Preparation method of porous ceramic atomizing core with curved atomizing surface

Abstract

The invention discloses a preparation method of a porous ceramic atomizing core with a curved atomizing surface, which comprises the following steps of: 1, preparing a porous ceramic substrate, namely preparing a porous ceramic green body with the curved atomizing surface during forming, and sintering the porous ceramic green body into the porous ceramic substrate with the curved atomizing surface; 2, preparing a heating film, namely coating metal platinum on the curved atomization surface of the porous ceramic substrate by adopting an atomic layer deposition process to form the heating film; and 3, preparing an electrode layer, printing a layer of electrode material at two ends of the heating film, further leveling, drying, discharging glue and sintering to obtain the electrode layer, and preparing to obtain the porous ceramic atomization core with the curved atomization surface. The method has the beneficial effects that the metal film with the uniform thickness can be prepared on the curved surface to serve as the heating film, the thickness is uniform, the heating temperature is stable, the temperature and the resistance value have the good linear proportion, the temperature is easy to detect and control, dry burning of the atomization core can be avoided, and dry burning protection is achieved.

Description

Technical Field

[0001] The present invention belongs to the technical field of atomizer cores of electronic atomization equipment, and in particular relates to a method for preparing a porous ceramic atomizer core with a curved atomization surface. Background Art

[0002] Electronic atomization equipment includes electronic cigarettes, electronic atomizers, etc., which are used to generate aerosols or drug-containing vapors, electronic smoke, etc. The atomization core is the core component of the electronic atomization device. The atomization core includes a liquid guide and a heating element arranged on the surface of the liquid guide. The liquid guide can be composed of a porous ceramic matrix made by sintering a porous ceramic material. The performance of the atomization core directly affects the atomization efficiency, aerosol characteristics, and safety of the electronic atomization device. According to the airway structure design of different electronic atomization devices, the atomization core needs to have different shapes of atomization surfaces to match in order to obtain the best taste. The traditional pre-embedded heating wire die-casting atomizer, the heating wire is powered on to heat up and atomize the smoke oil, but when the smoke oil is insufficient or the power of the heating wire is too large, the temperature of the heating wire will rise rapidly, and the atomization core is prone to dry burning, which is easy to produce a burnt taste, affecting the user's taste, and even causing the human body to inhale harmful substances produced by dry burning. Another type of thick film heating element, resistor, etc. are generally only suitable for planar atomization cores with regular surfaces. At present, there are also some atomizer core heating components on the market that use evaporation, physical vapor deposition and other coating processes to prepare heating films on the atomization surface of porous ceramic substrates. However, this type of process will produce uneven coating on non-planar surfaces, resulting in unstable heating of the atomizer core during operation. In addition, for small-sized components such as ceramic atomizer cores, it is impossible to coat the curved surface of the inner cavity with a large aspect ratio before cutting using traditional coating methods. Summary of the invention

[0003] The technical problem solved by the present invention is to overcome the deficiencies of the prior art and provide a method for preparing a porous ceramic atomizing core with a curved atomizing surface and an atomizing core thereof.

[0004] The technical solution of the present invention is a method for preparing a porous ceramic atomizing core having a curved atomizing surface, comprising the following steps:

[0005] 1. Preparation of porous ceramic matrix:

[0006] Obtaining ceramic aggregate: selecting at least one or more of powdered diatomaceous earth, alumina, silicon nitride, fused quartz powder, glass sand, feldspar powder, and mullite as ceramic aggregate, and grading and sieving the ceramic aggregate to obtain the ceramic aggregate with an average particle size of 7.5-150 μm;

[0007] Obtaining a sintering aid: selecting at least one or more of powdered boron oxide, sodium silicate, silicon oxide, potassium oxide, calcium oxide, iron oxide, titanium oxide, zinc oxide, and zirconium oxide as a sintering aid;

[0008] Obtaining a pore-forming agent: selecting at least one or more of powdered starch, wood powder, graphite powder, polystyrene microspheres, and polymethyl methacrylate microspheres as a pore-forming agent, and grading and sieving the pore-forming agent to obtain the pore-forming agent with an average particle size of 5-100 μm;

[0009] Obtaining a dispersant: selecting at least one or more of paraffin wax, beeswax, boric acid, oleic acid, stearic acid, polyethylene, polypropylene, polyvinyl acetate, polyvinyl acetal, ethylene-vinyl acetate copolymer resin, and vinyl chloride-vinyl acetate copolymer resin as the dispersant;

[0010] 40-65 parts of the ceramic aggregate, 10-30 parts of the sintering aid, and 10-30 parts of the pore-forming agent are selected by weight, mixed, and then added into 5-30 parts of the melted dispersant and stirred evenly, and then formed into a porous ceramic green body with a curved atomized surface, and further the porous ceramic green body is dewaxed and sintered to obtain a porous ceramic matrix with a curved atomized surface;

[0011] 2. Preparation of heating film:

[0012] The surface of the porous ceramic substrate is protected with a high-temperature tape, and the curved atomized surface to be coated is exposed and then placed in the reaction chamber of an atomic layer deposition device, and a metal platinum film is coated on the curved atomized surface of the porous ceramic substrate by an atomic layer deposition process to form a heating film; wherein the reaction source of platinum is a group selected from (trimethyl) methylcyclopentadiene platinum and oxygen, or (trimethyl) methylcyclopentadiene platinum and hydrogen, or hexafluoroacetylacetonate platinum and formalin, or acetylacetonate platinum and ozone; the thickness of the heating film is prepared to be 30-300nm, and the resistance of the heating film is prepared to be 0.5-2.0Ω;

[0013] 3. Preparation of electrode layer:

[0014] Selecting printable silver paste, silver-palladium paste, or aluminum paste as the electrode material, printing a layer of the electrode material on both ends of the curved atomized surface of the porous ceramic substrate through a prefabricated screen, further leveling, drying, debinding, and sintering to obtain the electrode layer;

[0015] The order of steps 2 and 3 can be switched, and at least a portion of the electrode layer overlaps with the heating film so that the two are electrically connected.

[0016] Preferably, the average particle size of the ceramic aggregate is 10-60 μm.

[0017] Preferably, the average particle size of the pore former is 15-50 μm.

[0018] Preferably, in the step of preparing the porous ceramic matrix, the ceramic aggregate is selected to be 40-50 parts, the sintering aid is selected to be 20-30 parts, the pore-forming agent is selected to be 15-30 parts, and the dispersant is selected to be 15-30 parts.

[0019] Preferably, in the step of preparing the porous ceramic matrix, the porous ceramic green body is formed by one of hot die casting, injection molding and dry pressing.

[0020] Preferably, it is characterized in that, in the step of preparing the porous ceramic matrix, the temperature of dewaxing is 450-850°C, and the temperature of sintering is 750-1250°C.

[0021] Preferably, in the step of preparing the porous ceramic matrix, the porosity of the porous ceramic matrix is ​​prepared to be 30-70%, and the average pore size of the porous ceramic matrix is ​​prepared to be 5-60 μm.

[0022] Preferably, in the step of preparing the heating film, the thickness of the heating film is prepared to be 50-200 nm, and the resistance of the heating film is prepared to be 0.7-1.5Ω.

[0023] Preferably, in the step of preparing the heating film, the reaction source of platinum is selected as (trimethyl) methylcyclopentadiene platinum and oxygen, the chamber temperature of the atomic layer deposition equipment is set to 250-350°C, the heating value of the reaction source (trimethyl) methylcyclopentadiene platinum is set to 50-100°C, oxygen is selected as the reaction gas, nitrogen is selected as the blowing gas, and the gas pressure of the chamber is maintained at 100-200Pa.

[0024] Preferably, the step of preparing the heating film further comprises:

[0025] S1, the precursor (trimethyl) methylcyclopentadienyl platinum enters the reaction chamber in a pulsed manner and chemically adsorbs on the atomized surface of the porous ceramic substrate;

[0026] S2, after the surface adsorption is saturated, the excess precursor is purged out of the reaction chamber with inert gas nitrogen;

[0027] S3, introducing the second reaction gas oxygen into the reaction chamber in a pulsed manner, and reacting with the precursor previously adsorbed on the atomized surface of the porous ceramic substrate;

[0028] S4. After the reaction is completed, the excess precursor and by-products are purged out of the reaction chamber with nitrogen;

[0029] S5. Repeat the above cycle process from S1 to S4 to continuously increase the coating thickness so as to achieve the required resistance value of the heating film.

[0030] Compared with the prior art, the invention has the following beneficial effects: the method for preparing a porous ceramic atomizing core with a curved atomizing surface of the invention comprises the following steps: firstly, a certain amount of ceramic aggregate, a sintering aid, and a pore-forming agent are selected by weight, mixed evenly, added into a molten dispersant, and stirred evenly; then, the mixture is formed into a porous ceramic green body with a curved atomizing surface; and the porous ceramic green body is dewaxed and sintered to obtain a porous ceramic substrate with a curved atomizing surface; then, an atomic layer deposition technique is used to form a uniform adsorption layer of a metal platinum precursor on the curved atomizing surface of the porous ceramic substrate; and further, the porous ceramic green body is formed into a porous ceramic substrate with a curved atomizing surface. Reaction gas is added to the curved atomizing surface of the porous ceramic substrate to generate a metal film as a heating film. This method can prepare a metal film with uniform thickness on a curved surface. The prepared ceramic atomizing core has a heating film with uniform thickness, a stable heating temperature, and a good correspondence and linear proportion between the temperature and the resistance. The temperature can be easily detected and controlled through resistance detection. In the case of insufficient atomizing liquid supply or excessive power of the heating film, the power supply can be cut off or the power can be reduced so that the temperature of the heating film will not rise rapidly, thereby avoiding dry burning of the atomizing core and achieving dry burning protection. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments of the present application will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. Unless otherwise stated, the drawings in the drawings do not constitute a scale limitation.

[0032] Figure 1 A three-dimensional view of a porous ceramic atomizing core having a curved atomizing surface according to the present invention;

[0033] Figure 2 It is a three-dimensional exploded structural diagram of the porous ceramic atomizing core with a curved atomizing surface of the present invention. DETAILED DESCRIPTION

[0034] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0035] like Figure 1 , Figure 2As shown, a porous ceramic atomizing core with a curved atomizing surface prepared by the present invention is applied to electronic atomizing equipment, including a porous ceramic substrate 1, a heating film 2 arranged on the atomizing surface of the porous ceramic substrate, and an electrode layer 3 arranged at both ends of the heating film 2, wherein the porous ceramic substrate 1 has many micropores, and the micropores are interconnected to form microchannels for adsorbing and conducting atomized liquid. In this embodiment, the porous ceramic substrate 1 has an atomizing surface 12 with a concave curved shape instead of a flat shape, that is, the atomizing surface 12 is a curved atomizing surface, and the other side facing away from the atomizing surface 12 is a liquid absorption surface 11. The heating film 2 is made of metal material, and has the function of heating when powered on and heating the atomized liquid to cause it to evaporate into an aerosol or smoke. The electrode layer 3 is used to connect the positive and negative poles of the power supply and supply power to the heating film 2.

[0036] The porous ceramic atomization core with a curved atomizing surface prepared by the present invention, when working, the atomized liquid stored in the electronic atomization device can flow to the liquid absorption surface 11 of the porous ceramic matrix 1, and then be adsorbed in the porous ceramic matrix, and further conducted to the heating film 2 on the atomizing surface 12. The heating film 2 also has many micropores. The heating film 2 is powered on to generate heat to evaporate the atomized liquid into aerosol or smoke, and emit it from the micropores of the heating film 2.

[0037] In other embodiments, the liquid absorption surface 11 having an outwardly convex curved shape instead of a flat shape in this embodiment may also be used as an atomizing surface, and the atomizing surface 12 may be used as a liquid absorption surface.

[0038] The method for preparing a porous ceramic atomizing core having a curved atomizing surface of the present invention comprises the following steps:

[0039] 1. Preparation of porous ceramic matrix:

[0040] Obtaining ceramic aggregate: selecting at least one or more of powdered diatomaceous earth, alumina, silicon nitride, quartz molten powder, glass sand, feldspar powder, and mullite as a mixture, and classifying and sieving the ceramic aggregate to obtain a ceramic aggregate with an average particle size of 7.5-150 μm; preferably, a ceramic aggregate with an average particle size of 10-60 μm, or preferably, a ceramic aggregate with an average particle size of 60-90 μm, or preferably, a ceramic aggregate with an average particle size of 90-120 μm, or preferably, a ceramic aggregate with an average particle size of 120-150 μm.

[0041] Obtaining a sintering aid: selecting at least one or more of powdered boron oxide, sodium silicate, silicon oxide, potassium oxide, calcium oxide, iron oxide, titanium oxide, zinc oxide, and zirconium oxide as a sintering aid;

[0042] Obtaining a pore-forming agent: selecting at least one or more of powdered starch, wood powder, graphite powder, polystyrene microspheres, and polymethyl methacrylate microspheres as a pore-forming agent, and classifying and sieving the pore-forming agent to obtain a pore-forming agent with an average particle size of 5-100 μm; preferably, a pore-forming agent with an average particle size of 15-50 μm; or preferably, a pore-forming agent with an average particle size of 5-15 μm; or preferably, a pore-forming agent with an average particle size of 15-35 μm; or preferably, a pore-forming agent with an average particle size of 35-50 μm; or preferably, a pore-forming agent with an average particle size of 50-75 μm; or preferably, a pore-forming agent with an average particle size of 75-100 μm.

[0043] Obtaining a dispersant: selecting at least one or more of paraffin wax, beeswax, boric acid, oleic acid, stearic acid, polyethylene, polypropylene, polyvinyl acetate, polyvinyl acetal, ethylene-vinyl acetate copolymer resin, and vinyl chloride-vinyl acetate copolymer resin as the dispersant;

[0044] 40-65 parts of ceramic aggregate, 10-30 parts of sintering aid, and 10-30 parts of pore former are selected by weight, mixed, added into 5-30 parts of melted dispersant, and stirred evenly, and then formed into a porous ceramic green body with a curved atomized surface, and the porous ceramic green body is further dewaxed and sintered to obtain a porous ceramic substrate 1 with a curved atomized surface;

[0045] Among them, the temperature of wax removal is 450-850℃, and the temperature of sintering is 750-1250℃;

[0046] Among them, the porosity of the porous ceramic matrix is ​​prepared to be 30-70%, preferably 30-40%, or 40-50%, or 50-60%, or 60-70%, and the average pore size of the porous ceramic matrix is ​​prepared to be 5-60μm, preferably 5-25μm, or 25-45μm, or 45-60μm.

[0047] Among them, when the above are selected by weight, 40-50 parts, or 50-65 parts of ceramic aggregate are preferred, 20-30 parts, or 10-20 parts, or 15-25 parts of sintering aid are preferred, 15-30 parts, or 10-15 parts, or 15-25 parts of pore formers are preferred, and 15-30 parts, or 5-15 parts, or 10-25 parts, or 15-25 parts of dispersants are preferred.

[0048] Among them, the molding method of the porous ceramic green body includes one of hot die casting, injection molding and dry pressing.

[0049] 2. Preparation of heating film:

[0050] The surface of the porous ceramic substrate is protected with high-temperature tape, and the curved atomized surface to be coated is exposed and then placed in the reaction chamber of the atomic layer deposition equipment. The metal platinum is coated on the curved atomized surface of the porous ceramic substrate by atomic layer deposition process to form a heating film 2; wherein the reaction source of platinum is a group selected from (trimethyl) methylcyclopentadiene platinum and oxygen, or (trimethyl) methylcyclopentadiene platinum and hydrogen, or hexafluoroacetylacetonate platinum and formalin, or acetylacetonate platinum and ozone; the thickness of the heating film is prepared to be 30-300nm, and can be preferably prepared to be 50-200nm, or 30-100nm, or 100-200nm, or 200-300nm, and the resistance of the heating film is prepared to be 0.5-2.0Ω, or preferably prepared to be 0.7-1.5Ω, or 0.5-1.0Ω, or 1.0-1.5Ω, or 1.5-2.0Ω.

[0051] Wherein, when the platinum reaction source is (trimethyl) methylcyclopentadiene platinum and oxygen, the chamber temperature of the atomic layer deposition equipment is set to 250-350° C., the heating value of the reaction source (trimethyl) methylcyclopentadiene platinum is set to 50-100° C., oxygen is selected as the reaction gas, nitrogen is selected as the blowing gas, and the gas pressure of the chamber is maintained at 100-200 Pa; the preparation step also includes:

[0052] S1, the precursor (trimethyl) methylcyclopentadienyl platinum enters the reaction chamber in a pulsed manner and chemically adsorbs on the atomized surface of the porous ceramic substrate;

[0053] S2, after the surface adsorption is saturated, the excess precursor is purged out of the reaction chamber with inert gas nitrogen;

[0054] S3, introducing the second reaction gas oxygen into the reaction chamber in a pulsed manner, and reacting with the precursor previously adsorbed on the atomized surface of the porous ceramic substrate;

[0055] S4. After the reaction is completed, the excess precursor and by-products are purged out of the reaction chamber with nitrogen;

[0056] S5. Repeat the above cycle process from S1 to S4 to continuously increase the coating thickness so as to achieve the required resistance value of the heating film.

[0057] 3. Preparation of electrode layer:

[0058] Select printable silver paste, silver palladium paste, or aluminum paste as the electrode material, print a layer of electrode material on both ends of the curved atomized surface of the porous ceramic substrate 1 through a prefabricated screen, further level and dry, then perform binder removal and sintering to obtain an electrode layer 3, the thickness of the electrode layer 3 is prepared to be 5-50 μm, preferably 10-40 μm, or 15-35 μm;

[0059] The order of the above steps 2 and 3 can be reversed, that is, the heating film 2 can be prepared on the curved atomized surface 12 of the porous ceramic substrate 1 first, and then the electrode layer 3 can be covered on both ends of the curved atomized surface of the prepared heating film 2; or the electrode layer 3 can be prepared on both ends of the curved atomized surface 12 of the porous ceramic substrate 1 first, and then the heating film 2 can be covered on the curved atomized surface 12 and the electrode layer 3. In this way, at least a part of the electrode layer 3 prepared in the two ways overlaps with the heating film 2 so that the two are electrically connected.

[0060] The present invention will be further described in detail below in conjunction with more specific embodiments:

[0061] Example

[0062] like Figure 1 , Figure 2 The porous ceramic atomizing core with a curved atomizing surface of the present invention is shown, and the preparation method thereof comprises the following steps:

[0063] 1. Preparation of porous ceramic matrix:

[0064] 1. Obtain ceramic aggregate: select 150g of diatomaceous earth with an average particle size of 50um, 200g of quartz powder with an average particle size of 30um, and 130g of quartz powder with an average particle size of 15um, and mix them evenly as ceramic aggregate;

[0065] 2. Obtain sintering aid: select 50g boron oxide powder, 12g aluminum oxide powder, and 98g sodium silicate powder and mix them evenly as sintering aid;

[0066] 3. Obtain pore-forming agent: Select polymethyl methacrylate microspheres with an average particle size of 30 μm as pore-forming agent;

[0067] 4. Obtain dispersant: Mix 130g paraffin, 10g beeswax and 5g oleic acid as dispersant;

[0068] 5. The above-mentioned ceramic aggregate, pore-forming agent and sintering aid are mixed evenly, added into the molten dispersant and stirred evenly, and then injection molded into a porous ceramic green body with a curved atomized surface. The porous ceramic green body is further dewaxed and sintered, wherein the dewaxing temperature is 750°C, and the sintering temperature is 950°C. After sintering, a porous ceramic substrate 1 with a curved atomized surface is obtained; the porosity of the porous ceramic substrate 1 is 55%, and the average pore size of the porous ceramic substrate 1 is 18 μm.

[0069] 2. Preparation of heating film:

[0070] 6. Protect the surface of the porous ceramic substrate 1 with high-temperature tape, expose the curved atomized surface to be coated, and then place it into the reaction chamber of the atomic layer deposition equipment. Use the atomic layer deposition process to coat metal platinum on the curved atomized surface 12 of the porous ceramic substrate to form a heating film 2.

[0071] The reaction source of platinum is selected as (trimethyl) methylcyclopentadienyl platinum and oxygen, the chamber temperature of the atomic layer deposition equipment is set to 300°C, the heating value of the reaction source (trimethyl) methylcyclopentadienyl platinum is set to 70°C, oxygen is selected as the reaction gas, nitrogen is selected as the blowing gas, and the gas pressure of the chamber is maintained at 130Pa.

[0072] The specific steps of preparing the heating film 2 also include:

[0073] S1, the precursor (trimethyl) methylcyclopentadienyl platinum enters the reaction chamber in a pulsed manner and chemically adsorbs on the atomized surface of the porous ceramic substrate;

[0074] S2, after the surface adsorption is saturated, the excess precursor is purged out of the reaction chamber with inert gas nitrogen;

[0075] S3, introducing the second reaction gas oxygen into the reaction chamber in a pulsed manner, and reacting with the precursor previously adsorbed on the atomized surface of the porous ceramic substrate;

[0076] S4. After the reaction is completed, the excess precursor and by-products are purged out of the reaction chamber with nitrogen;

[0077] S5. Repeat the above cycle process from S1 to S4 to continuously increase the coating thickness so as to achieve the desired resistance value of the heating film. The resistance value of the heating film 2 obtained in this embodiment is 0.85Ω.

[0078] 3. Preparation of electrode layer:

[0079] Printed silver paste is selected as the electrode material. The porous ceramic substrate 1 with the platinum heating film 2 deposited in the previous step is used to print a 45um thick silver paste on both ends of the platinum heating film 2 through a prefabricated screen. After printing, it is leveled at room temperature for 10 minutes, and then transferred to a 120℃ oven for drying for 12 minutes, and finally kept at 850℃ for 10 minutes for debinding and sintering, and a silver electrode layer 3 with a thickness of 27um is obtained at both ends of the platinum heating film.

[0080] Thus, a porous ceramic atomizing core with a curved atomizing surface is obtained.

[0081] The above description is only a preferred embodiment of the present invention. All equivalent changes and modifications made within the scope of the claims of the present invention should fall within the scope of the claims of the present invention.

Claims

1. A method for preparing a porous ceramic atomizing core having a curved atomizing surface, characterized in that: The following steps are involved:

1. Preparation of porous ceramic matrix: Obtaining ceramic aggregate: selecting at least one or more of powdered diatomaceous earth, alumina, silicon nitride, fused quartz powder, glass sand, feldspar powder, and mullite as ceramic aggregate, and grading and sieving the ceramic aggregate to obtain the ceramic aggregate with an average particle size of 7.5-150 μm; Obtaining a sintering aid: selecting at least one or more of powdered boron oxide, sodium silicate, silicon oxide, potassium oxide, calcium oxide, iron oxide, titanium oxide, zinc oxide, and zirconium oxide as a sintering aid; Obtaining a pore-forming agent: selecting at least one or more of powdered starch, wood powder, graphite powder, polystyrene microspheres, and polymethyl methacrylate microspheres as a pore-forming agent, and grading and sieving the pore-forming agent to obtain the pore-forming agent with an average particle size of 5-100 μm; Obtaining a dispersant: selecting at least one or more of paraffin wax, beeswax, boric acid, oleic acid, stearic acid, polyethylene, polypropylene, polyvinyl acetate, polyvinyl acetal, ethylene-vinyl acetate copolymer resin, and vinyl chloride-vinyl acetate copolymer resin as the dispersant; 40-65 parts of the ceramic aggregate, 10-30 parts of the sintering aid, and 10-30 parts of the pore-forming agent are selected by weight, mixed, and then added into 5-30 parts of the melted dispersant and stirred evenly, and then formed into a porous ceramic green body with a curved atomized surface, and further the porous ceramic green body is dewaxed and sintered to obtain a porous ceramic matrix with a curved atomized surface; 2. Preparation of heating film: The surface of the porous ceramic substrate is protected with a high-temperature tape, and the curved atomized surface to be coated is exposed and then placed in the reaction chamber of an atomic layer deposition device, and a metal platinum film is coated on the curved atomized surface of the porous ceramic substrate by an atomic layer deposition process to form a heating film; wherein the reaction source of platinum is a group selected from (trimethyl) methylcyclopentadiene platinum and oxygen, or (trimethyl) methylcyclopentadiene platinum and hydrogen, or hexafluoroacetylacetonate platinum and formalin, or acetylacetonate platinum and ozone; the thickness of the heating film is prepared to be 30-300nm, and the resistance of the heating film is prepared to be 0.5-2.0Ω; 3. Preparation of electrode layer: Selecting printable silver paste, silver-palladium paste, or aluminum paste as the electrode material, printing a layer of the electrode material on both ends of the curved atomized surface of the porous ceramic substrate through a prefabricated screen, further leveling, drying, debinding, and sintering to obtain the electrode layer; The order of steps 2 and 3 can be switched, and at least a portion of the electrode layer overlaps with the heating film so that the two are electrically connected.

2. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 1, characterized in that: The average particle size of the ceramic aggregate is 10-60 μm.

3. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 1, characterized in that: The average particle size of the pore former is 15-50 μm.

4. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 1, characterized in that: In the step of preparing the porous ceramic matrix, the ceramic aggregate is selected to be 40-50 parts, the sintering aid is selected to be 20-30 parts, the pore-forming agent is selected to be 15-30 parts, and the dispersant is selected to be 15-30 parts.

5. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 1, characterized in that: In the step of preparing the porous ceramic matrix, the porous ceramic green body is formed by a molding method selected from the group consisting of hot die casting, injection molding, and dry pressing.

6. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 1, characterized in that: In the step of preparing the porous ceramic matrix, the temperature of the wax removal is 450-850°C, and the temperature of the sintering is 750-1250°C.

7. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 1, characterized in that: In the step of preparing the porous ceramic matrix, the porosity of the porous ceramic matrix is ​​prepared to be 30-70%, and the average pore size of the porous ceramic matrix is ​​prepared to be 5-60 μm.

8. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 1, characterized in that: In the step of preparing the heating film, the thickness of the heating film is prepared to be 50-200nm, and the resistance of the heating film is prepared to be 0.7-1.5Ω.

9. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 1, characterized in that: In the steps of preparing the heating film, the reaction source of platinum is selected as (trimethyl) methylcyclopentadiene platinum and oxygen, the chamber temperature of the atomic layer deposition equipment is set to 250-350°C, the heating value of the reaction source (trimethyl) methylcyclopentadiene platinum is set to 50-100°C, oxygen is selected as the reaction gas, nitrogen is selected as the blowing gas, and the gas pressure of the chamber is maintained at 100-200Pa.

10. The method for preparing a porous ceramic atomizing core having a curved atomizing surface according to claim 9, characterized in that: The step of preparing the heating film further includes: S1, the precursor (trimethyl) methylcyclopentadienyl platinum enters the reaction chamber in a pulsed manner and chemically adsorbs on the atomized surface of the porous ceramic substrate; S2, after the surface adsorption is saturated, the excess precursor is purged out of the reaction chamber with inert gas nitrogen; S3, introducing the second reaction gas oxygen into the reaction chamber in a pulsed manner, and reacting with the precursor previously adsorbed on the atomized surface of the porous ceramic substrate; S4. After the reaction is completed, the excess precursor and by-products are purged out of the reaction chamber with nitrogen; S5. Repeat the above cycle process from S1 to S4 to continuously increase the coating thickness so as to achieve the required resistance value of the heating film.

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