaped portion 212 on the first substrate 11 (does not overlap with the boundary of the orthographic projection of the second strip-shaped portion 212 on the first substrate 11), the orthographic projection of the remaining boundary extending along the first direction X on the first substrate 11 falls on the boundary of the orthographic projection of the first strip-shaped portion 211 on the first substrate 11, and the orthographic projection of the boundary of the first spacer 31 extending along the second direction Y on the first substrate 11 is located within the orthographic projection of the first strip-shaped portion 211 on the first substrate 11 (does not overlap with the boundary of the orthographic projection of the first strip-shaped portion 211 on the first substrate 11).

[0124] The manufacturing method of the color film substrate provided in the embodiment of the present disclosure does not require the additional provision of a light blocking layer and a hard mask layer. Only one mask plate and a black matrix are needed to achieve self-alignment of the spacers. Only an exposure and development process is required, and no etching process is required. The process is simple, the cost is low, and the damage to the film layer is small. In addition, the light blocking layer is not added, and the aperture ratio is not affected.

[0125] In another exemplary embodiment, exposure may be performed by incident light from the back side of the first substrate 11 and then by incident light from the front side of the first substrate 11. The manufacturing process of the color filter substrate may include:

[0126] 201)~202) are the same as steps 101)~102) and will not be described in detail.

[0127] 203) The first spacer film 310 is exposed from the second exposure direction Z2. At this time, the first spacer film 310 in the area blocked by the black matrix 21 is not exposed, and the first spacer film 310 in the area not blocked by the black matrix 21 is exposed. Fig. 9A , Fig. 9B and Fig. 9C As shown, Fig. 9A Schematic diagram of exposure direction; Fig. 9B is a top view after exposure from the second exposure direction Z2, Fig. 9C For along Figure 7B Cross-sectional view along the AA' direction.

[0128] 204) using the first preset mask 51 to shield the first preset target area 601, and exposing the first spacer film 310 from the first exposure direction Z1, the first spacer film 310 located in the first preset target area 601 and in the shielding area of ​​the black matrix 21 in the previous step is shielded and not exposed, and the first spacer film 310 outside the first preset target area 601 is exposed, that is, the first spacer film 310 located outside the first preset target area 601 and in the shielding area of ​​the black matrix 21 in the previous step is exposed, as shown in FIG. Fig. 10A , Fig. 10B and Fig. 10C As shown, Fig. 10A Schematic diagram of exposure direction; Fig. 10B is a top view after exposure from the first exposure direction Z1, Fig. 10C For along Fig. 10B Cross-sectional view along the AA' direction.

[0129] 205) Same as step 105, developing is performed to form Fig. 8A and Figure 8B The structure shown.

[0130] In an exemplary embodiment, the manufacturing process of the array substrate may include:

[0131] 301) Depositing a light shielding film on the second substrate 12 and patterning to form a light shielding layer 22, such as Fig.11A and Fig. 11B As shown; among them, Fig.11A This is a top view after the light shielding layer 22 is formed. Fig. 11B For along Fig.11A Cross-sectional view along the BB' direction.

[0132] In some embodiments, the light-shielding layer 22 may include a plurality of third strip portions 221 extending along a first direction X and a plurality of fourth strip portions 222 extending along a second direction Y, wherein the plurality of third strip portions 221 are spaced apart along the second direction Y, and the plurality of fourth strip portions 222 are spaced apart along a direction X, wherein the plurality of third strip portions 221 and the plurality of fourth strip portions 222 are intersected to form a mesh structure, and the pixel units are distributed in a grid of the mesh structure.

[0133] In some embodiments, the second substrate 12 may be a rigid substrate, such as a glass substrate, or may be a flexible substrate, such as a polyimide (PI) substrate.

[0134] In some embodiments, the light shielding layer film may include metal, such as molybdenum (Mo).

[0135] 302) depositing a second spacer film 320 on the second substrate 12 having the light shielding layer 22 formed thereon, such as Fig. 12A and Fig. 12B As shown, Fig. 12A FIG. 3 is a top view after the second spacer film 320 is formed. Fig. 12B For along Fig. 12A The second spacer film 320 completely covers the light shielding layer 22 and the second substrate 12.

[0136] In some embodiments, the second spacer film 320 may be a positive photoresist material, that is, after exposure, the photoresist in the exposed area will be removed during development, while the photoresist in the blocked area will remain.

[0137] 303) using the second preset mask 52 to shield the second preset target area 602, and exposing the second spacer film 320 from the first exposure direction Z1, the second spacer film 320 in the second preset target area 602 is shielded and not exposed, and the second spacer film 320 outside the second preset target area 602 is exposed, such as Fig.13A , Fig. 13B and Fig. 13C As shown, Fig.13A Schematic diagram of exposure direction; Fig. 13B is a top view after exposure from the first exposure direction Z1, Fig. 13C For along Fig. 13B The first exposure direction Z1 is from the second spacer film 320 to the second substrate 12, that is, the exposure is performed by incident light from the front side of the second substrate 12. The first exposure direction Z1 may be perpendicular to the second substrate 12.

[0138] The second preset target area 602 is an area including the area where the second spacer 32 to be formed is located. The preset target area can be slightly larger than the area occupied by the second spacer 32 to be formed, that is, the orthographic projection of the second spacer 32 on the second substrate 12 falls into the orthographic projection of the second preset target area on the second substrate 12.

[0139] Fig. 13B Only one second preset target area 602 is shown in the figure, but the embodiment of the present disclosure is not limited thereto, and corresponding second preset target areas 602 may be set according to the number of second spacers 32. For example, a second spacer 32 may be set at the intersection of each third strip 221 and fourth strip 222, or a second spacer 32 may be set at each of a plurality of intersections, and so on.

[0140] 304) exposing the second spacer film 320 from the second exposure direction Z2, at this time, the second spacer film 320 in the area blocked by the light shielding layer 22 is not exposed, and the second spacer film 320 in the area not blocked by the light shielding layer 22 is exposed, and previously only the second spacer film 320 in the second preset target area 602 was not exposed, then, in this step, the second spacer film 320 in the second preset target area 602 that is not blocked by the light shielding layer 22 is exposed, and the second spacer film 320 outside the preset target area 602 is exposed, such as Fig.14A , Fig. 14B and Fig. 14C As shown, Fig.14A Schematic diagram of exposure direction; Fig. 14B is a top view after exposure from the second exposure direction Z2, Fig. 14C For along Fig. 14B The second exposure direction Z2 is opposite to the first exposure direction Z1, that is, the exposure is performed by incident light from the back side of the second substrate 12. At this time, the unexposed second spacer film 320 forms the second spacer 32.

[0141] It can be seen that since the shading layer 22 is used as the shielding layer, the boundary of the second spacer 32 is divided into two parts, one part of the boundary is projected within the orthographic projection of the shading layer 22 on the second substrate 12, and the other part of the boundary is projected on the second substrate 12 and falls on the boundary of the orthographic projection of the shading layer 22 on the second substrate 12.

[0142] 305) is developed to remove the exposed second spacer film 320, and the remaining unexposed second spacer film 320 forms the second spacer 32. Fig.15A and Fig. 15B As shown, Fig.15A This is the top view after development. Fig. 15B For along Fig.15A Cross-sectional view along the BB' direction.

[0143] It can be seen that the orthographic projection of part of the boundary of the second spacer 32 extending along the two directions Y on the second substrate 12 falls within the orthographic projection of the third strip-shaped portion 221 on the second substrate 12 (does not overlap with the boundary of the orthographic projection of the third strip-shaped portion 221 on the second substrate 12), the orthographic projection of the remaining boundary extending along the second direction Y on the second substrate 12 falls on the boundary of the orthographic projection of the fourth strip-shaped portion 222 on the second substrate 12, and the orthographic projection of the boundary of the second spacer 32 extending along the first direction X on the second substrate 12 is located within the orthographic projection of the fourth strip-shaped portion 222 on the second substrate 12 (does not overlap with the boundary of the orthographic projection of the fourth strip-shaped portion 222 on the second substrate 12).

[0144] In addition, it can be seen that the second spacer 32 extends along the second direction Y, and the first spacer 31 extends along the first direction X, and the two extending directions are perpendicular. When the array substrate and the color filter substrate are subsequently assembled, the first spacer 31 and the second spacer 32 can present a cross structure to facilitate the contact between the two. However, the embodiments of the present disclosure are not limited thereto, and the extending directions of the first spacer 31 and the second spacer 32 are not limited.

[0145] The manufacturing method of the spacers of the array substrate provided in the embodiment of the present disclosure does not need to set up an additional hard mask layer. Only one mask plate and a black matrix are needed to achieve self-alignment of the spacers. Only an exposure and development process is required, and no etching process is required. The process is simple, the cost is low, and the damage to the film layer is small.

[0146] In another exemplary embodiment, exposure may be performed first by incident light from the back side of the second substrate 12, and then by incident light from the front side of the second substrate 12. The manufacturing process of the color filter substrate may include:

[0147] 401)~402) are the same as steps 301)~302) and will not be described in detail.

[0148] 403) The second spacer film 320 is exposed from the second exposure direction Z2. At this time, the second spacer film 320 in the area blocked by the light shielding layer 22 is not exposed, and the second spacer film 320 in the area not blocked by the light shielding layer 22 is exposed. Fig.16A , Fig. 16B and Fig. 16C As shown, Fig.16A Schematic diagram of exposure direction; Fig. 16B is a top view after exposure from the second exposure direction Z2, Fig. 16C For along Fig. 14B Cross-sectional view along the BB' direction.

[0149] 404) using the second preset mask 52 to shield the second preset target area 602, and exposing the second spacer film 320 from the first exposure direction Z1, the second spacer film 320 in the second preset target area 602 and located in the shielding area of ​​the previous step shading layer 22 is shielded and not exposed, and the second spacer film 320 outside the second preset target area 602 is exposed, that is, the second spacer film 320 outside the second preset target area 602 and located in the shielding area of ​​the previous step shading layer 22 is exposed, as shown in FIG. Fig.17A , Fig. 17B and Fig. 17C As shown, Fig.17A Schematic diagram of exposure direction; Fig. 17B is a top view after exposure from the first exposure direction Z1, Fig. 17C For along Fig. 17B Cross-sectional view along the BB' direction.

[0150] 405), same as step 305, developing is performed to form Fig.15A and Fig. 15B The structure shown.

[0151] In some embodiments, an insulating layer 71 may be formed between the light shielding layer 22 and the second spacer 32. Fig.18A As shown in FIG. 18B , the insulating layer 71 and the light shielding layer 22 can be formed by a single patterning process, or after the light shielding layer 22 is patterned, an insulating film covering the light shielding layer 22 is deposited. Providing the insulating layer 71 can enhance the contact force between the second spacer 32 and the light shielding layer 22, and prevent the second spacer 32 from falling off.

[0152] In some embodiments, the insulating layer 71 may be silicon oxide (SiO) or silicon nitride (SiN).

[0153] The present disclosure also provides a display device, including the display substrate described in any of the above embodiments, or a display substrate manufactured by the method for manufacturing a display substrate described in any of the above embodiments. The display device can be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a monitor, a laptop computer, a digital photo frame, a navigator, etc.

[0154] The present disclosure also provides a display device, such as Fig.19 As shown, it includes a color filter substrate 100 and an array substrate 200. The color filter substrate 100 may include a first substrate 11, a black matrix 21 and a first spacer 31 sequentially arranged on the first substrate 11, and the array substrate 200 may include a second substrate 12, a light shielding layer 22 and a second spacer 32 sequentially arranged on the second substrate 12. The color filter substrate 100 and the array substrate 200 are arranged opposite to each other, and the first spacer 31 and the second spacer 32 are in contact, so as to provide support for the color filter substrate 100 and the array substrate 200, thereby forming a liquid crystal box, and liquid crystal can be filled in the liquid crystal box.

[0155] In some embodiments, a color filter layer ( Fig.19 The color filter layer may include a first color filter, a second color filter, a third color filter, etc. The first color, the second color, and the third color are, for example, red, green, and blue.

[0156] In some embodiments, a driving structure layer ( Fig.19 The driving structure layer may include a thin film transistor and a pixel electrode for driving the pixel.

[0157] Although the embodiments disclosed in the present invention are as above, the contents described are only embodiments adopted to facilitate understanding of the present invention and are not intended to limit the present invention. Any technician in the field to which the present invention belongs can make any modifications and changes in the form and details of implementation without departing from the spirit and scope disclosed in the present invention, but the patent protection scope of the present invention shall still be subject to the scope defined in the attached claims.

Claims

1. A display substrate, characterized in that: include: A light-shielding layer is arranged on a substrate, and at least one spacer is arranged on a side of the light-shielding layer away from the substrate, the orthographic projection of the spacer on the substrate falls within the orthographic projection of the light-shielding layer on the substrate, and a part of the boundary of the orthographic projection of the spacer on the substrate falls on the boundary of the orthographic projection of the light-shielding layer on the substrate.

2. The display substrate according to claim 1, characterized in that: The spacer is arranged on the surface of the light shielding layer.

3. The display substrate according to claim 1, characterized in that: A non-light-shielding insulating film layer is arranged between the spacer and the light-shielding layer.

4. The display substrate according to claim 3, characterized in that: The material of the insulating film layer includes at least one of the following: silicon oxide and silicon nitride.

5. The display substrate according to claim 1, characterized in that: The light shielding layer includes a plurality of first strip-shaped portions extending along a first direction and a plurality of second strip-shaped portions extending along a second direction, wherein the plurality of first strip-shaped portions and the plurality of second strip-shaped portions cross to form a mesh structure; The orthographic projection of a portion of the boundary of the spacer extending along the first direction on the substrate falls within the orthographic projection of the second strip-shaped portion on the substrate, the orthographic projection of the remaining boundary of the spacer extending along the first direction on the substrate falls on the boundary of the orthographic projection of the first strip-shaped portion on the substrate, and the orthographic projection of the boundary of the spacer extending along the second direction on the substrate is located within the orthographic projection of the first strip-shaped portion on the substrate; Alternatively, the orthographic projection of part of the boundary of the spacer extending along the second direction on the substrate falls within the orthographic projection of the first strip-shaped portion on the substrate, the orthographic projection of the remaining boundary extending along the second direction on the substrate falls on the boundary of the orthographic projection of the second strip-shaped portion on the substrate, and the orthographic projection of the boundary of the spacer extending along the first direction on the substrate is located within the orthographic projection of the second strip-shaped portion on the substrate.

6. The display substrate according to any one of claims 1 to 5, characterized in that: The display substrate is a color film substrate, and the light shielding layer is a black matrix.

7. The display substrate according to any one of claims 1 to 5, characterized in that: The display substrate is an array substrate.

8. A method for manufacturing a display substrate, characterized in that: include: forming a light shielding layer on the substrate; A spacer layer covering the light shielding layer and the substrate is formed on the side of the light shielding layer away from the substrate, and the spacer layer is a positive photoresist; Using a preset mask to shield a preset target area, exposing the spacer layer outside the preset target area from a first exposure direction, wherein the orthographic projection of the preset target area on the substrate overlaps with the orthographic projection of the shielding layer on the substrate; and, using the light shielding layer to shield light, exposing the spacer layer that is not shielded by the light shielding layer from a second exposure direction; The first exposure direction is opposite to the second exposure direction, and the first exposure direction is from the spacer layer to the substrate; The spacer layer is developed to form at least one spacer.

9. The method for manufacturing a display substrate according to claim 8, wherein: The method of shielding a preset target area by using a preset mask, exposing the spacer layer outside the preset target area from a first exposure direction, and shielding the spacer layer by using the light shielding layer, and exposing the spacer layer not shielded by the light shielding layer from a second exposure direction comprises: The preset target area is shielded by using a preset mask, the spacer layer outside the preset target area is exposed from the first exposure direction, the shading layer is used for shading, and the spacer layer in the preset target area that is not shielded by the shading layer is exposed from the second exposure direction.

10. The method for manufacturing a display substrate according to claim 8, wherein: The method of shielding a preset target area by using a preset mask, exposing the spacer layer outside the preset target area from a first exposure direction, and shielding the spacer layer by using the light shielding layer, and exposing the spacer layer not shielded by the light shielding layer from a second exposure direction comprises: The shading layer is used for shading, and after the spacer layer not blocked by the shading layer is exposed from the second exposure direction, the preset target area is shielded by the preset mask, and the spacer layer not blocked by the shading layer and located outside the preset target area is exposed from the first exposure direction.

11. A display device, characterized in that: A display substrate comprising the display substrate as claimed in any one of claims 1 to 7, or a display substrate manufactured according to the method for manufacturing a display substrate as claimed in any one of claims 8 to 10.

12. A display device, characterized in that: include: An array substrate and a color filter substrate, wherein the array substrate is a display substrate as claimed in any one of claims 1 to 5, and the color filter substrate is a display substrate as claimed in any one of claims 1 to 6.

Images